Pneumatically controlled nozzle assembly and substrate processing apparatus

Abstract

The utility model discloses a pneumatic control nozzle assembly and a substrate processing apparatus. The pneumatic control nozzle assembly comprises a nozzle body, a closing moving part and a pneumatic control driving part. The nozzle body includes an inlet end, an outlet end, and an internal passage. A closing movable member is movably disposed in the internal passage of the nozzle body. The pneumatic control driving part is connected with the nozzle body and the closing movable part and used for driving the closing movable part to do linear motion in the inner channel so that the nozzle body can be changed between the opening state and the closing state. And when the nozzle body is in the closed state, the closing movable part plugs the outlet end located at the tail end of the nozzle body.

Description

Technical Field

[0001] The present application relates to the field of semiconductor devices, and particularly to a pneumatic control nozzle assembly and a substrate processing apparatus. Background Art

[0002] In the cleaning or etching process of a single wafer, when the wet etching or cleaning process is about to end, the pipeline valve for supplying the chemical liquid is usually closed first to stop the supply of the chemical liquid. However, because the chemical liquid itself has weight, this often causes the residual chemical liquid inside the nozzle to drip from the nozzle tail end onto the wafer surface above the wafer turntable. This situation may cause chemical liquid contamination on the wafer surface and even lead to process problems such as over-etching.

[0003] In view of this, it is necessary to provide a pneumatic control nozzle assembly and a substrate processing apparatus to solve the above technical problems. Summary of the Utility Model

[0004] To solve the problems of the above prior art, the purpose of the present application is to provide a pneumatic control nozzle assembly and a substrate processing apparatus, which can prevent process liquid from dripping onto the wafer surface when the process stops.

[0005] In a first aspect, the present application provides a pneumatic control nozzle assembly, including: a nozzle body including an inlet end, an outlet end, and an internal channel, wherein the internal channel connects the inlet end and the outlet end; a closing movable member movably disposed in the internal channel of the nozzle body; and a control driving part connected to the nozzle body and the closing movable member for driving the closing movable member to perform a linear motion in the internal channel so that the nozzle body changes between an open state and a closed state, wherein when the nozzle body is in the closed state, the closing movable member plugs the outlet end located at the outermost end of the nozzle body.

[0006] In some embodiments, when the nozzle body is in the closed state, the end of the closing movable member protrudes out of the outlet end of the nozzle body.

[0007] In some embodiments, when the nozzle body is in the closed state, the end of the closing movable member is flush with the outlet end of the nozzle body.

[0008] In some embodiments, when the nozzle body is in the open state, the end of the closing movable member is separated from the outlet end of the nozzle body and the inner wall of the internal channel by a distance respectively.

[0009] In some embodiments, the linear motion of the closing movable member includes moving forward or away in a direction towards the outlet end of the nozzle body.

[0010] Second aspect, the present application also provides a substrate processing apparatus, including: a substrate holding part for holding a substrate; a liquid supply system for providing a liquid; and a pneumatic control nozzle assembly connected to the liquid supply system for applying the liquid onto the substrate, wherein the pneumatic control nozzle assembly includes: a nozzle body including an inlet end, an outlet end, and an internal channel, wherein the internal channel communicates the inlet end and the outlet end, and the nozzle body allows the liquid to enter through the inlet end and flow through the internal channel and then discharge from the outlet end; a closing movable member movably disposed in the internal channel of the nozzle body; and a pneumatic control driving part connected to the nozzle body and the closing movable member for driving the closing movable member to perform a linear motion in the internal channel so that the nozzle body changes between an open state and a closed state, wherein when the nozzle body is in the closed state, the closing movable member plugs the outlet end located at the outermost end of the nozzle body.

[0011] In some embodiments, when the nozzle body is in the closed state, one end of the closing movable member protrudes out of the outlet end of the nozzle body.

[0012] In some embodiments, when the nozzle body is in the closed state, one end of the closing movable member is flush with the outlet end of the nozzle body.

[0013] Compared with the prior art, the present application provides a pneumatic control nozzle assembly and a substrate processing apparatus, wherein when the nozzle body is in the closed state, the closing movable member plugs the outlet end located at the outermost end of the nozzle body, so that there is no space or channel for accommodating residual liquid on the side of the end of the closing movable member facing the outside, thereby ensuring that no additional liquid drips from the nozzle body in the closed state. Description of the Drawings

[0014] The following, in conjunction with the drawings, through a detailed description of the specific embodiments of the present application, will make the technical solutions and other beneficial effects of the present application obvious.

[0015] Figure 1 Schematic diagram showing a substrate processing apparatus according to an embodiment of the present application.

[0016] Figure 2 Schematic diagram showing the nozzle body of the pneumatic control nozzle assembly according to an embodiment of the present application in an open state.

[0017] Figure 3 Schematic diagram showing the nozzle body of the pneumatic control nozzle assembly according to an embodiment of the present application in a closed state.

[0018] Figure 4A partially enlarged view of the nozzle body of the pneumatic control nozzle assembly according to another embodiment of the present application in the closed state is shown.

[0019] Figure 5 A flowchart showing a control method of a substrate processing apparatus according to an embodiment of the present application is shown. Detailed Description of the Invention

[0020] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative efforts shall fall within the protection scope of the present application.

[0021] Please refer to Figure 1 , which shows a schematic diagram of a substrate processing apparatus according to an embodiment of the present application. The substrate processing apparatus 1 includes a pneumatic control nozzle assembly 10, a substrate holding portion 20, a liquid supply system 30, and a gas supply device 40. The substrate holding portion 20 is used to hold the substrate 2 thereon, and its design can be selected to be rotatable about an axis, and can use vacuum suction or clamping and other methods to maintain the stability of the substrate 2. The liquid supply system 30 is used to provide liquid and is connected to the pneumatic control nozzle assembly 10. The pneumatic control nozzle assembly 10 is used to apply the liquid from the liquid supply system 30 to the surface of the substrate 2 on the substrate holding portion 20 for cleaning, etching and other operations. Furthermore, the gas supply device 40 is connected to the pneumatic control nozzle assembly 10 and is used to supply gas to the pneumatic control nozzle assembly 10.

[0022] In the present application, by providing the pneumatic control nozzle assembly 10, the flow or cutoff of the liquid can be precisely controlled, thereby effectively adjusting the application of the liquid.

[0023] Please refer to Figure 2 and Figure 3 , Figure 2 which shows a schematic diagram of the nozzle body of the pneumatic control nozzle assembly according to an embodiment of the present application in the open state, and Figure 3 which shows a schematic diagram of the nozzle body of the pneumatic control nozzle assembly according to an embodiment of the present application in the closed state. The pneumatic control nozzle assembly 10 includes a nozzle body 11, a pneumatic control driving portion 12, and a closing movable member 13. The pneumatic control driving portion 12 is connected to the nozzle body 11 and the closing movable member 13.

[0024] As Figure 2 and Figure 3As shown, the nozzle body 11 includes an inlet end 111, an outlet end 112, and an internal channel 113. The internal channel 113 connects the inlet end 111 and the outlet end 112. In this application, the nozzle body 11 allows the liquid from the liquid supply system 30 to enter through the inlet end 111, and the liquid is discharged from the outlet end 112 after flowing through the internal channel 113. It should be noted that in this application, the inlet end 111 of the nozzle body 11 refers to the port connected to the liquid supply system 30, and the outlet end 112 of the nozzle body 11 is the outermost end of the nozzle body 11 and also refers to the end point of the internal channel 113.

[0025] As Figure 2 and Figure 3 As shown, in this embodiment, the nozzle body 11 includes two inlet ends 111. Correspondingly, the liquid supply system 30 includes a liquid supply source and a pipeline group. The pipeline group is connected between the liquid supply source and the nozzle body 11. The liquid supply source is configured to provide two different process liquids, and the pipeline group is responsible for transporting these two liquids to the two inlet ends 111 of the nozzle body 11 respectively. The nozzle body 11 receives different process liquids through these two inlet ends 111 and mixes them in the internal channel 113. This design allows different types or concentrations of liquids to be mixed inside the nozzle body 11 according to process requirements to achieve the best etching or cleaning effect. In addition, the design of a single nozzle body 11 avoids the problem of multiple nozzles occupying too much space and provides a more compact and efficient solution. It should be understood that in different embodiments, a design with more than two inlet ends 111 can be adopted to meet more complex process requirements, not limited to this.

[0026] As Figure 2 and Figure 3 As shown, the closing movable member 13 is movably disposed in the internal channel 113 of the nozzle body 11. In this embodiment, the closing movable member 13 is a straight and unbent long rod, one end of which is connected to the pneumatic driving portion 12, and the other end extends toward the outlet end 112 of the nozzle body 11. This straight and unbent long rod structure reduces the manufacturing difficulty and improves the precision of the process and the durability of the component.

[0027] As Figure 2 and Figure 3As shown, according to the positive pressure gas or negative pressure gas provided by the gas supply device 40, the pneumatic control driving part 12 drives the closing movable part 13 to perform linear motion in the internal channel 113, so that the nozzle body 11 changes between the open state and the closed state. Specifically, the linear motion of the closing movable part 13 includes moving forward in the direction of the outlet end 112 of the nozzle body 11 or moving away from the outlet end 112. This design allows the closing movable part 13 to move freely in the internal channel 113, achieving precise adjustment of liquid flow or cutoff. This not only simplifies the operation process, but also significantly improves the overall performance and long-term reliability of the system, ensuring the stability and efficiency of the pneumatic control nozzle assembly 10 during long-term use.

[0028] As Figure 2 shown, the gas supply device 40 provides negative pressure gas, so that the pneumatic control driving part 12 drives the closing movable part 13 to move away from the outlet end 112 of the nozzle body 11, so that the nozzle body 11 is in the open state. When the nozzle body 11 is in the open state, the end 131 of the closing movable part 13 is separated from the outlet end 112 of the nozzle body 11 and the pipe wall of the internal channel 113 by a certain distance. In this case, the liquid in the internal channel 113 will flow through the gap between the closing movable part 13 and the pipe wall of the internal channel 113 to the outlet end 112 and finally be discharged from the outlet end 112.

[0029] As Figure 3 shown, the gas supply device 40 provides positive pressure gas, so that the pneumatic control driving part 12 drives the closing movable part 13 to move forward in the direction of the outlet end 112 of the nozzle body 11 until the closing movable part 13 plugs the outlet end 112 of the nozzle body 11, so that the nozzle body 11 is in the closed state. It should be understood that the configuration of the end 131 of the closing movable part 13 matches the configuration of the outlet end 112 of the nozzle body 11 and the end point of the internal channel 113 to ensure that the closing movable part 13 can completely plug the outlet end 112 of the nozzle body 11.

[0030] As Figure 3 shown, in this embodiment, when the nozzle body 11 is in the closed state, the end 131 of the closing movable part 13 is flush with the outlet end 112 of the nozzle body, and the end 131 of the closing movable part 13 is exactly located at the end point of the internal channel 113 of the nozzle body 11. In this way, there is no space or channel for accommodating residual liquid on the side of the end 131 of the closing movable part 13 facing the outside, so as to ensure that no additional liquid will drip from the nozzle body 11 in the closed state.

[0031] Please refer to Figure 4, which shows a partially enlarged view of the nozzle body of the pneumatic control nozzle assembly according to another embodiment of the present application in the closed state. In this embodiment, when the nozzle body 11 is in the closed state, the end 131 of the closing movable member 13 protrudes from the outlet end 112 of the nozzle body 11. At this time, the end wall of the closing movable member 13 will closely abut against the outermost end wall of the internal channel 113 to ensure that there is no gap between the closing movable member 13 and the pipe wall. Furthermore, since the closing movable member 13 protrudes from the outlet end 112, there will be no space or channel for accommodating residual liquid on the side of the end 131 of the closing movable member 13 facing the outside. Therefore, this design can effectively prevent additional liquid from dripping from the nozzle body 11 in the closed state, achieving a good sealing effect.

[0032] In some embodiments, the substrate processing apparatus may further include a back suction device. The back suction device can be connected to the pneumatic control nozzle assembly 10 through the inlet end 111 of the nozzle body 11. In addition, the back suction device can also be selectively connected to the pneumatic control nozzle assembly 10 through another additional opening, which is different from the inlet end 111 and the outlet end 112. The main function of the back suction device is to suck out the liquid in the internal channel 113. Specifically, when the etching or cleaning process stops, the liquid output of the liquid supply system 30 will be closed first. Subsequently, the back suction device will suck away the residual liquid in the internal channel 113. Finally, the closing movable member 13 is driven by the pneumatic control driving part 12 to completely close the outlet end 112 of the nozzle body 11. Through the setting of the back suction device, it is ensured that when the process stops, the liquid inside the nozzle body 11 can be completely removed, thus effectively avoiding the risk of unexpected liquid dripping.

[0033] The present application also provides a control method for a substrate processing apparatus, which is executed by the above-mentioned substrate processing apparatus 1. The structure of the substrate processing apparatus 1 is as described above and will not be elaborated here. In addition, the substrate processing apparatus 1 may further include a host, which is communicatively connected to each element of the substrate processing apparatus 1. The host includes a processor and a memory that are electrically connected. It should be understood that the host may also include one or more of the following components: a circuit board, a power supply circuit, etc. The processor and the memory are disposed on the circuit board. The memory is configured to store executable program codes. The processor runs the programs corresponding to these executable program codes by reading the executable program codes stored in the memory to execute the control method of the present application.

[0034] In this embodiment, the processor is generally configured to control the overall operation of the host. The processor may include one or more processors to execute instructions and perform actions in all or part of the steps in the operation of the above-mentioned substrate processing apparatus 1. In addition, the processor may include one or more modules that facilitate the interaction between the processor and other components. For example, the processor may include a communication module to facilitate the interaction between the communication component and the processor. The memory is configured to store various types of data to support the operation of the host. Examples of such data include instructions for any application or method operating on the host. The memory may be implemented using any type of volatile or non-volatile memory device or a combination thereof. The power circuit supplies power to various components of the host. The power circuit may include a power management system, one or more power supplies, and any other components associated with the generation, management, and distribution of power for the host. In an exemplary embodiment, the host may be implemented by an independent terminal device or electronic components such as a controller or microcontroller integrated in the substrate processing apparatus 1.

[0035] Please refer to Figure 5 , which shows a flowchart of a control method for a substrate processing apparatus according to an embodiment of the present application. The control method of the present application includes: First, in step 51, the above-mentioned substrate processing apparatus 1 is provided.

[0036] As Figure 1 and Figure 5 shown, in step 52, the substrate 2 is placed on the substrate holding portion 20.

[0037] As Figure 1 , Figure 2 and Figure 5 shown, in step 53, the pneumatic drive unit 12 is driven to move the closing movable member 13 away from the outlet end 112 of the nozzle body 11 so that the nozzle body 11 is in an open state. Specifically, the gas supply device 40 supplies negative pressure gas, causing the pneumatic drive unit 12 to drive the closing movable member 13 to move away from the outlet end 112 of the nozzle body 11, thereby making the nozzle body 11 in an open state.

[0038] As Figure 1 , Figure 2 and Figure 5 shown, in step 54, the liquid supply system 30 is started to apply liquid to the substrate 2 through the pneumatically controlled nozzle assembly 10. It should be understood that when the nozzle body 11 is in an open state, the end 131 of the closing movable member 13 is separated from the outlet end 112 of the nozzle body 11 and the inner wall of the inner channel 113 by a certain distance. In this case, the liquid in the inner channel 113 will flow through the gap between the closing movable member 13 and the inner wall of the inner channel 113 to the outlet end 112 and finally be discharged from the outlet end 112.

[0039] AsFigure 1 , Figure 3 and Figure 5 As shown in Figure 1 , Figure 3 and Figure 5 , in step 55, the pneumatic driving part 12 drives the closing movable part 13 to move forward towards the outlet end 112 of the nozzle body 11 until the outlet end 112 at the very end of the nozzle body 11 is blocked, so that the nozzle body 11 is in a closed state. Specifically, the gas supply device 40 supplies positive pressure gas, so that the pneumatic driving part 12 drives the closing movable part 13 to move forward towards the outlet end 112 of the nozzle body 11 until the closing movable part 13 blocks the outlet end 112 of the nozzle body 11, thereby making the nozzle body 11 in a closed state. It should be understood that the configuration of the end 131 of the closing movable part 13 matches the configuration of the outlet end 112 of the nozzle body 11 and the end of the internal channel 113 to ensure that the closing movable part 13 can completely block the outlet end 112 of the nozzle body 11.

[0040] In some embodiments, the substrate processing device may further include a suction device. The suction device can be connected to the pneumatic control nozzle assembly 10 through the inlet end 111 of the nozzle body 11 or an additional opening. Furthermore, when the pneumatic driving part 12 drives the closing movable part 13 to move forward towards the outlet end 112 of the nozzle body 11, the control method further includes: closing the liquid supply system 30, and pumping out the residual liquid in the internal channel 113 through the suction device. Specifically, when the etching or cleaning process stops, the liquid output of the liquid supply system 30 is first closed. Subsequently, the suction device will pump away the residual liquid in the internal channel 113. Finally, step 55 is continued, and the pneumatic driving part 12 drives the closing movable part 13 to completely seal the outlet end 112 of the nozzle body 11. In this embodiment, through the setting of the suction device, it is ensured that when the process stops, the liquid inside the nozzle body 11 can be completely removed, thus effectively avoiding the risk of unexpected dripping of the liquid.

[0041] Compared with the prior art, the present application provides a pneumatic control nozzle assembly and a substrate processing device, in which when the nozzle body is in a closed state, the closing movable part blocks the outlet end at the very end of the nozzle body, so that there is no space or channel that can accommodate residual liquid on the side of the end of the closing movable part facing the outside, thereby ensuring that no additional liquid drips from the nozzle body in the closed state.

[0042] The above has introduced in detail a pneumatic control nozzle assembly and a substrate processing apparatus provided by the embodiments of the present application. Specific embodiments are used herein to elaborate on the principle and implementation manner of the present application. The description of the above embodiments is only used to help understand the technical solution and its core idea of the present application. Those of ordinary skill in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements on some of the technical features. These modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A pneumatically controlled nozzle assembly, characterized in that: include: A nozzle body, comprising an inlet end, an outlet end and an internal passage, wherein the internal passage communicates the inlet end and the outlet end; a closing movable member, movably disposed in the internal passage of the nozzle body; as well as An air-controlled drive unit is connected to the nozzle body and the closing movable member, and is used to drive the closing movable member to perform linear movement in the internal channel so that the nozzle body changes between an open state and a closed state, wherein when the nozzle body is in the closed state, the closing movable member plugs the outlet end located at the very end of the nozzle body.

2. The pneumatic control nozzle assembly according to claim 1, characterized in that: When the nozzle body is in the closed state, the distal end of the closing movable member protrudes out of the outlet end of the nozzle body.

3. The pneumatic control nozzle assembly according to claim 1, characterized in that: When the nozzle body is in the closed state, the rear end of the closing movable member is flush with the outlet end of the nozzle body.

4. The pneumatic control nozzle assembly according to claim 1, characterized in that: When the nozzle body is in the open state, the end of the closing movable member is spaced a distance from the outlet end of the nozzle body and the tube wall of the internal channel respectively.

5. The pneumatic control nozzle assembly according to claim 1, characterized in that: The linear movement of the closing movable member includes moving forward or away from the outlet end of the nozzle body.

6. A substrate processing device, characterized in that: include: A substrate holding portion, used for holding a substrate; A liquid supply system, used for supplying liquid; as well as A pneumatically controlled nozzle assembly is connected to the liquid supply system and is used to apply the liquid on the substrate, wherein the pneumatically controlled nozzle assembly comprises: a nozzle body, comprising an inlet end, an outlet end and an internal passage, wherein the internal passage communicates the inlet end and the outlet end, and the nozzle body allows the liquid to enter through the inlet end and flow through the internal passage before being discharged from the outlet end; a closing movable member movably disposed in the internal passage of the nozzle body; and An air-controlled drive unit is connected to the nozzle body and the closing movable member, and is used to drive the closing movable member to perform linear movement in the internal channel so that the nozzle body changes between an open state and a closed state, wherein when the nozzle body is in the closed state, the closing movable member plugs the outlet end located at the very end of the nozzle body.

7. The substrate processing apparatus according to claim 6, wherein: When the nozzle body is in the closed state, the distal end of the closing movable member protrudes out of the outlet end of the nozzle body.

8. The substrate processing apparatus according to claim 6, wherein: When the nozzle body is in the closed state, the rear end of the closing movable member is flush with the outlet end of the nozzle body.

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