Continuous impurity removal device for negative electrode material preparation

Abstract

The continuous impurity removal device comprises an impurity removal box, a first partition plate is arranged in the middle of the impurity removal box and divides the interior of the impurity removal box into an acid pickling cavity and a washing cavity, an impurity removal mechanism is arranged in the middle of the acid pickling cavity, and a feeding mechanism for conveying the negative electrode materials is arranged in the middle of the impurity removal mechanism. A discharging mechanism for conveying a negative electrode material is arranged in the flushing cavity, a cleaning mechanism for storing deionized water is arranged below the discharging mechanism, and a flushing mechanism for flushing the negative electrode material is arranged on the outer side of the impurity removal box. The negative electrode material is continuously conveyed through the feeding mechanism, and the impurity removal mechanism is matched to drive the pickling solution to continuously penetrate through the feeding mechanism, so that the negative electrode material in the feeding mechanism can be subjected to flowing pickling, and the impurity removal device can continuously remove impurities from the negative electrode material conveniently; and a filtrate net in the impurity removal mechanism can continuously filter impurities in the pickling solution when the pickling solution flows, so that the effect of continuously pickling the negative electrode material by the pickling solution can be maintained.

Description

Technical Field

[0001] The utility model relates to the technical field of negative electrode material preparation equipment, in particular to a continuous impurity removal device for negative electrode material preparation. Background Art

[0002] Negative electrode materials refer to materials used to store and release charge in batteries or electrochemical energy storage devices. Negative electrode materials accept electrons during charging and release electrons during discharging. Commonly used negative electrode materials such as graphite need to be treated with impurities during the preparation process to prevent impurities in the negative electrode materials from affecting the performance and life of the negative electrode materials.

[0003] A common method for removing impurities from negative electrode materials is pickling, which uses a strong acid solution such as concentrated hydrochloric acid, nitric acid or hydrofluoric acid to treat graphite to remove inorganic impurities (such as metal impurities) and carbides. The treated graphite is then rinsed with deionized water until it is neutral.

[0004] In the process of the above-mentioned negative electrode material, it is found that the pickling solution in contact with the negative electrode material will be doped with more impurities after contacting the negative electrode material, which will affect the subsequent impurity removal treatment of the negative electrode material. Therefore, when the impurity removal device continuously removes impurities from the negative electrode material, it is easy to have a poor impurity removal effect.

[0005] In summary, there is currently a need for an impurity removal device that is convenient for continuously removing impurities from negative electrode materials. Utility Model Content

[0006] In view of the deficiencies of the prior art, the utility model provides a continuous impurity removal device for preparing negative electrode materials, which solves the problems mentioned in the background technology.

[0007] In order to achieve the above objectives, the present invention is implemented through the following technical solutions:

[0008] A continuous impurity removal device for preparing negative electrode materials, comprising an impurity removal box, a partition plate 1 is provided in the middle of the impurity removal box, the partition plate 1 forms a pickling chamber and a flushing chamber inside the impurity removal box, an impurity removal mechanism is provided in the middle of the pickling chamber, a feeding mechanism for conveying negative electrode materials is provided in the middle of the impurity removal mechanism, a discharging mechanism for conveying negative electrode materials is provided in the flushing chamber, a cleaning mechanism for storing deionized water is provided below the discharging mechanism, and a flushing mechanism for flushing negative electrode materials is provided outside the impurity removal box;

[0009] The impurity removal mechanism comprises a second partition plate, a filtrate net, a liquid pump, an upper liquid pipe, a liquid outlet pipe and an impurity removal nozzle. The second partition plate is mirror-mounted inside the pickling chamber. The second partition plate divides the inside of the pickling chamber into a pickling area and a purification area. A filtrate net is provided at the bottom of the second partition plate. The first liquid pump is provided at the top of the purification area. The first liquid pump has an upper liquid pipe at its water inlet and a first liquid outlet pipe at its water outlet. The middle of the first liquid outlet pipe is located at the top of the pickling area. A plurality of impurity removal nozzles are provided below the first liquid outlet pipe.

[0010] A sewage discharge door is provided at the bottom of one side of the impurity removal box, and the sewage discharge door is arranged corresponding to the pickling area. A liquid replenishment pipe 1 is provided at the top of the side of the impurity removal box, and the liquid replenishment pipe 1 is arranged corresponding to the purification area.

[0011] Furthermore, the feeding mechanism includes a feed hopper, a feeding cylinder, a liquid passing cylinder, a discharging cylinder, a motor and spiral blades. The feed hopper is arranged on the side of the impurity removal box, a feeding cylinder is arranged at the bottom of the feed hopper, a liquid passing cylinder is fixedly arranged at the end of the feeding cylinder, a discharging cylinder is arranged at the end of the liquid passing cylinder away from the spiral blades, a motor is arranged on the outside of the feeding cylinder, and a spiral blade is arranged at the output end of the motor, and the edge of the spiral blade is in sliding contact with the inner side of the feeding cylinder, the inner side of the liquid passing cylinder and the inner side of the discharging cylinder.

[0012] Furthermore, the liquid-passing cylinder is provided with liquid-passing holes, which are spaced apart in a ring. The feeding cylinder, the liquid-passing cylinder and the discharging cylinder are arranged upwardly and tilted inside the impurity removal box, and the end of the discharging cylinder passes through the partition to the top of the discharging mechanism.

[0013] Furthermore, the discharge mechanism includes motor 2, a feeding rod, a feeding mesh belt and a discharge plate. Motor 2 is arranged outside the impurity removal box, the feeding rod is located inside the flushing chamber, a feeding mesh belt is arranged outside the feeding rod, discharge ports are arranged at both ends of the flushing chamber, and a discharge plate is arranged at the bottom of the discharge port.

[0014] Furthermore, the cleaning mechanism includes partition three, a guide top plate and a filter net. The partition three is mirrored at the bottom of the flushing chamber. A water storage area is formed between the partition three. A water collection area is formed between the partition three and the impurity removal box. A guide top plate is provided at the top of the partition three, and a filter net is provided at the bottom of the partition three.

[0015] Furthermore, the flushing mechanism includes a liquid pump 2, an upper liquid pipe 2, a liquid outlet pipe 2 and a flushing nozzle. The liquid pump 2 is arranged on the outside of the impurity removal box. The water inlet of the liquid pump 2 is provided with an upper liquid pipe 2. The end of the upper liquid pipe 2 that is away from the liquid pump 2 extends to the inside of the water storage area. The water outlet of the liquid pump 2 is provided with a liquid outlet pipe 2. The liquid outlet pipe 2 is located above the discharge mechanism, and a plurality of flushing nozzles are provided on the bottom surface of the liquid outlet pipe 2.

[0016] The utility model provides a continuous impurity removal device for preparing negative electrode materials. Compared with the prior art, it has the following beneficial effects:

[0017] The negative electrode material is continuously transported by the feeding mechanism, and the pickling solution is driven to continuously pass through the feeding mechanism in cooperation with the impurity removal mechanism, so that the negative electrode material in the feeding mechanism can be flow-picked, which is convenient for the impurity removal device to continuously remove impurities from the negative electrode material. During this process, the filtrate net in the impurity removal mechanism can continuously filter impurities in the pickling solution when the pickling solution flows, thereby maintaining the effect of continuously pickling the negative electrode material with the pickling solution. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0019] Figure 1 The schematic diagram of the structure of the continuous impurity removal device for preparing negative electrode materials of the utility model is shown;

[0020] Figure 2 The utility model is shown as a schematic diagram of the overall side view of the structure;

[0021] Figure 3 The schematic diagram of the structure of the flushing mechanism of the utility model is shown;

[0022] Figure 4 The structure diagram of the impurity removal mechanism of the utility model is shown;

[0023] Figure 5 The schematic diagram of the structure of the cleaning mechanism of the utility model is shown;

[0024] As shown in the figure: 1. De-impurity box; 11. Partition 1; 12. Drain door; 13. Liquid replenishment pipe 1; 2. Feeding mechanism; 21. Feed hopper; 22. Feeding barrel; 23. Liquid passing barrel; 24. Discharging barrel; 25. Motor 1; 26. Spiral blade; 3. De-impurity mechanism; 31. Partition 2; 32. Filtrate net; 33. Liquid pump 1; 34. Upper liquid pipe 1; 35. Discharging pipe 1; 36. De-impurity nozzle; 4. Cleaning mechanism; 41. Partition 3; 42. Guide top plate; 43. Filter net; 44. Liquid replenishment pipe 2; 45. Discharging pipe; 5. Discharging mechanism; 51. Motor 2; 52. Feeding rod; 53. Feeding mesh belt; 54. Discharging plate; 6. Flushing mechanism; 61. Liquid pump 2; 62. Upper liquid pipe 2; 63. Discharging pipe 2; 64. Flushing nozzle. DETAILED DESCRIPTION

[0025] In order to make the purpose, technical solution and advantages of the embodiments of the utility model clearer, the technical solution in the embodiments of the utility model is described clearly and completely. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0026] Embodiment 1:

[0027] In order to solve the technical problems in the background technology, the following continuous impurity removal device for preparing negative electrode materials is provided:

[0028] Combination Figure 1-Figure 4 As shown, the continuous impurity removal device for preparing negative electrode materials provided by the utility model comprises an impurity removal box 1, a partition 11 is provided in the middle of the impurity removal box 1, the partition 11 forms a pickling chamber and a flushing chamber inside the impurity removal box 1, an impurity removal mechanism 3 is provided in the middle of the pickling chamber, the impurity removal mechanism 3 can continuously flush the negative electrode material with a pickling solution, a feeding mechanism 2 for conveying the negative electrode material is provided in the middle of the impurity removal mechanism 3, a discharging mechanism 5 for conveying the negative electrode material is provided in the flushing chamber, a cleaning mechanism 4 for storing deionized water is provided below the discharging mechanism 5, a flushing mechanism 6 for flushing the negative electrode material is provided outside the impurity removal box 1, and the flushing mechanism 6 can spray deionized water on the negative electrode material for flushing;

[0029] The impurity removal mechanism 3 includes a partition plate 31, a filtrate net 32, a liquid pump 33, an upper liquid pipe 34, a liquid outlet pipe 35 and an impurity removal nozzle 36. The partition plate 31 is mirrored inside the pickling chamber. The partition plate 31 divides the inside of the pickling chamber into a pickling area and a purification area. A filtrate net 32 ​​is provided at the bottom of the partition plate 31. The filtrate net 32 ​​can filter the pickling solution when the pickling solution enters the purification area from the pickling area, so as to maintain the pickling and impurity removal effect of the pickling solution on the negative electrode material. The liquid pump 33 is provided at the top of the purification area. The liquid pump 33 can provide power for the flow of the pickling solution. The water inlet of the liquid pump 33 is provided with an upper liquid pipe 34, and the water outlet of the liquid pump 33 is provided with a liquid outlet pipe 35. The middle part of the liquid outlet pipe 35 is located at the top of the pickling area. A plurality of impurity removal nozzles 36 are provided below the liquid outlet pipe 35. When the liquid pump 33 is working, the plurality of impurity removal nozzles 36 can flow the pickling solution to the feeding mechanism 2.

[0030] A sewage discharge door 12 is provided at the bottom of one side of the impurity removal box 1, and the sewage discharge door 12 is arranged corresponding to the pickling area. The sewage discharge door 12 is used to clean the dirt in the pickling area. A liquid replenishing pipe 13 is provided at the top of the side of the impurity removal box 1, and the liquid replenishing pipe 13 is arranged corresponding to the purification area. The liquid replenishing pipe 13 is convenient for replenishing the pickling solution into the pickling chamber;

[0031] In the present embodiment, the feeding mechanism 2 comprises a feed hopper 21, a feed barrel 22, a liquid-passing barrel 23, a discharge barrel 24, a motor 25 and a spiral blade 26. The feed hopper 21 is arranged on the side of the impurity removal box 1. The feed barrel 22 is provided at the bottom end of the feed hopper 21. The feed hopper 21 can feed the negative electrode material into the feed barrel 22, so as to facilitate the subsequent pickling of the negative electrode material. The end of the feed barrel 22 is fixedly provided with a liquid-passing barrel 23, and the end of the liquid-passing barrel 23 away from the spiral blade 26 is provided with a discharge barrel 24. A motor 25 is provided on the outside of the feed barrel 22, and a spiral blade 26 is provided on the output end of the motor 25. The motor drives the spiral blade 26 to rotate, so as to continuously transport the negative electrode material, so as to facilitate the continuous impurity removal of the impurity removal device. The edge of the spiral blade 26 is in sliding contact with the inner side of the feed barrel 22, the inner side of the liquid-passing barrel 23 and the inner side of the discharge barrel 24.

[0032] In this embodiment, liquid holes are provided inside the liquid cylinder 23, and the liquid holes are arranged in a ring array at intervals. The arrangement of the liquid holes allows the flowing pickling solution to continuously pass through the liquid cylinder 23 to contact with the negative electrode material for impurity removal. The feed cylinder 22, the liquid cylinder 23 and the discharge cylinder 24 are arranged upwardly and tilted inside the impurity removal box 1. The end of the discharge cylinder 24 passes through the partition 11 to the top of the discharge mechanism 5. The feed cylinder 22, the liquid cylinder 23 and the discharge cylinder 24 arranged upwardly and tilted facilitate entering the flushing cavity for flushing after the negative electrode material is pickled and impurities are removed;

[0033] The implementation principle of the first embodiment is as follows: when the impurity removal device is in use, the feeding mechanism 2 continuously transports the negative electrode material, and at the same time, the impurity removal mechanism 3 drives the pickling solution to continuously pass through the feeding mechanism 2, and the negative electrode material in the feeding mechanism 2 will be pickled with the pickling solution flow to remove impurities in the negative electrode material, so that the impurity removal device can continuously remove impurities from the negative electrode material. During this process, the filtrate net 32 ​​in the impurity removal mechanism 3 can continuously filter impurities in the pickling solution when the pickling solution flows, thereby maintaining the effect of continuously pickling the negative electrode material with the pickling solution.

[0034] Embodiment 2:

[0035] like Figure 1-Figure 5 As shown, based on the above embodiment, this embodiment further provides the following contents:

[0036] In order to enable the impurity removal device to treat the negative electrode material to neutrality after pickling the negative electrode material, the present embodiment provides the following design:

[0037] The discharge mechanism 5 includes a second motor 51, a feeding rod 52, a feeding mesh belt 53 and a discharge plate 54. The second motor 51 is arranged outside the impurity removal box 1, the feeding rod 52 is located inside the flushing chamber, a feeding mesh belt 53 is arranged outside the feeding rod 52, discharge ports are arranged at both ends of the flushing chamber, and a discharge plate 54 is arranged at the bottom of the discharge port. The feeding mesh belt 53 can transport the negative electrode material falling on the surface under the rotation of the feeding rod 52, so as to facilitate the negative electrode material to be discharged from the device after flushing;

[0038] In this embodiment, the cleaning mechanism 4 includes a partition plate 41, a guide top plate 42 and a filter screen 43. The partition plate 41 is mirrored at the bottom of the flushing chamber. A water storage area is formed between the partition plates 41, and a water collection area is formed between the partition plates 41 and the impurity removal box 1. The top of the partition plate 41 is provided with a guide top plate 42, and the bottom of the partition plate 41 is provided with a filter screen 43. The filter screen 43 can filter impurities in the deionized water when the deionized water flows, so as to maintain the flushing effect of the deionized water on the negative electrode material;

[0039] In this embodiment, the flushing mechanism 6 includes a liquid pump 61, an upper liquid pipe 62, a liquid outlet pipe 63 and a flushing nozzle 64. The liquid pump 61 is arranged on the outside of the impurity removal box 1. The water inlet of the liquid pump 61 is provided with an upper liquid pipe 62. The liquid pump 61 can transport deionized water through the upper liquid pipe 62. The end of the upper liquid pipe 62 that is away from the liquid pump 61 extends to the inside of the water storage area. The water outlet of the liquid pump 61 is provided with a liquid outlet pipe 63. The liquid outlet pipe 63 is located above the discharge mechanism 5. A plurality of flushing nozzles 64 are provided on the bottom surface of the liquid outlet pipe 63. The plurality of flushing nozzles 64 can spray deionized water to flush the negative electrode material after pickling above the feeding mesh belt 53. A liquid replenishment pipe 44 for replenishing deionized water and a liquid discharge pipe 45 for discharging deionized water are provided on the outside of the impurity removal box 1.

[0040] The implementation principle of the second embodiment is as follows: after the negative electrode material is pickled and impurities removed by the impurity removal mechanism 3, the negative electrode material will be transported by the feeding mechanism 2 to the top of the feeding mesh belt 53 of the discharge mechanism 5. At this time, the liquid pump 2 61 in the flushing mechanism 6 extracts the deionized water in the cleaning mechanism 4 through the upper liquid pipe 2 62, and the deionized water will be sprayed out by multiple flushing nozzles 64 under the liquid outlet pipe 2 63. The sprayed deionized water will flush the negative electrode material above the feeding mesh belt 53 and flush it to neutral. Then, the motor 2 51 drives the feeding rod 52 and the feeding mesh belt 53 to rotate to discharge the flushed negative electrode material.

[0041] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0042] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A continuous impurity removal device for preparing negative electrode materials, characterized in that: The invention comprises a cleaning box (1), wherein a partition plate (11) is provided in the middle of the cleaning box (1), the partition plate (11) forms a pickling chamber and a flushing chamber inside the cleaning box (1), a cleaning mechanism (3) is provided in the middle of the pickling chamber, a feeding mechanism (2) for conveying negative electrode materials is provided in the middle of the cleaning mechanism (3), a discharge mechanism (5) for conveying negative electrode materials is provided in the flushing chamber, a cleaning mechanism (4) for storing deionized water is provided below the discharge mechanism (5), and a flushing mechanism (6) for flushing negative electrode materials is provided outside the cleaning box (1); The impurity removal mechanism (3) comprises a second partition plate (31), a filtrate net (32), a liquid pump (33), an upper liquid pipe (34), a liquid outlet pipe (35) and an impurity removal nozzle (36); the second partition plate (31) is arranged in a mirror image inside the pickling chamber; the second partition plate (31) divides the inside of the pickling chamber into a pickling area and a purification area; the filtrate net (32) is arranged at the bottom of the second partition plate (31); the liquid pump (33) is arranged at the top of the purification area; the water inlet of the liquid pump (33) is provided with an upper liquid pipe (34); the water outlet of the liquid pump (33) is provided with a liquid outlet pipe (35); the middle part of the liquid outlet pipe (35) is located at the top of the pickling area; and a plurality of impurity removal nozzles (36) are arranged below the liquid outlet pipe (35); A sewage discharge door (12) is provided at the bottom of one side of the impurity removal box (1), and the sewage discharge door (12) is arranged corresponding to the pickling area. A liquid replenishment pipe (13) is provided at the top of the side of the impurity removal box (1), and the liquid replenishment pipe (13) is arranged corresponding to the purification area.

2. The continuous impurity removal device for preparing negative electrode materials according to claim 1, characterized in that: The feeding mechanism (2) comprises a feeding hopper (21), a feeding cylinder (22), a liquid-passing cylinder (23), a discharging cylinder (24), a motor (25) and a spiral blade (26); the feeding hopper (21) is arranged on the side of the impurity removal box (1); the feeding cylinder (22) is arranged at the bottom end of the feeding hopper (21); the liquid-passing cylinder (23) is fixedly arranged at the end of the feeding cylinder (22); the discharging cylinder (24) is arranged at the end of the liquid-passing cylinder (23) away from the spiral blade (26); the motor (25) is arranged on the outside of the feeding cylinder (22); the spiral blade (26) is arranged at the output end of the motor (25); the edge of the spiral blade (26) is in sliding contact with the inner side of the feeding cylinder (22), the inner side of the liquid-passing cylinder (23) and the inner side of the discharging cylinder (24).

3. The continuous impurity removal device for preparing negative electrode materials according to claim 2, characterized in that: The liquid-passing cylinder (23) is provided with liquid-passing holes arranged in a ring-shaped pattern at intervals. The feeding cylinder (22), the liquid-passing cylinder (23) and the discharge cylinder (24) are arranged in an upwardly inclined manner inside the impurity removal box (1). The end of the discharge cylinder (24) passes through the partition plate (11) to the top of the discharge mechanism (5).

4. The continuous impurity removal device for preparing negative electrode materials according to claim 1, characterized in that: The discharge mechanism (5) comprises a second motor (51), a feeding rod (52), a feeding mesh belt (53) and a discharge plate (54); the second motor (51) is arranged outside the impurity removal box (1); the feeding rod (52) is located inside the flushing chamber; a feeding mesh belt (53) is arranged outside the feeding rod (52); discharge ports are arranged at both ends of the flushing chamber; and a discharge plate (54) is arranged at the bottom of the discharge port.

5. The continuous impurity removal device for preparing negative electrode materials according to claim 1, characterized in that: The cleaning mechanism (4) comprises a partition three (41), a guide top plate (42) and a filter screen (43); the partition three (41) is arranged in a mirror image at the bottom of the flushing chamber; a water storage area is formed between the partition three (41); a water collection area is formed between the partition three (41) and the impurity removal box (1); the guide top plate (42) is arranged at the top end of the partition three (41); and the filter screen (43) is arranged at the bottom end of the partition three (41).

6. The continuous impurity removal device for preparing negative electrode materials according to claim 1, characterized in that: The flushing mechanism (6) comprises a second liquid pump (61), a second upper liquid pipe (62), a second liquid outlet pipe (63) and a flushing nozzle (64). The second liquid pump (61) is arranged outside the impurity removal box (1). The second upper liquid pipe (62) is arranged at the water inlet of the second liquid pump (61). One end of the second upper liquid pipe (62) facing away from the second liquid pump (61) extends to the inside of the water storage area. The second liquid outlet pipe (63) is arranged at the water outlet of the second liquid pump (61). The second liquid outlet pipe (63) is located above the discharge mechanism (5). A plurality of flushing nozzles (64) are arranged on the bottom surface of the second liquid outlet pipe (63).

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