Self-cleaning device and deslagging filter

Abstract

The embodiment of the utility model provides a self-cleaning device and a deslagging filter, the self-cleaning device comprises a cleaning liquid tank, a pipeline system and a control system, the cleaning liquid tank is filled with cleaning liquid, the pipeline system is a fluid loop which starts from the cleaning liquid tank and ends in liquid conduction of the cleaning liquid tank, the cleaning liquid can flow along the pipeline system, and the control system is connected with the pipeline system. The filtering system of the slag remover is located in the fluid loop, the cleaning liquid passes through the filtering system in the process of flowing along the pipeline system so as to clean the filtering system, and the cleaned cleaning liquid returns to the cleaning liquid tank along the pipeline system. The control system is arranged on the pipeline system and can manage the flow direction and the speed of the cleaning solution in the pipeline system so as to control the time of injecting the cleaning solution into the filtering system and the time of staying in the filtering system, so that the filtering system is fully cleaned.

Description

Technical Field

[0001] The present application relates to the technical field of vehicle body painting equipment, and in particular to a self-cleaning device and a slag removal filter. Background Art

[0002] After the body frame (commonly known as the body in white) is welded, it needs to be electrophoretically treated before painting. This not only cleans away the dust and iron filings during welding, but also forms a layer of electrophoretic film on the surface of the body to improve the adhesion of subsequent paint and avoid coating defects.

[0003] After the electrophoresis treatment is completed, since there will be various debris washed from the body frame in the electrophoresis fluid, in order to avoid waste of the electrophoresis fluid, the electrophoresis fluid will be introduced into a slag removal filter for purification, and the debris will be removed from the electrophoresis fluid and then recycled. However, long-term filtration work will also cause the risk of clogging the filtration system of the slag removal filter, resulting in poor filtration effect of the electrophoresis fluid. Utility Model Content

[0004] In view of the above problems, an embodiment of the present application is proposed. The purpose of the embodiment of the present application is to provide a self-cleaning device that can self-clean the filter system of the slag removal filter to ensure a good working effect of the slag removal filter.

[0005] To achieve this purpose, the present application embodiment adopts the following technical solutions:

[0006] A self-cleaning device, comprising:

[0007] A cleaning liquid tank, containing cleaning liquid;

[0008] The pipeline system is a fluid circuit that is liquid-conducting and starts from and ends at the cleaning liquid tank, and the filter system of the deslagging filter and the overpressure relief pipeline are both located on the fluid circuit;

[0009] The control system is arranged on the pipeline system and can manage the flow direction and speed of the cleaning liquid in the pipeline system.

[0010] Preferably, the pipeline system comprises:

[0011] A cleaning liquid outlet pipeline and a post-washing tank inlet pipeline both of which are in liquid communication with the cleaning liquid tank; wherein:

[0012] The cleaning liquid outlet pipeline can output the cleaning liquid in the cleaning liquid tank;

[0013] The post-wash tank inlet pipeline can transport the cleaned post-wash liquid back to the cleaning liquid tank;

[0014] One end of the overpressure relief pipeline is in fluid communication with the clean liquid outlet pipeline, and the other end is in fluid communication with the post-wash inlet pipeline, forming a loop for cleaning the overpressure relief pipeline;

[0015] One end of the filter system is in fluid communication with the clean liquid outlet pipeline, and the other end is in fluid communication with the post-wash inlet pipeline, forming a loop for cleaning the filter system;

[0016] The control system can switch to clean the overpressure relief pipeline, clean the filter system, or clean the overpressure relief pipeline and the filter system at the same time.

[0017] Preferably, the control system comprises:

[0018] An automatic control system to control the length of time the cleaning fluid remains in the filtration system; and

[0019] The manual control system can control whether the cleaning liquid is fed, whether the cleaned liquid is returned to the tank, and whether the overpressure relief pipeline is cleaned.

[0020] Preferably, the automatic control system comprises:

[0021] A washing liquid inlet valve group is located on a path where the cleaning liquid outlet pipeline is in liquid communication with the filtering system;

[0022] A waste liquid discharge valve group is located on the path where the post-wash tank inlet pipeline is in liquid communication with the filtration system;

[0023] The control unit can control the opening or closing of the washing liquid inlet valve and the waste liquid discharge valve group.

[0024] Preferably, the waste liquid discharge valve group includes a plurality of waste liquid discharge valves, a plurality of pipelines connected to the post-washing tank inlet pipeline are arranged at intervals on the circumference of the filtration system, and each of the pipelines is provided with a waste liquid discharge valve; or

[0025] The washing liquid inlet valve group includes a plurality of washing liquid inlet valves. A plurality of pipelines connected to the clean liquid outlet pipeline are arranged at intervals on the circumference of the filtering system, and each pipeline is provided with a washing liquid inlet valve.

[0026] Preferably, the manual control system comprises:

[0027] An output valve group is arranged on the cleaning liquid outlet pipeline and is located at the cleaning liquid tank;

[0028] An input valve group is arranged on the post-washing tank inlet pipeline and is located at the cleaning liquid tank;

[0029] a liquid inlet valve, located on a path where the clean liquid outlet pipeline is in liquid communication with the overpressure relief pipeline;

[0030] A drain valve is located on a path where the post-wash tank inlet pipeline is in liquid communication with the overpressure drain pipeline;

[0031] A filter drain valve, located on the liquid flow path between the wash liquid inlet valve and the clean liquid outlet pipeline;

[0032] When the self-cleaning device is working, the output valve group, the input valve group, and the filter drain valve are in an open state;

[0033] The overpressure relief pipeline can be cleaned when the liquid inlet valve and the liquid discharge valve are opened.

[0034] Preferably, the cleaning liquid tank comprises

[0035] A washing tank filled with pickling solution and a clean water washing tank filled with clean water;

[0036] The washing liquid tank and the clean water washing tank are both in liquid communication with the clean liquid outlet pipeline;

[0037] The output valve group comprises:

[0038] a washing liquid valve, located on the path of the pickling liquid flowing to the cleaning liquid outlet pipeline;

[0039] A cleaning water valve, located on the path of the clean water flowing to the clean liquid outlet pipeline;

[0040] When the output valve group is opened, one of the washing liquid valve and the cleaning water valve is opened, and the other is closed;

[0041] The input valve group comprises:

[0042] a washing liquid return valve, located on the path of the pickling liquid after cleaning flowing back to the washing liquid tank; and

[0043] A cleaning water return valve, located on the path of the clean water after cleaning flowing back to the clean water tank;

[0044] The washing liquid reflux valve is opened or closed correspondingly to the washing liquid valve;

[0045] The cleaning water reflux valve is opened or closed correspondingly to the cleaning water valve.

[0046] Preferably, the washing liquid valve, the washing liquid reflux valve, the automatic control system, and the filter drain valve are all in an open state, so that the filter system can be pickled;

[0047] The cleaning water valve, the cleaning water return valve, the automatic control system, and the filter drain valve are all in an open state, so that the filter system can be washed with water;

[0048] When the filter system is acid-washed or water-washed, the liquid inlet valve and the liquid discharge valve can be in an open state, so that the overpressure discharge pipeline can be cleaned while the filter system is being cleaned;

[0049] When the washing liquid valve, the washing liquid return valve, the liquid inlet valve and the drainage valve are all in an open state, and the automatic control system and the filter drainage valve are in a closed state, the overpressure drainage pipeline can be pickled separately;

[0050] When the cleaning water valve, the cleaning water return valve, the liquid inlet valve, and the drain valve are all in an open state, and the automatic control system and the filter drain valve are in a closed state, the overpressure drain pipeline can be washed separately;

[0051] When cleaning the filtering system or the overpressure relief pipeline, first perform acid washing and then water washing.

[0052] Preferably, a water pump is provided on the cleaning liquid outlet pipeline, and the water pump is located on the path through which the cleaning liquid circulates.

[0053] Another object of an embodiment of the present application is to provide a self-cleaning deslagging filter.

[0054] To achieve this purpose, the present application embodiment adopts the following technical solutions:

[0055] A slag removal filter, comprising:

[0056] Phosphating tank, containing the electrophoresis solution to be cleaned;

[0057] A filtration loop, both ends of which are connected to the phosphating tank liquid to form a cleaning loop;

[0058] A filtration system located on the cleaning circuit;

[0059] an overpressure relief pipeline, one end of which is in fluid communication with the filtration system and the other end of which is in fluid communication with the phosphating tank, so as to reduce the pressure of the electrophoresis liquid to be cleaned in the filtration system; and

[0060] The self-cleaning device, the filtering system and the overpressure relief pipeline are all located on the cleaning circuit of the self-cleaning device, and the self-cleaning device is the self-cleaning device mentioned above.

[0061] The technical solution provided by the embodiment of the utility model is to set the filtering system of the slag remover in the piping system by providing a cleaning liquid tank filled with cleaning liquid, a piping system which is connected to the liquid in the cleaning liquid tank at the start and end, and a control system arranged on the piping system. The cleaning liquid in the cleaning tank can enter the filtering system through the piping system, and the control system can control the time of injecting the cleaning liquid into the filtering system and the time the cleaning liquid stays in the filtering system, so as to fully clean the filtering system and ensure the good working effect of the slag remover filter. BRIEF DESCRIPTION OF THE DRAWINGS

[0062] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, a brief introduction will be given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0063] Figure 1 A schematic diagram of the hydraulic structure of a slag removal filter provided in one embodiment of the present application;

[0064] Figure 2 A schematic diagram of the hydraulic structure of a self-cleaning device provided in one embodiment of the present application.

[0065] In the figure: 1. Self-cleaning device; 2. Filtration system; 3. Overpressure relief pipeline;

[0066] 10. Control system; 11. Automatic control system; 111. Washing liquid inlet valve group; 112. Waste liquid discharge valve group; 12. Manual control system; 121. Output valve group; 1211. Washing liquid valve; 1212. Washing water valve; 122. Input valve group; 1221. Washing liquid reflux valve; 1222. Washing water reflux valve; 123. Liquid inlet valve; 124. Drainage valve; 125. Filter drain valve;

[0067] 20. Pipeline system; 21. Clean the liquid outlet pipeline; 22. Wash the pipeline into the tank;

[0068] 30. Cleaning liquid tank; 31. Washing liquid tank; 32. Clean water tank;

[0069] 40. Water pump. DETAILED DESCRIPTION

[0070] The filter system in the slag filter is provided with a filter device. When the electrophoretic liquid to be cleaned is injected into the slag filter, the filter device can filter out the impurities mixed in the electrophoretic liquid. Although there is a filter residue dropping device in the filter system, most of the filtered impurities can be discharged from the filter system through the filter residue dropping device, but inevitably there will be many tiny impurities adhering to the filter device. As the number of times the electrophoretic liquid is filtered increases, more impurities adhere to the filter device, which will cause the filter system to be blocked in the long run. If the filter system is composed of multiple filter paper bags, the filter paper bags can be replaced when the number of filtrations reaches a predetermined threshold. However, this method is not only cumbersome, but also limits the pressure of the electrophoretic liquid passed into the filter device to avoid crushing the filter paper bag and affecting the filtering effect. The electrophoretic liquid referred to here includes but is not limited to phosphating liquid, zirconating liquid or thin film silane liquid, etc., as long as the liquid can be used for electrophoresis of the body in white.

[0071] Based on this, the inventor of the present application sets up the filtration system as a plurality of filter plates with filter meshes arranged in sequence. The filter meshes can be made of acid-resistant, corrosion-resistant and high-strength plastic meshes. Compared with filter paper bags, filter plates with filter meshes can effectively increase the pressure of injected electrophoretic fluid. In the process of the electrophoretic fluid passing through rows of filter plates, the filtered impurities remain between two adjacent filter plates. When the filtration is completed, the filter plates move sequentially along the length direction of the filtration system to create a drop gap between two adjacent filter plates. Impurities mixed between two adjacent filter plates can fall from the drop gap and leave the filtration system.

[0072] In view of the tiny impurity particles remaining on the filter system after the blanking is completed, the inventor tried to set a way to pass a cleaning liquid into the filter system to clean the filter system. It should be noted that the cleaning liquid can be a combination of multiple types, and the cleaning liquid is not limited to one type here. The cleaning liquid here can be a combination of two or more of an acidic cleaning liquid, an alkaline cleaning liquid, a clean water cleaning liquid, etc. Different types of cleaning liquids are sequentially passed into the filter system to achieve cleaning work on different functions of the filter system. For example, when the cleaning liquid is a combination of an acidic cleaning liquid and a clean water cleaning liquid, the acidic cleaning liquid can be first passed into the filter system, and the tiny impurity particles adhering to the filter system can not only be separated from the filter system with the flow of the acidic cleaning liquid, but the acidic cleaning liquid can also dissolve the tiny impurity particles. And controlling the length of time the acidic cleaning liquid stays in the filter system can enable the acidic cleaning liquid to fully dissolve the impurities on the filter net to achieve a good cleaning effect on the filter system. After the acidic cleaning solution is cleaned, clean water cleaning solution is introduced to prevent the acidic cleaning solution remaining in the filtration system from contaminating the electrophoresis solution that needs to be filtered, to ensure the chemical stability of the electrophoresis solution, and to ensure a good electrophoresis treatment result for the body sheet metal parts. For ease of understanding, cleaning solutions such as acidic cleaning solutions and alkaline cleaning solutions that can dissolve impurities are referred to as functional cleaning solutions.

[0073] In addition, in the process of filtering the electrophoretic liquid by the slag removal filter, in order to avoid the electrophoretic liquid entering the chamber of the slag removal filter being too high or the filtration system being highly blocked, causing the electrophoretic liquid to circulate poorly and resulting in increased pressure and leakage of the power board seal, the inventor of the present application has provided an overpressure relief pipeline between the filtration system and the electrophoretic liquid tank to perform pressure relief when the pressure in the chamber is too high, so as to ensure the normal operation of the filtration system. Due to occasional overpressure relief protection, some electrophoretic liquid will remain in the overpressure relief pipeline. When the overpressure relief pipeline is not started for a long time, the electrophoretic liquid remaining in the overpressure relief pipeline will accumulate in slag, which will cause the risk of clogging the overpressure relief pipeline in the long run. Therefore, it is very necessary to clean the overpressure relief pipeline in time after the pressure is relieved.

[0074] The inventor of this application attempts to divide the piping system into a loop for cleaning the filtration system and a loop for cleaning the overpressure relief pipeline, connect the two loops in parallel, share the pipeline for the cleaning liquid to flow out of the cleaning liquid tank and the pipeline for the cleaning liquid to flow back to the cleaning liquid tank after cleaning, and set different control valves at different places in the piping system to control the flow direction of the cleaning liquid, so as to switch between cleaning only the filtration system, cleaning only the overpressure relief pipeline, or cleaning the filtration system and the overpressure relief pipeline at the same time. This solution uses a set of self-cleaning devices to clean both the filtration system and the overpressure relief pipeline, which can make full use of the structure of the self-cleaning device and is smaller in size. In addition, the entire cleaning process is automatically operated, and no manual cleaning is required, saving time and effort.

[0075] The present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present application, rather than to limit the present application. It should also be noted that, for ease of description, only the parts related to the present application, rather than all structures, are shown in the accompanying drawings.

[0076] In the description of this application, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0077] In the present application, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0078] In the description of this embodiment, the terms "upper", "lower", "right", etc., are based on the directions or positions shown in the drawings, and are only for the convenience of description and simplification of operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as limiting the present application. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0079] like Figure 1-2 As shown, this embodiment provides a self-cleaning device 1, which includes a cleaning liquid tank 30, a pipeline system 20 and a control system 10, wherein the cleaning liquid tank 30 is filled with cleaning liquid, the pipeline system 20 is a fluid circuit of liquid conduction starting from the cleaning liquid tank 30 and ending at the cleaning liquid tank 30, the filter system 2 of the deslagging filter and the overpressure relief pipeline 3 are both located on the fluid circuit, the cleaning liquid can flow out of the cleaning liquid tank 30 from the fluid circuit, and when passing through the filter system 2 or the overpressure relief pipeline 3, the filter system 2 or the overpressure relief pipeline 3 can be cleaned, and after the cleaning is completed, the cleaning liquid flows out of the filter system 2 through the pipeline system 20 and then flows back to the cleaning liquid tank 30, thereby achieving the recycling of the cleaning liquid. The control system 10 is arranged on the pipeline system 20, and can manage the flow direction and speed of the cleaning liquid in the pipeline system 20, thereby controlling the residence time of the cleaning liquid in the filter system 2, so that the filter system 2 is fully cleaned and a good cleaning effect is guaranteed.

[0080] The self-cleaning device 1 of the embodiment of the present application can be the self-cleaning device 1 of the deslagging filter, or it can be an independent device. When the deslagging filter needs to be self-cleaned, it can be connected to the pipeline of the deslagging filter itself. As long as the cleaning liquid can enter the filter system 2 and leave the filter system 2 after cleaning, the present application does not make specific restrictions. When the self-cleaning device 1 is an independent device, the self-cleaning device 1 of the present application is not a dedicated part, and can also be connected to the liquid of other equipment that needs to clean the filter system 2 to clean the filter system 2.

[0081] It should be noted that since the self-cleaning device 1 of the present application is connected to the piping system of the slag removal filter itself, it is necessary to close the valve that controls the flow direction of the liquid in the piping system of the slag removal filter itself when cleaning the slag removal filter, and the self-cleaning device 1 can only be started when the filtration system 2 is in a non-filtering state, otherwise the cleaning liquid will contaminate the electrophoretic liquid and even cause damage to the slag removal filter.

[0082] In some embodiments of the present application, Figure 1-2 As shown, a structure that can be realized by the pipeline system 20 is that it includes a clean liquid outlet pipeline 21 and a post-wash inlet pipeline 22, and the clean liquid outlet pipeline 21 and the post-wash inlet pipeline 22 are both connected to the clean liquid tank 30. The cleaning liquid in the clean liquid tank 30 can flow out along the clean liquid outlet pipeline 21 to provide cleaning liquid for the filter system 2 or the overpressure relief pipeline 3, and can also flow into the clean liquid tank 30 along the post-wash inlet pipeline 22, so as to achieve the recycling of the cleaning liquid and avoid waste. Specifically, one end of the filter system 2 is liquid-conductive with the clean liquid outlet pipeline 21, and the other end is liquid-conductive with the post-wash inlet pipeline 22, forming a loop for cleaning the filter system 2. The cleaning liquid can come out of the clean liquid tank 30 and enter the filter system 2 along the clean liquid outlet pipeline 21. After the filter system 2 is cleaned, it comes out of the filter system 2 and enters the post-wash inlet pipeline 22, and then returns to the clean liquid tank 30 along the post-wash inlet pipeline 22. One end of the overpressure relief pipeline 3 is in liquid conduction with the clean liquid outlet pipeline 21, and the other end is in liquid conduction with the post-wash inlet tank pipeline 22, forming a loop for cleaning the overpressure relief pipeline 3. The cleaning liquid can enter the overpressure relief pipeline 3 along the clean liquid outlet pipeline 21 after coming out of the cleaning liquid tank 30, and after the overpressure relief pipeline 3 is cleaned, it can come out of the overpressure relief pipeline 3 and enter the post-wash inlet tank pipeline 22, and then return to the cleaning liquid tank 30 along the post-wash inlet tank pipeline 22. The control system 10 can switch to clean the overpressure relief pipeline 3, clean the filter system 2, or clean the overpressure relief pipeline 3 and the filter system 2 at the same time. When the overpressure relief pipeline 3 does not need to be cleaned, the loop for cleaning the overpressure relief pipeline 3 is closed. When the overpressure relief pipeline 3 needs to be cleaned, the overpressure relief pipeline 3 can be cleaned separately, or the overpressure relief pipeline 3 can be cleaned together with the filter system 2.

[0083] In some embodiments of the present application, Figure 1-2As shown, a structure that can be realized by the control system 10 is to include an automatic control system 11 and a manual control system 12, wherein the automatic control system 11 can control the length of time that the cleaning liquid stays in the filter system 2 to ensure that the filter system 2 is fully and well cleaned. The manual control system 12 can control whether the cleaning liquid is fed, whether the cleaned liquid is operated, and whether the overpressure relief pipeline 3 is cleaned. Since the overpressure relief pipeline 3 does not normally work and only works when pressure is occasionally relieved, the overpressure relief pipeline 3 needs to be cleaned after the pressure relief is completed. Therefore, under normal circumstances, the circuit for cleaning the overpressure relief pipeline 3 is closed by default, and only the filter system 2 is cleaned. When cleaning the filter system 2, it is necessary to manually control the feeding of the cleaning liquid and the return of the cleaned liquid to the tank before starting the automatic control system 11 to clean the filter system 2, which is easy to operate.

[0084] Specifically, if Figure 1-2As shown, a structure that can be realized by the automatic control system 11 is to include a washing liquid inlet valve group 111 and a waste liquid discharge valve group 112, wherein the washing liquid inlet valve group 111 is located on the path where the cleaning liquid outlet pipeline 21 is in liquid communication with the filter system 2, and can control whether the cleaning liquid is passed into the filter system 2, and control the flow rate of the cleaning liquid, so as to avoid causing the pressure of the cleaning liquid in the relevant chamber of the deslagging filter to be too high and damage the deslagging filter. The waste liquid discharge valve group 112 is located on the path where the post-washing tank pipeline 22 is in liquid communication with the filter system 2, and can control whether the cleaning liquid is discharged. The control unit can control the opening or closing of the washing liquid inlet valve group 111 and the waste liquid discharge valve group 112. The control unit can be a programmable logic controller (PLC), in which a cleaning program is stored, and is coupled to the washing liquid inlet valve group 111 and the waste liquid discharge valve group 112, and can control the opening or closing of the washing liquid inlet valve group 111 and the waste liquid discharge valve group 112. For example, when the filter system 2 needs to be cleaned, the control unit can control the cleaning liquid inlet valve group 111 and the waste liquid discharge valve group 112 to be opened, and the cleaning liquid enters the chamber where the filter system 2 is located and then flows out. In order to ensure that the filter system 2 can be fully cleaned by the cleaning liquid, the inlet of the cleaning liquid is arranged at the bottom of the chamber where the filter system 2 is located, and the outlet of the cleaning liquid is arranged at the top of the chamber where the filter system 2 is located. When the cleaning liquid enters the chamber where the filter system 2 is located, the chamber needs to be filled before it can flow out from the outlet. The control unit can control the opening time of the cleaning liquid inlet valve group 111 and the waste liquid discharge valve group 112 to be 2-3 hours. During this process, the cleaning liquid circulates continuously, and the cleaning liquid passing through the filter system 2 is flowing, which can achieve a good flushing effect on the filter system 2 and can clean up the impurities adhering to the filter system 2 in time. When cleaning the filter system 2, the control unit can also control the washing liquid inlet valve group 111 to open and the waste liquid discharge valve group 112 to close. When the cleaning liquid fills the chamber where the filter system 2 is located, the control unit controls the washing liquid inlet valve group 111 to close, so that the filter system 2 is immersed in the cleaning liquid for 2-3 hours. The control unit controls the waste liquid discharge valve group 112 to open to discharge the cleaning liquid into the cleaning liquid tank 30. During discharge, the pressure of the cleaning liquid discharge can be controlled so that the cleaning liquid can remove more impurities adhering to the filter system 2 during discharge to achieve a good cleaning effect.

[0085] In the embodiments of the present application, Figure 1-2As shown, a plurality of pipelines connected to the clean liquid outlet pipeline 21 are arranged at intervals on the circumference of the filter system 2, and a washing liquid inlet valve is provided on each pipeline. The cleaning liquid can enter the filter system 2 from multiple directions on the circumference, and leave the clean liquid outlet pipeline 21 after cleaning is completed; or, the waste liquid discharge valve group 112 includes a plurality of waste liquid discharge valves, and a plurality of pipelines connected to the post-washing tank inlet pipeline 22 are arranged at intervals on the circumference of the filter system 2, and a waste liquid discharge valve is provided on each pipeline, and the cleaning liquid can leave the plurality of liquid outlet pipelines on the circumference of the filter system 2 after cleaning is completed; or, a plurality of pipelines connected to the clean liquid outlet pipeline 21 are arranged at intervals on the circumference of the filter system 2, and a washing liquid inlet valve is provided on each pipeline. At the same time, a plurality of pipelines connected to the post-washing tank inlet pipeline 22 are arranged at intervals on the circumference of the filter system 2, and a waste liquid discharge valve is provided on each pipeline, which can not only increase the speed at which the cleaning liquid enters the filter system 2, but also increase the speed at which the cleaning liquid leaves the filter system 2 after cleaning.

[0086] like Figure 1-2 As shown, a possible structure of the manual control system 12 is, including an output valve group 121, an input valve group 122, a liquid inlet valve 123, a liquid discharge valve 124 and a filter liquid discharge valve 125. Among them, the output valve group 121 is arranged on the clean liquid outlet pipeline 21, located at the clean liquid tank 30; the input valve group 122 is arranged on the post-washing tank inlet pipeline 22, located at the clean liquid tank 30; the liquid inlet valve 123 is located on the path where the clean liquid outlet pipeline 21 is in liquid communication with the overpressure discharge pipeline 3; the liquid discharge valve 124 is located on the path where the post-washing tank inlet pipeline 22 is in liquid communication with the overpressure discharge pipeline 3; the filter liquid discharge valve 125 is located on the path where the liquid flows between the washing liquid inlet valve and the clean liquid outlet pipeline 21. When the self-cleaning device 1 is working, the output valve group 121, the input valve group 122, and the filter drain valve 125 are in an open state to ensure that the cleaning liquid can flow normally from the cleaning liquid tank 30 into the filter system 2. When the inlet valve 123 and the drain valve 124 are opened, the cleaning liquid can not only enter the filter system 2, but also enter the cleaning overpressure relief pipeline 3, and can clean the filter system 2 and the overpressure relief pipeline 3 at the same time. When the inlet valve 123 and the drain valve 124 are closed, the cleaning liquid cannot enter the overpressure relief pipeline 3, and cannot clean the overpressure relief pipeline 3. When the automatic control system 11 is closed, the inlet valve 123 and the drain valve 124 are opened, only the overpressure relief pipeline 3 can be cleaned.

[0087] Although the cleaning liquid can effectively clean the impurities adhering to the filtration system 2 or remaining in the overpressure relief pipeline 3, the cleaning liquid after cleaning can remain in the filtration system 2 and the overpressure relief pipeline 3. When the electrophoresis liquid is filtered, if the cleaning liquid is a functional cleaning liquid, the remaining cleaning liquid can contaminate the electrophoresis liquid and reduce the electrophoresis treatment effect. Figure 1-2As shown, the self-cleaning device 1 of the embodiment of the present application first performs functional washing on the filter system 2 or the overpressure relief system, and then performs clean water washing after the functional washing to clean out the functional washing liquid. Specifically, a structure that can be realized for the cleaning liquid tank 30 is to include a washing liquid tank 31 and a clean water washing tank 32, wherein the functional washing liquid is located in the washing liquid tank 31, and the clean water washing liquid is located in the clean water washing tank 32. The washing liquid tank 31 and the clean water washing tank 32 are both in liquid conduction with the clean liquid outlet pipeline 21. The output valve group 121 includes a washing liquid valve 1211 and a cleaning water valve 1212, the washing liquid valve 1211 is located on the path where the pickling liquid flows to the clean liquid outlet pipeline 21, and the cleaning water valve 1212 is located on the path where the clean water flows to the clean liquid outlet pipeline 21. The input valve group 122 includes a washing liquid reflux valve 1221 and a washing water reflux valve 1222. The washing liquid reflux valve 1221 is located on the path of the acid washing liquid after cleaning flowing back to the washing liquid tank 31. The washing liquid reflux valve 1221 and the washing liquid valve 1211 are opened or closed correspondingly. The washing water reflux valve 1222 is located on the path of the clean water after cleaning flowing back to the clean water tank. The washing water reflux valve 1222 and the washing water valve 1212 are opened or closed correspondingly. When the output valve group 121 is opened, one of the washing liquid valve 1211 and the washing water valve 1212 is opened and the other is closed, so that when cleaning the filter system 2 or the overpressure relief system, the cleaning liquid is either a functional washing liquid or a clean water washing liquid, and the two cannot be confused to ensure a good cleaning effect.

[0088] Specifically, if Figure 1-2As shown, when the washing liquid valve 1211, the washing liquid reflux valve 1221, the automatic control system 11, and the filter drain valve 125 are all in the open state, the functional washing liquid flows in the pipeline system 20, and the filter system 2 can be functionally washed. The functional washing here corresponds to the performance of the functional washing liquid. When the functional washing liquid is an acidic washing liquid, the functional washing is acid washing, and when the functional washing liquid is an alkaline washing liquid, the functional washing is alkaline washing, etc.; the cleaning water valve 1212, the cleaning water reflux valve 1222, the automatic control system 11, and the filter drain valve 125 are all in the open state, and the clean water washing liquid flows in the pipeline system 20 to clean the filter system 2; when the filter system 2 is functionally washed or water washed, the liquid inlet valve 123 and the discharge flow drain valve 124 can be in the open state, and the functional washing is carried out. The washing liquid can flow to the filtration system 2 and the overpressure relief pipeline 3 at the same time, so as to clean the overpressure relief pipeline 3 while cleaning the filtration system 2; when the washing liquid valve 1211, the washing liquid return valve 1221, the liquid inlet valve 123, and the discharge valve 124 are all in the open state, and the automatic control system 11 and the filter discharge valve 125 are in the closed state, the functional washing liquid can only pass through the overpressure relief pipeline 3, and the overpressure relief pipeline 3 can be functionally washed alone; when the cleaning water valve 1212, the cleaning water return valve 1222, the liquid inlet valve 123, and the discharge valve 124 are all in the open state, and the automatic control system 11 and the filter discharge valve 125 are in the closed state, the clean water washing liquid can only pass through the overpressure relief pipeline 3, and the overpressure relief pipeline 3 can be washed alone.

[0089] like Figure 1-2 As shown, in order to allow the cleaning liquid to enter the filtration system 2 or the overpressure relief pipeline 3 from the cleaning liquid outlet pipeline 21 with sufficient pressure, in some embodiments of the present application, the self-cleaning device 1 also includes a water pump 40, which is arranged on the cleaning liquid outlet pipeline 21 and is located on the path of the cleaning liquid circulation. The water pump 40 can increase the power of the cleaning liquid flow in the cleaning liquid tank 30.

[0090] The present application also includes a slag removal filter, such as Figure 1As shown, the deslagging filter includes a phosphating tank, a filtering circuit, a filtering system 2, an overpressure relief pipeline 3 and a self-cleaning device 1, wherein the phosphating tank is filled with electrophoretic liquid to be cleaned, and both ends of the filtering circuit are connected to the liquid of the phosphating tank to form a cleaning circuit, and the filtering system 2 is located on the cleaning circuit. One end of the overpressure relief pipeline is connected to the liquid of the filtering system 2, and the other end is connected to the liquid of the phosphating tank to reduce the pressure of the electrophoretic liquid to be cleaned in the filtering system 2. The filtering system 2 and the overpressure relief pipeline are both located on the cleaning circuit of the self-cleaning device 1, and the self-cleaning device 1 is the above-mentioned self-cleaning device 1. After the deslagging filter cleans the electrophoretic liquid, the self-cleaning device 1 can be started to clean the filtering system 2 and the overpressure relief pipeline, remove the residual impurities adhering to the filtering system 2 and the electrophoretic liquid remaining in the overpressure relief pipeline, ensure the normal operation of the filtering system 2 and the overpressure relief pipeline, and ensure good filtering function and good pressure relief function of the electrophoretic liquid.

[0091] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A self-cleaning device, characterized in that: include: A cleaning liquid tank, containing cleaning liquid; The pipeline system is a fluid circuit that is liquid-conducting and starts from and ends at the cleaning liquid tank. The filter system of the deslagging filter and the overpressure relief pipeline are both located on the fluid circuit. The control system is arranged on the pipeline system and can manage the flow direction and speed of the cleaning liquid in the pipeline system.

2. The self-cleaning device according to claim 1, characterized in that: The pipeline system comprises: A cleaning liquid outlet pipeline and a post-washing tank inlet pipeline both of which are in liquid communication with the cleaning liquid tank; wherein: The cleaning liquid outlet pipeline can output the cleaning liquid in the cleaning liquid tank; The post-wash tank inlet pipeline can transport the cleaned post-wash liquid back to the cleaning liquid tank; One end of the overpressure relief pipeline is in fluid communication with the clean liquid outlet pipeline, and the other end is in fluid communication with the post-wash inlet pipeline, forming a loop for cleaning the overpressure relief pipeline; One end of the filter system is in fluid communication with the clean liquid outlet pipeline, and the other end is in fluid communication with the post-wash inlet pipeline, forming a loop for cleaning the filter system; The control system can switch to clean the overpressure relief pipeline, clean the filter system, or clean the overpressure relief pipeline and the filter system at the same time.

3. The self-cleaning device according to claim 2, characterized in that: The control system comprises: An automatic control system to control the length of time the cleaning fluid remains in the filtration system; and The manual control system can control whether the cleaning liquid is fed, whether the cleaned liquid is returned to the tank, and whether the overpressure relief pipeline is cleaned.

4. The self-cleaning device according to claim 3, characterized in that: The automatic control system comprises: A washing liquid inlet valve group is located on a path where the cleaning liquid outlet pipeline is in liquid communication with the filtering system; A waste liquid discharge valve group is located on the path where the post-wash tank inlet pipeline is in liquid communication with the filtration system; The control unit can control the opening or closing of the washing liquid inlet valve and the waste liquid discharge valve group.

5. The self-cleaning device according to claim 4, characterized in that: The waste liquid discharge valve group includes a plurality of waste liquid discharge valves, a plurality of pipelines connected to the post-washing tank inlet pipeline are arranged at intervals on the circumference of the filtration system, and each of the pipelines is provided with a waste liquid discharge valve; or The washing liquid inlet valve group includes a plurality of washing liquid inlet valves. A plurality of pipelines connected to the clean liquid outlet pipeline are arranged at intervals on the circumference of the filtering system, and each pipeline is provided with a washing liquid inlet valve.

6. The self-cleaning device according to claim 4, characterized in that: The manual control system comprises: An output valve group is arranged on the cleaning liquid outlet pipeline and is located at the cleaning liquid tank; An input valve group is arranged on the post-washing tank inlet pipeline and is located at the cleaning liquid tank; a liquid inlet valve, located on a path where the clean liquid outlet pipeline is in liquid communication with the overpressure relief pipeline; A drain valve is located on a path where the post-wash tank inlet pipeline is in liquid communication with the overpressure drain pipeline; A filter drain valve, located on the liquid flow path between the wash liquid inlet valve and the clean liquid outlet pipeline; When the self-cleaning device is working, the output valve group, the input valve group, and the filter drain valve are in an open state; The overpressure relief pipeline can be cleaned when the liquid inlet valve and the liquid discharge valve are opened.

7. The self-cleaning device according to claim 6, characterized in that: The cleaning liquid tank includes a washing liquid tank filled with pickling liquid and a clean water washing tank filled with clean water; The washing liquid tank and the clean water washing tank are both in liquid communication with the clean liquid outlet pipeline; The output valve group comprises: a washing liquid valve, located on the path of the pickling liquid flowing to the cleaning liquid outlet pipeline; A cleaning water valve, located on the path of the clean water flowing to the clean liquid outlet pipeline; When the output valve group is opened, one of the washing liquid valve and the cleaning water valve is opened, and the other is closed; The input valve group comprises: a washing liquid return valve, located on the path of the pickling liquid after cleaning flowing back to the washing liquid tank; and A cleaning water return valve, located on the path of the clean water after cleaning flowing back to the clean water tank; The washing liquid reflux valve is opened or closed correspondingly to the washing liquid valve; The cleaning water reflux valve is opened or closed correspondingly to the cleaning water valve.

8. The self-cleaning device according to claim 7, characterized in that: The washing liquid valve, the washing liquid reflux valve, the automatic control system, and the filter drain valve are all in an open state, so that the filter system can be pickled; The cleaning water valve, the cleaning water return valve, the automatic control system, and the filter drain valve are all in an open state, so that the filter system can be washed with water; When the filter system is acid-washed or water-washed, the liquid inlet valve and the liquid discharge valve can be in an open state, so that the overpressure discharge pipeline can be cleaned while the filter system is being cleaned; When the washing liquid valve, the washing liquid return valve, the liquid inlet valve and the drainage valve are all in an open state, and the automatic control system and the filter drainage valve are in a closed state, the overpressure drainage pipeline can be pickled separately; When the cleaning water valve, the cleaning water return valve, the liquid inlet valve and the drain valve are all in an open state, and the automatic control system and the filter drain valve are in a closed state, the overpressure drain pipeline can be washed separately; When cleaning the filtering system or the overpressure relief pipeline, first perform acid washing and then water washing.

9. The self-cleaning device according to any one of claims 2 to 8, characterized in that: The cleaning liquid outlet pipeline is provided with a water pump, and the water pump is located on the path where the cleaning liquid circulates.

10. A slag removal filter, characterized in that: include: Phosphating tank, containing the electrophoresis solution to be cleaned; A filtration loop, both ends of which are connected to the phosphating tank liquid to form a cleaning loop; A filtration system located on the cleaning circuit; An overpressure relief pipeline, one end of which is in fluid communication with the filtration system and the other end of which is in fluid communication with the phosphating tank, so as to reduce the pressure of the electrophoresis liquid to be cleaned in the filtration system; as well as The self-cleaning device, the filtering system and the overpressure relief pipeline are all located on the cleaning circuit of the self-cleaning device, and the self-cleaning device is the self-cleaning device according to any one of claims 1 to 9.

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