Flow dividing pipeline non-return structure and gas flow dividing system

Abstract

The utility model provides a non-return structure and a gas shunting system. The non-return structure comprises a rotating module and a limiting sealing module. The rotating module comprises a plurality of blades, and the inner end of each blade is connected to the first rotating shaft so that the blades can rotate in the forward direction under driving of forward airflow. The first end of the limiting and sealing module is elastically installed on the shell of the non-return structure in a one-way mode, the second end of the limiting and sealing module extends to the blades of the rotating module, and the second end of the limiting and sealing module is in one-way elastic deformation when being touched by the outer ends of the blades rotating in the forward direction; when the blades are driven by reverse airflow to rotate reversely, the blades are locked and connected with the outer ends of the corresponding blades in a sealed mode so that the reverse airflow can be blocked.

Description

Technical Field

[0001] The utility model relates to the field of semiconductor processing, in particular to a backflow prevention structure for a shunt pipeline and a gas shunt system. Background Art

[0002] PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment is a device widely used in semiconductor manufacturing and other industrial applications. It activates chemical reactions through plasma to deposit thin films on the surface of substrate materials. In the application of PECVD equipment, process gas shunting is usually required.

[0003] For example: During the PECVD process, different process steps may require different gas pressures and gas flow rates. Through shunting, the flow rate of each gas can be precisely controlled, thereby optimizing the thin film deposition process. Another example: The characteristics of the thin films deposited by PECVD (such as thickness, uniformity, refractive index, stress, etc.) are affected by various process parameters, including the ratio of process gases. By shunting different process gases, the gas composition ratio can be adjusted, thereby affecting the growth rate and final characteristics of the thin films. In the shunt pipeline, the forward flowing gas flows from the high-pressure side of the gas tank to the low-pressure side of the front-stage pipeline. However, if the air pump stops during the gas flow process, it will cause the pressure distribution to reverse, resulting in the risk of backflow.

[0004] In order to overcome the above-mentioned defects existing in the prior art, there is an urgent need in the art for a backflow prevention technology for shunt pipelines to prevent backflow in a unidirectional gas flow structure, so as to avoid the backflow of backflow gas from pouring back, thereby contaminating the pipeline and the gas source. Summary of the Utility Model

[0005] The following gives a brief overview of one or more aspects to provide a basic understanding of these aspects. This overview is not an exhaustive survey of all contemplated aspects, and is neither intended to identify key or decisive elements of all aspects nor to define the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description to follow.

[0006] In order to overcome the above-mentioned defects existing in the prior art, the utility model provides a backflow prevention structure for a shunt pipeline and a gas shunt system for preventing backflow in a unidirectional gas flow structure, so as to avoid the backflow of backflow gas from pouring back, thereby contaminating the pipeline and the gas source.

[0007] Specifically, the check structure provided by the first aspect of the present utility model includes: a rotating module, including a plurality of blades, wherein the inner ends of the blades are connected to a first rotating shaft to rotate forward under the drive of a forward air flow; and a limit and seal module, the first end of which is unidirectionally elastically installed on the housing of the check structure, and the second end of which extends towards the blades of the rotating module. Wherein, the second end of the limit and seal module undergoes unidirectional elastic deformation when touched by the outer ends of the blades rotating forward, and locks and seals the outer ends of the corresponding blades when the reverse air flow drives the blades to rotate reversely, so as to block the reverse air flow.

[0008] Further, in some embodiments of the present utility model, the check structure includes two of the limit and seal modules, which are respectively arranged on the first side of the housing of the check structure and the second side opposite thereto. The rotating module includes six blades, and the angle between each two blades is 60°.

[0009] Further, in some embodiments of the present utility model, reverse barbs are provided at the outer ends of the blades, and claw-shaped locking structures are provided at the second ends of the limit and seal modules.

[0010] Further, in some embodiments of the present utility model, a flexible sealing pad is provided on the first surface where the reverse barb contacts the claw-shaped locking structure and / or on the second surface where the claw-shaped locking structure contacts the reverse barb.

[0011] Further, in some embodiments of the present utility model, the first end of the first rotating shaft is connected to the first end seal plate of the module housing via a first rotating bearing, and the second end is connected to the second end seal plate of the module housing via a second rotating bearing. A first sealing ring is provided between the first end seal plate and the first end of the rotating module, and a second sealing ring is provided between the second end seal plate and the second end of the rotating module. The first end seal plate is fixedly connected to the first side of the main body of the module housing via a third sealing ring, and the second end seal plate is fixedly connected to the second side of the module housing opposite to the first side via a fourth sealing ring.

[0012] Further, in some embodiments of the present utility model, the first end seal plate and the second end seal plate are made of Q235A steel. The third sealing ring and the fourth sealing ring respectively include an inner layer structure and an outer layer structure. Wherein, the inner layer structure is made of FFKM material, and the outer layer structure is made of soluble polytetrafluoroethylene.

[0013] Further, in some embodiments of the present utility model, the check structure includes two of the limiting and sealing modules. Among them, the first end of the first limiting and sealing module is connected to the first inner surface of the module housing via the first limiting and sealing rotating shaft, and the first end of the second limiting and sealing module is connected to the second inner surface of the module housing opposite to the first inner surface via the second limiting and sealing rotating shaft. A fifth sealing ring is provided between the first limiting and sealing module and the first limiting and sealing rotating shaft, and a sixth sealing ring is provided between the second limiting and sealing module and the second limiting and sealing rotating shaft.

[0014] In addition, the gas diversion system provided by the second aspect of the present utility model includes: a gas box for storing and outputting various gases required for semiconductor processing; a pre-stage pipeline respectively connected to a plurality of gas supply ports of the gas box and at least one process chamber, and used for introducing at least one first gas required for the semiconductor processing into the process chamber and / or introducing at least one second gas not required for the semiconductor processing into an exhaust gas suction pipe for exhausting waste gas by means of pipeline switching; and a plurality of check structures as described in the first aspect of the present utility model provided between the pre-stage pipeline and each of the gas supply ports of the gas box, and used for forwardly transmitting at least one gas provided by the gas box to the pre-stage pipeline and blocking the reverse air flow flowing from the pre-stage pipeline to the gas box.

[0015] Further, in some embodiments of the present utility model, the gas diversion system further includes: a pressure switch located between the gas box and the pre-stage pipeline, and used for closing all valves when the pressure exceeds a preset threshold to prevent gas leakage; and a diaphragm valve located between the gas box and the pre-stage pipeline, and used for adjusting the gas flow rate and preventing the gas in the pipeline from flowing back.

[0016] Further, in some embodiments of the present utility model, the gas diversion system further includes: a leak detection interface located at the outlet of the gas box and used for connecting a leak detector to check for gas leakage; and a filter located at the outlet of the gas box and used for filtering contaminants in the reflux gas. Description of the Drawings

[0017] After reading the detailed description of the embodiments of the present disclosure in conjunction with the following drawings, the above features and advantages of the present utility model can be better understood. In the drawings, the components are not necessarily drawn to scale, and components having similar related characteristics or features may have the same or similar reference numerals.

[0018] Figures 1A to 1B The structural schematic diagram of the check structure of the diversion pipeline provided by some embodiments of the present utility model is shown.

[0019] Figure 2Shows an exploded schematic diagram of a check structure provided according to some embodiments of the present invention.

[0020] Figure 3 Shows a schematic structural diagram of a gas diversion system provided according to some embodiments of the present invention.

[0021] Figure 4A Shows a schematic connection diagram of a gas diversion system provided according to some embodiments of the present invention.

[0022] Figure 4B Shows a schematic diagram of the device structure of a gas diversion system provided according to some embodiments of the present invention.

[0023] Reference numerals:

[0024] 10 Check structure

[0025] 11 Housing

[0026] 111, 112 End sealing plates

[0027] 113 First sealing ring

[0028] 114 Second sealing ring

[0029] 115 Third sealing ring

[0030] 116 Fourth sealing ring

[0031] 12 Rotating module

[0032] 121 Blades

[0033] 1211 Reverse barbs

[0034] 122 First rotating shaft

[0035] 123, 124 Rotating bearings

[0036] 13 Limit sealing module

[0037] 131 Claw-shaped locking structure

[0038] 132 Fifth sealing ring

[0039] 133 Sixth sealing ring

[0040] 134, 135 Limit sealing rotating shafts

[0041] 20 Gas tank

[0042] 30 Front-stage pipeline

[0043] 40 Pressure switch

[0044] 50 Diaphragm Valve

[0045] 60 Leak Detection Interface

[0046] 70 Filter

[0047] 80 Check Valve Detailed Implementation Manner

[0048] The following specific embodiments illustrate the implementation manners of the present utility model. Those skilled in the art can easily understand other advantages and effects of the present utility model from the content disclosed in this specification. Although the description of the present utility model will be introduced in combination with preferred embodiments, this does not mean that the features of this utility model are limited to this implementation manner. On the contrary, the purpose of introducing the utility model in combination with the implementation manner is to cover other alternatives or modifications that may be extended based on the claims of the present utility model. In order to provide a deep understanding of the present utility model, many specific details will be included in the following description. The present utility model can also be implemented without using these details. In addition, in order to avoid confusing or obscuring the key points of the present utility model, some specific details will be omitted in the description.

[0049] In the description of the present utility model, it should be noted that unless otherwise clearly specified and defined, the terms "installation", "connection", and "coupling" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific situations.

[0050] In addition, the "upper", "lower", "left", "right", "top", "bottom", "horizontal", and "vertical" used in the following description should be understood as the orientations shown in this paragraph and the related drawings. This relative term is only for the convenience of description and does not represent that the device described needs to be manufactured or operated in a specific orientation. Therefore, it should not be construed as a limitation to the present utility model.

[0051] It can be understood that although the terms "first", "second", "third", etc. can be used here to describe various components, regions, layers, and / or parts, these components, regions, layers, and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers, and / or parts. Therefore, the first component, region, layer, and / or part discussed below can be called the second component, region, layer, and / or part without departing from some embodiments of the present utility model.

[0052] As described above, a PECVD (Plasma Enhanced Chemical Vapor Deposition) device is a device widely used in semiconductor manufacturing and other industrial applications. It activates chemical reactions through plasma to deposit thin films on the surface of substrate materials. In the application of PECVD devices, process gas splitting is usually required.

[0053] For example: During the PECVD process, different process steps may require different gas pressures and gas flow rates. Through splitting, the flow rate of each gas can be precisely controlled, thereby optimizing the thin film deposition process. Another example: The characteristics of the thin films deposited by PECVD (such as thickness, uniformity, refractive index, stress, etc.) are affected by various process parameters, including the ratio of process gases. By splitting different process gases, the gas composition ratio can be adjusted, thereby affecting the growth rate and final characteristics of the thin films. The forward flowing gas in the splitting pipeline flows from the high-pressure side of the gas box to the low-pressure side of the front-stage pipeline. However, if the air pump stops during the flowing gas process, it will cause the pressure distribution to reverse, posing a risk of reverse flow.

[0054] To overcome the above-mentioned defects existing in the prior art, the present utility model provides a reverse flow prevention structure for a splitting pipeline and a gas splitting system for preventing reverse flow in a one-way flowing gas structure to avoid the backflow of reverse flow gas from pouring back, thereby contaminating the pipeline and the gas source.

[0055] In some non-limiting embodiments, the reverse flow prevention structure 10 provided in the first aspect of the present utility model can be configured in the gas splitting system provided in the second aspect of the present utility model.

[0056] Specifically, please refer to Figures 1A to 1B , Figures 1A to 1B which shows a schematic structural diagram of the reverse flow prevention structure 10 for a splitting pipeline provided according to some embodiments of the present utility model.

[0057] As Figures 1A to 1B shown, the reverse flow prevention structure 10 includes a rotation module 12 and a limit and seal module 13. The rotation module 12 includes a plurality of blades 121. Among them, the inner ends of the blades 121 are connected to a first rotation shaft 122 to rotate forward under the drive of the forward air flow. The limit and seal module 13 is unidirectionally elastically installed at the first end on the housing 11 of the reverse flow prevention structure, and its second end extends towards the blades 121 of the rotation module 12. Among them, the second end of the limit and seal module 13 undergoes unidirectional elastic deformation when touched by the outer ends of the forwardly rotating blades 121, and locks and seals the outer ends of the corresponding blades 121 when the reverse air flow drives the blades 121 to rotate in the reverse direction, so as to block the reverse air flow.

[0058] Further, there may be two limiting and sealing modules 13, which are respectively arranged on the first side of the housing 11 of the check valve structure and the second side opposite thereto. The rotating module 12 includes six blades 121, and the angle between each two blades 121 is 60°. Here, the number of the blades 121 can also be adjusted according to specific anti-backflow requirements, and the anti-backflow ability increases with the increase in the number of the blades 121.

[0059] Further, a reverse barb 1211 is provided at the outer end of the blade 121, and a claw-shaped locking structure 131 is provided at the second end of the limiting and sealing module 13. A flexible sealing pad is provided on the first surface where the reverse barb 1211 contacts the claw-shaped locking structure 131 and / or on the second surface where the claw-shaped locking structure 131 contacts the reverse barb 1211.

[0060] Please refer to Figure 2 , Figure 2 which shows an exploded schematic view of the check valve structure 10 provided according to some embodiments of the present invention.

[0061] As Figure 2 shown, at the first end of the first rotating shaft 122 in the check valve structure 10, it is connected to the first end sealing plate 111 of the module housing 11 via the first rotating bearing 123, and its second end is connected to the second end sealing plate 112 of the module housing 11 via the second rotating bearing 124. Here, the materials of the first end sealing plate 111 and the second end sealing plate 112 can be Q235A steel, so that the surface roughness of the inner surface of the end sealing plate is 0.02 μm, thereby reducing the friction coefficient to ensure smooth rotation.

[0062] A first sealing ring 113 is provided between the first end sealing plate 111 and the first end of the rotating module 12, and a second sealing ring 114 is provided between the second end sealing plate 112 and the second end of the rotating module 12. Here, the shapes of the first sealing ring 113 and the second sealing ring 114 are adapted to the groove shapes on the side surfaces of the rotating module 12.

[0063] Accordingly, the first end sealing plate 111 is fixedly connected to the first side of the main body of the module housing 11 via the third sealing ring 115, and the second end sealing plate 112 is fixedly connected to the second side of the module housing 11 opposite to the first side via the fourth sealing ring 116. The third sealing ring 115 and the fourth sealing ring 116 respectively include an inner layer structure and an outer layer structure. Among them, the inner layer structure is made of FFKM material so that its inner layer structure has good elasticity, corrosion resistance and sealing performance. The outer layer structure is made of soluble polytetrafluoroethylene (Polyfluoroalkoxy, Teflon PFA, PFA), and its sliding friction coefficient against mirror steel material is less than 0.04, and the rolling friction coefficient of deep groove ball bearing is 0.0010 - 0.0015, which can effectively enhance the wear resistance and corrosion resistance of its outer layer structure, and at the same time reduce its friction coefficient, thereby effectively improving the mechanical properties of the sealing ring.

[0064] Further, in some embodiments, the check structure 10 includes two limit sealing modules 13. Among them, the first end of the first limit sealing module 13 is connected to the first inner surface of the module housing 11 via the first limit sealing rotating shaft 134, and the first end of the second limit sealing module 13 is connected to the second inner surface of the module housing 11 opposite to the first inner surface via the second limit sealing rotating shaft 135. A fifth sealing ring 132 is provided between the first limit sealing module 13 and the first limit sealing rotating shaft 134, and a sixth sealing ring 133 is provided between the second limit sealing module 13 and the second limit sealing rotating shaft 135.

[0065] Please refer to Figure 3 , Figure 3 which shows a schematic structural diagram of a gas splitting system provided according to some embodiments of the present invention.

[0066] As Figure 3 shown, the gas splitting system includes a gas box 20, a plurality of check structures 10 as described in the first aspect of the present invention, and a pre-stage pipeline 30.

[0067] The gas box 20 is used to store and output various gases required for semiconductor processing technology. The pre-stage pipeline 30 is respectively connected to a plurality of gas supply ports of the gas box 20 and at least one process chamber, and is used to introduce at least one first gas required for semiconductor processing technology into the process chamber and / or introduce at least one second gas not required for semiconductor processing technology into the exhaust gas extraction pipe through pipeline switching. The check structure 10 is arranged between the pre-stage pipeline 30 and each gas supply port of the gas box 20, and is used to forwardly transmit at least one gas provided by the gas box 20 to the pre-stage pipeline 30 and block the reverse air flow flowing from the pre-stage pipeline 30 to the gas box 20.

[0068] Further, the gas shunt system further includes a pressure switch 40 and a diaphragm valve 50. The pressure switch 40 is located between the gas tank 20 and the pre-stage pipeline 30 and is used to close all valves when the pressure exceeds a preset threshold to prevent gas leakage. In some embodiments, the pressure switch 40 can monitor the pressure and give a leak point alarm when it exceeds 550 torr, and at the same time close all valves to stop the gas supply to avoid gas leakage. The diaphragm valve 50 is located between the gas tank 20 and the pre-stage pipeline 30 and is used to adjust the gas flow rate and further prevent the gas in the pipeline from flowing back.

[0069] Those skilled in the art can understand that this is only a preferred embodiment of the gas shunt system and is not used to limit the entire structure of the gas shunt system. In some other embodiments, the check structure 10 of the gas shunt system can also be replaced by a one-way valve 80, which can be selected according to the actual situation of the gas shunt system to meet different shunt requirements.

[0070] Please refer to Figures 4A to 4B , Figure 4A which shows a schematic connection structure diagram of a gas shunt system provided according to some embodiments of the present invention. Figure 4B which shows a schematic device structure diagram of a gas shunt system provided according to some embodiments of the present invention.

[0071] As Figures 4A to 4B shown, in some other embodiments, the gas shunt system further includes a leak detection interface 60 and a filter 70. Since there is a minimum threshold of the opening pressure (for example: 2 bar) after adding the one-way valve 80, it may cause the pipeline in front of the valve to be unable to perform He inspection due to insufficient pressure. Therefore, a leak detector can be connected through a leak detection flange for He inspection. The leak detection interface 60 is located at the outlet of the gas tank 20 and is used to connect the leak detector to check for gas leakage.

[0072] Further, the filter 70 is located at the outlet of the gas tank 20 and is used to filter the pollutants in the reflux gas. Therefore, even when structures such as the one-way valve 80 and the diaphragm valve 50 fail or are insufficiently effective, the filter 70 can further control the pollution of the gas tank 20 by the pollutants in the reflux gas.

[0073] In summary, the present invention provides a check structure 10 for a shunt pipeline and a gas shunt system, which are used to prevent backflow of a unidirectional gas structure to avoid backflow gas from flowing back and polluting the pipeline and the gas source.

[0074] Although the foregoing methods are illustrated and described as a series of acts for simplicity of explanation, it should be understood and appreciated that the methods are not limited by the order of acts, as some acts may occur in different orders and / or concurrently with other acts not illustrated and described herein or other acts that are understandable to those skilled in the art, in accordance with one or more embodiments.

[0075] The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A check structure, characterized in that, Comprising: A rotating module, including a plurality of blades, wherein the inner ends of the blades are connected to a first rotating shaft to rotate forward under the drive of a forward air flow; and A limiting and sealing module, the first end of which is unidirectionally elastically mounted on the housing of the check structure, and the second end of which extends towards the blades of the rotating module, wherein the second end of the limiting and sealing module undergoes unidirectional elastic deformation when touched by the outer ends of the blades rotating forward, and locks and seals the outer ends of the corresponding blades when the reverse air flow drives the blades to rotate reversely, so as to block the reverse air flow.

2. The check structure according to claim 1, wherein Including two of the limiting and sealing modules, which are respectively arranged on the first side of the housing of the check structure and the second side opposite thereto, The rotating module includes six blades, and the angle between each two blades is 60°.

3. The check structure according to claim 1, characterized in that, Reverse barbs are provided at the outer ends of the blades, and claw-shaped locking structures are provided at the second ends of the limiting and sealing modules.

4. The check structure according to claim 3, characterized in that, Flexible sealing gaskets are provided on the first surface where the reverse barbs contact the claw-shaped locking structures and / or on the second surface where the claw-shaped locking structures contact the reverse barbs.

5. The check structure according to claim 1, wherein, The first end of the first rotating shaft is connected to the first end sealing plate of the module housing via a first rotating bearing, and the second end is connected to the second end sealing plate of the module housing via a second rotating bearing, A first sealing ring is provided between the first end sealing plate and the first end of the rotating module, a second sealing ring is provided between the second end sealing plate and the second end of the rotating module, the first end sealing plate is fixedly connected to the first side of the module housing main body via a third sealing ring, and the second end sealing plate is fixedly connected to the second side of the module housing opposite to the first side via a fourth sealing ring.

6. The check structure according to claim 5, characterized in that, The first end sealing plate and the second end sealing plate are made of Q235A steel, and the third sealing ring and the fourth sealing ring respectively include an inner layer structure and an outer layer structure, wherein the inner layer structure is made of FFKM material and the outer layer structure is made of soluble polytetrafluoroethylene.

7. The check structure according to claim 6, wherein, The check structure includes two of the limiting and sealing modules, wherein the first end of the first limiting and sealing module is connected to the first inner surface of the module housing via a first limiting and sealing rotating shaft, and the first end of the second limiting and sealing module is connected to the second inner surface of the module housing opposite to the first inner surface via a second limiting and sealing rotating shaft, A fifth sealing ring is provided between the first limiting and sealing module and the first limiting and sealing rotating shaft, and a sixth sealing ring is provided between the second limiting and sealing module and the second limiting and sealing rotating shaft.

8. A gas splitting system, characterized in that, Comprising: An air box for storing and outputting various gases required for semiconductor processing processes; A pre-stage pipeline, respectively connecting a plurality of gas supply ports of the air box and at least one process chamber, for introducing at least one first gas required for the semiconductor processing process into the process chamber and / or introducing at least one second gas not required for the semiconductor processing process into an exhaust gas suction pipe for discharging tail gas by means of pipeline switching; And A plurality of check structures as described in any one of claims 1 to 7 are provided between the pre-stage pipeline and each of the gas supply ports of the gas tank, for positively transmitting at least one gas provided by the gas tank to the pre-stage pipeline and blocking the reverse gas flow from the pre-stage pipeline to the gas tank.

9. The gas diversion system according to claim 8, characterized in that It further includes: A pressure switch, located between the gas tank and the pre-stage pipeline, for closing all valves when the pressure exceeds a preset threshold to prevent gas leakage; And A diaphragm valve, located between the gas tank and the pre-stage pipeline, for regulating the gas flow rate and preventing the gas in the pipeline from flowing back.

10. The gas splitting system according to claim 8, wherein It further includes: A leak detection interface, located at the outlet of the gas tank, for connecting a leak detector to check for gas leakage; And A filter, located at the outlet of the gas tank, for filtering contaminants in the reflux gas.

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