Photovoltaic wet processing equipment
By optimizing the transmission mechanism of the photovoltaic wet treatment equipment, the problems of unnecessary treatment of the silicon wafer edge and water film rupture are solved, and stable transmission and efficient treatment effects are achieved.
Patent Information
- Application Number
- CN202421712433.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-19
- Publication Date
- 2025-05-27
- Estimated Expiration
- 2034-07-19
AI Technical Summary
During the chemical treatment of silicon wafers, the edges of silicon wafers are unnecessary to be treated, causing the water film to rupture or fall, causing damage to the surface of silicon wafers, and affecting the concentration of the drug solution, reducing the treatment effect.
A photovoltaic wet treatment equipment is designed to ensure stability during the transmission process by optimizing the settings of the transmission mechanism and avoiding the breakage or fall of the water film. The device includes a chemical treatment tank and a transmission mechanism consisting of a plurality of transmission rollers whose roller spacing is optimized to maintain stable transmission.
It effectively avoids the surface of the silicon wafer that does not need to be treated and is damaged by chemical liquid, and prevents the concentration of the liquid from decreasing, improving the treatment effect.
Smart Images

Figure CN222914756U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of photovoltaic cell manufacturing, in particular to photovoltaic wet processing equipment. Background Art
[0002] The silicon wafer production process usually involves chemical treatment of a single surface of the silicon wafer, that is, the silicon wafer is transferred to a chemical treatment tank containing a chemical treatment liquid to chemically treat the lower surface of the silicon wafer. However, in the process of chemically treating the lower surface of the silicon wafer, the edge of the silicon wafer is also unnecessarily chemically treated. Specifically, after the silicon wafer is diffused, PSG (phosphosilicate glass) and / or BSG (borosilicate glass) will be formed on the lower surface and edge of the silicon wafer. It is necessary to use a wet etching method to remove the PSG (phosphosilicate glass) and / or BSG (borosilicate glass) on the lower surface and edge of the silicon wafer, for example, using HNO 3 The mixed liquid of H2O and HF etches away the PSG on the lower surface and edge of the silicon wafer after the diffusion process, so that the upper and lower surfaces of the silicon wafer are insulated from each other.
[0003] In order to prevent the surface that does not need to be treated from contacting the chemical treatment liquid, a layer of water film is usually laid on the surface that does not need to be treated. However, if there is jitter during the transmission process, the water film on the surface of the silicon wafer is prone to partial rupture or fall off, causing the surface of the silicon wafer to be damaged by the chemical liquid. At the same time, the fallen water film will enter the chemical treatment tank to reduce the concentration of the liquid, affecting the treatment effect of the surface of the silicon wafer that needs to be treated. Utility Model Content
[0004] The utility model aims to provide a photovoltaic wet processing device to solve one or more problems of the prior art.
[0005] In order to achieve the above-mentioned purpose, the technical solution adopted by the utility model is: a photovoltaic wet processing equipment, the processing equipment comprising:
[0006] A chemical treatment tank having a treatment tank cavity;
[0007] A transmission mechanism, used for transmitting the workpiece to be processed, wherein the transmission mechanism transmits the workpiece through the processing tank cavity along a transmission direction;
[0008] The transmission mechanism includes a plurality of transmission rollers arranged at intervals along the transmission direction, the plurality of transmission rollers include a plurality of first transmission rollers arranged at intervals in the processing tank cavity, and a plurality of second transmission rollers arranged at intervals outside the processing tank cavity, a first spacing is provided between two adjacent first transmission rollers, a second spacing is provided between two adjacent second transmission rollers, and a third spacing is provided between the first transmission roller and the second transmission roller adjacently arranged along the transmission direction, wherein the second spacing is greater than the first spacing and the third spacing.
[0009] In some embodiments, the first spacing, the second spacing, and the third spacing are all constant values, and the first spacing is equal to the third spacing.
[0010] In some embodiments, the chemical treatment tank includes an inner tank body and an outer tank body, the outer tank body has an outer tank cavity, the inner tank body has an inner tank cavity, the inner tank body is arranged in the outer tank cavity, and the inner tank cavity constitutes the treatment tank cavity, and the chemical treatment tank is configured to be able to overflow from the inner tank cavity to the outer tank cavity.
[0011] In some embodiments, the inner tank body has a first side wall and a second side wall, the first side wall and the second side wall are spaced apart along a first direction, a first overflow portion is provided on the first side wall, and a second overflow portion is provided on the second side wall, and the first overflow portion and the second overflow portion are both configured to allow the liquid in the inner tank cavity to overflow into the outer tank cavity.
[0012] The first direction is opposite to the transmission direction, the first overflow portion is higher than the second overflow portion in the vertical direction, and the height difference between the first overflow portion and the second overflow portion in the vertical direction is h, 0.5 mm≤h≤10 mm. Preferably, 1 mm≤h≤5 mm.
[0013] In some embodiments, a first channel is provided on the first side wall, and a second channel is provided on the second side wall, and the first channel and the second channel both communicate with the inner groove cavity and the outer groove cavity, wherein the bottom wall of the first channel is higher than the bottom wall of the second channel in the vertical direction, the bottom wall of the first channel constitutes the first overflow portion, and the bottom wall of the second channel constitutes the second overflow portion;
[0014] Alternatively, the top end of the first side wall is higher than the top end of the second side wall in the vertical direction, the top end of the first side wall constitutes the first overflow portion, and the top end of the second side wall constitutes the second overflow portion.
[0015] In some embodiments, the inner groove body has an inner groove bottom wall located at the bottom of the inner groove cavity, and the inner groove bottom wall gradually extends downward along the first direction. The angle between the inner groove bottom wall and the horizontal plane is θ, wherein 0.1°≤θ≤10°, preferably, 0.2°≤θ≤2°.
[0016] In some embodiments, the processing device further comprises:
[0017] a liquid replenishing mechanism, used for replenishing liquid into the inner tank cavity, the liquid replenishing mechanism having a liquid replenishing outlet connected to the inner tank cavity, the liquid replenishing outlet being arranged adjacent to the first side wall; and / or,
[0018] A pump mechanism is used to pump the liquid in the outer groove cavity into the inner groove cavity, and the pump mechanism has a liquid supply outlet connected to the inner groove cavity, and the liquid supply outlet is arranged adjacent to the first side wall.
[0019] In some embodiments, the outer trough body has a third side wall and a fourth side wall, and the third side wall and the fourth side wall are respectively arranged to be spaced apart from the inner trough body in the transmission direction, and at least one second transmission roller is respectively provided between the third side wall and the inner trough body and between the fourth side wall and the inner trough body, wherein all transmission rollers located in the inner trough cavity and the outer trough cavity are equally spaced along the transmission direction.
[0020] In some embodiments, the processing equipment also includes a rinsing tank, a water washing tank and a drying tank, and the workpiece to be processed is transported along the transmission direction and sequentially passes through the chemical treatment tank, the rinsing tank, the water washing tank and the drying tank, wherein the rinsing tank and / or the water washing tank are provided with nozzles for spraying liquid onto the surface of the workpiece to be processed, and the processing equipment also includes a liquid circulation mechanism for transferring the liquid in the rinsing tank to the chemical treatment tank.
[0021] In some embodiments, the processing equipment further comprises an air cutting groove, in which an air knife for spraying gas onto the surface of the workpiece to be processed is provided, wherein the air cutting groove is provided between the water washing tank and the drying tank.
[0022] Due to the application of the above-mentioned technical scheme, the utility model has the following advantages compared with the prior art: the photovoltaic wet processing equipment provided by the embodiment of the utility model, in which the transmission mechanism is optimized so that the transmission mechanism can maintain stable transmission when carrying the workpiece to be processed into or out of the processing tank cavity of the chemical treatment tank, and during the transmission process in the processing tank cavity, thereby avoiding the water film on the surface of the workpiece to be processed from breaking or falling due to the shaking of the transmission roller, thereby avoiding the surface of the workpiece to be processed that does not need to contact with the chemical solution from being damaged by the chemical solution, and avoiding the concentration of the solution in the processing tank cavity from being reduced and affecting the treatment effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0023] Attached Figure 1 It is a schematic diagram of the coordination structure of the chemical treatment tank and the transmission mechanism in the photovoltaic wet processing equipment according to one embodiment of the utility model;
[0024] Attached Figure 2 For attachment Figure 1 Schematic diagram of the structure of the middle inner tank;
[0025] Attached Figure 3It is a schematic diagram of the coordination structure of the chemical treatment tank and the transmission mechanism in the photovoltaic wet processing equipment of another embodiment of the utility model;
[0026] Attached Figure 4 For attachment Figure 3 Schematic diagram of the structure of the middle inner tank;
[0027] Attached Figure 5 This is a schematic diagram of the distribution of processing tanks in a photovoltaic wet processing device according to an embodiment of the utility model;
[0028] Attached Figure 6 This is a schematic diagram of the distribution of processing tanks in a photovoltaic wet processing device according to another embodiment of the utility model;
[0029] Attached Figure 7 A schematic diagram of the working principle of the nozzles provided in the flushing tank and / or the water washing tank in some embodiments;
[0030] Attached Figure 8 A schematic diagram of the working principle of an air knife provided in an air cutting groove in some embodiments;
[0031] Attached Fig. 9 A schematic diagram of the distribution of each transmission roller and the chemical treatment tank in the transmission mechanism in some embodiments;
[0032] Attached Fig.10 Schematic diagram of the distribution of each transmission roller and the chemical treatment tank in the transmission mechanism in other embodiments;
[0033] Wherein: 1. chemical treatment tank; 11. outer tank body; 111. third side wall; 112. fourth side wall; 113. outer tank bottom wall; 12. inner tank body; 121. first side wall; 122. second side wall; 123. inner tank bottom wall; 124. first channel; 125. second channel; 126. top of first side wall; 127. top of second side wall; 13. support member;
[0034] 2. Conveying mechanism; 21. Conveying roller; 211. First conveying roller; 212. Second conveying roller; 3. Parts to be processed;
[0035] 4. Flushing tank; 5. Water washing tank; 6. Drying tank; 7. Air cutting tank; 8. Nozzle; 9. Air knife.
[0036] A. First direction; B. Second direction (transmission direction). DETAILED DESCRIPTION
[0037] The technical solution of the utility model is described in detail below in conjunction with the accompanying drawings and specific embodiments, so that the advantages and features of the utility model can be more easily understood by those skilled in the art. Obviously, the embodiments described in this application are only part of the embodiments of the application, rather than all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of this application.
[0038] Referring to a photovoltaic wet processing device shown in the drawings, the processing device includes a chemical processing tank 1 and a transmission mechanism 2. The chemical processing tank 1 has a processing tank cavity for containing chemical liquid; the transmission mechanism 2 is used to transmit the workpiece 3 to be processed, and the transmission mechanism 2 transmits through the processing tank cavity along the transmission direction, so that the workpiece 3 to be processed contacts the chemical liquid in the processing tank cavity for chemical treatment.
[0039] The chemical treatment tank 1 comprises an outer tank body 11 and an inner tank body 12, wherein the outer tank body 11 has an outer tank cavity, and the inner tank body 12 has an inner tank cavity, wherein the inner tank cavity is used to hold chemical liquid, and is also the treatment tank cavity of the chemical treatment tank 1. The inner tank body 12 is arranged in the outer tank cavity, and the inner tank body 12 can overflow to the outer tank body 11, so that the liquid overflowing from the inner tank cavity can enter the outer tank cavity, so as to facilitate the recycling of the liquid, and promote the flow of the liquid in the inner tank body 12 to improve the uniformity of the liquid inside.
[0040] The inner groove body 12 has an inner groove bottom wall 123 located at the bottom of the inner groove cavity, and the inner groove bottom wall 123 gradually extends downward along the first direction A. Specifically, the angle between the inner groove bottom wall 123 and the horizontal plane is θ, where 0.1°≤θ≤10°. In some embodiments, the angle value is preferably 0.2°≤θ≤2°.
[0041] In the photovoltaic wet processing equipment, the workpiece 3 is transported through the outer tank 11 and the inner tank 12 along the second direction B, which is also the transport direction of the transport mechanism 2. The second direction B is opposite to the first direction A. In other words, the bottom wall 123 of the inner tank is tilted downward in the opposite direction of the movement of the workpiece 3. Figures 1 to 4 In the figure, the inner tank bottom wall 123 gradually tilts downward from left to right, showing a state of being higher on the left and lower on the right; the workpiece 3 to be processed is transported by the transport mechanism 2 and passes through the chemical treatment tank 1 from right to left.
[0042] During processing, upstream in the first direction A, that is, Figures 1 to 4The left end of the inner tank body 12 adds new liquid medicine into the inner tank cavity or overflows into the outer tank body 11 and flows back into the inner tank body 12, so that the liquid medicine in the inner tank body 12 can flow along the first direction A, which is opposite to the moving direction (i.e., the second direction B) of the workpiece 3 to be processed. After the workpiece 3 to be processed enters the inner tank body 12, it first reacts with the old liquid medicine, which contains more residues; as the workpiece 3 to be processed moves to the left, the liquid medicine at the left end is relatively fresh, and the residues in the new liquid medicine are reduced, so the treatment effect on the surface of the workpiece 3 to be processed is improved, and at the same time, the probability of the residues being brought into the subsequent tank body is reduced.
[0043] The inner tank body 12 has a first side wall 121 and a second side wall 122, which are spaced apart along the first direction A, a first overflow portion is provided on the first side wall 121, and a second overflow portion is provided on the second side wall 122, and the first overflow portion and the second overflow portion are both configured to allow the liquid in the inner tank cavity to overflow into the outer tank cavity, wherein the first overflow portion is higher than the second overflow portion in the vertical direction, which further facilitates the liquid medicine in the inner tank cavity to flow along the first direction A. Specifically, the height difference between the first overflow portion and the second overflow portion in the vertical direction is h, wherein 0.5 mm ≤ h ≤ 10 mm, and in some embodiments, the height difference can be set to 1 mm ≤ h ≤ 5 mm.
[0044] In some embodiments, see Figure 1 , Figure 2 As shown, a first channel 124 is provided on the first side wall 121, and a second channel 125 is provided on the second side wall 122. The first channel 124 and the second channel 125 are both connected to the inner groove cavity and the outer groove cavity, wherein the bottom wall of the first channel 124 is higher than the bottom wall of the second channel 125 in the vertical direction, and the height difference between the two in the vertical direction is h, and the bottom wall of the first channel 124 constitutes a first overflow portion, and the bottom wall of the second channel 125 constitutes a second overflow portion. Further, the first channel 124 and the second channel 125 are used for the workpiece 3 to be processed to be transported through the inner groove body 12 along the transport direction, so that the lower surface of the workpiece 3 to be processed contacts the liquid medicine while the upper surface does not contact the liquid medicine.
[0045] In some other embodiments, see Figure 3 , Figure 4 As shown, the top 126 of the first side wall is higher than the top 127 of the second side wall in the vertical direction, and the height difference between the two in the vertical direction is h. The top 126 of the first side wall constitutes a first overflow portion, and the top 127 of the second side wall constitutes a second overflow portion. Further, the workpiece 3 to be processed is transferred from the top of the first side wall 121 and the top of the second side wall 122 through the inner tank 12, so that the lower surface of the workpiece 3 to be processed contacts the liquid medicine while the upper surface does not contact the liquid medicine.
[0046] In the chemical treatment tank 1, the inner tank body 12 is located as a whole in the outer tank cavity of the outer tank body 11, and the outer tank body 11 has an outer tank bottom wall 113 located at the bottom of the outer tank cavity, and a third side wall 111 and a fourth side wall 112 arranged at intervals along the first direction A, the third side wall 111 and the first side wall 121 have a spacing, the fourth side wall 112 and the second side wall 122 have a spacing, the outer tank bottom wall 113 and the bottom of the inner tank body 12 have a spacing in the vertical direction, and a support member 13 is arranged between the two, and the support member 13 has one or a plurality of support members 13 distributed at intervals.
[0047] Although not shown in the figure, the processing device further includes a liquid replenishing mechanism, which is used to replenish liquid into the inner tank cavity, specifically a liquid for reacting with the surface material of the to-be-processed piece 3, and the liquid replenishing mechanism has a liquid replenishing outlet connected to the inner tank cavity, and the liquid replenishing outlet is arranged adjacent to the first side wall 121, that is, the liquid is replenished into the inner tank cavity upstream in the first direction A. The processing device further includes a pumping mechanism, which is used to pump the liquid in the outer tank cavity into the inner tank cavity, and the pumping mechanism has a liquid supply outlet connected to the inner tank cavity, and the liquid supply outlet is arranged adjacent to the first side wall 121, that is, the liquid overflowing from the inner tank cavity into the outer tank cavity flows back into the inner tank cavity upstream in the first direction A through the above-mentioned pumping mechanism.
[0048] See also Figure 5 As shown, in some embodiments, the treatment equipment further includes a rinse tank 4, a water washing tank 5 and a drying tank 6. The workpiece 3 to be treated is transported along the second direction B and sequentially passes through the chemical treatment tank 1, the rinse tank 4, the water washing tank 5 and the drying tank 6, so as to sequentially rinse and remove the residual liquid on the surface of the workpiece 3 to be treated, further wash with water to fully remove the liquid on the surface of the workpiece 3 to be treated, and then dry. A nozzle 8 can be provided in either the rinse tank 4 or the water washing tank 5 to spray liquid on the surface of the workpiece 3 to accelerate the flow of liquid on the surface of the workpiece 3 to be treated and improve the cleaning effect. Furthermore, the treatment equipment further includes a liquid circulation mechanism (not shown in the figure) for transferring the liquid in the rinse tank 4 to the chemical treatment tank 1 so that the liquid can be recycled.
[0049] See also Figure 6 As shown, in other embodiments, the processing equipment further includes an air cutting groove 7, which is arranged between the water washing tank 5 and the drying tank 6. The air cutting groove 7 is provided with an air knife 9 for spraying gas to the surface of the workpiece 3 to be processed. By spraying gas to the surface of the workpiece 3 to be processed and blowing away part of the liquid on the workpiece 3 to be processed in advance, the amount of liquid brought into the drying tank 6 by the workpiece 3 to be processed after water washing can be reduced, thereby improving the drying effect and reducing energy consumption.
[0050] See also Fig. 9 , Fig.10As shown, in the processing equipment, the transmission mechanism 2 includes a plurality of transmission rollers 21 arranged at intervals along the second direction B, and the plurality of transmission rollers 21 include a plurality of first transmission rollers 211 arranged at intervals in the inner groove cavity, and a plurality of second transmission rollers 212 arranged at intervals outside the inner groove cavity, wherein a first spacing D1 is provided between two adjacent first transmission rollers 211, a second spacing D2 is provided between two adjacent second transmission rollers 212, and a third spacing D3 is provided between the first transmission rollers 211 and the second transmission rollers 212 arranged adjacent to each other along the second direction, and the above-mentioned second spacing D2 is greater than the first spacing D1 and the third spacing D3.
[0051] In this way, when the conveying mechanism 2 is carrying the workpiece 3 to be processed and is about to enter the inner tank body 12, when it is carrying the workpiece 3 to be processed and being transmitted in the inner tank body 12, and when it is carrying the workpiece 3 to be processed and flowing out of the inner tank body 12, the spacing between the conveying rollers 21 in the conveying mechanism 2 is smaller, which can avoid or reduce the jitter amplitude caused by the conveying rollers 21, thereby maintaining a more stable transmission. In other areas, the spacing between the conveying rollers 21 of the conveying mechanism 2 is larger, which can take into account the cost of the conveying mechanism 2 and avoid the increase in cost and complexity of the structure due to the excessive provision of conveying rollers 21.
[0052] Thus, in some production processes, if only the lower surface of the workpiece 3 to be treated needs to be chemically treated, a water film will be formed on the upper surface of the workpiece 3 to be treated before the workpiece 3 enters the chemical treatment tank 1 to protect the upper surface of the workpiece 3 from contacting the chemical solution and reacting. By making the above-mentioned improved configuration of the transmission mechanism 2, the transmission roller 21 of the transmission mechanism 2 can maintain stable transmission when the transmission mechanism 2 enters the chemical treatment tank 1 or is located in the chemical treatment tank 1, avoiding or reducing the shaking of the transmission roller 21, which causes the water film laid on the upper surface of the workpiece 3 to be treated to be partially broken or dropped, thereby causing the upper surface of the workpiece 3 to be impregnated with the chemical solution or the water film to fall into the inner tank body 12, resulting in a decrease in the concentration of the chemical solution.
[0053] For the convenience of manufacturing, the first spacing D1, the second spacing D2 and the third spacing D3 are all constant values, and the first spacing D1 is equal to the third spacing D3. Fig.10 As shown, at least one second transmission roller 212 is provided between the third side wall 111 of the outer trough body 11 and the inner trough body 12, and between the fourth side wall 112 and the inner trough body 12. All transmission rollers 21 located in the inner trough cavity and the outer trough cavity are arranged at equal intervals along the second direction, which makes it easier to arrange the transmission mechanism 2 during the production process.
[0054] When the surface of the workpiece 3 to be treated is treated for PSG and BSG removal by using the above-mentioned chemical treatment tank and photovoltaic wet treatment equipment, the liquid medicine in the inner tank body 12 keeps overflowing into the outer tank body 11, and new liquid medicine is added to the inner tank body 12 upstream of the first direction A, so that the liquid medicine can keep flowing along the first direction A in the inner tank cavity, and at the same time, the workpiece 3 to be treated is transmitted through the chemical treatment tank 1 along the second direction B opposite to the first direction A, so that the workpiece 3 to be treated first contacts with the old liquid medicine and then contacts with the new liquid medicine, which can not only improve the treatment effect on the surface of the workpiece 3 to be treated, but also reduce the probability of the residues produced by the reaction being brought into the subsequent tank body. At the same time, the transmission mechanism 2 can maintain stable transmission during the process of the workpiece 3 to be treated entering or flowing out of the inner tank body 12 and being transmitted in the inner tank body 12, so as to avoid the water film on the upper surface of the workpiece 3 to be treated from breaking or falling due to jitter during the transmission process, avoid damaging the upper surface of the workpiece 3 to be treated, and avoid the concentration of the liquid medicine in the inner tank body 12 from decreasing and affecting the treatment effect.
[0055] Of course, the chemical treatment tank 1 and photovoltaic wet processing equipment provided in the above embodiments are not only suitable for the PSG and BSG removal processes of silicon wafers, but can also be used in other surface treatment processes of silicon wafers, such as film stripping, development and electroplating, etc., which require contact with chemical liquids for reaction. Of course, the workpiece 3 to be processed is not limited to silicon wafers, but can also be other products that require surface treatment.
[0056] The above embodiments are only for illustrating the technical concept and features of the utility model, and their purpose is to enable people familiar with the technology to understand the content of the utility model and implement it accordingly, and they cannot be used to limit the protection scope of the utility model. Any equivalent changes or modifications made according to the spirit of the utility model should be included in the protection scope of the utility model.
Claims
1. A photovoltaic wet processing device, characterized in that: The processing equipment comprises: A chemical treatment tank having a treatment tank cavity; A transmission mechanism, used for transmitting the workpiece to be processed, wherein the transmission mechanism transmits the workpiece through the processing tank cavity along a transmission direction; The transmission mechanism includes a plurality of transmission rollers arranged at intervals along the transmission direction, the plurality of transmission rollers include a plurality of first transmission rollers arranged at intervals in the processing tank cavity, and a plurality of second transmission rollers arranged at intervals outside the processing tank cavity, a first spacing is provided between two adjacent first transmission rollers, a second spacing is provided between two adjacent second transmission rollers, and a third spacing is provided between the first transmission roller and the second transmission roller adjacently arranged along the transmission direction, wherein the second spacing is greater than the first spacing and the third spacing.
2. The photovoltaic wet processing equipment according to claim 1, characterized in that: The first spacing, the second spacing and the third spacing are all constant values, and the first spacing is equal to the third spacing.
3. The photovoltaic wet processing equipment according to claim 1, characterized in that: The chemical treatment tank includes an inner tank body and an outer tank body, the outer tank body has an outer tank cavity, the inner tank body has an inner tank cavity, the inner tank body is arranged in the outer tank cavity, and the inner tank cavity constitutes the treatment tank cavity, and the chemical treatment tank is configured to be able to overflow from the inner tank cavity to the outer tank cavity.
4. The photovoltaic wet processing equipment according to claim 3, characterized in that: The inner tank body has a first side wall and a second side wall, the first side wall and the second side wall are spaced apart along a first direction, a first overflow portion is provided on the first side wall, and a second overflow portion is provided on the second side wall, and the first overflow portion and the second overflow portion are both configured to allow the liquid in the inner tank cavity to overflow into the outer tank cavity, The first direction is opposite to the transmission direction, the first overflow portion is higher than the second overflow portion in the vertical direction, and the height difference between the first overflow portion and the second overflow portion in the vertical direction is h, 0.5mm≤h≤10mm.
5. The photovoltaic wet processing equipment according to claim 4, characterized in that: A first channel is provided on the first side wall, and a second channel is provided on the second side wall, and the first channel and the second channel both communicate with the inner groove cavity and the outer groove cavity, wherein the bottom wall of the first channel is higher than the bottom wall of the second channel in the vertical direction, the bottom wall of the first channel constitutes the first overflow portion, and the bottom wall of the second channel constitutes the second overflow portion; Alternatively, the top end of the first side wall is higher than the top end of the second side wall in the vertical direction, the top end of the first side wall constitutes the first overflow portion, and the top end of the second side wall constitutes the second overflow portion.
6. The photovoltaic wet processing equipment according to claim 4, characterized in that: 1mm≤h≤5mm.
7. The photovoltaic wet processing equipment according to claim 4, characterized in that: The inner groove body has an inner groove bottom wall located at the bottom of the inner groove cavity, the inner groove bottom wall gradually extends downward along the first direction, and the angle between the inner groove bottom wall and the horizontal plane is θ, wherein 0.1°≤θ≤10°.
8. The photovoltaic wet processing equipment according to claim 7, characterized in that: 0.2°≤θ≤2°.
9. The photovoltaic wet processing equipment according to claim 4, characterized in that: The processing device also includes: a liquid replenishing mechanism, used for replenishing liquid into the inner tank cavity, the liquid replenishing mechanism having a liquid replenishing outlet connected to the inner tank cavity, the liquid replenishing outlet being arranged adjacent to the first side wall; and / or, A pump mechanism is used to pump the liquid in the outer groove cavity into the inner groove cavity, and the pump mechanism has a liquid supply outlet connected to the inner groove cavity, and the liquid supply outlet is arranged adjacent to the first side wall.
10. The photovoltaic wet processing equipment according to claim 3, characterized in that: The outer trough body has a third side wall and a fourth side wall, and the third side wall and the fourth side wall are respectively arranged to be spaced apart from the inner trough body in the transmission direction, and at least one second transmission roller is respectively arranged between the third side wall and the inner trough body and between the fourth side wall and the inner trough body, wherein all the transmission rollers located in the inner trough cavity and the outer trough cavity are equally spaced along the transmission direction.
11. The photovoltaic wet processing equipment according to any one of claims 1 to 10, characterized in that: The processing equipment further comprises a rinsing tank, a water washing tank and a drying tank, and the workpiece to be processed is transported along the transport direction and sequentially passes through the chemical treatment tank, the rinsing tank, the water washing tank and the drying tank, wherein the rinsing tank and / or the water washing tank is provided with a nozzle for spraying liquid onto the surface of the workpiece to be processed, and the processing equipment further comprises a liquid circulation mechanism for transferring the liquid in the rinsing tank to the chemical treatment tank; The processing equipment further comprises an air cutting groove, in which an air knife for spraying air toward the surface of the workpiece to be processed is provided, wherein the air cutting groove is arranged between the water washing tank and the drying tank.