Baffle assembly and evaporation device

Abstract

The utility model discloses a baffle assembly and an evaporation device, and belongs to the technical field of evaporation equipment. The first supporting plate is arranged on one side, close to the evaporation source, of the substrate; second groove holes are formed in the first supporting plate in the first direction of the first supporting plate, the second groove holes are communicated with the evaporation side of the evaporation source, the second groove holes are formed into a plurality of sets in parallel along the first supporting plate, communication is correspondingly formed towards the base plate in the depth direction of the second groove holes, and the width of the communication position is larger than that of the containing space of the second groove holes. According to the assembly, the second groove hole communicated with the evaporation side is formed, the containing space communicated with the second groove hole is further formed in the inner side of the second groove hole, and due to the fact that the containing space has the larger width size, the steam part of the target material can be deposited on the wall face of the containing space after passing through the second groove hole; part of metal steam can be deposited in the position, wider than the second groove hole, in the containing space, and therefore the anchoring effect can be increased after attachment and deposition.

Description

Technical Field

[0001] The utility model relates to the technical field of film winding equipment, in particular to a baffle assembly and an evaporation coating device. Background Art

[0002] In the evaporation coating operation, in addition to adhering to the target substrate, the evaporated metal vapor will also adhere to the structures around the evaporation source. In order to protect the mechanisms and components of the device, it is necessary to set up a baffle to shield and protect the space around the evaporation source.

[0003] However, for the composite current collector coating process in the production of lithium batteries, due to the large amount of metal deposition on the baffle during the coating process, long roll length, and long evaporation coating time.

[0004] During the evaporation coating process, the metal layer deposited on the baffle will be too thick, and at high temperatures, there may be a situation where part of it falls off. The fallen metal slag may fall into the evaporation source, causing the molten target material in the evaporation source to splash. At the same time, due to the large temperature difference between the fallen metal slag and the molten metal liquid, a large amount of metal clusters are likely to be generated and deposited on the flexible substrate (such as a PET film) together with the vapor, which will cause local overheating of the flexible substrate, scald the current collector base film, generate pinholes, and affect the performance of the current collector and the electrode assembly.

[0005] In Patent Document 1, to prevent the baffle from overheating and dropping slag, a support layer with holes is provided, and the metal vapor enters the support layer (back side) through the holes to form an attachment, thereby reducing the probability of falling from the outer surface.

[0006] However, the above baffle assembly structure is relatively complex, the hole structure of the support layer is dense, and it is not conducive to cleaning and maintenance later.

[0007] Therefore, further improvement is needed.

[0008] Patent Document 1: CN220767144U. Summary of the Utility Model

[0009] The utility model aims to at least solve one of the technical problems in the related technologies to some extent. For this reason, an object of the utility model is to propose a baffle assembly, which forms a plurality of slot hole structures that play an anchoring role in the deposited metal layer and can facilitate the deposition of metal vapor.

[0010] Another object of the present application is to propose an evaporation coating device including the above component.

[0011] The technical solution of the utility model is as follows:

[0012] A baffle assembly includes:

[0013] Substrate;

[0014] The first support plate is disposed on one side of the substrate close to the evaporation source;

[0015] The first support plate forms a second slot in its first direction. The second slot communicates with the evaporation side of the evaporation source, and a plurality of groups of the second slots are arranged in parallel along the first support plate. A receiving space that is connected and has a width greater than that of the second slot is formed corresponding to the substrate along the depth direction of the second slot.

[0016] Based on the above technical solution, a second slot communicating with the evaporation side is formed, and a receiving space communicating therewith is further formed inside the second slot. The target material vapor in the evaporation source can enter the receiving space from the second slot. Since the receiving space has a larger width dimension, after part of the target material vapor passes through the second slot, it will be deposited on the wall surface of the receiving space, and part of the metal vapor will be deposited at a position wider than the second slot in the receiving space. Therefore, the anchoring effect can be increased after attachment and deposition.

[0017] Further, the first support plate is detachably connected to the substrate;

[0018] Or, the first support plate and the substrate are provided as an integral body.

[0019] Based on the above technical solution, combined with the component structure, a suitable structure can be selected to facilitate maintenance.

[0020] Further, the outer surface of the first support plate and the wall surface of the receiving space are roughened.

[0021] Based on the above technical solution, the adhesiveness can be increased.

[0022] Further, a first slot is formed on the substrate corresponding to the second slot. A second support plate is slidably disposed in the first slot. The depth direction of the first slot communicates with the second slot, and the receiving space is a space defined by the second slot and the second support plate.

[0023] Based on the above technical solution, by providing a slidable support plate, the convenience during the cleaning and demolding of the attached target material can be increased.

[0024] Further, a first gap is provided between the second support plate and the first slot in the depth direction of the first slot.

[0025] Further, the size of the first gap is 1 - 5 mm.

[0026] Further, a second gap is provided between the second support plate and the first slot in the width direction of the first slot.

[0027] Further, the size of the second gap is 0.5 - 2 mm.

[0028] Based on the above technical solution, a gap is provided to facilitate subsequent sliding adjustment of the second support plate and facilitate removal for cleaning.

[0029] Further, the width of the first slot is greater than the width of the connection between the accommodation space and the first slot.

[0030] Based on the above technical solution, the second support plate in the first slot can provide a sliding space and ensure a larger contact area between the second support plate and the target vapor, ensuring a sufficient deposition amount of the target material on the second support plate.

[0031] Further, the width of the second slot gradually increases in the depth direction towards the accommodation space.

[0032] Based on the above technical solution, the volume of the accommodation space can be increased, and the inner side wall of the first slot can also serve as a support plane to participate in increasing the anchoring effect.

[0033] Further, a scraping plate adapted to the accommodation space is provided on the second support plate.

[0034] Based on the above technical solution, it is convenient for crushing and demolding.

[0035] Further, the scraping plate is provided at the end side of the second support plate.

[0036] Based on the above technical solution, the scraping plate can be prevented from blocking the accommodation space.

[0037] Further, the axial length of the second support plate can be longer than that of the first slot.

[0038] Based on the above technical solution, it is convenient for subsequent operations.

[0039] Further, an ultra-deep groove is provided at the outlet end of the first slot corresponding to the accommodation space.

[0040] Based on the above technical solution, the size of the accommodation space can be further increased.

[0041] The present application also discloses an evaporation coating device based on the above components. The baffle assembly is arranged at the edge of the evaporation path of the vapor to reduce the overflow of the vapor to the non-evaporation coating area. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] The drawings are used to provide a further understanding of the present invention and constitute a part of the specification. They are used together with the embodiments of the present invention to explain the present invention and do not constitute a limitation to the present invention. In the drawings:

[0043] Figure 1 It is a schematic structural diagram of an arrangement form of the baffle assembly;

[0044] Figure 2 It is a schematic structural diagram of the baffle assembly;

[0045] Figure 3 Schematic diagram of the Z-axis direction structure of the substrate ( Figure 2 viewed from below);

[0046] Figure 4 Schematic diagram of the Z-axis direction structure of the support plate ( Figure 2 viewed from above);

[0047] Figure 5 Schematic diagram of the structure of the baffle assembly with the second support plate provided therein;

[0048] Figure 6 Schematic diagram of the structure of an embodiment of the baffle assembly;

[0049] Figure 7 Schematic diagram of the structure of an embodiment of the baffle assembly;

[0050] Figure 8 Schematic diagram of the structure of an embodiment of the baffle assembly.

[0051] In the figure:

[0052] 100 - baffle assembly;

[0053] 1 - substrate; 11 - first slot; 111 - first gap; 112 - second gap;

[0054] 2 - first support plate; 21 - second slot; 22 - accommodation space;

[0055] 3 - second support plate; 31 - scraper.

[0056] X - first direction; Y - second direction; Z - third direction. Detailed implementation manners

[0057] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments.

[0058] Examples of the described embodiments are shown in the accompanying drawings, where the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions from beginning to end. The embodiments described below by referring to the accompanying drawings are exemplary and are intended to explain the present invention, and should not be construed as limiting the present invention.

[0059] As Figure 1 shown, in order to ensure that other devices are not affected by the steam generated in the evaporation source, a baffle assembly 100 is generally provided to block the evaporation path of the steam and reduce the steam from overflowing to the non-evaporation plating area.

[0060] The baffle assembly 100 can be arranged on both sides of the main drum and can also be further arranged on both sides of the evaporation source; it can be arranged horizontally or vertically, or can have a certain inclination angle.

[0061] Referring to Figures 2-4 , a baffle assembly 100 includes:

[0062] A substrate 1, as the main body of the baffle assembly, ensures the strength of the baffle;

[0063] A first support plate 2 is disposed on one side of the substrate 1 close to the evaporation source;

[0064] In some embodiments of the present application, the first support plate 2 forms a second slot 21 in its first direction, the second slot 21 communicates with the evaporation side of the evaporation source, and the second slot 21 is arranged in a plurality of groups parallel to the second direction of the first support plate 2; a receiving space 22 that is connected and communicates with each other and has a width greater than that of the second slot 21 is formed corresponding to the substrate 1 along the third direction Z of the second slot 21, that is, D2>D3; at this time, the receiving space 22 corresponds to the space defined by the inner side of the second slot 21 and the substrate 1.

[0065] The second slot 21 communicating with the evaporation side is formed, and a receiving space communicating with it is further formed inside the second slot 21. The target material vapor in the evaporation source can enter the receiving space from the second slot 21. And because the receiving space has a larger width dimension, after part of the target material vapor passes through the second slot 21, it will be deposited on the wall surface of the receiving space, and part of the metal vapor will be deposited at a position wider than the second slot 21 in the receiving space. Therefore, the anchoring effect can be increased after adhesion and deposition.

[0066] In addition, in some embodiments of the present application, the first support plate 2 is detachably connected to the substrate 1, such as being connected and fixed through a connecting member; it can also be set as an integral body, such as being integrally processed and formed. Considering increasing the adhesion, the outer surface of the first support plate 2 and the receiving space can also be roughened;

[0067] In some embodiments of the present application, the first direction corresponds to the transverse direction of the base film, the second direction corresponds to the longitudinal direction of the base film, and the third direction corresponds to the vertical direction; in other embodiments of the present application, when the baffle assembly is arranged in the vertical direction, the second direction corresponds to the vertical direction, and the third direction corresponds to the longitudinal direction of the base film; those skilled in the art can make adaptive changes in combination with the content of the present application, which should also be covered by the protection scope of the present application.

[0068] In some embodiments of the present application, referring to Figures 1-5, a first slot 11 is provided on the substrate 1 corresponding to the second slot 21, and a second support plate 3 is slidably arranged in the first slot 11. Further, the second support plate 3 maintains a certain sealing property with the first slot 11. At this time, the first slot 11 penetrates outward, so the accommodating space 22 is set as the space defined by the inner side of the second slot 21 and the second support plate 3;

[0069] To ensure that the second support plate 3 can be easily slid after depositing the target material and is convenient to take out for cleaning, a first gap 111 is provided between the second support plate 3 and the first slot 11, and the size L1 of the first gap 111 is 1-5 mm; there are second gaps 112 between both sides of the second support plate 3 in the second direction Y and the first slot 111, and the size L2 of the second gaps 112 is 0.5-2 mm. Due to the existence of the accommodating space 22, the space below the second support plate 3 can also be increased, which is beneficial for subsequent sliding.

[0070] The slidable arrangement of the second support plate 3 facilitates the cleaning of the target material layer deposited thereon. At the same time, during the sliding process of the second support plate 3, the integrally deposited target material layer will be broken, making it easier to loosen and demold.

[0071] Such as Figure 5 , the width D1 of the first slot 11 is greater than the width D2 at the connection between the accommodating space 22 and the first slot 11, so that the second support plate 3 in the first slot 11 can provide a sliding space and ensure a larger contact area between the second support plate 3 and the target material vapor, ensuring a sufficient deposition amount of the target material on the second support plate.

[0072] Further referring to Figure 6 , the width of the second slot 21 gradually increases along the third direction Z and towards the accommodating space 22. In some embodiments of the present application, its cross-section is generally trapezoidal. At this time, the volume of the accommodating space 22 can be increased, that is, the inner side wall of the first slot 11 can also be used as a support plane to participate in increasing the anchoring effect. Of course, other shapes with cross-sectional width dimensions satisfying the above variation law are also possible, such as a stepped shape with a stepped change, or only one side of the second slot 21 satisfies the gradient change.

[0073] Referring to Figure 7In some embodiments of the present application, in consideration of the convenience of subsequent crushing and demoulding, the second support plate 3 is provided with a scraper 31 adapted to the accommodating space 22, at least for scraping off the deposited residue on the support platform at the connection between the first slot hole 11 and the accommodating space 22. The scraper 31 is provided at the end side of the second support plate 3 and does not block the accommodating space. There is a certain gap between the scraper 31 and the wall surface of the accommodating space to avoid the difficulty in pulling the second support plate 3 when the residue is thick; the axial length of the second support plate 3 can be longer than that of the first slot hole 11, which is convenient for subsequent operation. Of course, a related joint structure can be provided at the end side of the second support plate 3 for connecting an external traction device to pull the second support plate 3 out of the first direction X to play a demoulding role.

[0074] Reference Figure 8 In some embodiments of the present application, an extra-deep groove is provided at the outlet end of the first slot 11 corresponding to the accommodating space 22 to further increase the size of the accommodating space 22 .

[0075] In addition, a condensation pipeline may be pre-buried on the substrate 1 to cool the components. The structure related to the condensation pipeline belongs to the existing conventional technology and will not be described in detail.

[0076] The present application also discloses a vapor deposition device based on the above components.

[0077] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or conventionally expressed in the prior art, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0078] In the description of the embodiments of the present application, the term "and / or" is only a description of the association relationship of associated objects, indicating that three relationships may exist. For example, A and / or B can represent: A exists, A and B exist at the same time, and B exists. In addition, the character " / " in this article generally indicates that the associated objects before and after are in an "or" relationship.

[0079] The term "multiple" as used in the present application refers to more than two (including two). Similarly, "multiple groups" refers to more than two groups (including two groups), and "multiple sheets" refers to more than two sheets (including two sheets).

[0080] The above are only the preferred specific embodiments of the present utility model, but the protection scope of the present utility model is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present utility model, according to the technical solution of the present utility model and its inventive concept, makes equivalent substitutions or changes, and should be covered within the protection scope of the present utility model.

Claims

1. A baffle assembly, comprising: A substrate; A first support plate disposed on one side of the substrate close to the evaporation source; Characterized in that the first support plate forms a second slot hole in its first direction, the second slot hole is communicated with the evaporation side of the evaporation source, and the second slot hole is arranged in a plurality of groups along the first support plate, and a accommodating space which is communicated and has a width greater than that of the second slot hole is formed corresponding to the substrate along the depth direction of the second slot hole.

2. The baffle assembly according to claim 1, wherein The first support plate is detachably connected to the substrate; Or, the first support plate and the substrate are integrally formed.

3. The baffle assembly according to claim 1, wherein The width of the second slot hole gradually increases in the depth direction towards the accommodating space.

4. The baffle assembly according to any one of claims 1-3, characterized in that, A first slot hole is formed on the substrate corresponding to the second slot hole, and a second support plate is slidably disposed in the first slot hole. The depth direction of the first slot hole is communicated with the second slot hole, and the accommodating space is the space defined by the second slot hole and the second support plate.

5. The baffle assembly according to claim 4, wherein A first gap is provided between the second support plate and the first slot hole in the depth direction of the first slot hole; And / or, a second gap is provided between the second support plate and the first slot hole in the width direction of the first slot hole.

6. The baffle assembly according to claim 4, wherein The width of the first slot hole is greater than the width of the communicating portion between the accommodating space and the first slot hole; And / or, an ultra-deep slot is provided at the outlet end of the first slot hole corresponding to the accommodating space.

7. The baffle assembly according to claim 4, wherein The second support plate is provided with a squeegee adapted to the accommodating space.

8. The baffle assembly according to claim 7, wherein, The squeegee is disposed on the end side of the second support plate.

9. The baffle assembly according to claim 8, wherein, The axial length of the second support plate is longer than that of the first slot hole.

10. A vapor deposition apparatus, characterized in that, Comprising the baffle assembly according to claim 9, the baffle assembly is disposed in the edge area of the evaporation path of the steam to reduce the overflow of the steam to the non-evaporation plating area.

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