Double-chamber evaporation magnetic conductive structure

By designing the magnetic permeability structure of the interlaced magnetic permeability plate and the insulating washer in the dual-chamber evaporation, the problem of mutual interference between the magnetic fields is solved, and the uniformity and processing efficiency of the coating are improved.

CN222886754UActive Publication Date: 2025-05-20SUZHOU YOULUN VACUUM EQUIP TECH CO LTD
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Patent Information

Application Number
CN202421763183.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-24
Publication Date
2025-05-20
Estimated Expiration
2034-07-24

AI Technical Summary

Technical Problem

In the existing dual-chamber evaporation technology, the magnetic fields below the two evaporation sources interfere with each other, affecting the uniformity of the coating and processing efficiency.

Method used

Multiple groups of interlaced first magnetic permeable plates and second magnetic permeable plates are used to combine insulating washer and fixing bolts to form a magnetic structure to guide the magnetic field magnetic inductive lines to reduce mutual interference between the magnetic fields.

Benefits of technology

It effectively reduces mutual interference between magnetic fields, improves the uniformity of the coating and the processing efficiency of double-chamber evaporation.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a double-chamber evaporation magnetic conductive structure, which comprises a plurality of groups of first magnetic conductive plates and second magnetic conductive plates, the plurality of groups of first magnetic conductive plates and second magnetic conductive plates are distributed in a staggered manner, and a plurality of uniformly distributed insulating washers are arranged between the plurality of groups of first magnetic conductive plates and second magnetic conductive plates. The multiple sets of insulating washers are all arranged on the outer side of the fixing bolt piece or the assembling bottom plate in a sleeving mode, and the insulating washers are insulating ceramic washers. A pair of fixing bolt pieces is fixedly assembled above the multiple sets of first magnetic conductive plates and the second magnetic conductive plates, multiple assembling bottom plates are assembled below the multiple sets of first magnetic conductive plates and the second magnetic conductive plates, and a pair of assembling bolt pieces are fixedly assembled between the multiple assembling bottom plates and the first magnetic conductive plates and between the multiple assembling bottom plates and the second magnetic conductive plates. According to the utility model, the plurality of groups of first concentrating flux plates and second concentrating flux plates are matched with the plurality of groups of insulating washers to guide the distribution of magnetic induction lines of a magnetic field, so that the mutual interference of the magnetic field between a pair of evaporation sources is reduced, the distance between the pair of evaporation sources is reduced, and the double-chamber evaporation effect is ensured.
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Description

Technical Field

[0001] The utility model belongs to the technical field of double - chamber evaporation coating, and particularly relates to a magnetic - conduction structure for double - chamber evaporation coating. Background Art

[0002] Vacuum evaporation coating refers to a process in which an evaporation coating material is vaporized by heating and evaporation under vacuum conditions, so that the evaporation coating material condenses into a film on the surface of a substrate. Common vacuum evaporation coating devices mainly consist of a vacuum system and an evaporation chamber, while double - chamber evaporation coating is a vacuum evaporation coating device composed of two evaporation chambers. Compared with traditional vacuum evaporation coating devices, double - chamber evaporation coating has the advantage of high processing efficiency.

[0003] Since double - chamber evaporation coating uses two evaporation chambers to evaporate - coat a substrate, similarly, evaporation sources are arranged below both of the two evaporation chambers. The evaporation coating material is heated and vaporized by the evaporation sources. In the prior art, double - chamber evaporation coating usually forms a magnetic field below the evaporation sources by arranging magnets below the evaporation sources, so that the vaporized evaporation coating material condenses into a film on the surface of the substrate under the action of the magnetic field.

[0004] In the prior art, common double - chamber evaporation coating mainly reduces the mutual interference of the magnetic fields below the two evaporation sources by increasing the distance between the two evaporation sources. However, in the actual application process, the magnetic fields below the two evaporation sources still interfere with each other. The mutual interference of the magnetic fields not only affects the effect of double - chamber evaporation coating, but also has an adverse effect on the coating uniformity of the substrate.

[0005] The information disclosed in this background - art section is only intended to enhance the overall understanding of the present utility model and should not be regarded as an admission or any form of implication that this information constitutes prior art already known to those of ordinary skill in the art. Summary of the Utility Model

[0006] The purpose of the present utility model is to provide a magnetic - conduction structure for double - chamber evaporation coating, which can conduct the magnetic fields of the two evaporation sources in double - chamber evaporation coating, and reduce the adverse effects caused by the mutual interference of the two magnetic fields on double - chamber evaporation coating.

[0007] In order to achieve the above purpose, the technical solution provided by a specific embodiment of the present utility model is as follows:

[0008] A double-chamber evaporation plating magnetic conduction structure includes multiple groups of first magnetic conduction plates and second magnetic conduction plates. The multiple groups of first magnetic conduction plates and second magnetic conduction plates are distributed alternately. A plurality of evenly distributed insulating washers are arranged between the multiple groups of first magnetic conduction plates and second magnetic conduction plates. A pair of fixing bolt members are fixedly assembled above the multiple groups of first magnetic conduction plates and second magnetic conduction plates. A plurality of assembly bottom plates are assembled below the multiple groups of first magnetic conduction plates and second magnetic conduction plates. A pair of assembly bolt members are fixedly assembled between the plurality of assembly bottom plates and the first magnetic conduction plates and second magnetic conduction plates.

[0009] In one or more embodiments of the present invention, assembly fixing holes are drilled on the outer sides of the multiple groups of first magnetic conduction plates and second magnetic conduction plates. Drilling the assembly fixing holes facilitates the combined assembly of the multiple groups of first magnetic conduction plates and second magnetic conduction plates. The first magnetic conduction plate is a silicon steel sheet, and the second magnetic conduction plate is a stainless steel sheet.

[0010] In one or more embodiments of the present invention, the four corners of the multiple groups of first magnetic conduction plates and second magnetic conduction plates are all rounded, and the two sides of the multiple groups of first magnetic conduction plates and second magnetic conduction plates are all chamfered. By rounding the four sides and chamfering the two sides of the first magnetic conduction plates and second magnetic conduction plates, the application safety of the multiple groups of first magnetic conduction plates and second magnetic conduction plates is improved.

[0011] In one or more embodiments of the present invention, the multiple groups of insulating washers are all sleeved on the outer sides of the fixing bolt members or the assembly bottom plates. The pair of fixing bolt members or the assembly bottom plates play a role in assembling and limiting the multiple groups of insulating washers. The insulating washer is an insulating ceramic washer. It is convenient to assemble and limit the multiple groups of first magnetic conduction plates and second magnetic conduction plates through the insulating ceramic washers.

[0012] In one or more embodiments of the present invention, the assembly bottom plate is composed of an L-shaped clamping member and a fixed bottom plate, and the L-shaped clamping member is perpendicular to the fixed bottom plate. The single group of first magnetic conduction plates and second magnetic conduction plates are clamped and assembled through the L-shaped clamping member. A fixing hole is drilled on one side of the L-shaped clamping member, and the fixing hole is arranged in cooperation with the assembly bolt member. Drilling the fixing hole facilitates fixing the L-shaped clamping member on the side of the first magnetic conduction plate or the second magnetic conduction plate by using the assembly bolt member.

[0013] In one or more embodiments of the present invention, the width of the side of the L-shaped clamping member away from the assembly bolt member is the same as the sum of the thicknesses of the single group of first magnetic conduction plates, second magnetic conduction plates, and insulating washers.

[0014] In one or more embodiments of the present utility model, a pair of assembly through-holes are drilled in the fixed bottom plate. Drilling the assembly through-holes facilitates the assembly and fixation of the fixed bottom plate. Thus, it is convenient to fix multiple groups of first magnetic conduction plates and second magnetic conduction plates between a pair of evaporation sources, thereby facilitating the diversion of the magnetic field distribution of a pair of evaporation sources and reducing the risk of mutual interference between the magnetic fields of the two evaporation sources.

[0015] In one or more embodiments of the present utility model, chamfering treatments are performed at the four peripheral corners of the L-shaped clamping member and the fixed bottom plate. This ensures the use safety of the L-shaped clamping member and the fixed bottom plate.

[0016] Compared with the prior art, the present utility model conducts the diversion of the magnetic induction line distribution of the magnetic field through the cooperation of multiple groups of first magnetic conduction plates, second magnetic conduction plates and multiple groups of insulating washers, reduces the mutual interference of the magnetic fields between a pair of evaporation sources, thereby reducing the distance between a pair of evaporation sources and ensuring the effect of double-chamber evaporation coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings described below are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0018] Figure 1 It is a three-dimensional view of the magnetic conduction structure for double-chamber evaporation coating in an embodiment of the present utility model;

[0019] Figure 2 It is a side view of the magnetic conduction structure for double-chamber evaporation coating in an embodiment of the present utility model;

[0020] Figure 3 It is another three-dimensional view of the magnetic conduction structure for double-chamber evaporation coating in an embodiment of the present utility model;

[0021] Figure 4 It is a top view of the magnetic conduction structure for double-chamber evaporation coating in an embodiment of the present utility model;

[0022] Figure 5 It is Figure 4 the structural schematic diagram at position A in

[0023] MAIN REFERENCE NUMERAL DESCRIPTION:

[0024] 1 - First magnetic conduction plate, 2 - Second magnetic conduction plate, 3 - Insulating washer, 4 - Fixed bolt member, 5 - Assembly bottom plate, 501 - L-shaped clamping member, 502 - Fixed bottom plate, 6 - Assembly bolt member. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0025] To enable those skilled in the art to better understand the technical solutions in the present utility model, the following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. Based on the embodiments in the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0026] As Figures 1 to 5 shown, a double-chamber evaporation magnetic conduction structure in an embodiment of the present utility model includes multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2, and the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 are distributed alternately.

[0027] Specifically, assembly fixing holes are drilled on the outer sides of the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2. Drilling the assembly fixing holes facilitates the combined assembly of the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2.

[0028] Preferably, the first magnetic conduction plate 1 is a silicon steel sheet. The magnetic induction lines of a pair of evaporation sources are diverted and distributed through the silicon steel sheet. The silicon steel sheet has the advantages of good magnetic conduction performance and not being easily magnetized. The second magnetic conduction plate 2 is a stainless steel sheet. The magnetic induction lines of the magnetic field of a pair of evaporation sources are assisted in distribution through multiple groups of stainless steel sheets.

[0029] As Figures 1 to 3 shown, the four corners of the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 are all rounded, and the two sides of the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 are all chamfered. By rounding the four sides and chamfering the two sides of the first magnetic conduction plates 1 and second magnetic conduction plates 2, the application safety of the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 is improved.

[0030] As Figures 2 to 5 shown, a plurality of evenly distributed insulating washers 3 are arranged between the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2. It is convenient to separate and limit the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 through the multiple groups of insulating washers 3.

[0031] Specifically, the multiple groups of insulating washers 3 are all sleeved on the outer sides of the fixing bolt members 4 or the assembly bottom plates 5. The pair of fixing bolt members 4 or the assembly bottom plates 5 play a role in assembling and limiting the multiple groups of insulating washers 3.

[0032] Preferably, the insulating washer 3 is an insulating ceramic washer. It is convenient to assemble and limit the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 through the insulating ceramic washer.

[0033] As Figures 1 to 3As shown in the figure, a pair of fixing bolt members 4 are fixedly assembled above multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2. The multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 are assembled and fixed by the pair of fixing bolt members 4.

[0034] As Figures 2 to 3 shown in the figure, multiple assembly bottom plates 5 are assembled below multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2. The multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 are assisted in assembly and fixed by the multiple assembly bottom plates 5. At the same time, the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 can be assembled and fixed by the method of assembling and fixing the assembly bottom plates 5.

[0035] As Figures 2 to 3 shown in the figure, a pair of assembly bolt members 6 are fixedly assembled between the multiple assembly bottom plates 5 and the first magnetic conduction plates 1 and second magnetic conduction plates 2. The L-shaped clamping members 501, multiple groups of first magnetic conduction plates 1, second magnetic conduction plates 2 and insulating washers 3 are combined and fixed by the pair of assembly bolt members 6.

[0036] As Figures 2 to 3 shown in the figure, the assembly bottom plate 5 is composed of two parts, an L-shaped clamping member 501 and a fixed bottom plate 502, and the L-shaped clamping member 501 is perpendicularly arranged with the fixed bottom plate 502. The single group of first magnetic conduction plates 1 and second magnetic conduction plates 2 are clamped and assembled by the L-shaped clamping member 501.

[0037] Specifically, a fixing hole is drilled on one side of the L-shaped clamping member 501, and the fixing hole is arranged in cooperation with the assembly bolt member 6. By drilling the fixing hole, it is convenient to fix the L-shaped clamping member 501 on the side surface of the first magnetic conduction plate 1 or the second magnetic conduction plate 2 by using the assembly bolt member 6.

[0038] It should be noted that the width of the side of the L-shaped clamping member 501 away from the assembly bolt member 6 is the same as the sum of the thicknesses of the single group of first magnetic conduction plates 1, second magnetic conduction plates 2 and the insulating washer 3.

[0039] Among them, a pair of assembly through holes are drilled on the fixed bottom plate 502. By drilling the assembly through holes, it is convenient to assemble and fix the fixed bottom plate 502. Thus, it is convenient to fix the multiple groups of first magnetic conduction plates 1 and second magnetic conduction plates 2 between a pair of evaporation sources, and thus it is convenient to divert the magnetic induction lines of the magnetic field of the pair of evaporation sources.

[0040] At the same time, chamfering treatments are performed on the four peripheral corners of the L-shaped clamping member 501 and the fixed bottom plate 502. This ensures the use safety of the L-shaped clamping member 501 and the fixed bottom plate 502.

[0041] Specifically, a plurality of insulating washers 3 are arranged between multiple groups of first magnetic conductive plates 1 and second magnetic conductive plates 2, and a pair of fixing bolt members 4 are used to fixedly combine multiple groups of first magnetic conductive plates 1, second magnetic conductive plates 2, and insulating washers 3. Meanwhile, a plurality of assembly bottom plates 5 can be fixedly assembled below the first magnetic conductive plate 1 or the second magnetic conductive plate 2 through a pair of assembly bolt members 6. During use, multiple groups of first magnetic conductive plates 1 and second magnetic conductive plates 2 can be assembled between the magnetic fields of a pair of evaporation sources by assembling and fixing the fixing bottom plate 502, thereby guiding the magnetic induction line distribution of the magnetic fields of the pair of evaporation sources, reducing the situation where the magnetic induction line distributions of the magnetic fields of the pair of evaporation sources are staggered, and reducing the adverse effects of magnetic field crosstalk on double-chamber evaporation coating.

[0042] For those skilled in the art, it is obvious that the present utility model is not limited to the details of the above exemplary embodiments, and the present utility model can be implemented in other specific forms without departing from the spirit or basic characteristics of the present utility model. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-restrictive. The scope of the present utility model is defined by the appended claims rather than the above description. Therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be embraced within the present utility model. Any reference signs in the claims should not be regarded as limiting the claimed rights.

[0043] In addition, it should be understood that although this specification is described according to embodiments, not every embodiment only contains an independent technical solution. This narrative way of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A dual-chamber evaporation magnetic conductive structure, characterized in that: It includes multiple groups of first magnetic conductive plates and second magnetic conductive plates, which are alternately distributed, and multiple evenly distributed insulating gaskets are arranged between the multiple groups of first magnetic conductive plates and second magnetic conductive plates. A pair of fixing bolts are fixedly assembled above the multiple groups of first magnetic conductive plates and second magnetic conductive plates, and multiple assembly base plates are assembled below the multiple groups of first magnetic conductive plates and second magnetic conductive plates, and a pair of assembly bolts are fixedly assembled between the multiple assembly base plates and the first magnetic conductive plates and the second magnetic conductive plates.

2. The dual-chamber vapor deposition magnetic conductive structure according to claim 1, characterized in that: The outer sides of the plurality of groups of the first magnetic conductive plates and the second magnetic conductive plates are all provided with assembly fixing holes, the first magnetic conductive plates are silicon steel sheets, and the second magnetic conductive plates are stainless steel sheets.

3. The dual-chamber vapor deposition magnetic conductive structure according to claim 1, characterized in that: The four peripheral corners of the multiple groups of the first magnetic conductive plates and the second magnetic conductive plates are all rounded, and the two sides of the multiple groups of the first magnetic conductive plates and the second magnetic conductive plates are all chamfered.

4. The dual-chamber vapor deposition magnetic conductive structure according to claim 1, characterized in that: A plurality of groups of insulating washers are all sleeved on the outer sides of the fixing bolts or the assembly base plate, and the insulating washers are insulating ceramic washers.

5. The dual-chamber vapor deposition magnetic conductive structure according to any one of claims 1, 2 or 3, characterized in that: A plurality of groups of insulating washers are all sleeved on the outer sides of the fixing bolts or the assembly base plate, and the insulating washers are insulating ceramic washers.

6. The dual-chamber vapor deposition magnetic conductive structure according to claim 1, characterized in that: The assembly base plate is composed of an L-shaped clamp and a fixed base plate. The L-shaped clamp is vertically arranged to the fixed base plate, and a fixing hole is drilled on one side of the L-shaped clamp. The fixing hole is matched with the assembly bolt.

7. The dual-chamber vapor deposition magnetic conductive structure according to any one of claims 1, 2, 3 or 4, characterized in that: The assembly base plate is composed of an L-shaped clamp and a fixed base plate. The L-shaped clamp is vertically arranged to the fixed base plate, and a fixing hole is drilled on one side of the L-shaped clamp. The fixing hole is matched with the assembly bolt.

8. The dual-chamber vapor deposition magnetic conductive structure according to claim 7, characterized in that: The width of the L-shaped clamping member at a side away from the assembly bolt member is the same as the sum of the thicknesses of a single set of the first magnetic conductive plate, the second magnetic conductive plate and the insulating gasket.

9. The dual-chamber vapor deposition magnetic conductive structure according to claim 8, characterized in that: A pair of assembly through holes are drilled on the fixed bottom plate.

10. The dual-chamber vapor deposition magnetic conductive structure according to claim 7, characterized in that: The four corners of the L-shaped clamp and the fixed bottom plate are chamfered.