Vacuum drying device

Abstract

The utility model relates to the technical field of vacuum drying, in particular to a vacuum drying device which comprises a lower cavity, at least one group of through hole components are uniformly distributed at the top of the lower cavity; each group of through hole components comprises a plurality of through holes; in each group of through hole components, a central cavity is formed in the lower cavity and located at the central position of the plurality of through holes, and each through hole is communicated with the central cavity through a runner cavity; the bottom of the lower cavity is communicated with an air hole corresponding to each central cavity, and the air holes are suitable for being communicated with external air source equipment; the upper cavity is connected to the top of the lower cavity in a sealed mode and suitable for being enclosed with the lower cavity to form a drying cavity. And the supporting assembly is arranged on the lower cavity and is suitable for supporting the substrate. The technical problems that in the air exhaust process of an existing vacuum drying machine, air speed distribution on the surface of a substrate is not uniform, crystallization on the surface of the substrate is not uniform, and the corrugation phenomenon is generated are solved.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum drying, in particular to a vacuum drying device. Background Art

[0002] The vacuum dryer mainly creates a high vacuum environment and utilizes the evaporation effect under low pressure conditions to quickly evaporate the water and other liquids in the object, thereby achieving the purpose of drying and crystallization. Compared with other drying equipment, the vacuum dryer has the advantages of high efficiency, easy control, small equipment size, easy maintenance, and good product surface quality. The vacuum chamber is the main working mechanism of the vacuum dryer, and the chamber structure has an important influence on the drying effect of the substrate. Usually in flat plate coating, the substrate needs to be moved to the vacuum drying device for drying after the coating is completed, so that the solvent in the slurry can evaporate, thereby achieving rapid crystallization.

[0003] Existing vacuum dryers usually include a vacuum chamber and a supporting assembly arranged in the vacuum chamber. The inner cavity of the vacuum chamber is connected to an external vacuum pump through an exhaust hole to evacuate the chamber for drying. However, during the exhaust process, the gas velocity distribution on the surface of the substrate is uneven, which can easily cause uneven crystallization on the surface of the substrate and produce a corrugated phenomenon. Utility Model Content

[0004] The utility model provides a vacuum drying device, which solves the technical problem that in the process of vacuum drying in the existing vacuum dryer, the gas velocity distribution on the surface of the substrate is uneven, which easily causes uneven crystallization on the surface of the substrate and produces a corrugated phenomenon.

[0005] In view of this, the utility model provides a vacuum drying device, comprising:

[0006] The lower cavity has at least one group of through-hole components evenly distributed on the top; each group of through-hole components includes a plurality of through-holes; in each group of through-hole components, a central cavity is provided in the lower cavity at the center of the plurality of through-holes, and each through-hole is connected to the central cavity through a flow channel cavity; the bottom of the lower cavity has an air hole corresponding to each of the central cavities, and the air hole is suitable for connecting to an external air source device;

[0007] An upper cavity body, sealed and connected to the top of the lower cavity body, and suitable for enclosing with the lower cavity body to form a drying cavity;

[0008] The supporting assembly is arranged on the lower cavity and is suitable for supporting the substrate.

[0009] Optionally, a first groove is provided on the top of the lower cavity, and a diverter plate is adapted to be embedded in the first groove; the through-hole assembly is arranged on the diverter plate; a central groove is provided at the bottom of the diverter plate corresponding to the center position of the multiple through holes in each group of the through-hole assembly, and the central groove and the groove bottom of the first groove enclose the central cavity; a flow channel groove is provided at the bottom of the diverter plate corresponding to each through hole, and each through hole in each group of the through-hole assembly is connected to the central groove through the flow channel groove, and the flow channel groove and the groove bottom of the first groove enclose the flow channel cavity.

[0010] Optionally, a first groove is provided on the top of the lower cavity, and a diverter plate is adapted and embedded in the first groove; the through-hole component is arranged on the diverter plate;

[0011] The support assembly comprises a flow equalizer plate, the bottom of which is arranged on the top of the diverter plate through a plurality of pillars, and the peripheral side of the flow equalizer plate is in gap fit with the side wall of the drying chamber, suitable for placing the substrate.

[0012] Optionally, the support assembly further includes:

[0013] A plurality of pin needles are evenly distributed on the top of the flow plate and are suitable for supporting the substrate.

[0014] Optionally, the pin needle is magnetically connected to the current equalizer plate.

[0015] Optionally, viewed from a vertical direction, the flow plate covers all of the through-hole components, and the projection of the substrate is located within the projection of the flow plate.

[0016] Optionally, the through hole components are provided with two groups, and the two groups of through hole components are evenly spaced and arranged on the diverter plate; each group of the through hole components includes four through holes distributed in a rectangular array, and the four through holes are all located at the edge of the diverter plate.

[0017] Optionally, the through hole components are provided with two groups, and the two groups of through hole components are evenly spaced apart on the diverter plate; each group of the through hole components includes eight through holes distributed in a rectangular array, and the eight through holes are all located at the edge of the diverter plate.

[0018] Optionally, a second groove is provided at the bottom of the upper cavity, and the second groove and the lower cavity are enclosed to form the drying cavity.

[0019] Optionally, a sealing ring is provided between the upper cavity and the lower cavity, suitable for sealing the drying cavity.

[0020] The technical solution of the utility model has the following advantages:

[0021] The utility model performs vacuuming by arranging a through-hole assembly, and at the same time arranges a central cavity in the middle of a plurality of through-holes of the through-hole assembly, and makes each through-hole connected to the central cavity through a flow channel cavity with the same path length, width, depth and structure, thereby improving the uniformity of gas flow during vacuuming, and greatly improving the uniformity of the flow velocity and flow rate of the gas on the surface of the substrate flowing from all directions of the surface of the substrate to the pores of the lower cavity, thereby improving the uniformity of the gas flow velocity distribution on the surface of the substrate in the drying chamber, and reducing the adverse effects such as uneven crystallization of the substrate surface and generation of ripples caused by uneven gas velocity distribution on the substrate surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0023] Figure 1 An exploded diagram of the vacuum drying device provided by the utility model;

[0024] Figure 2 A schematic diagram of the structure of the vacuum drying device provided by the utility model at a first viewing angle;

[0025] Figure 3 for Figure 2 Sectional view at AA;

[0026] Figure 4 for Figure 3 Enlarged view of point B in the middle;

[0027] Figure 5 A schematic diagram of the structure of the flow equalizer of the first embodiment provided by the utility model;

[0028] Figure 6 This is a schematic structural diagram of a flow equalizer according to a second embodiment of the present invention.

[0029] Description of reference numerals:

[0030] 1. Lower cavity; 2. Through hole; 3. Air hole; 4. Upper cavity; 5. Support assembly; 51. Pin needle; 52. Flow equalizer; 53. Pillar; 6. First groove; 7. Diverter plate; 8. Center groove; 9. Flow channel groove; 10. Second groove; 11. Sealing ring. DETAILED DESCRIPTION

[0031] The technical solution of the utility model will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0032] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0033] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0034] In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0035] Example 1

[0036] See also Figures 1 to 6 The present embodiment provides a vacuum drying device, comprising: a lower cavity 1, with at least one group of through-hole components evenly distributed on the top; each group of through-hole components comprises a plurality of through-holes 2; in each group of through-hole components, a central cavity is provided in the lower cavity 1 at the center of the plurality of through-holes 2, and each through-hole 2 is connected to the central cavity through a flow channel cavity; an air hole 3 is connected to each central cavity at the bottom of the lower cavity 1, and the air hole 3 is suitable for connecting with an external air source device; an upper cavity 4 is sealed and connected to the top of the lower cavity 1, and is suitable for enclosing with the lower cavity 1 to form a drying cavity; a support component 5 is arranged on the lower cavity 1, and is suitable for supporting a substrate.

[0037] It should be noted that the through-hole assembly and the support assembly 5 are both located in the drying chamber; the path length, width, depth and structure of all flow channel cavities are consistent; the number of through-hole assemblies and through-holes 2 in each group of through-hole assemblies can be limited according to actual conditions and are not specifically limited here.

[0038] In this embodiment, when it is necessary to dry the substrate, the upper cavity 4 and the lower cavity 1 are separated, and then the substrate is placed on the support assembly 5, and then the upper cavity 4 is sealed and connected with the lower cavity 1, so that the substrate is located in the drying chamber, and then the external gas source equipment is connected through the air hole 3 at the bottom of the lower cavity 1 to evacuate, thereby realizing vacuum drying of the substrate in the drying chamber. During the vacuuming process, the gas on the surface of the substrate in the drying chamber flows from all directions of the substrate surface to each through hole 2 of each group of through hole assemblies of the lower cavity 1, and then flows from the through hole 2 to the central cavity through the flow channel cavity and then flows out from the air hole 3. Since there are gas in each group of through hole assemblies, Each through hole 2 is connected to the central cavity through the flow channel cavity, and the path length, width, depth and structure of each through hole 2 to the central cavity are consistent, so that the uniformity of the flow rate and flow rate of the gas on the substrate surface flowing from all directions of the substrate surface to the pores 3 of the lower cavity 1 is greatly improved, thereby improving the uniformity of the gas flow rate distribution on the substrate surface in the drying chamber, reducing the uneven crystallization of the substrate surface, ripples and other adverse effects caused by the uneven distribution of gas velocity on the substrate surface. After the drying is completed, the vacuum can be broken by introducing air through an external gas source device, so as to separate the upper cavity 4 and the lower cavity 1 and take out the substrate.

[0039] Example 2

[0040] As a further improvement to Example 1, Figure 1 , Figure 3 , Figure 5 and Figure 6 As shown, a first groove 6 is provided on the top of the lower cavity 1, and a diverter plate 7 is adapted and embedded in the first groove 6; a through-hole assembly is arranged on the diverter plate 7; a central groove 8 is provided at the bottom of the diverter plate 7 corresponding to the center position of multiple through holes 2 of each group of through-hole assemblies, and the central groove 8 and the groove bottom of the first groove 6 form a central cavity; a flow channel groove 9 is provided at the bottom of the diverter plate 7 corresponding to each through hole 2, and each through hole 2 in each group of through-hole assemblies is connected to the central groove 8 through the flow channel groove 9, and the flow channel groove 9 and the groove bottom of the first groove 6 form a flow channel cavity.

[0041] It should be noted that the diverter plate 7 is located in the drying chamber; the size of the diverter plate 7 is adapted to the size of the first groove 6 .

[0042] In the present embodiment, the central cavity and the flow channel cavity in the lower cavity 1 are formed by the central groove 8 and the flow channel groove 9 on the diverter plate 7 in the first groove 6, presenting a split structure, and the diverter plate 7 is adapted to be embedded in the first groove 6, which is convenient for installing and disassembling the diverter plate 7, so as to clean the central cavity and the flow channel cavity, and avoid residual pollutants from flowing into the drying cavity and contaminating the substrate when the vacuum is broken; in addition, the structure of the diverter plate 7 can be designed and manufactured according to actual conditions, and the number and structure of the through-hole components, flow channel grooves and central grooves can be replaced by diverter plates 7 with different structures, so as to change the number and structure of the through-hole components, flow channel cavities and central cavities on the lower cavity 1, thereby avoiding the overall redesign and manufacturing of the lower cavity 1, reducing production costs, shortening production cycles, and improving production efficiency, and being able to cope with different pumping speed conditions.

[0043] Specifically, Figure 3 As shown, the diverter plate 7 is detachably connected to the lower cavity 1 by screws, which is convenient for installation and disassembly.

[0044] Based on the above implementation, in a preferred implementation, Figure 1 , Figure 3 and Figure 4 As shown, a first groove 6 is provided at the top of the lower cavity 1, and a diverter plate 7 is adapted and embedded in the first groove 6; the through-hole assembly is arranged on the diverter plate 7; the support assembly 5 includes a flow-distributing plate 52, the bottom of the flow-distributing plate 52 is arranged on the top of the diverter plate 7 through a plurality of pillars 53, and the peripheral side of the flow-distributing plate 52 is matched with the gap of the side wall of the drying cavity, which is suitable for placing the substrate.

[0045] In this embodiment, the flow plate 52 is supported by the pillar 53 on the top of the flow divider 7, so that there is a certain gap between the flow plate 52 and the flow divider 7, so as to prevent the flow plate 52 from blocking the through-hole assembly of the flow divider 7 and prevent the flow plate 52 from deforming during the air extraction process. During drying, the substrate can be placed on the flow plate 52, and the flow plate 52 is arranged between the through-hole assembly and the substrate, so that when the air is extracted or the vacuum is broken by the air intake, the gas can only flow through the gap between the flow plate 52 and the drying chamber, so as to prevent the through-hole 2 from being directly aligned with the substrate, causing the airflow to have an adverse effect on the surface of the substrate.

[0046] Based on the above implementation, in a preferred implementation, Figure 1 and Figure 3 As shown, the support assembly 5 further includes: a plurality of pin needles 51, which are evenly distributed on the top of the flow equalizer plate 52 and are suitable for supporting the substrate.

[0047] In this embodiment, the pin needles 51 are provided to support the substrate. When coating is applied on both sides of the substrate, it is convenient to dry both sides of the substrate and to take and place the substrate, thereby expanding the scope of application.

[0048] Specifically, the number and arrangement of the pin needles 51 are not specifically limited and can be selected according to actual conditions. In one embodiment, eight pin needles 51 are provided, and two rows are arranged at intervals along the width direction of the flow equalizer plate 52, with four pin needles in each row evenly distributed.

[0049] On the basis of the above-mentioned embodiment, in a preferred embodiment, the pin needle 51 is magnetically connected to the current equalizer plate 52 .

[0050] In this embodiment, the pin needle 51 is magnetically connected to the flow plate 52, which is convenient for installation and disassembly.

[0051] Specifically, a magnetic block is provided inside the pin 51, and the current equalizer 52 is a magnetic stainless steel current equalizer 52, which facilitates magnetic connection.

[0052] Based on the above implementation, in a preferred implementation, Figure 1 , Figure 3 and Figure 4 As shown, viewed from the vertical direction, the flow plate 52 covers all the through-hole components, and the projection of the substrate is located within the projection of the flow plate 52 .

[0053] In this embodiment, the flow plate 52 is arranged to cover all the through-hole components in the vertical direction, and the projection of the substrate is located within the projection of the flow plate 52, so as to ensure that the substrate is not directly aligned and connected with the through-hole, so that when the gas is evacuated, the gas can only flow from the surface of the substrate to the surroundings and then flow to the through-hole components through the gap between the flow plate 52 and the drying chamber. When the vacuum is broken and the air is inducted, the gas flow path is the same and the flow direction is opposite, which further avoids the adverse effect of the airflow on the substrate surface.

[0054] Based on the above implementation, in a preferred implementation, Figure 5 As shown, there are two groups of through hole components, and the two groups of through hole components are evenly spaced and arranged on the diverter plate 7; each group of through hole components includes four through holes 2 distributed in a rectangular array, and the four through holes 2 are all located at the edge of the diverter plate 7.

[0055] In this embodiment, two groups of through-hole components are provided, and the through-holes 2 of each group of through-hole components are distributed in an array, so that all the through-holes 2 are evenly distributed in the lower cavity 1 in a rectangular array, thereby improving the uniformity of gas flow during vacuum suction and reducing the uneven distribution of gas velocity on the substrate surface, thereby reducing the adverse effects such as uneven crystallization of the substrate surface and ripples. The other four through-holes 2 are all located at the edge of the diverter plate 7, so that they are close to the gap between the flow plate 52 and the drying chamber, thereby improving the vacuum pumping rate in the drying chamber.

[0056] As a convertible implementation method, it can also be, for example Figure 6As shown, two groups of through-hole components are provided, and the two groups of through-hole components are evenly spaced on the manifold 7; each group of through-hole components includes eight through-holes 2 distributed in a rectangular array, and the eight through-holes 2 are all located at the edge of the manifold 7. In this embodiment, by providing two groups of through-hole components, and the through-holes 2 of each group of through-hole components are distributed in an array, all the through-holes 2 are evenly distributed in the lower cavity 1 in a rectangular array, and by increasing the number of through-holes 2, the speed of vacuuming is increased, and at the same time, the uniformity of gas flow during vacuuming is improved, and the uneven distribution of gas velocity on the surface of the substrate is reduced, thereby reducing the adverse effects such as uneven crystallization of the substrate surface and ripples. In addition, the eight through-holes 2 are all located at the edge of the manifold 7, so that they are close to the gap between the flow-uniforming plate 52 and the drying chamber, thereby increasing the vacuuming rate in the drying chamber.

[0057] Based on the above implementation, in a preferred implementation, Figure 3 As shown, a second groove 10 is provided at the bottom of the upper cavity 4, and the second groove 10 and the lower cavity 1 are enclosed to form a drying cavity.

[0058] In this embodiment, the second groove 10 is provided so that the upper cavity 4 and the lower cavity 1 are sealed and connected to form a drying cavity, which improves the crystallization effect of the substrate surface while ensuring that the structure in the drying cavity is compact and the vacuuming efficiency is improved.

[0059] Based on the above implementation, in a preferred implementation, Figure 1 and Figure 3 As shown, a sealing ring 11 is provided between the upper cavity 4 and the lower cavity 1, which is suitable for sealing the drying cavity.

[0060] It should be noted that the sealing ring 11 is arranged around the outer circumference of the drying chamber.

[0061] In this embodiment, the sealing ring 11 is provided to improve the sealing performance and avoid leakage of the drying chamber during vacuuming, thereby preventing the vacuuming effect from being affected.

[0062] Specifically, Figure 1 and Figure 3 As shown, a sealing groove is provided at the top of the lower cavity 1, and a sealing ring 11 is arranged in the sealing groove.

[0063] Specifically, one of the upper cavity 4 and the lower cavity 1 is fixedly arranged with an external device, and the other of the two is driven and connected with an external driving device, and is suitable for being driven by the external driving device to fit together to be sealed and connected or to be spaced apart.

[0064] The specific working principle of a vacuum drying device provided in this embodiment is as follows: the lower cavity 1 can be fixedly set, and the upper cavity 4 is connected to an external driving device. When the substrate needs to be dried, the upper cavity 4 is driven by the driving device to separate and space the lower cavity 1, and then the substrate is placed on multiple pins 51 for support, and then the upper cavity 4 is driven to fit the lower cavity 1 for sealing connection, so that the substrate is located in the drying cavity, and then the air hole 3 at the bottom of the lower cavity 1 is connected to the external air source device for vacuuming, thereby realizing vacuum drying of the substrate in the drying cavity. During the vacuuming process, the gas on the surface of the substrate in the drying chamber flows from all directions of the substrate surface through the gap between the flow plate 52 and the drying chamber to each through hole 2 on the diverter plate 7, and then flows from the through hole 2 through the flow channel cavity to the central cavity and then flows out from the air hole 3. Since each through hole 2 in each through hole assembly is connected to the central cavity through a flow channel cavity, the path length, width, depth and structure of each through hole 2 to the central cavity are consistent, so that the gas on the substrate surface flows from all directions of the substrate surface to the air hole 3 of the lower cavity 1. The uniformity of the flow velocity and flow rate is greatly improved, thereby improving the uniformity of the gas flow velocity distribution on the substrate surface in the drying chamber, reducing the uneven distribution of the gas velocity on the substrate surface, and thus reducing the adverse effects such as uneven crystallization of the substrate surface and ripples. After the drying is completed, the vacuum can be broken by introducing air through an external gas source device, so as to separate the upper cavity 4 and the lower cavity 1 and take out the substrate.

[0065] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection of the invention of the utility model.

Claims

1. A vacuum drying device, characterized in that: include: The lower cavity (1) has at least one group of through-hole components evenly distributed on the top; each group of through-hole components includes a plurality of through-holes (2); in each group of through-hole components, a central cavity is provided in the lower cavity (1) at the center of the plurality of through-holes (2), and each through-hole (2) is connected to the central cavity via a flow channel cavity; the bottom of the lower cavity (1) has an air hole (3) corresponding to each of the central cavities, and the air hole (3) is suitable for connecting to an external air source device; An upper cavity (4) is sealed and connected to the top of the lower cavity (1), and is suitable for enclosing with the lower cavity (1) to form a drying cavity; A support assembly (5) is arranged on the lower cavity (1) and is suitable for supporting a substrate.

2. The vacuum drying device according to claim 1, characterized in that: A first groove (6) is provided at the top of the lower cavity (1), and a diverter plate (7) is adapted to be embedded in the first groove (6); the through-hole assembly is arranged on the diverter plate (7); a central groove (8) is provided at the bottom of the diverter plate (7) corresponding to the central position of the plurality of through holes (2) in each group of the through-hole assembly, and the central groove (8) and the groove bottom of the first groove (6) are combined to form the central cavity; a flow channel groove (9) is provided at the bottom of the diverter plate (7) corresponding to each through hole (2), and each through hole (2) in each group of the through-hole assembly is connected to the central groove (8) through the flow channel groove (9), and the flow channel groove (9) and the groove bottom of the first groove (6) are combined to form the flow channel cavity.

3. The vacuum drying device according to claim 1, characterized in that: A first groove (6) is provided on the top of the lower cavity (1), and a diverter plate (7) is adapted and embedded in the first groove (6); the through-hole assembly is arranged on the diverter plate (7); The support assembly (5) comprises a flow equalizer plate (52), the bottom of which is arranged on the top of the flow divider plate (7) via a plurality of pillars (53), and the peripheral side of the flow equalizer plate (52) is gap-matched with the side wall of the drying chamber, suitable for placing the substrate.

4. The vacuum drying device according to claim 3, characterized in that: The support assembly (5) further comprises: A plurality of pin needles (51) are evenly distributed on the top of the flow equalizer plate (52) and are suitable for supporting the substrate.

5. The vacuum drying device according to claim 4, characterized in that: The pin needle (51) is magnetically connected to the flow equalizer plate (52).

6. The vacuum drying device according to claim 3, characterized in that: Viewed from a vertical direction, the flow plate (52) covers all of the through-hole components, and the projection of the substrate is located within the projection of the flow plate (52).

7. The vacuum drying device according to any one of claims 2 to 6, characterized in that: The through hole components are provided in two groups, and the two groups of through hole components are evenly spaced and arranged on the diverter plate (7); each group of the through hole components comprises four through holes (2) distributed in a rectangular array, and the four through holes (2) are all located at the edge of the diverter plate (7).

8. The vacuum drying device according to any one of claims 2 to 6, characterized in that: The through hole components are provided in two groups, and the two groups of through hole components are evenly spaced and arranged on the diverter plate (7); each group of the through hole components comprises eight through holes (2) distributed in a rectangular array, and the eight through holes (2) are all located at the edge of the diverter plate (7).

9. The vacuum drying device according to claim 1, characterized in that: A second groove (10) is provided at the bottom of the upper cavity (4), and the second groove (10) and the lower cavity (1) are enclosed to form the drying cavity.

10. The vacuum drying device according to claim 1, characterized in that: A sealing ring (11) is provided between the upper cavity (4) and the lower cavity (1), which is suitable for sealing the drying cavity.

Images