Pressure fluctuation retarding device for sensor of photoetching machine

Abstract

The utility model discloses a pressure fluctuation retarding device for a photoetching machine sensor, which relates to the technical field of photoetching machine sensors and comprises a photoetching machine main body, the flow field pressure detection sensor is detachably fixed at the bottom of the photoetching machine main body; the flow field pressure detection sensor is downwards inserted into the liquid film; the film layer wraps the front section of the flow field pressure detection sensor; the bearing device is connected to the outer side of the flow field pressure detection sensor in a sleeving manner; the clamping device is fixed in the bearing device and is used for clamping and fixing the film layer; according to the utility model, the front section of the flow field pressure detection sensor is wrapped by the film layer, so that the flow field pressure detection sensor is protected, high-frequency interference entering the sensor is effectively attenuated, and the service life of the flow field pressure detection sensor is prolonged.

Description

Technical Field

[0001] The utility model relates to the technical field of lithography machine sensors, in particular to a device for reducing pressure fluctuation of a lithography machine sensor. Background Art

[0002] Modern dry lithography machines use optical systems to accurately project and expose the patterns on the mask onto the silicon wafer coated with photoresist. Immersion lithography, on the other hand, fills the gap between the lens group and the silicon wafer in the dry lithography system with an immersion liquid that meets the optical property requirements to increase the refractive index of light waves in this space, thereby increasing the numerical aperture of the projection objective and the depth of focus of the system, so as to achieve the purpose of obtaining smaller line widths.

[0003] Chinese patent document with the application number 201110168788.3 discloses an immersion lithography machine flow field pressure sensor based on PVDF: the PVDF pressure sensing element with a shielding film has the characteristics of high sensitivity, low impedance and good flexibility, is convenient and simple to install, and has very little interference to the flow field; the signal processing device conditions the charge signal output by the PVDF pressure sensing element into a -5 to 5V voltage signal that can be collected, and effectively suppresses zero drift and noise interference.

[0004] With the continuous use of the sensor, the pressure fluctuation remains unchanged for the sensor pressure value, while the sensing reading of the sensor continues to decrease. Content of the Utility Model

[0005] The utility model provides a device for reducing pressure fluctuation of a lithography machine sensor to solve the problem that with the continuous use of the sensor in the prior art, the pressure fluctuation remains unchanged for the sensor pressure value, while the sensing reading of the sensor continues to decrease.

[0006] The technical problem solved by the utility model is realized by adopting the following technical solutions:

[0007] A device for reducing pressure fluctuation of a lithography machine sensor, comprising:

[0008] A lithography machine main body;

[0009] A flow field pressure detection sensor, which is detachably fixed at the bottom of the lithography machine main body;

[0010] A liquid film, into which the flow field pressure detection sensor is inserted downward;

[0011] A film layer, which wraps the front section of the flow field pressure detection sensor;

[0012] A receiving device, which is sleeved outside the flow field pressure detection sensor;

[0013] The clamping device is fixed inside the receiving device and clamps and fixes the film layer.

[0014] Optionally, a through hole penetrating up and down is provided on the film layer, and the film layer is eccentrically arranged with the liquid film.

[0015] Optionally, a threaded portion is provided in the middle of the outer side of the flow field pressure detection sensor, and the threaded portion corresponds to the receiving device.

[0016] Optionally, the receiving device includes:

[0017] A threaded sleeve which is rotatably sleeved on the outer side of the threaded portion;

[0018] An annular groove which is provided on the outer side of the threaded sleeve;

[0019] A rotating sleeve which is rotatably sleeved on the outer side of the threaded sleeve;

[0020] An annular protrusion which is bonded to the inner surface of the rotating sleeve and inserted into the outer side of the annular groove.

[0021] Optionally, the clamping device includes:

[0022] A lower supporting ring which is clamped inside the rotating sleeve and sleeved on the outer side of the film layer;

[0023] An upper pressing ring which is clamped inside the rotating sleeve and clamps the film layer in cooperation with the lower supporting ring;

[0024] A sealing ring which is bonded to the upper part of the inner side of the upper pressing ring and contacts and seals with the outer surface of the flow field pressure detection sensor;

[0025] An installation groove which is provided at the bottom of the upper pressing ring and is provided with a plurality of uniformly distributed in an annular array.

[0026] Optionally, the clamping device further includes:

[0027] A clamping plate which is rotatably installed inside the installation groove and clamps and fixes the film layer with the lower supporting ring under the extrusion of the flow field pressure detection sensor;

[0028] A coil spring, the two ends of which are respectively detachably and fixedly connected to the clamping plate and the shaft body inside the installation groove.

[0029] Optionally, a wire is fixedly installed on the aluminum electrode of the flow field pressure detection sensor, and one end of the wire far from the flow field pressure detection sensor is electrically connected to a signal processing device.

[0030] The beneficial effects of the present utility model are:

[0031] 1. By setting the membrane layer to wrap around the front section of the flow field pressure detection sensor, the flow field pressure detection sensor is protected, the high-frequency interference that has entered the sensor is effectively attenuated, and the service life of the flow field pressure detection sensor is increased;

[0032] 2. The setting of the clamping device can drive the membrane layer to rotate, so that the corresponding position of the through hole and the flow field pressure detection sensor changes. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 This is a schematic diagram of the main structure of the utility model;

[0034] Figure 2 This is a schematic diagram of the structure of the receiving device of the utility model;

[0035] Figure 3 This is an exploded schematic diagram of the receiving device structure of the utility model;

[0036] Figure 4 This is a schematic diagram of the structure of the upper pressure ring of the utility model;

[0037] Figure 5 This is a schematic diagram of the coil spring structure of the utility model;

[0038] Figure 6 It is a schematic diagram of the structure of the threaded part of the utility model.

[0039] In the figure: 100, main body of photolithography machine;

[0040] 200, flow field pressure detection sensor; 210, threaded portion; 220, wire; 230, signal processing device;

[0041] 300, liquid film;

[0042] 400, film layer; 410, through hole;

[0043] 500, receiving device; 510, threaded sleeve; 520, annular groove; 530, rotating sleeve; 540, annular protrusion;

[0044] 600, clamping device; 610, lower support ring; 620, upper pressure ring; 630, sealing ring; 640, mounting groove; 650, clamping plate; 660, coil spring. DETAILED DESCRIPTION

[0045] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further described below with reference to specific illustrations.

[0046] Reference Figure 1-6 A device for alleviating pressure fluctuations of a sensor of a lithography machine is shown, comprising:

[0047] The main body 100 of the lithography machine;

[0048] The flow field pressure detection sensor 200, and the flow field pressure detection sensor 200 is detachably fixed at the bottom of the main body 100 of the lithography machine;

[0049] The liquid film 300, and the flow field pressure detection sensor 200 is inserted downward into the inside of the liquid film 300;

[0050] The film layer 400, and the film layer 400 wraps around the front section of the flow field pressure detection sensor 200;

[0051] The receiving device 500, and the receiving device 500 is sleeved on the outside of the flow field pressure detection sensor 200;

[0052] The clamping device 600, and the clamping device 600 is fixed inside the receiving device 500 and clamps and fixes the film layer 400.

[0053] Among them, through the setting of the film layer 400 wrapping around the front section of the flow field pressure detection sensor 200, it plays a role in protecting the flow field pressure detection sensor 200, so that the induction reading of the flow field pressure detection sensor 200 will not continuously decrease over time, increasing the service life of the flow field pressure detection sensor 200;

[0054] Among them, relying on the flow field pressure detection sensor 200 to receive the pressure fluctuation excitation of the liquid film 300 to generate a pressure signal.

[0055] In some embodiments of the present invention, referring to Figure 2 as shown, a through hole 410 penetrating up and down is formed in the film layer 400, and the film layer 400 is eccentrically arranged with respect to the liquid film 300.

[0056] Among them, through the setting of the clamping device 600, the film layer 400 can be driven to rotate, so that the corresponding position of the through hole 410 and the flow field pressure detection sensor 200 is changed.

[0057] In some embodiments of the present invention, referring to Figure 6 as shown, a threaded portion 210 is provided in the middle of the outside of the flow field pressure detection sensor 200, and the threaded portion 210 corresponds to the receiving device 500.

[0058] Among them, through the setting of the threaded portion 210, the fixing of the receiving device 500 can be ensured, facilitating the installation and disassembly of the receiving device 500.

[0059] In some embodiments of the present invention, referring to Figure 3 as shown, the receiving device 500 includes:

[0060] A threaded sleeve 510, which is rotatably sleeved on the outside of the threaded part 210;

[0061] An annular groove 520, which is formed on the outside of the threaded sleeve 510;

[0062] A rotating sleeve 530, which is rotatably sleeved on the outside of the threaded sleeve 510;

[0063] An annular protrusion 540, which is bonded to the inner surface of the rotating sleeve 530 and inserted outside the annular groove 520.

[0064] Among them, through the setting of the threaded sleeve 510 and the cooperation with the threaded part 210, the rotating sleeve 530 is fixed at a specified position;

[0065] Among them, through the setting of the rotating sleeve 530, the normal installation and fixation of the clamping device 600 are ensured. At the same time, under the action of an external force, the clamping device 600 is driven to rotate to adjust the position of the through hole 410;

[0066] Among them, through the cooperative setting of the annular groove 520 and the annular protrusion 540, the connection stability between the threaded sleeve 510 and the rotating sleeve 530 can be ensured, and at the same time, it will not affect the rotation of the rotating sleeve 530. Moreover, the annular protrusion 540 is made of rubber material, which can ensure the sealing performance at the connection between the threaded sleeve 510 and the rotating sleeve 530.

[0067] In some embodiments of the present invention, referring to Figure 4 and Figure 3 as shown, the clamping device 600 includes:

[0068] A lower support ring 610, which is snap-fitted inside the rotating sleeve 530 and sleeved outside the film layer 400;

[0069] An upper pressing ring 620, which is snap-fitted inside the rotating sleeve 530 and clamps the film layer 400 in cooperation with the lower support ring 610;

[0070] A sealing ring 630, which is bonded to the upper inner part of the upper pressing ring 620 and contacts and seals the outer surface of the flow field pressure detection sensor 200;

[0071] An installation groove 640, which is formed at the bottom of the upper pressing ring 620 and is provided with a plurality of them evenly distributed in an annular array.

[0072] Among them, through the cooperative setting of the lower support ring 610 and the upper pressing ring 620, the film layer 400 is clamped and fixed, preventing the film layer 400 from falling or loosening under the action of an external force;

[0073] Among them, the sealing ring 630 can be pressed against the flow field pressure detection sensor 200 to ensure the sealing between the upper pressing ring 620 and the flow field pressure detection sensor 200.

[0074] In some embodiments of the present utility model, referring to Figure 5 as shown, the clamping device 600 further includes:

[0075] A clamping plate 650, which is rotatably installed inside the installation groove 640 and clamps and fixes the film layer 400 with the lower supporting ring 610 under the extrusion of the flow field pressure detection sensor 200;

[0076] A coil spring 660, the two ends of which are respectively detachably and fixedly connected to the clamping plate 650 and the shaft body inside the installation groove 640.

[0077] Among them, the installation groove 640 provides space for the installation of the clamping plate 650, enabling the clamping plate 650 to rotate normally;

[0078] Among them, the clamping plate 650 further clamps and fixes the film layer 400 under the extrusion of the flow field pressure detection sensor 200;

[0079] Among them, the coil spring 660 can release the further clamping and fixing of the film layer 400 after the rotating sleeve 530 disengages from the flow field pressure detection sensor 200.

[0080] In some embodiments of the present utility model, referring to Figure 1 as shown, a wire 220 is fixedly installed on the aluminum electrode of the flow field pressure detection sensor 200, and one end of the wire 220 away from the flow field pressure detection sensor 200 is electrically connected to a signal processing device 230.

[0081] Among them, the flow field pressure detection sensor 200 receives the pressure fluctuation excitation of the liquid film 3 to generate a pressure signal, outputs it to the signal processing device 230, and finally outputs it to a monitoring device such as an oscilloscope;

[0082] Among them, the wire 220 connects the flow field pressure detection sensor 200 and the signal processing device 230 to conduct signals.

[0083] The working method of the present utility model:

[0084] During installation, the upper pressure ring 620 is fixed inside the rotating sleeve 530, and then the membrane layer 400 is inserted into the rotating sleeve 530, and then the lower support ring 610 is fixed inside the rotating sleeve 530, and the membrane layer 400 is clamped and fixed, and then the rotating sleeve 530 is sleeved on the outside of the threaded sleeve 510, and the annular protrusion 540 is inserted into the inside of the annular groove 520, and then the threaded sleeve 510 is screwed on the outside of the threaded part 210, and the membrane layer 400 is sleeved on the front section of the flow field pressure detection sensor 200, and when inserted, the flow field pressure detection sensor 200 will squeeze the clamping plate 650, so that the clamping plate 650 rotates to clamp and fix the liquid film 300, and drives the coil spring 660 to rotate and store force when rotating;

[0085] When disassembling, the receiving device 500 is removed from the flow field pressure detection sensor 200, and the coil spring 660 will drive the clamping plate 650 to reset the contact with the membrane layer 400, and then the lower support ring 610 and the upper pressure ring 620 can be removed. Although the preferred embodiments of the utility model have been described, those skilled in the art can make additional changes and modifications to these embodiments once they know the basic creative concept. Therefore, the attached claims are intended to be interpreted as including the preferred embodiments and all changes and modifications that fall within the scope of the utility model.

[0086] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A device for reducing pressure fluctuations of a photolithography sensor, characterized in that: include: Photolithography machine body (100); A flow field pressure detection sensor (200), wherein the flow field pressure detection sensor (200) is detachably fixed to the bottom of the photolithography machine body (100); A liquid film (300), wherein the flow field pressure detection sensor (200) is inserted downward into the interior of the liquid film (300); A membrane layer (400), wherein the membrane layer (400) is wrapped around the front section of the flow field pressure detection sensor (200); A receiving device (500), wherein the receiving device (500) is sleeved on the outside of the flow field pressure detection sensor (200); A clamping device (600) is fixed inside the receiving device (500) and clamps and fixes the film layer (400).

2. The device for reducing pressure fluctuation of a sensor of a lithography machine according to claim 1, characterized in that: The membrane layer (400) is provided with a through hole (410) that passes through from top to bottom, and the membrane layer (400) and the liquid film (300) are eccentrically arranged.

3. The device for reducing pressure fluctuation of a photolithography machine sensor according to claim 1, characterized in that: A threaded portion (210) is provided in the middle of the outer side of the flow field pressure detection sensor (200), and the threaded portion (210) corresponds to the receiving device (500).

4. The device for reducing pressure fluctuation of a photolithography machine sensor according to claim 1, characterized in that: The receiving device (500) comprises: A threaded sleeve (510), wherein the threaded sleeve (510) is rotatably sleeved on the outer side of the threaded portion (210); an annular groove (520), wherein the annular groove (520) is formed on the outer side of the threaded sleeve (510); A rotating sleeve (530), wherein the rotating sleeve (530) is rotatably sleeved on the outer side of the threaded sleeve (510); An annular protrusion (540) is bonded to the inner surface of the rotating sleeve (530) and inserted into the outer side of the annular groove (520).

5. The device for reducing pressure fluctuation of a photolithography sensor according to claim 1, characterized in that: The clamping device (600) comprises: A lower supporting ring (610), wherein the lower supporting ring (610) is clamped inside the rotating sleeve (530) and sleeved on the outside of the membrane layer (400); An upper pressure ring (620), wherein the upper pressure ring (620) is clamped inside the rotating sleeve (530) and clamps the film layer (400) in cooperation with the lower support ring (610); A sealing ring (630), wherein the sealing ring (630) is bonded to the inner upper portion of the upper pressure ring (620) and contacts and seals with the outer surface of the flow field pressure detection sensor (200); The mounting groove (640) is opened at the bottom of the upper pressure ring (620) and is provided with a plurality of mounting grooves (640) evenly distributed in a ring array.

6. The device for reducing pressure fluctuation of a sensor of a lithography machine according to claim 1, characterized in that: The clamping device (600) further comprises: A clamping plate (650), wherein the clamping plate (650) is rotatably mounted inside the mounting groove (640) and clamps and fixes the membrane layer (400) together with the lower support ring (610) under the pressure of the flow field pressure detection sensor (200); A coil spring (660), wherein two ends of the coil spring (660) are respectively detachably fixedly connected to the clamping plate (650) and the shaft body inside the mounting groove (640).

7. The device for reducing pressure fluctuation of a sensor of a lithography machine according to claim 1, characterized in that: A wire (220) is fixedly mounted on the aluminum electrode of the flow field pressure detection sensor (200), and one end of the wire (220) away from the flow field pressure detection sensor (200) is electrically connected to a signal processing device (230).

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