Single crystal furnace and thermal field device thereof

Abstract

The utility model relates to the technical field of single crystal furnaces, and discloses a single crystal furnace and a thermal field device thereof, which comprise a furnace body, supporting legs fixedly mounted at the bottom of the furnace body, a cover plate fixedly mounted at the top of the furnace body, and a processing component arranged on the side wall of the furnace body, the machining assembly comprises an adjusting mechanism installed on the side wall of the furnace body, the adjusting mechanism is located on the inner wall of the furnace body, an auxiliary mechanism is installed at the bottom of the inner wall of the furnace body, one end of the auxiliary mechanism is connected with one end of the adjusting mechanism, and a movable door is installed on the side wall of the furnace body through a hinge in a hinged mode. The single crystal furnace solves the problems that when an existing single crystal furnace is used, due to the fact that heat emitted by a heater is not uniform, the heat can be diffused to the two sides, the heat in the upper position and the heat in the lower position in the furnace are not uniform, and certain limitation exists when the existing single crystal furnace is used.

Description

Technical Field

[0001] The utility model relates to the technical field of single crystal furnaces, in particular to a single crystal furnace and a thermal field device thereof. Background Art

[0002] A single crystal furnace is a device that uses a graphite heater to melt polycrystalline materials such as polysilicon in an inert gas (mainly nitrogen and helium) environment, and uses the Czochralski method to grow single crystals without dislocation. The design and simulation of the thermal field of the single crystal furnace. The diameter of the single crystal during the growth process can be affected by factors such as temperature, pulling speed and rotation speed, crucible tracking speed and rotation speed, and the flow rate of the protective gas. Among them, the temperature mainly determines whether crystallization can be achieved, while the speed will directly affect the intrinsic quality of the crystal. This influence can only be known through testing after the single crystal is pulled out. A thermal field with a suitable temperature distribution will not only make the single crystal grow smoothly, but also have a high quality. If the temperature distribution of the thermal field is not very reasonable, various defects are likely to occur in the process of growing single crystals, affecting the quality. In severe cases, the phenomenon of crystal metamorphosis occurs and single crystals cannot be grown. Therefore, in the early stage of investing in a single crystal growth enterprise, it is necessary to configure the most reasonable thermal field according to the growth equipment to ensure the quality of the single crystals produced. Therefore, a single crystal furnace and its thermal field device are needed;

[0003] When the existing single crystal furnace is in use, the heater emits heat unevenly, causing the heat to diffuse to both sides, resulting in uneven heat in the upper and lower positions of the furnace, resulting in certain limitations when the existing single crystal furnace is in use. Utility Model Content

[0004] The purpose of the utility model is to provide a single crystal furnace and a thermal field device thereof, so as to achieve the purpose of solving the problems raised in the above-mentioned background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a single crystal furnace and a thermal field device thereof, comprising a furnace body,

[0006] Support legs fixedly mounted on the bottom of the furnace body;

[0007] A cover plate fixedly mounted on the top of the furnace body;

[0008] and a processing assembly disposed on the side wall of the furnace body;

[0009] The processing assembly includes an adjustment mechanism installed at the side wall of the furnace body, and the adjustment mechanism is located at the inner wall of the furnace body;

[0010] An auxiliary mechanism is installed at the bottom of the inner wall of the furnace body, and one end of the auxiliary mechanism is connected to one end of the regulating mechanism.

[0011] Preferably, there are four supporting legs, the four supporting legs are equal in shape and size, and the four supporting legs are fixedly installed at the four corners of the bottom of the furnace body respectively. The position of the entire device can be supported by the supporting legs at the bottom of the device.

[0012] Preferably, a movable door is hingedly mounted on the side wall of the furnace body via a hinge, and a handle is fixedly mounted on the side wall of the movable door, so that an operator can open the movable door easily via the handle.

[0013] Preferably, the auxiliary mechanism includes a support block, which is fixedly mounted on the bottom of the inner wall of the furnace body, a support plate is fixedly mounted on the top of the support block, a cooler is fixedly mounted on the bottom of the support plate, a base is fixedly mounted on the side wall of the support plate, a heater is fixedly mounted on the top of the base, and a crucible is fixedly mounted on the top of the support plate.

[0014] Preferably, there are two heaters, the two heaters are equal in shape and size, and the two heaters are respectively located on the left and right sides of the crucible.

[0015] Preferably, the adjustment mechanism includes a base plate, which is fixedly mounted on the side wall of the support plate, a threaded rod is rotatably mounted on the top of the base plate through a bearing, an adjustment block is mounted on the side wall of the threaded rod, an upper arc plate is fixedly mounted on the side wall of the adjustment block, a sleeve block is fixedly mounted on the side wall of the upper arc plate, a column is slidably mounted on the inner wall of the sleeve block, a stabilizing plate is fixedly mounted on the bottom of the column, and the side wall of the stabilizing plate is fixedly connected to the side wall of the support plate.

[0016] Preferably, the inner wall of the adjustment block is threadedly connected to the side wall of the threaded rod, there are two columns, and the two columns are symmetrically arranged relative to the middle surface of the support plate in the left and right directions. When the position of the threaded rod is rotated, the position of the adjustment block can be driven to move.

[0017] In another aspect of the present invention, a single crystal furnace is provided, comprising: the above-mentioned thermal field device.

[0018] The utility model provides a single crystal furnace and a thermal field device thereof, which have the following beneficial effects:

[0019] (1) The utility model allows an operator to rotate the position of the threaded rod. When the threaded rod rotates, since the side wall of the threaded rod is threadedly connected to the inner wall of the adjusting block, the threaded rod can drive the adjusting block to move when it rotates, causing the upper arc plate to move downward. Then, air flows to the inner wall of the furnace body through the circular holes on the inner wall of the cover plate, causing the temperature of the inner wall of the furnace body to rise more evenly. This solves the problem that when the existing single crystal furnace is in use, the heater emits heat unevenly, causing the heat to diffuse to both sides, thereby causing uneven heat in the upper and lower positions of the furnace, resulting in certain limitations in the use of the existing single crystal furnace.

[0020] (2) When the operator uses the device of the utility model, the device is first supported by the support legs at the bottom of the device, and then the heater can be directly turned on. The heater can increase the temperature inside the furnace, making it easier for the operator to use the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is a schematic diagram of the appearance structure of the utility model;

[0022] Figure 2 This is a schematic diagram of the cross-sectional structure of the utility model;

[0023] Figure 3 It is a structural schematic diagram of the adjustment mechanism of the utility model;

[0024] Figure 4 For this utility model Figure 2 A partial enlarged view of middle A;

[0025] Figure 5 It is a front sectional schematic diagram of the utility model.

[0026] In the figure: 1. furnace body; 2. supporting legs; 3. movable door; 4. processing assembly; 41. adjusting mechanism; 411. upper arc plate; 412. column; 413. socket block; 414. stabilizing plate; 415. bottom plate; 416. threaded rod; 417. adjusting block; 42. auxiliary mechanism; 421. supporting block; 422. cooler; 423. supporting plate; 424. crucible; 425. heater; 427. base; 5. handle; 6. cover plate. DETAILED DESCRIPTION

[0027] In order to have a clearer understanding of the technical features, purposes and effects of the utility model, the specific implementation methods of the utility model are now described with reference to the accompanying drawings.

[0028] Example 1

[0029] The preferred embodiment of the single crystal furnace and the thermal field device provided by the utility model is as follows Figures 1 to 5 As shown: A single crystal furnace and its thermal field device, including a furnace body 1, a movable door 3 is hingedly installed on the side wall of the furnace body 1 through a hinge, and a handle 5 is fixedly installed on the side wall of the movable door 3, and the handle 5 is convenient for an operator to open the position of the movable door 3.

[0030] The support legs 2 are fixedly mounted on the bottom of the furnace body 1. There are four support legs 2. The four support legs 2 are of equal shape and size. The four support legs 2 are respectively fixedly mounted at the four corners of the bottom of the furnace body 1. The support legs 2 at the bottom of the device can support the position of the entire device.

[0031] A cover plate 6 fixedly mounted on the top of the furnace body 1;

[0032] and a processing assembly 4 disposed on the side wall of the furnace body 1;

[0033] The processing assembly 4 includes an adjusting mechanism 41 installed on the side wall of the furnace body 1. The adjusting mechanism 41 is located on the inner wall of the furnace body 1. The adjusting mechanism 41 includes a bottom plate 415. The bottom plate 415 is fixedly installed on the side wall of the support plate 423. A threaded rod 416 is rotatably installed on the top of the bottom plate 415 through a bearing. An adjusting block 417 is installed on the side wall of the threaded rod 416. An upper arc plate 411 is fixedly installed on the side wall of the adjusting block 417. A socket block 413 is fixedly installed on the side wall of the upper arc plate 411. A column 412 is slidably installed on the inner wall of the socket block 413. A stabilizing plate 414 is fixedly installed on the bottom of the column 412. The side wall of the stabilizing plate 414 is fixedly connected to the side wall of the support plate 423.

[0034] In this embodiment, the inner wall of the adjustment block 417 is threadedly connected to the side wall of the threaded rod 416. There are two columns 412, and the two columns 412 are symmetrically arranged relative to the middle surface of the support plate 423 in the left and right directions. When the position of the threaded rod 416 is rotated, the position of the adjustment block 417 can be driven to move.

[0035] In the specific implementation process, the operator can put materials into the crucible 424, and then directly rotate the position of the threaded rod 416. When the threaded rod 416 rotates, since the side wall of the threaded rod 416 is threadedly connected with the inner wall of the adjusting block 417, the threaded rod 416 can drive the adjusting block 417 to move when it rotates, so as to move the upper arc plate 411 downward, and then the air flows to the inner wall of the furnace body 1 through the circular hole on the inner wall of the cover plate 6. Due to the setting of the upper arc plate 411, the internal air can be adjusted according to the instructions attached. Figure 5 The liquid flows in the direction of the middle arrow, causing the temperature of the inner wall of the furnace body 1 to rise more evenly.

[0036] Example 2

[0037] On the basis of Example 1, a preferred embodiment of a single crystal furnace and a thermal field device thereof provided by the present invention is as follows: Figures 1 to 5 As shown: an auxiliary mechanism 42 is installed at the bottom of the inner wall of the furnace body 1, one end of the auxiliary mechanism 42 is connected to one end of the adjustment mechanism 41, the auxiliary mechanism 42 includes a support block 421, the support block 421 is fixedly installed at the bottom of the inner wall of the furnace body 1, a support plate 423 is fixedly installed on the top of the support block 421, a cooler 422 is fixedly installed on the bottom of the support plate 423, a base 427 is fixedly installed on the side wall of the support plate 423, a heater 425 is fixedly installed on the top of the base 427, and a crucible 424 is fixedly installed on the top of the support plate 423.

[0038] In this embodiment, there are two heaters 425 . The two heaters 425 are equal in shape and size. The two heaters 425 are respectively located at the left and right sides of the crucible 424 .

[0039] During the specific implementation process, when the operator uses the device, he first supports the position of the device through the support legs 2 at the bottom of the device, and then directly turns on the heater 425, which can increase the temperature inside the furnace body 1.

[0040] In another aspect of the present invention, a single crystal furnace is provided, comprising: the above-mentioned thermal field device.

[0041] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A thermal field device, comprising a furnace body (1), A support leg (2) fixedly mounted on the bottom of the furnace body (1); A cover plate (6) fixedly mounted on the top of the furnace body (1); and a processing assembly (4) arranged on the side wall of the furnace body (1); characterized in that: The processing assembly (4) comprises an adjustment mechanism (41) installed on the side wall of the furnace body (1), and the adjustment mechanism (41) is located on the inner wall of the furnace body (1); An auxiliary mechanism (42) is installed at the bottom of the inner wall of the furnace body (1), and one end of the auxiliary mechanism (42) is connected to one end of the adjustment mechanism (41).

2. A thermal field device according to claim 1, characterized in that: There are four supporting legs (2), the four supporting legs (2) are of equal shape and size, and the four supporting legs (2) are respectively fixedly mounted at the four corners of the bottom of the furnace body (1).

3. A thermal field device according to claim 1, characterized in that: A movable door (3) is hingedly mounted on the side wall of the furnace body (1) via a hinge, and a handle (5) is fixedly mounted on the side wall of the movable door (3).

4. A thermal field device according to claim 1, characterized in that: The auxiliary mechanism (42) comprises a support block (421), wherein the support block (421) is fixedly mounted on the bottom of the inner wall of the furnace body (1), a support plate (423) is fixedly mounted on the top of the support block (421), a cooler (422) is fixedly mounted on the bottom of the support plate (423), a base (427) is fixedly mounted on the side wall of the support plate (423), a heater (425) is fixedly mounted on the top of the base (427), and a crucible (424) is fixedly mounted on the top of the support plate (423).

5. A thermal field device according to claim 4, characterized in that: There are two heaters (425), the two heaters (425) are equal in shape and size, and the two heaters (425) are respectively located on the left and right sides of the crucible (424).

6. A thermal field device according to claim 1, characterized in that: The adjustment mechanism (41) comprises a bottom plate (415), the bottom plate (415) is fixedly mounted on the side wall of the support plate (423), a threaded rod (416) is rotatably mounted on the top of the bottom plate (415) through a bearing, an adjustment block (417) is mounted on the side wall of the threaded rod (416), an upper arc plate (411) is fixedly mounted on the side wall of the adjustment block (417), a sleeve block (413) is fixedly mounted on the side wall of the upper arc plate (411), a column (412) is slidably mounted on the inner wall of the sleeve block (413), a stabilizing plate (414) is fixedly mounted on the bottom of the column (412), and the side wall of the stabilizing plate (414) is fixedly connected to the side wall of the support plate (423).

7. A thermal field device according to claim 6, characterized in that: The inner wall of the adjustment block (417) is threadedly connected to the side wall of the threaded rod (416). There are two upright posts (412), and the two upright posts (412) are symmetrically arranged relative to the middle surface of the support plate (423) in the left-right direction.

8. A single crystal furnace, characterized in that: include: A thermal field device as claimed in any one of claims 1 to 7.

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