Cell piece with polygonal metal electrode structure and solar cell module
By adopting the polygonal metal electrode structure design on the solar cell, the problems of insufficient adhesion and stress accumulation of metal gate lines are solved, and more efficient carrier collection and lower resistance value are achieved, improving the overall performance of the cell.
Patent Information
- Application Number
- CN202421362199.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-14
- Publication Date
- 2025-06-27
- Estimated Expiration
- 2034-06-14
AI Technical Summary
The metal gate lines of existing solar cell cells are insufficient adhesion in the low-temperature process, resulting in incomplete contact surfaces, excessive resistance, affecting conversion efficiency, and traditional conductive silver paste is costly, and the accumulation of stress during electroplating and deposition leads to problems such as warping and fracture of the metal gate lines.
The polygonal metal electrode structure is adopted, and the electrode is a polygonal mesh structure. The bus bar is arranged on the circumference of the electrode to form a fine mesh distribution, reducing the stress of the metal gate line, and providing a shorter carrier collection path, increasing contact points, and reducing resistance values.
It effectively reduces the stress of the metal gate line, improves the adhesion and conversion efficiency of the battery cell, reduces the series resistance value of the battery cell, and improves the reliability and power output of the module.
Smart Images
Figure CN223040501U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of solar cell manufacturing, in particular to a battery chip with a polygonal metal electrode structure and a solar cell module. Background Technique
[0002] At present, for mass-produced crystalline silicon solar cells in the solar energy industry, the surface metal grid lines (electrodes) use the technology of screen-printing silver paste and sintering. However, the aspect ratio of the electrode grid lines produced by this method is small (the average width is 30-50 μm and the height is about 10-15 μm after sintering), which results in too large a light-shielding area of the battery (the front light-shielding area ranges from 4% to 5%). Coupled with the high price of silver paste (about 7,000-8,000 yuan per kilogram of silver paste), how to improve the efficiency and reduce the production cost is the top priority for each battery chip manufacturer.
[0003] After low-temperature preparation process photovoltaic cell chips gradually become the leader of future high-efficiency solar cells, the traditional silver paste printing and high-temperature sintering are no longer applicable and cannot meet the production of low-temperature preparation process photovoltaic cell chips. However, there are still some areas to be improved in the low-temperature process, including: the phenomenon of insufficient adhesion between the metal grid lines and the battery chip; the incomplete contact surface, resulting in too high resistance, making values such as Isc and FF too low, and unable to improve the conversion efficiency of the battery chip. Therefore, whether it is to reduce the cost of conductive materials or to improve the conversion efficiency and other factors, they are all urgently needed to be improved in the battery chip industry.
[0004] The direction of change is to replace the traditional conductive silver paste preparation process of metal grid lines with an electroplated metal grid line process. One of the main focuses is to use a yellow light process to prepare a fine line pattern, reducing the width of the currently mass-produced printed grid lines from 40 μm to 20 μm or even less, so as to reduce the grid line shielding area. In addition, because the contact area between the semiconductor and the metal conductor is reduced, the recombination surface is reduced, the minority carrier lifetime is increased, and finally the open voltage and photoelectric conversion efficiency of the battery chip are improved.
[0005] However, during the electroplating deposition process of ions, atoms are continuously deposited, nucleated, stacked, and grown. Due to the easy formation of electroplating grain boundary restructuring during the low-temperature crystallization process, that is, the so-called self-annealing (for example, copper or copper alloys), stress will gradually accumulate in the metal gate line. If the stress cannot be effectively reduced or released, it is easy to cause warping, fracture, or even detachment of the metal gate line from the surface of the battery cell, that is, the so-called gate detachment result. There are many ways to improve this situation. For example, reducing the current density to slow down the deposition rate can effectively reduce the stress during deposition, but the process time is long, which is not conducive to the cost reduction requirements of the battery cell. Therefore, the most cost-effective option is to make corresponding changes to the metal gate line characteristics formed by the electroplating deposition process from the design of the metal gate line shape to reduce or solve the phenomenon of stress generation and accumulation in the metal gate line electroplating process.
[0006] In addition, for the currently used metal electrode pattern, whether there is a main grid line or not, the carrier collection is carried out by thin grids parallel to the short side or long side of the battery cell, and then the series connection of the battery cell group is made through the main grid line or the structure designed by 0BB. The problems existing in this way are that the adhesion between the thin grid line (or electrode) and the series connection strip is insufficient, and the carrier transmission path is restricted by the electrodes in a single direction. If a local open circuit occurs in the electrode, it will further make the carrier collection path longer, affecting the overall series resistance value. Summary of the Invention
[0007] In view of the above problems, the present utility model provides a battery cell and a solar cell module with a polygonal metal electrode structure to solve the above or other previous problems existing in the prior art.
[0008] To solve the above technical problems, the technical solution adopted by the present utility model is: a battery cell with a polygonal metal electrode structure, including a battery cell substrate, an electrode provided on at least one side of the battery cell substrate, and a bus bar provided on the periphery of the electrode. The electrode is a polygonal grid structure, and the periphery of the electrode is respectively connected to the bus bar on the corresponding side.
[0009] Furthermore, the bus bar and the grid lines constituting the electrode are of a single-layer metal layer structure; or, the bus bar and the grid lines constituting the electrode are of a multi-layer metal layer structure.
[0010] Furthermore, the line width of the bus bar is 50um - 3500um, and the thickness of the bus bar is 5um - 50um.
[0011] Further, the electrode includes a first group of gate lines and a second group of gate lines which are intersectingly arranged. The first group of gate lines includes a plurality of first gate lines, and two ends of each first gate line are respectively connected to two side edges of the bus bar. The second group of gate lines includes a plurality of second gate lines, and two ends of each second gate line are respectively connected to two side edges of the bus bar. Each first gate line intersects with a plurality of second gate lines, and each second gate line intersects with a plurality of first gate lines to construct an electrode with a quadrilateral grid structure.
[0012] Further, two adjacent first gate lines are arranged in parallel, and the distance between two adjacent first gate lines is a first distance. Two adjacent second gate lines are arranged in parallel, and the distance between two adjacent second gate lines is a second distance.
[0013] Further, the first gate line is arranged in parallel with one diagonal of the cell substrate, and the second gate line is arranged in parallel with the other diagonal of the cell substrate.
[0014] Further, the line width of the first gate line and the line width of the second gate line are both 10um - 50um, and the thickness of the first gate line and the thickness of the second gate line are both 5um - 50um.
[0015] Further, the electrode includes a plurality of sub - electrodes arranged in a ring along the center of the cell substrate. Adjacent sub - electrodes are adjacent to each other. Along the radial direction of the ring, a plurality of sub - electrodes are arranged in multiple layers. The sub - electrodes are hexagonal to construct an electrode with a hexagonal grid structure.
[0016] Further, the length of the third gate line forming the sub - electrode is 1000um - 50000um.
[0017] Further, the line width of the third gate line is 10um - 50um, and the thickness of the third gate line is 5um - 50um.
[0018] A solar cell module includes a cell with the above - mentioned polygonal metal electrode structure.
[0019] Due to the above - mentioned technical solution, electrodes and bus bars which are connected to each other are arranged on at least one side surface of the cell substrate. The bus bar is arranged on the periphery of the electrode. The electrode is a polygonal grid structure, covering the side surface of the cell substrate, forming a fine grid distribution, reducing the stress of the metal gate lines, providing a shorter carrier collection path for the cell, reducing the electrical loss, providing more contact points for the subsequent connection of the cell strings, reducing the resistance value of the cell strings, providing higher module reliability, and improving the power output and module reliability of the overall battery module. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 is a schematic structural diagram of a cell with a honeycomb - type grid structure electrode according to an embodiment of the present invention;
[0021] Figure 2 It is a schematic structural diagram of a battery cell with a diamond grid structure electrode according to an embodiment of the present invention.
[0022] In the figure:
[0023] 1. Battery cell substrate; 2. Electrode; 3. Bus bar
[0024] 4. Sub - electrode; 20. First grid line; 21. Second grid line
[0025] 22. Third grid line Detailed implementation manners
[0026] The present invention will be further described below with reference to the accompanying drawings and specific embodiments.
[0027] Figure 1 And Figure 2 respectively show schematic structural diagrams of some embodiments of the present invention. Some embodiments relate to a battery cell and a solar cell module with a polygonal metal electrode structure. A metal electrode in a polygonal grid structure is provided on at least one side surface of the battery cell substrate, providing a shorter carrier collection path, reducing the series resistance of the battery cell, providing higher module reliability, and reducing the stress of the metal grid lines.
[0028] A battery cell with a polygonal metal electrode structure, as Figure 1 and 2 shown, includes a battery cell substrate 1, an electrode 2 provided on at least one side surface of the battery cell substrate 1, and a bus bar 3 provided on the periphery of the electrode 2. The electrode 2 is in a polygonal grid structure, and the periphery of the electrode 2 is respectively connected to the corresponding side bus bar 3. That is, the electrode 2 and the bus bar 3 are provided on any one side surface of the battery cell substrate 1, or the electrode 2 and the bus bar 3 are provided on two side surfaces of the battery cell substrate 1. The setting positions of the electrode 2 and the bus bar 3 are selected according to actual requirements.
[0029] In some feasible embodiments, the above - mentioned battery cell substrate 1 is a double - sided battery cell provided with a bottom conductive layer, and the treatment of the bottom conductive layer has been completed.
[0030] The above - mentioned electrode 2 is a metal electrode, and the electrode 2 is in a polygonal grid structure, covering the entire side surface of the battery cell substrate 1. A fine grid distribution is carried out on the side surface of the battery cell substrate 1, which can effectively reduce the stress of the metal grid lines constituting the electrode 2, provide the shortest carrier collection path for the battery cell, reduce the electrical loss, provide more contact points for the subsequent connection of the battery cell series, and enhance the reliability of the module.
[0031] The above-mentioned bus bar 3 is a frame structure, which is arranged around the circumference of the electrode 2. One side of the circumference of the electrode 2 is connected to the corresponding side of the bus bar 3. That is, the bus bar 3 is arranged along the circumferential direction of the electrode 2 to form a closed-loop structure, and the electrode 2 is located inside the bus bar 3. The shape of the bus bar 3 is preferably adapted to the shape of the cell substrate 1, so that the shape of the electrode 2 is adapted to the shape of the cell substrate 1, so that the electrode 2 is as widely distributed as possible on the side surface of the cell substrate 1. There is a certain distance between any side of the bus bar 3 and the corresponding side of the cell substrate 1, and this distance is 5 - 3500 um, which is selected according to actual needs.
[0032] The above-mentioned bus bar 3 is prepared by an electroplating deposition process. The material of the bus bar 3 is a conductive material, and this conductive material is a metal such as gold, silver, copper, aluminum, tin, nickel, tungsten or an alloy thereof, and this conductive material is selected according to actual needs.
[0033] In some feasible embodiments, the bus bar 3 can be a single-layer structure. In this structure, the material of the bus bar 3 is a metal or alloy, such as silver or copper; or, the bus bar 3 can be a multi-layer structure, that is, multiple metal layers are sequentially arranged along the side surface to the outside of the cell substrate 1. The thicknesses of different metal layers can be the same or different, and the thickness of each metal layer is selected according to actual needs; when preparing the multi-layer metal layers, first electroplate and deposit the first metal layer, and after electroplating is completed, then electroplate and deposit the second metal layer, and the second metal layer covers the first metal layer, and so on, to perform electroplating deposition of the multi-layer metal layers, covering layer by layer to form the bus bar 3 structure with a multi-layer metal layer structure. The number of metal layers is selected according to actual needs and no specific requirements are made here.
[0034] The line width of the above-mentioned bus bar 3 is 50 um - 3500 um, and the line width dimension of the bus bar 3 is selected according to actual needs and no specific requirements are made here.
[0035] The thickness of the above-mentioned bus bar 3 is 5 um - 50 um, and the thickness dimension of the bus bar 3 is selected according to actual needs and no specific requirements are made here.
[0036] The above-mentioned electrode 2 is a metal electrode, which is prepared by electroplating and depositing a metal grid line according to a certain pattern shape to form an electrode 2 structure with a polygonal grid structure. The electrode 2 includes a plurality of connected sub-electrodes 4 arranged in sequence along the transverse and longitudinal directions of the cell substrate 1, that is, a plurality of sub-electrodes 4 are arranged along the transverse direction or the longitudinal direction of the cell substrate 1, and the plurality of sub-electrodes 4 are connected in sequence to form a sub-electrode group. The plurality of sub-electrode groups are arranged and connected in sequence along the longitudinal direction or the transverse direction to form a grid-shaped electrode 2 structure; alternatively, the electrode 2 includes a plurality of connected sub-electrodes 4 arranged in a ring along the center of the cell substrate 1, and the adjacent sub-electrodes 4 are connected to form a grid-shaped electrode 2 structure; wherein, the shape of the sub-electrode 4 is polygonal, which can be a quadrilateral, a pentagon, a hexagon, etc. The shape of the sub-electrode 4 is selected according to actual needs and no specific requirements are made here. Preferably, the shape of the sub-electrode 4 is a rhombus or a regular hexagon.
[0037] In some feasible embodiments, the grid line forming the electrode 2 can be a single-layer structure. In this case, the material of the grid line forming the electrode 2 is a metal or an alloy, such as silver or copper; or, the grid line forming the electrode 2 can be a multi-layer structure, that is, multiple metal layers are arranged in sequence along the side to the outside direction of the cell substrate 1. The thicknesses of different metal layers can be the same or different, and the thickness of each metal layer is selected according to actual needs; when preparing the multi-layer metal layer, first electroplate and deposit the first metal layer, and after electroplating is completed, then electroplate and deposit the second metal layer, and the second metal layer covers the first metal layer, and so on, to perform electroplating and deposition of the multi-layer metal layer, covering layer by layer to form a grid line structure with a multi-layer metal layer structure. The number of metal layers is selected according to actual needs and no specific requirements are made here.
[0038] In some feasible embodiments, the line width of the grid line forming the electrode 2 is 10um - 50um, and the size of the line width of the grid line is selected according to actual needs and no specific requirements are made here.
[0039] In some feasible embodiments, the thickness of the grid line forming the electrode 2 is 5um - 50um, and the size of the thickness of the grid line is selected according to actual needs and no specific requirements are made here.
[0040] In some feasible embodiments, when electrodes 2 are provided on both side surfaces of the cell substrate 1, the polygon grid densities of the electrodes 2 on the two side surfaces may be different. That is, the number of polygon sub - electrodes in the electrode 2 with a polygon grid structure on one side surface of the cell substrate 1 is greater than the number of polygon sub - electrodes in the electrode with a polygon grid structure on the other side surface of the cell substrate 1, and the side lengths of the polygon sub - electrodes in the electrodes 2 with a polygon grid structure on the two side surfaces are different; or, the polygon grid densities of the electrodes 2 on the two side surfaces may also be the same. That is, the number of polygon sub - electrodes in the electrode 2 with a polygon grid structure on one side surface of the cell substrate 1 is consistent with the number of polygon sub - electrodes in the electrode with a polygon grid structure on the other side surface of the cell substrate 1.
[0041] In some feasible embodiments, when electrodes 2 are provided on both side surfaces of the cell substrate 1, among the electrodes 2 with a polygon grid structure on the two side surfaces, the shapes of the polygon sub - electrodes may be the same, such as both being quadrilaterals or hexagons. Or, the shapes of the polygon sub - electrodes may also be different. For example, the shape of the sub - electrode of the electrode 2 with a polygon grid structure on one side surface of the cell substrate 1 is a quadrilateral, and the shape of the sub - electrode of the electrode 2 with a polygon grid structure on the other side surface of the cell substrate 1 is a hexagon. The shapes of the sub - electrodes of the electrodes 2 on the two side surfaces of the cell substrate 1 are selected and set according to actual requirements.
[0042] When the shape of the sub - electrode 4 is a quadrilateral, an electrode 2 structure in the shape of a quadrilateral grid is formed. Under this structural design, the specific structure of the electrode 2 is:
[0043] Such as Figure 2As shown, the electrode 2 includes a first grid line group and a second grid line group which are intersectingly arranged. The first grid line group includes a plurality of first grid lines 20. The two ends of each first grid line 20 are respectively connected to the two side edges of the bus bar 3. The first grid line 20 can be connected to two relatively arranged side edges of the bus bar 3, or the first grid line 20 can be connected to two intersectingly arranged side edges of the bus bar 3, and selection is made according to the setting mode of the first grid line 20. The second grid line group includes a plurality of second grid lines 21. The two ends of each second grid line 21 are respectively connected to the two side edges of the bus bar 3. The second grid line 21 can be connected to two relatively arranged side edges of the bus bar 3, or the second grid line 21 can be connected to two intersectingly arranged side edges of the bus bar 3, and selection is made according to the setting mode of the second grid line 21. The two side edges of the bus bar 3 connected to the first grid line 20 and the two side edges of the bus bar 3 connected to the second grid line 21 can be completely different, or one of the side edges of the bus bar 3 connected to the first grid line 20 and the two side edges of the bus bar 3 connected to the second grid line 21 can be the same, and selection and setting are made according to actual requirements. Each first grid line 20 intersects with a plurality of second grid lines 21, and each second grid line 21 intersects with a plurality of first grid lines 20. A quadrilateral sub-electrode 4 structure is formed at the intersection of two adjacent first grid lines 20 and two adjacent second grid lines 21. A plurality of groups of first grid lines 20 and a plurality of groups of second grid lines 21 are intersectingly arranged to construct the electrode 2 with a quadrilateral grid structure. When the first grid line 20 and the second grid line 21 are perpendicularly intersectingly arranged, the quadrilateral is a square or a rectangle. When the first grid line 20 and the second grid line 21 are non-perpendicularly intersectingly arranged, the quadrilateral is a parallelogram or a trapezoid or a rhombus.
[0044] In the first grid line group, the plurality of first grid lines 20 can be parallelly arranged or not, and selection is made according to actual requirements. In the second grid line group, the plurality of second grid lines 21 can be parallelly arranged or not, and selection is made according to actual requirements. In some feasible embodiments, preferably, two adjacent first grid lines 20 are parallelly arranged, then the plurality of first grid lines 20 are all parallelly arranged, and the distance between two adjacent first grid lines 20 is a first distance. Two adjacent second grid lines 21 are parallelly arranged, then the plurality of second grid lines 21 are all parallelly arranged, and the distance between two adjacent second grid lines 21 is a second distance, and the formed quadrilateral is a parallelogram. The first distance and the second distance can be the same. At this time, the quadrilateral is a regular rhombus, and the formed electrode 2 is a regular rhombus grid structure. The first distance and the second distance can also be different. At this time, the quadrilateral is a non-regular rhombus, and the formed electrode 2 is a non-regular rhombus grid structure.
[0045] For a further optimized solution, multiple first grid lines 20 are all arranged parallel to one diagonal of the cell substrate 1, and multiple second grid lines 21 are all arranged parallel to the other diagonal of the cell substrate 1. As can be known from the shape of the cell substrate 1, the cell substrate 1 has two intersecting diagonals. Taking one diagonal as a reference, translate it in both directions away from this diagonal by a first distance to form two first grid lines 20. Then, taking these first grid lines 20 as a reference, translate them in the corresponding side directions by the first distance to form another first grid line 20, and so on, to form multiple first grid lines 20 that cover the side surface of the cell substrate 1, and both ends of each first grid line 20 intersect with the two side edges of the bus bar 3; taking the other diagonal as a reference, translate it in both directions away from this diagonal by a second distance to form two second grid lines 21. Then, taking these second grid lines 21 as a reference, translate them in the corresponding side directions by the second distance to form another second grid line 21, and so on, to form multiple second grid lines 21 that cover the side surface of the cell substrate 1, and both ends of each second grid line 21 intersect with the two side edges of the bus bar 3, thus forming the electrode 2 with a quadrilateral grid structure.
[0046] The line widths of the above-mentioned first grid lines 20 and the second grid lines 21 are both 10um - 50um, and the line widths of the first grid lines 20 and the second grid lines 21 are selected according to actual requirements, and no specific requirements are made here.
[0047] The thicknesses of the above-mentioned first grid lines 20 and the second grid lines 21 are both 5um - 50um, and the thicknesses of the first grid lines 20 and the second grid lines 21 are selected according to actual requirements, and no specific requirements are made here.
[0048] When the shape of the sub - electrode 4 is a hexagon, an electrode 2 structure in the shape of a hexagonal grid is formed. Under this structural design, the specific structure of the electrode 2 is as follows:
[0049] As Figure 1 shown, the electrode 2 includes multiple sub - electrodes 4 arranged in a ring along the center of the cell substrate 1, and adjacent sub - electrodes 4 are connected. The multiple sub - electrodes 4 are arranged in multiple layers, that is, a sub - electrode 4 is set at the center of the cell substrate 1, and then, with the center of this sub - electrode 4 as the center of the circle, multiple sub - electrodes 4 are arranged in a ring to form one layer of sub - electrodes 4. Along the radial direction of the ring, the multiple sub - electrodes 4 are arranged in multiple layers. Each sub - electrode 4 is connected to multiple sub - electrodes 4 around it to form a grid structure; among them, the sub - electrode 4 includes multiple grid lines three 22 connected end to end in sequence to form a polygonal sub - electrode 42 structure. The number of sub - electrodes 4 is selected according to the side area of the cell substrate 1, and the multiple connected sub - electrodes 4 cover the side surface of the cell substrate 1.
[0050] In some feasible embodiments, in each sub-electrode 4, the number of the third grid lines 22 is six. Then, the shape of the sub-electrode 4 is a hexagon. Preferably, in each sub-electrode 4, the lengths of the respective third grid lines 22 are the same, and the shape of the sub-electrode 4 is a regular hexagon. In this structure, the electrode 2 is a honeycomb grid structure.
[0051] In some feasible embodiments, the length of the third grid line 22 is 1000 um - 50000 um, and the length of the third grid line 22 is selected according to actual requirements, and no specific requirements are made here.
[0052] In some feasible embodiments, the line width of the third grid line 22 is 10 um - 50 um, and the line width of the third grid line 22 is selected according to actual requirements, and no specific requirements are made here.
[0053] In some feasible embodiments, the thickness of the third grid line 22 is 5 um - 50 um, and the thickness of the third grid line 22 is selected according to actual requirements, and no specific requirements are made here.
[0054] When preparing a battery chip with a polygonal metal electrode 2 structure, the following steps are included:
[0055] Prepare a double-sided battery chip that has completed the treatment of the bottom conductive layer;
[0056] Adopt an imprinting method to coat the mask, and coat the mask on both sides of the battery chip;
[0057] Perform an exposure process to form the patterns of the electrode 2 and the bus bar 3 on both sides of the battery chip. When performing the exposure process, place the battery chip coated with the mask in a direct writing exposure machine for exposure, and transfer the patterns of the electrode 2 and the bus bar 3 to the mask on both sides of the battery chip; among them, the shape of the electrode 2 is the electrode 2 with a honeycomb grid shape or a quadrilateral grid shape as described above, and is selected according to actual requirements;
[0058] Perform a developing process on the exposed battery chip, and place the exposed battery chip in a developing machine for developing;
[0059] Adopt an electroplating process to prepare the electrode 2 and the bus bar 3;
[0060] Remove the mask;
[0061] Adopt an etching process to etch the bottom conductive layer;
[0062] Complete the preparation of the battery chip.
[0063] A solar cell module includes a battery chip with a polygonal metal electrode structure as described above.
[0064] Due to the adoption of the above technical solution, electrodes and busbars are provided and connected on at least one side of the battery cell substrate. The busbars are arranged on the periphery of the electrodes. The electrodes are of a polygonal mesh structure and are distributed all over the side of the battery cell substrate, forming a fine mesh distribution, reducing the stress of the metal grid lines, providing a shorter carrier collection path for the battery cell, reducing the electrical loss, providing more contact points for the subsequent connection of the battery cell string group, reducing the resistance value of the battery cell string group, providing higher module reliability, and improving the power output and reliability of the overall battery module.
[0065] The above has described the embodiments of the present invention in detail, but the content described is only the preferred embodiments of the present invention and cannot be considered as limiting the scope of implementation of the present invention. All equivalent changes and improvements made according to the scope of the present invention application should still fall within the scope covered by the patent of the present invention.
Claims
1. A battery cell with a polygonal metal electrode structure, characterized in that: It includes a battery cell liner, an electrode arranged on at least one side of the battery cell liner, and a bus bar arranged around the electrode, the electrode is a polygonal grid structure, and the sides of the electrode are respectively connected to the bus bars on the corresponding sides; the bus bar is a closed-loop structure, the electrode is located inside the bus bar, the bus bar and the electrode are both prepared by electroplating deposition, and the distance between any side edge of the bus bar and the corresponding side edge of the battery cell liner is 5-3500um.
2. The cell with a polygonal metal electrode structure according to claim 1, characterized in that: The bus bar and the gate wires constituting the electrodes are of a single-layer metal structure; or, the bus bar and the gate wires constituting the electrodes are of a multi-layer metal structure.
3. The cell with a polygonal metal electrode structure according to claim 2, characterized in that: The line width of the busbar is 50um-3500um, and the thickness of the busbar is 5um-50um.
4. The battery cell with a polygonal metal electrode structure according to any one of claims 1 to 3, characterized in that: The electrode includes a grid line group 1 and a grid line group 2 that are arranged to intersect each other. The grid line group 1 includes multiple grid lines 1, and the two ends of the grid lines 1 are respectively connected to the two sides of the bus bar. The grid line group 2 includes multiple grid lines 2, and the two ends of the grid lines 2 are respectively connected to the two sides of the bus bar. Each of the grid lines 1 is arranged to intersect with multiple grid lines 2, and each of the grid lines 2 is arranged to intersect with multiple grid lines 1, so as to construct an electrode with a quadrilateral grid structure.
5. The battery cell with a polygonal metal electrode structure according to claim 4, characterized in that: Two adjacent gate lines 1 are arranged in parallel, and the distance between the two adjacent gate lines 1 is a first distance. Two adjacent gate lines 2 are arranged in parallel, and the distance between the two adjacent gate lines 2 is a second distance.
6. The battery cell with a polygonal metal electrode structure according to claim 5, characterized in that: The first gate line is arranged in parallel with one diagonal line of the cell substrate, and the second gate line is arranged in parallel with another diagonal line of the cell substrate.
7. The battery cell with a polygonal metal electrode structure according to claim 5 or 6, characterized in that: The line width of the gate line 1 and the line width of the gate line 2 are both 10um-50um, and the thickness of the gate line 1 and the thickness of the gate line 2 are both 5um-50um.
8. The battery cell with a polygonal metal electrode structure according to any one of claims 1 to 3, characterized in that: The electrode includes a plurality of sub-electrodes arranged in a ring shape along the center of the cell substrate, and adjacent sub-electrodes are adjacent to each other. Along the radial direction of the ring, the plurality of sub-electrodes are arranged in multiple layers, and the sub-electrodes are hexagonal, constructing an electrode with a hexagonal grid structure.
9. The battery cell with a polygonal metal electrode structure according to claim 8, characterized in that: The length of the gate line three constituting the sub-electrode is 1000um-50000um, the line width of the gate line three is 10um-50um, and the thickness of the gate line three is 5um-50um.
10. A solar cell module, characterized in that: A battery cell comprising a polygonal metal electrode structure as described in any one of claims 1 to 9.