Sample stage for focused ion beam microscope

By designing a multi-sample placement station and rotation adjustment mechanism arranged in an annular array, the problem of only one sample being placed in the sample load stage in the prior art is solved, and the continuous processing and detection of multiple samples is achieved, and efficiency and accuracy are improved.

CN222826353UActive Publication Date: 2025-05-02CENT SOUTH UNIV SCI PARK DEV CO LTD
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Patent Information

Application Number
CN202421539161.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-02
Publication Date
2025-05-02
Estimated Expiration
2034-07-02

AI Technical Summary

Technical Problem

The existing focused ion beam double beam electron microscope sample stage can only place one sample, resulting in frequent pick-up and placement when multiple samples need to be processed, which is inefficient.

Method used

A sample stage for focusing ion beam microscope is designed, and multiple sample placement stations are arranged in an annular array. By rotating and adjusting, the samples at different stations are aligned with the ion beam emission ends to achieve continuous processing and detection of multiple samples.

Benefits of technology

Continuous processing and testing of multiple samples is achieved, no frequent replacement of samples is required, efficiency is improved, and aligned with the ion beam during each processing is ensured, which avoids the impact of the ion beam on other samples and ensures the accuracy of processing and testing.

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Abstract

A rotatable shaft rod is installed above a base, the shaft rod extends vertically, a base table is fixed to the top of the shaft rod, an adjusting mechanism is arranged on the base and used for driving the shaft rod to rotate and adjust, a plurality of containing holes are formed in the base table around the axis of the base table in an annular array mode, and the containing holes are communicated with the shaft rod. A sample placing seat is slidably and detachably inserted into each accommodating hole; and a placing cavity for placing a sample is formed in the top of each sample placing seat. According to the utility model, a plurality of sample placing stations are arranged in an annular array, so that a plurality of samples can be placed at the same time, the samples on different stations are aligned with the ion beam emission end through rotation adjustment, continuous processing detection of the plurality of samples is realized, frequent replacement of the samples is not needed, and the efficiency is improved; only a single sample is aligned with the ion beam emitting end, it is guaranteed that the emitted ion beam does not affect other samples, and then the accuracy of machining detection is guaranteed.
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Description

Technical Field

[0001] The utility model relates to the technical field of electron microscope equipment, in particular to a sample carrier for a focused ion beam microscope. Background Art

[0002] Focused ion beam microscopy is an advanced electron microscopy technique that uses ion beams for sample processing and imaging. It can achieve high-resolution surface imaging, perform nano-processing of samples, obtain three-dimensional structural information of samples, and perform real-time observation and adjustment during the processing. This technology has broad application prospects in nanotechnology, material research and the semiconductor industry.

[0003] The sample carrier of the existing focused ion beam dual beam electron microscope has only one position for placing the sample, and can only place one sample at a time. When multiple samples need to be processed, the samples need to be frequently taken and placed, which is not continuous enough and inefficient. Utility Model Content

[0004] In order to solve the above technical problems, the utility model provides a sample carrier for a focused ion beam microscope.

[0005] The utility model provides the following technical solution: a sample carrier for a focused ion beam microscope, comprising a base, a rotatable shaft rod installed above the base, the shaft rod extends vertically, and a base is fixed on the top, an adjustment mechanism is provided on the base, the adjustment mechanism is used to drive the shaft rod to rotate and adjust, a plurality of containing holes are arranged in a ring-shaped array around its axis on the base, a sample placement seat is slidably and detachably inserted in each of the containing holes, and a placement cavity for placing the sample is provided on the top of each sample placement seat.

[0006] It can be seen that by arranging multiple sample placement stations in a circular array, multiple samples can be placed at the same time, and the samples on different stations can be aligned with the ion beam emission end through rotation and adjustment, so as to realize continuous processing and detection of multiple samples, thereby eliminating the need to frequently replace samples and improving efficiency. In addition, during each processing, only a single sample is aligned with the ion beam emission end to ensure that the emitted ion beam will not affect other samples, thereby ensuring the accuracy of processing and detection.

[0007] Preferably, a vertical pole is fixed on the base, a positioning plate is fixed on the top of the pole, and a plurality of indicator plates are arranged in a ring-shaped array around its axis on the base. The positioning plates correspond to the positions of the receiving holes one by one. When the indicator plates are aligned with the positioning plates, the receiving holes corresponding to the positions of the indicator plates are aligned with the positions of the ion beam emission ends.

[0008] Preferably, the bottom of each sample placement seat is provided with a threaded hole extending vertically upward, and an adjusting screw is threadedly installed in each threaded hole in a matching manner. The bottom end of the adjusting screw extends to the bottom of the sample placement seat and is fixed with a support plate. The diameter of the support plate is larger than the diameter of the adjusting screw, and the bottom end surface of the support plate is in contact with the bottom wall of the container hole.

[0009] Preferably, the adjustment mechanism includes a mounting box, a worm and a worm wheel. The mounting box is fixed on the upper surface of the base, the bottom end of the shaft is rotatably mounted on the inner bottom wall of the mounting box, and the shaft vertically extends to the top of the mounting box, the worm is rotatably mounted in the mounting box, and one end extends to the outside of the mounting box, and the worm wheel is fixedly sleeved on the outside of the shaft and engages with the worm.

[0010] Preferably, a pinch handle is fixed to the upper end surface of each sample placement seat, and each pinch handle extends vertically to the top of the base.

[0011] Preferably, a rotary handle is fixed to the end of the worm extending to the outside of the installation box, and anti-slip grooves are provided on the outer surface of the rotary handle.

[0012] Compared with the prior art, the utility model has the following beneficial effects:

[0013] (1) The utility model arranges multiple sample placement stations in a circular array, and is capable of placing multiple samples at the same time. By rotating and adjusting, the samples on different stations are aligned with the ion beam emission end, thereby realizing continuous processing and detection of multiple samples. There is no need to frequently replace samples, thereby improving efficiency. In addition, during each processing, only a single sample is aligned with the ion beam emission end, ensuring that the emitted ion beam will not affect other samples, thereby ensuring the accuracy of processing and detection.

[0014] (2) The utility model provides an adjustment mechanism. When the adjustment mechanism is operated to rotate and adjust the shaft rod and the base, when the indicator piece at a certain position is aligned with the positioning piece, it is ensured that the container hole aligned with the position of the indicator piece is located at the processing and detection station aligned with the ion beam emission end, which can ensure that the sample at this position can receive normal processing and detection, thereby playing an auxiliary positioning effect and improving the positioning accuracy.

[0015] (3) The utility model pinches the support plate and rotates the adjusting screw to different amounts, so that the adjusting screw extends from the bottom of the sample holder to different amounts, thereby supporting the sample holder at different heights, thereby achieving height adjustment of the sample holder. By adjusting the height of each sample holder, the upper surface heights of different samples are kept consistent, thereby ensuring the consistency of processing and testing of each sample.

[0016] (4) The utility model utilizes the one-way transmission effect of the worm and the worm wheel to achieve a self-locking effect on the shaft rod. When not adjusted, the shaft rod and the base can be prevented from rotating randomly, thereby ensuring the stability during sample processing and testing. In addition, the sample placement seat is designed to be detachable, which is convenient for cleaning each sample placement seat and avoids residual impurities from affecting the processing and testing of the next batch of samples. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a three-dimensional schematic diagram of the overall structure of the utility model;

[0018] Figure 2 It is a detailed structural diagram of the adjustment mechanism in the utility model;

[0019] Figure 3 It is a schematic diagram of the local structure of the upper surface of the base in the utility model;

[0020] Figure 4 It is a schematic diagram of the cross-sectional structure of the base in the utility model. DETAILED DESCRIPTION

[0021] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0022] like Figures 1 to 4 As shown, a sample carrier for a focused ion beam microscope includes a base 1, a shaft 2, a base 3, a sample placement seat 4, a vertical rod 5, an adjustment mechanism 6, a receiving hole 7, a placement cavity 8, a threaded hole 9, an adjustment screw 10, a support plate 11, a pinch handle 12, a positioning plate 13, an indicator plate 14, a mounting box 15, a worm 16, a rotating handle 17 and a worm gear 18.

[0023] In the description of the present invention, unless otherwise specified, "multiple" means two or more; the terms "upper", "lower", "left", "right", "inner", "outer", "front end", "rear end", "head", "tail" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third" and the like are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0024] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0025] like Figures 1 to 4 As shown, a rotatable shaft 2 is installed above the base 1, the shaft 2 extends vertically, and a base 3 is fixed on the top. An adjustment mechanism 6 is provided on the base 1, and the adjustment mechanism 6 is used to drive the shaft 2 to rotate and adjust. A plurality of receiving holes 7 are arranged in a ring-shaped array around its axis on the base 3, and a sample placement seat 4 can be slidably and detachably inserted in each of the receiving holes 7, and a placement cavity 8 for placing the sample is provided on the top of each sample placement seat 4.

[0026] A vertical pole 5 is fixed vertically on the base 1, and a positioning piece 13 is fixed on the top of the vertical pole 5. A plurality of indicator pieces 14 are arranged in a ring-shaped array around the axis of the base 3. The positioning pieces 13 correspond to the positions of the receptacles 7 one by one. When the indicator pieces 14 are aligned with the positioning pieces 13, the receptacles 7 corresponding to the positions of the indicator pieces 14 are aligned with the positions of the ion beam emission ends. When the adjustment mechanism 6 is operated to rotate and adjust the shaft 2 and the base 3, when the indicator piece 14 at a certain position is aligned with the positioning piece 13, it is ensured that the receptacle 7 aligned with the position of the indicator piece 14 is located at the processing and detection station aligned with the ion beam emission end, which can ensure that the sample at this position can receive normal processing and detection, thereby playing an auxiliary positioning effect and improving the positioning accuracy.

[0027] The bottom of each sample placement seat 4 is provided with a threaded hole 9 extending vertically upward, and each threaded hole 9 is threadedly matched with an adjusting screw 10. The bottom end of the adjusting screw 10 extends to the bottom of the sample placement seat 4 and is fixed with a supporting plate 11. The diameter of the supporting plate 11 is larger than the diameter of the adjusting screw 10, and the bottom end surface of the supporting plate 11 is in conflict with the bottom wall of the containing hole 7. After the sample placement seat 4 is placed in the placement cavity 8, the bottom end of the supporting plate 11 is in conflict with the bottom wall of the containing hole 7, so that the sample placement seat 4 can be supported and raised in the containing hole 7. By pinching the supporting plate 11 and screwing the adjusting screw 10 to different amounts, the adjusting screw 10 can be extended from the bottom of the sample placement seat 4 by different amounts, so that the sample placement seat 4 can be supported at different heights, thereby realizing the height adjustment of the sample placement seat 4. By adjusting the height of each sample placement seat 4, the upper surface height of different samples can be kept consistent, thereby ensuring the consistency of processing and testing of each sample.

[0028] A pinch handle 12 is fixed to the upper end surface of each sample placement seat 4, and each pinch handle 12 extends vertically to the top of the base 3. By pinching the pinch handle 12, it is convenient to pull the sample placement seat 4 upward, and then to remove the sample placement seat 4 from the receiving hole 7. In addition, the sample placement seat 4 is designed to be detachable, which is convenient for cleaning each sample placement seat 4 to avoid residual impurities from affecting the processing and testing of the next batch of samples.

[0029] The adjusting mechanism 6 includes a mounting box 15, a worm 16 and a worm wheel 18. The mounting box 15 is fixed on the upper surface of the base 1. The bottom end of the shaft rod 2 is rotatably mounted on the inner bottom wall of the mounting box 15, and the shaft rod 2 vertically extends to the top of the mounting box 15. The worm 16 is rotatably mounted in the mounting box 15, and one end extends to the outside of the mounting box 15. The worm wheel 18 is fixedly sleeved on the outside of the shaft rod 2 and meshes with the worm 16. By screwing the worm 16, the rotating worm 16 meshes with the worm wheel 18 and drives the shaft rod 2 to rotate, thereby providing drive for the position switching of the sample. In addition, the one-way transmission effect of the worm 16 and the worm wheel 18 is utilized to self-lock the shaft rod 2. When not adjusting, the shaft rod 2 and the base 3 can be prevented from rotating at will, thereby ensuring the stability during sample processing and detection.

[0030] A handle 17 is fixed to the end of the worm 16 extending to the outside of the installation box 15. The worm 16 can be easily adjusted by pinching the handle 17. The outer surface of the handle 17 is provided with anti-slip grooves to increase the friction between the handle 17 and the hand, thereby avoiding slipping and slipping of the hand when twisting.

[0031] The working principle of the utility model is: first, each sample placement seat 4 is slid out from the receiving hole 7 respectively, and then the samples to be processed are placed in the placement cavity 8 on the sample placement seat 4 respectively, and then each sample placement seat 4 is slid back into the receiving hole 7 again, and then, the shaft rod 2 and the base 3 are driven to rotate by operating the adjustment mechanism 6, so that the first sample placement seat 4 is aligned with the ion beam emission end, and a sample is processed. After the processing is completed, the adjustment mechanism 6 is continued to be operated to drive the shaft rod 2 and the base 3 to rotate, so that the sample placement seat 4 at the next position is aligned with the ion beam emission end, and the second sample is processed, and so on, until all samples are processed.

[0032] The utility model arranges multiple sample placement stations by an annular array, and can place multiple samples at the same time. By rotating and adjusting, the samples on different stations are aligned with the ion beam emission end, so that continuous processing and detection of multiple samples can be achieved, and there is no need to frequently replace samples, thereby improving efficiency. In addition, during each processing, only a single sample is aligned with the ion beam emission end, ensuring that the emitted ion beam will not affect other samples, thereby ensuring the accuracy of processing and detection.

[0033] The above-mentioned embodiments are only preferred embodiments of the present invention and cannot be used to limit the scope of rights of the present invention. Therefore, modifications, equivalent changes, improvements, etc. made according to the scope of the patent application of the present invention are still within the scope covered by the present invention.

Claims

1. A sample carrier for a focused ion beam microscope, comprising a base (1), characterized in that: A rotatable shaft (2) is installed above the base (1), the shaft (2) extends vertically, and a base (3) is fixed on the top; an adjustment mechanism (6) is provided on the base (1), and the adjustment mechanism (6) is used to drive the shaft (2) to rotate and adjust; a plurality of receiving holes (7) are arranged in a ring-shaped array around its axis on the base (3), and a sample placement seat (4) can be slidably and detachably inserted in each of the receiving holes (7), and a placement cavity (8) for placing a sample is provided on the top of each of the sample placement seats (4).

2. A sample carrier for a focused ion beam microscope according to claim 1, characterized in that: A vertical pole (5) is fixed on the base (1), and a positioning piece (13) is fixed on the top of the vertical pole (5); a plurality of indicator pieces (14) are arranged in a ring-shaped array around the axis of the base (3), and the positioning pieces (13) correspond to the positions of the receiving holes (7) one by one; when the indicator pieces (14) are aligned with the positioning pieces (13), the receiving holes (7) corresponding to the positions of the indicator pieces (14) are aligned with the positions of the ion beam emission ends.

3. The sample carrier for a focused ion beam microscope according to claim 1, characterized in that: The bottom of each sample placement seat (4) is provided with a threaded hole (9) extending vertically upward, and an adjusting screw (10) is screwed in each threaded hole (9) in a threaded matching manner; the bottom end of the adjusting screw (10) extends to the bottom of the sample placement seat (4) and is fixed with a supporting plate (11), the diameter of the supporting plate (11) is larger than the diameter of the adjusting screw (10), and the bottom end surface of the supporting plate (11) is in contact with the bottom wall of the container hole (7).

4. The sample carrier for a focused ion beam microscope according to claim 1, characterized in that: The adjusting mechanism (6) comprises a mounting box (15), a worm (16) and a worm wheel (18); the mounting box (15) is fixed on the upper surface of the base (1); the bottom end of the shaft (2) is rotatably mounted on the inner bottom wall of the mounting box (15), and the shaft (2) vertically extends through the mounting box (15); the worm (16) is rotatably mounted in the mounting box (15), and one end extends through the mounting box (15) to the outside; the worm wheel (18) is fixedly sleeved on the outside of the shaft (2) and meshes with the worm (16) accordingly.

5. The sample carrier for a focused ion beam microscope according to claim 1, characterized in that: A gripping handle (12) is fixed to the upper end surface of each sample placement seat (4), and each gripping handle (12) extends vertically to the top of the base (3).

6. The sample carrier for a focused ion beam microscope according to claim 4, characterized in that: A rotary handle (17) is fixed to the end of the worm (16) extending to the outside of the installation box (15), and anti-slip grooves are provided on the outer surface of the rotary handle (17).