Reaction gas distribution optimization device for CVD (Chemical Vapor Deposition) process cavity

Abstract

The utility model discloses a CVD (chemical vapor deposition) process cavity reaction gas distribution optimizing device, which relates to the technical field of gas distribution and comprises a shunting component, one end of the shunting component is connected with a flow equalizing component, one end of the flow equalizing component far away from the shunting component is connected with an outer ring flow guide pipe, and gas flow is divided into two parts by a shunting plate. At the moment, the inner-ring air inlet pipe and the outer-ring air inlet pipe can play a role in pushing the fans, so that if the thrust generated by the outer-ring air inlet pipe and the thrust generated by the inner-ring air inlet pipe is larger than the friction coefficient of a first gear, an annular rack and a second gear, the airflow can drive the fan in the first air outlet assembly and the fan in the second air outlet assembly to rotate; therefore, airflow can uniformly pass through the inner ring opening and the outer ring opening, the density of the airflow at the inner ring opening and the density of the airflow at the outer ring opening are identical, the intensity of the airflow at the inner ring opening and the intensity of the airflow at the outer ring opening are kept equal, the airflow is uniformly distributed on the surface of the semiconductor CVD, and the film forming effect of the semiconductor CVD is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of gas distribution, and more specifically to a CVD process chamber reaction gas distribution optimization device. Background Art

[0002] In the semiconductor CVD process chamber, the reaction gas enters from the center of the chamber top cover, passes through two layers of gas distribution plates and then enters the chamber to participate in the reaction. The uniformity of film formation is strongly related to the flow field distribution of the reaction gas.

[0003] The existing gas distribution optimization device disperses the gas in two stages. The first stage uses a splitter plate to distribute the airflow to be sparse in the middle and dense on both sides. The second stage uses inner and outer circle flow guide pipes to transport the airflow to the inner circle opening and the outer circle opening. However, during the airflow transportation process, it is impossible to ensure that the gas is evenly distributed in the inner and outer flow guide pipes, resulting in different airflow densities at the inner and outer circle openings, which in turn causes the inner and outer circle openings to have one strong airflow and the other weak airflow, ultimately affecting the efficiency of semiconductor CVD film formation. Utility Model Content

[0004] The purpose of the utility model is to provide a CVD process chamber reaction gas distribution optimization device to solve the problems raised in the above-mentioned background technology: the existing gas distribution optimization device disperses the gas in two stages, the first stage uses a splitter plate to distribute the gas flow to be sparse in the middle and dense on both sides, and the second stage uses inner and outer circle guide tubes to transport the gas flow to the inner circle mouth and the outer circle mouth, but in the process of gas flow transportation, it is impossible to ensure that the gas is evenly distributed in the inner and outer guide tubes, resulting in different gas flow densities at the inner and outer circle mouths, and then causing the inner and outer circle mouths to present a phenomenon of strong gas flow and weak gas flow, which ultimately affects the efficiency of semiconductor CVD film formation.

[0005] A CVD process chamber reaction gas distribution optimization device includes a flow diversion component, one end of the flow diversion component is connected to a flow equalizing component, the end of the flow equalizing component away from the flow diversion component is connected to an outer ring flow guide tube, and the other end of the flow equalizing component away from the flow diversion component is connected to an inner ring flow guide tube, and the end of the inner ring flow guide tube away from the flow equalizing component is connected to a gas disk assembly.

[0006] Preferably, the diverter assembly includes a diverter plate connected to the middle portion of the air inlet, one end of the diverter plate is connected to an outer ring air inlet pipe, and the other end of the diverter plate is connected to an inner ring air inlet pipe, and the diverter plate divides the air inlet into two air inlet cavities evenly.

[0007] Preferably, the flow equalizing component includes a first air outlet component, the upper end of the first air outlet component is connected to a first gear, the outer surface of the first gear is connected to an annular rack, the end of the annular rack away from the first gear is sleeved with a second gear, the lower end of the second gear is connected to a second air outlet component, and the first gear is rotatably connected to the second gear through the annular rack.

[0008] Preferably, the first air outlet component includes a circular frame, a semi-arc air inlet is opened at one end of the circular frame close to the diversion component, and the inner cavity of the circular frame is connected to a fan, and the central axis of the fan is connected to a circular rotating rod.

[0009] Preferably, the components of the second air outlet assembly are the same as those of the first air outlet assembly, the circular rotating rod in the first air outlet assembly is connected to the first gear, the circular rotating rod in the second air outlet assembly is connected to the second gear, and the circular rotating rod is connected to the first gear by passing through the circular frame, and the first gear is rotatably connected to the fan through the circular rotating rod, and at the same time, the circular rotating rod in the second air outlet assembly is connected to the second gear by passing through the circular frame, and the second gear is rotatably connected to the fan through the circular rotating rod.

[0010] Preferably, the gas disk assembly includes a second circular cavity, the middle part of the second circular cavity is connected to an inner ring opening, the outer side of the inner ring opening is provided with an outer ring opening, and the inner ring opening is connected to the inner ring flow guide pipe, and the outer ring opening is connected to the outer ring flow guide pipe.

[0011] Compared with the prior art, the advantages of the present invention are:

[0012] 1) In the utility model, the airflow is divided into two parts by a splitter plate. At this time, the inner and outer ring air inlet pipes will play a driving role on the fan. In this way, if the thrust generated by the outer ring air inlet pipe and the inner ring air inlet pipe is greater than the friction coefficient of the first gear, the annular rack and the second gear, the airflow will drive the fan in the first air outlet component and the fan in the second air outlet component to rotate, so that the airflow can pass through the inner and outer ring openings evenly, and then make the airflow density of the inner and outer ring openings the same, and then keep the airflow intensity of the inner and outer ring openings equal, and let the airflow be evenly distributed on the semiconductor CVD surface, thereby improving the semiconductor CVD film forming effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0014] Figure 2 This is a schematic diagram of the structure of the flow diversion component of the utility model;

[0015] Figure 3 This is a schematic diagram of the structure of the current balancing component of the utility model;

[0016] Figure 4 This is a schematic diagram of the structure of the first air outlet component of the utility model;

[0017] Figure 5 This is a schematic diagram of the structure of the gas disc assembly of the utility model.

[0018] Explanation of the numbers in the figure: 1. diverter assembly; 101. air inlet; 102. diverter plate; 103. outer ring air inlet duct; 104. inner ring air inlet duct; 2. flow equalizing assembly; 201. first air outlet assembly; 202. first gear; 203. annular rack; 204. second gear; 205. circular frame; 206. semi-arc air inlet; 207. fan; 208. circular rotating rod; 209. second air outlet assembly; 3. outer ring guide tube; 4. inner ring guide tube; 5. air disk assembly; 501. second circular cavity; 502. inner ring opening; 503. outer ring opening. DETAILED DESCRIPTION

[0019] Example: See Figure 1 A CVD process chamber reaction gas distribution optimization device includes a flow diversion component 1, one end of the flow diversion component 1 is connected to a flow equalizing component 2, the end of the flow equalizing component 2 away from the flow diversion component 1 is connected to an outer ring guide tube 3, and the other end of the flow equalizing component 2 away from the flow diversion component 1 is connected to an inner ring guide tube 4, and the end of the inner ring guide tube 4 away from the flow equalizing component 2 is connected to a gas disk component 5.

[0020] See also Figure 2 The diverter assembly 1 includes a diverter plate 102 connected to the middle part of the air inlet 101, one end of the diverter plate 102 is connected to the outer ring air inlet pipe 103, and the other end of the diverter plate 102 is connected to the inner ring air inlet pipe 104, and the diverter plate 102 divides the air inlet 101 into two air inlet cavities.

[0021] See also Figure 3 The flow equalizing component 2 includes a first air outlet component 201, the upper end of the first air outlet component 201 is connected to a first gear 202, the outer surface of the first gear 202 is connected to an annular rack 203, the end of the annular rack 203 away from the first gear 202 is sleeved with a second gear 204, the lower end of the second gear 204 is connected to a second air outlet component 209, and the first gear 202 is rotatably connected to the second gear 204 through the annular rack 203.

[0022] See also Figure 4 The first air outlet component 201 includes a circular frame 205, and a semi-arc air inlet 206 is opened at one end of the circular frame 205 close to the diversion component 1, and the inner cavity of the circular frame 205 is connected to a fan 207, and the central axis of the fan 207 is connected to a circular rotating rod 208.

[0023] The components of the second air outlet component 209 are the same as the components of the first air outlet component 201. The circular rotating rod 208 in the first air outlet component 201 is connected to the first gear 202, and the circular rotating rod 208 in the second air outlet component 209 is connected to the second gear 204, and the circular rotating rod 208 is connected to the first gear 202 by penetrating the circular frame 205, and the first gear 202 is rotatably connected to the fan 207 through the circular rotating rod 208. At the same time, the circular rotating rod 208 in the second air outlet component 209 is connected to the second gear 204 by penetrating the circular frame 205, and the second gear 204 is rotatably connected to the fan 207 through the circular rotating rod 208.

[0024] See also Figure 5 The gas disk assembly 5 includes a second circular cavity 501, the middle part of the second circular cavity 501 is connected with an inner ring opening 502, the outer side of the inner ring opening 502 is provided with an outer ring opening 503, and the inner ring opening 502 is connected with the inner ring flow guide tube 4, and the outer ring opening 503 is connected with the outer ring flow guide tube 3.

[0025] Working principle: First, the airflow will enter the air inlet 101. When the airflow enters the inner cavity of the air inlet 101, the diverter plate 102 will divert the airflow, and then the diverted gas will be transported to the flow equalizing component 2 through the outer ring air inlet pipe 103 and the inner ring air inlet pipe 104. At this time, the airflow in the outer ring air inlet pipe 103 will generate a thrust for the fan 207 in the second air outlet component 209, and at the same time, the airflow in the inner ring air inlet pipe 104 will generate a thrust for the fan 207 in the first air outlet component 201. If the thrust generated by the outer ring air inlet pipe 103 and the inner ring air inlet pipe 104 is less than the friction coefficient of the first gear 202, the annular rack 203 and the second gear 204, the air in the first air outlet component 201 will generate a thrust. The fan 207 and the fan 207 in the second air outlet component 209 will not rotate. If the thrust generated by the outer ring air inlet pipe 103 and the inner ring air inlet pipe 104 is greater than the friction coefficient of the first gear 202, the annular rack 203 and the second gear 204, the airflow will drive the fan 207 in the first air outlet component 201 and the fan 207 in the second air outlet component 209 to rotate, thereby allowing the airflow to be transported to the outer ring guide pipe 3 and the inner ring guide pipe 4 through the first air outlet component 201 and the second air outlet component 209, and then transport the airflow from the outer ring guide pipe 3 and the inner ring guide pipe 4 to the inner ring opening 502 and the outer ring opening 503, and finally transported to the outside through the inner ring opening 502 and the outer ring opening 503, thereby ending all operations.

[0026] The above shows and describes the basic principle, main features and advantages of the utility model. Those skilled in the art should understand that the utility model is not limited by the above embodiments. The above embodiments and descriptions are only preferred examples of the utility model and are not used to limit the utility model. Without departing from the spirit and scope of the utility model, the utility model may have various changes and improvements, which fall within the scope of the utility model to be protected. The scope of protection of the utility model is defined by the attached claims and their equivalents.

Claims

1. A CVD process chamber reaction gas distribution optimization device, comprising a flow splitter component (1), characterized in that: One end of the flow dividing component (1) is connected to a flow equalizing component (2), one end of the flow equalizing component (2) away from the flow dividing component (1) is connected to an outer ring flow guide tube (3), and the other end of the flow equalizing component (2) away from the flow dividing component (1) is connected to an inner ring flow guide tube (4), and one end of the inner ring flow guide tube (4) away from the flow equalizing component (2) is connected to a gas disk component (5).

2. The device for optimizing the distribution of reactive gases in a CVD process chamber according to claim 1, characterized in that: The flow splitter assembly (1) comprises a splitter plate (102) connected to the middle portion of an air inlet (101), one end of the splitter plate (102) is connected to an outer ring air inlet pipe (103), and the other end of the splitter plate (102) is connected to an inner ring air inlet pipe (104).

3. The CVD process chamber reaction gas distribution optimization device according to claim 2, characterized in that: The flow equalizing component (2) comprises a first air outlet component (201), the upper end of the first air outlet component (201) is connected to a first gear (202), the outer surface of the first gear (202) is connected to an annular rack (203), one end of the annular rack (203) away from the first gear (202) is sleeved with a second gear (204), and the lower end of the second gear (204) is connected to a second air outlet component (209).

4. The device for optimizing the distribution of reactive gases in a CVD process chamber according to claim 3, characterized in that: The first air outlet component (201) comprises a circular frame (205), a semi-arc-shaped air inlet (206) is provided at one end of the circular frame (205) close to the diversion component (1), and the inner cavity of the circular frame (205) is connected to a fan (207), and the central axis of the fan (207) is connected to a circular rotating rod (208).

5. The device for optimizing the distribution of reactive gases in a CVD process chamber according to claim 4, characterized in that: The components of the second air outlet component (209) are the same as the components of the first air outlet component (201); the circular rotating rod (208) in the first air outlet component (201) is connected to the first gear (202), and the circular rotating rod (208) in the second air outlet component (209) is connected to the second gear (204).

6. The device for optimizing the distribution of reactive gases in a CVD process chamber according to claim 5, characterized in that: The gas disk assembly (5) comprises a second circular cavity (501), the middle portion of the second circular cavity (501) is connected to an inner ring opening (502), and an outer ring opening (503) is provided on the outer side of the inner ring opening (502).

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