Double-pulse water-jet guided laser processing system
By adopting the polarized beam combining technology of dual-pulse laser in water-conducting laser technology, the problems of limited laser parameters and reduced beam quality after multi-laser beam combining are solved, and efficient water-conducting laser processing is achieved.
Patent Information
- Application Number
- CN202422094299.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-28
- Publication Date
- 2025-06-06
- Estimated Expiration
- 2034-08-28
AI Technical Summary
In the existing water-conducting laser technology, the laser parameters are limited and difficult to adjust, resulting in a certain laser that can only be used for processing a specific type of material, and the power is increased after the multi-laser beam is combined but the beam quality is reduced.
Using a dual-pulse water-conducting laser processing system, the laser beam combination of the laser emission direction of the first laser and the second laser is combined with the polarizer to realize the polarization beam combination of the laser, and the multi-laser beam combination is used to form an efficient coupled water beam for water-conducting laser processing through the beam combination mirror, beam expansion system and coupling system.
While ensuring the quality of the light beam, the quality and efficiency of the water-conducting laser are improved, and the material can be removed more effectively and the processing efficiency can be improved.
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Figure CN222944711U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of water-conducting processing and relates to a double-pulse water-conducting laser processing system. Background Art
[0002] Water-guided laser technology is an advanced manufacturing method that combines laser cutting and water jet technology. The laser beam generated by a high-power laser is guided by a fine water nozzle for high-precision and low-heat-affected processing. The water flow not only guides the laser beam, but also plays a cooling role during the processing, significantly reducing the heat-affected zone and avoiding material deformation or performance degradation. This technology is suitable for a variety of materials, such as metals, ceramics, glass and composites, and is expected to be widely used in electronic manufacturing, medical devices, aerospace and automotive industries. Water-guided laser technology mainly relies on the high energy of the laser to achieve material removal, so the laser parameters have a significant impact on the processing effect. In particular, parameters such as power, pulse width, and frequency.
[0003] However, since the power, pulse width, frequency and other parameters are limited by the laser itself and are not adjustable, a certain laser can only process one type of material, which has great limitations. Although the use of multiple laser beams can combine the advantages of each laser and improve the processing quality and efficiency, the lasers generated by different lasers are mostly irrelevant. Simply combining multiple laser beams together will only increase the power but reduce the beam quality.
[0004] Therefore, a device is needed to couple multiple lasers into a water jet while ensuring the beam quality to solve the above technical problems. Utility Model Content
[0005] The technical solution adopted by the utility model to solve the technical problem is: a double-pulse water-conducting laser processing system, comprising: a first laser and a second laser; the laser emission direction of the first laser faces the incident direction of the first polarizer, the emission direction of the first polarizer faces the incident direction of the first half-wave plate, and the emission direction of the first half-wave plate faces the incident direction of the second polarizer; the laser emission direction of the second laser faces the incident direction of the third polarizer, the emission direction of the third polarizer faces the incident direction of the second half-wave plate, and the emission direction of the second half-wave plate faces the incident direction of the fourth polarizer;
[0006] The emission direction of the second polarizer is toward the incident mirror surface of the reflector, and the reflection direction of the reflector is toward the reflection mirror surface of the beam combiner; the emission direction of the fourth polarizer is toward the incident mirror surface of the beam combiner;
[0007] The beam combiner combines the outgoing light from the second polarizer with the outgoing light from the fourth polarizer and then emits them to the beam expansion system. The beam expansion light of the beam expansion system is emitted toward the coupling system. The coupled water beam emitted by the coupling system after coupling is used for water-guided laser processing.
[0008] Preferably, the first laser and the second laser are electrically connected to a pulse modulator respectively, and the pulse modulator is also electrically connected to a central control system.
[0009] Preferably, the polarization directions of the second polarizer and the fourth polarizer are perpendicular to each other.
[0010] Preferably, the angle between the incident mirror surface of the reflector and the outgoing light of the second polarizer is 45°, the angle between the incident mirror surface of the beam combiner and the outgoing light of the fourth polarizer is 45°, and the angle between the reflecting mirror surface of the beam combiner and the reflected light of the reflector is 45°.
[0011] Preferably, the laser parameters of the first laser are: 532nm nanosecond laser, pulse width 400ns.
[0012] More preferably, the laser parameters of the second laser are: 532nm picosecond laser, pulse width 50ps.
[0013] More preferably, the pulse delay of the second laser relative to the first laser is 100 ns.
[0014] The beneficial effects of the utility model are:
[0015] The utility model combines two pulse laser beams for water-conducting laser processing and combines multiple lasers for polarization beams, thereby improving the quality and efficiency of water-conducting lasers while ensuring the quality of the beams. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 The utility model is a schematic diagram of a double-pulse water-conducting laser processing system.
[0017] Among them, 101, the first laser; 102, the second laser; 201, the first polarizer; 202, the second polarizer; 203, the third polarizer; 204, the fourth polarizer; 301, the first half-wave plate; 302, the second half-wave plate; 401, the reflector; 501, the beam combiner; 601, the beam expansion system; 701, the coupling system; 702, the coupled water beam; 801, the central control system; 901, the pulse modulator. DETAILED DESCRIPTION
[0018] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the relevant technologies in the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0019] refer to Figure 1 Due to the different parameters of different lasers, the processing effects after coupling with water jets are also different. This embodiment improves the processing quality and efficiency by combining two different beams.
[0020] A double-pulse water-conducting laser processing system comprises: a first laser 101 and a second laser 102; the laser emission direction of the first laser 101 faces the incident direction of the first polarizer 201, the emission direction of the first polarizer 201 faces the incident direction of the first half-wave plate 301, and the emission direction of the first half-wave plate 301 faces the incident direction of the second polarizer 202; the laser emission direction of the second laser 102 faces the incident direction of the third polarizer 203, the emission direction of the third polarizer 203 faces the incident direction of the second half-wave plate 302, and the emission direction of the second half-wave plate 302 faces the incident direction of the fourth polarizer 204;
[0021] The emission direction of the second polarizer 202 is toward the incident mirror surface of the reflector 401, and the reflection direction of the reflector 401 is toward the reflecting mirror surface of the beam combiner 501; the emission direction of the fourth polarizer 204 is toward the incident mirror surface of the beam combiner 501; the beam combiner 501 combines the laser light emitted by the first laser 101 with the laser light emitted by the second laser 102, so that the laser light emitted by the beam combiner 501 has higher power and does not reduce the beam quality;
[0022] The beam combiner 501 combines the outgoing light of the second polarizer 202 with the outgoing light of the fourth polarizer 204 and emits the combined light to the beam expansion system 601. The expanded light of the beam expansion system 601 is emitted toward the coupling system 701. The coupled water beam 702 emitted after coupling by the coupling system 701 is used for water-guided laser processing. After the laser emitted by the first laser 101 and the laser emitted by the second laser 102 are combined, the coupled water beam 702 can interact with the material for a longer time, thereby improving the material removal efficiency.
[0023] Furthermore, the first laser 101 and the second laser 102 are electrically connected to the pulse modulator 901 respectively, and the pulse modulator 901 is also electrically connected to the central control system 801; the pulse modulator 901 and the central control system 801 are used to adjust the laser parameters and pulse delay of the first laser 101 and the second laser 102, so that the laser emitted by the first laser 101 and the laser emitted by the second laser 102 are polarized and combined, with enhanced coherence and higher power.
[0024] Furthermore, the polarization directions of the second polarizer 202 and the fourth polarizer 204 are perpendicular to each other.
[0025] Furthermore, the incident mirror surface of the reflector 401 and the outgoing light angle of the second polarizer 202 are 45°, the incident mirror surface of the beam combiner 501 and the outgoing light angle of the fourth polarizer 204 are 45°, and the reflecting mirror surface of the beam combiner 501 and the reflected light angle of the reflector 401 are 45°.
[0026] Furthermore, the laser parameters of the first laser 101 are: 532nm nanosecond laser, pulse width 400ns, frequency 100KHz, single pulse energy 0.5mj.
[0027] Furthermore, the laser parameters of the second laser 102 are: 532nm picosecond laser, pulse width 50ps, frequency 100KHz, single pulse energy 0.1mj.
[0028] Furthermore, the pulse delay of the second laser 102 relative to the first laser 101 is 100 ns.
[0029] Example:
[0030] First, according to the processing requirements, the pulse delay time between the two lasers, the first laser 101 and the second laser 102, is set, and the pulse modulator 901 realizes the modulation of the pulse time by sending different square wave signals to each laser. After the laser emitted by the first laser 101 passes through the first polarizer 201, it becomes linearly polarized light. After passing through the first half-wave plate 301, the polarization direction of the outgoing light beam is determined by the angle between the polarization direction of the first polarizer 201 and the fast axis direction of the first half-wave plate 301. After that, after the polarized light beam passes through the second polarizer 202, the polarization direction of the outgoing light beam is the same as that of the second polarizer 202, and the power of the outgoing light beam is related to the angle between the polarization direction of the second polarizer 202 and the polarization direction of the light beam incident thereon. Similarly, after the laser emitted by the second laser 102 passes through the third polarizer 203, the second half-wave plate 302, and the fourth polarizer 204, it is emitted as polarized light with the same polarization direction as that of the fourth polarizer 204. The polarization directions of the second polarizer 202 and the fourth polarizer 204 are perpendicular to each other. The light beam of the first laser 101 passes through the reflector 401 and is combined with the light beam of the second laser 102 at the beam combiner 501. The combined light beam passes through the beam expansion system 601 and reaches the coupling system 701, where water-light coupling is performed, and finally a coupled water beam 702 is output.
[0031] The second polarizer 202 and the fourth polarizer 204 can also adjust the laser power on their respective optical paths, which is more conducive to the design and regulation of processing parameters.
[0032] The laser parameters emitted by the first laser 101 are: 532nm nanosecond laser, pulse width 400ns, frequency 100KHz, single pulse energy 0.5mj; the laser parameters emitted by the second laser 102 are: 532nm picosecond laser, pulse width 50ps, frequency 100KHz, single pulse energy 0.1mj. The pulse delay of the second laser 102 is set to 100ns, so that the second laser 102 action pulse is introduced between the first action pulse and the second action pulse of the first laser 101, so that the laser and the material have a longer action time, and the material removal efficiency is improved. The polarization direction of the second polarizer 202 is the same as the fast axis direction of the first half-wave plate 301, and the polarization direction of the fourth polarizer 204 is the same as the fast axis direction of the second half-wave plate 302, that is, the second polarizer 202 and the fourth polarizer 204 do not attenuate the lasers of their respective optical paths. After the combined laser passes through the beam expansion system 601, it enters the coupling system 701, performs water-light coupling, and finally forms a coupled water beam 702 for processing. The combined coupled water jet 702 has a longer cutting action time with the material, a higher material removal efficiency, and better performance.
[0033] In summary, the utility model combines two pulsed laser beams for water-conducting laser processing and combines multiple lasers for polarization beams, thereby improving the quality and efficiency of water-conducting lasers while ensuring the quality of the beam; therefore, the utility model has broad application prospects.
[0034] It should be emphasized that the above are only preferred embodiments of the present invention and do not constitute any form of limitation to the present invention. Any simple modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention are still within the scope of the technical solution of the present invention.
Claims
1. A double-pulse water-conducting laser processing system, characterized in that: include: A first laser (101) and a second laser (102); the laser emission direction of the first laser (101) faces the incident direction of the first polarizer (201), the emission direction of the first polarizer (201) faces the incident direction of the first half-wave plate (301), and the emission direction of the first half-wave plate (301) faces the incident direction of the second polarizer (202); the laser emission direction of the second laser (102) faces the incident direction of the third polarizer (203), the emission direction of the third polarizer (203) faces the incident direction of the second half-wave plate (302), and the emission direction of the second half-wave plate (302) faces the incident direction of the fourth polarizer (204); The emission direction of the second polarizer (202) is toward the incident mirror surface of the reflector (401), and the reflection direction of the reflector (401) is toward the reflector surface of the beam combiner (501); The emission direction of the fourth polarizer (204) is toward the incident mirror surface of the beam combining mirror (501); The beam combining mirror (501) combines the outgoing light of the second polarizer (202) and the outgoing light of the fourth polarizer (204) and emits the combined light to the beam expansion system (601); the beam expansion light of the beam expansion system (601) is emitted in a direction toward the coupling system (701); and the coupled water beam (702) emitted by the coupling system (701) after coupling is used for water-guided laser processing.
2. A double-pulse water-conducting laser processing system according to claim 1, characterized in that: The first laser (101) and the second laser (102) are electrically connected to a pulse modulator (901) respectively, and the pulse modulator (901) is also electrically connected to a central control system (801).
3. A double-pulse water-conducting laser processing system according to claim 1, characterized in that: The polarization directions of the second polarizer (202) and the fourth polarizer (204) are perpendicular to each other.
4. A double-pulse water-conducting laser processing system according to claim 1, characterized in that: The angle between the incident mirror surface of the reflector (401) and the outgoing light of the second polarizer (202) is 45°, the angle between the incident mirror surface of the beam combining mirror (501) and the outgoing light of the fourth polarizer (204) is 45°, and the angle between the reflected light of the reflector surface of the beam combining mirror (501) and the reflector (401) is 45°.
5. A double-pulse water-conducting laser processing system according to claim 1, characterized in that: The laser parameters of the first laser (101) are: 532nm nanosecond laser, pulse width 400ns.
6. A double-pulse water-conducting laser processing system according to claim 5, characterized in that: The laser parameters of the second laser (102) are: 532nm picosecond laser, pulse width 50ps.
7. A double-pulse water-conducting laser processing system according to claim 5, characterized in that: The pulse delay of the second laser (102) relative to the first laser (101) is 100 ns.