High-uniformity pressure reaction box for thin-film device preparation process

Abstract

The utility model relates to the technical field of thin film device preparation, discloses a high-uniformity pressure reaction box for a thin film device preparation process, and solves the problem of non-uniform film formation caused by non-uniform flow of inert gas and oxygen in a thin film preparation process in the prior art. A pressure monitor and a safety valve pipe are arranged at the top end of the box body, so that the safety in a high-pressure environment is ensured; and the pressurizing pipeline is communicated with an external pressurizing pump, so that the control on the internal pressure of the box body is realized, and a uniform pressure environment is provided for the preparation of the thin film. The airflow control assembly on the air inlet pipe comprises a driving motor, a rotary drum, a dispersion disc, turbine blades and the like, flow uniformity regulation and control over inert gas and oxygen in the reaction box are achieved, and by arranging a magnetic suspension bearing and a material table rotary disc, the operation efficiency of equipment is improved, and abrasion is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of thin film device preparation, in particular to a high uniform pressure reaction box for thin film device preparation technology. Background Art

[0002] In the preparation of thin film devices, pressure reactors are usually used for film-making processes that need to be carried out under high pressure conditions. These processes may include chemical synthesis, catalysis research, material science research, and thin film deposition at specific pressures and temperatures. They are widely used in electronic device manufacturing, optical coatings, new energy fields, and functional films. The main thin film deposition technologies are physical vapor deposition (PVD), chemical vapor deposition (CVD), solution method, and atomic layer deposition (ALD). These technologies deposit thin films on solid surfaces by physical or chemical means, and are used to prepare devices such as transistors, integrated circuits (ICs), flat panel displays, optical filters, and thin film solar cells.

[0003] The materials entering the pressure reactor include but are not limited to: metal or non-metal targets for sputtering or evaporation processes; solvents and additives for adjusting the chemical composition and physical properties of the film; special catalysts for promoting specific reaction processes. In these processes, the pressure reactor provides the necessary environment to ensure uniform deposition of the film.

[0004] In view of the above-mentioned related technologies, a high uniform pressure reaction box for thin film device preparation process is now provided, which can eliminate the disadvantage that the existing device cannot uniformly control the pressure and the flow rate of inert gas and oxygen to achieve uniform deposition. Utility Model Content

[0005] The utility model aims to provide a high uniform pressure reaction box for thin film device preparation process, and the device is adopted to work, thereby solving the problem of uneven film formation caused by uneven flow of inert gas and oxygen in the existing thin film preparation process.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a high uniform pressure reaction box for thin film device preparation process, comprising a box body, a pressure monitor is provided on one side of the top of the box body, the detection end of the pressure monitor extends into the box body, a safety valve pipe is connected to the other side of the top of the box body, a booster pipe connected to an external booster pump is provided in the middle of the top of the box body, an air inlet pipe is provided in the middle of the outer wall of one side of the box body, an air guide pipe is provided at the bottom of the outer wall of the other side of the box body, a vacuum pump is connected to the air guide pipe, a circular notch is opened on the inner bottom surface of the box body, and an air flow control component is provided on the air inlet pipe;

[0007] The airflow control assembly includes a drive motor, which is fixedly mounted on the outer wall of one side of the box body, the output shaft of the drive motor passes through and the end thereof is fixedly connected to a drive gear, at least two drums are meshedly connected to the drive gear, both ends of the drums are provided with gear rings, one end of the drum is rotatably connected to the end of the intake pipe extending into the box body, a dispersion disk is meshed together on the outer wall of the gear ring at the other end of at least two drums, one end of the dispersion disk is rotatably connected to a drainage cover, and the other end is rotatably connected to a turbine blade, and the drainage cover is fixedly mounted on the inner wall of the box body near the drive motor side;

[0008] Preferably, the air inlet pipes are fixedly connected and arranged on the air guide cover and at least two of them are provided;

[0009] Preferably, a circular notch is provided on the inner bottom surface of the box body, and an axle seat is rotatably provided on the inner bottom surface of the circular notch;

[0010] Preferably, a magnetic bearing is fixedly mounted on the annular inner wall of the circular notch;

[0011] Preferably, a material table turntable is fixedly connected to the top of the shaft seat;

[0012] Preferably, guide fins are distributed circumferentially on the outer wall of the shaft seat;

[0013] Preferably, a return spring is sleeved on the shaft seat.

[0014] Compared with the prior art, the beneficial effects of the utility model are as follows:

[0015] 1. The utility model proposes a high uniform pressure reaction box for thin film device preparation process, which ensures safety when working in a high pressure environment by setting a pressure monitor and a safety valve pipe at the top of the box. At the same time, through the connection between the booster pipe and the external booster pump, the pressure inside the box is accurately controlled, thereby providing a uniform pressure environment for the preparation of thin film devices. In addition, by setting an air intake pipe and an airflow control component, including a drive motor, a drum, a dispersion disk and a turbine blade, the flow of inert gas and oxygen inside the reaction box is regulated, further enhancing the uniformity of the thin film preparation process.

[0016] 2. The utility model proposes a high uniform pressure reaction box for thin film device preparation process. By setting an air inlet pipe in the middle of the outer wall of one side of the box body and providing an air flow control component on the air inlet pipe, the flow of inert gas and oxygen inside the reaction box is effectively controlled, thereby improving the uniformity of thin film deposition. In particular, through the design of the drum and the dispersion plate, the inert gas and oxygen can be evenly dispersed to various parts of the reaction box, thereby ensuring the quality and performance of the film. In addition, by setting up magnetic suspension bearings and a material table turntable, not only the operating efficiency of the equipment is improved, but also the wear caused by friction is reduced, thereby extending the service life of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0018] Figure 2 It is a schematic diagram of the internal structure of the utility model;

[0019] Figure 3 This is a schematic diagram of the structure of the airflow control component of the utility model;

[0020] Figure 4 This is a schematic diagram of the turbine blade position structure of the utility model;

[0021] Figure 5 This is a structural schematic diagram of the material table turntable of the utility model;

[0022] Figure 6 It is a schematic diagram of the cross-sectional structure of the axle seat of the utility model.

[0023] In the figure: 1. Box body; 10. Circular notch; 11. Pressurization pipe; 12. Intake pipe; 13. Air guide pipe; 2. Pressure monitor; 3. Vacuum pump; 4. Safety valve pipe; 5. Air flow control assembly; 51. Drive motor; 52. Drive gear; 53. Drum; 54. Dispersion disk; 55. Drainage cover; 56. Turbine blade; 6. Shaft seat; 61. Material table turntable; 62. Guide fin; 63. Magnetic bearing; 64. Return spring. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0025] In order to further understand the content of the utility model, the utility model is described in detail in conjunction with the accompanying drawings.

[0026] Combination Figure 1-Figure 6, a high uniform pressure reaction box for thin film device preparation process, comprising a box body 1, a pressure monitor 2 is provided on one side of the top of the box body 1, the detection end of the pressure monitor 2 extends into the box body 1, a safety valve pipe 4 is connected to the other side of the top of the box body 1, a boosting pipe 11 connected to an external boosting pump is provided in the middle of the top of the box body 1, an air inlet pipe 12 is provided in the middle of the outer wall of one side of the box body 1, the air inlet pipe 12 is fixedly connected and arranged on the drainage cover 55 and at least two are provided, this design can ensure the inert gas introduced, the inert gas can be nitrogen or argon, can enter the inside of the box body 1 evenly with oxygen, improve the uniformity of the distribution of the inert gas and oxygen in the reaction box, so that the preparation process of the thin film device is more uniform and controllable; an air guide pipe 13 is provided at the bottom of the outer wall on the other side of the box body 1, and a vacuum pump 3 is connected to the air guide pipe 13, a circular notch 10 is opened on the inner bottom surface of the box body 1, and an air flow control component 5 is provided on the air inlet pipe 12;

[0027] The airflow control component 5 includes a drive motor 51, which is fixedly mounted on the outer wall of one side of the casing 1. The output shaft of the drive motor 51 passes through and is fixedly connected to a drive gear 52 at its end. The drive gear 52 is meshed with at least two drums 53, and both ends of the drum 53 are provided with gear rings. One end of the drum 53 is rotatably connected to the end of the intake pipe 12 extending into the casing 1. A dispersion disk 54 is meshed together on the outer wall of the gear ring at the other end of at least two drums 53. One end of the dispersion disk 54 is rotatably connected to a drainage cover 55, and the other end is rotatably connected to a turbine fan blade 56. The drainage cover 55 is fixedly mounted on the inner wall of the casing 1 on the side close to the drive motor 51.

[0028] A shaft seat 6 is rotatably provided on the inner bottom surface of the circular groove 10, and a material table turntable 61 is fixedly connected to the top of the shaft seat 6. Such a structural design allows the material table turntable 61 to be stably installed in the box body 1, which is convenient for rotating the thin film device during the preparation process, thereby improving the preparation efficiency and quality of the thin film device; a magnetic suspension bearing 63 is fixedly installed on the annular inner wall of the circular groove 10. This design uses magnetic suspension technology to reduce the friction and wear during the rotation of the material table turntable, thereby improving the service life and stability of the equipment, and at the same time ensuring the high precision and stability of the turntable rotation; guide fins 62 are distributed circumferentially on the outer wall of the shaft seat 6, and these guide fins 62 help to improve the fluidity of inert gas and oxygen, thereby making the preparation process of the thin film device more uniform; a reset spring 64 is sleeved on the shaft seat 6, and the reset spring 64 can provide a restoring force when the turntable or shaft seat is deviated from the normal position by external force, thereby helping the turntable or shaft seat to quickly return to the correct position, thereby ensuring the stability and continuity of the thin film device preparation process.

[0029] Working principle: In this high uniform pressure reaction box, the box body 1 constitutes the main structure, and the pressure monitor 2 and the safety valve pipe 4 are responsible for monitoring and ensuring the pressure safety inside the box body. The booster pipe 11 is connected to the external booster pump to adjust the pressure inside the box body 1. The air inlet pipe 12 introduces inert gas and oxygen respectively, and the inert gas can be nitrogen or argon. The air guide pipe 13 and the vacuum pump 3 connected thereto are used to continuously guide the inert gas and oxygen introduced into the control box body.

[0030] The airflow control assembly 5 is the key to achieving uniform distribution of inert gas and oxygen. It drives the drum 53 by rotating the drive motor 51, and then drives the dispersion disk 54 and the turbine blades 56 to ensure uniform mixing and flow of inert gas and oxygen in the box 1. The multiple-root design of the intake pipe 12 further improves the uniformity of the distribution of inert gas and oxygen. The shaft seat 6 and the material table turntable 61 at its top cooperate to provide a rotating platform for the preparation of thin film devices, while the magnetic bearing 63 reduces the friction during the rotation of the turntable, ensuring the smoothness and accuracy of the rotation; the setting of the guide fin 62 and the return spring 64 helps the material table turntable 61 to continue to maintain stable rotation during the supercharging process.

[0031] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0032] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A high uniform pressure reaction box for a thin film device preparation process, comprising a box body (1), a pressure monitor (2) is provided on one side of the top of the box body (1), a detection end of the pressure monitor (2) extends into the box body (1), a safety valve pipe (4) is connected to the other side of the top of the box body (1), a booster pipe (11) connected to an external booster pump is provided in the middle of the top of the box body (1), an air inlet pipe (12) is provided in the middle of the outer wall of one side of the box body (1), and an air guide pipe (13) is provided at the bottom of the outer wall of the other side, and a vacuum pump (3) is connected to the air guide pipe (13), characterized in that: The air intake pipe (12) is provided with an airflow control component (5); The airflow control assembly (5) comprises a drive motor (51), the drive motor (51) being fixedly mounted on an outer wall of one side of the housing (1), the output shaft of the drive motor (51) passing through and having a drive gear (52) fixedly connected at its end, the drive gear (52) being meshedly connected to at least two rotating drums (53), both ends of the rotating drums (53) being provided with toothed rings, one end of the rotating drum (53) being rotatably connected to an end of an intake pipe (12) extending into the housing (1), a dispersion disk (54) being meshedly mounted on the outer wall of the toothed rings at the other ends of at least the two rotating drums (53), one end of the dispersion disk (54) being rotatably connected to a flow guide cover (55), and the other end being rotatably connected to a turbine blade (56), the flow guide cover (55) being fixedly mounted on the inner wall of the housing (1) on a side close to the drive motor (51).

2. The high uniform pressure reaction box for thin film device preparation process according to claim 1, characterized in that: The air inlet pipes (12) are fixedly connected and arranged on the air guide cover (55), and at least two of them are provided.

3. The high uniform pressure reaction box for thin film device preparation process according to claim 1, characterized in that: A circular notch (10) is provided on the inner bottom surface of the box body (1), and an axle seat (6) is rotatably provided on the inner bottom surface of the circular notch (10).

4. The high uniform pressure reaction box for thin film device preparation process according to claim 3, characterized in that: A magnetic suspension bearing (63) is fixedly mounted on the annular inner wall of the circular notch (10).

5. The high uniform pressure reaction box for thin film device preparation process according to claim 3, characterized in that: A material table turntable (61) is fixedly connected to the top of the shaft seat (6).

6. The high uniform pressure reaction box for thin film device preparation process according to claim 3, characterized in that: Guide fins (62) are distributed circumferentially on the outer wall of the shaft seat (6).

7. The high uniform pressure reaction box for thin film device preparation process according to claim 3, characterized in that: A return spring (64) is sleeved on the shaft seat (6).

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