Gas hedging mixing treatment cavity structure and gas mixing device

By designing a gas hedging and mixing chamber structure in the gas mixing device, and using multiple gas openings of the gas hedging module to achieve gas hedging and mixing, the problem of low gas mixing efficiency in the prior art is solved, and the gas mixing efficiency and thermal runaway protection performance of the battery cell module are significantly improved.

CN222867962UActive Publication Date: 2025-05-13CONTEMPORARY AMPEREX TECHNOLOGY CO LTD +1
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Patent Information

Application Number
CN202421325281.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-11
Publication Date
2025-05-13
Estimated Expiration
2034-06-11

AI Technical Summary

Technical Problem

The existing gas mixing device is not sufficiently mixed in gas hedging, resulting in poor gas mixing efficiency, and cannot effectively reduce the concentration of combustible gas in the battery cell module and prevent thermal runaway.

Method used

A gas hedging and mixing processing chamber structure is designed, including a gas mixing chamber and a gas hedging assembly. The gas hedging assembly consists of a first gas flow channel, a first gas hedging passage, a second gas flow channel and a second gas hedging passage. By setting a plurality of gas openings, hedging and mixing of the first gas and the second gas is realized.

Benefits of technology

Through the gas hedging and mixing treatment chamber structure, the gas mixing efficiency is significantly improved, so that the first gas and the second gas can be fully mixed, effectively reduce the concentration of combustible gas, and improve the thermal runaway protection performance of the battery cell module.

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Abstract

The utility model provides a gas hedging mixing treatment cavity structure and a gas mixing device, and relates to the technical field of gas mixing. The gas hedging mixing treatment cavity structure comprises a gas mixing cavity and a gas hedging assembly, the gas hedging assembly comprises a first gas flow channel, a first gas hedging passage, a second gas flow channel and a second gas hedging passage, the first gas flow channel is communicated with the first gas hedging passage, and the second gas flow channel is communicated with the second gas hedging passage; the first gas hedging passage and the second gas hedging passage are respectively provided with a plurality of gas holes; and the first gas hedging passage and the second gas hedging passage are arranged in the gas mixing cavity. The gas hedging mixing treatment cavity structure can achieve the technical effect of improving the gas mixing efficiency.
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Description

Technical Field

[0001] The present application relates to the field of gas mixing technology, and in particular to a gas counter-mixing processing chamber structure and a gas mixing device. Background Art

[0002] The thermal runaway protection performance of the battery cell module is very important. In the air medium, the parallel cells in the module can be short-circuited due to internal dendrite short-circuit, diaphragm defects and overcharging. Thermal runaway of the cells due to internal short circuits can cause the temperature of the faulty cells to rise sharply, causing the electrolyte to vaporize and the internal pressure of the cells to increase, resulting in shell rupture. The sharp rise in temperature and the impact of airflow pressure can cause discharge sparks on the positive and negative electrodes, especially the solvent contained in the electrolyte solvent inside the cell vaporizes and mixes with the air, which can cause a larger explosion and combustion when it encounters an open flame.

[0003] Generally, the concentration of combustible gas in the battery cell module can be reduced to improve the protection of the battery cell module and effectively avoid thermal runaway of the battery cell module. The existing gas mixing device sets a hollow spiral distributor at the entrance of the gas treatment chamber, through which inert gas is introduced. Small holes are opened on the spiral distributor, and the inert gas is sprayed out from the holes to mix with the combustible gas flow in the cavity to reduce the concentration of the combustible gas. However, the existing gas mixing device sprays the inert gas through the small holes, while the combustible gas still flows in the cavity in the form of mainstream gas, the counter-mixing is not sufficient, and the gas mixing efficiency is poor. Utility Model Content

[0004] The purpose of the present application is to provide a gas counter-mixing processing chamber structure and a gas mixing device, which can achieve the technical effect of improving the gas mixing efficiency.

[0005] In a first aspect, the present application provides a gas counter-mixing processing chamber structure, including a gas mixing chamber and a gas counter-mixing component;

[0006] The gas counter-pressure assembly comprises a first gas flow channel, a first gas counter-pressure passage, a second gas flow channel and a second gas counter-pressure passage, the first gas flow channel is connected to the first gas counter-pressure passage, the second gas flow channel is connected to the second gas counter-pressure passage, and the first gas counter-pressure passage and the second gas counter-pressure passage are respectively provided with a plurality of gas openings;

[0007] The first gas counter-pressure passage and the second gas counter-pressure passage are arranged inside the gas mixing chamber.

[0008] In the above implementation process, the gas counter-punch mixing processing chamber structure sets a gas counter-punch component inside the gas counter-punch component, wherein the first gas flow channel and the first gas counter-punch passage are passed with the first gas, and the second gas flow channel and the second gas counter-punch passage are passed with the second gas; the first gas is ejected from the gas opening of the first gas counter-punch passage, and the second gas is ejected from the gas opening of the second gas counter-punch passage, so that the first gas and the second gas are counter-punched and mixed, thereby improving the mixing effect and greatly improving the mixing efficiency of the two gases; thus, the gas counter-punch mixing processing chamber structure can achieve the technical effect of improving the gas mixing efficiency.

[0009] Furthermore, the first gas counter-hedging passage includes a plurality of first gas counter-hedging loops, and the plurality of first gas counter-hedging loops are respectively connected to the first gas flow channel.

[0010] In the above implementation process, the first gas counter-flow passage is arranged as a ring-shaped flow channel, and the radii of multiple first gas counter-flow loops are different and can be nested with each other, so that the internal space of the gas mixing chamber can be effectively utilized.

[0011] Furthermore, the center of the first gas counteracting loop is arranged along the axis of the gas mixing chamber.

[0012] In the above implementation process, the center of the first gas hedging loop is set on the axis of the gas mixing chamber, which is convenient for installing the first gas hedging loop inside the gas mixing chamber.

[0013] Furthermore, the second gas counter-hedge passage includes a plurality of second gas counter-hedge loops, which are respectively connected to the second gas flow channel, and the gas opening of each second gas counter-hedge loop is arranged opposite to the gas opening of one of the first gas counter-hedge loops.

[0014] In the above implementation process, the second gas counter-flow passage is arranged as a ring-shaped flow channel, and the radii of multiple second gas counter-flow loops are different and can be nested with each other, so that the internal space of the gas mixing chamber can be effectively utilized; moreover, the gas opening of each second gas counter-flow loop is arranged relative to the gas opening of one of the first gas counter-flow loops, so that the two gases can counter-collide and achieve sufficient mixing.

[0015] Furthermore, the center of the second gas counter-pressure loop is arranged along the axis of the gas mixing chamber.

[0016] In the above implementation process, the center of the second gas counter-hedge loop is set on the axis of the gas mixing chamber, which is convenient for installing the second gas counter-hedge loop inside the gas mixing chamber.

[0017] Furthermore, the plurality of first gas counteracting loops and the plurality of second gas counteracting loops are nested in sequence, and the center of the plurality of first gas counteracting loops is the same as the center of the plurality of second gas counteracting loops.

[0018] In the above implementation process, the radii of multiple first gas counter-loops and the radii of multiple second gas counter-loops are different, so they can be arranged in the order of first gas counter-loop-second gas counter-loop-first gas counter-loop..., and the radii of multiple first gas counter-loops and multiple second gas counter-loops are set on the same horizontal plane, thereby effectively saving the installation space inside the gas mixing chamber.

[0019] Furthermore, the plurality of first gas hedging loops and the plurality of second gas hedging loops are nested in sequence at equal intervals.

[0020] Furthermore, the first gas flow channel is connected to a combustible gas source, and the second gas flow channel is connected to an inert gas source.

[0021] Furthermore, the gas counter-mixing processing chamber structure also includes a gas outlet cover plate, and the gas outlet cover plate is sealed and installed at one end of the gas mixing chamber.

[0022] In the above implementation process, the gas outlet cover plate is sealed and installed with the gas mixing chamber to serve as an outlet for the mixed gas.

[0023] In a second aspect, the present application provides a gas mixing device, comprising a gas counter-mixing processing chamber structure as described in any one of the first aspects.

[0024] Other features and advantages disclosed in the present application will be described in the following description, or some features and advantages can be inferred or determined without doubt from the description, or can be learned by implementing the above-mentioned technology disclosed in the present application.

[0025] In order to make the above-mentioned objects, features and advantages of the present application more obvious and easy to understand, preferred embodiments are specifically cited below and described in detail with reference to the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments of the present application will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0027] Figure 1 An exploded isometric view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application;

[0028] Figure 2 An isometric view of a gas hedge assembly provided for an embodiment of the application;

[0029] Figure 3 An isometric view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application;

[0030] Figure 4 A front view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application;

[0031] Figure 5 A side view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application;

[0032] Figure 6 A top view of the gas counter-mixing processing chamber structure provided in an embodiment of the present application.

[0033] Figure numerals: gas mixing chamber 100; chamber sealing plate 110; gas counter-pressure assembly 200; first gas flow channel 211; first gas counter-pressure passage 212; second gas flow channel 221; second gas counter-pressure passage 222; gas outlet cover plate 300. DETAILED DESCRIPTION

[0034] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0035] In the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0036] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0037] In addition, the terms "installed", "set", "provided with", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or a point connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0038] In addition, the terms "first", "second", etc. are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not used to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise specified, "plurality" means two or more.

[0039] Generally, the protection of the battery cell module can be improved by reducing the concentration of combustible gas in the battery cell module, and the thermal runaway of the battery cell module can be effectively avoided; the existing gas mixing device sets a hollow spiral distributor at the entrance of the gas processing chamber, and introduces inert gas. There are small holes on the spiral distributor, and the inert gas is ejected from the holes and mixed with the combustible gas flow in the cavity to reduce the concentration of the combustible gas; however, the existing gas mixing device ejects the inert gas through the small holes, while the combustible gas still flows in the cavity in the form of mainstream gas, the counter-mixing is not sufficient, and the gas mixing efficiency is poor;

[0040] In order to solve the above-mentioned technical problems, the present application provides a gas counter-mixing processing chamber structure and a gas mixing device, which can be applied to thermal runaway protection of battery cell modules; see Figures 1 to 6 , Figure 1 An exploded isometric view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application. Figure 2 An isometric view of a gas hedge assembly provided for an embodiment of the application, Figure 3 An isometric view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application. Figure 4 A front view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application, Figure 5 A side view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application. Figure 6A top view of a gas counter-mixing processing chamber structure provided in an embodiment of the present application; the gas counter-mixing processing chamber structure includes a gas mixing chamber 100 and a gas counter-mixing assembly 200;

[0041] Exemplarily, the gas counter-pressure component 200 includes a first gas flow channel 211, a first gas counter-pressure passage 212, a second gas flow channel 221, and a second gas counter-pressure passage 222. The first gas flow channel 211 is connected to the first gas counter-pressure passage 212, the second gas flow channel 221 is connected to the second gas counter-pressure passage 222, and the first gas counter-pressure passage 212 and the second gas counter-pressure passage 222 are respectively provided with a plurality of gas openings.

[0042] Among them, the first gas flow channel 211 and the second gas flow channel 221 can respectively introduce different types of gases. In the embodiment of the present application, the gas introduced into the gas mixing chamber 100 through the first gas flow channel 211 is called the first gas, and the gas introduced into the gas mixing chamber 100 through the second gas flow channel 221 is called the second gas.

[0043] Optionally, each gas opening of the first gas counterpressure passage 212 is correspondingly provided with a gas opening of the second gas counterpressure passage 222 .

[0044] Exemplarily, the first gas counter-pressure passage 212 and the second gas counter-pressure passage 222 are disposed inside the gas mixing chamber 100 .

[0045] The first gas flow channel 211 is connected to the first gas counter-pressure passage 212, so that the first gas passes through the first gas flow channel 211 into the first gas counter-pressure passage 212, and then enters the gas mixing chamber 100 from the gas opening of the first gas counter-pressure passage 212;

[0046] The second gas flow channel 221 is connected to the second gas counter-flow passage 222, so that the second gas passes into the second gas counter-flow passage 222 through the second gas flow channel 221, and then enters the gas mixing chamber 100 from the gas opening of the second gas counter-flow passage 222;

[0047] Furthermore, when the first gas is ejected from the gas opening of the first gas counter-punch passage 212, it is counter-mixed with the second gas ejected from the gas opening of the second gas counter-punch passage 222, so that the first gas and the second gas are effectively mixed, greatly improving the mixing efficiency of the two gases.

[0048] Optionally, the cavity sealing plate 110 and the gas mixing cavity 100 are sealed and installed to form a sealed cavity to prevent the mixed gas from leaking from the gas mixing cavity 100 .

[0049] Optionally, the gas openings of the first gas counter-punch passage 212 and the second gas counter-punch passage 222 may have hole shapes of circular holes, strip-shaped slits, etc. It should be noted that this is only an example and not a limitation, and the specific hole shape of the gas openings may be selected according to actual needs.

[0050] In some embodiments, the gas counter-punch mixing processing chamber structure is provided with a gas counter-punch component 200 inside the gas mixing chamber 100, wherein the first gas flow channel 211 and the first gas counter-punch passage 212 are passed with the first gas, and the second gas flow channel 221 and the second gas counter-punch passage 222 are passed with the second gas; the first gas is ejected from the gas opening of the first gas counter-punch passage 212, and the second gas is ejected from the gas opening of the second gas counter-punch passage 222, so that the first gas and the second gas are counter-punched and mixed, thereby improving the mixing effect and greatly improving the mixing efficiency of the two gases; thus, the gas counter-punch mixing processing chamber structure can achieve the technical effect of improving the gas mixing efficiency.

[0051] Exemplarily, the first gas counter-pressure passage 212 includes a plurality of first gas counter-pressure loops, and the plurality of first gas counter-pressure loops are respectively connected to the first gas flow channel 211 .

[0052] Exemplarily, the first gas counter-flow passage 212 is arranged as a ring-shaped flow channel, and the radii of the multiple first gas counter-flow loops are different and can be nested with each other, so that the internal space of the gas mixing chamber can be effectively utilized.

[0053] Exemplarily, the center of the first gas counteracting loop is arranged along the axis of the gas mixing chamber 100 .

[0054] Exemplarily, the center of the first gas counter-hedge loop is set at the axis of the gas mixing chamber 100 , which facilitates the installation of the first gas counter-hedge loop inside the gas mixing chamber 100 .

[0055] Exemplarily, the second gas counter-punch passage includes a plurality of second gas counter-punch loops, which are respectively connected to the second gas flow channel, and the gas opening of each second gas counter-punch loop is arranged opposite to the gas opening of one of the first gas counter-punch loops.

[0056] Exemplarily, the second gas counter-flow passage 222 is arranged as a ring-shaped flow channel, and the radii of the multiple second gas counter-flow loops are different and can be nested with each other, so that the internal space of the gas mixing chamber can be effectively utilized; moreover, the gas opening of each second gas counter-flow loop is arranged relative to the gas opening of one of the first gas counter-flow loops, so that the two gases can counter-flow and collide to achieve sufficient mixing.

[0057] Exemplarily, the center of the second gas counter-circuit is arranged along the axis of the gas mixing chamber.

[0058] Exemplarily, the center of the second gas counter-hedge loop is set at the axis of the gas mixing chamber 100 , which facilitates the installation of the second gas counter-hedge loop inside the gas mixing chamber 100 .

[0059] Exemplarily, a plurality of first gas counteracting loops and a plurality of second gas counteracting loops are nested in sequence, and the center of the plurality of first gas counteracting loops is the same as the center of the plurality of second gas counteracting loops.

[0060] Exemplarily, the radii of multiple first gas counter-circuit loops and the radii of multiple second gas counter-circuit loops are different, so they can be arranged in the order of first gas counter-circuit - second gas counter-circuit - first gas counter-circuit..., and the radii of multiple first gas counter-circuit loops and multiple second gas counter-circuit loops are set on the same horizontal plane, thereby effectively saving the installation space inside the gas mixing chamber 100.

[0061] Exemplarily, a plurality of first gas hedging loops and a plurality of second gas hedging loops are nested in sequence at equal intervals.

[0062] Exemplarily, the first gas flow channel is connected to a combustible gas source, and the second gas flow channel is connected to an inert gas source.

[0063] Exemplarily, the gas counter-mixing processing chamber structure further includes a gas outlet cover plate 300 , and the gas outlet cover plate 300 is sealed and installed at one end of the gas mixing chamber 100 .

[0064] Exemplarily, the gas outlet cover plate 300 is sealed and installed with the gas mixing chamber 100 to serve as an outlet for the mixed gas.

[0065] Illustratively, an embodiment of the present application provides a gas mixing device, comprising: Figures 1 to 6 The gas counter-mixing processing chamber structure shown.

[0066] In some embodiments, in combination Figures 1 to 6 The gas counter-pressure mixing processing chamber structure provided in the embodiment of the present application respectively introduces the two gases into different gas counter-pressure passages by setting the first gas flow channel 211, the first gas counter-pressure passage 212, the second gas flow channel 221 and the second gas counter-pressure passage 222; thereby, the first gas is ejected from the gas opening of the first gas counter-pressure passage 212 and the second gas is ejected from the gas opening of the second gas counter-pressure passage 222, so that the first gas and the second gas can achieve gas flow counter-pressure and mixing, thereby improving the mixing effect and effectively improving the gas mixing efficiency.

[0067] In some implementation scenarios, the gas counter-mixing processing chamber structure and the gas mixing device provided in the embodiments of the present application are applied to battery thermal runaway protection; wherein, the first gas flow channel is connected to a combustible gas source, which is a combustible gas generated during normal operation or thermal runaway of the battery, such as hydrogen, etc.; the second gas flow channel is connected to an inert gas source, which is non-flammable, such as nitrogen, etc.; thereby, the combustible mixed gas generated by the thermal runaway of the battery cell is inerted, which can achieve sufficient mixing of the combustible gas and the inert gas, realize non-flammable gas production of the battery, and improve the thermal runaway protection performance of the battery.

[0068] In all the embodiments of the present application, "big" and "small" are relative, "more" and "less" are relative, and "up" and "down" are relative. The expressions of such relative terms are not elaborated in the embodiments of the present application.

[0069] It should be understood that the "in this embodiment", "in the embodiment of the present application" or "as an optional implementation" mentioned throughout the specification means that the specific features, structures or characteristics related to the embodiment are included in at least one embodiment of the present application. Therefore, "in this embodiment", "in the embodiment of the present application" or "as an optional implementation" appearing throughout the specification does not necessarily refer to the same embodiment. In addition, these specific features, structures or characteristics can be combined in one or more embodiments in any suitable manner. Those skilled in the art should also be aware that the embodiments described in the specification are all optional embodiments, and the actions and modules involved are not necessarily required for the present application.

[0070] In the various embodiments of the present application, it should be understood that the size of the serial numbers of the above-mentioned processes does not necessarily mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

[0071] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A gas hedging and mixing treatment chamber structure, characterized in that It includes a gas mixing chamber and a gas hedging component; The gas counter-pressure assembly comprises a first gas flow channel, a first gas counter-pressure passage, a second gas flow channel and a second gas counter-pressure passage, the first gas flow channel is connected to the first gas counter-pressure passage, the second gas flow channel is connected to the second gas counter-pressure passage, and the first gas counter-pressure passage and the second gas counter-pressure passage are respectively provided with a plurality of gas openings; The first gas counter-pressure passage and the second gas counter-pressure passage are arranged inside the gas mixing chamber.

2. The gas hedging and mixing chamber structure according to claim 1, characterized in that, The first gas counteracting passage includes a plurality of first gas counteracting loops, and the plurality of first gas counteracting loops are respectively connected to the first gas flow channel.

3. The gas counter-mixing processing chamber structure according to claim 2, characterized in that: The center of the first gas counteracting loop is arranged along the axis of the gas mixing chamber.

4. The gas counter-mixing processing chamber structure according to claim 2, characterized in that: The second gas counter-punch passage includes a plurality of second gas counter-punch loops, which are respectively connected to the second gas flow channel, and a gas opening of each second gas counter-punch loop is arranged opposite to a gas opening of one of the first gas counter-punch loops.

5. The gas counter-mixing processing chamber structure according to claim 4, characterized in that: The center of the second gas counteracting loop is arranged along the axis of the gas mixing chamber.

6. The gas counter-mixing processing chamber structure according to claim 4, characterized in that: The multiple first gas hedging loops and the multiple second gas hedging loops are nested in sequence, and the center of the multiple first gas hedging loops is the same as the center of the multiple second gas hedging loops.

7. The gas counter-mixing processing chamber structure according to claim 6, characterized in that: The plurality of first gas counteracting loops and the plurality of second gas counteracting loops are nested in sequence and arranged at equal intervals.

8. The gas counter-mixing processing chamber structure according to claim 1, characterized in that: The first gas flow channel is connected to a combustible gas source, and the second gas flow channel is connected to an inert gas source.

9. The gas counter-mixing processing chamber structure according to claim 1, characterized in that: The gas counter-mixing processing chamber structure further includes a gas outlet cover plate, and the gas outlet cover plate is sealed and installed at one end of the gas mixing chamber.

10. A gas mixing device, characterized in that: A gas counter-mixing processing chamber structure comprising the gas counter-mixing processing chamber structure as described in any one of claims 1 to 9.