Hydrogen fluoride gasification impurity removal equipment

Abstract

The utility model relates to hydrogen fluoride gasification impurity removal equipment, the impurity removal equipment comprises an impurity removal box, a gas inlet pipe, a gas outlet pipe and a return pipe, the impurity removal box is in the shape of a cuboid sealed shell, the gas inlet pipe and the gas outlet pipe are respectively communicated to the lower parts of two ends of the impurity removal box, and the sections, communicated to the impurity removal box, of the gas inlet pipe and the gas outlet pipe are L-shaped; the backflow pipe is obliquely arranged, the upper end of the backflow pipe is communicated to the upper portion of the vertical section of the air outlet pipe, the lower portion of the backflow pipe is communicated to the top face of the impurity removal box, the impurity removal box is filled with reaction liquid, and the liquid level of the reaction liquid is higher than the communicating position of the air inlet pipe and the impurity removal box and the communicating position of the air outlet pipe and the impurity removal box. The utility model aims to solve or at least alleviate the problems of low purification efficiency and low reaction liquid utilization rate of the existing hydrogen fluoride impurity removal equipment, and provides hydrogen fluoride gasification impurity removal equipment.

Description

Technical Field

[0001] The utility model belongs to the technical field of hydrogen fluoride production, and particularly relates to a hydrogen fluoride gasification and impurity removal device. Background Art

[0002] Hydrogen fluoride (HF) is the basis of modern fluorochemical industry and is the most basic raw material for preparing elemental fluorine, various fluorine refrigerants, fluorine-containing new materials, inorganic fluoride salts, various organic fluorides, etc. In recent years, fluorochemical industry in China has developed rapidly. At present, the annual production capacity of hydrogen fluoride in China reaches more than 2 million tons, and most of them are produced by the fluorite method. The fluorite method is to react fluorite with sulfuric acid to prepare hydrogen fluoride gas. The raw material hydrogen fluoride gas prepared by the fluorite method contains SO4 2- , PO4 3- , H2O, SO2, As 3+ and other impurities.

[0003] Most of the heating processes in the hydrogen fluoride production process are in the gaseous state. In the prior art, gaseous hydrogen fluoride mostly removes impurities by spraying reaction liquid, with relatively low purification efficiency. At the same time, the utilization rate of the reaction liquid used for purification is not high, resulting in waste of resources. Summary of the Utility Model

[0004] The purpose of the utility model is to overcome the deficiencies in the prior art, solve or at least alleviate the problems of relatively low purification efficiency of the current hydrogen fluoride impurity removal device and low utilization rate of the reaction liquid, and provide a hydrogen fluoride gasification and impurity removal device.

[0005] The utility model is realized by the following technical solutions:

[0006] A hydrogen fluoride gasification and impurity removal device, the impurity removal device includes an impurity removal box, an inlet pipe, an outlet pipe and a return pipe. The impurity removal box is in the shape of a cuboid sealed shell. The inlet pipe and the outlet pipe are respectively connected to the lower parts of both ends of the impurity removal box;

[0007] The sections of the inlet pipe and the outlet pipe connected to the impurity removal box are both L-shaped. The return pipe is inclined. The upper end of the return pipe is connected to the upper part of the vertical section of the outlet pipe, and the lower end is connected to the top surface of the impurity removal box;

[0008] The impurity removal box is filled with a reaction liquid, and the liquid level height of the reaction liquid is higher than the connection positions of the inlet pipe and the outlet pipe with the impurity removal box.

[0009] In order to further realize the utility model, the following technical solutions can be preferably selected:

[0010] Preferably, the impurity removal device further includes a drain plate, which is fixedly arranged in the impurity removal box. The longitudinal section of the drain plate is in a W shape. The upper pointed part in the middle of the drain plate is correspondingly arranged below the connection between the return pipe and the impurity removal box, and a plurality of through holes are arranged in an array along the length direction at the lower pointed parts of the drain plate.

[0011] Preferably, a one-way conduction component is arranged in the return pipe, and the conduction direction of the one-way conduction component is from the air outlet pipe to the impurity removal box.

[0012] Preferably, the one-way conduction component includes a positioning plate, a diversion pipe, and a sealing plate arranged in sequence from top to bottom. A hollow area is arranged on the positioning plate. The diversion pipe is in a frustum-shaped tubular shape with a larger upper part and a smaller lower part. A spring is arranged between the sealing plate and the positioning plate, and the upper and lower ends of the spring are respectively fixedly connected to the positioning plate and the sealing plate.

[0013] Preferably, an axial flow fan is arranged on the air outlet pipe, and the axial flow fan is located above the connection between the return pipe and the air outlet pipe.

[0014] By the above technical solution, the beneficial effects of the present utility model are as follows:

[0015] In the present utility model, a reaction liquid is poured into the impurity removal box, and hydrogen fluoride gas is directly introduced into the reaction liquid and then enters the impurity removal box. The hydrogen fluoride gas entering the impurity removal box squeezes the reaction liquid out of the air outlet pipe. When the reaction liquid flows to the return pipe, the reaction liquid flows back to the impurity removal box and sprays the hydrogen fluoride gas in the impurity removal box, while the hydrogen fluoride gas in the air outlet pipe is discharged upward from the air outlet pipe. The hydrogen fluoride gas passes through the reaction liquid multiple times, improving the purification efficiency. At the same time, the reaction liquid is recycled, which also improves the utilization rate of the reaction liquid. Description of the Drawings

[0016] Figure 1 is a structural sectional view of the present utility model;

[0017] Figure 2 is a structural schematic diagram of the present utility model;

[0018] Figure 3 is of the present utility model Figure 1 sectional view at A-A;

[0019] Figure 4 is of the present utility model Figure 1 magnified view at B;

[0020] Among them: 1-impurity removal box; 2-air inlet pipe; 3-air outlet pipe; 4-return pipe; 5-drain plate; 6-positioning plate; 7-diversion pipe; 8-sealing plate; 9-axial flow fan. Detailed Embodiments

[0021] In the description of the present utility model, it should also be noted that, unless otherwise clearly specified and defined, the terms "arranged", "installed", "connected", and "coupled" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0022] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments in the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0023] Embodiment 1:

[0024] As Figures 1-4 shown, a hydrogen fluoride gasification and impurity removal device, the impurity removal device includes an impurity removal box 1, an inlet pipe 2, an outlet pipe 3, and a return pipe 4. The impurity removal box 1 is in the shape of a cuboid sealed housing. The inlet pipe 2 and the outlet pipe 3 are respectively communicated to the lower parts of both ends of the impurity removal box 1;

[0025] The sections of the inlet pipe 2 and the outlet pipe 3 communicated with the impurity removal box 1 are both in an L shape. The return pipe 4 is inclined. The upper end of the return pipe 4 is communicated to the upper part of the vertical section of the outlet pipe 3, and the lower end is communicated to the top surface of the impurity removal box 1;

[0026] The impurity removal box 1 is filled with a reaction liquid, and the liquid level height position of the reaction liquid is higher than the communication positions of the inlet pipe 2 and the outlet pipe 3 with the impurity removal box 1.

[0027] In the present utility model, a reaction liquid is filled in the impurity removal box 1. Hydrogen fluoride gas is directly introduced into the reaction liquid and then enters the impurity removal box 1. The hydrogen fluoride gas entering the impurity removal box 1 squeezes the reaction liquid out of the outlet pipe 3. When the reaction liquid flows to the return pipe 4, the reaction liquid flows back to the impurity removal box 1 and sprays the hydrogen fluoride gas in the impurity removal box 1, and the hydrogen fluoride gas in the outlet pipe 3 is discharged upward from the outlet pipe 3. The hydrogen fluoride gas passes through the reaction liquid multiple times, improving the purification efficiency. At the same time, the reaction liquid is recycled, which also improves the utilization rate of the reaction liquid.

[0028] To improve the spraying effect and further enhance the purification efficiency, the impurity removal device further includes a drenching plate 5. The drenching plate 5 is fixedly arranged inside the impurity removal tank 1. The longitudinal section of the drenching plate 5 is in a W shape. The upper pointed part in the middle of the drenching plate 5 is correspondingly arranged below the connection between the reflux pipe 4 and the impurity removal tank 1. A plurality of through holes are arranged in an array along the length direction at the lower pointed parts of the drenching plate 5.

[0029] To prevent hydrogen fluoride gas in the impurity removal tank 1 from entering the air outlet pipe 3 through the reflux pipe 4, a one-way conduction component is arranged inside the reflux pipe 4. The conduction direction of the one-way conduction component is from the air outlet pipe 3 to the impurity removal tank 1.

[0030] To optimize the product structure, in this embodiment, the one-way conduction component includes a positioning plate 6, a diversion pipe 7, and a sealing plate 8 arranged in sequence from top to bottom. The positioning plate 6 is provided with a hollowed-out area. The diversion pipe 7 is in the shape of a frustum-shaped tube with a larger upper part and a smaller lower part. A spring is arranged between the sealing plate 8 and the positioning plate 6. The upper and lower ends of the spring are respectively fixedly connected to the positioning plate 6 and the sealing plate 8.

[0031] The spring makes the sealing plate 8 abut against the lower end of the diversion pipe 7 to prevent hydrogen fluoride gas in the impurity removal tank 1 from passing through the diversion pipe 7. When there is reaction liquid in the reflux pipe 4, the weight of the reaction liquid overcomes the pulling force of the spring and drives the sealing plate 8 to move downward, enabling the reaction liquid to flow back into the impurity removal tank 1.

[0032] To prevent excessive pressure in the impurity removal tank 1 from causing the reaction liquid to be unable to flow back into the impurity removal tank 1, an axial flow fan 9 is arranged on the air outlet pipe 3. The axial flow fan 9 is located above the connection between the reflux pipe 4 and the air outlet pipe 3.

[0033] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A hydrogen fluoride gasification and impurity removal device, characterized in that The impurity removal device includes an impurity removal box (1), an air inlet pipe (2), an air outlet pipe (3) and a return pipe (4). The impurity removal box (1) is in the shape of a cuboid sealed housing. The air inlet pipe (2) and the air outlet pipe (3) are respectively connected to the lower parts of both ends of the impurity removal box (1). The sections of the air inlet pipe (2) and the air outlet pipe (3) connected to the impurity removal box (1) are both L-shaped. The return pipe (4) is inclined. The upper end of the return pipe (4) is connected to the upper part of the vertical section of the air outlet pipe (3), and the lower end is connected to the top surface of the impurity removal box (1). The impurity removal box (1) is filled with a reaction liquid, and the liquid level of the reaction liquid is higher than the connection positions of the air inlet pipe (2) and the air outlet pipe (3) with the impurity removal box (1).

2. The hydrogen fluoride gasification and impurity removal device according to claim 1, characterized in that, The impurity removal device further includes a shower plate (5). The shower plate (5) is fixedly arranged in the impurity removal box (1). The longitudinal section of the shower plate (5) is in the shape of a W. The upper pointed part in the middle of the shower plate (5) is correspondingly arranged below the connection position of the return pipe (4) and the impurity removal box (1). A plurality of through holes are arranged in an array along the length direction at the lower pointed parts of the shower plate (5).

3. The hydrogen fluoride gasification and impurity removal device according to claim 1, characterized in that, A one-way conduction component is arranged in the return pipe (4), and the conduction direction of the one-way conduction component is from the air outlet pipe (3) to the impurity removal box (1).

4. The hydrogen fluoride gasification and impurity removal device according to claim 3, characterized in that, The one-way conduction component includes a positioning plate (6), a diversion pipe (7) and a sealing plate (8) arranged in sequence from top to bottom. A hollow area is arranged on the positioning plate (6). The diversion pipe (7) is in the shape of a frustum of a cone tube with a large upper part and a small lower part. A spring is arranged between the sealing plate (8) and the positioning plate (6), and the upper and lower ends of the spring are respectively fixedly connected to the positioning plate (6) and the sealing plate (8).

5. The hydrogen fluoride gasification and impurity removal device according to claim 1, wherein, An axial flow fan (9) is arranged on the air outlet pipe (3), and the axial flow fan (9) is located above the connection position of the return pipe (4) and the air outlet pipe (3).

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