Demolding device

By designing a membrane defiling device including a liquid reservoir, a suction device, a fluid conduit and a spray nozzle, the problem of incomplete membrane defiling in the prior art is solved, efficient cleaning of the substrate is achieved, and product quality and production efficiency are improved.

CN222994827UActive Publication Date: 2025-06-17TRULY OPTO ELECTRONICS
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Patent Information

Application Number
CN202421383458.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-17
Publication Date
2025-06-17
Estimated Expiration
2034-06-17

AI Technical Summary

Technical Problem

Existing membrane decompression devices are prone to incomplete membrane decompression during the production process, which leads to the photoresist falling off in the subsequent process, affecting product quality and reliability.

Method used

A membrane defiling device is designed, including a liquid storage tank, a suction device, a liquid conduit and a spray nozzle. Each liquid storage tank provides medicinal liquid for two membrane defiling chambers. Through the combination of the suction device and a spray nozzle, efficient cleaning of the substrate is achieved.

Benefits of technology

The device can clean 99% of the photoresist in one membrane defiling chamber, and through the continuous cleaning process of multiple membrane defiling chambers, ensuring that there is no photoresist residue on the substrate surface, improving product quality and production efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a demolding device, which comprises a demolding station, the demolding station comprises at least one liquid storage tank, a plurality of suction devices, a plurality of liquid guide pipes and a plurality of spraying nozzles; at least two demoulding chambers are arranged in the demoulding station, each liquid storage tank provides liquid medicine for the two demoulding chambers, each liquid storage tank is communicated with each spraying nozzle through each liquid guide pipe, each suction device is arranged between each liquid storage tank and each liquid guide pipe, and each liquid storage tank is communicated with each spraying nozzle through each liquid guide pipe. Liquid medicine in the liquid storage tank is pumped out of the liquid guide pipe through the suction device, after the demolding cavities are primarily cleaned, a substrate is transferred to the next demolding cavity to be further cleaned, finally, the liquid medicine in the liquid guide pipe is sprayed towards the substrate to which photoresist adheres from the spraying nozzle, the photoresist on the substrate is cleaned, and the photoresist on the substrate is removed. And stripping the photoresist from the substrate by using a tool. Each liquid storage tank provides liquid medicine for the two demolding cavities, it is guaranteed that the photoresist is dissolved through the activity of the demolding liquid, and therefore the quality of the substrate is guaranteed.
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Description

Technical Field

[0001] The utility model relates to the field of cover plates, and particularly to a film stripping device. Background Art

[0002] In the production process of TP / TFT, it is necessary to stack various layers of patterns on a substrate layer by layer. Among them, the pattern production of the ITO / MAM layer needs to go through processes such as cleaning, coating, pre-baking, exposure, development, curing, etching, and film stripping. After film stripping, the corresponding pattern is transferred to the substrate. However, the existing film stripping process has the phenomenon of incomplete film stripping: the existing film stripping device has a total of 6 stripping chambers, and the liquid medicine in each liquid medicine tank sprays for the 6 stripping chambers, and the sprayed liquid medicine flows back to the liquid medicine tank. Therefore, when a certain quantity is produced, the photoresist dissolves in the stripping liquid, reducing the activity and ability of the stripping liquid, and then resulting in the problem of incomplete film stripping, which leads to the problem of film layer peeling off in the subsequent manufacturing process, causing problems with the quality and reliability of the product. Summary of the Utility Model

[0003] The purpose of the utility model is to overcome the deficiencies in the prior art and provide a film stripping device.

[0004] The purpose of the utility model is achieved by the following technical solutions:

[0005] A film stripping device includes: a film stripping station; the film stripping station includes at least one liquid storage tank, several suction devices, several liquid guide pipes, and several spray nozzles; at least two stripping chambers are arranged in the film stripping station, and the stripping chambers are used to clean the substrate adhered with photoresist. Each liquid storage tank provides liquid medicine for two of the stripping chambers. The spray nozzles are respectively arranged at the top of the stripping chambers, and the spray nozzles face the substrate in the stripping chambers. Each liquid storage tank is communicated with each spray nozzle through each liquid guide pipe. Each suction device is arranged between the liquid storage tank and the liquid guide pipe. The liquid medicine in the liquid storage tank is pumped out from the liquid guide pipe through the suction device. After preliminary cleaning in the stripping chamber, the substrate is transferred to the next stripping chamber for further cleaning.

[0006] In one of the embodiments, the suction device is a water pump.

[0007] In one of the embodiments, two spray nozzles are arranged in each of the stripping chambers.

[0008] In one of the embodiments, the number of the stripping chambers is six, and the number of the liquid storage tanks is three. Each liquid storage tank provides the sprayed liquid medicine for two of the stripping chambers.

[0009] In one of the embodiments, each of the stripping chambers is horizontally arranged.

[0010] In one embodiment, a water valve is provided between each of the liquid storage tanks and the liquid guide pipe.

[0011] In one embodiment, the film stripping station further includes a plurality of return pipes, and each of the liquid storage tanks is communicated with each of the film stripping chambers through the return pipes.

[0012] In one embodiment, the liquid storage tank is arranged below the film stripping chamber, one end of the return pipe is communicated with the bottom of the film stripping chamber, and the other end is communicated with the top of the liquid storage tank.

[0013] In one embodiment, the bottoms of every two of the film stripping chambers are communicated.

[0014] In one embodiment, the film stripping device further includes a spraying station, the spraying station is below the film stripping station, the spraying station includes a spraying pipe, a water tank, a water pump and a high-pressure nozzle, the water tank is communicated with the high-pressure nozzle through the spraying pipe, and the water pump pumps the clear water in the water tank out from the high-pressure nozzle for flushing the substrate.

[0015] Compared with the prior art, the present utility model has at least the following advantages:

[0016] The film stripping device of the present utility model is provided with a film stripping station, which includes a liquid storage tank, a suction device, a liquid guide pipe and a plurality of spraying nozzles. Each liquid storage tank provides a liquid medicine for two film stripping chambers to ensure the activity of the film stripping liquid to dissolve the photoresist so as to ensure the quality of the substrate. Each liquid storage tank is communicated with each spraying nozzle through the liquid guide pipe, the suction device is arranged between the liquid storage tank and the liquid guide pipe, the liquid medicine in the liquid storage tank is pumped out from the liquid guide pipe through the suction device, and finally, the liquid medicine in the liquid guide pipe is sprayed from the spraying nozzle towards the substrate adhered with the photoresist to clean the photoresist on the substrate, and at the same time, a tool is used to peel the photoresist from the substrate. After preliminary cleaning in one film stripping chamber, 99% of the photoresist can be cleaned. Finally, the preliminarily cleaned substrate is transferred to the next film stripping chamber for deep cleaning to further clean the photoresist on the substrate. Description of the Drawings

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required to be used in the embodiments will be briefly introduced below.

[0018] Figure 1 It is a schematic structural diagram of a film stripping device in an embodiment of the present utility model.

[0019] Reference Numerals:

[0020] Film stripping chamber 10, liquid storage tank 11, liquid guide pipe 12, spraying nozzle 13, water valve 14, return pipe 15. Detailed implementation manners

[0021] To facilitate the understanding of the present utility model, the present utility model will be described more comprehensively below with reference to the relevant drawings.

[0022] This application proposes a film stripping device. Please refer to Figure 1 , including: a film stripping station. The film stripping station includes a liquid storage tank 11, a suction device, a liquid guide pipe 12, and a plurality of spray nozzles 13. At least two film stripping chambers 10 are provided in the film stripping station. The film stripping chamber 10 is used to clean the substrate adhered with photoresist. Each spray nozzle 13 is respectively arranged at the top of the film stripping chamber 10. The spray nozzle 13 faces the substrate in the film stripping chamber 10 and is used to spray the substrate, so that the photoresist on the substrate naturally falls off from the substrate, so that the staff can use tools for peeling. Each liquid storage tank 11 of this application provides liquid medicine for two film stripping chambers 10, ensuring the activity of the film stripping liquid to dissolve the photoresist to ensure the cleaning quality of the substrate. The liquid storage tank 11 is communicated with each spray nozzle 13 through the liquid guide pipe 12, and the suction device is arranged between the liquid storage tank 11 and the liquid guide pipe 12. The liquid medicine in the liquid storage tank 11 is pumped out from the liquid guide pipe 12 through the suction device. Finally, the liquid medicine in the liquid guide pipe 12 is sprayed from the spray nozzle 13 towards the substrate adhered with photoresist to clean the photoresist on the substrate, and at the same time, tools are used to peel the photoresist from the substrate. After a film stripping chamber 10 is preliminarily cleaned, 99% of the photoresist can be cleaned. Finally, the preliminarily cleaned substrate is transferred to the next film stripping chamber 10 for in-depth cleaning to further clean the photoresist on the substrate. Preferably, the suction device is a water pump.

[0023] It should be noted that the liquid medicine is a liquid specially used to dissolve photoresist.

[0024] Furthermore, please continue to refer to Figure 1 , two spray nozzles 13 are provided in each film stripping chamber 10 to increase the spraying area of the substrate, so that the liquid medicine can quickly infiltrate into each position of the substrate, improving the film stripping effect of the substrate and thus improving the film stripping efficiency. Among them, the number of film stripping chambers 10 is six, and the number of liquid storage tanks 11 is three. Each liquid storage tank 11 provides the spraying liquid medicine for two film stripping chambers 10. Among them, the first two film stripping chambers 10 are used to peel 99% of the photoresist from the substrate, and the middle two film stripping chambers 10 are used to peel the remaining thin residual photoresist from the substrate and at the same time perform a rinsing treatment on the substrate to ensure the cleanliness of the substrate surface. The last two film stripping chambers 10 improve the fault tolerance rate of the film stripping device and improve the reliability of the device to fully ensure that there is no photoresist residue on the substrate surface. And the number of film stripping chambers 10 can be set according to the cleanliness of the substrate.

[0025] Furthermore, each film stripping chamber 10 is horizontally arranged.

[0026] In one embodiment, please refer to Figure 1 , the film stripping station further includes a plurality of return pipes 15. A liquid storage tank 11 is connected to two film stripping chambers 10 through a return pipe 15, so that the liquid medicine can be recycled, improving the utilization rate of the liquid medicine, saving the waste of the liquid medicine, and thus reducing the cost. When the activity of the liquid medicine is reduced to below the standard activity, the staff needs to replace the liquid medicine in the liquid storage tank 11 to ensure the cleaning effect.

[0027] Further, the liquid storage tank 11 is arranged below the film stripping chamber 10. One end of the return pipe 15 is connected to the bottom of the film stripping chamber 10, and the other end is connected to the top of the liquid storage tank 11. Since the liquid flows to the lower place due to gravity, the liquid medicine after spraying can freely flow back into the liquid storage tank 11 through the return pipe 15, saving power. The bottoms of every two film stripping chambers 10 are connected, which can save the number of return pipes 15 and save costs. In addition,

[0028] In another preferred embodiment, please refer to again Figure 1 , a water valve 14 is arranged between each liquid storage tank 11 and the liquid guide pipe 12. When the staff needs to replace the liquid guide pipe 12, the water valve 14 can be closed to prevent the liquid medicine from flowing out of the interface of the liquid guide pipe 12, thus causing waste of the liquid medicine.

[0029] In addition, the film stripping device further includes a spraying station, which is arranged below the film stripping station and flushes the cleaned substrate. High-pressure clean water is used to flush the residual film and liquid medicine on the surface of the substrate, further ensuring the cleanliness of the substrate. Specifically, the spraying station includes a spraying pipe, a water tank, a water pump and a high-pressure nozzle. The water tank is used to store clean water. The water pump provides negative pressure for the clean water to form high pressure. The water tank is connected to the high-pressure nozzle through the spraying pipe. The water pump pumps the clean water in the water tank out of the high-pressure nozzle, and the spraying end of the high-pressure nozzle faces the substrate for flushing the substrate.

[0030] The above embodiments only represent several implementation manners of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the utility model patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several deformations and improvements can still be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the utility model patent shall be subject to the appended claims.

Claims

1. A film stripping device, characterized in that: include: Demolding station; The demolding station includes at least one liquid storage tank, a plurality of suction devices, a plurality of liquid guide tubes and a plurality of spray nozzles; at least two demolding chambers are arranged in the demolding station, and the demolding chambers are used to clean the substrate adhered with the photoresist, and the substrate passes through each of the demolding chambers in turn; each of the liquid storage tanks provides liquid medicine for the two demolding chambers, and the spray nozzles are respectively arranged on the top of the demolding chambers, and the spray nozzles are directed toward the substrates in the demolding chambers. Each of the liquid storage tanks is connected to each of the spray nozzles through each of the liquid guide tubes, and each of the suction devices is arranged between the liquid storage tanks and the liquid guide tubes, and the liquid medicine in the liquid storage tanks is pumped out from the liquid guide tubes through the suction devices.

2. The film stripping device according to claim 1, characterized in that: The suction device is a water pump.

3. The film stripping device according to claim 1, characterized in that: Two spray nozzles are arranged in each of the demolding chambers.

4. The film stripping device according to claim 1, characterized in that: The number of the demolding chambers is six, the number of the liquid storage tanks is three, and each of the liquid storage tanks provides spraying liquid for two of the demolding chambers.

5. The film stripping device according to claim 4, characterized in that: Each of the demolding chambers is arranged horizontally.

6. The film stripping device according to claim 1, characterized in that: A water valve is arranged between each of the liquid storage tanks and the liquid guiding tube.

7. The film stripping device according to claim 1, characterized in that: The film stripping station further comprises a plurality of reflux pipes, and each of the liquid storage tanks is connected with each of the film stripping chambers via the reflux pipes.

8. The film stripping device according to claim 7, characterized in that: The liquid storage tank is arranged below the film stripping chamber, one end of the reflux pipe is communicated with the bottom of the film stripping chamber, and the other end is communicated with the top of the liquid storage tank.

9. The film stripping device according to claim 8, characterized in that: The bottoms of every two of the demolding chambers are connected.

10. The film stripping device according to claim 1, characterized in that: It also includes a spraying station, which is below the stripping station. The spraying station includes a spray pipe, a water tank, a water pump and a high-pressure nozzle. The water tank is connected to the high-pressure nozzle through the spray pipe. The water pump pumps the clean water in the water tank out of the high-pressure nozzle for washing the substrate.