Rapid polishing device for semiconductor quartz ring processing
By designing the positioning mechanism and guide mechanism in the polishing device, the problems of poor fixation of the quartz ring and different centers of the polishing disc are solved, and the stable positioning of the quartz ring and the stable lifting of the polishing disc are achieved, which improves the processing quality and the service life of the device.
Patent Information
- Application Number
- CN202421863206.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-02
- Publication Date
- 2025-05-30
- Estimated Expiration
- 2034-08-02
AI Technical Summary
When used, the existing polishing device has poor fixing effect on the quartz ring, which leads to the positional offset of the quartz ring when polishing, and the lifting and lowering components of the polishing disc will wear, resulting in the lifting and lowering process not being in the same axis, affecting the processing quality.
A fast polishing device is designed, using a positioning mechanism and a guide mechanism to solve the fixing problem of quartz rings and the lifting problem of polishing discs. The positioning mechanism drives the linkage ring to lift and lower through the motor and the threaded shaft, and the clamping block is clamped and positioned in the radial direction; the guide mechanism moves relative to the thread of the adjustment rod and the fixing plate, and the jacket resists the piston rod from the side to ensure the concentricity of the polishing disc when lifting and lowering.
It effectively prevents the deviation of the quartz ring during processing, ensures the quality of polishing, and avoids concentricity imbalances when lifting and lowering of the polishing disc, extending the service life of the device.
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Figure CN222920273U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of polishing devices, in particular to a rapid polishing device for semiconductor quartz ring processing. Background Technique
[0002] A semiconductor quartz ring is a key component used in semiconductor manufacturing processes, usually used in lithography processes and chemical vapor deposition processes. In the semiconductor quartz ring manufacturing process, polishing treatment is required.
[0003] According to the utility model patent with the authorization announcement number CN221088556U, a rapid polishing device for a semiconductor quartz ring proposed therein relates to the technical field of polishing devices. It includes a base, and two middle parts at both ends of the top of the base are fixedly connected with brackets, and a polishing assembly is arranged at the top of the brackets. By starting the self-locking motor to drive the rotation of the rotating shaft, the rotating shaft drives the rotation of the first belt pulley, and while the first belt pulley drives the second belt pulley, the one-way bearing, and the reciprocating lead screw to rotate through the transmission belt.
[0004] However, when the existing polishing device is in use, the fixing effect on the quartz ring is not good, and the quartz ring is prone to position deviation during polishing. Moreover, during the repeated lifting and lowering process of the polishing disc, its lifting assembly will be worn, resulting in the polishing disc not being able to be on the same axis during the lifting and lowering process, affecting processing. Therefore, it needs to be improved. Content of the Utility Model
[0005] The purpose of the utility model is to provide a rapid polishing device for semiconductor quartz ring processing, which solves the problems that when the existing polishing device is in use, the fixing effect on the quartz ring is not good, and the quartz ring is prone to position deviation during polishing. At the same time, it solves the problem that during the repeated lifting and lowering process of the polishing disc, its lifting assembly will be worn, resulting in the polishing disc not being able to be on the same axis during the lifting and lowering process, affecting processing.
[0006] To achieve the above purpose, the utility model provides the following technical solution: A rapid polishing device for semiconductor quartz ring processing, including a base, four corners of the upper end of the base are welded with columns, and the tops of the four columns are jointly fixedly connected with an operating table. A workpiece is placed on the upper end of the operating table. A positioning mechanism is arranged at the upper end of the base. The edge of the upper end of the operating table is welded with a bracket, and a cylinder is fixedly installed at the upper end of the bracket. The piston rod of the cylinder penetrates through the bracket and is slidably connected with the bracket. The end of the piston rod is fixedly connected with a connecting plate, and a first motor is fixedly installed at the bottom of the connecting plate. The end of the output shaft of the first motor is fixedly connected with a polishing disc. A guiding mechanism is arranged at the inner top of the bracket.
[0007] Preferably, the positioning mechanism includes four clamping blocks slidably connected to the upper end of the base. The clamping blocks penetrate through the operating table and are slidably connected to the operating table. The clamping blocks are in contact with the workpiece. A linkage ring is slidably sleeved on the outer sides of the four clamping blocks. A plurality of connecting rods are fixedly connected to the inner ring of the linkage ring, and a central block is fixedly connected to the ends of the plurality of connecting rods. The connecting rods penetrate through the clamping blocks and are slidably connected to the clamping blocks. A second motor is fixedly installed in the middle of the upper end of the base. The end of the output shaft of the second motor is fixedly connected to a threaded shaft. The threaded shaft penetrates through the central block and is threadedly connected to the central block. Through the setting of the positioning mechanism, it has a positioning effect on the workpiece and prevents its offset during the processing.
[0008] Preferably, a convex-character slider is fixedly connected to the bottom of the clamping block, and the convex-character slider is slidably connected to the base. Through the setting of the convex-character slider, it has a guiding effect on the clamping block.
[0009] Preferably, a limiting block is fixedly connected to the top of the threaded shaft, and the limiting block and the threaded shaft are of an integral structure. Through the setting of the limiting block, it has a limiting effect on the stroke between the threaded shaft and the central block.
[0010] Preferably, a vertical plate is fixedly connected to the upper end of the base, and a spring is fixedly connected between the vertical plate and the clamping block. Through the setting of the spring, it has an auxiliary resetting effect on the clamping block.
[0011] Preferably, the guiding mechanism includes a fixing plate fixedly connected to the bracket. An adjusting rod is threadedly connected inside the fixing plate. One end of the adjusting rod is fixedly connected to a knob. The other end of the adjusting rod is installed with a clamping sleeve through a bearing, and the clamping sleeve is in contact with the piston rod of the air cylinder. A guiding rod is fixedly connected to one side of the clamping sleeve close to the fixing plate. The guiding rod penetrates through the fixing plate and is slidably connected to the fixing plate. Through the setting of the guiding mechanism, it has a guiding effect on the telescopic movement of the piston rod of the air cylinder, thereby ensuring that the polishing disc maintains concentricity when lifting.
[0012] Compared with the prior art, the beneficial effects of the present utility model are as follows:
[0013] 1. The present utility model sets a positioning mechanism under the operating table for placing the workpiece. Among them, a linkage ring is driven to lift by a motor and a threaded shaft. During the descending process of the linkage ring, the linkage ring will cause each clamping block to radially contract towards it, thereby clamping and positioning the workpiece, making it keep at the same axis as the polishing disc, and it is not easy to shift its position during processing, ensuring the quality of polishing.
[0014] 2. The utility model is provided with a guiding mechanism at the bracket for installing the cylinder. Among them, by utilizing the relative threaded movement between the adjusting rod and the fixed plate, the clamping sleeve can be made to abut against the piston rod of the cylinder from the side, so that the piston rod of the cylinder is not prone to shaking, thereby ensuring concentricity when the polishing disc ascends and descends. Description of the Drawings
[0015] Figure 1 is a three-dimensional view of the overall structure of the utility model;
[0016] Figure 2 is of the utility model Figure 1 front view;
[0017] Figure 3 is of the utility model Figure 2 enlarged view of the guiding mechanism;
[0018] Figure 4 is of the utility model Figure 1 three-dimensional view of the structure of the positioning mechanism.
[0019] In the figure: 1. Base; 2. Column; 3. Operating table; 4. Positioning mechanism; 5. Workpiece; 6. Bracket; 7. Cylinder; 8. Guiding mechanism; 9. Connecting plate; 10. Motor I; 11. Polishing disc; 41. Clamping block; 42. Convex character slider; 43. Linking ring; 44. Connecting rod; 45. Central block; 46. Motor II; 47. Threaded shaft; 48. Limiting block; 49. Vertical plate; 410. Spring; 81. Fixed plate; 82. Adjusting rod; 83. Clamping sleeve; 84. Knob; 85. Guide rod. Detailed Implementation Manner
[0020] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.
[0021] Please refer to Figure 1-2 , a rapid polishing device for semiconductor quartz ring processing, including a base 1. Four corners of the upper end of the base 1 are welded with columns 2, and the tops of the four columns 2 are fixedly connected together to form an operating table 3. A workpiece 5 is placed on the upper end of the operating table 3. The edge of the upper end of the operating table 3 is welded with a bracket 6. The upper end of the bracket 6 is fixedly installed with a cylinder 7. The piston rod of the cylinder 7 penetrates through the bracket 6 and is slidably connected with the bracket 6. The end of the piston rod is fixedly connected with a connecting plate 9. The bottom of the connecting plate 9 is fixedly installed with a motor I 10. The end of the output shaft of the motor I 10 is fixedly connected with a polishing disc 11.
[0022] Please refer to Figure 1 、 Figure 2 、 Figure 4 , a positioning mechanism 4 is provided at the upper end of the base 1. The positioning mechanism 4 includes four clamping blocks 41 slidably connected to the upper end of the base 1. The clamping blocks 41 penetrate through the operating table 3 and are slidably connected to the operating table 3. The clamping blocks 41 are in contact with the workpiece 5. A linkage ring 43 is slidably sleeved on the outer sides of the four clamping blocks 41. A plurality of connecting rods 44 are fixedly connected to the inner ring of the linkage ring 43, and the ends of the plurality of connecting rods 44 are fixedly connected to a central block 45 together. The connecting rods 44 penetrate through the clamping blocks 41 and are slidably connected to the clamping blocks 41. A second motor 46 is fixedly installed in the middle of the upper end of the base 1. The end of the output shaft of the second motor 46 is fixedly connected to a threaded shaft 47. The threaded shaft 47 penetrates through the central block 45 and is threadedly connected to the central block 45. Through the setting of the positioning mechanism 4, it has a positioning effect on the workpiece 5 and prevents its offset during the processing process.
[0023] Please refer to Figure 1 、 Figure 2 、 Figure 4 , a convex-character slider 42 is fixedly connected to the bottom of the clamping block 41, and the convex-character slider 42 is slidably connected to the base 1. Through the setting of the convex-character slider 42, it has a guiding effect on the clamping block 41. A limiting block 48 is fixedly connected to the top of the threaded shaft 47, and the limiting block 48 and the threaded shaft 47 are of an integral structure. Through the setting of the limiting block 48, it has a limiting effect on the stroke between the threaded shaft 47 and the central block 45. A vertical plate 49 is fixedly connected to the upper end of the base 1, and a spring 410 is fixedly connected between the vertical plate 49 and the clamping block 41. Through the setting of the spring 410, it has an auxiliary resetting effect on the clamping block 41.
[0024] Please refer to Figure 2 、 Figure 3 , a guiding mechanism 8 is provided at the inner top of the bracket 6. The guiding mechanism 8 includes a fixing plate 81 fixedly connected to the bracket 6. An adjusting rod 82 is threadedly connected inside the fixing plate 81. One end of the adjusting rod 82 is fixedly connected to a knob 84. The other end of the adjusting rod 82 is installed with a clamping sleeve 83 through a bearing, and the clamping sleeve 83 is in contact with the piston rod of the cylinder 7. A guiding rod 85 is fixedly connected to one side of the clamping sleeve 83 close to the fixing plate 81. The guiding rod 85 penetrates through the fixing plate 81 and is slidably connected to the fixing plate 81. Through the setting of the guiding mechanism 8, it has a guiding effect on the telescopic movement of the piston rod of the cylinder 7, thereby ensuring concentricity when the polishing disc 11 moves up and down.
[0025] The specific implementation process of the present utility model is as follows: During use, first place the workpiece 5 on the operating table 3, then start the second motor 46. The second motor 46 drives the threaded shaft 47 to rotate, and the center block 45 generates a vertically downward movement through the relative threaded movement with the threaded shaft 47. Subsequently, the center block 45 drives the linkage ring 43 to descend through the connecting rod 44. During the descent of the linkage ring 43, the linkage ring 43 causes each clamping block 41 to radially contract, thereby clamping and positioning the workpiece 5, making it remain on the same axis as the polishing disc 11 and not easily shifting during processing, ensuring the quality of polishing.
[0026] Subsequently, the air cylinder 7 pushes the polishing disc 11 driven by the first motor 10 downward, thereby polishing and grinding the workpiece 5. Moreover, the piston rod of the air cylinder 7 is guided by the clamping sleeve 83, ensuring the concentricity of the polishing disc 11 during lifting and lowering.
[0027] Although the embodiments of the present utility model have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present utility model. The scope of the present utility model is defined by the appended claims and their equivalents.
Claims
1. A rapid polishing device for semiconductor quartz ring processing, comprising a base (1), characterized in that: The four corners of the upper end of the base (1) are welded with columns (2), and the tops of the four columns (2) are fixedly connected to an operating table (3), a workpiece (5) is placed on the upper end of the operating table (3), a positioning mechanism (4) is provided at the upper end of the base (1), a bracket (6) is welded to the upper edge of the operating table (3), a cylinder (7) is fixedly installed on the upper end of the bracket (6), a piston rod of the cylinder (7) passes through the bracket (6) and is slidably connected to the bracket (6), a connecting plate (9) is fixedly connected to the end of the piston rod, a motor (10) is fixedly installed at the bottom of the connecting plate (9), a polishing disc (11) is fixedly connected to the end of the output shaft of the motor (10), and a guide mechanism (8) is provided on the inner top of the bracket (6).
2. The rapid polishing device for semiconductor quartz ring processing according to claim 1, characterized in that: The positioning mechanism (4) comprises four clamping blocks (41) slidably connected to the upper end of the base (1), the clamping blocks (41) pass through the operating table (3) and are slidably connected to the operating table (3), the clamping blocks (41) are in contact with the workpiece (5), the outer sides of the four clamping blocks (41) are slidably sleeved with a linkage ring (43), the inner ring of the linkage ring (43) is fixedly connected with a plurality of connecting rods (44), and the ends of the plurality of connecting rods (44) are fixedly connected with a center block (45), the connecting rods (44) pass through the clamping blocks (41) and are slidably connected to the clamping blocks (41), and a second motor (46) is fixedly installed in the middle of the upper end of the base (1), and the end of the output shaft of the second motor (46) is fixedly connected with a threaded shaft (47), and the threaded shaft (47) passes through the center block (45) and is threadedly connected to the center block (45).
3. The rapid polishing device for semiconductor quartz ring processing according to claim 2, characterized in that: The bottom of the clamping block (41) is fixedly connected with a embossed sliding block (42), and the embossed sliding block (42) is slidably connected to the base (1).
4. The rapid polishing device for semiconductor quartz ring processing according to claim 2, characterized in that: The top of the threaded shaft (47) is fixedly connected to a limiting block (48), and the limiting block (48) and the threaded shaft (47) are an integrated structure.
5. The rapid polishing device for semiconductor quartz ring processing according to claim 2, characterized in that: The upper end of the base (1) is fixedly connected to a vertical plate (49), and a spring (410) is fixedly connected between the vertical plate (49) and the clamping block (41).
6. The rapid polishing device for semiconductor quartz ring processing according to claim 1, characterized in that: The guide mechanism (8) comprises a fixing plate (81) fixedly connected to the bracket (6); an adjusting rod (82) is connected to the inside of the fixing plate (81) via a thread; one end of the adjusting rod (82) is fixedly connected to a knob (84); the other end of the adjusting rod (82) is provided with a sleeve (83) via a bearing, and the sleeve (83) is in contact with a piston rod of the cylinder (7); a guide rod (85) is fixedly connected to the side of the sleeve (83) close to the fixing plate (81); the guide rod (85) passes through the fixing plate (81) and is slidably connected to the fixing plate (81).
Citation Information
Patent Citations
Quartz ring rapid polishing device for semiconductor
CN221088556U