Device for controlling thin film deposition distribution and chemical vapor deposition equipment

Abstract

The utility model provides a device for controlling thin film deposition distribution and chemical vapor deposition equipment, the device is arranged on the chemical vapor deposition equipment, the chemical vapor deposition equipment comprises an upper cavity shell and a spraying plate with through holes, the upper cavity shell and the spraying plate are enclosed to form an upper cavity, the device comprises a diffuser, a liquid inlet pipe, a liquid outlet pipe and a liquid outlet pipe, the upper cavity is arranged in the upper cavity in a vertically movable and adjustable manner and is positioned above the spraying plate; and the driving mechanism is in driving connection with the diffuser and is used for driving the diffuser to perform vertical movement adjustment, so that the distance between the diffuser and the spraying plate is adjusted, and airflow distribution is adjusted. The diffuser is moved and adjusted through the driving mechanism, the distribution condition of thin film deposition can be adjusted and controlled, and the thickness and the refractive index of the thin film cannot be affected.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor manufacturing, in particular to a device for controlling thin film deposition distribution and a chemical vapor deposition equipment. Background Art

[0002] Flowable Chemical Vapor Deposition (FCVD) technology uses means such as heating, plasma enhancement, and light assistance to cause gaseous substances to form solid thin films on the surface of a substrate through chemical reactions under atmospheric or low-pressure conditions. In the process of FCVD, a Diffuser is usually used to evenly disperse the gas flow to prevent a large local gas flow rate, so as to improve the uniformity of thin film deposition.

[0003] In the process of FCVD, multiple precursors are usually required. The existing method for adjusting the thin film deposition distribution is to adjust the amount of some precursors, but this will also cause changes in the thickness and refractive index of the thin film. How to achieve the regulation of thin film deposition distribution without affecting the thickness and refractive index of the thin film.

[0004] In view of this, it is necessary to propose a device for controlling thin film deposition distribution and a chemical vapor deposition equipment to solve the above problems. Summary of the Utility Model

[0005] The purpose of the utility model is to provide a device for controlling thin film deposition distribution and a chemical vapor deposition equipment, so as to improve the problem that the existing regulation of thin film deposition distribution will affect the thickness and refractive index of the thin film.

[0006] The utility model provides a device for controlling thin film deposition distribution. The device is arranged on a chemical vapor deposition equipment, and the chemical vapor deposition equipment includes an upper cavity shell and a spray plate with through holes. An upper cavity is formed by enclosing the upper cavity shell and the spray plate. The device includes:

[0007] A diffuser, which is vertically movably adjustable and arranged above the spray plate in the upper cavity;

[0008] A driving mechanism, which is drivingly connected to the diffuser and used to drive the diffuser to perform vertical movement adjustment, so as to adjust the distance between the diffuser and the spray plate, and then adjust the gas flow distribution.

[0009] In a possible embodiment, the driving mechanism includes an adjusting rod arranged vertically, an adjusting gear rotatably arranged in the upper cavity housing, and a motor. The bottom end of the adjusting rod is connected to the top end of the diffuser. The adjusting gear is sleeved and threadedly connected to the adjusting rod. A driving gear is fixedly sleeved on the output shaft of the motor, and the driving gear is meshed and connected to the adjusting gear; or,

[0010] The driving mechanism includes a telescopic member arranged in the upper cavity housing and capable of telescopic adjustment.

[0011] In a possible embodiment, for the case where the driving mechanism includes the adjusting gear, the driving mechanism further includes a speed reduction gear meshed and connected between the adjusting gear and the driving gear, and the number of teeth of the speed reduction gear is greater than the number of teeth of the driving gear.

[0012] In a possible embodiment, there are at least two speed reduction gears. At least two speed reduction gears are sequentially meshed and connected between the adjusting gear and the driving gear, so that the torque of the driving gear is sequentially transmitted to the adjusting gear through at least two speed reduction gears. In the direction from the driving gear to the adjusting gear, the number of teeth of the speed reduction gear gradually increases.

[0013] In a possible embodiment, an air guide hole is provided at the top of the upper cavity housing. The upper cavity housing is communicated with a remote plasma source through the air guide hole. The remote plasma source is used to generate plasma, and the plasma enters the upper cavity through the air guide hole;

[0014] The diffuser is arranged corresponding to the air guide hole.

[0015] In a possible embodiment, for the case where the driving mechanism includes the adjusting gear, a through hole is provided through the adjusting gear.

[0016] In a possible embodiment, the adjusting rod passes through the air guide hole, and a vent gap is formed between the adjusting rod and the inner wall of the air guide hole. The upper cavity housing is provided with a receiving groove communicated with the air guide hole. The adjusting gear extends into the receiving groove from the air guide hole, and the through hole is located at the air guide hole to conduct gas;

[0017] The width of the receiving groove in the vertical direction is adapted to the thickness of the adjusting gear to limit the vertical movement of the adjusting gear. The motor is arranged outside the upper cavity housing. The adjusting gear partially extends out of the receiving groove and is meshed and connected to the driving gear; or,

[0018] The junction of the accommodation groove and the air guide hole is the notch of the accommodation groove. The size of the notch is adapted to the thickness of the adjusting gear to limit the vertical movement of the adjusting gear. The motor is arranged outside the upper cavity shell. The output shaft of the motor passes through the outer wall of the upper cavity shell and extends into the accommodation groove. The driving gear is located in the accommodation groove and is meshed and connected with the adjusting gear; or,

[0019] The junction of the accommodation groove and the air guide hole is the notch of the accommodation groove. The size of the notch is adapted to the thickness of the adjusting gear to limit the vertical movement of the adjusting gear. The motor and the driving gear are both arranged in the accommodation groove.

[0020] In a possible embodiment, for the case where the telescopic member is adopted for the driving mechanism, the top end of the telescopic member is fixed to the inner wall of the air guide hole through a support rod. The bottom end of the telescopic member is connected to the top end of the diffuser. An air-permeable gap is formed between the telescopic member and the inner wall of the air guide hole.

[0021] In a possible embodiment, for the case where the motor is adopted for the driving mechanism, the motor is a four-phase two-step motor or a 28BYJ stepping motor; or,

[0022] For the case where the adjusting rod is adopted for the driving mechanism, the adjusting rod is made of an alloy material resistant to corrosion and high temperature.

[0023] The present invention also provides a chemical vapor deposition device, including: an upper cavity shell, a spray plate, a lower cavity shell, and a device for controlling the distribution of film deposition in any of the above embodiments;

[0024] An upper cavity is formed by enclosing the upper cavity shell and the spray plate. The spray plate is provided with through holes for air ventilation;

[0025] A lower cavity is formed by enclosing the lower cavity shell and the spray plate. A rotating base for carrying a substrate is arranged in the lower cavity.

[0026] The beneficial effects of the device for controlling the thin film deposition distribution provided by the present utility model are as follows: The diffuser is driven by a driving mechanism to move vertically for adjustment, thereby adjusting the distance between the diffuser and the spray plate. When the distance is small, due to the air flow distribution, the amount of free radicals in the middle area of the substrate is less, while the amount of free radicals in the edge area of the substrate is more, resulting in a slower deposition rate in the middle area of the substrate and a faster deposition rate in the edge area. When the distance is large, due to the change in air flow distribution, the amount of free radicals in the middle area of the substrate is more, while the amount of free radicals in the edge area of the substrate is less, resulting in a faster deposition rate in the middle area of the substrate and a slower deposition rate in the edge area. By moving and adjusting the diffuser through the driving mechanism, the distribution of thin film deposition can be regulated, and it will not affect the thickness and refractive index of the thin film. In a further solution, by setting a speed reduction gear on the driving mechanism, more precise displacement adjustment of the diffuser can be achieved. In an even further solution, by setting perforations on the adjusting gear, the blockage of the air flow can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 FIG. is an installation schematic diagram of the device for controlling the thin film deposition distribution of the present utility model in the first specific embodiment.

[0028] Figure 2 、 Figure 3 、 Figure 4 FIGS. respectively show schematic diagrams of the air flow distribution in the upper chamber when the diffuser in the device for controlling the thin film deposition distribution of the present utility model is in different positions.

[0029] Figure 5 FIG. is an installation schematic diagram of the device for controlling the thin film deposition distribution of the present utility model in the second specific embodiment.

[0030] Figure 6 FIG. is an installation schematic diagram of the device for controlling the thin film deposition distribution of the present utility model in the third specific embodiment.

[0031] Figure 7 FIG. shows a schematic diagram of the diffuser, adjusting rod, and adjusting gear in the device for controlling the thin film deposition distribution of the present utility model.

[0032] Figure 8 FIG. is an installation schematic diagram of the device for controlling the thin film deposition distribution of the present utility model in another driving mode.

[0033] Description of the reference numerals: 110, diffuser; 120, driving mechanism; 121, adjusting rod; 122, adjusting gear; 1221, perforation; 123, motor; 124, driving gear; 125, speed reduction gear; 126, telescopic member; 1261, support rod; 210, upper cavity housing; 211, air guide hole; 212, accommodation groove; 220, spray plate; 221, through hole; 230, upper cavity; 240, remote plasma source; 250, lower cavity housing; 260, lower cavity; 270, rotating base; 280, substrate. Detailed implementation manners

[0034] For the purpose of making the objectives, technical solutions and advantages of the embodiments of the present utility model clearer, the technical solutions in the embodiments of the present utility model will be clearly and completely described below. Apparently, the described embodiments are some but not all of the embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0035] In view of the problems existing in the prior art, an embodiment of the present utility model provides a device for controlling the film deposition distribution. Refer to Figure 1 , this device is arranged on a chemical vapor deposition device, and the chemical vapor deposition device includes an upper cavity housing 210 and a spray plate 220 having a through hole 221. An upper cavity 230 is formed by enclosing the upper cavity housing 210 and the spray plate 220. This device includes a diffuser 110 and a driving mechanism 120. The diffuser 110 is vertically movably adjustable and arranged in the upper cavity 230 and above the spray plate 220. The driving mechanism 120 is drivingly connected to the diffuser 110 and is used to drive the diffuser 110 to perform vertical movement adjustment, thereby adjusting the distance between the diffuser 110 and the spray plate 220 to adjust the air flow distribution.

[0036] Refer to Figure 1 , Figure 2 and Figure 3 , by adjusting the driving mechanism 120 to move the diffuser 110 downward to shorten the distance between the diffuser 110 and the spray plate 220, so that the diffuser 110 is close to the spray plate 220. Due to the shielding effect of the diffuser 110, the air flow between the diffuser 110 and the spray plate 220 decreases, making more air flow along the diffuser 110 to the edge area of the spray plate 220, resulting in less air flow flowing out from the middle area of the spray plate 220 and more air flow flowing out from the edge area of the spray plate 220. Combining Figure 2 and Figure 8, a rotating base 270 is provided below the spray plate 220, and a substrate 280 is carried on the rotating base 270. According to the air flow distribution flowing from the spray plate 220 to the substrate 280, the amount of free radicals in the middle region of the substrate 280 is less, while the amount of free radicals in the edge region of the substrate 280 is more, resulting in a slower deposition rate in the middle region of the substrate 280 and a faster deposition rate in the edge region.

[0037] See Figure 1 , Figure 3 and Figure 4 , by adjusting the driving mechanism 120, the diffuser 110 is moved upward to increase the distance between the diffuser 110 and the spray plate 220, so that the diffuser 110 is far away from the spray plate 220. The air flow rate between the diffuser 110 and the spray plate 220 increases, resulting in more air flow flowing out from the middle region of the spray plate 220 and less air flow flowing out from the edge region of the spray plate 220. Combining Figure 4 and Figure 8 , the amount of free radicals in the middle region of the substrate 280 is more, while the amount of free radicals in the edge region of the substrate 280 is less, resulting in a faster deposition rate in the middle region of the substrate 280 and a slower deposition rate in the edge region.

[0038] Therefore, in the chemical vapor deposition process, the distance between the diffuser 110 and the spray plate 220 can be flexibly adjusted through the driving mechanism 120 to achieve the regulation of the air flow distribution, thereby controlling the distribution of thin film deposition. The adjustment principle is simple and will not affect the thickness and refractive index of the thin film.

[0039] It should be noted that the specific setting method of the driving mechanism 120 is not limited here, as long as it can meet the vertical movement adjustment of the diffuser 110. Two driving methods are given below for detailed explanation.

[0040] In one driving method, see Figure 1 , the driving mechanism 120 includes an adjusting rod 121 arranged vertically, an adjusting gear 122 rotatably arranged in the upper cavity shell 210, and a motor 123. The bottom end of the adjusting rod 121 is connected to the top end of the diffuser 110. The adjusting gear 122 is sleeved and threadedly connected to the adjusting rod 121. A driving gear 124 is fixedly sleeved on the output shaft of the motor 123, and the driving gear 124 is meshed and connected to the adjusting gear 122. Driven by the motor 123, the driving gear 124 rotates, driving the adjusting gear 122 meshed and connected to the driving gear 124 to rotate, and then driving the adjusting rod 121 threadedly connected to the adjusting gear 122 to move vertically, converting the rotational motion of the gear into the linear motion of the adjusting rod 121, thereby realizing the vertical displacement adjustment of the diffuser 110.

[0041] In one embodiment, see Figure 6, in the case where the drive mechanism 120 includes the adjustment gear 122, the drive mechanism 120 further includes a reduction gear 125 meshed and connected between the adjustment gear 122 and the drive gear 124, and the number of teeth of the reduction gear 125 is greater than that of the drive gear 124. Since the number of teeth of the reduction gear 125 is greater than that of the drive gear 124, the number of rotations of the reduction gear 125 per unit time is less than that of the drive gear 124. Through the speed reduction effect of the reduction gear 125, the vertical movement amount of the adjustment rod 121 can be accurately controlled, and further, the fine adjustment of the vertical movement amount of the diffuser 110 can be realized.

[0042] In a specific embodiment, referring to Figure 6 , there are at least two reduction gears 125, and the at least two reduction gears 125 are sequentially meshed and connected between the adjustment gear 122 and the drive gear 124, so that the torque of the drive gear 124 is sequentially transmitted to the adjustment gear 122 through the at least two reduction gears 125. In the direction from the drive gear 124 to the adjustment gear 122, the number of teeth of the reduction gear 125 gradually increases. Through the sequential meshing of the at least two reduction gears 125, the multi-stage speed reduction transmission of the torque of the drive gear 124 is realized. Through the precise transmission of the multi-stage reduction gears 125, the more fine control of the vertical displacement adjustment of the diffuser 110 can be realized.

[0043] In another embodiment, referring to Figure 1 and Figure 2 , a gas guide hole 211 is provided at the top of the upper cavity shell 210, and the upper cavity shell 210 is communicated with the remote plasma source 240 through the gas guide hole 211. The remote plasma source 240 is used to generate plasma, and the plasma enters the upper cavity 230 through the gas guide hole 211. The diffuser 110 is arranged corresponding to the gas guide hole 211 to better uniformly disperse the gas entering the upper cavity 230 from the gas guide hole 211. Specifically, the diffuser 110 is in a conical shape. The gas entering the upper cavity 230 from the gas guide hole 211 first flows to the top of the diffuser 110, and the gas flows along the outer wall of the diffuser 110 to the bottom of the diffuser 110, so that the gas can diffuse around.

[0044] Further, referring to Figure 7 , in the case where the drive mechanism 120 includes the adjustment gear 122, a perforation 1221 is provided through the adjustment gear 122. By providing the perforation 1221 on the adjustment gear 122, the gas can flow through the perforation 1221, avoiding the influence of the adjustment gear 122 on the gas flow. Specifically, there are several perforations 1221.

[0045] Even further, referring to Figure 1 and Figure 7, the adjusting rod 121 passes through the air guide hole 211, and a ventilation gap is formed between the adjusting rod 121 and the inner wall of the air guide hole 211. The upper cavity housing 210 is provided with a receiving groove 212 communicating with the air guide hole 211. The adjusting gear 122 extends into the receiving groove 212 from the air guide hole 211, and the perforation 1221 is located at the air guide hole 211 to conduct gas. The installation position of the motor 123 can be flexibly set according to the actual situation, and the following will be explained in combination with three specific embodiments.

[0046] In the first specific embodiment, refer to Figure 1 and Figure 7 , the width of the receiving groove 212 in the vertical direction is adapted to the thickness of the adjusting gear 122 to limit the vertical movement of the adjusting gear 122. The motor 123 is arranged outside the upper cavity housing 210, and a part of the adjusting gear 122 extends out of the receiving groove 212 and is meshed and connected with the driving gear 124.

[0047] In the second specific embodiment, refer to Figure 5 , the junction of the receiving groove 212 and the air guide hole 211 is the notch of the receiving groove 212. The size of the notch is adapted to the thickness of the adjusting gear 122 to limit the vertical movement of the adjusting gear 122. The motor 123 is arranged outside the upper cavity housing 210, and the output shaft of the motor 123 passes through the outer wall of the upper cavity housing 210 and extends into the receiving groove 212. The driving gear 124 is located in the receiving groove 212 and is meshed and connected with the adjusting gear 122.

[0048] In the third specific embodiment, refer to Figure 6 , the junction of the receiving groove 212 and the air guide hole 211 is the notch of the receiving groove 212. The size of the notch is adapted to the thickness of the adjusting gear 122 to limit the vertical movement of the adjusting gear 122. The motor 123 and the driving gear 124 are both arranged in the receiving groove 212.

[0049] When the adjusting gear 122 rotates, since the adjusting rod 121 is threadedly connected with the adjusting gear 122, and the receiving groove 212 plays a limiting role on the adjusting gear 122, the adjusting gear 122 will not displace relative to the adjusting rod 121, while the adjusting rod 21 will move vertically relative to the adjusting gear 122.

[0050] Preferably, refer to Figure 1 , the center lines of the adjusting rod 121, the diffuser 110, the air guide hole 211, and the spray plate 220 are collinearly arranged to improve the uniformity of air flow dispersion.

[0051] In some possible embodiments, in the case where the driving mechanism 120 employs the motor 123, the motor 123 is a four-two stepper motor 123 or a 28BYJ stepper motor 123. Among them, the 28BYJ stepper motor 123 has eight or more pairs of permanent magnet rotors, and the stepper motor 123 can achieve ultra-small angle rotation, and the rotation angle can be less than 5.625°. Or, in the case where the driving mechanism 120 employs the adjusting rod 121, the adjusting rod 121 is made of an alloy material resistant to corrosion and high temperature, such as alloy materials with strong stability like aluminum alloy, titanium alloy, nickel alloy, etc.

[0052] In another driving mode, referring to Figure 8 , the driving mechanism 120 includes a telescopic member 126 disposed in the upper cavity housing 210 and capable of telescopic adjustment. Specifically, the telescopic member 126 can be an electric telescopic rod, a micro cylinder or a micro hydraulic cylinder. By the telescopic adjustment of the telescopic member 126, the diffuser 110 can be driven to move vertically.

[0053] Furthermore, referring to Figure 8 , in the case where the driving mechanism 120 employs the telescopic member 126, the top end of the telescopic member 126 is fixed to the inner wall of the air guide hole 211 through the support rod 1261, the bottom end of the telescopic member 126 is connected to the top end of the diffuser 110, and a ventilation gap is formed between the telescopic member 126 and the inner wall of the air guide hole 211. The telescopic member 126 is supported in the air guide hole 211 through the support rod 1261. On the one hand, the support rod 1261 can provide stable support for the telescopic member 126, and on the other hand, it can avoid affecting gas flow.

[0054] Preferably, referring to Figure 8 , the central axes of the telescopic member 126, the diffuser 110, the air guide hole 211, and the spray plate 220 are collinearly arranged to improve the uniformity of air flow dispersion.

[0055] Next, the technical effects of the device for controlling the thin film deposition distribution of the present invention will be explained in detail.

[0056] 1. By driving the diffuser 110 to move vertically and adjust through the driving mechanism 120, the diffuser 110 and the spray plate 220 can be accurately adjusted, which can effectively adjust the air flow distribution. This adjustment method does not depend on changing the amount of the precursor, so the control of the thin film deposition distribution can be achieved without changing the film thickness and refractive index.

[0057] 2. By adopting the combination of the adjusting rod 121, the adjusting gear 122 and the motor 123, or by adopting the driving mode of the telescopic member 126, the automatic movement adjustment of the diffuser 110 can be realized.

[0058] 3. Under the deceleration effect of the speed reduction gear 125, the rotational speed of the adjustment gear 122 is less than that of the driving gear 124, so that the vertical movement amount of the adjustment rod 121 can be accurately controlled, and further the fine adjustment of the vertical movement amount of the diffuser 110 can be realized.

[0059] The present utility model also provides a chemical vapor deposition device, comprising: an upper cavity housing 210, a spray plate 220, a lower cavity housing 250, and a device for controlling the thin film deposition distribution as described in any one of the above embodiments. An upper cavity 230 is formed by enclosing the upper cavity housing 210 and the spray plate 220. The spray plate 220 is provided with through holes 221 for ventilation. A lower cavity 260 is formed by enclosing the lower cavity housing 250 and the spray plate 220. A rotating base 270 for carrying a substrate 280 is provided in the lower cavity 260.

[0060] Although the embodiments of the present utility model have been described in detail above, it is obvious to those skilled in the art that various modifications and changes can be made to these embodiments. However, it should be understood that such modifications and changes are all within the scope and spirit of the present utility model described in the claims. Moreover, the present utility model described herein may have other embodiments and can be implemented or realized in various ways. Unless otherwise defined, the technical terms or scientific terms used herein should have the ordinary meaning understood by those of ordinary skill in the art to which the present utility model belongs. The words such as "comprising" used herein mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

Claims

1. A device for controlling the distribution of thin film deposition, characterized in that: The device is arranged on a chemical vapor deposition device, the chemical vapor deposition device comprises an upper cavity shell and a shower plate with through holes, the upper cavity shell and the shower plate enclose an upper cavity, and the device comprises: A diffuser is vertically movable and adjustable in the upper chamber and is located above the spray plate; The driving mechanism is connected to the diffuser and used to drive the diffuser to perform vertical movement adjustment, thereby adjusting the distance between the diffuser and the spray plate to adjust the airflow distribution.

2. The device for controlling thin film deposition distribution according to claim 1, characterized in that: The driving mechanism includes a vertically arranged adjusting rod, an adjusting gear rotatably arranged on the upper chamber shell, and a motor, the bottom end of the adjusting rod is connected to the top end of the diffuser, the adjusting gear is sleeved and threadedly connected to the adjusting rod, and a driving gear is fixedly sleeved on the output shaft of the motor, and the driving gear is meshed and connected with the adjusting gear; or, The driving mechanism comprises a telescopic member which is arranged in the upper cavity shell and can be telescopically adjusted.

3. The device for controlling the deposition distribution of a thin film according to claim 2, characterized in that: In the case where the driving mechanism includes the adjusting gear, the driving mechanism further includes a speed reduction gear meshingly connected between the adjusting gear and the driving gear, and the number of teeth of the speed reduction gear is greater than the number of teeth of the driving gear.

4. The device for controlling the thin film deposition distribution according to claim 3, characterized in that: There are at least two deceleration gears, and at least two of the deceleration gears are meshed and connected in sequence between the adjusting gear and the driving gear, so that the torque of the driving gear is transmitted to the adjusting gear through at least two deceleration gears in sequence, and the number of teeth of the deceleration gear gradually increases from the driving gear to the adjusting gear.

5. The device for controlling thin film deposition distribution according to claim 2, characterized in that: A gas guide hole is provided on the top of the upper chamber shell, and the upper chamber shell is connected with a remote plasma source through the gas guide hole. The remote plasma source is used to generate plasma, and the plasma enters the upper chamber through the gas guide hole; The diffuser is arranged corresponding to the air guide hole.

6. The device for controlling thin film deposition distribution according to claim 5, characterized in that: In the case where the driving mechanism includes the adjusting gear, the adjusting gear is provided with a through hole therethrough.

7. The device for controlling thin film deposition distribution according to claim 6, characterized in that: The adjusting rod passes through the air guide hole and a ventilated gap is formed between the adjusting rod and the inner wall of the air guide hole, the upper cavity shell is provided with a receiving groove connected with the air guide hole, the adjusting gear extends from the air guide hole into the receiving groove, and the through hole is located at the air guide hole to conduct gas; The width of the accommodating groove in the vertical direction is adapted to the thickness of the adjusting gear to limit the vertical movement of the adjusting gear. The motor is arranged outside the upper cavity shell, and the adjusting gear part extends out of the accommodating groove and is meshed and connected with the driving gear. or, The intersection of the accommodating groove and the air guide hole is a notch of the accommodating groove, the size of the notch is adapted to the thickness of the adjusting gear to limit the vertical movement of the adjusting gear, the motor is arranged outside the upper cavity shell, the output shaft of the motor passes through the outer wall of the upper cavity shell and extends into the accommodating groove, the driving gear is located in the accommodating groove and meshedly connected with the adjusting gear; or, The intersection of the accommodating groove and the air guide hole is a notch of the accommodating groove, and the size of the notch is adapted to the thickness of the adjusting gear to limit the vertical movement of the adjusting gear. The motor and the driving gear are both arranged in the accommodating groove.

8. The device for controlling the deposition distribution of a thin film according to claim 5, characterized in that: In the case where the driving mechanism adopts the telescopic part, the top end of the telescopic part is fixed to the inner wall of the air guide hole through a support rod, the bottom end of the telescopic part is connected to the top end of the diffuser, and a ventilation gap is formed between the telescopic part and the inner wall of the air guide hole.

9. The device for controlling the deposition distribution of a thin film according to any one of claims 2 to 8, characterized in that: In the case where the driving mechanism adopts the motor, the motor is a 42 stepping motor or a 28BYJ stepping motor; or, In the case where the driving mechanism adopts the adjusting rod, the adjusting rod is made of a corrosion-resistant and high-temperature-resistant alloy material.

10. A chemical vapor deposition device, characterized in that: include: An upper chamber shell, a shower plate, a lower chamber shell, and a device for controlling the distribution of thin film deposition as claimed in any one of claims 1 to 9; The upper cavity shell and the spray plate are enclosed to form an upper cavity, and the spray plate is provided with a through hole for ventilation; The lower chamber shell and the spray plate are enclosed to form a lower chamber, and a rotating base for carrying a substrate is arranged in the lower chamber.

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