Material taking and placing mechanism
By introducing a magnetic suction limit mechanism between the limiting parts and the mating parts into the adsorption structure, the problem of the adsorption structure swing at the target position is solved, achieving higher stability and position accuracy, while reducing impact force and cost.
Patent Information
- Application Number
- CN202422095190.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-27
- Publication Date
- 2025-07-04
- Estimated Expiration
- 2034-08-27
AI Technical Summary
When the existing adsorption structure is driven by a servo-reducing motor, it is easy to swing at the target position due to the back gap between the gears, which affects the position accuracy.
The magnetic suction limiting method between the limiting member and the mating member is adopted to ensure that the first adsorption assembly maintains a precise position during rotation, and magnetically absorbs through the limiting member on the base and the mating member on the first adsorption assembly to eliminate rotational motion errors.
It improves the stability and position accuracy of the material pick-up and discharge mechanism, reduces impact force, extends the service life of the limiting parts, and reduces costs.
Smart Images

Figure CN223060125U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of silicon wafer production equipment, and more specifically, to a pick-and-place mechanism. Background Art
[0002] In the process of single-sided coating of silicon wafers, it is necessary to suck the silicon wafers through an adsorption structure for loading and unloading. The adsorption structure includes two suction cups. During the loading process, the two suction cups first suck the silicon wafer simultaneously, and then one of the two suction cups remains stationary while the other needs to rotate 180°, and then the silicon wafer is attached to the silicon wafer on the stationary suction cup. Similarly, during the unloading process, one of the two suction cups also needs to rotate 180° to ensure coating on the same side of the silicon wafer.
[0003] However, the existing adsorption structure is driven by a servo reduction motor, and there is backlash between the gears in the servo reduction motor, resulting in the adsorption structure being prone to swing at the target position, affecting the position accuracy of the adsorption structure. Summary of the Utility Model
[0004] The utility model provides a new technical solution for a pick-and-place mechanism, which can at least solve the problem of poor position accuracy of the adsorption structure in the prior art.
[0005] The utility model provides a pick-and-place mechanism, including: a base, at least one limiting member is provided on the base; a first adsorption assembly, the first adsorption assembly is rotatably arranged on the base around a preset axis, the first adsorption assembly has at least a first state and a second state, and a cooperating member is provided on the first adsorption assembly; wherein, at least one of the limiting member and the cooperating member includes a magnet, and when the first adsorption assembly is in the first state and / or the second state, the limiting member and the cooperating member are magnetically attracted to limit the first adsorption assembly.
[0006] Optionally, the first adsorption assembly includes a plurality of first adsorption sheets arranged in a straight line direction, two of the limiting members are provided on the base, the two limiting members are spaced apart along the arrangement direction of the first adsorption sheets, the two limiting members include a first limiting member and a second limiting member, when the first adsorption assembly is in the first state, the first limiting member is magnetically attracted to the cooperating member; when the first adsorption assembly is in the second state, the second limiting member is magnetically attracted to the cooperating member.
[0007] Optionally, the cooperating member includes the magnet and a mounting seat, the mounting seat is arranged on the first adsorption assembly, the mounting seat has a mounting hole, and the magnet is arranged in the mounting hole.
[0008] Optionally, the extending direction of the axis of the mounting hole is perpendicular to the arrangement direction of the first adsorption sheets.
[0009] Optionally, the mounting hole penetrates through the mounting base, and a limiting boss protruding inwards is provided on the inner wall surface of the mounting hole. The magnet abuts against the limiting boss. When the limiting member and the mating member are magnetically attracted, the limiting boss is located between the limiting member and the mating member.
[0010] Optionally, the mounting base has two such mounting holes, and the two mounting holes are spaced apart along the arrangement direction of the first adsorption sheet. Each mounting hole is provided with a magnet. When the first adsorption assembly is in the first state, one of the two magnets is adsorbed to the limiting member; when the first adsorption assembly is in the second state, the other of the two magnets is magnetically attracted to the limiting member.
[0011] Optionally, the limiting member includes: a connecting member connected to the base; an adsorbing member movably disposed on the connecting member along a first direction, and the adsorbing member can be magnetically attracted by the magnet; a locking member disposed on the adsorbing member for locking the position of the adsorbing member; wherein, when the first adsorption assembly is in the first state or the second state, the first direction is perpendicular to the arrangement direction of the first adsorption sheet.
[0012] Optionally, the adsorbing member includes a bolt, and the locking member includes a nut, and the bolt is screwed to the connecting member and the nut respectively.
[0013] Optionally, the pick-and-place mechanism further includes: a second adsorption assembly disposed on the base, and the second adsorption assembly includes a plurality of the second adsorption sheets arranged in a straight line direction. When the first adsorption assembly is in the first state or the second state, the arrangement direction of the second adsorption sheets is parallel to the arrangement direction of the first adsorption sheets.
[0014] Optionally, the pick-and-place mechanism further includes: a driving member disposed on the base; a gear transmission assembly connected between the driving member and the first adsorption assembly, and the driving member drives the gear transmission assembly to rotate the first adsorption assembly.
[0015] According to the pick-and-place mechanism of the present invention, in the first state and / or the second state, the limiting member on the base is magnetically attracted and limited to the mating member on the first adsorption assembly. On the one hand, the error of the rotational movement of the first adsorption assembly can be eliminated, the first adsorption assembly can be prevented from swinging at the target position, and the stability and position accuracy of the pick-and-place mechanism can be improved. On the other hand, the impact force between the first adsorbing member and the limiting member when the first adsorbing member is limited can be reduced, and the safety and the service life of the limiting member can be improved. In addition, the magnetic attraction limit also has the advantages of simple structure and low cost.
[0016] Other features and advantages of the present utility model will become clear through the following detailed description of exemplary embodiments of the present utility model with reference to the accompanying drawings. Description of the Drawings
[0017] The drawings incorporated in and constituting a part of this specification illustrate embodiments of the present utility model and, together with the description thereof, are used to explain the principles of the present utility model.
[0018] Figure 1 is the front view of the pick-and-place mechanism according to an embodiment provided by the present utility model;
[0019] Figure 2 is the perspective view of the first adsorption assembly in the pick-and-place mechanism according to an embodiment provided by the present utility model;
[0020] Figure 3 is the side view of the first adsorption assembly in the pick-and-place mechanism according to an embodiment provided by the present utility model;
[0021] Figure 4 is along Figure 3 the sectional view taken along line A-A in
[0022] Figure 5 is Figure 4 the enlarged view of the circled part at C in
[0023] Figure 6 is along Figure 3 the sectional view taken along line B-B in
[0024] Figure 7 is Figure 6 the enlarged view of the circled part at D in
[0025] Reference Signs
[0026] 100, pick-and-place mechanism;
[0027] 10, base; 11, limiting member; 11a, first limiting member; 11b, second limiting member; 111, connecting member; 1111, first connecting portion; 1112, second connecting portion; 112, adsorbing member; 113, locking member;
[0028] 20, first adsorption assembly; 20a, preset axis; 21, fitting; 211, magnet; 211a, first magnet; 211b, second magnet; 212, mounting seat; 213, mounting hole; 214, limiting boss; 22, first adsorption sheet;
[0029] 30, second adsorption assembly; 31, second adsorption sheet;
[0030] 40, driving member. Detailed Embodiments
[0031] Various exemplary embodiments of the present utility model will now be described in detail with reference to the accompanying drawings. It should be noted that: unless otherwise specifically stated, the relative arrangements, numerical expressions, and numerical values of the components and steps set forth in these embodiments do not limit the scope of the present utility model.
[0032] The following description of at least one exemplary embodiment is actually merely illustrative and in no way limits the present utility model or its application or use.
[0033] Techniques, methods, and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, the said techniques, methods, and devices should be regarded as part of the specification.
[0034] In all the examples shown and discussed here, any specific value should be construed as merely exemplary and not as a limitation. Therefore, other examples of the exemplary embodiments may have different values.
[0035] It should be noted that: like reference numerals and letters denote like items in the following drawings, and thus, once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.
[0036] The pick-and-place mechanism 100 according to an embodiment of the present utility model will be specifically described below with reference to the accompanying drawings.
[0037] As Figures 1 to 7 shown, the pick-and-place mechanism 100 according to an embodiment of the present utility model includes: a base 10 and a first adsorption assembly 20.
[0038] Specifically,
[0039] In other words, the pick-and-place mechanism 100 according to an embodiment of the present utility model mainly consists of a base 10 and a first adsorption assembly 20.
[0040] Among them, at least one limiting member 11 is provided on the base 10. The first adsorption assembly 20 is rotatably provided on the base 10 around a preset axis 20a. The first adsorption assembly 20 has at least a first state and a second state. A mating member 21 is provided on the first adsorption assembly 20. Among them, at least one of the limiting member 11 and the mating member 21 includes a magnet 211. When the first adsorption assembly 20 is in the first state and / or the second state, magnetic attraction occurs between the limiting member 11 and the mating member 21 to limit the first adsorption assembly 20.
[0041] Specifically, the loading and unloading mechanism 100 can pick up and place wafers by adsorption. A first adsorption component 20 can be provided on the base 10, and the first adsorption component 20 can adsorb the wafers. The first adsorption component 20 can rotate relative to the base 10 to adjust the position and attitude of the wafers.
[0042] In addition, the first adsorption component 20 has at least a first state and a second state. The first state can be the initial state of the first adsorption component 20, and the second state can be the state after the first adsorption component 20 rotates 180°.
[0043] In the coating process, one-sided coating of the wafers is required. Therefore, it is necessary to use the first adsorption component 20 to pick up the wafers. At this time, the first adsorption component 20 is in the first state. Then rotate the first adsorption component 20 by 180° to switch to the second state. Then insert the wafers adsorbed by the first adsorption component 20 between the wafers not adsorbed by the first adsorption component 20, and make the multiple wafers fit together in pairs. Then send the wafers that fit together in pairs into the coating equipment for one-sided coating. After the coating is completed, one of the wafers that fit together in pairs can be adsorbed by the first adsorption component 20, and then the wafers that are stuck together are completely separated. Then rotate the first adsorption component 20 by 180° to switch back to the first state, so that the coated surfaces of all the wafers face the same side.
[0044] Optionally, the rotation center line of the first adsorption component 20 can extend in the vertical direction.
[0045] For the convenience of description, a three-dimensional coordinate system of mutually perpendicular X, Y, and Z axes can be established, where the Z axis can extend in the vertical direction, and the X axis and the Y axis can be mutually perpendicular horizontal axes.
[0046] One or more limit members 11 can be provided on the base 10, and a mating member 21 can be provided on the first adsorption component 20. Among them, at least one of the mating member 21 and the limit member 11 can include a magnet 211, and specifically can include but are not limited to the following situations:
[0047] In the first case, the limit member 11 includes a magnet 211, and a part or all of the mating member 21 can be made of a material that can be magnetically attracted by the magnet 211;
[0048] In the second case, the mating member 21 includes a magnet 211, and a part or all of the limit member 11 can be made of a material that can be magnetically attracted by the magnet 211;
[0049] In the third case, the limit member 11 and the mating member 21 each include a magnet 211.
[0050] It should be noted that the magnet 211 can include a natural magnet 211 or an electromagnet 211, which is not limited herein.
[0051] When the first adsorption component 20 is driven to rotate between the first state and the second state by a conventional driving structure, it is prone to deviation, and it is difficult to accurately control the posture of the first adsorption component 20. For example, it is difficult to control the first adsorption component 20 to accurately rotate 180°. Therefore, the position of the limiting member 11 is set according to the standard position of the first adsorption component 20 in the first state and / or the second state, and the limiting member 11 adsorbs the fitting member 21 on the first adsorption component 20 when the first adsorption component 20 is about to switch to the first state and / or the second state. This can not only ensure that the first adsorption component 20 is accurately limited, avoid the first adsorption component 20 from swinging and affecting the posture of the silicon wafer, but also avoid the first adsorption component 20 from hitting the limiting member 11 under the action of a large rotational torque, which is beneficial to improving safety and the service life of the limiting member 11.
[0052] Thus, for the pick-and-place mechanism 100 according to the embodiment of the present invention, in the first state and / or the second state, the limiting member 11 on the base 10 and the fitting member 21 on the first adsorption component 20 are magnetically adsorbed and limited. On the one hand, the error of the rotational movement of the first adsorption component 20 can be eliminated, the first adsorption component 20 can be prevented from swinging at the target position, and the stability and position accuracy of the pick-and-place mechanism 100 can be improved. On the other hand, the impact force between the first adsorbing member 112 and the limiting member 11 when being limited can be reduced, and the safety and the service life of the limiting member 11 can be improved. In addition, magnetic adsorption and limitation also have the advantages of simple structure and low cost.
[0053] Optionally, the pick-and-place mechanism 100 can be arranged at the end of the manipulator, and the base 10 can be connected to the end of the manipulator.
[0054] According to an embodiment of the present invention, the first adsorption component 20 includes a plurality of first adsorption sheets 22 arranged in a linear direction. Two limiting members 11 are provided on the base 10, and the two limiting members 11 are spaced apart along the arrangement direction of the first adsorption sheets 22. The two limiting members 11 include a first limiting member 11a and a second limiting member 11b. When the first adsorption component 20 is in the first state, the first limiting member 11a is magnetically adsorbed to the fitting member 21. When the first adsorption component 20 is in the second state, the second limiting member 11b is magnetically adsorbed to the fitting member 21.
[0055] Specifically, the first adsorption component 20 can mainly be composed of a plurality of first adsorption sheets 22. An adsorption hole can be provided on one side of each first adsorption sheet 22 for adsorbing the silicon wafer, and the plurality of first adsorption sheets 22 can be arranged along their own thickness directions. In addition, the number of the limiting members 11 on the base 10 can be two. For the convenience of description, these two limiting members 11 can be defined as the first limiting member 11a and the second limiting member 11b.
[0056] When the first adsorption component 20 is in the first state and the second state, the plurality of first adsorption sheets 22 are arranged along the Y-axis direction, and the two limit members 11 can be arranged at intervals along the Y-axis direction. The connection line between the two limit members 11 can be perpendicular to the rotation center line of the first adsorption component 20.
[0057] In addition, when the first adsorption component 20 is in the first state, the fitting 21 can be magnetically attracted to the first limit member 11a, and when the first adsorption component 20 is in the second state, the fitting 21 can be magnetically attracted to the second limit member 11b, so as to ensure that the first adsorption component 20 has a high position accuracy before and after rotation.
[0058] According to some other embodiments of the present invention, the fitting 21 includes a magnet 211 and a mounting base 212. The mounting base 212 is provided on the first adsorption component 20. The mounting base 212 has a mounting hole 213, and the magnet 211 is provided in the mounting hole 213.
[0059] In other words, the fitting 21 can be mainly composed of the magnet 211 and the mounting base 212. Among them, the first adsorption component 20 can further include a fixing plate, and the fixing plate can be located below the base 10.
[0060] The bottom of the fixing plate can be provided with a plurality of first adsorption sheets 22. A rotating shaft can be connected to the fixing plate, and the fixing plate can rotate around the rotating shaft so that the first adsorption component 20 rotates. The top of the fixing plate can be connected with the mounting base 212.
[0061] The mounting base 212 can be provided with a mounting hole 213 for mounting the magnet 211. The mounting hole 213 can be a blind hole or a through hole, which is not limited herein. The magnet 211 can be embedded in the mounting hole 213.
[0062] In this embodiment, setting the fitting 21 to include the magnet 211 is beneficial to simplifying the structure of the base 10 and reducing the cost of the picking and placing mechanism 100.
[0063] Optionally, the mounting hole 213 can be a circular hole, and the magnet 211 can be cylindrical.
[0064] In some specific embodiments of the present invention, the extending direction of the axis of the mounting hole 213 is perpendicular to the arrangement direction of the first adsorption sheets 22.
[0065] For example, as Figure 4 shown, when the first adsorption component 20 is in the first state and the second state, the axis of the mounting hole 213 can extend along the X-axis direction, so that the N pole and the S pole of the magnet 211 are spaced apart along the X-axis direction, thereby facilitating the magnetic attraction to limit the first adsorption component 20 before and after the first adsorption component 20 rotates 180°.
[0066] According to some alternative embodiments of the present utility model, the mounting hole 213 penetrates through the mounting seat 212. An inwardly protruding limiting boss 214 is provided on the inner wall surface of the mounting hole 213. The magnet 211 abuts against the limiting boss 214. When the limiting member 11 and the mating member 21 are magnetically attracted, the limiting boss 214 is located between the limiting member 11 and the mating member 21.
[0067] Specifically, as Figure 5 shown, the mounting hole 213 can penetrate through both side surfaces of the mounting seat 212. The inner wall surface of the mounting hole 213 can be provided with a limiting boss 214. The limiting boss 214 can be annular, thereby dividing the mounting hole 213 into two parts with different diameters. The part with a larger diameter is used to accommodate the magnet 211, and the part with a smaller diameter, i.e., the limiting boss 214, can abut against the magnet 211 and limit the magnet 211.
[0068] When the limiting member 11 and the mating member 21 are magnetically attracted, the part with a larger diameter in the mounting hole 213 is away from the limiting member 11, and the part with a smaller diameter in the mounting hole 213 is close to the limiting member 11, and the magnet 211 is exposed from the side of the mounting seat 212 facing the limiting member 11.
[0069] Therefore, when the magnet 211 and the limiting member 11 are magnetically attracted, the two can be separated by the limiting boss 214, that is, they do not directly contact, which is beneficial to controlling the magnetic attraction between the magnet 211 and the limiting member 11 and reducing the resistance when the first adsorption assembly 20 rotates.
[0070] In some alternative embodiments, the magnet 211 can be embedded in the mounting hole 213 by interference fit or fixed in the mounting hole 213 by bonding to prevent the magnet 211 from loosening and falling.
[0071] According to some other embodiments of the present utility model, the mounting seat 212 has two mounting holes 213. The two mounting holes 213 are arranged at intervals along the arrangement direction of the first adsorption sheet 22. A magnet 211 is provided in each mounting hole 213. When the first adsorption assembly 20 is in the first state, one of the two magnets 211 is adsorbed to the limiting member 11. When the first adsorption assembly 20 is in the second state, the other of the two magnets 211 is magnetically attracted to the limiting member 11.
[0072] Specifically, as Figure 6 and Figure 7As shown, the number of mounting holes 213 on the mounting base 212 and the number of magnets 211 can be equal to the number of limit members 11 on the base 10, and the two mounting holes 213, the two magnets 211 and the two limit members 11 are arranged in one-to-one correspondence. For ease of description, the two magnets 211 can be defined as a first magnet 211a and a second magnet 211b respectively. The limit bosses 214 in the two mounting holes 213 can be arranged at intervals along the axial direction of the mounting holes 213.
[0073] When the first adsorption assembly 20 is in the first state and the second state, the two mounting holes 213 can be spaced apart along the Y-axis direction. When the first adsorption assembly 20 is in the first state, the first magnet 211a can be magnetically attracted to the first limit member 11a, and when the first adsorption assembly 20 is in the second state, the second magnet 211b can be magnetically attracted to the second limit member 11b.
[0074] In this embodiment, by providing two mounting holes 213 and two magnets 211, when each magnet 211 cooperates with the corresponding limit member 11, the magnet 211 and the limit member 11 can be separated by the limit boss 214, and the two do not directly contact, which is beneficial to controlling the magnetic attraction between the magnet 211 and the limit member 11 and reducing the resistance when the first adsorption assembly 20 rotates.
[0075] In some specific embodiments of the present utility model, the limit member 11 includes a connecting member 111, an adsorbing member 112 and a locking member 113. The connecting member 111 is connected to the base 10. The adsorbing member 112 is movably arranged on the connecting member 111 along a first direction, and the adsorbing member 112 can be magnetically attracted by the magnet 211. The locking member 113 is arranged on the adsorbing member 112 for locking the position of the adsorbing member 112. When the first adsorption assembly 20 is in the first state or the second state, the first direction is perpendicular to the arrangement direction of the first adsorption sheet 22.
[0076] In other words, the limit member 11 of this embodiment can mainly be composed of a connecting member 111, an adsorbing member 112 and a locking member 113. The first direction can be the X-axis direction in the drawings.
[0077] As Figure 5 shown, the connecting member 111 can be connected below the base 10. The connecting member 111 can be an L-shaped plate member, including a first connecting portion 1111 and a second connecting portion 1112. The first connecting portion 1111 can extend horizontally and be connected to the base 10, the top end of the second connecting portion 1112 is connected to the first connecting portion 1111, and the bottom end of the second connecting portion 1112 can extend vertically downward.
[0078] The adsorbing member 112 can be magnetically attracted by the magnet 211. The adsorbing member 112 can be connected to the second connecting portion 1112, and the adsorbing member 112 can move along the X-axis direction to adjust the position of the adsorbing member 112. In addition, a locking member 113 is provided on the adsorbing member 112. The locking member 113 can lock the adsorbing member 112 after the adsorbing member 112 is adjusted in place to prevent the adsorbing member 112 from moving. Thus, the standard positions of the first adsorption assembly 20 in the first state and the second state can be calibrated.
[0079] Optionally, the adsorbing member 112 can be made of carbon steel material so that the magnetic force between the adsorbing member 112 and the magnet 211 meets the requirements.
[0080] Optionally, the magnet 211 can include a rubidium magnet, which is a kind of strong magnet and can generate a strong magnetic force on the limiting member 11.
[0081] According to some alternative embodiments of the present invention, the adsorbing member 112 includes a bolt, and the locking member 113 includes a nut. The bolt is screwed to the connecting member 111 and the nut respectively. By rotating the bolt, the position of the bolt in the X-axis direction can be adjusted, and the position of the bolt can be locked by the nut, which has the advantages of simple structure, low cost and easy adjustment.
[0082] For example, as Figure 5 shown, when the first adsorption assembly 20 is in the first state and the second state, the cap portion of the bolt can be magnetically attracted by the magnet 211, and the cap portion is located between the second connecting portion 1112 and the magnet 211. The nut can be connected between the cap portion and the second connecting portion 1112.
[0083] According to some other embodiments of the present invention, the pick-and-place mechanism 100 further includes a second adsorption assembly 30. The second adsorption assembly 30 is provided on the base 10. The second adsorption assembly 30 includes a plurality of second adsorption sheets 31 arranged in a straight line direction. When the first adsorption assembly 20 is in the first state or the second state, the arrangement direction of the second adsorption sheets 31 is parallel to the arrangement direction of the first adsorption sheets 22.
[0084] Specifically, as Figure 1 shown, the pick-and-place mechanism 100 can include two adsorption assemblies, namely the first adsorption assembly 20 and the second adsorption assembly 30. The second adsorption assembly 30 can be connected to the base 10 and arranged along the X-axis direction with the first adsorption assembly 20. The second adsorption assembly 30 can have a plurality of second adsorption sheets 31, and the plurality of second adsorption sheets 31 can be arranged along the Y-axis direction.
[0085] Optionally, the first adsorption sheets 22 and the second adsorption sheets 31 can have the same shape, structure and size.
[0086] The working process of the loading and unloading mechanism 100 of this embodiment for loading wafers into the coating equipment will be described in detail below.
[0087] The first adsorption component 20 and the second adsorption component 30 each adsorb a row of wafers. At this time, the first adsorption component 20 is in the first state, and the first magnet 211a is magnetically attracted to the first limiting member 11a. The first adsorption component 20 rotates 180° to switch from the first state to the second state, and the second magnet 211b is magnetically attracted to the second limiting member 11b. The first adsorption component 20 translates a certain distance in the positive direction of the Y-axis, so that the wafers adsorbed by the first adsorption component 20 and the wafers adsorbed by the second adsorption component 30 are staggered. The first adsorption component 20 and the second adsorption component 30 approach each other in the X-axis direction, so that the two rows of wafers are inserted into each other alternately. The first adsorption component 20 translates a certain distance in the reverse direction of the Y-axis, so that the wafers are attached to each other in pairs, that is, the wafers adsorbed on each first adsorption sheet 22 are attached to the wafers on an adjacent second adsorption sheet 31. The wafers attached to each other in pairs are transported into the carrier of the coating equipment.
[0088] The process of the loading and unloading mechanism 100 unloading wafers from the coating equipment can perform opposite actions to the loading process.
[0089] In some specific embodiments of the present invention, the loading and unloading mechanism 100 further includes a driving member 40 and a gear transmission assembly. The driving member 40 is arranged on the base 10. The gear transmission assembly is connected between the driving member 40 and the first adsorption component 20, and the driving member 40 drives the gear transmission assembly to rotate the first adsorption component 20.
[0090] Specifically, the driving member 40 and the gear transmission assembly can be arranged on the base 10. The gear transmission assembly can be connected between the driving member 40 and the first adsorption component 20. The gear transmission assembly can include a reduction gear for reducing the rotational speed of the output end of the driving member 40.
[0091] Since the gear transmission assembly has an ineliminable backlash through gear transmission, the structure of the limiting member 11 and the mating member 21 magnetically attracted in this embodiment can eliminate this backlash. Therefore, the accuracy requirements for the driving member 40 and the gear transmission assembly can be reduced, thereby reducing the cost of the driving member 40 and the gear transmission assembly.
[0092] Optionally, the combined structure of the driving member 40 and the gear transmission assembly can be a servo reduction motor.
[0093] In summary, for the loading and unloading mechanism 100 according to the embodiment of the present utility model, in the first state and / or the second state, the limiting member 11 on the base 10 and the cooperating member 21 on the first adsorption assembly 20 are magnetically attracted and limited. On the one hand, the error of the rotational movement of the first adsorption assembly 20 can be eliminated, the swinging of the first adsorption assembly 20 at the target position can be avoided, the stability and position accuracy of the loading and unloading mechanism 100 can be improved. On the other hand, the impact force between the first adsorbent 112 and the limiting member 11 when being limited can be reduced, the safety and the service life of the limiting member 11 can be improved. In addition, the magnetic attraction limit also has the advantages of simple structure and low cost.
[0094] Although some specific embodiments of the present utility model have been described in detail by way of examples, those skilled in the art should understand that the above examples are for illustrative purposes only and not for limiting the scope of the present utility model. Those skilled in the art should understand that the above embodiments can be modified without departing from the scope and spirit of the present utility model. The scope of the present utility model is defined by the appended claims.
Claims
1. A pick-and-place mechanism, characterized in that, Comprising: A base, on which at least one limiting member is provided; A first adsorption assembly, which is rotatably arranged on the base around a preset axis. The first adsorption assembly has at least a first state and a second state, and a fitting member is provided on the first adsorption assembly; Wherein, at least one of the limiting member and the fitting member includes a magnet. When the first adsorption assembly is in the first state and / or the second state, magnetic attraction occurs between the limiting member and the fitting member to limit the first adsorption assembly.
2. The pick-and-place mechanism according to claim 1, wherein, The first adsorption assembly includes a plurality of first adsorption sheets arranged in a linear direction. Two limiting members are provided on the base, and the two limiting members are spaced apart along the arrangement direction of the first adsorption sheets. The two limiting members include a first limiting member and a second limiting member. When the first adsorption assembly is in the first state, the first limiting member is magnetically attracted to the fitting member; When the first adsorption assembly is in the second state, the second limiting member is magnetically attracted to the fitting member.
3. The pick-and-place mechanism according to claim 2, wherein, The fitting member includes the magnet and a mounting seat. The mounting seat is arranged on the first adsorption assembly. The mounting seat has a mounting hole, and the magnet is arranged in the mounting hole.
4. The pick-and-place mechanism according to claim 3, wherein The extending direction of the axis of the mounting hole is perpendicular to the arrangement direction of the first adsorption sheets.
5. The pick-and-place mechanism according to claim 4, wherein The mounting hole penetrates through the mounting seat. A limiting boss protruding inward is provided on the inner wall surface of the mounting hole. The magnet abuts against the limiting boss. When the limiting member and the fitting member are magnetically attracted, the limiting boss is located between the limiting member and the fitting member.
6. The pick-and-place mechanism according to claim 3, wherein The mounting seat has two mounting holes, and the two mounting holes are spaced apart along the arrangement direction of the first adsorption sheets. Each mounting hole is provided with a magnet. When the first adsorption assembly is in the first state, one of the two magnets is adsorbed to the limiting member; When the first adsorption assembly is in the second state, the other of the two magnets is magnetically attracted to the limiting member.
7. The pick-and-place mechanism according to claim 2, characterized in that, The limiting member includes: A connecting member, which is connected to the base; An adsorbing member, which is movably arranged on the connecting member along a first direction. The adsorbing member can be magnetically attracted by the magnet; A locking member, which is arranged on the adsorbing member and is used to lock the position of the adsorbing member; Wherein, when the first adsorption assembly is in the first state or the second state, the first direction is perpendicular to the arrangement direction of the first adsorption sheets.
8. The pick-and-place mechanism according to claim 7, wherein, The adsorbing member includes a bolt, and the locking member includes a nut. The bolt is screwed to the connecting member and the nut respectively.
9. The pick-and-place mechanism according to claim 2, wherein, Further comprising: A second adsorption assembly, which is arranged on the base. The second adsorption assembly includes a plurality of second adsorption sheets arranged in a linear direction. When the first adsorption assembly is in the first state or the second state, the arrangement direction of the second adsorption sheets is parallel to the arrangement direction of the first adsorption sheets.
10. The pick-and-place mechanism according to any one of claims 1-9, characterized in that, Further comprising: A driving member, which is arranged on the base; A gear transmission assembly, the gear transmission assembly being connected between the driving member and the first adsorption assembly, and the driving member driving the gear transmission assembly to rotate the first adsorption assembly.