Wafer character automatic identification work station

Abstract

The utility model discloses a wafer character automatic identification work station comprising four supporting parts which are distributed at the upper end of a bottom plate along the circumferential direction; the bearing ring is connected to the supporting part in a rotating mode; a column track; the support arm track is horizontally arranged on the stand column track; the camera module is connected to the support arm track in a sliding manner; three stop blocks and three guide blocks are arranged at the upper end of the bearing ring; the stop blocks and the guide blocks are arranged at intervals; and a guide inclined surface is arranged on one side of the guide block. Characters of the wafer can be read, and the type of the wafer can be judged through a spectrograph; a main body structure and a movement mechanism are simplified, the use condition and the operation difficulty are reduced, and meanwhile, the work station is convenient to move and place; the wafer can be conveniently and stably placed on the supporting ring; and wafers with different sizes can be compatible by replacing bearing rings with different models.

Description

Technical Field

[0001] The utility model belongs to the technical field of detection equipment, and particularly relates to a wafer character automatic recognition workstation. Background Art

[0002] The characters on the wafer mainly contain product information such as model number, batch number, etc. These information are crucial for subsequent semiconductor manufacturing, quality control, and product traceability. By identifying these characters, it can ensure the correct processing and tracking of each wafer during the manufacturing process, thereby avoiding confusion and errors. The characters on the wafer are usually special double-density dot matrix fonts, which are different from traditional printed fonts, making it difficult for traditional character recognition methods to stably and accurately identify these characters.

[0003] The Chinese patent document with the publication number CN114975185A discloses a wafer planar position correction and character recognition device, including an identification mechanism for planar correction of the wafer, a detection sensor for identifying the position of the wafer notch, and a detection camera for reading the character information of the wafer; the detection sensor and the detection camera are arranged in parallel, the identification mechanism is arranged on the left side of the detection sensor, and the rotating shaft on the identification mechanism drives the wafer to rotate and stop within the sensing range of the detection sensor, and the detection camera arranged on one side of the detection sensor detects and reads the information of the wafer characters after stopping; the eccentric position search and character information reading of the wafer can be realized under the wafer alignment platform module, reducing costs; the wafer position correction compensation can be realized under the wafer alignment platform module; it has good beneficial effects.

[0004] In the above patent solution, independent motion mechanisms are respectively arranged for the processes of wafer loading and unloading, adsorption and fixation, rotation and recognition, and position adjustment for wafer compatibility. In addition to high costs, difficult operation and control, the overall volume and weight are also relatively large, making it inconvenient to move. However, in the production link of wafers and the test link in the laboratory, character recognition operations are often carried out on small batches or individual wafers. When applying the above technical solution, the usage scenarios and conditions are relatively harsh. Summary of the Utility Model

[0005] In order to overcome the technical problems in the prior art that the wafer character recognition device often has a relatively large volume and weight, high operation and control difficulty, and is not convenient for character recognition of small batches or individual wafers; an object of the present utility model is to provide a wafer character automatic recognition workstation. By setting a manually driven rotating support ring at the upper end of the bottom plate, the wafer can be stably placed in the middle of the support ring without adsorption. At the same time, a sliding camera module for character recognition is arranged at the upper end of the support ring, streamlining the motion mechanism and reducing the overall volume and weight.

[0006] To achieve the above object, the present utility model adopts the following technical solutions: A wafer character automatic recognition workstation, comprising a support part, there are four of the support parts, and they are evenly distributed along the circumferential direction at the upper end of the bottom plate; a supporting ring, the supporting ring is rotatably connected to the four support parts, and the wafer is horizontally placed on the supporting ring; a column track, the column track is vertically arranged at the upper end of the bottom plate; a boom track, the boom track is horizontally arranged on one side of the column track facing the supporting ring; a camera module, the camera module is horizontally slidably connected to the boom track, and the sliding direction of the camera module is arranged along the diameter direction of the supporting ring; wherein, three stoppers and three guiding blocks are arranged at the upper end of the supporting ring; the stoppers and the guiding blocks are respectively evenly distributed along the same circumferential direction of the supporting ring, and the stoppers and the guiding blocks are arranged at intervals; a guiding inclined surface is arranged on one side of the guiding block facing the middle of the supporting ring; the wafer placed on the supporting ring abuts against the guiding inclined surface and the stopper.

[0007] Only need to place the wafer on the supporting ring, the lower end of the wafer abuts against the guiding inclined surface, the outer periphery of the wafer abuts against the stopper, and the wafer is coaxial with the supporting ring. The placement is simple and the operation is convenient. At the same time, the placement position of the wafer is stable, which is convenient for the camera module to read the characters on the wafer. The whole does not set a power mechanism, the manufacturing cost and the control operation difficulty are low, the volume and weight are small, and the requirements for the use scenario and conditions are low.

[0008] Further, the support part includes a pillar, the pillar is arranged at the upper end of the bottom plate; an axial bearing, the axial bearing is rotatably connected to the upper end of the pillar, and its rotation axis is arranged longitudinally; a radial bearing, the radial bearing is rotatably connected to the side wall of the pillar, and its rotation axis is arranged along the diameter direction of the supporting ring; wherein, the outer periphery of the axial bearing is used to abut against the outer periphery of the supporting ring; the radial bearing is used to abut against the lower end of the supporting ring.

[0009] While the axial bearing and the radial bearing provide positioning for the supporting ring, they also provide a smooth rotation guiding ability for it. The smooth rotation of the supporting ring can reduce the vibration on the wafer and improve the reading efficiency of the camera module for the characters.

[0010] Preferably, one end of the stopper facing the middle of the supporting ring and one end of the guiding block facing the middle of the supporting ring are respectively located inside the supporting ring; there is a gap between the inner wall of the supporting ring and the outer wall of the wafer; the gap is convenient for the clamping device to move the wafer.

[0011] Specifically, the supporting ring is detachably connected to the supporting part; the supporting ring has multiple models; the circumferential diameters of the distribution of the stoppers and the guiding blocks on each model of the supporting ring are different; by replacing the supporting ring and placing wafers with different diameters on the corresponding supporting ring for character recognition, the compatibility of the workstation is increased.

[0012] Further, a U-shaped frame is arranged on the column track; the wafer placed on the supporting ring is located inside the U-shaped frame; spectrometer probes are respectively arranged above and below the wafer inside the U-shaped frame.

[0013] The light emission band of the spectrometer probe is 200 - 800 nm, and the light transmittance of wafers of each material is different in these bands, which is used to determine the model of the wafer.

[0014] Specifically, two first clamping plates are detachably connected to the column track; a first threaded column is arranged between the two first clamping plates; the U-shaped frame is arranged on one of the first clamping plates; the first clamping plate can be selectively clamped and fixed on the column track.

[0015] Further, a slider is slidably connected to the arm track; a locking knob is threadedly connected to the slider; the locking knob can be selectively abutted against the arm track; the camera module is arranged on the slider.

[0016] Further, a fine adjustment module is arranged between the arm track and the column track; a fine adjustment knob is arranged on the fine adjustment module; the fine adjustment module is used to adjust the height of the camera module.

[0017] Optionally, one side of the lower end of the column track is rotatably connected to the bottom plate, and a bolt hole is arranged on the other side; the rotation axis of the column track is arranged along the length direction of the arm track; the column track can be rotated to achieve the purpose of folding, further reducing the volume occupied by the workstation and facilitating movement.

[0018] Preferably, a fill light is arranged below the supporting ring at the upper end of the bottom plate.

[0019] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0020] 1. A rotatable supporting ring is arranged at the upper end of the bottom plate, and at the same time, a camera module and a spectrometer probe that can be manually adjusted in position are arranged above the bottom plate, which can read the characters of the wafer and can also judge the model of the wafer through the spectrometer;

[0021] 2. The main structure and the motion mechanism are streamlined, the volume and mass of the workstation are reduced, the use conditions and the operation difficulty are reduced, and at the same time, it is also convenient to move and place the workstation.

[0022] 3. The wafer can be conveniently and stably placed on the carrier ring without the need to set up an adsorption and driving mechanism. The picking and placing of the wafer is simple, which helps to increase the detection efficiency of the wafer. At the same time, different sizes of wafers can be compatible by replacing carrier rings of different models without modifying the workstation, thus increasing the compatibility. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 is a schematic structural view of the present utility model;

[0024] Figure 2 , Figure 3 is a schematic structural view of the column track and the arm track of the present utility model;

[0025] Figure 4 is a schematic structural view of the carrier ring of the present utility model;

[0026] Figure 5 is a schematic structural view of the support part of the present utility model.

[0027] In the figure: 1, bottom plate; 2, column track; 3, support part; 31, pillar; 32, radial bearing; 33, axial bearing; 41, carrier ring; 42, stop block; 43, guide block; 431, guide inclined surface; 5, wafer; 61, arm track; 62, slider; 63, locking knob; 64, L-shaped plate; 65, camera module; 71, U-shaped frame; 72, first clamping plate; 81, fine adjustment module; 82, second clamping plate; 83, fine adjustment knob. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0028] Next, in combination with the drawings and specific embodiments, the present utility model will be further described. It should be noted that, on the premise of no conflict, the following-described embodiments or technical features can be arbitrarily combined to form new embodiments.

[0029] In the description of the present utility model, it should be noted that for orientation terms, if there are terms such as "center", "horizontal", "vertical", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicating the orientation and position relationship is based on the orientation or position relationship shown in the drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and cannot be understood as limiting the specific protection scope of the present utility model.

[0030] In addition, terms such as "first" and "second" are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of such features. In the description of the present utility model, the meaning of "several" is two or more, unless otherwise specifically defined.

[0031] In the present utility model, unless otherwise clearly specified and defined, terms such as "arranged" and "installed" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may also be a mechanical connection; it may be directly connected or connected through an intermediate medium, and it may be internally connected and communicated between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0032] See Figures 1 - 5 , a wafer character automatic recognition workstation, including a bottom plate 1; a support part 3, there are four of the support parts 3, and they are respectively evenly distributed along the circumferential direction at the upper end of the bottom plate 1; a supporting ring 41, the supporting ring 41 is rotatably connected to the four support parts 3, and the wafer is horizontally placed on the supporting ring 41; a column track 2, the column track 2 is vertically arranged on one side of the upper end of the bottom plate 1; a boom track 61, the boom track 61 is horizontally arranged on the side of the column track 2 facing the supporting ring 41.

[0033] Three stoppers 42 and three guide blocks 43 are arranged at the upper end of the supporting ring 41; the stoppers 42 and the guide blocks 43 are respectively evenly distributed along the same circumferential direction of the supporting ring 41, and the stoppers 42 and the guide blocks 43 are arranged at intervals; a guide inclined surface 431 is arranged on the side of the guide block 43 facing the middle of the supporting ring 41; the wafer placed on the supporting ring 41 abuts against the guide inclined surface 431 and the stopper 42.

[0034] One end of the stopper 42 facing the middle of the supporting ring 41 and one end of the guide block 43 facing the middle of the supporting ring 41 are respectively located inside the supporting ring 41; there is a gap between the inner wall of the supporting ring 41 and the outer wall of the wafer; the supporting ring 41 is detachably connected to the support part 3; the supporting ring 41 has multiple models; the circumferential diameters of the distribution of the stoppers 42 and the guide blocks 43 on each model of the supporting ring 41 are different.

[0035] The supporting part 3 includes a pillar 31 which is arranged at the upper end of the bottom plate 1; an axial bearing 33 which is rotatably connected to the upper end of the pillar 31 and whose rotation axis is arranged longitudinally; a radial bearing 32 which is rotatably connected to the side wall of the pillar 31 and whose rotation axis is arranged along the diameter direction of the supporting ring 41. Wherein, the outer periphery of the axial bearing 33 is used to abut against the outer periphery of the supporting ring 41; the radial bearing 32 is used to abut against the lower end of the supporting ring 41.

[0036] A U-shaped frame 71 is arranged on the column track 2; the U-shaped frame 71 is located below the arm track 61; the wafer 5 placed on the supporting ring 41 is located inside the U-shaped frame 71; spectrometers probes are respectively arranged above and below the wafer 5 inside the U-shaped frame 71.

[0037] Two first clamping plates 72 are detachably connected to the column track 2; a first threaded column is arranged between the two first clamping plates 72; the U-shaped frame 71 is arranged on one of the first clamping plates 72; the first clamping plate 72 can be selectively clamped and fixed on the column track 2.

[0038] A slider 62 is slidably connected to the arm track 61 along its length direction; an L-shaped plate 64 is arranged on the slider 62; a camera module 65 is arranged on the L-shaped plate 64; the sliding direction of the camera module 65 is arranged along the diameter direction of the supporting ring 41; a locking knob 63 is threadedly connected to the slider 62; the locking knob 63 can be selectively abutted against the arm track 61; the camera module 65 is arranged on the slider 62.

[0039] Two second clamping plates 82 are detachably connected to the column track 2; a second threaded column is arranged between the two second clamping plates 82; the second clamping plate 82 can be selectively clamped and fixed on the column track 2; a fine adjustment module 81 is arranged between one of the second clamping plates 82 and the arm track 61; a fine adjustment knob 83 is arranged on the fine adjustment module 81; the fine adjustment module 81 is used to adjust the height of the camera module 65.

[0040] A supplementary light is arranged at the upper end of the bottom plate 1 below the supporting ring 41.

[0041] One side of the lower end of the column track 2 is rotatably connected to the bottom plate 1, and a bolt hole is arranged on the other side; the rotation axis of the column track 2 is arranged along the length direction of the arm track 61.

[0042] The above are only specific embodiments of the present utility model, but the technical features of the present utility model are not limited thereto. Any changes or modifications made by those skilled in the art within the scope of the present utility model are covered by the patent scope of the present utility model.

Claims

1. An automatic wafer character recognition workstation, characterized in that: It includes a support part, there are four of the support parts, and they are evenly distributed along the circumferential direction at the upper end of the bottom plate; a supporting ring, the supporting ring is rotatably connected to the four support parts, and the wafer is horizontally placed on the supporting ring; a column track, the column track is vertically arranged at the upper end of the bottom plate; an arm track, the arm track is horizontally arranged on one side of the column track facing the supporting ring; a camera module, the camera module is horizontally slidably connected to the arm track, and the sliding direction of the camera module is arranged along the diameter direction of the supporting ring; Wherein, three stoppers and three guiding blocks are arranged at the upper end of the supporting ring; the stoppers and the guiding blocks are evenly distributed along the same circumferential direction of the supporting ring, and the stoppers and the guiding blocks are arranged at intervals; a guiding inclined surface is arranged on one side of the guiding block facing the middle of the supporting ring; the wafer placed on the supporting ring abuts against the guiding inclined surface and the stopper.

2. The workstation according to claim 1, wherein: The support part includes a support column, and the support column is arranged at the upper end of the bottom plate; an axial bearing, the axial bearing is rotatably connected to the upper end of the support column, and its rotation axis is arranged longitudinally; a radial bearing, the radial bearing is rotatably connected to the side wall of the support column, and its rotation axis is arranged along the diameter direction of the supporting ring; Wherein, the outer periphery of the axial bearing is used to abut against the outer periphery of the supporting ring; the radial bearing is used to abut against the lower end of the supporting ring.

3. The workstation according to any one of claims 1-2, characterized in that: One end of the stopper facing the middle of the supporting ring and one end of the guiding block facing the middle of the supporting ring are respectively located inside the supporting ring; there is a gap between the inner wall of the supporting ring and the outer wall of the wafer.

4. The workstation according to any one of claims 1-2, characterized in that: The supporting ring is detachably connected to the support part; the supporting ring has multiple models; the circumferential diameters of the distribution of the stoppers and the guiding blocks on each model of the supporting ring are different.

5. The workstation according to any one of claims 1-2, characterized in that: A U-shaped frame is arranged on the column track; the wafer placed on the supporting ring is located inside the U-shaped frame; spectrometer probes are respectively arranged above and below the wafer inside the U-shaped frame.

6. The workstation according to claim 5, characterized in that: Two first clamping plates are detachably connected to the column track; a first threaded column is arranged between the two first clamping plates; the U-shaped frame is arranged on one of the first clamping plates; the first clamping plate can be selectively clamped and fixed on the column track.

7. The workstation according to any one of claims 1-2, characterized in that: A slider is slidably connected to the arm track; a locking knob is threadedly connected to the slider; the locking knob can be selectively abutted against the arm track; the camera module is arranged on the slider.

8. The workstation according to any one of claims 1-2, characterized in that: A fine adjustment module is arranged between the arm track and the column track; a fine adjustment knob is arranged on the fine adjustment module; the fine adjustment module is used to adjust the height of the camera module.

9. The workstation according to any one of claims 1-2, characterized in that: One side of the lower end of the column track is rotatably connected to the bottom plate, and a bolt hole is arranged on the other side; the rotation axis of the column track is arranged along the length direction of the arm track.

10. The workstation according to any one of claims 1-2, characterized in that: A supplementary light is arranged at the upper end of the bottom plate below the supporting ring.

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