Centrifugal cleaning and rotary drying machine for wafer box cover plate

Abstract

The utility model relates to the field of wafer box cover cleaning, in particular to a wafer box cover plate centrifugal cleaning rotary dryer which comprises a cleaning tank and a sealing cover arranged above the cleaning tank and used for sealing the cleaning tank, mounting frames are arranged at the two ends of the bottom of the cleaning tank, air cylinders are fixed to the mounting frames, and the air cylinders are fixed to the sealing cover. The centrifugal cleaning rotary drying machine for the wafer box cover plate comprises a cleaning tank and a sealing cover, an air cylinder is fixed to the center of the bottom of the cleaning tank, the end of a piston rod of the air cylinder is fixedly connected with the sealing cover, a motor is fixed to the center of the bottom of the cleaning tank, and an output shaft of the motor is fixedly connected with a positioning clamp arranged in the cleaning tank. And water of the spray heads can be diffused in a quite large range, it is ensured that the cleaning liquid can uniformly cover all corners of the wafer box cover, it is ensured that the wafer box cover is cleaned in all directions, and the heating rods are arranged in the device, so that the cleaned wafer box cover can be rapidly dried.

Description

Technical Field

[0001] The utility model relates to the field of wafer box cover cleaning, in particular to a wafer box cover plate centrifugal cleaning and rotating drying machine. Background Art

[0002] The wafer box consists of a cover and a body. The wafers are stored inside the wafer box to protect them from dust and other pollutants. However, in order to ensure the purity and performance of the wafers, we must regularly clean the wafer box and cover. Unfortunately, the cover cleaning equipment currently on the market often has poor cleaning effects, making it difficult to completely remove dirt, and lacks a convenient drying function after cleaning. This not only affects the cleaning efficiency, but may also have an adverse effect on the quality of the wafers.

[0003] Therefore, it is necessary to provide a wafer box cover centrifugal cleaning and rotary drying machine to solve the above technical problems. Utility Model Content

[0004] In order to solve the above technical problems, the utility model provides a centrifugal cleaning and rotating drying machine for a wafer box cover.

[0005] The utility model provides a centrifugal cleaning and rotating drying machine for wafer box cover plates, comprising a cleaning tank and a sealing cover arranged above the cleaning tank for sealing the cleaning tank, mounting frames are arranged at both ends of the bottom of the cleaning tank, cylinders are fixed on the mounting frames, the piston rod ends of the cylinders are fixedly connected to the sealing cover, a motor is fixed at the bottom center of the cleaning tank, the output shaft of the motor is fixedly connected to a positioning fixture arranged inside the cleaning tank, a plurality of nozzles are installed on the inner wall of the cleaning tank and the inner side of the sealing cover, water inlet pipes connected to the nozzles are installed at the bottom of the cleaning tank and the top of the sealing cover, and a drain outlet is arranged at the bottom of the cleaning tank.

[0006] Preferably, the positioning fixture comprises a support frame fixedly connected to the output shaft of the motor, a U-shaped frame for positioning four sides of the wafer box cover is installed on the support frame, and a positioning column for cooperating with the positioning groove of the wafer box cover is installed on the support frame.

[0007] Preferably, a guide rail is fixed on the mounting frame, a slide rail is fixed on the sealing cover, and the slide rail is slidably connected to the guide rail.

[0008] Preferably, a plurality of heating rods are installed in the sealing cover.

[0009] Preferably, the sealing cover is provided with an exhaust duct.

[0010] Preferably, the nozzles on the inner side of the sealing cover are distributed equidistantly along the diameter direction of the sealing cover.

[0011] Compared with the related art, the utility model provides the following beneficial effects:

[0012] The inside of the cleaning tank and the sealing cover are evenly provided with nozzles, and the nozzles are evenly distributed along the diameter direction of the sealing cover, which improves the thoroughness and efficiency of cleaning. The nozzles in the cleaning tank and the sealing cover will spray water upward and downward respectively, and the water from the nozzles can spread over a considerable range, ensuring that the cleaning liquid can evenly cover every corner of the wafer box cover, ensuring that the wafer box cover is cleaned in all directions, and the positioning fixture is driven by a motor to rotate quickly to generate centrifugal force to throw out the water. A heating rod is equipped inside the device, so that the cleaned wafer box cover can be quickly dried. The utility model greatly shortens the cleaning process time, improves work efficiency, and also avoids the adverse effects that a humid environment may have on wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0014] Figure 2 It is a structural schematic diagram of the bottom of the cleaning tank of the utility model;

[0015] Figure 3 This is a schematic diagram of the cleaning tank structure of the utility model;

[0016] Figure 4 It is a schematic diagram of the sealing cover structure of the utility model.

[0017] Numbers in the figure: 1. Cleaning tank; 2. Sealing cover; 3. Mounting frame; 4. Cylinder; 5. Motor; 6. Positioning fixture; 61. Support frame; 62. U-shaped frame; 63. Positioning column; 7. Nozzle; 8. Water inlet pipe; 9. Drain outlet; 10. Guide rail; 11. Slide rail; 12. Heating rod; 13. Exhaust duct. DETAILED DESCRIPTION

[0018] The utility model is further described below in conjunction with the accompanying drawings and implementation modes.

[0019] Please refer to Figures 1 to 4 A wafer box cover centrifugal cleaning and rotating drying machine comprises a cleaning tank 1 and a sealing cover 2 located above the cleaning tank 1. Stable mounting frames 3 are installed at both ends of the bottom of the cleaning tank 1, and cylinders 4 are fixed on the mounting frames 3. The piston rod ends of the cylinders 4 are tightly connected to the sealing cover 2, so that the sealing cover 2 can open and close the cleaning tank 1 conveniently.

[0020] At the bottom center of the cleaning tank 1, a motor 5 is firmly installed. The output shaft of the motor 5 is connected to the positioning fixture 6 inside the cleaning tank 1. The positioning fixture 6 is cleverly designed and includes a support frame 61 connected to the output shaft of the motor 5. The support frame 61 is equipped with a U-shaped frame 62 for accurately positioning the four sides of the wafer box cover. At the same time, a positioning column 63 is also installed on the support frame 61. This positioning column 63 perfectly matches the positioning groove on the wafer box cover to ensure that the wafer box cover will not move relative to the support frame 61 during the cleaning process, thereby effectively avoiding damage to the cover.

[0021] In actual operation, it is only necessary to place the wafer box cover inside the four U-shaped frames 62, and to coordinate and position it with the positioning grooves of the wafer box cover through the positioning columns 63. Subsequently, the motor 5 will drive the support frame 61 to rotate. At this time, the external water source is connected through the water inlet pipe 8, and the nozzle 7 in the cleaning tank 1 and the nozzle 7 in the sealing cover 2 will spray water upward and downward respectively to ensure that the wafer box cover is cleaned in all directions. During drying, the motor 5 drives the positioning fixture 6 to rotate rapidly, generating centrifugal force to throw out the water.

[0022] A slide rail 11 is fixed on the sealing cover 2 , and the slide rail 11 is slidably connected to the guide rail 10 . The guide rail 10 is slidably connected to the slide rail 11 , so that the sealing cover 2 can move up and down more smoothly.

[0023] In addition, the device also takes into account the drying problem after cleaning. A plurality of heating rods 12 are installed in the sealing cover 2, which can effectively dry the cover of the wafer box after cleaning. At the same time, an exhaust pipe 13 is also provided on the sealing cover 2. When water vapor is generated by heating, the water vapor will be discharged in time through the exhaust pipe 13, and the external exhaust device is connected to ensure the dryness and cleanliness of the cleaning environment.

[0024] It is worth mentioning that the nozzles 7 on the inner side of the sealing cover 2 are equidistantly distributed along the diameter direction thereof. This design ensures that the cleaning range can fully cover every corner of the wafer box cover, thereby achieving an efficient and thorough cleaning effect.

[0025] In general, this wafer box cover centrifugal cleaning and rotary drying machine greatly improves the cleaning efficiency and quality of the wafer box cover with its precise positioning, all-round cleaning and efficient drying functions.

[0026] The above description is only an embodiment of the present invention, and does not limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made by using the contents of the specification and drawings of the present invention, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A wafer box cover centrifugal cleaning and rotary drying machine, characterized in that: The invention comprises a cleaning tank (1) and a sealing cover (2) arranged above the cleaning tank (1) for sealing the cleaning tank, mounting frames (3) are arranged at both ends of the bottom of the cleaning tank (1), cylinders (4) are fixed on the mounting frames (3), the piston rod ends of the cylinders (4) are fixedly connected to the sealing cover (2), a motor (5) is fixed at the center of the bottom of the cleaning tank (1), the output shaft of the motor (5) is fixedly connected to a positioning fixture (6) arranged inside the cleaning tank (1), a plurality of nozzles (7) are installed on the inner wall of the cleaning tank (1) and the inner side of the sealing cover (2), a water inlet pipe (8) connected to the nozzle (7) is installed on the bottom of the cleaning tank (1) and the top of the sealing cover (2), and a water outlet (9) is arranged at the bottom of the cleaning tank (1).

2. The wafer box cover centrifugal cleaning and rotary drying machine according to claim 1, characterized in that: The positioning fixture (6) comprises a support frame (61) fixedly connected to the output shaft of the motor (5), a U-shaped frame (62) for positioning the four sides of the wafer box cover is installed on the support frame (61), and a positioning column (63) for cooperating with the positioning groove of the wafer box cover is installed on the support frame (61).

3. The wafer box cover centrifugal cleaning and rotary drying machine according to claim 2, characterized in that: A guide rail (10) is fixed on the mounting frame (3), a slide rail (11) is fixed on the sealing cover (2), and the slide rail (11) is slidably connected to the guide rail (10).

4. The wafer box cover centrifugal cleaning and rotary drying machine according to claim 1, characterized in that: A plurality of heating rods (12) are installed in the sealing cover (2).

5. The wafer box cover centrifugal cleaning and rotary drying machine according to claim 1, characterized in that: The sealing cover (2) is provided with an exhaust pipe (13).

6. The wafer box cover centrifugal cleaning and rotary drying machine according to claim 1, characterized in that: The nozzles (7) on the inner side of the sealing cover (2) are distributed at equal distances along the diameter direction of the sealing cover (2).

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