High-stability antireflection cover plate structure

Abstract

The utility model discloses a high-stability antireflection cover plate structure, which comprises a glass substrate, the antireflection film is arranged on the surface of one side of the glass substrate and is formed by alternately arranging a plurality of high-refractive-index films and a plurality of low-refractive-index films, and the low-refractive-index films are yttrium oxide films; and the water vapor barrier film is arranged on the surface of one side, far away from the glass substrate, of the antireflection film. The anti-reflection cover plate structure can improve the chemical stability of the anti-reflection film made of yttrium oxide.

Description

Technical Field

[0001] The utility model relates to the technology of optical cover plates, in particular to an anti-reflection cover plate structure with high stability. Background Art

[0002] The existing high-transparency glass cover plates are formed by making an anti-reflection film on the surface of a glass substrate. By using the optical interference effect of the anti-reflection film, the light reflectivity is reduced, and they are widely used in smart devices such as mobile phones, tablets, and computers, as well as vehicle-mounted devices such as vehicle-mounted instruments and vehicle-mounted displays.

[0003] The anti-reflection film is formed by alternately arranging multiple layers of high-refractive-index thin films and multiple layers of low-refractive-index thin films. When light passes through the interface between the high-refractive-index thin film and the low-refractive-index thin film, reflected light will be generated due to the sudden change in refractive index. By reasonably designing the thickness of each layer of the high-refractive-index thin film and the low-refractive-index thin film, the optical path difference between two adjacent reflected light beams is equal to 1 / 4 of the wavelength of the light, and an optical interference phenomenon can be generated to cancel each other out, thereby weakening the reflection of light.

[0004] Yttrium oxide can be used as the low-refractive-index thin film of the anti-reflection film. However, yttrium oxide is prone to absorb moisture and carbon dioxide in the environment, and then deteriorate, with poor chemical stability and a high product complaint rate. Summary of the Utility Model

[0005] In order to solve the above deficiencies of the prior art, the utility model provides an anti-reflection cover plate structure, which can improve the chemical stability of the anti-reflection film made of yttrium oxide.

[0006] The technical problems to be solved by the utility model are realized through the following technical solutions:

[0007] An anti-reflection cover plate structure with high stability, comprising:

[0008] A glass substrate;

[0009] An anti-reflection film, arranged on one side surface of the glass substrate, and formed by alternately arranging multiple layers of high-refractive-index thin films and multiple layers of low-refractive-index thin films, wherein the low-refractive-index thin film is a yttrium oxide thin film;

[0010] A water vapor barrier film, arranged on the side surface of the anti-reflection film away from the glass substrate.

[0011] Further, the side of the anti-reflection film close to the water vapor barrier film is the low-refractive-index thin film.

[0012] Further, the thickness of each layer of the low-refractive-index thin film is 60-100nm.

[0013] Further, the thickness of each layer of the high-refractive-index thin film is 80-150nm.

[0014] Further, the high refractive index thin film is a titanium dioxide thin film, a tantalum pentoxide thin film or a niobium oxide thin film.

[0015] Further, the water vapor barrier film is an aluminum oxide thin film or a silicon oxide thin film.

[0016] Further, the thickness of the water vapor barrier film is 10 - 30 nm.

[0017] Further, the anti-reflection cover plate structure further includes a transition medium film, and the transition medium film is disposed between the glass substrate and the anti-reflection film.

[0018] Further, the transition medium film is a silicon dioxide thin film.

[0019] Further, the thickness of the transition medium film is 50 - 100 nm.

[0020] The present utility model has the following beneficial effects: The anti-reflection cover plate structure of the present utility model uses the anti-reflection film to reduce the light reflectivity of the cover plate surface, and at the same time uses the water vapor barrier film to cover the surface of the anti-reflection film to block moisture and carbon dioxide in the environment, and avoid the yttrium oxide thin film, which is used as the low refractive index thin film in the anti-reflection film, from contacting moisture and carbon dioxide in the environment and deteriorating, thereby improving the chemical stability of the anti-reflection film. Description of the Drawings

[0021] Figure 1 It is a schematic diagram of the stacked structure of the anti-reflection cover plate structure provided by the present utility model.

[0022] Figure 2 It is a schematic diagram of the stacked structure of the anti-reflection film in the anti-reflection cover plate structure provided by the present utility model.

[0023] Figure 3 It is a schematic diagram of the stacked structure of the anti-reflection cover plate structure provided by the present utility model. Detailed Embodiments

[0024] The present utility model will be described in detail below with reference to the drawings and embodiments. The examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions from beginning to end. The embodiments described below by referring to the drawings are exemplary and are intended to explain the present utility model, and should not be construed as a limitation to the present utility model.

[0025] In the description of the present utility model, it should be understood that the orientation or positional relationship indicated by terms such as "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present utility model.

[0026] In addition, the terms "first", "second", "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second", "third" may explicitly or implicitly include one or more of such features. In the description of the present utility model, the meaning of "a plurality" is two or more unless otherwise specifically defined.

[0027] In the present utility model, unless otherwise clearly specified and defined, terms such as "installation", "connection", "connection", "fixation", "setting", etc. should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and may also be the communication inside two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0028] Embodiment 1

[0029] A high-stability antireflection cover plate structure, comprising:

[0030] A glass substrate 10;

[0031] An antireflection film 20, disposed on one side surface of the glass substrate 10, formed by alternately arranging a plurality of high-refractive-index thin films 21 and a plurality of low-refractive-index thin films 22, wherein the low-refractive-index thin film 22 is a yttrium oxide thin film;

[0032] A moisture barrier film 30, disposed on the side surface of the antireflection film 20 away from the glass substrate 10.

[0033] The antireflection cover plate structure of the present utility model uses the antireflection film 20 to reduce the light reflectivity of the cover plate surface. At the same time, the water vapor barrier film 30 is used to cover the surface of the antireflection film 20 to block moisture and carbon dioxide in the environment, and prevent the yttrium oxide film, which is the low refractive index film 22 in the antireflection film 20, from contacting moisture and carbon dioxide in the environment and deteriorating, thereby improving the chemical stability of the antireflection film 20.

[0034] The water vapor barrier film 30 can be, but is not limited to, an aluminum oxide film or a silicon oxide film, and is formed on the surface of the antireflection film 20 by physical vapor deposition or chemical vapor deposition.

[0035] Both the aluminum oxide film and the silicon oxide film have a crystal structure. Among them, the aluminum atoms and oxygen atoms in the aluminum oxide film are tightly bonded together by covalent bonds to form a hexagonal crystal structure. This structure has the characteristics of close packing, making the crystal structure of aluminum oxide very hard and dense, and the arrangement of atoms is tight without voids or holes.

[0036] The silicon atoms and oxygen atoms in the silicon oxide film are tightly bonded together by covalent bonds to form a crystal structure of a silicon-oxygen tetrahedron chain or a hexahedron ring. This structure is very strong and dense, and can effectively resist the entry of water vapor into the voids in the silicon oxide structure.

[0037] In this embodiment, the thickness of the water vapor barrier film 30 is 10 - 30 nm. Of course, the specific thickness of the water vapor barrier film 30 can be adjusted according to the water vapor barrier requirements of the product and the water vapor barrier performance of its own material, and the foregoing range should not be used as a limitation.

[0038] Preferably, the high refractive index film 21 can be, but is not limited to, a titanium dioxide film, a tantalum pentoxide film or a niobium oxide film.

[0039] Among them, on the side of the antireflection film 20 close to the water vapor barrier film 30, it can be either the high refractive index film 21 or the low refractive index film 22, but preferably the low refractive index film 22.

[0040] The antireflection film 20 reduces the light reflectivity of the cover plate surface based on the light interference effect. When light passes through the interface between the high refractive index film 21 and the low refractive index film 22, reflected light will be generated due to the sudden change in refractive index. By reasonably designing the thicknesses of each layer of the high refractive index film 21 and the low refractive index film 22, so that the optical path difference between two adjacent reflected light beams is equal to 1 / 4 wavelength of the light, an optical interference phenomenon can be generated and cancel each other out, thereby weakening the reflection of light.

[0041] In this embodiment, there are three layers each of the high refractive index thin film 21 and the low refractive index thin film 22, which are respectively the first high refractive index thin film 211, the first low refractive index thin film 221, the second high refractive index thin film 212, the second low refractive index thin film 222, the third high refractive index thin film 213, and the third low refractive index thin film 223 sequentially arranged on the glass substrate 10.

[0042] The thickness of each layer of the low refractive index thin film 22 is 60 - 100 nm, and the thickness of each layer of the high refractive index thin film 21 is 80 - 150 nm.

[0043] Embodiment Two

[0044] As an optimized solution of Embodiment One, in this embodiment, the antireflection cover plate structure further includes a transition medium film 40, and the transition medium film 40 is arranged between the glass substrate 10 and the antireflection film 20.

[0045] The antireflection cover plate structure of the present utility model arranges the transition medium film 40 between the glass substrate 10 and the antireflection film 20 to utilize the good adhesion of the transition medium film 40 to improve the adhesion of the antireflection film 20 on the glass substrate 10, thereby improving the stability and durability of the cover plate.

[0046] The bonding force between the transition medium film 40 and the glass substrate 10, as well as the bonding force between the transition medium film 40 and the antireflection film 20, should be greater than the bonding force between the glass substrate 10 and the antireflection film 20.

[0047] Preferably, the transition medium film 40 can be but is not limited to a silicon dioxide thin film. As an inorganic non-metallic oxide, the silicon dioxide thin film has good bonding ability with both the glass substrate 10 and the antireflection film 20.

[0048] In this embodiment, the thickness of the transition medium film 40 is 50 - 100 nm. Of course, the specific thickness of the transition medium film 40 can be determined according to the adhesion requirements of the product and the adhesion performance of the transition medium material, and should not be limited to the above range.

[0049] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the embodiments of the present utility model and are not intended to limit them. Although the embodiments of the present utility model have been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the embodiments of the present utility model can still be modified or equivalently replaced, and these modifications or equivalent replacements cannot make the modified technical solutions deviate from the scope of the technical solutions of the embodiments of the present utility model.

Claims

1. An antireflection cover plate structure with high stability, characterized in that, Comprising: A glass substrate; An antireflection film, disposed on one surface of the glass substrate, formed by alternately arranging multiple layers of high refractive index films and multiple layers of low refractive index films, wherein the low refractive index film is a yttrium oxide film; A water vapor barrier film, disposed on the surface of the antireflection film away from the glass substrate.

2. The anti-reflection cover plate structure according to claim 1, wherein The side of the antireflection film close to the water vapor barrier film is the low refractive index film.

3. The antireflection cover plate structure according to claim 1, characterized in that, The thickness of each layer of the low refractive index film is 60 - 100 nm.

4. The antireflection cover plate structure according to claim 1, wherein The thickness of each layer of the high refractive index film is 80 - 150 nm.

5. The antireflection cover plate structure according to claim 1, wherein The high refractive index film is a titanium dioxide film, a tantalum pentoxide film or a niobium oxide film.

6. The antireflection cover plate structure according to claim 1, wherein, The water vapor barrier film is an aluminum oxide film or a silicon oxide film.

7. The antireflection cover plate structure according to claim 1 or 6, characterized in that The thickness of the water vapor barrier film is 10 - 30 nm.

8. The antireflection cover plate structure according to claim 1, characterized in that, The antireflection cover structure further includes a transition dielectric film, and the transition dielectric film is disposed between the glass substrate and the antireflection film.

9. The antireflection cover plate structure according to claim 8, wherein, The transition dielectric film is a silicon dioxide film.

10. The antireflection cover plate structure according to claim 8 or 9, characterized in that, The thickness of the transition dielectric film is 50 - 100 nm.

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