Stripping device for verifying performance of photoresist stripping liquid

Abstract

The utility model relates to the technical field of panel preparation, and provides a stripping device for verifying the performance of photoresist stripping liquid, which comprises a spraying tank, a particle counting component and a carrier plate, the spraying tank is used for accommodating the stripping liquid, the spraying tank comprises a spraying end, and the spraying end is used for spraying the stripping liquid in the spraying tank so as to strip photoresist on a substrate. According to the stripping device for verifying the performance of the photoresist stripping liquid, the spraying tank and the carrier plate are arranged, a substrate with photoresist is placed on the carrier plate, and the stripping liquid is sprayed in the spraying tank, so that a photoresist stripping experiment of the substrate is carried out, and the particle content in the stripping liquid is detected through the particle counting assembly; the photoresist stripping performance and the service life of the stripping liquid are verified, the verification operation of the stripping liquid on a production line is avoided, and meanwhile, the consumption of consumables and the stripping liquid in the verification process is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of panel preparation, in particular to a stripping device for verifying the performance of a photoresist stripping solution. Background Art

[0002] Photoresist is an etching-resistant material whose solubility changes after being irradiated by light, electron beam, ion beam, etc. It is widely used in the microfabrication of panels, integrated circuits, and semiconductor discrete devices. By coating a positive photoresist on the surface of different material films, the positive photoresist pattern formed after exposure and development protects the underlying material. Then, the unprotected underlying material is etched through dry etching or wet etching to obtain the required pattern. Finally, the positive photoresist pattern is removed by cleaning with a stripping solution. For example, in the photoresist stripping method and photoresist stripping device with the publication number CN103995441A, the photoresist on the substrate surface is stripped by a photoresist stripping solution.

[0003] Organic stripping solutions usually consist of alkanolamines, amide solvents, alcohol ether solvents, corrosion inhibitors, surfactants, etc. When the processes related to stripping change, the corresponding stripping solution needs to be formulated and adjusted to meet the process requirements. For example, when the types of positive photoresist change, the original stripping solution formula may not be able to effectively clean the new positive photoresist film layer. When the metal film layer protected by the photoresist pattern changes, the original stripping solution formula may corrode the new metal film layer. During some stripping processes for stripping the positive photoresist pattern film layer, the stripping solution may also come into contact with other organic film layers in the substrate structure. For example, when stripping after etching the anode pattern of the pixel layer in an OLED product, the stripping solution will contact the underlying organic layer PLN film layer of the anode pattern. The PLN film layer is a film layer obtained after curing an acrylate resin. When the resin used in the PLN film layer is changed, the original stripping solution formula may corrode the new PLN film layer, causing the anode pattern to collapse and deform. In summary, when other processes or materials related to the stripping process change, it is usually necessary to adjust the stripping solution formula, such as replacing alkanolamines, adjusting the content of corrosion inhibitors, or changing the type of corrosion inhibitors. After the stripping solution formula is adjusted and changed, the performance of the new formula needs to be verified, and only after passing the verification can it be introduced into the production process.

[0004] However, when verifying a new formula stripping solution, it is often directly verified on the production line corresponding to the process. Especially when verifying the life of the liquid medicine, that is, the ability of a certain amount of liquid medicine to process the number of substrates, a large amount of stripping solution liquid medicine and a large number of different types of substrates are required, and the corresponding production line cannot operate normally during the verification, wasting a large amount of production capacity. Summary of the Utility Model

[0005] In view of this, the present utility model provides a stripping device for verifying the performance of a photoresist stripping liquid. By arranging a spray tank and a carrier plate, a substrate with photoresist is placed on the carrier plate, and the stripping liquid is sprayed in the spray tank to perform the photoresist stripping experiment on the substrate. Then, the particle counting component is used to detect the particle content in the stripping liquid, so as to verify the photoresist stripping performance and service life of the stripping liquid, avoiding the verification operation of the stripping liquid on the production line and reducing the consumption of consumables and stripping liquid during the verification process.

[0006] The technical solution of the present utility model is realized as follows: The present utility model provides a stripping device for verifying the performance of a photoresist stripping liquid, including a spray tank, a particle counting component and a carrier plate. Among them,

[0007] The spray tank is used to contain the stripping liquid. The spray tank includes a spray end, and the spray end is used to spray the stripping liquid in the spray tank to strip the photoresist on the substrate;

[0008] The particle counting component includes a detection inlet end and a detection outlet end. Both the detection inlet end and the detection outlet end are connected to the spray tank, so that the stripping liquid in the spray tank flows through the detection inlet end into the particle counting component and returns to the spray tank from the detection outlet end. The particle counting component is used to detect the particle size and quantity in the stripping liquid;

[0009] The carrier plate is arranged in the spray tank, and the carrier plate is used to place the substrate so that the side of the substrate with photoresist faces the spray end.

[0010] On the basis of the above technical solutions, preferably, the spray tank further includes a tank body and a liquid supply pipe. Among them,

[0011] The tank body is fixed to the spray end, and the spray end is arranged inside the tank body;

[0012] The liquid supply pipe is connected to the tank body and the spray end, so that the stripping liquid in the tank body can flow to the spray end.

[0013] Further preferably, it further includes a feeding chamber, which is relatively fixed to the tank body and connected to the tank body. A diversion end is arranged on the liquid supply pipe, and the diversion end extends into the feeding chamber. The feeding chamber is used to put photoresist powder into it so that it enters the tank body.

[0014] Further preferably, the spray tank further includes a liquid replenishing chamber, which is relatively fixed to the tank body and connected to the inside of the tank body to replenish the stripping liquid into the tank body.

[0015] Further preferably, the spray tank further includes a plate changing chamber, which is arranged on the tank body and connected to the inside of the tank body. The carrier plate is movably arranged in the tank body so that the carrier plate can be moved into the plate changing chamber.

[0016] Further preferably, the spray tank further includes an observation window, and the observation window is embedded on the outer side of the tank body.

[0017] Based on the above technical solutions, preferably, it further includes a heating device, and the heating device is fixed at the bottom of the spray tank and extends into the spray tank to heat the stripping liquid in the spray tank.

[0018] Further preferably, it further includes a stirring device, and the stirring device is arranged on the spray tank. The stirring device includes a stirring end, and the stirring end is arranged inside the spray tank to stir the stripping liquid in the spray tank.

[0019] Based on the above technical solutions, preferably, the particle counting assembly includes a transfer pump and a particle counter. Among them,

[0020] The input end of the transfer pump is communicated with the inside of the spray tank;

[0021] The input end of the particle counter is communicated with the output end of the transfer pump, and the output end of the particle counter is communicated with the spray tank, so that the stripping liquid conveyed by the transfer pump enters the particle counter and then returns to the spray tank.

[0022] Based on the above technical solutions, preferably, the carrier plate is provided with a receiving groove and a through hole. The receiving groove is used for receiving the substrate, and the through hole is communicated with the receiving groove, so that the stripping liquid can flow downward through the carrier plate.

[0023] The stripping device for verifying the performance of the photoresist stripping liquid of the present utility model has the following

[0024] Advantages:

[0025] (1) By setting the spray tank and the carrier plate, the substrate with photoresist is placed on the carrier plate, and the stripping liquid spraying operation is carried out in the spray tank, so as to carry out the photoresist stripping experiment of the substrate. Then, the particle content in the stripping liquid is detected through the particle counting assembly to verify the photoresist stripping performance and service life of the stripping liquid, avoiding the verification operation of the stripping liquid on the production line and reducing the consumption of consumables and stripping liquid during the verification process;

[0026] (2) By setting the heating device, the viewing window and the feeding chamber, the performance of the new formula of the stripping liquid can be verified by simulating the process conditions of the production line, that is, under certain temperature and pressure conditions, the positive photoresist pattern on the surface of the substrate is cleaned and removed by the spraying mode, so as to verify the cleaning ability of the new formula of the stripping liquid for the photoresist pattern on the surface of different film layers under different temperature and pressure conditions, the corrosion inhibition effect on metal film layers and organic film layers of different materials, and at the same time, the evaporation rate of the stripping liquid, the foaming amount of the stripping liquid, and the service life of the stripping liquid can also be verified. Description of the Drawings

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0028] Figure 1 It is a schematic structural diagram of a stripping device for verifying the performance of a photoresist stripping solution of the present invention. Specific embodiments

[0029] The following will combine the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present invention.

[0030] As Figure 1 shown, the stripping device for verifying the performance of the photoresist stripping solution of the present invention includes a spray tank 1, a particle counting assembly 2 and a carrier plate 3.

[0031] The spray tank 1 is used to contain the stripping solution. The spray tank 1 includes a spray end 11, and the spray end 11 is used to spray the stripping solution in the spray tank 1 to strip the photoresist on the substrate. The main body of the spray tank 1 is a tank body 12, which is made of stainless steel and is vertically arranged. In the tank body 12, the spray end 11 is located at the inner top of the tank body 12 and is fixed to the tank body 12. The stripping solution with a liquid level within a certain range is stored in the tank body 12, and this stripping solution is the stripping solution whose stripping performance needs to be verified. On the tank body 12, an exhaust pipe is also provided, and a valve is installed on the exhaust pipe. During the use process, the stripping solution will generate waste gas, which can be directly discharged through the exhaust pipe.

[0032] The particle counting assembly 2 includes a detection inlet end and a detection outlet end. Both the detection inlet end and the detection outlet end are connected to the spray tank 1, so that the stripping solution in the spray tank 1 flows through the detection inlet end into the particle counting assembly 2 and returns to the spray tank 1 from the detection outlet end. The particle counting assembly 2 is used to detect the particle size and quantity in the stripping solution. That is, the stripping solution in the spray tank 1 circulates through the particle counting assembly 2, and the particle counting assembly 2 detects the particle size and quantity of the circulating stripping solution.

[0033] It should be noted that when the concentration of photoresist in the stripping solution reaches or exceeds the solubility of the photoresist in the stripping solution, the excess photoresist will not dissolve in the stripping solution. At this time, the number of particles with different particle sizes in the stripping solution will increase by an order of magnitude or even geometrically. The solubility of the stripping solution in the photoresist can be confirmed by the change in the number of particles in the stripping solution. That is to say, the particle counting component 2 can count the particles in the flowing stripping solution to determine the photoresist stripping performance of the stripping solution.

[0034] The carrier plate 3 is arranged in the spray tank 1. The carrier plate 3 is used to place the substrate so that the side of the substrate with the photoresist faces the spray end 11.

[0035] When stripping the photoresist on the substrate, the carrier plate 3 and the substrate need to be placed flat in the tank body 12 together. The carrier plate 3 is located above the liquid level of the stripping solution and is directly opposite to the spray end 11 so that the sprayed stripping solution can evenly and accurately fall on the substrate.

[0036] Through the confirmation of the stripping effect of the sample substrate under process conditions, to verify the change in the stripping ability of the stripping solution on the photoresist on the substrate surface and the change in the corrosion degree on different film layers such as metal aluminum and organic film layers at different photoresist concentrations.

[0037] In this embodiment, the spray tank 1 further includes a liquid supply pipe 13. The tank body 12 is fixed to the spray end 11, and the spray end 11 is arranged inside the tank body 12. The liquid supply pipe 13 communicates the tank body 12 with the spray end 11 so that the stripping solution in the tank body 12 can flow to the spray end 11. The spray end 11 is several nozzles fixed on the top inner wall of the tank body 12. The liquid supply pipe 13 is connected to the tank body 12 through the connecting nozzles. A liquid supply pump is arranged on the liquid supply pipe 13 to realize the pumping of the stripping solution in the tank body 12 and the transmission of the stripping solution. In addition, in order to make the spraying pressure of the stripping solution adjustable during the experiment, a pressure gauge and a valve are also arranged on the liquid supply pipe 13. The pressure change of the stripping solution in the pipe can be monitored through the pressure gauge, and the valve can adjust the opening degree to realize the adjustment of the spraying pressure, thereby providing more adjustable parameters for the experiment.

[0038] As a preferred embodiment, a feeding chamber 4 is also provided. The feeding chamber 4 is relatively fixed to the tank body 12 and communicates with the tank body 12. A shunt end is arranged on the liquid supply pipe 13, and the shunt end extends into the feeding chamber 4. The feeding chamber 4 is used to put the photoresist powder so that it enters the tank body 12.

[0039] The provided feeding chamber 4 is connected to the tank body 12 through a pipeline, and a valve is also provided on this pipeline. Meanwhile, a cover plate is provided above the feeding chamber 4. This setting is for confirming the performance of the stripping liquid at different photoresist concentrations. Specifically, the cover plate can be opened, and a certain amount of photoresist powder can be put into the feeding chamber 4. The liquid supply pipe 13 sends the stripping liquid into the feeding chamber 4 through the shunt end, so that the photoresist powder is brought into the stripping liquid in the tank body 12. It should be noted that a valve is also provided on the shunt end. This valve is closed when performing the photoresist stripping test on the substrate and opened when conducting this experiment. Correspondingly, the confirmation of its performance can be directly carried out through the particle counting component 2.

[0040] In this embodiment, the spray tank 1 further includes a liquid replenishing chamber 14. The liquid replenishing chamber 14 is relatively fixed to the tank body 12 and is connected to the inside of the tank body 12 to replenish the stripping liquid into the tank body 12.

[0041] The provided liquid replenishing chamber 14 is connected to the tank body 12 through a pipeline, and a valve is correspondingly provided on this pipeline. When replenishing the stripping liquid into the tank body 12, this valve is opened, and vice versa, it is in a closed state in other situations.

[0042] As a preferred embodiment, the spray tank 1 further includes a substrate changing chamber 15. The substrate changing chamber 15 is provided on the tank body 12 and is connected to the inside of the tank body 12. The carrier plate 3 is movably arranged in the tank body 12 so that the carrier plate 3 can be moved into the substrate changing chamber 15.

[0043] A linearly slidable member is provided on the tank body 12, which can be selected as a straight rod. One end of the straight rod is located outside the substrate changing chamber 15, and the other end is placed inside the tank body 12. The carrier plate 3 is fixed to the end of the straight rod located inside the tank body 12. By pulling the straight rod to drive the carrier plate 3 to move inside the tank body 12, the carrier plate 3 can be made to enter the substrate changing chamber 15. A hatch door is provided on the substrate changing chamber 15. By opening the hatch door, the substrate can be taken, placed, or replaced in the substrate changing chamber 15, thus making it more convenient for manual operation of the experiment.

[0044] In this embodiment, the spray tank 1 further includes an observation window 16. The observation window 16 is embedded on the outer side of the tank body 12.

[0045] During the experiment, through the observation window 16, the liquid level height of the stripping liquid can be confirmed, especially the initial liquid level height and the current height of the test, so as to calculate the evaporation rate of the stripping liquid, that is, the volume reduction amount of the stripping liquid per unit time under the process conditions. In addition, the foam height of the liquid level can also be determined through the observation window 16, that is, the change amount of the foam height generated by the stripping liquid at different photoresist concentrations.

[0046] In this embodiment, a heating device 5 is also provided. The heating device 5 is fixed at the bottom of the spray tank 1 and extends into the spray tank 1 to heat the stripping liquid in the spray tank 1.

[0047] The heating device 5 can be selected as a heating rod, and the stripping liquid inside the tank 12 is heated by the heating device 5, thereby changing the temperature of the stripping liquid to achieve the stripping effect of the stripping liquid under different temperature conditions, especially for the temperature adjustment test of stripping liquids with different amine contents.

[0048] This setting can simulate the process conditions of the production line to verify the performance of the new stripping solution formula, that is, the positive photoresist pattern on the surface of the substrate is cleaned and removed in a spray mode under certain temperature and pressure conditions, so as to verify the cleaning ability of the new stripping solution formula on the photoresist patterns on the surfaces of different film layers under different temperature and pressure conditions, and the corrosion inhibition effect on metal film layers and organic film layers of different materials. At the same time, the evaporation rate of the stripping solution, the foaming amount of the stripping solution, and the life of the stripping solution can also be verified.

[0049] Among them, the faster the volatilization rate, the more waste gas is generated, and the stripping liquid needs to be replenished after volatilization, which will increase the consumption of the stripping liquid. When the stripping liquid produces too much foam, the foam will be adsorbed on the surface of the photoresist film layer, hindering the stripping liquid from contacting the photoresist film layer and affecting the stripping liquid's cleaning and stripping ability.

[0050] As a preferred embodiment, a stirring device 6 is further provided. The stirring device 6 is provided on the spray tank 1 . The stirring device 6 includes a stirring end. The stirring end is provided inside the spray tank 1 to stir the stripping liquid in the spray tank 1 .

[0051] The stirring device 6 mainly includes a motor and a stirring paddle. The motor is fixed on the tank body 12. The stirring paddle is arranged inside the tank body 12 and is transmission-connected to the output end of the motor. The stirring device 6 can make the stripping liquid heated inside the tank body 12 and the photoresist powder put in flow and mix quickly, so as to avoid uneven temperature of the stripping liquid or different concentration of the photoresist powder affecting the accuracy of the test.

[0052] In this embodiment, the particle counting component 2 includes a transmission pump 21 and a particle counter 22. The input end of the transmission pump 21 is connected to the interior of the spray tank 1, the input end of the particle counter 22 is connected to the output end of the transmission pump 21, and the output end of the particle counter 22 is connected to the spray tank 1, so that the stripping liquid transported by the transmission pump 21 enters the particle counter 22 and then returns to the spray tank 1.

[0053] As a preferred embodiment, a receiving groove and a through hole are provided on the carrier plate 3 , wherein the receiving groove is used to receive the substrate, and the through hole is connected to the receiving groove so that the stripping liquid can flow downward through the carrier plate 3 .

[0054] The size of the provided accommodation groove can be larger than that of the carrier plate 3. During the test, the stripping liquid sprayed onto the carrier plate 3 can directly flow downward through the through holes and be mixed with the stripping liquid stored inside the tank body 12, avoiding the retention of the stripping liquid on the carrier plate 3 and affecting the accuracy of the test.

[0055] The above are only the preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A stripping device for verifying the performance of a photoresist stripping solution, characterized in that: It comprises a spray tank (1), a particle counting assembly (2) and a carrier plate (3), wherein: The spray tank (1) is used to contain a stripping liquid, and the spray tank (1) comprises a spray end (11), and the spray end (11) is used to spray the stripping liquid in the spray tank (1) to strip the photoresist on the substrate; The particle counting component (2) comprises a detection inlet and a detection outlet, both of which are connected to the spray tank (1), so that the stripping liquid in the spray tank (1) flows into the particle counting component (2) through the detection inlet and flows back to the spray tank (1) from the detection outlet. The particle counting component (2) is used to detect the size and quantity of particles in the stripping liquid. The carrier plate (3) is arranged in the spray tank (1), and the carrier plate (3) is used to place a substrate so that a side of the substrate having the photoresist faces the spray end (11).

2. The stripping device for verifying the performance of a photoresist stripping solution according to claim 1, characterized in that: The spray tank (1) further comprises a tank body (12) and a liquid supply pipe (13), wherein: The tank body (12) is fixed to the spray end (11), and the spray end (11) is arranged inside the tank body (12); The liquid supply pipe (13) connects the tank body (12) and the spray end (11) so that the stripping liquid in the tank body (12) can flow to the spray end (11).

3. The stripping device for verifying the performance of the photoresist stripping solution according to claim 2, characterized in that: The invention also comprises a feeding chamber (4), wherein the feeding chamber (4) is relatively fixed to the tank body (12) and is in communication with the tank body (12); a diversion end is provided on the liquid supply pipe (13), and the diversion end extends into the feeding chamber (4); the feeding chamber (4) is used for placing photoresist powder so as to allow the powder to enter the tank body (12).

4. The stripping device for verifying the performance of a photoresist stripping solution according to claim 2, characterized in that: The spray tank (1) further comprises a liquid replenishing chamber (14), wherein the liquid replenishing chamber (14) is relatively fixed to the tank body (12) and is communicated with the interior of the tank body (12) so as to replenish the stripping liquid into the tank body (12).

5. The stripping device for verifying the performance of a photoresist stripping solution according to claim 2, characterized in that: The spray tank (1) further comprises a plate changing chamber (15), wherein the plate changing chamber (15) is arranged on the tank body (12) and is in communication with the interior of the tank body (12), and the carrier plate (3) is movably arranged in the tank body (12) so that the carrier plate (3) can be moved into the plate changing chamber (15).

6. The stripping device for verifying the performance of a photoresist stripping solution according to claim 2, characterized in that: The spray tank (1) further comprises an observation window (16), wherein the observation window (16) is embedded on the outside of the tank body (12).

7. The stripping device for verifying the performance of a photoresist stripping solution according to claim 1, characterized in that: It also comprises a heating device (5), which is fixed at the bottom of the spray tank (1) and extends into the spray tank (1) to heat the stripping liquid in the spray tank (1).

8. The stripping device for verifying the performance of a photoresist stripping solution according to claim 7, characterized in that: It also comprises a stirring device (6), which is arranged on the spray tank (1). The stirring device (6) comprises a stirring end, which is arranged inside the spray tank (1) to stir the stripping liquid in the spray tank (1).

9. The stripping device for verifying the performance of a photoresist stripping solution according to claim 1, characterized in that: The particle counting assembly (2) comprises a transmission pump (21) and a particle counter (22), wherein: The input end of the transmission pump (21) is in communication with the interior of the spray tank (1); The input end of the particle counter (22) is connected to the output end of the transmission pump (21), and the output end of the particle counter (22) is connected to the spray tank (1), so that the stripping liquid transported by the transmission pump (21) enters the particle counter (22) and then returns to the spray tank (1).

10. The stripping device for verifying the performance of a photoresist stripping solution according to claim 1, characterized in that: The carrier plate (3) is provided with a receiving groove and a through hole, the receiving groove is used to receive the substrate, and the through hole is connected to the receiving groove so that the stripping liquid can pass through the carrier plate (3) and flow downward.

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