Heat exchange auxiliary tank for silicon wafer texturing system

Abstract

The utility model relates to the field of photovoltaic silicon wafer cleaning, in particular to a heat exchange auxiliary tank for a silicon wafer texturing system, which comprises a tank body, the tank body is arranged outside a slow lifting tank, a water inlet pipe and a water outlet pipe are arranged on the tank body, the water inlet pipe is connected with the slow lifting tank, and the water outlet pipe is connected with a cleaning tank; the two heat exchange pipes are connected between the tank body and the water heater, a cold water pipe is connected between the two heat exchange pipes, and the two heat exchange pipes are connected with the side wall of the tank body; wherein the cold water pipe is positioned in the tank body. Hot water overflowing from the slow lifting tank exchanges heat with cold water, the temperature of water input into the water heater is increased, the purpose of saving electric energy of the water heater is achieved, the heat exchange pipe is arranged on the side wall of the tank body, the pressure for pumping water into the heat exchange pipe can be reduced when water is conveyed into the heat exchange pipe, and therefore the water pumping consumption of an external water supply system can be reduced, and the energy saving effect is achieved. Therefore, the energy consumption of the whole system is saved.

Description

Technical Field

[0001] The present application relates to the field of photovoltaic silicon wafer cleaning, and in particular to a heat exchange auxiliary tank for a silicon wafer texturing system. Background Art

[0002] After a series of processing procedures, silicon wafers need to be cleaned and texturized. The purpose of cleaning is to eliminate various pollutants adsorbed on the surface of the silicon wafers. Surface texturing can reduce the reflection of sunlight on the surface. After completing the texturizing process, the silicon wafers need to be pre-dehydrated using a slow-pulling tank, that is, the surface tension of pure, extremely resistive hot water is used to thermally dehydrate the silicon wafers during the slow-pulling process, and then the pre-dehydrated silicon wafers are dried.

[0003] When cleaning silicon wafers, warm water needs to be used in the cleaning pool for cleaning. The water temperature requirement is relatively low. The texturing process has higher temperature requirements. The water in the texturing tank and the slow withdrawal tank needs to be stably maintained between 50-80°C. During the texturing process, slow withdrawal of hot water will cause a large amount of water in the slow withdrawal tank to overflow. Therefore, a hot water machine is needed to heat cold water and continuously input it into the texturing tank to keep it at a constant temperature. The hot water machine has a heavy workload and consumes a lot of power. Utility Model Content

[0004] The technical problem to be solved by the utility model is that the existing silicon wafer texturing system has a large energy consumption.

[0005] To this end, the utility model provides a heat exchange auxiliary tank for a silicon wafer texturing system.

[0006] The technical solution adopted by the utility model to solve its technical problems is:

[0007] A heat exchange auxiliary tank for a silicon wafer texturing system, comprising:

[0008] A tank body, the tank body is arranged outside the slow extraction tank, and the tank body is provided with a water inlet pipe and a water outlet pipe, the water inlet pipe is connected to the slow extraction tank, and the water outlet pipe is connected to the cleaning tank;

[0009] Two heat exchange tubes, the heat exchange tubes are connected between the tank body and the water heater, a cold water pipe is connected between the two heat exchange tubes, and the two heat exchange tubes are connected to the side wall of the tank body;

[0010] Wherein, the cold water pipe is located in the tank body.

[0011] By adopting the above technical solution, the hot water overflowing from the slow draw tank in the present application is input into the tank body through the water inlet pipe, and the cold water enters the heat exchange tube, which is wrapped by the hot water in the tank body for heat exchange, and the temperature of the water discharged from the heat exchange tube to the water heater rises, thereby achieving the purpose of saving electric energy for the water heater. The heat exchange tube is arranged on the side wall of the tank body, and the pressure of pumping water into the heat exchange tube can be reduced when water is transported to the heat exchange tube, thereby reducing the water pumping consumption of the external water supply system, thereby saving energy consumption of the overall system.

[0012] After heat exchange, the temperature of the hot water in the tank drops and is input into the cleaning tank. Since the overflow water quality of the slow extraction is good, the hot water after heat exchange and cooling can enter the cleaning tank for reuse. The tank is set outside the slow extraction tank, so that technicians can monitor the tank operation in real time, and it is also convenient for the heat dissipation of the heat exchange auxiliary tank structure to avoid damage to the components in the heat exchange auxiliary tank structure in a high temperature environment and reduce its life.

[0013] Furthermore, a plurality of partition plates are arranged in the tank body, and the partition plates are arranged at intervals in the left-right direction. The partition plates divide the interior of the tank body into a plurality of heat exchange spaces. Notches are arranged on the partition plates, and the notches on adjacent partition plates are arranged one close to the front side and one close to the rear side.

[0014] Furthermore, the number of the spacer plates is odd, and the two heat exchange tubes are connected to the same side wall of the tank body.

[0015] Furthermore, a plurality of limit plates are arranged in the tank body, and the limit plates are provided with limit holes for the cold water pipes to pass through. The limit plates are arranged in the notches, or between adjacent partition plates, or between the partition plates and the inner wall of the tank body.

[0016] Furthermore, a support block is connected to the bottom of the trough body, and the support block is composed of a plurality of support plates arranged perpendicularly and crosswise to each other. The support block is in a grid shape, and the water inlet pipe and the water outlet pipe are connected to the bottom of the trough body.

[0017] Furthermore, a vent is provided on the support plate.

[0018] Furthermore, an overflow pipe is provided on the side wall of the tank body, the overflow pipe is connected to the cleaning tank, and the connection between the overflow pipe and the tank body is located above the heat exchange tube.

[0019] Furthermore, at least one water level monitor is arranged on the left side wall of the tank body.

[0020] Further, when one water level monitor is provided, the height of the water level monitor is consistent with the height of the overflow pipe.

[0021] Furthermore, when there are multiple water level monitors, one water level monitor that is set at a height consistent with the height of the overflow pipe is the main water level monitor, and the other water level monitors are located below the main water level monitor.

[0022] The beneficial effect of the utility model is that the tank body is arranged outside the slow lifting tank, so that technicians can monitor the tank body operation in real time, and it is also convenient for heat dissipation of the heat exchange sub-tank structure to avoid damage to components in the heat exchange sub-tank structure in a high temperature environment, thereby reducing its life.

[0023] The overflow hot water of the slow-draw tank has good water quality and enters the tank body through the water inlet pipe. Cold water is pumped out from the outside and enters the capillary tube through the first heat exchange tube. The hot water in the tank body exchanges heat with the cold water in the capillary tube. The cooled water in the tank body flows to the cleaning tank through the water outlet pipe, and the heated water in the capillary tube is introduced into the water heater through the second heat exchange tube, so as to achieve the purpose of saving electric energy. The heat exchange tube is arranged on the side wall of the tank body, which can reduce the pressure of cold water input into the heat exchange tube, that is, when water is delivered to the heat exchange tube, the pressure of pumping water into the heat exchange tube can be reduced, thereby reducing the pumping water consumption of the external water supply system, thereby saving the energy consumption of the overall system. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] The utility model is further described below in conjunction with the accompanying drawings and embodiments.

[0025] Figure 1 It is a side view of the heat exchange auxiliary tank in the utility model.

[0026] Figure 2 yes Figure 1 The AA section view is used to reflect the positional relationship between the trough body and the partition plate.

[0027] In the figure: 1. tank body; 2. water inlet; 3. water outlet; 4. first heat exchange tube; 5. second heat exchange tube; 6. overflow tube; 7. partition plate; 8. insert; 9. support plate; 10. water level monitor; 11. vent; 12. protective cover; 13. notch. DETAILED DESCRIPTION

[0028] Now the utility model is further described in detail with reference to the accompanying drawings. These drawings are simplified schematic diagrams, which only illustrate the basic structure of the utility model in a schematic manner, and therefore only show the components related to the utility model.

[0029] In the description of the present utility model, it is necessary to understand that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, features defined as "first" and "second" may explicitly or implicitly include one or more of such features. In the description of the present utility model, unless otherwise specified, "multiple" means two or more.

[0030] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0031] Reference Figure 1 and Figure 2 A heat exchange auxiliary tank for a silicon wafer texturing system comprises a tank body 1, a water inlet pipe, a water outlet pipe, a partition plate 7, a first heat exchange tube 4 and a second heat exchange tube 5. A top cover is installed on the top of the tank body 1 by bolts, a through opening is arranged on the top cover, a protective cover 12 is movably arranged on the top cover, and an observation window and a handle can be arranged on the protective cover 12.

[0032] A plurality of partition plates 7 are provided, and preferably, the number of the partition plates 7 is odd. The plurality of partition plates 7 are provided along the width direction (left-right direction) of the tank body 1 to divide the interior of the tank body 1 into a plurality of heat exchange spaces. In the present embodiment, three partition plates 7 are provided, and there are four heat exchange spaces. From right to left, the four heat exchange spaces are respectively the first heat exchange space, the second heat exchange space, the third heat exchange space and the fourth heat exchange space. Notches 13 are provided along the partition plates 7, and the notches 13 on adjacent partition plates 7 are provided one close to the front side and the other close to the rear side.

[0033] The first heat exchange tube 4 and the second heat exchange tube 5 are arranged on the side wall of the front side or the rear side of the tank body 1. The first heat exchange tube 4 and the second heat exchange tube 5 are arranged on the same side wall of the tank body 1. The first heat exchange tube 4 is arranged on the right side of the side wall of the tank body 1 and is connected to the first heat exchange space. The second heat exchange tube 5 is arranged on the left side of the side wall of the tank body 1 and is connected to the fourth heat exchange space.

[0034] A cold water pipe is connected between the first heat exchange tube 4 and the second heat exchange tube 5. The cold water pipe can be a capillary tube, which is arranged in a serpentine shape. The capillary tube passes through the notch 13 and is bent and arranged in four heat exchange spaces. A plurality of limit plates can also be arranged in the tank body 1. The limit plates are provided with limit holes for the cold water pipe to pass through. The limit plates can be arranged at any position in the notch 13, between adjacent partition plates 7, and between the partition plates 7 and the inner wall of the tank body 1. The partition plates 7 and the inner wall of the tank body 1 are connected with insert strips 8. The insert strips 8 are provided with slots. The length direction of the slots is arranged along the depth direction of the tank body 1. The slots pass through the top of the insert strips 8. The insert plates are plugged into the tank body 1 by cooperating with the slots.

[0035] An overflow pipe 6 is provided on the side wall of the tank body 1, and the overflow pipe 6 is connected to the cleaning tank. The connection between the overflow pipe 6 and the tank body 1 is located above the first heat exchange tube 4 and the second heat exchange tube 5. At least one water level monitor 10 is provided on the left side wall of the tank body 1. When one water level monitor 10 is provided, the height of the water level monitor 10 is consistent with the height of the overflow pipe 6. When multiple water level monitors 10 are provided, one water level monitor 10 provided at a height consistent with the height of the overflow pipe 6 is the main water level monitor 10, and the other water level monitors 10 are located below the main water level monitor 10.

[0036] The bottom of the tank body 1 is connected with a support block, which is composed of a plurality of support plates 9 arranged perpendicularly and crosswise to each other, and the support block is in a grid shape. The bottom of the tank body 1 is provided with a water inlet 2 and a water outlet 3. The water inlet pipe is connected to the bottom of the tank body 1 through the water inlet 2, and the water outlet pipe is connected to the bottom of the tank body 1 through the water outlet 3. The water inlet 2 is connected to the first heat exchange space, and the water outlet 3 is connected to the fourth heat exchange space. A vent 11 is provided at the bottom of each support plate 9, and the vent 11 runs through the bottom of the support plate 9, so that ventilation conditions are formed under the tank body 1, which is convenient for heat dissipation of the tank body 1, improves the heat exchange efficiency of hot water, and makes the temperature of the water output to the cleaning tank not too high.

[0037] The implementation principle of this application is:

[0038] The overflow hot water of the slow-draw tank has good water quality and enters the tank body 1 through the water inlet pipe. Cold water is pumped out from the outside and enters the capillary through the first heat exchange tube 4. The hot water in the tank body 1 exchanges heat with the cold water in the capillary tube. The cooled water in the tank body 1 flows to the cleaning tank through the water outlet pipe. The heated water in the capillary tube is introduced into the water heater through the second heat exchange tube 5, so as to achieve the purpose of saving electric energy. The heat exchange tube is arranged on the side wall of the tank body 1, which can reduce the pressure of cold water input into the heat exchange tube, that is, when water is delivered to the heat exchange tube, the pressure of pumping water into the heat exchange tube can be reduced, thereby reducing the pumping water consumption of the external water supply system, thereby saving the energy consumption of the overall system.

[0039] Based on the above ideal embodiments of the utility model, the relevant staff can make various changes and modifications without departing from the technical concept of the utility model through the above description. The technical scope of the utility model is not limited to the content of the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A heat exchange auxiliary tank for a silicon wafer texturing system, characterized in that: include, A tank body (1), the tank body (1) is arranged outside the slow extraction tank, and a water inlet pipe and a water outlet pipe are arranged on the tank body (1), the water inlet pipe is connected to the slow extraction tank, and the water outlet pipe is connected to the cleaning tank; Two heat exchange tubes, the heat exchange tubes being connected to the tank body (1), a cold water pipe being connected between the two heat exchange tubes, the two heat exchange tubes being connected to the side wall of the tank body (1), and one end of one heat exchange tube away from the tank body (1) being connected to a water heater; Wherein, the cold water pipe is located in the tank body (1).

2. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 1, characterized in that: A plurality of partition plates (7) are arranged in the tank body (1), and the partition plates (7) are arranged at intervals in the left-right direction. The partition plates (7) divide the interior of the tank body (1) into a plurality of heat exchange spaces. Notches (13) are arranged on the partition plates (7), and the notches (13) on adjacent partition plates (7) are arranged one close to the front side and one close to the rear side.

3. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 2, characterized in that: The number of the partition plates (7) is odd, and the two heat exchange tubes are connected to the same side wall of the tank body (1).

4. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 2, characterized in that: A plurality of limit plates are arranged in the trough body (1), and limit holes are arranged on the limit plates for the cold water pipes to pass through. The limit plates are arranged in the notches (13), or between adjacent partition plates (7), or between the partition plates (7) and the inner wall of the trough body (1).

5. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 1, characterized in that: The bottom of the trough body (1) is connected to a support block, the support block is composed of a plurality of support plates (9) arranged perpendicularly and crosswise to each other, the support block is in a grid shape, and the water inlet pipe and the water outlet pipe are connected to the bottom of the trough body (1).

6. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 5, characterized in that: The support plate (9) is provided with a ventilation hole (11).

7. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 1, characterized in that: An overflow pipe (6) is provided on the side wall of the tank body (1), the overflow pipe (6) is connected to the cleaning tank, and the connection between the overflow pipe (6) and the tank body (1) is located above the heat exchange tube.

8. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 7, characterized in that: At least one water level monitor (10) is arranged on the left side wall of the tank body (1).

9. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 8, characterized in that: When one water level monitor (10) is provided, the height of the water level monitor (10) is consistent with the height of the overflow pipe (6).

10. The heat exchange auxiliary tank for silicon wafer texturing system according to claim 8, characterized in that: When a plurality of water level monitors (10) are provided, one water level monitor (10) provided at a height consistent with the height of the overflow pipe (6) is the main water level monitor (10), and the other water level monitors (10) are located below the main water level monitor (10).

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