Microwave plasma chemical vapor deposition growth base lifting device

Abstract

The utility model discloses a lifting device for a microwave plasma chemical vapor deposition growth base station, and solves the problems that a diamond taking-out process is relatively tedious and high in cost and the overall production efficiency of diamonds is reduced in the prior art. The microwave reaction device comprises a rack, a fixed bracket arranged on the rack, a vacuum chamber which is arranged in the fixed bracket and is used for microwave reaction, a sliding mechanism which is arranged on the rack and is connected with the fixed bracket, and a linear motor arranged on the sliding mechanism, and the growth table is arranged at the driving end of the linear motor, is matched with the vacuum chamber and is used for bearing the growth of the diamond crystal. The sliding mechanism can simultaneously drive the linear motor and the growth table to move, and the linear motor can push the growth table and the vacuum chamber to be assembled and separated, so that the process of taking out the diamond can be simplified, and the overall production efficiency of the diamond is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of diamond processing, in particular to a microwave plasma chemical vapor deposition base lifting device. Background Art

[0002] Microwave plasma chemical vapor deposition (MPCVD) is currently recognized as one of the best methods for preparing diamond materials. The diamonds synthesized by this method have the characteristics of large particle size, large size and high purity.

[0003] Traditionally, the diamond growth sample stage is fixed in the resonant cavity. As the diamond growth time increases, the distance between the diamond surface and the plasma becomes closer and closer, which will cause the growth temperature of the diamond to increase, thereby affecting the growth efficiency and quality of the diamond. In addition, when the sample stage is used to grow diamonds, after the growth of the diamond is completed, the grown diamond needs to be removed from the diamond growth sample stage. At this time, various tools are needed to separate the diamond growth sample stage and the resonant cavity. The diamond removal process is relatively cumbersome and time-consuming, reducing the overall diamond production efficiency. Utility Model Content

[0004] The utility model provides a microwave plasma chemical vapor deposition growth base lifting device to at least solve some of the above technical problems.

[0005] In order to achieve the above purpose, the technical solution adopted by the utility model is as follows:

[0006] A microwave plasma chemical vapor deposition growth base lifting device comprises a frame, a fixed support arranged on the frame, a vacuum chamber arranged in the fixed support for microwave reaction, a sliding mechanism arranged on the frame and connected to the fixed support, a linear motor arranged on the sliding mechanism, and a growth platform arranged on the driving end of the linear motor and adapted to the vacuum chamber for receiving the growth of diamond crystals.

[0007] Furthermore, the sliding mechanism includes a pair of guide rails arranged on the frame and connected to the fixed bracket, a sliding plate slidably installed between the two guide rails, and a buffer mechanism arranged between the sliding plate and the growth table; the linear motor is installed on the sliding plate and its driving end passes through the sliding plate and the buffer mechanism and is connected to the growth table.

[0008] Furthermore, the buffer mechanism includes a plurality of shock absorbers arranged on the sliding plate, and a buffer plate arranged on the shock absorber and located directly below the growth platform; a flexible buffer layer is provided on the top surface of the buffer plate, and the linear motor driving end passes through the buffer plate and is connected to the growth platform.

[0009] Further, the shock absorber includes a sleeve disposed on the sliding plate, a telescopic rod movably passing through the sleeve and connected to the buffer plate, and a buffer spring disposed in the sleeve and having two ends respectively connected to the inner bottom wall of the sleeve and the bottom end of the telescopic rod.

[0010] Further, a first relief hole is provided on the sliding plate, a second relief hole and two cooling water pipe through holes are formed on the buffer plate, and the driving end of the linear motor passes through the first relief hole and the second relief hole to be connected to the growth table.

[0011] Further, a limiting block for restricting the travel of the sliding plate on the guide rail is provided on the guide rail.

[0012] Further, the fixed bracket includes a top mounting plate disposed on the frame, a bottom mounting plate connected to the sliding mechanism, and several support rods connected between the top mounting plate and the bottom mounting plate. The growth table passes through the bottom mounting plate and is hermetically connected to the vacuum chamber. The top surface of the growth table is located inside the vacuum chamber, and the vacuum chamber is mounted on the top mounting plate.

[0013] Further, the bottom mounting plate is provided with a U-shaped relief hole adapted to the growth table.

[0014] Further, the growth table includes a mounting seat disposed on the output end of the linear motor, and a molybdenum ring disposed on the mounting seat and adapted to the vacuum chamber for diamond growth.

[0015] Further, a sealing mechanism is provided on the mounting seat. The sealing mechanism includes an annular embedding groove disposed on the mounting seat, and a sealing ring disposed in the annular embedding groove and abutted against the vacuum chamber.

[0016] Compared with the prior art, the present utility model has the following beneficial effects:

[0017] The structure of the present utility model is simple, scientifically reasonable in design and convenient to use. The linear motor of the present utility model drives the growth table to be separated from and cooperate with the vacuum chamber, and drives the linear motor to move on the frame through the sliding mechanism, so that after the diamond growth is completed, the linear motor drives the growth table to be separated from the vacuum chamber, and then the sliding mechanism is pulled to move the linear motor and the growth table out of the frame, thereby facilitating the extraction of the grown diamond and effectively improving the overall production efficiency of the diamond. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic structural diagram of the present utility model.

[0019] Figure 2 It is a schematic diagram of the sliding mechanism of the present utility model.

[0020] Figure 3 It is a cross-sectional view of the sliding plate of the present utility model.

[0021] Figure 4 This is a schematic diagram of the fixing bracket of the present utility model.

[0022] Figure 5 This is a schematic diagram of the bottom mounting plate of the present utility model.

[0023] Figure 6 This is a schematic diagram of the buffer plate of the present utility model.

[0024] Figure 7 This is a schematic diagram of the buffer mechanism of the present utility model.

[0025] Figure 8 This is a schematic diagram of the sleeve of the present utility model.

[0026] Figure 9 This is a schematic diagram of the sliding plate of the present utility model.

[0027] Figure 10 This is a schematic diagram of the growth table of the present utility model.

[0028] Figure 11 This is a schematic cross-sectional view of the annular embedding groove of the present utility model.

[0029] Figure 12 is Figure 11 assembly drawing of.

[0030] Among them, the names corresponding to the reference numerals are:

[0031] 1, frame; 2, guide rail; 3, sliding plate; 4, fixing bracket; 5, linear motor; 6, growth table; 7, vacuum chamber; 22, limit block; 31, first relief hole; 32, second relief hole; 33, cooling water pipe through hole; 34, handle; 41, top mounting plate; 43, bottom mounting plate; 42, support rod; 44, U-shaped relief hole; 51, buffer plate; 53, flexible buffer layer; 61, mounting seat; 62, molybdenum ring; 63, annular embedding groove; 64, sealing ring; 91, telescopic rod; 92, buffer spring; 93, sleeve; 641, embedding ring; 642, sealing ring; 301, sliding hole. Detailed implementation manners

[0032] In order to make the purpose, technical solutions and advantages of the present utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0033] In the description of the present utility model, it should be noted that the orientation or positional relationship indicated by terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation. Therefore, it cannot be construed as a limitation to the present utility model. In addition, the terms "first", "second", "third" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance.

[0034] In the description of the present utility model, it should be noted that unless otherwise clearly specified and defined, the terms "installation", "connection", "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; of course, it can also be a mechanical connection or an electrical connection; additionally, it can be a direct connection or an indirect connection through an intermediate medium, or it can be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0035] Embodiment 1.

[0036] As Figure 1-12 shown, a lifting device for a growth substrate of microwave plasma chemical vapor deposition provided by the present utility model includes a frame 1, a fixed bracket 4 provided on the frame 1, a vacuum chamber 7 for microwave reaction provided inside the fixed bracket 4, a sliding mechanism provided on the frame 1 and connected to the fixed bracket 4, a linear motor 5 provided on the sliding mechanism, and a growth table 6 provided on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0037] The sliding mechanism of the present utility model can drive the linear motor 5 and the growth table 6 to move simultaneously, and the linear motor 5 can push the growth table 6 to perform a lifting action, so as to facilitate the assembly and separation of the growth table 6 and the vacuum chamber 7. When the diamond needs to be taken out, the linear motor 5 is started, and the linear motor 5 drives the growth table 6 to separate from the vacuum chamber 7. At the same time, the sliding mechanism drives the linear motor 5 and the growth table 6 to slide inside the frame 1, so as to facilitate the separation of the growth table 6 and the vacuum chamber 7 and facilitate the taking out of the diamond, which can effectively improve the overall production efficiency of the diamond.

[0038] Embodiment 2.

[0039] As Figure 1-12As shown, the utility model provides a microwave plasma chemical vapor deposition growth base lifting device, including a frame 1, a fixed bracket 4 arranged on the frame 1, a vacuum chamber 7 for microwave reaction arranged in the fixed bracket 4, a sliding mechanism arranged on the frame 1 and connected to the fixed bracket 4, a linear motor 5 arranged on the sliding mechanism, and a growth table 6 arranged on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0040] The sliding mechanism includes a pair of guide rails 2 arranged on the frame 1 and connected to the fixed bracket 4, a sliding plate 3 slidably installed between the two guide rails 2, and a buffer mechanism arranged between the sliding plate 3 and the growth table 6; the linear motor 5 is installed on the sliding plate 3 and its driving end passes through the sliding plate 3 and the buffer mechanism and is connected to the growth table 6.

[0041] Based on Example 1, this Example 2 provides a more preferred structure of the sliding mechanism, specifically: the sliding mechanism includes a pair of guide rails 2 arranged on the frame 1 and connected to the fixed bracket 4, a sliding plate 3 slidably installed between the two guide rails 2, and a buffer mechanism arranged between the sliding plate 3 and the growth table 6; the linear motor 5 is installed on the sliding plate 3 and its driving end passes through the sliding plate 3 and the buffer mechanism and is connected to the growth table 6.

[0042] The utility model guide rail 2 is installed in parallel on the frame 1 and is connected to the fixed bracket 4 through a T-shaped mounting seat. The T-shaped mounting seat is provided with a bolt hole A, and the fixed bracket 4 is provided with a bolt hole B matched with the bolt hole A. Bolts matched with the bolt hole A and the bolt hole B are provided in the bolt hole A and the bolt hole B. The sliding plate 3 is provided with a sliding hole 301 matched with the guide rail 2. The number of the sliding holes 301 is the same as the number of the guide rails 2. The sliding holes 301 are respectively slidably mounted on the corresponding guide rails 2 and slide along the guide rails 2. At the same time, a buffer mechanism is provided on the sliding plate 3. When the sliding plate 3 slides on the guide rail 2, the linear motor 5 and the buffer mechanism on the sliding plate 3 slide. The linear motor 5 drives the growth table 6 to slide, so that the growth table 6 can slide out of the frame 1, so as to facilitate the placement of diamonds, and the buffer mechanism can avoid collision between the growth table 6 and the sliding plate 3. The utility model sliding plate 3 is provided with a handle 34, and the handle 34 is convenient for pulling the sliding plate 3 to slide on the guide rail 2.

[0043] Example 3.

[0044] like Figure 1-12As shown, the utility model provides a microwave plasma chemical vapor deposition growth base lifting device, including a frame 1, a fixed bracket 4 arranged on the frame 1, a vacuum chamber 7 for microwave reaction arranged in the fixed bracket 4, a sliding mechanism arranged on the frame 1 and connected to the fixed bracket 4, a linear motor 5 arranged on the sliding mechanism, and a growth table 6 arranged on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0045] The sliding mechanism includes a pair of guide rails 2 arranged on the frame 1 and connected to the fixed bracket 4, a sliding plate 3 slidably installed between the two guide rails 2, and a buffer mechanism arranged between the sliding plate 3 and the growth table 6; the linear motor 5 is installed on the sliding plate 3 and its driving end passes through the sliding plate 3 and the buffer mechanism and is connected to the growth table 6.

[0046] The buffer mechanism includes a plurality of shock absorbers arranged on the sliding plate 3, and a buffer plate 51 arranged on the shock absorber and located directly below the growth table 6; a flexible buffer layer 53 is provided on the top surface of the buffer plate 51, and the driving end of the linear motor 5 passes through the buffer plate 51 and is connected to the growth table 6.

[0047] This embodiment 3 provides a more preferred structure of the buffer mechanism on the basis of embodiment 2, specifically: the buffer mechanism includes a plurality of shock absorbers arranged on the sliding plate 3, and a buffer plate 51 arranged on the shock absorbers and located directly below the growth table 6; a flexible buffer layer 53 is provided on the top surface of the buffer plate 51, and the driving end of the linear motor 5 passes through the buffer plate 51 and is connected to the growth table 6.

[0048] The utility model preferably has four shock absorbers, which are distributed in a rectangular shape on the sliding plate 3, and the shock absorber is provided with a buffer plate 51 located directly below the growth table 6. The buffer plate 51 can facilitate contact with the growth table 6 to prevent the growth table 6 from falling accurately on the buffer plate 51 when the growth table 6 is driven by the linear motor 5 to descend. A flexible buffer layer 53 is provided on the top surface of the buffer plate 51. The flexible buffer layer 53 can prevent the buffer plate 51 and the growth table 6 from colliding. The flexible buffer layer 53 is tightly attached to the top surface of the buffer plate 51, and is preferably made of silicone rubber material with a thickness of preferably 3-5 mm.

[0049] Example 4.

[0050] like Figure 1-12 As shown, the utility model provides a microwave plasma chemical vapor deposition growth base lifting device, including a frame 1, a fixed bracket 4 arranged on the frame 1, a vacuum chamber 7 for microwave reaction arranged in the fixed bracket 4, a sliding mechanism arranged on the frame 1 and connected to the fixed bracket 4, a linear motor 5 arranged on the sliding mechanism, and a growth table 6 arranged on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0051] The sliding mechanism includes a pair of guide rails 2 provided on the frame 1 and connected to the fixed bracket 4, a sliding plate 3 slidably installed between the two guide rails 2, and a buffer mechanism provided between the sliding plate 3 and the growth table 6; a linear motor 5 is installed on the sliding plate 3 and its driving end passes through the sliding plate 3 and the buffer mechanism to be connected to the growth table 6.

[0052] The buffer mechanism includes a plurality of shock absorbers provided on the sliding plate 3, and a buffer plate 51 provided on the shock absorbers and located directly below the growth table 6; a layer of flexible buffer layer 53 is provided on the top surface of the buffer plate 51, and the driving end of the linear motor 5 passes through the buffer plate 51 to be connected to the growth table 6.

[0053] The shock absorber includes a sleeve 93 provided on the sliding plate 3, a telescopic rod 91 movably inserted into the sleeve 93 and connected to the buffer plate 51, and a buffer spring 92 provided in the sleeve 93 and having its two ends respectively connected to the inner bottom wall of the sleeve 93 and the bottom end of the telescopic rod 91.

[0054] In this Embodiment 4, a more preferable structure of the shock absorber is given on the basis of Embodiment 3, specifically: the shock absorber includes a sleeve 93 provided on the sliding plate 3, a telescopic rod 91 movably inserted into the sleeve 93 and connected to the buffer plate 51, and a buffer spring 92 provided in the sleeve 93 and having its two ends respectively connected to the inner bottom wall of the sleeve 93 and the bottom end of the telescopic rod 91.

[0055] In the utility model, the sleeve 93 is fixedly provided on the sliding plate 3, the telescopic rod 91 is movably inserted into the sleeve 93 and connected to the buffer plate 51, the buffer spring 92 is provided in the sleeve 93 and its two ends are respectively connected to the inner bottom wall of the sleeve 93 and the bottom end of the telescopic rod 91. When the growth table 6 contacts the buffer plate 51, the pressure during the downward movement of the buffer plate 51 pushes the telescopic rod 91 to compress the buffer spring 92, thereby absorbing the vibration during the downward movement of the growth table 6 and preventing the growth table 6 from vibrating.

[0056] Embodiment 5.

[0057] As Figure 1-12 shown, a lifting device for a microwave plasma chemical vapor deposition growth substrate provided by the utility model includes a frame 1, a fixed bracket 4 provided on the frame 1, a vacuum chamber 7 for microwave reaction provided in the fixed bracket 4, a sliding mechanism provided on the frame 1 and connected to the fixed bracket 4, a linear motor 5 provided on the sliding mechanism, and a growth table 6 provided on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0058] The sliding mechanism includes a pair of guide rails 2 arranged on the frame 1 and connected to the fixed bracket 4, a sliding plate 3 slidably installed between the two guide rails 2, and a buffer mechanism arranged between the sliding plate 3 and the growth table 6; the linear motor 5 is installed on the sliding plate 3 and its driving end passes through the sliding plate 3 and the buffer mechanism and is connected to the growth table 6.

[0059] The buffer mechanism includes a plurality of shock absorbers arranged on the sliding plate 3, and a buffer plate 51 arranged on the shock absorber and located directly below the growth table 6; a flexible buffer layer 53 is provided on the top surface of the buffer plate 51, and the driving end of the linear motor 5 passes through the buffer plate 51 and is connected to the growth table 6.

[0060] The sliding plate 3 is provided with a first clearance hole 31 , the buffer plate 51 is provided with a second clearance hole 32 and two cooling water pipe penetration holes 33 , and the driving end of the linear motor 5 passes through the first clearance hole 31 and the second clearance hole 32 to be connected to the growth platform 6 .

[0061] Based on Example 3, this Example 5 provides a more preferred structure of the sliding plate 3 and the buffer plate 51, specifically: a first clearance hole 31 is provided on the sliding plate 3, a second clearance hole 32 and two cooling water pipe holes 33 are provided on the buffer plate 51, and the driving end of the linear motor 5 passes through the first clearance hole 31 and the second clearance hole 32 to be connected to the growth table 6.

[0062] The first clearance hole 31 and the second clearance hole 32 of the utility model can facilitate the driving end of the linear motor 5 to drive the growth table 6 to move up and down, thereby avoiding interference between the driving end of the linear motor 5 and the sliding plate 3 and the buffer plate 51, and two cooling water pipe penetration holes 33 are also provided on the buffer plate 51, and the sliding plate 3 also has two cooling water pipe penetration holes A. The cooling water pipe penetration holes 33 and the cooling water pipe penetration holes A can facilitate external cooling pipes to pass through the cooling water pipe penetration holes 33 and the cooling water pipe penetration holes A to be connected to the growth table 6, thereby facilitating cooling of the growth table 6.

[0063] Example 6.

[0064] like Figure 1-12 As shown, the utility model provides a microwave plasma chemical vapor deposition growth base lifting device, including a frame 1, a fixed bracket 4 arranged on the frame 1, a vacuum chamber 7 for microwave reaction arranged in the fixed bracket 4, a sliding mechanism arranged on the frame 1 and connected to the fixed bracket 4, a linear motor 5 arranged on the sliding mechanism, and a growth table 6 arranged on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0065] The sliding mechanism includes a pair of guide rails 2 provided on the frame 1 and connected to the fixed bracket 4, a sliding plate 3 slidably installed between the two guide rails 2, and a buffer mechanism provided between the sliding plate 3 and the growth table 6; the linear motor 5 is installed on the sliding plate 3 and its driving end passes through the sliding plate 3 and the buffer mechanism to be connected to the growth table 6.

[0066] The guide rail 2 is provided with a limit block 22 for restricting the travel of the sliding plate 3 on the guide rail 2.

[0067] Embodiment 6 gives a more preferable structure of the guide rail 2 on the basis of Embodiment 2. Specifically, the guide rail 2 is provided with a limit block 22 for restricting the travel of the sliding plate 3 on the guide rail 2.

[0068] In the utility model, the limit block 22 is arranged on the guide rail 2. The limit block 22 can restrict the travel of the sliding plate 3 on the guide rail 2. At the same time, through the limit block 22, it is convenient to align the growth table 6 on the output end of the linear motor 5 with the vacuum chamber 7, which is convenient for the cooperation between the growth table 6 and the vacuum chamber 7.

[0069] Embodiment 7.

[0070] As Figure 1-12 shown, a microwave plasma chemical vapor deposition growth substrate lifting device provided by the utility model includes a frame 1, a fixed bracket 4 provided on the frame 1, a vacuum chamber 7 for microwave reaction provided in the fixed bracket 4, a sliding mechanism provided on the frame 1 and connected to the fixed bracket 4, a linear motor 5 provided on the sliding mechanism, and a growth table 6 provided on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0071] The fixed bracket 4 includes a top surface mounting plate 41 provided on the frame 1, a bottom surface mounting plate 43 connected to the sliding mechanism, and a plurality of support rods 42 connected between the top surface mounting plate 41 and the bottom surface mounting plate 43. The growth table 6 passes through the bottom surface mounting plate 43 and is hermetically connected to the vacuum chamber 7. The top surface of the growth table 6 is located inside the vacuum chamber 7, and the vacuum chamber 7 is installed on the top surface mounting plate 41.

[0072] Based on Example 1, this Example 7 provides a more preferred structure for the fixed bracket 4, specifically: the top mounting plate 41 is arranged on the frame 1, and the bottom mounting plate 43 is arranged on the two guide rails 2, so as to avoid interference between the bottom mounting plate 43 and the sliding plate 3, and the support rod 42 is connected between the top mounting plate 41 and the bottom mounting plate 43. The support rods 42 are preferably four, and the four support rods 42 are distributed in a rectangular structure, so as to reduce the vibration generated when the growth table 6 and the vacuum chamber 7 cooperate. The vacuum chamber 7 is installed on the top mounting plate 41, the growth table 6 passes through the bottom mounting plate 43 and is sealed and connected to the vacuum chamber 7, the threaded hole B is opened in the bottom mounting plate 43, and the mounting plate 43 is connected to the T-shaped mounting seat by bolts.

[0073] Example 8.

[0074] like Figure 1-12 As shown, the utility model provides a microwave plasma chemical vapor deposition growth base lifting device, including a frame 1, a fixed bracket 4 arranged on the frame 1, a vacuum chamber 7 for microwave reaction arranged in the fixed bracket 4, a sliding mechanism arranged on the frame 1 and connected to the fixed bracket 4, a linear motor 5 arranged on the sliding mechanism, and a growth table 6 arranged on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0075] The fixed bracket 4 includes a top mounting plate 41 arranged on the frame 1, a bottom mounting plate 43 connected to the sliding mechanism, and a plurality of support rods 42 connected between the top mounting plate 41 and the bottom mounting plate 43. The growth table 6 passes through the bottom mounting plate 43 and is sealedly connected to the vacuum chamber 7. The top surface of the growth table 6 is located in the vacuum chamber 7, and the vacuum chamber 7 is installed on the top mounting plate 41.

[0076] The bottom mounting plate 43 is provided with a U-shaped clearance hole 44 adapted to the growing platform 6 .

[0077] Based on Example 7, this Example 8 provides a more preferred structure of the bottom mounting plate 43, specifically: the bottom mounting plate 43 is provided with a U-shaped clearance hole 44 adapted to the growth platform 6.

[0078] The U-shaped clearance hole 44 of the utility model can make way when the linear motor 5 pushes the growth platform 6 to move, thereby avoiding interference between the bottom mounting plate 43 and the growth platform 6. The growth platform 6 passes through the U-shaped clearance hole 44 when moving up and down.

[0079] Example 9.

[0080] like Figure 1-12As shown in the figure, a lifting device for a growth substrate of microwave plasma chemical vapor deposition provided by the present utility model includes a frame 1, a fixed bracket 4 provided on the frame 1, a vacuum chamber 7 for microwave reaction provided inside the fixed bracket 4, a sliding mechanism provided on the frame 1 and connected to the fixed bracket 4, a linear motor 5 provided on the sliding mechanism, and a growth stage 6 provided on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0081] The growth stage 6 includes a mounting seat 61 provided on the output end of the linear motor 5, and a molybdenum ring 62 provided on the mounting seat 61 and adapted to the vacuum chamber 7 for diamond growth.

[0082] In this Embodiment 9, on the basis of Embodiment 1, a more preferable structure of the growth stage 6 is given. Specifically, the growth stage 6 includes a mounting seat 61 provided on the output end of the linear motor 5, and a molybdenum ring 62 provided on the mounting seat 61 and adapted to the vacuum chamber 7 for diamond growth.

[0083] In the present utility model, the mounting seat 61 is arranged on the output end of the linear motor 5. A molybdenum ring 62 is provided on the mounting seat 61. Diamond seeds are placed on the molybdenum ring 62, and the linear motor 5 pushes the mounting seat 61 to move upward, sending the molybdenum ring 62 on the mounting seat 61 into the vacuum chamber 7, so as to facilitate the growth of diamond seeds in the vacuum chamber 7.

[0084] Embodiment 10.

[0085] As Figure 1-12 As shown in the figure, a lifting device for a growth substrate of microwave plasma chemical vapor deposition provided by the present utility model includes a frame 1, a fixed bracket 4 provided on the frame 1, a vacuum chamber 7 for microwave reaction provided inside the fixed bracket 4, a sliding mechanism provided on the frame 1 and connected to the fixed bracket 4, a linear motor 5 provided on the sliding mechanism, and a growth stage 6 provided on the driving end of the linear motor 5 and adapted to the vacuum chamber 7 for receiving the growth of diamond crystals.

[0086] The growth stage 6 includes a mounting seat 61 provided on the output end of the linear motor 5, and a molybdenum ring 62 provided on the mounting seat 61 and adapted to the vacuum chamber 7 for diamond growth.

[0087] A sealing mechanism is provided on the mounting seat 61. The sealing mechanism includes an annular embedding groove 63 provided on the mounting seat 61, and a sealing ring 64 provided in the annular embedding groove 63 and abutted against the vacuum chamber 7.

[0088] Embodiment 10 provides a more preferable structure of the mounting base 61 on the basis of Embodiment 9. Specifically, a sealing mechanism is provided on the mounting base 61. The sealing mechanism includes an annular embedding groove 63 provided on the mounting base 61, and a sealing ring 64 provided in the annular embedding groove 63 and abutted against the vacuum chamber 7.

[0089] The sealing mechanism of the present utility model can facilitate the sealing between the mounting base 61 and the bottom of the vacuum chamber 7, and prevent external gas from entering the vacuum chamber 7 and affecting the growth quality of diamond. Specifically, an annular embedding groove 63 is formed on the mounting base 61, and a sealing ring 64 abutted against the vacuum chamber 7 is provided in the annular embedding groove 63, so as to seal the abutting part between the mounting base 61 and the vacuum chamber 7. The annular embedding groove 63 of the present utility model is a dovetail groove. The sealing ring 64 includes an embedding ring 641 adapted to the dovetail groove, and a sealing ring 642 provided on the embedding ring 641 and abutted against the vacuum chamber 7. The embedding ring 641 is tightly embedded in the annular embedding groove 63, and the embedding ring 641 and the sealing ring 642 are of an integral structure.

[0090] The linear motor 5 used in the present utility model is a known device in the prior art and can be directly purchased and used in the market. Therefore, the structure, circuit and control principle of the linear motor 5 will not be described in detail herein.

[0091] Finally, it should be noted that the above embodiments are only the preferred embodiments of the present utility model to illustrate the technical solutions of the present utility model, rather than to limit it, and certainly not to limit the patent scope of the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements on some or all of the technical features; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present utility model. That is to say, any meaningless modifications or touch-ups made on the main design concept and spirit of the present utility model, as long as the technical problems solved are still the same as those of the present utility model, should be included in the protection scope of the present utility model. In addition, directly or indirectly applying the technical solutions of the present utility model to other related technical fields shall also be included in the patent protection scope of the present utility model by the same token.

Claims

1. A microwave plasma chemical vapor deposition growth base lifting device, characterized in that: The invention comprises a frame (1), a fixed support (4) arranged on the frame (1), a vacuum chamber (7) arranged in the fixed support (4) for microwave reaction, a sliding mechanism arranged on the frame (1) and connected to the fixed support (4), a linear motor (5) arranged on the sliding mechanism, and a growth platform (6) arranged on the driving end of the linear motor (5) and adapted to the vacuum chamber (7) for receiving the growth of diamond crystals.

2. The microwave plasma chemical vapor deposition growth base lifting device according to claim 1, characterized in that: The sliding mechanism comprises a pair of guide rails (2) arranged on a frame (1) and connected to a fixed bracket (4), a sliding plate (3) slidably mounted between the two guide rails (2), and a buffer mechanism arranged between the sliding plate (3) and a growth table (6); a linear motor (5) is mounted on the sliding plate (3) and a driving end thereof passes through the sliding plate (3) and the buffer mechanism and is connected to the growth table (6).

3. The microwave plasma chemical vapor deposition growth base lifting device according to claim 2, characterized in that: The buffer mechanism comprises a plurality of shock absorbers arranged on a sliding plate (3), and a buffer plate (51) arranged on the shock absorbers and located directly below the growth platform (6); a flexible buffer layer (53) is provided on the top surface of the buffer plate (51), and the driving end of the linear motor (5) passes through the buffer plate (51) and is connected to the growth platform (6).

4. The microwave plasma chemical vapor deposition growth base lifting device according to claim 3, characterized in that: The shock absorber comprises a sleeve (93) arranged on the sliding plate (3), a telescopic rod (91) movably inserted into the sleeve (93) and connected to the buffer plate (51), and a buffer spring (92) arranged in the sleeve (93) and having two ends respectively connected to the inner bottom wall of the sleeve (93) and the bottom end of the telescopic rod (91).

5. The microwave plasma chemical vapor deposition growth base lifting device according to claim 3, characterized in that: The sliding plate (3) is provided with a first clearance hole (31), the buffer plate (51) is provided with a second clearance hole (32) and two cooling water pipe penetration holes (33), and the driving end of the linear motor (5) passes through the first clearance hole (31) and the second clearance hole (32) to be connected to the growth platform (6).

6. The microwave plasma chemical vapor deposition growth base lifting device according to claim 2, characterized in that: A limit block (22) is provided on the guide rail (2) for limiting the travel of the sliding plate (3) on the guide rail (2).

7. The microwave plasma chemical vapor deposition growth base lifting device according to claim 1, characterized in that: The fixed support (4) comprises a top mounting plate (41) arranged on the frame (1), a bottom mounting plate (43) connected to the sliding mechanism, and a plurality of support rods (42) connected between the top mounting plate (41) and the bottom mounting plate (43); the growth platform (6) passes through the bottom mounting plate (43) and is sealedly connected to the vacuum chamber (7); the top surface of the growth platform (6) is located in the vacuum chamber (7), and the vacuum chamber (7) is mounted on the top mounting plate (41).

8. The microwave plasma chemical vapor deposition growth base lifting device according to claim 7, characterized in that: The bottom mounting plate (43) is provided with a U-shaped clearance hole (44) adapted to the growing platform (6).

9. The microwave plasma chemical vapor deposition growth base lifting device according to claim 1, characterized in that: The growth platform (6) comprises a mounting seat (61) arranged on the output end of the linear motor (5), and a molybdenum ring (62) arranged on the mounting seat (61) and adapted to the vacuum chamber (7) for diamond growth.

10. The microwave plasma chemical vapor deposition growth base lifting device according to claim 9, characterized in that: A sealing mechanism is provided on the mounting seat (61), the sealing mechanism comprising an annular embedding groove (63) provided on the mounting seat (61), and a sealing ring (64) provided in the annular embedding groove (63) and abutting against the vacuum chamber (7).

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