Microwave plasma chemical vapor deposition growth base lifting device

By designing a microwave plasma chemical vapor deposition growth abutment lifting device including lifting columns, plug-in cylinders, sealing rings, lifting adjustment modules and auxiliary support units, the problem of the lack of auxiliary support in existing devices during long-term work has been solved, and the stable lifting of the growth abutment and the improvement of the service life of the device are achieved.

CN223033452UActive Publication Date: 2025-06-27SICHUAN 330 SEMICON CO LTD
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Patent Information

Application Number
CN202422132844.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-30
Publication Date
2025-06-27
Estimated Expiration
2034-08-30

AI Technical Summary

Technical Problem

The existing microwave plasma chemical vapor deposition growth base lifting device lacks auxiliary support structure during long working hours, resulting in the growth base exerting a vertical force on the lifting structure, which easily causes the lifting structure to wear and affect stability and service life.

Method used

A microwave plasma chemical vapor deposition growth abutment lifting device including a lifting column, a plug-in cylinder, a sealing ring, a lifting adjustment module and an auxiliary support unit is designed. The support seat is driven downwardly by multiple telescopic push rods, and the lead screw is rotated by a driving unit to realize vertical lifting and adjustment of the support table and the support column. After the lifting adjustment is completed, the telescopic push rod is extended simultaneously, and the support seat supports the bottom of the lifting platform to provide auxiliary support and reduce dependence on the lead screw and lifting platform.

Benefits of technology

Through the auxiliary support structure, excessive load on the lifting structure during long-term work of the growth base is avoided, wear of the lead screw and lifting platform is reduced, and the stability and service life of the device are improved.

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Abstract

The utility model provides a microwave plasma chemical vapor deposition growth base platform lifting device which comprises a lifting column, an inserting cylinder, a sealing ring, a lifting adjusting module, a plurality of guide columns, a base, a lead screw, a driving unit and a lifting platform, wherein the lifting column is vertically connected with the bottom of a vacuum chamber in a sliding manner, and the upper end of the lifting column is connected with a growth base platform; the top of the lifting table is connected with the bottom of the lifting column, and an auxiliary supporting unit used for supporting the lifting table in an auxiliary mode is further arranged on the base. According to the lifting device for the microwave plasma chemical vapor deposition growth base station, the basic requirement for lifting adjustment of the growth base station can be met, and the growth base station can be supported in an auxiliary mode through the supporting structure after height adjustment is completed; the growth base platform is prevented from being supported only through the lifting adjusting structure for a long time, the acting force of the growth base platform is borne independently, and therefore the stability of the device is improved.
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Description

Technical Field

[0001] The utility model belongs to the technical field, and particularly relates to a lifting device for a growth pedestal in microwave plasma chemical vapor deposition. Background Art

[0002] During the process of growing thick (>1 mm) single-crystal or polycrystalline diamond, as the thickness increases, the distance between the diamond surface and the plasma gets closer and closer, resulting in a higher and higher growth temperature. Therefore, users need to reduce the microwave input power or the chamber pressure to maintain the growth temperature. However, the reduction of microwave power will cause a decrease in the growth rate. To avoid the above situation, people usually use a lifting device to adjust the height of the growth pedestal. For the existing lifting device for a growth pedestal in microwave plasma chemical vapor deposition, although it can meet the basic requirement of adjusting the height of the growth pedestal, after the height adjustment of the growth pedestal is completed by the lifting structure, it only continues to rely on the lifting structure to support the growth pedestal, and there is no auxiliary support structure for auxiliary supporting the growth pedestal. Therefore, during the long-term operation of the growth pedestal, a vertically downward force is exerted on the lifting structure, resulting in damage to the lifting structure, thereby affecting the stability of the growth pedestal and the service life of the device.

[0003] For example, the utility model with the publication number CN 217839126 U discloses a lifting device for a growth pedestal in microwave plasma chemical vapor deposition. In the technical solution of this patent, the height of the growth pedestal is adjusted by the cooperation of a motor mounting seat, a forward and reverse motor, a lead screw, a lifting guide rail, and a lifting table that is threadedly sleeved on the lead screw and movably sleeved on the lifting guide rail. After the height adjustment is completed, the vacuum chamber is supported by relying on the cooperation of the lead screw and the lifting table that is screwed and fixed to the lead screw. Since there is no auxiliary support structure, during the long-term operation of the growth pedestal, a vertically downward force will be continuously exerted on the lead screw and the lifting table, which is likely to cause wear to the lead screw and the lifting table, thereby affecting the service life of the lifting structure and the supporting stability of the vacuum chamber. Summary of the Utility Model

[0004] In view of this, aiming at the deficiencies of the prior art, the utility model provides a lifting device for a growth pedestal in microwave plasma chemical vapor deposition, which can not only meet the basic requirement of lifting and adjusting the growth pedestal, but also, after the height adjustment is completed, assist in supporting the growth pedestal through a support structure, avoiding relying solely on the lifting adjustment structure to support the growth pedestal for a long time and bear the force of the growth pedestal alone, thereby improving the stability of the device.

[0005] To solve the above technical problems, the technical solution adopted by the present utility model is as follows: A lifting device for a growth pedestal in microwave plasma chemical vapor deposition, comprising a lifting column vertically slidably connected to the bottom of a vacuum chamber and having its upper end connected to the growth pedestal. A socket cylinder adapted to the lifting column is provided at the bottom of the vacuum chamber, and a sealing ring adapted to the lifting column is provided on the inner wall of the socket cylinder. It further includes a lifting adjustment module provided at the bottom of the vacuum chamber for lifting and adjusting the lifting column. The lifting adjustment module includes a plurality of guide columns provided on the bottom wall of the bottom of the vacuum chamber. A base is commonly provided at the bottoms of the plurality of guide columns. A lead screw is vertically rotatably provided between the top of the base and the bottom of the vacuum chamber. A driving unit for rotationally driving the lead screw is further provided on the top of the base. A lifting table threadedly connected to the lead screw and vertically slidably connected to the plurality of guide columns is provided, and the top of the lifting table is connected to the bottom of the lifting column. An auxiliary support unit for auxiliary support of the lifting table is further provided on the base.

[0006] As a further improvement of the present utility model, the driving unit includes a driving motor vertically provided on the top of the base. A driving gear is provided at the upper end of the output shaft of the driving motor, and a driven gear meshing with the driving gear is provided on the lead screw.

[0007] As a further improvement of the present utility model, the auxiliary support unit includes a plurality of telescopic push rods vertically provided on the base. Support seats for auxiliary support of the lifting table are respectively provided at the upper ends of the output shafts of the plurality of telescopic push rods.

[0008] As a further improvement of the present utility model, a support ring is commonly provided at the tops of the plurality of support seats; a first bearing with an inner ring adapted to the lower end of the lead screw is provided at the top of the base, and a second bearing with an inner ring threadedly fixed to the upper end of the lead screw is provided at the bottom of the vacuum chamber.

[0009] As a further improvement of the present utility model, guide socket cylinders are respectively provided at the bottoms of the plurality of support seats, and guide socket rods respectively inserted and fixed to the plurality of guide socket cylinders are provided at the top of the base.

[0010] As a further improvement of the present utility model, a connecting cylinder for clamping and fixing the lower end of the lifting column is provided at the top of the lifting table. A connecting bolt for screwing and fixing the lower end of the lifting column is provided at the side end of the connecting cylinder, and a threaded connection hole adapted to the connecting bolt is provided at the lower end of the lifting column.

[0011] As a further improvement of the present utility model, a fixing plate is provided at the bottom side end of the driving motor. Fixing bolts for screwing and fixing to the base are provided on the fixing plate, and threaded fixing holes adapted to the fixing bolts are provided on the base.

[0012] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0013] First, the user can first make multiple telescopic push rods drive the support base to reset downward, and then make the lead screw rotate through the drive unit. With the cooperation of the sliding connection between the support table and multiple support columns, the support table and support columns can be vertically lifted and lowered, so as to realize the lifting adjustment of the growth base platform; after completing the lifting adjustment of the lifting base platform, the output shafts of multiple telescopic push rods can be synchronously extended by a certain length, so that multiple support seats support the bottom of the lifting platform, so as to realize the auxiliary support of the lifting platform and lifting column, and avoid relying solely on the screw connection between the lead screw and the lifting platform to support the lifting platform and lifting column during the subsequent long-term working process, and avoid easily damaging the connection between the lead screw and the lifting platform.

[0014] Second, just start the drive motor, and the lead screw can be rotated through the cooperation of the first bearing and the second bearing, as well as the cooperation of the driving gear and the driven gear.

[0015] Third, through the cooperation of the guiding insertion cylinder and the guiding insertion rod, it can be avoided that the telescopic push rod is deflected and deformed and damaged by the radial acting force.

[0016] Fourth, just make the fixing bolt pass through the side wall of the fixing plate and be screwed and fixed with the threaded fixing hole, and the flexible fixing of the drive motor and the base can be realized. Description of the Drawings

[0017] The following further describes the present invention in detail with reference to the drawings and specific embodiments.

[0018] Figure 1 is a structural schematic diagram of the present invention;

[0019] Figure 2 is a structural schematic diagram of the vacuum chamber, insertion cylinder, sealing ring, and second bearing of the present invention;

[0020] Figure 3 is a structural schematic diagram of the telescopic push rod, support seat, support ring, and guiding insertion cylinder of the present invention;

[0021] Figure 4 is a structural schematic diagram of the guiding column, base, lead screw, lifting platform, drive motor, second bearing, connecting cylinder, connecting bolt, fixing plate, and fixing bolt of the present invention.

[0022] In the figure: 101, vacuum chamber; 102, insertion cylinder; 103, sealing ring; 104, lifting column; 201, guiding column; 202, base; 203, lead screw; 204, lifting table; 205, driving motor; 206, driving gear; 207, driven gear; 208, telescopic push rod; 209, supporting seat; 210, supporting ring; 211, first bearing; 212, second bearing; 213, guiding insertion cylinder; 214, guiding insertion rod; 301, connecting cylinder; 302, connecting bolt; 303, fixing plate; 304, fixing bolt. Detailed implementation mode

[0023] To better understand the present utility model, the content of the present utility model will be further clearly elaborated below in conjunction with embodiments. However, the protection scope of the present utility model is not limited to the following embodiments only. In the following description, a large number of specific details are given to provide a more thorough understanding of the present utility model. However, it is obvious to those skilled in the art that the present utility model can be implemented without one or more of these details.

[0024] As Figure 1 、 2 shown in FIGS. 3 and 4, a lifting device for a growth substrate in microwave plasma chemical vapor deposition includes a lifting column 104 that is vertically slidably connected to the bottom of a vacuum chamber 101 and whose upper end is connected to the growth substrate. A insertion cylinder 102 adapted to the lifting column 104 is provided at the bottom of the vacuum chamber 101. A sealing ring 103 adapted to the lifting column 104 is provided on the inner wall of the insertion cylinder 102. The lifting device further includes a lifting adjustment module provided at the bottom of the vacuum chamber 101 for adjusting the lifting of the lifting column 104. The lifting adjustment module includes a plurality of guiding columns 201 provided on the bottom wall of the bottom of the vacuum chamber 101. A base 202 is commonly provided at the bottoms of the plurality of guiding columns 201. A lead screw 203 is vertically rotatably provided between the top of the base 202 and the bottom of the vacuum chamber 101. A driving unit for rotationally driving the lead screw 203 is further provided on the top of the base 202. A lifting table 204 that is vertically slidably connected to the plurality of guiding columns 201 is screwed onto the lead screw 203. The top of the lifting table 204 is connected to the bottom of the lifting column 104. An auxiliary support unit for auxiliary support of the lifting table 204 is further provided on the base 202.

[0025] As Figure 1 shown in FIG., the driving unit includes a driving motor 205 vertically provided on the top of the base 202. A driving gear 206 is provided at the upper end of the output shaft of the driving motor 205. A driven gear 207 meshing with the driving gear 206 is provided on the lead screw 203.

[0026] As Figure 1 、 3As shown, the auxiliary support unit includes a plurality of telescopic push rods 208 vertically arranged on the base 202, and support seats 209 for auxiliary support of the lifting table 204 are respectively arranged at the upper ends of the output shafts of the plurality of telescopic push rods 208.

[0027] As Figure 1 , 2 , as shown in Figure 4, a support ring 210 is jointly arranged at the tops of the plurality of support seats 209; a first bearing 211 with an inner ring adapted to the lower end of the lead screw 203 is arranged at the top of the base 202, and a second bearing 212 with an inner ring screwed and fixed to the upper end of the lead screw 203 is arranged at the bottom of the vacuum chamber 101. Through the support ring 210, the bottom of the lifting table 204 can be fully supported, thereby improving the auxiliary support effect on the lifting table 204.

[0028] As Figure 1 , 3 , as shown in the figure, guide insertion cylinders 213 are respectively arranged at the bottoms of the plurality of support seats 209, and guide insertion rods 214 respectively inserted and fixed to the plurality of guide insertion cylinders 213 are arranged at the top of the base 202. Through the cooperation of the guide insertion cylinders 213 and the guide insertion rods 214, the telescopic push rods 208 can be prevented from being deflected and deformed due to radial forces and damaged.

[0029] The user can first shorten the output shafts of the plurality of telescopic push rods 208 downward by a certain length, so that the plurality of support seats 209 are reset downward to avoid affecting the subsequent lifting adjustment of the support table. Then, the drive motor 205 can be started. Under the cooperation of the first bearing 211 and the second bearing 212, and the cooperation of the driving gear 206 and the driven gear 207, the lead screw 203 can be rotated. Under the screw connection between the support table and the lead screw 203, and the sliding connection between the support table and the plurality of support columns, the support table and the support columns can be lifted vertically up and down, thereby realizing the lifting adjustment of the growth base table.

[0030] After completing the lifting adjustment of the lifting base table, the output shafts of the plurality of telescopic push rods 208 can be synchronously extended by a certain length, so that the plurality of support seats 209 all support the bottom of the lifting table 204, thereby realizing the auxiliary support for the lifting table 204 and the lifting column 104. Avoid relying solely on the screw connection between the lead screw 203 and the lifting table 204 to support the lifting table 204 and the lifting column 104 during the subsequent long-term working process, and avoid the connection between the lead screw 203 and the lifting table 204 from being easily damaged.

[0031] According to another embodiment of the present invention, as Figure 4As shown in the figure, a connecting cylinder 301 is provided at the top of the lifting platform 204 and is clamped and fixed to the lower end of the lifting column 104. A connecting bolt 302 for screwing and fixing the lower end of the lifting column 104 is provided at the side end of the connecting cylinder 301. A threaded connection hole adapted to the connecting bolt 302 is provided at the lower end of the lifting column 104. Just make the lower end of the lifting column 104 be clamped and fixed to the connecting cylinder 301, and then make the connecting bolt 302 pass through the side wall of the connecting cylinder 301 and be screwed and fixed to the threaded connection hole, so as to realize the flexible fixation of the lifting column 104 and the lifting platform 204.

[0032] According to another embodiment of the present invention, as Figure 4 shown in the figure, a fixing plate 303 is provided at the bottom side end of the driving motor 205. Fixing bolts 304 for screwing and fixing to the base 202 are provided on the fixing plate 303. Threaded fixing holes adapted to the fixing bolts 304 are provided on the base 202. Just make the fixing bolts 304 pass through the side wall of the fixing plate 303 and be screwed and fixed to the threaded fixing holes, so as to realize the flexible fixation of the driving motor 205 and the base 202.

[0033] The above are the preferred embodiments of the present invention. It should be noted that for those of ordinary skill in the art of this technology, without departing from the principle of the present invention, several improvements and refinements can still be made, and these improvements and refinements should also be regarded as the protection scope of the present invention.

Claims

1. A microwave plasma chemical vapor deposition growth base lifting device, comprising a lifting column (104) vertically slidably connected to the bottom of a vacuum chamber (101) and having an upper end connected to the growth base, a plug-in cylinder (102) adapted to the lifting column (104) is arranged at the bottom of the vacuum chamber (101), a sealing ring (103) adapted to the lifting column (104) is arranged on the inner wall of the plug-in cylinder (102), and also comprising a lifting adjustment module arranged at the bottom of the vacuum chamber (101) and used for lifting and lowering the lifting column (104), characterized in that: The lifting and adjusting module comprises a plurality of guide columns (201) arranged on the bottom wall of the bottom of the vacuum chamber (101); a base (202) is commonly arranged at the bottom of the plurality of guide columns (201); a lead screw (203) is arranged between the top of the base (202) and the bottom of the vacuum chamber (101) for vertical rotation; a driving unit for driving the lead screw (203) for rotation is also arranged on the top of the base (202); a lifting platform (204) vertically slidably connected to the plurality of guide columns (201) is screwed on the lead screw (203); the top of the lifting platform (204) is connected to the bottom of the lifting column (104); and an auxiliary support unit for auxiliary support of the lifting platform (204) is also arranged on the base (202).

2. The microwave plasma chemical vapor deposition growth base lifting device according to claim 1, characterized in that: The drive unit comprises a drive motor (205) vertically arranged on the top of the base (202), a driving gear (206) is arranged at the upper end of the output shaft of the drive motor (205), and a driven gear (207) meshing with the driving gear (206) is arranged on the lead screw (203).

3. The microwave plasma chemical vapor deposition growth base lifting device according to claim 2, characterized in that: The auxiliary support unit comprises a plurality of telescopic push rods (208) vertically arranged on a base (202), and the upper ends of the output shafts of the plurality of telescopic push rods (208) are respectively provided with support seats (209) for auxiliary support of the lifting platform (204).

4. The microwave plasma chemical vapor deposition growth base lifting device according to claim 3, characterized in that: A support ring (210) is commonly arranged at the top of the plurality of support seats (209); a first bearing (211) having an inner ring matched with the lower end of the lead screw (203) is arranged at the top of the base (202); and a second bearing (212) having an inner ring screwed and fixed to the upper end of the lead screw (203) is arranged at the bottom of the vacuum chamber (101).

5. The microwave plasma chemical vapor deposition growth base lifting device according to claim 4, characterized in that: The bottoms of the plurality of support seats (209) are respectively provided with guide insert cylinders (213), and the top of the base (202) is provided with guide insert rods (214) respectively plugged and fixed with the plurality of guide insert cylinders (213).

6. The microwave plasma chemical vapor deposition growth base lifting device according to claim 5, characterized in that: The top of the lifting platform (204) is provided with a connecting tube (301) which is clamped and fixed to the lower end of the lifting column (104); the side end of the connecting tube (301) is provided with a connecting bolt (302) for screwing and fixing the lower end of the lifting column (104); and the lower end of the lifting column (104) is provided with a threaded connecting hole which is compatible with the connecting bolt (302).

7. The microwave plasma chemical vapor deposition growth base lifting device according to claim 6, characterized in that: A fixing plate (303) is provided at the bottom side end of the driving motor (205), and a fixing bolt (304) for screwing and fixing with the base (202) is provided on the fixing plate (303), and a threaded fixing hole matched with the fixing bolt (304) is provided on the base (202).

Citation Information

Patent Citations

  • Microwave plasma chemical vapor deposition growth base lifting device

    CN217839126U