Silicon wafer cleaning liquid recovery device

By designing a silicon wafer cleaning liquid recovery device with multiple filtering and shunt chamber diversion structures, the problem of incomplete filtration and cleaning liquid mixing in the existing device is solved, and efficient removal and shunt of cleaning liquid is achieved, and processing efficiency is improved.

CN223009937UActive Publication Date: 2025-06-24SHANGHAI EACO GASES CO LTD
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Patent Information

Application Number
CN202421940767.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-12
Publication Date
2025-06-24
Estimated Expiration
2034-08-12

AI Technical Summary

Technical Problem

The existing cleaning liquid recovery device has the problem that it is difficult to completely remove impurities through a single filtration in the filter structure, and the lack of diversion measures leads to mixing multiple cleaning liquids, which increases the difficulty of subsequent processing.

Method used

A silicon wafer cleaning liquid recovery device including a first filter member and a second filter member is designed. Through the diverting structure of the multiple filtration and the diverting chamber, multiple filtration of the cleaning liquid and different types of cleaning liquid are realized to avoid impurities residues and liquid mixing.

Benefits of technology

The impurities in the cleaning liquid are completely removed, the maintenance of the filter structure is improved, the mixing of multiple cleaning liquids is avoided, and the subsequent processing process is simplified.

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Abstract

The utility model discloses a silicon wafer cleaning fluid recovery device which comprises a supporting plate, a plurality of supporting legs are fixedly connected to the bottom of the supporting plate, a recovery frame is fixedly connected to the top of the supporting plate, a plurality of pipe holes are formed in the surface of the recovery frame, and a recovery groove is fixedly connected to the top of the recovery frame. A plurality of liquid inlet pipes and liquid outlet pipes are arranged at the two ends of the recovery tank respectively, a plurality of splitter plates are fixedly connected to the inner wall of the recovery tank, an inner cavity of the recovery tank is equally divided into a plurality of splitter cavities by the splitter plates, a first filtering piece is arranged on the recovery tank, a plurality of positioning grooves are formed in the surface of the supporting plate, and a plurality of second filtering pieces are arranged in the positioning grooves. And a liquid storage tank is placed in each positioning groove, a plurality of clamping grooves are formed in the top end face of each liquid storage tank, and a second filtering piece is installed at the top end of each liquid storage tank. According to the utility model, cleaning fluid can be filtered for multiple times, and different types of cleaning fluid can be shunted.
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Description

Technical Field

[0001] The utility model belongs to the technical field of cleaning liquid recovery, and particularly relates to a silicon wafer cleaning liquid recovery device. Background Art

[0002] Silicon wafer cleaning is a very crucial step in the semiconductor manufacturing process, aiming to remove contaminants on the surface of the silicon wafer to ensure the high quality and high reliability of subsequent processes. The goal of silicon wafer cleaning is to remove contaminants such as particles, metal contamination, oxides, and organic substances.

[0003] When cleaning silicon wafers, cleaning liquid is required, and after cleaning, the remaining cleaning liquid needs to be recovered to reduce the consumption of chemicals, lower production costs, and at the same time reduce the discharge of waste liquid and environmental pollution. Currently, there are some cleaning liquid recovery devices on the market. For example, a cleaning liquid recovery device is disclosed on the Chinese Patent Network, with a publication number of CN219442728U. This recovery device can be used for the recovery of cleaning liquid, but there are some defects and deficiencies to be improved: (1) When recovering the cleaning liquid, it is usually necessary to filter the suspended particles and large particle contaminants in the cleaning liquid to avoid the cleaning liquid containing more impurities. Although some existing cleaning liquid recovery devices are provided with a filtering structure, they can often only perform single filtration, making it difficult to completely remove the impurities in the cleaning liquid, and it is not convenient to clean or replace the filtering structure after long-term use, resulting in the blockage of the filtering structure and affecting the subsequent filtering effect; (2) When cleaning silicon wafers, in order to remove different types of contaminants, multiple different cleaning liquids are often used. However, the existing cleaning liquid recovery devices lack corresponding shunt measures, so that multiple cleaning liquids will be mixed together after recovery, increasing the subsequent treatment difficulty. Therefore, in view of the above problems, it is of great significance to provide a silicon wafer cleaning liquid recovery device according to the utility model. Summary of the Utility Model

[0004] The utility model provides a silicon wafer cleaning liquid recovery device, which can perform multiple filtrations on the cleaning liquid through a first filter element and a second filter element to completely remove the impurities in the cleaning liquid; different types of cleaning liquids can be respectively introduced into different shunt chambers through multiple liquid inlet pipes, and the introduced cleaning liquids can be shunted through multiple shunt chambers to avoid the mixing of multiple different cleaning liquids and increase the subsequent treatment difficulty. In summary, the problems in the background art are solved.

[0005] To solve the above technical problems, the utility model is realized through the following technical solutions:

[0006] A silicon wafer cleaning liquid recovery device of the utility model includes a support plate. A number of support legs are fixedly connected to the bottom of the support plate, and a recovery frame is fixedly connected to the top thereof. The recovery frame is L-shaped, and a number of pipe holes are formed on its surface. A recovery tank is fixedly connected to the top of the recovery frame. A number of liquid inlet pipes and liquid outlet pipes are respectively arranged at both ends of the recovery tank. The liquid inlet pipes and the liquid outlet pipes are both communicated with the inner cavity of the recovery tank, and a liquid valve is installed on each of the liquid inlet pipes and the liquid outlet pipes. A number of flow dividing plates are fixedly connected to the inner wall of the recovery tank. The flow dividing plates divide the inner cavity of the recovery tank into several equal flow dividing chambers. A first filter element is arranged on the recovery tank. Each of the liquid outlet pipes passes through the corresponding pipe hole and extends to the lower part of the recovery frame. A number of positioning grooves are formed on the surface of the support plate. A liquid storage tank is placed in each of the positioning grooves. A number of clamping grooves are formed on the top end face of the liquid storage tank, and a second filter element is installed at the top end of each of the liquid storage tanks;

[0007] The first filter element includes a filter frame. The filter frame is n-shaped, a handle is fixedly connected to the top thereof, and a number of first filter meshes are installed at the bottom of the filter frame;

[0008] The second filter element includes a filter cover. The filter cover is circular, its diameter is equal to the inner diameter of the liquid storage tank, and a second filter mesh is installed on the filter cover. A number of clamping blocks are fixedly connected to the outer wall of the filter cover.

[0009] Further, the number of the liquid inlet pipes, the liquid outlet pipes, and the flow dividing chambers is the same, and the centers of each of the liquid inlet pipes, the liquid outlet pipes, and the flow dividing chambers are located on the same straight line.

[0010] Further, the inner wall width of the filter frame corresponds to and is equal to the outer wall width of the recovery tank. The number of the first filter meshes is the same as that of the flow dividing chambers, and the widths correspond to and are equal to each other. The center of each of the first filter meshes corresponds to the center of each of the flow dividing chambers one by one.

[0011] Further, the number of the positioning grooves is the same as that of the pipe holes, and each of the positioning grooves is located directly below the corresponding pipe hole.

[0012] Further, an anti-slip pad is arranged at the bottom of each of the positioning grooves. The anti-slip pad is circular, its diameter is equal to the diameter of the positioning groove, and a herringbone anti-slip pattern is engraved on the surface of the anti-slip pad.

[0013] Further, both the clamping blocks and the clamping grooves are rectangular, their number is the same, the widths are equal, and the centers of each of the clamping blocks correspond to the centers of each of the clamping grooves one by one.

[0014] Furthermore, a plurality of reinforcing blocks are fixedly connected to the inner wall of the top of the recycling rack. The reinforcing blocks are triangular, one side of which is fixedly connected to the side wall of the recycling rack, and the reinforcing blocks are linearly distributed at equal intervals along the width direction of the recycling rack.

[0015] The utility model has the following beneficial effects compared with the prior art:

[0016] (1) When the silicon wafer cleaning liquid recycling device in the utility model is in use, the cleaning liquid can be filtered multiple times through the first filter element and the second filter element so as to completely remove impurities in the cleaning liquid;

[0017] (2) When the silicon wafer cleaning liquid recycling device in the utility model is in use, different types of cleaning liquids can be respectively introduced into different diversion cavities through a plurality of liquid inlet pipes, and the introduced cleaning liquids can be diverted through the plurality of diversion cavities so as to avoid mixing of multiple different cleaning liquids and increase the subsequent treatment difficulty.

[0018] Of course, any product implementing the utility model does not necessarily need to achieve all the above advantages simultaneously. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for describing the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the utility model, and for those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0020] Figure 1 is a schematic structural diagram of a silicon wafer cleaning liquid recycling device of the utility model;

[0021] Figure 2 is a schematic structural diagram of the recycling rack in the utility model;

[0022] Figure 3 is a top view of the recycling tank in the utility model;

[0023] Figure 4 is a side view of the first filter element in the utility model;

[0024] Figure 5 is a schematic structural diagram of the liquid storage tank in the utility model;

[0025] Figure 6 is a schematic structural diagram of the second filter element in the utility model.

[0026] In the drawings, the list of components represented by each reference numeral is as follows:

[0027] 1. Support plate; 2. Support leg; 3. Recycling rack; 4. Pipe hole; 5. Recycling groove; 6. Liquid inlet pipe; 7. Liquid outlet pipe; 8. Liquid valve; 9. Diverting plate; 10. Diverting cavity; 11. Positioning groove; 12. Liquid storage tank; 13. Card slot; 14. Filter rack; 15. Handle; 16. First filter screen; 17. Filter cover; 18. Second filter screen; 19. Clamping block; 20. Anti-slip pad; 21. Reinforcing block. Detailed implementation mode

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0029] In the description of the present invention, it should be understood that the terms "relative", "one end", "inner", "lateral", "end", "both ends", "both sides", "front", "one end face", "the other end face", etc. indicating the orientation or position relationship are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the components or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus cannot be understood as a limitation to the present invention.

[0030] Please refer to Figure 1-6As shown in the figure, a silicon wafer cleaning liquid recovery device of the present utility model includes a support plate 1. A plurality of support legs 2 are fixedly connected to the bottom of the support plate 1, and a recovery frame 3 is fixedly connected to the top thereof. The recovery frame 3 is L-shaped, and a plurality of pipe holes 4 are formed on its surface. Moreover, a recovery tank 5 is fixedly connected to the top of the recovery frame 3. A plurality of liquid inlet pipes 6 and liquid outlet pipes 7 are respectively arranged at both ends of the recovery tank 5. The liquid inlet pipes 6 and the liquid outlet pipes 7 are both communicated with the inner cavity of the recovery tank 5. A liquid valve 8 is installed on each of the liquid inlet pipes 6 and the liquid outlet pipes 7. After the liquid valve 8 is opened, the remaining cleaning liquid after silicon wafer cleaning can be introduced into the inner cavity of the recovery tank 5. A plurality of flow dividing plates 9 are fixedly connected to the inner wall of the recovery tank 5. The flow dividing plates 9 divide the inner cavity of the recovery tank 5 into several equal flow dividing chambers 10. The introduced cleaning liquid can be divided through the flow dividing chambers 10 to avoid increasing the subsequent treatment difficulty after mixing of various different cleaning liquids. A first filtering member is arranged on the recovery tank 5. Each liquid outlet pipe 7 passes through the corresponding pipe hole 4 and extends below the recovery frame 3. A plurality of positioning grooves 11 are formed on the surface of the support plate 1. A liquid storage tank 12 is placed in each positioning groove 11. The divided cleaning liquid can be introduced into different liquid storage tanks 12 through the liquid outlet pipes 7. Multiple liquid storage tanks 12 can be used to separately store various different cleaning liquids for subsequent separate treatment of different cleaning liquids. A plurality of clamping grooves 13 are formed on the top end surface of the liquid storage tank 12, and a second filtering member is installed at the top end of each liquid storage tank 12;

[0031] The first filtering member includes a filtering frame 14. The filtering frame 14 is n-shaped, a handle 15 is fixedly connected to the top thereof, and a plurality of first filter meshes 16 are installed at the bottom of the filtering frame 14. The cleaning liquid entering the recovery tank 5 can be preliminarily filtered through the first filter meshes 16 to remove suspended particles and large particle pollutants contained in the cleaning liquid;

[0032] The second filtering member includes a filtering cover 17. The filtering cover 17 is circular, and its diameter is equal to the inner diameter of the liquid storage tank 12. A second filter mesh 18 is installed on the filtering cover 17. A plurality of clamping blocks 19 are fixedly connected to the outer wall of the filtering cover 17. The cleaning liquid entering the liquid storage tank 12 can be secondary filtered through the second filter mesh 18, so as to completely remove the remaining impurities in the cleaning liquid.

[0033] Among them, the numbers of the liquid inlet pipes 6, the liquid outlet pipes 7, and the flow dividing chambers 10 are the same, and the centers of each of the liquid inlet pipes 6, the liquid outlet pipes 7, and the flow dividing chambers 10 are located on the same straight line. Different types of cleaning liquids can be respectively introduced into different flow dividing chambers 10 through multiple liquid inlet pipes 6 and introduced into different liquid storage tanks 12 through multiple liquid outlet pipes 7 to achieve the division of multiple cleaning liquids.

[0034] Among them, the inner wall width of the filter rack 14 corresponds exactly to the outer wall width of the recovery tank 5. The number of the first filter nets 16 is the same as that of the diversion chambers 10, and their widths correspond exactly. Moreover, the center of each first filter net 16 corresponds one by one to the center of each diversion chamber 10. The filter rack 14 can be attached to the outer wall of the recovery tank 5 so that the filter rack 14 can be fixed by plugging. At this time, each first filter net 16 can be aligned and attached to the inner wall of the corresponding diversion chamber 10, so that the cleaning liquid in each diversion chamber 10 can be filtered by multiple first filter nets 16 at the same time. After long-term use, the entire first filter element can be lifted upward and removed from the recovery tank 5 through the handle 15 to clean or replace each first filter net 16.

[0035] Among them, the number of the positioning grooves 11 is the same as that of the pipe holes 4, and each positioning groove 11 is located directly below the corresponding pipe hole 4. When the liquid storage tank 12 is placed in each positioning groove 11, the position of its tank mouth is directly opposite to the end pipe orifice of the liquid outlet pipe 7, thus ensuring that the cleaning liquid can be accurately introduced into the corresponding liquid storage tank 12.

[0036] Among them, an anti-slip pad 20 is provided at the bottom of each positioning groove 11. The anti-slip pad 20 is circular, its diameter is equal to the diameter of the positioning groove 11, and the surface of the anti-slip pad 20 is engraved with herringbone anti-slip patterns. The anti-slip pad 20 is made of an elastic material such as rubber and is fixed by means of glue, etc. When the liquid storage tank 12 is placed in the positioning groove 11, the anti-slip pad 20 can be used to increase the friction between the liquid storage tank 12 and the positioning groove 11 to play an anti-slip role, thus effectively preventing the liquid storage tank 12 from shifting and tipping due to slipping.

[0037] Among them, both the clamping blocks 19 and the clamping grooves 13 are rectangular, their numbers are the same, and their widths are equal. Moreover, the center of each clamping block 19 corresponds one by one to the center of each clamping groove 13. When the filter cover 17 is placed into the liquid storage tank 12, each clamping block 19 can be aligned and attached to the corresponding clamping groove 13. At this time, the filter cover 17 can be fixed through the mutual cooperation between the clamping blocks 19 and the clamping grooves 13. After long-term use, the entire second filter element can be taken out of the liquid storage tank 12 to clean or replace the second filter net 18.

[0038] Among them, a number of reinforcing blocks 21 are fixedly connected to the inner wall of the top of the recovery rack 3. The reinforcing blocks 21 are triangular, one side of which is fixedly connected to the side wall of the recovery rack 3, and the reinforcing blocks 21 are linearly distributed at equal intervals along the width direction of the recovery rack 3. The recovery rack 3 can be supported and reinforced by each reinforcing block 21 to improve the structural firmness of the recovery rack 3, thus effectively preventing the recovery rack 3 from deforming due to stress.

[0039] The circuits, electronic components, and chip modules involved in the present utility model are all prior arts, which can be fully realized by those skilled in the art without further elaboration. The content protected by the present utility model does not involve improvements to software and methods either.

[0040] The standard parts used in the application documents can be purchased from the market. All the components in the application documents can be customized according to the descriptions in the specification and the drawings. The specific connection methods of each part all adopt conventional means such as bolts, rivets, and welding that are mature in the prior art. The machinery, parts, and equipment all adopt conventional models in the prior art. The electrical components described in this text are all electrically connected to the external main controller and the 220V mains power supply, and the main controller can be a conventional known device such as the LED lamp body for control.

[0041] The working principle of the present utility model is:

[0042] When the present utility model is in use, the cleaning liquid remaining after silicon wafer cleaning can be introduced into the inner cavity of the recovery tank 5 by opening the liquid valve 8 on the liquid inlet pipe 6. The inner cavity of the recovery tank 5 is equally divided into a plurality of diversion cavities 10 by a plurality of diversion plates 9. Different types of cleaning liquids can be respectively introduced into different diversion cavities 10 through a plurality of liquid inlet pipes 6. The introduced cleaning liquid can be diverted through the plurality of diversion cavities 10 to avoid mixing of various different cleaning liquids and increase the subsequent treatment difficulty. When the cleaning liquid enters each diversion cavity 10, the cleaning liquid in each diversion cavity 10 can be preliminarily filtered through each first filter screen 16 on the first filter element to remove suspended particles and large particle pollutants contained in the cleaning liquid. After the preliminary filtration is completed, by opening the liquid valve 8 on each liquid outlet pipe 7, the diverted cleaning liquid can be introduced into different storage tanks 12. A variety of different cleaning liquids can be separately stored through the plurality of storage tanks 12 for subsequent separate treatment of different cleaning liquids. When the cleaning liquid enters each storage tank 12, the cleaning liquid can be secondarily filtered through the second filter screen 18 on the second filter element, so as to completely remove the impurities remaining in the cleaning liquid.

[0043] The preferred embodiments of the present utility model disclosed above are only used to help illustrate the present utility model. The preferred embodiments do not elaborate on all details and do not limit the present utility model to the specific embodiments described. Obviously, many modifications and variations can be made according to the content of this specification. These embodiments are selected and specifically described in this specification to better explain the principle and practical application of the present utility model, so that those skilled in the relevant technical field can well understand and utilize the present utility model. The present utility model is only limited by the claims and their full scope and equivalents.

Claims

1. A silicon wafer cleaning liquid recovery device, characterized in that: The invention comprises a support plate, wherein a plurality of support legs are fixedly connected to the bottom of the support plate, a recovery frame is fixedly connected to the top of the recovery frame, the recovery frame is L-shaped, a plurality of tube holes are opened on the surface of the recovery frame, and a recovery tank is fixedly connected to the top of the recovery frame, a plurality of liquid inlet pipes and liquid outlet pipes are respectively arranged at both ends of the recovery tank, the liquid inlet pipes and the liquid outlet pipes are both connected to the inner cavity of the recovery tank, and a liquid valve is installed on each of the liquid inlet pipes and the liquid outlet pipes, a plurality of diverter plates are fixedly connected to the inner wall of the recovery tank, the diverter plates divide the inner cavity of the recovery tank into a plurality of diverter chambers, a first filter element is arranged on the recovery tank, each of the liquid outlet pipes passes through the corresponding tube hole and extends to the bottom of the recovery frame, a plurality of positioning grooves are opened on the surface of the support plate, a liquid storage tank is placed in each of the positioning grooves, a plurality of card slots are opened on the top end surface of the liquid storage tank, and a second filter element is installed on the top of each of the liquid storage tanks; The first filter element comprises a filter frame, the filter frame is in an N shape, a handle is fixedly connected to the top of the filter frame, and a plurality of first filter screens are installed at the bottom of the filter frame; The second filter element comprises a filter cover, which is circular and has a diameter equal to the inner diameter of the liquid storage tank. A second filter screen is installed on the filter cover, and a plurality of blocks are fixedly connected to the outer wall of the filter cover.

2. A silicon wafer cleaning liquid recovery device according to claim 1, characterized in that: The number of the liquid inlet pipes, the liquid outlet pipes and the diversion chambers are the same, and the centers of the liquid inlet pipes, the liquid outlet pipes and the diversion chambers are all located on the same straight line.

3. A silicon wafer cleaning liquid recovery device according to claim 1, characterized in that: The inner wall width of the filter frame is equal to the outer wall width of the recovery tank, the first filter screens are the same in number and width as the diversion chambers, and the center of each of the first filter screens corresponds to the center of each diversion chamber.

4. The silicon wafer cleaning liquid recovery device according to claim 1, characterized in that: The number of the positioning grooves is the same as the tube holes, and each of the positioning grooves is located directly below the corresponding tube hole.

5. The silicon wafer cleaning liquid recovery device according to claim 1, characterized in that: The bottom of each positioning groove is provided with an anti-skid pad, the anti-skid pad is circular, the diameter of the anti-skid pad is equal to the diameter of the positioning groove, and the surface of the anti-skid pad is engraved with herringbone anti-skid patterns.

6. The silicon wafer cleaning liquid recovery device according to claim 1, characterized in that: The card blocks and the card slots are both rectangular, have the same number and width, and the center of each card block corresponds to the center of each card slot.

7. The silicon wafer cleaning liquid recovery device according to claim 1, characterized in that: A plurality of reinforcing blocks are fixedly connected to the top inner wall of the recovery rack. The reinforcing blocks are triangular in shape, one side of which is fixedly connected to the side wall of the recovery rack, and the reinforcing blocks are equidistantly linearly distributed along the width direction of the recovery rack.

Citation Information

Patent Citations

  • Cleaning fluid recovery device

    CN219442728U