Exhaust mechanism for semiconductor material production

Abstract

The utility model relates to an exhaust mechanism for semiconductor material production, which belongs to the technical field of exhaust for semiconductor material production, and comprises a purification box body, a support plate, a fan, a gas input pipe, an exhaust pipe, a box door and a spraying assembly, the purification mechanism comprises a driving motor fixedly mounted on the outer wall of the back side of the purification box body, and a rotating shaft is fixedly mounted on an output shaft of the driving motor. According to the exhaust mechanism for semiconductor material production, the first filter screens are mounted under the action of the driving motor, the rotating shaft, the mounting base and the first bolts, meanwhile, waste gas is cleaned through the multiple first filter screens, a larger filter area is provided, the waste gas can continuously pass through the filter screens through the rotating action, and the exhaust efficiency is improved. And meanwhile, only a small amount of water is needed to purify the waste gas in the purification box body, so that the waste gas purification efficiency and quality are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of exhaust gas in semiconductor material production, in particular to an exhaust gas mechanism for semiconductor material production. Background Technique

[0002] In the process of semiconductor production, a variety of special gases, a large amount of chemicals such as acids and alkalis, as well as organic solvents and volatile liquids are used. These gases and chemicals will generate waste gases in different processes of semiconductor manufacturing, mainly including organic waste gases and acid-base waste gases. These waste gases contain a variety of harmful substances, such as non-methane total hydrocarbons, nitrogen oxides, sulfur dioxide, ammonia, sulfuric acid mist, fluorides, chlorides, chlorine, etc. In order to protect the environment, reduce environmental pollution, and at the same time ensure the quality of products and the normal operation of equipment, it is necessary to filter and treat these discharged gases. Gas filters play a crucial role in pollution control in semiconductor factories. Through filtration and purification, harmful substances in the waste gas can be eliminated or reduced to meet environmental protection requirements.

[0003] At present, when filtering the gas during semiconductor production, the gas is generally filtered by spraying. Although the water spraying method can treat the large particle components in the waste gas, the removal effect on smaller particles and organic substances is not ideal, and the purification efficiency of low-concentration organic waste gas is relatively low. Moreover, the spraying method requires a large amount of water resources, and subsequent wastewater treatment is also required. Therefore, an exhaust gas mechanism for semiconductor material production is proposed. Summary of the Invention

[0004] Aiming at the deficiencies of the prior art, the utility model provides an exhaust gas mechanism for semiconductor material production, which has the advantages of improving the efficiency of waste gas treatment and reducing water use, and solves the problems of relatively low purification efficiency of low-concentration organic waste gas and the need for a large amount of water resources by spraying and subsequent wastewater treatment.

[0005] To achieve the above object, the utility model provides the following technical scheme: An exhaust gas mechanism for semiconductor material production, including a purification box body, a support plate, a fan, a gas input pipe, an exhaust pipe, a box door and a spraying assembly, and a purification mechanism is arranged inside the purification box body;

[0006] The purification mechanism includes a driving motor fixedly installed on the outer wall of the back side of the purification box body. A rotating shaft is fixedly installed on the output shaft of the driving motor. Four mounting seats are fixedly installed on the outer peripheral wall of the rotating shaft. A first filter screen is movably installed inside the mounting seat. Limiting seats are fixedly installed on the inner walls of the top and bottom of the purification box body. A second filter screen is slidably installed between the two limiting seats. A gas guiding plate is fixedly installed between the limiting seat and the purification box body. An air outlet head is fixedly installed on the right inner wall of the purification box body. A limiting head is fixedly installed on the outer wall of the right side of the air outlet head. An exhaust pipe is slidably connected to the outer peripheral wall of the limiting head. A third filter screen is movably installed on the inner peripheral wall of the exhaust pipe. A limiting ring is fixedly installed on the inner peripheral wall of the exhaust pipe.

[0007] Furthermore, the spraying assembly includes a water pump fixedly installed on the top of the purification box body. A water inlet pipe is fixedly installed at the water inlet end of the water pump. A water delivery pipe is fixedly installed at the water outlet end of the water pump. A flow dividing seat is fixedly installed on the side of the water delivery pipe away from the water pump. Three atomizing spray heads are fixedly installed at the bottom of the flow dividing seat.

[0008] Furthermore, flanges are fixedly installed on the outer walls of the opposite sides of the air outlet head and the exhaust pipe. A plurality of second bolts are threadedly connected inside the flanges.

[0009] Furthermore, an installation groove is formed on the side of the mounting seat away from the rotating shaft. The first filter screen is movably installed inside the installation groove and is of a suitable size. Installation holes are formed inside the first filter screen. Threaded holes are formed inside the mounting seat. A first bolt is threadedly connected inside the threaded hole and is of a suitable size.

[0010] Furthermore, two flow guiding plates are fixedly installed on the inner wall of the bottom of the purification box body. The flow guiding plates are in the shape of right-angled triangles. Two sewage pipes are fixedly installed on the inner wall of the bottom of the purification box body. A collection box is installed at the bottom of the sewage pipe. The two sewage pipes are located between the two flow guiding plates.

[0011] Furthermore, the gas guiding plate is trapezoidal. The shortest distance between the outer walls of the opposite sides of the two gas guiding plates is the same as the diameter of the air outlet head.

[0012] Furthermore, a support plate is fixedly installed on the outer wall of the left side of the purification box body. A fan is fixedly installed on the top of the support plate. The air inlet pipe and the gas input pipe are respectively fixedly installed at the air inlet end and the air outlet end of the fan. The gas input pipe penetrates through the left side wall of the purification box body and extends to the inside.

[0013] Compared with the prior art, the technical solution of the present application has the following beneficial effects:

[0014] The exhaust mechanism for semiconductor material production installs the first filter screen through the action of a driving motor, a rotating shaft, a mounting seat, and a first bolt. At the same time, the exhaust gas is cleaned by multiple first filter screens, providing a larger filtration area. The rotating action helps to continuously pass the exhaust gas through the filter screen, thereby improving the overall processing efficiency. At the same time, only a small amount of water is needed to purify the exhaust gas inside the purification box, improving the efficiency and quality of exhaust gas purification. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 is a schematic structural diagram of the present utility model;

[0016] Figure 2 For the present utility model Figure 1 is a front view structural schematic diagram;

[0017] Figure 3 For the present utility model Figure 1 is a back side structural schematic diagram;

[0018] Figure 4 is a schematic diagram of the connection structure of the air outlet head and the limit head of the present utility model.

[0019] In the figure: 1, purification box; 2, support plate; 3, fan; 4, intake pipe; 5, gas input pipe; 6, water pump; 7, water inlet pipe; 8, water delivery pipe; 9, shunt seat; 10, atomizing spray head; 11, driving motor; 12, rotating shaft; 13, mounting seat; 14, first filter screen; 15, limit seat; 16, second filter screen; 17, air guide plate; 18, air outlet head; 19, limit head; 20, exhaust pipe; 21, third filter screen; 22, limit ring; 23, flange; 24, first bolt; 25, second bolt; 26, guide plate; 27, sewage pipe; 28, collection box; 29, box door. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0020] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model.

[0021] Please refer to Figures 1-4 , an exhaust mechanism for semiconductor material production in this embodiment includes a purification box 1, a support plate 2, a fan 3, an intake pipe 4, a gas input pipe 5, a box door 29, and a spray assembly. A purification mechanism is provided inside the purification box 1.

[0022] The support plate 2 is fixedly installed on the left outer wall of the purification box body 1, the fan 3 is fixedly installed on the top of the support plate 2, the air inlet pipe 4 and the gas input pipe 5 are respectively fixedly installed at the air inlet end and the air outlet end of the fan 3, and the gas input pipe 5 penetrates through the left side wall of the purification box body 1 and extends to the inside.

[0023] The purification mechanism includes a driving motor 11 fixedly installed on the back outer wall of the purification box body 1. A rotating shaft 12 is fixedly installed on the output shaft of the driving motor 11. Four mounting seats 13 are fixedly installed on the outer peripheral wall of the rotating shaft 12. A first filter screen 14 is movably installed inside the mounting seat 13. An installation groove is opened on one side of the mounting seat 13 away from the rotating shaft 12. The first filter screen 14 is movably installed inside the installation groove and is of a suitable size. Installation holes are opened inside the first filter screen 14. Threaded holes are opened inside the mounting seat 13, and a first bolt 24 is threadedly connected inside the threaded holes and is of a suitable size.

[0024] Limit seats 15 are fixedly installed on both the top inner wall and the bottom inner wall of the purification box body 1. A second filter screen 16 is slidably installed between the two limit seats 15. A gas guide plate 17 is fixedly installed between the limit seat 15 and the purification box body 1. An air outlet head 18 is fixedly installed on the right inner wall of the purification box body 1. The gas guide plate 17 is trapezoidal. The shortest distance between the outer walls of the two opposite sides of the two gas guide plates 17 is the same as the diameter of the air outlet head 18. A limit head 19 is fixedly installed on the right outer wall of the air outlet head 18. The outer peripheral wall of the limit head 19 is slidably connected with an exhaust pipe 20. Flanges 23 are fixedly installed on the opposite outer walls of the air outlet head 18 and the exhaust pipe 20. A plurality of second bolts 25 are threadedly connected inside the flanges 23. A third filter screen 21 is movably installed on the inner peripheral wall of the exhaust pipe 20, and a limit ring 22 is fixedly installed on the inner peripheral wall of the exhaust pipe 20.

[0025] The spraying assembly includes a water pump 6 fixedly installed on the top of the purification box body 1. A water inlet pipe 7 is fixedly installed at the water inlet end of the water pump 6. A water delivery pipe 8 is fixedly installed at the water outlet end of the water pump 6. A flow dividing seat 9 is fixedly installed on the side of the water delivery pipe 8 away from the water pump 6. Three atomizing spray heads 10 are fixedly installed at the bottom of the flow dividing seat 9.

[0026] In this embodiment, the first filter screen 14 is connected and installed through the mounting seat 13 and the first bolt 24, which is convenient for replacing and cleaning the first filter screen 14.

[0027] Two flow guiding plates 26 are fixedly installed on the bottom inner wall of the purification box body 1. The flow guiding plates 26 are right-angled triangles. Two sewage pipes 27 are fixedly installed on the bottom inner wall of the purification box body 1. A collection box 28 is installed at the bottom of the sewage pipes 27. The two sewage pipes 27 are located between the two flow guiding plates 26.

[0028] In this embodiment, the second filter screen 16 is connected and installed through the limit seat 15, which facilitates the replacement and cleaning of the second filter screen 16.

[0029] In this embodiment, the air outlet head 18 and the exhaust pipe 20 are connected and installed through the flange 23 and the second bolt 25, which facilitates the disassembly and separation of the air outlet head 18 and the exhaust pipe 20, and facilitates the removal of the third filter screen 21 from the inside of the exhaust pipe 20.

[0030] The working principle of the above embodiment is as follows:

[0031] First, the gas generated in the semiconductor material production is discharged into the purification box body 1 through the action of the fan 3, the air inlet pipe 4 and the gas input pipe 5. At this time, the water pump 6 inputs a small amount of water into the inside of the shunt seat 9 through the water inlet pipe 7 and the water delivery pipe 8 and sprays the water in an atomized manner through the atomizing spray head 10. At the same time, the driving motor 11 is started to drive the rotating shaft 12 to rotate. At this time, the mounting seat 13 drives the first filter screen 14 to rotate. At this time, the first filter screen 14 will purify and clean the gas inside the purification box body 1. Part of the waste gas is purified and cleaned through the second filter screen 16. The gas inside the purification box body 1 is guided through the air guide plate 17 and then input into the inside of the exhaust pipe 20 through the air outlet head 18 and the limit head 19. At this time, the third filter screen 21 filters and purifies the gas in the exhaust pipe 20, improving the efficiency and quality of waste gas purification.

[0032] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover a non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "including a..." does not exclude the existence of additional identical elements in the process, method, article or device including the said element.

[0033] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principle and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An exhaust mechanism for semiconductor material production, comprising a purification box (1), a support plate (2), a fan (3), an air inlet pipe (4), a gas input pipe (5), a box door (29) and a spray assembly, characterized in that: The purification box (1) is provided with a purification mechanism inside; The purification mechanism comprises a driving motor (11) fixedly mounted on the outer wall of the back side of the purification box (1); the output shaft of the driving motor (11) is fixedly mounted with a rotating shaft (12); the outer peripheral wall of the rotating shaft (12) is fixedly mounted with four mounting seats (13); a first filter screen (14) is movably mounted inside the mounting seats (13); a limiting seat (15) is fixedly mounted on the top inner wall and the bottom inner wall of the purification box (1); a second filter screen (14) is slidably mounted between the two limiting seats (15). A filter screen (16) is fixedly installed between the limit seat (15) and the purification box (1); an air guide plate (17) is fixedly installed on the right inner wall of the purification box (1); a gas outlet head (18) is fixedly installed on the right outer wall of the gas outlet head (18); an exhaust pipe (20) is slidably connected to the outer peripheral wall of the limit head (19); a third filter screen (21) is movably installed on the inner peripheral wall of the exhaust pipe (20); and a limit ring (22) is fixedly installed on the inner peripheral wall of the exhaust pipe (20).

2. The exhaust mechanism for semiconductor material production according to claim 1, characterized in that: The spray assembly comprises a water pump (6) fixedly mounted on the top of the purification box (1), a water inlet pipe (7) fixedly mounted on the water inlet end of the water pump (6), a water delivery pipe (8) fixedly mounted on the water outlet end of the water pump (6), a diverter seat (9) fixedly mounted on the side of the water delivery pipe (8) away from the water pump (6), and three atomizing spray heads (10) fixedly mounted on the bottom of the diverter seat (9).

3. The exhaust mechanism for semiconductor material production according to claim 1, characterized in that: A flange (23) is fixedly mounted on the outer wall of the gas outlet head (18) and the exhaust pipe (20) on one side opposite to the other, and a plurality of second bolts (25) are connected to the internal threads of the flange (23).

4. The exhaust mechanism for semiconductor material production according to claim 1, characterized in that: A mounting groove is provided on a side of the mounting seat (13) away from the rotating shaft (12); the first filter screen (14) is movably mounted inside the mounting groove and is of a size that matches the first filter screen (14); a mounting hole is provided inside the first filter screen (14); a threaded hole is provided inside the mounting seat (13); a first bolt (24) is threadedly connected to the inside of the threaded hole and is of a size that matches the first bolt (24).

5. The exhaust mechanism for semiconductor material production according to claim 1, characterized in that: Two guide plates (26) are fixedly mounted on the inner wall of the bottom of the purification box (1), and the guide plates (26) are in the shape of a right triangle. Two sewage pipes (27) are fixedly mounted on the inner wall of the bottom of the purification box (1), and a collecting box (28) is mounted at the bottom of the sewage pipes (27). The two sewage pipes (27) are located between the two guide plates (26).

6. The exhaust mechanism for semiconductor material production according to claim 1, characterized in that: The air guide plates (17) are trapezoidal in shape, and the shortest distance between the outer walls of two opposite sides of the air guide plates (17) is the same as the diameter of the air outlet head (18).

7. The exhaust mechanism for semiconductor material production according to claim 1, characterized in that: The support plate (2) is fixedly mounted on the left outer wall of the purification box (1), the fan (3) is fixedly mounted on the top of the support plate (2), the air inlet pipe (4) and the gas input pipe (5) are respectively fixedly mounted on the air inlet end and the air outlet end of the fan (3), and the gas input pipe (5) passes through the left outer wall of the purification box (1) and extends to the interior.

Images