Silicon wafer brush dust removal device

Abstract

The utility model relates to a silicon wafer brush dust removal device which comprises a dust collection assembly, a sweeping assembly and a sensor assembly. The dust collection assembly comprises a dust collection base, a dust removal connecting part and a dust collector body; the dust collection base and the dust removal connecting part are connected into a whole; an opening is formed in the bottom of the cavity, and a dust collection air opening connected with the dust collector body is formed in the top of the cavity; the sweeping assembly comprises a brush and a rotary servo motor; the brush is rotatably arranged in the cavity, and part of the brush is exposed out of the opening; the rotary servo motor drives the brush to rotate; and the sensor assembly is arranged below the dust removal connecting part. The brush is in direct contact with the surface of the silicon wafer to sweep dust adhered to the surface of the silicon wafer, dust particles on the surface of the silicon wafer are sucked through the dust suction assembly, then the position of the silicon wafer is detected through the sensor, and a motion instruction is executed only when the brush is not in contact with the silicon wafer, namely, the brush rotates to the back face to remove dust and stops rotating when the brush is in contact with the silicon wafer. Good application prospects are realized.

Description

Technical Field

[0001] The utility model belongs to the field of photovoltaic solar cell sheets, and in particular relates to a silicon sheet brush dust removal device. Background Art

[0002] Various new energy technologies are developing rapidly, among which photovoltaic power generation technology is one of the key areas of focus. Unlike traditional fuel power generation, photovoltaic power generation technology converts sunlight into electrical energy, which is a green and safe way of generating electricity. In photovoltaic power generation, the most important part is the solar cell, and for solar cells, the most important indicator is the photoelectric conversion efficiency.

[0003] However, in the preparation process of solar cells, there are many factors that affect the efficiency of the cells. For example, dust adhering to the surface of the cells may reduce the efficiency of the cells and even cause hidden cracks and scratches. To address this problem, in the production process of photovoltaic cells, ion wind rods, ion blowers or ion wind nozzles are usually used to blow during the operation of the silicon wafers, which can remove dust and eliminate static electricity at the same time. However, since the wind speed will also affect the normal operation of the cells, the fan needs to maintain a certain distance from the cells to prevent the cells from shifting, which may eventually lead to poor dust removal effect. Therefore, a dust removal device for photovoltaic solar cells with good dust removal effect is needed. Utility Model Content

[0004] In order to solve the above problems existing in the prior art, the utility model provides a silicon wafer brush dust removal device. The technical problem to be solved by the utility model is achieved through the following technical solutions:

[0005] The utility model provides a silicon chip brush dust removal device, comprising: a dust suction component, a sweeping component and a sensor component;

[0006] The dust collection assembly comprises: a dust collection base, a dust removal connection part and a dust collector body;

[0007] The dust suction base is located on the dust removal connection part and is connected as a whole; a cavity is arranged inside the dust removal connection part, an opening is arranged at the bottom of the cavity, and a dust suction air outlet is arranged at the top; the dust suction air outlet is connected to the vacuum cleaner body through an air duct;

[0008] The cleaning assembly comprises: a brush and a rotary servo motor;

[0009] The brush is rotatably disposed in the cavity and partially exposed from the opening; the rotary servo motor is connected to and drives the brush to rotate;

[0010] The sensor assembly is disposed below the dust removal connection portion near the opening and is used to detect the silicon chip to generate a control signal and transmit it to a connected external control assembly;

[0011] The external control component controls the rotation servo motor according to the control signal.

[0012] In one embodiment of the present invention, the axial length of the brush is greater than or equal to the width of the silicon wafer.

[0013] In one embodiment of the utility model, the sweeping assembly further comprises: a rotating shaft;

[0014] The brush is coaxially sleeved outside the rotating shaft, and the rotating shaft is rotatably connected to the dust removal connecting part; the output end of the rotary servo motor is connected to one end of the rotating shaft to drive the rotating shaft to rotate.

[0015] In one embodiment of the present invention, the sensor assembly includes a plurality of sensors, and the plurality of sensors are arranged at intervals below the dust removal connection portion.

[0016] In one embodiment of the present invention, the sensor is an infrared photoelectric sensor, and the emitting end of the infrared photoelectric sensor is arranged downward.

[0017] In one embodiment of the present invention, after the sensor component detects the silicon chip, the external control component controls the rotation servo motor to stop rotating according to the control signal so that the brush stops rotating.

[0018] In one embodiment of the utility model, the silicon wafer brush dust removal device further includes: a connecting component; the connecting component is respectively connected to the dust suction base, the rotating shaft and the rotary servo motor.

[0019] Compared with the prior art, the beneficial effects of the utility model are:

[0020] The silicon wafer brush dust removal device of the utility model is placed above the belt transmission mechanism for transmitting silicon wafers. The brush part is exposed and directly contacts the surface of the silicon wafer to sweep away the dust adhered to the surface of the silicon wafer. The direct contact of the brush can better collect dust particles, thereby improving the accuracy of dust removal. After the brush collects the dust particles, it rotates to the back and removes the dust particles thereon through the dust suction component to ensure the effective removal of dust and avoid secondary pollution due to incomplete removal. Then, the position of the silicon wafer is detected by the sensor, and the motion instruction is executed only when the brush is not in contact with the silicon wafer, that is, the brush rotates to the back to remove dust, and stops rotating when the brush contacts the silicon wafer, thereby realizing cyclic dust removal, which is long-lasting. And because the surface of the silicon wafer is only in contact with the non-moving brush, it is not easy to cause the silicon wafer to deviate, and at the same time, the dust removal effect can be guaranteed, which has good application prospects.

[0021] The above description is only an overview of the technical solution of the utility model. In order to more clearly understand the technical means of the utility model, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the utility model more obvious and easy to understand, the following preferred embodiments are specifically cited and described in detail with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 This is a structural front view of a silicon wafer brush dust removal device provided by an embodiment of the utility model;

[0023] Figure 2 This is a structural side view of a silicon wafer brush dust removal device provided by an embodiment of the utility model;

[0024] Figure 3 It is a structural schematic diagram of the dust collection assembly provided by an embodiment of the utility model;

[0025] Figure 4 It is a schematic diagram of the working effect of a silicon wafer brush dust removal device provided in an embodiment of the utility model.

[0026] Icons: 100 - dust suction component; 110 - dust suction base; 120 - dust removal connection; 121 - dust suction vent; 130 - vacuum cleaner body; 200 - sweeping component; 210 - brush; 220 - rotary servo motor; 230 - shaft; 300 - sensor component; 400 - connection component; 10 - external control component; 20 - dust removal device fixing bracket; 30 - transmission belt. DETAILED DESCRIPTION

[0027] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined purpose of the present invention, a silicon wafer brush dust removal device proposed according to the present invention is described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0028] The above and other technical contents, features and effects of the utility model are clearly presented in the following detailed description of the specific implementation mode in conjunction with the accompanying drawings. Through the description of the specific implementation mode, the technical means and effects adopted by the utility model to achieve the predetermined purpose can be more deeply and specifically understood. However, the attached drawings are only for reference and explanation, and are not used to limit the technical solution of the utility model.

[0029] Embodiment 1

[0030] Please refer to Figure 1 , Figure 2 and Figure 3The silicon wafer brush dust removal device of this embodiment includes: a dust suction component 100 and a sweeping component 200, wherein the sweeping component 200 is arranged in the dust suction component 100, and the brush 210 of the dust suction component 100 is partially exposed from the sweeping component 200, and the dust on the silicon wafer is swept from top to bottom by the brush 210, and the dust suction component 100 is used to suck away the dust particles on the brush 210 to ensure continuous dust removal.

[0031] In this embodiment, the dust collection assembly 100 includes: a dust collection base 110, a dust removal connection part 120 and a vacuum cleaner body 130; the dust collection base 110 is located on the dust removal connection part 120 and is connected as a whole; a cavity is provided inside the dust removal connection part 120, an opening is provided at the bottom of the cavity, and a dust collection air outlet 121 is provided at the top; the dust collection air outlet 121 is connected to the vacuum cleaner body 130 through an air duct, that is, the vacuum cleaner body 130 makes the upper part of the cavity inside the dust removal connection part 120 have negative pressure through the connected air duct and the dust collection air outlet 121, that is, dust is sucked from the cavity into the vacuum cleaner body 130.

[0032] In an optional embodiment, the dust suction base 110 is a rectangular parallelepiped base to adapt to the axial length of the brush 210 and to minimize the volume; similarly, the dust suction air outlet 121 and the shape of the vertical projection of the opening are both rectangular.

[0033] In an optional embodiment, the cavity in the dust removal connection part 120 is a cylinder, and the diameter of the cylinder is slightly larger than the outer diameter of the brush 210 .

[0034] In this embodiment, the cleaning component 200 includes: a brush 210, a rotary servo motor 220 and a rotating shaft 230; the brush 210 is rotatably arranged in the cavity, and partially exposed from the opening; the brush 210 is coaxially sleeved outside the rotating shaft 230, and the rotating shaft 230 is rotatably connected to the dust removal connection part 120; the output end of the rotary servo motor 220 is connected to one end of the rotating shaft 230 to drive the rotating shaft 230 to rotate, and the rotating shaft 230 drives the brush 210 to rotate, and when the brush 210 rotates and passes through the dust suction port 121, the dust carried thereon is sucked away to ensure the effective removal of the dust and avoid secondary pollution due to incomplete removal.

[0035] In an optional embodiment, the brush 210 is detachably connected to the dust removal connection portion 120 to facilitate regular cleaning and replacement of the brush 210 .

[0036] Preferably, the brush 210 is made of wool to ensure that the surface of the silicon wafer is not damaged during the cleaning process.

[0037] In this embodiment, to ensure thorough cleaning, the axial length of the brush 210 is greater than or equal to the width of the silicon wafer, so that the brush 210 can cover the surface of the silicon wafer when in contact with the silicon wafer.

[0038] In this embodiment, the silicon wafer brush dust removal device also includes: a sensor component 300, which is arranged at the bottom of the dust suction component 100. Specifically, the sensor component 300 is arranged below the dust removal connection part 120 near the opening, and is used to detect the position of the silicon wafer to generate a control signal and transmit it to the connected external control component 10, and the external control component 10 then controls the rotation servo motor 220 according to the control signal. After the sensor component 300 detects the silicon wafer, the external control component 10 controls the rotating servo motor 220 to stop rotating according to the control signal so as to stop the brush 210 from rotating, so as to prevent the silicon wafer from being offset due to the rotation of the brush 210. That is, in the actual working process, the silicon wafer is transported on the transmission belt 30 to the bottom of the brush 210 to achieve dust removal, rather than the brush 210 actively moving to achieve removal. After the sensor component 300 cannot detect the silicon wafer, a group of control signals is also generated. The external control component 10 controls the rotating servo motor 220 to rotate according to the group of control signals so as to rotate the brush 210 inward, and the dust particles swept by the brush 210 are sucked away by the dust suction component 100.

[0039] In an optional embodiment, to ensure the accuracy of detection, the sensor assembly 300 includes a plurality of sensors, and the plurality of sensors are spaced apart and arranged below the dust removal connection portion 120 .

[0040] In an optional embodiment, the sensor is an infrared photoelectric sensor, and the emitting end of the infrared photoelectric sensor is arranged downward.

[0041] Preferably, the model of the infrared photoelectric sensor may be TCRT1000, TCRT5 or SFH309.

[0042] In an optional embodiment, the silicon wafer brush dust removal device further includes: a connecting component 400, and the connecting component 400 is respectively connected to the dust suction base 110, the rotating shaft 230 and the rotary servo motor 220.

[0043] In a specific embodiment, Figure 4As shown, the connection component 400 is fixedly connected to the dust removal device fixing bracket 20, and the dust removal device fixing bracket 20 is fixed on the machine tool base or foundation, so that the silicon wafer brush dust removal device is set above the transmission belt 30, and the silicon wafers are transported one by one on the transmission belt 30. For ease of understanding, the transmission frequency of the silicon wafer is 1 second / sheet, that is, there is a certain interval between two adjacent silicon wafers, and only one silicon wafer passes through the brush 210 within 1 second. Along the movement direction of the transmission belt 30, that is, the transmission movement direction of the silicon wafer, if the infrared photoelectric sensor does not sense that there is a silicon wafer passing below, a group of control signals are generated, and the external control component 10 controls the rotation servo motor 220 to rotate according to the group of control signals to make the brush 210 rotate inward. At this time, the linear velocity direction of the brush 210 near the transmission belt 30 is the same as the transmission movement direction of the silicon wafer. At the same time, the vacuum cleaner body 130 continues to work, and the dust carried by the brush 210 is sucked out through the dust suction vent 121. It can be understood that the rotation and suction time should be less than 1 second. When the infrared photoelectric sensor senses that a silicon wafer is passing below, a set of control signals is also generated. The external control component 10 controls the rotation servo motor 220 to stop according to the set of control signals. However, with the movement of the silicon wafer, there is a relative movement between the brush 210 and the silicon wafer, so that the dust on the surface of the silicon wafer is brushed off and attached to the bristle surface of the brush 210 through the brush 210. At this time, dust is continuously sucked inside the dust suction base 110 and the dust removal connection part 120, thereby achieving the effect of cyclic dust removal.

[0044] The silicon wafer brush dust removal device of the utility model is placed above the belt transmission mechanism for transmitting silicon wafers. The brush part is exposed and directly contacts the surface of the silicon wafer to sweep away the dust adhered to the surface of the silicon wafer. The direct contact of the brush can better collect dust particles, thereby improving the accuracy of dust removal. After the brush collects the dust particles, it rotates to the back and removes the dust particles thereon through the dust suction component to ensure the effective removal of dust and avoid secondary pollution due to incomplete removal. Then, the position of the silicon wafer is detected by the sensor, and the motion instruction is executed only when the brush is not in contact with the silicon wafer, that is, the brush rotates to the back to remove dust, and stops rotating when the brush contacts the silicon wafer, thereby realizing cyclic dust removal, which is long-lasting. And because the surface of the silicon wafer is only in contact with the non-moving brush, it is not easy to cause the silicon wafer to deviate, and at the same time, the dust removal effect can be guaranteed, which has good application prospects.

[0045] It should be noted that, in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is any such actual relationship or order between these entities or operations. Moreover, the term "include", "comprise" or any other variant is intended to cover non-exclusive inclusion, so that the article or device including a series of elements includes not only those elements, but also other elements that are not explicitly listed. In the absence of more restrictions, the elements defined by the sentence "including one..." do not exclude the existence of other identical elements in the article or device including the elements. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. The orientation or position relationship indicated by "up", "down", "left", "right", etc. is based on the orientation or position relationship shown in the drawings, which is only for the convenience of describing the utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation to the utility model.

[0046] The above contents are further detailed descriptions of the present invention in combination with specific preferred implementations, and the specific implementation of the present invention cannot be considered to be limited to these descriptions. For ordinary technicians in the technical field to which the present invention belongs, several simple deductions or substitutions can be made without departing from the concept of the present invention, which should be regarded as falling within the protection scope of the present invention.

Claims

1. A silicon wafer brush dust removal device, characterized in that: include: A dust collecting component (100), a sweeping component (200) and a sensor component (300); The dust collection assembly (100) comprises: a dust collection base (110), a dust removal connection part (120) and a dust collector body (130); The dust collection base (110) is located on the dust collection connection part (120) and is connected as a whole; a cavity is provided inside the dust collection connection part (120); an opening is provided at the bottom of the cavity, and a dust collection air outlet (121) is provided at the top; the dust collection air outlet (121) is connected to the vacuum cleaner body (130) via an air duct; The cleaning component (200) comprises: a brush (210) and a rotary servo motor (220); The brush (210) is rotatably disposed in the cavity and partially exposed from the opening; the rotary servo motor (220) is connected to and drives the brush (210) to rotate; The sensor component (300) is arranged below the dust removal connection part (120) near the opening and is used to detect the silicon chip to generate a control signal and transmit it to a connected external control component (10); The external control component (10) controls the rotation servo motor (220) according to the control signal.

2. The silicon wafer brush dust removal device according to claim 1, characterized in that: The axial length of the brush (210) is greater than or equal to the width of the silicon wafer.

3. The silicon wafer brush dust removal device according to claim 1, characterized in that: The cleaning assembly (200) further comprises: a rotating shaft (230); The brush (210) is coaxially sleeved outside the rotating shaft (230), and the rotating shaft (230) is rotatably connected to the dust removal connection part (120); the output end of the rotary servo motor (220) is connected to one end of the rotating shaft (230) to drive the rotating shaft (230) to rotate.

4. The silicon wafer brush dust removal device according to claim 1, characterized in that: The sensor assembly (300) comprises a plurality of sensors, and the plurality of sensors are arranged at intervals below the dust removal connection portion (120).

5. The silicon wafer brush dust removal device according to claim 4, characterized in that: The sensor is an infrared photoelectric sensor, and the emitting end of the infrared photoelectric sensor is arranged downward.

6. The silicon wafer brush dust removal device according to claim 1, characterized in that: After the sensor component (300) detects the silicon chip, the external control component (10) controls the rotation servo motor (220) to stop rotating according to the control signal so as to stop the brush (210) from rotating.

7. The silicon wafer brush dust removal device according to claim 3, characterized in that: The silicon wafer brush dust removal device further comprises: a connecting component (400); The connecting assembly (400) is respectively connected to the dust suction base (110), the rotating shaft (230) and the rotary servo motor (220).

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