IR film pasting structure
By performing a 4-segment cutting design on the ITO high-retaining film, the problem of dirt on the back of the ITO when applying the IR film is solved, and the effect of protecting the back ITO film surface is achieved, saving labor labor hours.
Patent Information
- Application Number
- CN202421262994.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-04
- Publication Date
- 2025-05-09
- Estimated Expiration
- 2034-06-04
AI Technical Summary
When applying IR film, the entire surface of the high-retaining film on the back of the ITO is tear up, causing the back to be easily dirty, affecting the appearance, and it needs to be wiped again, wasting labor and labor.
A IR film patching structure is designed. By cutting the ITO high-retaining film in four sections, the IR film area is removed before applying the IR film, and the ITO film high-retaining film outside the IR film area is retained to protect the back ITO film surface from dirt.
It effectively avoids dirt on the back of the ITO during the IR film application process, reduces the need for rewiping, and saves labor labor.
Smart Images
Figure CN222844960U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of IR film pasting, in particular to an IR film pasting structure. Background Art
[0002] The high-security film that comes with the ITO film is designed to be divided into two sections for separate tearing, and the high-security film in the IR film area is cut separately. The high-security film in the IR film area is removed before applying the IR film, and the high-security film of the ITO film outside the IR film area is retained to protect the dirt on the back ITO film surface. Before shipment, the ITO high-security film is torn off and the shipping protective film is replaced. The high-security film structure design requires the entire surface of the high-security film to be torn off before applying the IR film. When applying the IR film, because the entire surface of the high-security film is torn off, the back of the ITO is easily dirty and affects the appearance, and needs to be wiped again, wasting manpower and working hours.
[0003] In view of the above problems, it is necessary to design an IR film application structure to overcome the above problems. Utility Model Content
[0004] The main purpose of the utility model is to provide an IR film application structure, which can effectively solve the problems in the background technology.
[0005] In order to achieve the above purpose, the technical solution adopted by the utility model is:
[0006] An IR film pasting structure comprises an IR film, one side of the IR film is provided with a front protection film, one end of the IR film is provided with a red tear handle, one side of the IR film is provided with an ITO high-protection film, and alignment lines and ITO high-protection film cutting lines are provided between the IR film and the ITO high-protection film.
[0007] As a preferred solution of the utility model, the IR film is detachably connected to the red tear handle, the surface of the IR film is provided with a detachable high-preservation film, the back of the IR film is provided with an ITO film, and the ITO high-preservation film and the IR film are detachable.
[0008] As a preferred solution of the utility model, the ITO high-protection film is an n-type semiconductor material.
[0009] Beneficial Effects
[0010] Compared with the prior art, the utility model has the following beneficial effects:
[0011] 1. The IR film pasting structure is designed to cut the ITO high-protection film into 4 sections. Before pasting the IR film 1, the high-protection film in the IR film area is removed first, and the high-protection film of the ITO film outside the IR film 1 area is retained to protect the dirty design of the back ITO film surface. BRIEF DESCRIPTION OF THE DRAWINGS
[0012] Figure 1 It is a schematic front view of the utility model;
[0013] Figure 2 It is a side view schematic diagram of the utility model;
[0014] Figure 3 It is a schematic diagram of a back view of the utility model.
[0015] In the picture: 1. IR film; 2. Front protective film; 3. Shipping protective film; 4. ITO high-protection film; 5. Red tear finger; 6. Alignment line; 7. ITO high-protection film cutting line. DETAILED DESCRIPTION
[0016] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further described below in conjunction with specific implementation methods.
[0017] like Figure 1-3 As shown, an IR film application structure includes an IR film 1, a front protective film 2 is provided on one side of the IR film 1, a red tear handle 5 is provided at one end of the IR film 1, an ITO high-protection film 4 is provided on one side of the IR film 1, and an alignment line 6 and an ITO high-protection film cutting line 7 are provided between the IR film 1 and the ITO high-protection film 4.
[0018] As a preferred solution of the utility model, the IR film 1 and the red tear handle 5 are detachably connected, the surface of the IR film 1 is provided with a detachable high-preservation film, the back of the IR film 1 is provided with an ITO film, and the ITO high-preservation film 4 and the IR film 1 are detachable.
[0019] As a preferred solution of the present invention, the ITO high-protection film 4 is an n-type semiconductor material, and the material of the front protection film 2 can be PP, PVC, PET, or AR.
[0020] It should be noted that the utility model is an IR film pasting structure. When in use, the ITO high-protection film 4 is cut in sections. The high-protection film in the IR film area is removed before pasting the IR film 1. The high-protection film of the ITO film outside the IR film 1 area is retained to protect the dirty design of the back ITO film surface. Before shipment, the ITO high-protection film 4 is torn off and the shipping protection film 3 is replaced. The alignment line 6 and the ITO high-protection film cutting line 7 both provide convenience for the removal of the high-protection film in the IR film area and the ITO high-protection film 4. The front protection film 2 protects the front of the IR film 1.
[0021] The above shows and describes the basic principle and main features of the utility model and the advantages of the utility model. Those skilled in the art should understand that the utility model is not limited by the above embodiments. The above embodiments and descriptions are only for explaining the principle of the utility model. Without departing from the spirit and scope of the utility model, the utility model may have various changes and improvements, which fall within the scope of the utility model to be protected. The scope of protection of the utility model is defined by the attached claims and their equivalents.
Claims
1. An IR film application structure, comprising an IR film (1), characterized in that: A front protective film (2) is provided on one side of the IR film (1), a red tear handle (5) is provided on one end of the IR film (1), an ITO high-protection film (4) is provided on one side of the IR film (1), and an alignment line (6) and an ITO high-protection film cutting line (7) are provided between the IR film (1) and the ITO high-protection film (4).
2. The IR film application structure according to claim 1, characterized in that: The IR film (1) and the red tear handle (5) are detachably connected, a high-preservation film is disposed on the surface of the IR film (1) and is detachable, an ITO film is disposed behind the IR film (1), and the ITO high-preservation film (4) and the IR film (1) are detachable.
3. The IR film application structure according to claim 1, characterized in that: The ITO high-protection film (4) is an n-type semiconductor material.