Magnetic field generating device and unbalanced planar cathode

Abstract

The utility model relates to the technical field of vacuum coating magnetron sputtering unbalanced planar cathodes, in particular to a magnetic field generating device and an unbalanced planar cathode. The magnetic field generating device provided by the utility model comprises a magnetic shoe bottom plate, a spacer block, a first magnetic pole, a second magnetic pole and a magnetism adjusting assembly, the spacer block, the first magnetic pole and the second magnetic pole are arranged on the magnetic shoe bottom plate, and the spacer block is located between the first magnetic pole and the second magnetic pole; the polarities of the first magnetic pole and the second magnetic pole are opposite, and the magnetic field intensity of the first magnetic pole is different from that of the second magnetic pole; the magnetism adjusting assembly is used for adjusting the magnetic field intensity of the target surface in the horizontal direction, and the magnetism adjusting assembly is arranged between the spacer block and the first magnetic pole and / or between the spacer block and the second magnetic pole, so that the maximum value of the magnetic field intensity of the target surface in the horizontal direction can be reduced, the fluctuation of the magnetic field intensity is relatively gentle, and the coating uniformity and the utilization rate of the target material are improved; and the coating quality is further improved.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum coating magnetron sputtering unbalanced planar cathodes, in particular to a magnetic field generating device and an unbalanced planar cathode. Background Art

[0002] Magnetron sputtering is a common method of physical deposition. It utilizes the interaction between magnetic and electric fields to cause electrons to spiral near the target surface, increasing the probability of electrons striking argon gas and forming argon ions. The argon ions generated by the electrons bombarding the argon gas collide with the target surface under the influence of the electric field, sputtering the target material. The magnetic field generator in a planar magnetron sputtering cathode is mainly divided into two types: balanced magnetic field and unbalanced magnetic field.

[0003] In existing unbalanced magnetic fields, the cathode structure often consists of a pair of permanent magnets with opposite polarities and different magnetic field strengths placed on a magnetic block, with the target material placed on top of the pair of permanent magnets. This cathode structure results in uneven magnetic field strength distribution on the left and right sides of the target surface. However, existing technologies can significantly improve the uniformity of the magnetic field distribution on the target surface by adding magnetic blocks outside the pair of permanent magnets. This can increase the energy of ion sputtering during coating, thereby improving coating efficiency.

[0004] However, this method also has its shortcomings, because the magnetic field strength is the sum of spatial vectors, that is, the vector sum of the magnetic field in the X, Y, and Z directions. The uniformity of the magnetic field strength of the vector sum can improve the electron uniformity in the center of the target, that is, the sputtering efficiency is high and the ion energy is large in the center of the target. However, there is still a large difference in the order of magnitude between the electron distribution in the center and edge areas of the target, and the target utilization rate has not increased, only the sputtering efficiency has increased during coating. Experiments have found that it is the horizontal magnetic field strength that affects the target utilization and uniformity. Adding a magnetic block to the outside of a pair of permanent magnets has little effect on the uniformity of the magnetic field strength in the horizontal direction of the target surface. This is why, when a magnetic block is added to the outside of a pair of permanent magnets, the overall uniformity will be improved during cathode coating, and the target sputtering rate and ion energy intensity will increase, but the film thickness uniformity and target utilization rate in the target direction will not be improved. Utility Model Content

[0005] The purpose of the utility model is to provide a magnetic field generating device and an unbalanced planar cathode to solve the technical problems of low film thickness uniformity in the target material direction and low target material utilization rate in the prior art method of adding a magnetic conductive block outside a pair of permanent magnets.

[0006] The utility model provides a magnetic field generating device for an unbalanced planar cathode, wherein the unbalanced planar cathode has a target surface, and the magnetic field generating device comprises: a magnetic shoe bottom plate, a spacer, a first magnetic pole, a second magnetic pole and a magnetic adjustment component;

[0007] The magnetic shoe base has a first side and a second side opposite to each other, the spacer, the first magnetic pole and the second magnetic pole are all arranged on the magnetic shoe base and are all located on the first side, and the spacer is located between the first magnetic pole and the second magnetic pole;

[0008] The polarity of the first magnetic pole is opposite to that of the second magnetic pole, and the magnetic field strength of the first magnetic pole is different from that of the second magnetic pole;

[0009] The magnetic adjustment component is used to adjust the magnetic field strength in the horizontal direction of the target surface, and the magnetic adjustment component is arranged between the spacer and the first magnetic pole, and / or the magnetic adjustment component is arranged between the spacer and the second magnetic pole.

[0010] As a further technical solution, the first magnetic pole is in the shape of a rectangular frame, and the spacer is arranged in the frame of the first magnetic pole;

[0011] The spacer is provided with a slot, and the second magnetic pole is inserted into the slot;

[0012] The magnetic adjustment assembly includes a pair of first magnetic adjustment members. The first magnetic pole has a first segment and a second segment facing each other. The pair of first magnetic adjustment members are respectively located between the first segment and the spacer and between the second segment and the spacer.

[0013] As a further technical solution, the magnetic adjustment component includes a pair of second magnetic adjustment members;

[0014] The first magnetic pole further has a third segment and a fourth segment facing each other, and a pair of the second magnetic adjustment members are respectively located between the third segment and the spacer and between the fourth segment and the spacer.

[0015] As a further technical solution, it also includes a partition assembly, the magnetic adjustment assembly is arranged between the spacer block and the first magnetic pole, and the partition assembly is arranged between the magnetic adjustment assembly and the first magnetic pole.

[0016] As a further technical solution, the first magnetic pole includes a plurality of permanent magnets arranged in sequence;

[0017] and / or;

[0018] The second magnetic pole includes a plurality of permanent magnets arranged in sequence.

[0019] As a further technical solution, a connecting block is further included. The connecting block is connected to the magnetic shoe bottom plate and is located on the first side. The connecting block is used to connect to the water cooling plate.

[0020] As a further technical solution, a handle is further included, which is connected to the magnetic shoe bottom plate and is located on the second side.

[0021] The utility model provides an unbalanced planar cathode, comprising a target material, a back plate, a water-cooling plate, a cathode seat, an insulating frame and the magnetic field generating device;

[0022] The cathode seat is provided with a mounting hole, the magnetic field generating device is arranged in the mounting hole, the water-cooling plate is connected to the upper end of the cathode seat and corresponds to the mounting hole, the back plate is arranged on the upper side of the water-cooling plate, the target material is arranged on the upper side of the back plate, and the insulating frame is sleeved on the cathode seat.

[0023] As a further technical solution, a water filling area is provided in the middle of the water-cooling plate, and a water inlet pipe and a water outlet pipe are provided on both sides of the water-cooling plate, and the water inlet pipe and the water outlet pipe are both connected to the water filling area;

[0024] The water inlet pipe and the water outlet pipe are both passed through the cathode seat, and are both sealed and connected to the cathode seat via a first sealing structure.

[0025] As a further technical solution, the back plate is sealed to the water-cooling plate via a second sealing structure;

[0026] The water cooling plate is sealed and connected to the cathode seat via a third sealing structure;

[0027] The insulating frame is sealed and connected to the cathode seat via a fourth sealing structure.

[0028] Compared with the prior art, the magnetic field generating device and the unbalanced planar cathode provided by the present invention have the following technical advantages:

[0029] The utility model provides a magnetic field generating device for an unbalanced planar cathode, which has a target surface. The magnetic field generating device includes: a magnetic shoe base, a spacer, a first magnetic pole, a second magnetic pole and a magnetic adjustment component; the magnetic shoe base has a first side and a second side relative to each other, the spacer, the first magnetic pole and the second magnetic pole are all arranged on the magnetic shoe base and are all located on the first side, and the spacer is located between the first magnetic pole and the second magnetic pole; the polarity of the first magnetic pole is opposite to that of the second magnetic pole, and the magnetic field strength of the first magnetic pole is different from that of the second magnetic pole; the magnetic adjustment component is used to adjust the magnetic field strength in the horizontal direction of the target surface, and the magnetic adjustment component is arranged between the spacer and the first magnetic pole, and / or the magnetic adjustment component is arranged between the spacer and the second magnetic pole.

[0030] By arranging a magnetic adjustment component between the spacer and the first magnetic pole and / or between the spacer and the second magnetic pole to adjust the horizontal magnetic field strength of the target surface, the maximum value of the horizontal magnetic field strength of the target surface can be reduced, and the fluctuation of the magnetic field strength in the range of 21mm-63mm on the target surface can be made relatively gentle, thereby improving the uniformity of the coating and the utilization rate of the target material, thereby improving the coating quality.

[0031] The unbalanced planar cathode provided by the present invention includes the above-mentioned magnetic field generating device. Therefore, the technical advantages and effects achieved by it include the technical advantages and effects achieved by the above-mentioned magnetic field generating device, which will not be elaborated here.

[0032] Other features and advantages of the present invention will be described in detail in the subsequent detailed description of the embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0034] Figure 1 A schematic diagram of an unbalanced planar cathode structure provided by an embodiment of the present utility model;

[0035] Figure 2 A schematic diagram of a magnetic field generating device provided in an embodiment of the present utility model installed on a cathode seat;

[0036] Figure 3 A schematic structural diagram of a magnetic field generating device provided in an embodiment of the present utility model;

[0037] Figure 4 A side view of a magnetic field generating device provided in an embodiment of the present utility model;

[0038] Figure 5 The embodiment of the present invention provides Figure 4 Enlarged view of point A in the middle;

[0039] Figure 6 The embodiment of the present invention provides Figure 4 mid-CC cross-section;

[0040] Figure 7 The embodiment of the present invention provides Figure 6 Enlarged view of point B in the middle;

[0041] Figure 8 A schematic diagram of the back side of a magnetic field generating device provided in an embodiment of the present utility model;

[0042] Figure 9 The embodiment of the present invention provides Figure 8 mid-CC cross-section;

[0043] Figure 10A schematic diagram of the installation of a water cooling plate and a connecting block provided in an embodiment of the present utility model;

[0044] Figure 11 A schematic diagram of the water cooling plate structure provided by an embodiment of the present utility model;

[0045] Figure 12 A cross-sectional view of a water-cooling plate provided in an embodiment of the present utility model;

[0046] Figure 13 This is a side view of a water-cooling plate provided in an embodiment of the present invention.

[0047] Icons: 1-target material; 2-back plate; 3-water cooling plate; 4-cathode seat; 5-insulating frame; 6-magnetic field generating device; 7-first permanent magnet; 8-second permanent magnet; 9-third permanent magnet; 10-fourth permanent magnet; 11-spacer; 12-first magnetic adjustment component; 13-connecting block; 14-magnetic shoe bottom plate; 15-handle; 16-second magnetic adjustment component; 17-long partition; 18-short partition; 19-fourth screw; 20-first screw; 21-second screw; 22-fifth permanent magnet; 23-sixth permanent magnet; 24-water inlet pipe; 25-water outlet pipe; 26-skeleton sealing ring; 27-pressure cover; 28-second sealing structure; 29-third sealing structure; 30-fourth sealing structure; 31-third screw; 32-water filling area; 33-process hole; 34-water pipe joint. DETAILED DESCRIPTION

[0048] The following will clearly and completely describe the technical solutions of the present invention in conjunction with the embodiments. Obviously, the embodiments described are only a part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0049] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating positions or relationships, are based on the positions or relationships shown in the accompanying drawings and are intended solely to facilitate the description of this utility model and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0050] In the description of this utility model, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections, electrical connections; direct connections, indirect connections through an intermediate medium, and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.

[0051] In addition, the technical solutions between the various embodiments can be combined with each other, but they must be based on the fact that ordinary technicians in this field can implement them. When the combination of technical solutions is mutually contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by this utility model.

[0052] The present invention will be further described in detail below through specific implementation examples and in conjunction with the accompanying drawings.

[0053] Specific structure such as Figures 1 to 13 shown.

[0054] This embodiment provides a magnetic field generating device 6 for an unbalanced planar cathode, the unbalanced planar cathode having a target surface, and the magnetic field generating device 6 includes: a magnetic shoe base 14, a spacer 11, a first magnetic pole, a second magnetic pole and a magnetic adjustment component; the magnetic shoe base 14 has a first side and a second side relative to each other, the spacer 11, the first magnetic pole and the second magnetic pole are all arranged on the magnetic shoe base 14, and are all located on the first side, and the spacer 11 is located between the first magnetic pole and the second magnetic pole; the polarity of the first magnetic pole is opposite to that of the second magnetic pole, and the magnetic field strength of the first magnetic pole is different from that of the second magnetic pole; the magnetic adjustment component is used to adjust the magnetic field strength in the horizontal direction of the target surface, and the magnetic adjustment component is arranged between the spacer 11 and the first magnetic pole, and / or, the magnetic adjustment component is arranged between the spacer 11 and the second magnetic pole.

[0055] In this embodiment, the material of the magnetic shoe bottom plate 14 must be pure iron or other high magnetic permeability materials with a very high relative magnetic permeability coefficient, and its relative magnetic permeability coefficient is about 4000. The spacer 11 is made of aluminum alloy with a relative magnetic permeability coefficient of 1. The spacer 11 is fixed to the magnetic shoe bottom plate 14 by a first screw 20.

[0056] The principle of magnetic field optimization is to change the relative permeability of certain areas in the permanent magnet's spatial environment, thereby changing the difficulty of magnetic field propagation in that area, thereby changing the magnetic field strength in the horizontal direction of the target surface. Two permanent magnets of identical size and shape but opposite polarity are placed horizontally in space. According to electromagnetic field theory, magnetic lines of force will form between the two permanent magnets, from the north pole to the south pole. All these magnetic lines of force form an electromagnetic loop, and the propagation ability of the magnetic lines of force is affected by the relative permeability of the spatial medium. There is air around the two permanent magnets, so the relative magnetic permeability around the permanent magnets is a fixed constant. From electromagnetic theory, we know that if you take any point on the magnetic line of force, the tangent of the magnetic line of force at any point is the magnetic field size BTx at that point, which is the vector sum of Bx and By. In the magnetron sputtering planar cathode device, the size and distribution uniformity of the magnetic field in the horizontal direction of the target surface determine the sputtering efficiency and uniformity of the coating. According to experiments, the horizontal magnetic field of the target surface, that is, the magnetic field size of Bx, is in the range of 300Gs-500Gs, which is the highest sputtering efficiency. 400GS is the best value. That is, when optimizing the magnetic field, try to lock the horizontal magnetic field of the target surface at 400Gs.

[0057] In this embodiment, the magnetic tuning component can be pure iron. Since the relative magnetic permeability of pure iron is greater than that of air in space, according to electromagnetic field theory, magnetic lines of force can pass through pure iron much more easily. Therefore, the horizontal magnetic field strength in space increases, and thus the horizontal magnetic field strength at the target surface also increases. Since pure iron cannot affect the relative magnetic permeability of space outside its own volume, the magnetic field strength distribution in spatial regions far from the target surface is unaffected by the pure iron. Specifically, by placing the magnetic tuning component between the spacer 11 and the first magnetic pole and / or between the spacer 11 and the second magnetic pole, the magnetic field strength and distribution on the target surface will change, but the magnetic field characteristics near the plated substrate remain the same as when the magnetic tuning component is not present.

[0058] Comparing this embodiment with the prior art reveals that the prior art approach, i.e., the method of adding a magnetic conductive block to the outer surface of a pair of permanent magnets, results in significant variations in the horizontal magnetic field distribution on the target surface. In particular, in the target surface region between 21 mm and 63 mm, the horizontal magnetic field intensity on the target surface initially increases sharply and then rapidly decreases. Coating experience indicates that the maximum horizontal magnetic field intensity on the target surface is the area that first burns through the target material 1 during etching. If the maximum point is too steep, not only will the coating uniformity deteriorate, but the target material 1 utilization rate will also be reduced. This embodiment adjusts the horizontal magnetic field intensity on the target surface by providing a magnetic adjustment assembly between the spacer 11 and the first magnetic pole and / or between the spacer 11 and the second magnetic pole. This reduces the maximum horizontal magnetic field intensity on the target surface and makes the magnetic field intensity fluctuations more gradual in the target surface region between 21 mm and 63 mm. This improves coating uniformity and target material 1 utilization, thereby enhancing coating quality. Furthermore, target material 1 utilization can be increased by 2% compared to the prior art, and the defective rate of coated products due to uniformity issues can be reduced by 1.5%.

[0059] In the optional technical solution of this embodiment, the first magnetic pole and the second magnetic pole are both strip-shaped and arranged relatively parallel. The spacer 11 is also strip-shaped at this time. The spacer 11 can prevent the first magnetic pole and the second magnetic pole from being adsorbed together. The overall structure is simple and easy to manufacture.

[0060] In an optional technical solution of this embodiment, the first magnetic pole is in the shape of a rectangular frame, and the spacer 11 is disposed within the frame of the first magnetic pole; the spacer 11 is provided with a slot, and the second magnetic pole is inserted into the slot; the magnetic adjustment assembly includes a pair of first magnetic adjustment members 12, the first magnetic pole having a first and second opposing segments, and the pair of first magnetic adjustment members 12 are respectively located between the first segment and the spacer 11, and between the second segment and the spacer 11. This structural form of the first and second magnetic poles can more effectively improve the uniformity of the coating. At the same time, the spacer 11 not only prevents the first and second magnetic poles from adsorbing each other, but also facilitates the installation of the second magnetic pole, ensuring the stability of the second magnetic pole.

[0061] Specifically, the magnetic field generating device 6 includes two identical first magnetic adjustment components 12, located on either side of the magnetic shoe base 14. Made of the same material as the magnetic shoe base 14, the components 12 have a row of screw holes and are secured to the spacer 11 via second screws 21. The shape and size of the first magnetic adjustment components 12 are optimized through numerical analysis of magnetic field simulations, using the same principles as those described above for magnetic field optimization. To ensure optimal magnetic adjustment performance, all second screws 21 securing the components 12 must be made of iron.

[0062] In the optional technical solution of this embodiment, the magnetic adjustment component includes a pair of second magnetic adjustment parts 16; the first magnetic pole also has a relative third segment and fourth segment, and the pair of second magnetic adjustment parts 16 are respectively located between the third segment and the spacer 11 and between the fourth segment and the spacer 11.

[0063] In this embodiment, second magnetic adjustment components 16 are mounted on the front and rear sides of the magnetic shoe base 14. The second magnetic adjustment components 16 are made of the same material as the first magnetic adjustment component 12 and are secured to the magnetic shoe base 14 via third screws 31. The size and height of the second magnetic adjustment components 16 are also optimized through numerical analysis of magnetic field simulations, following the same optimization principle as the first magnetic adjustment component 12. Coating comparisons show that the magnetic field generator 6 can be magnetically adjusted by the second magnetic adjustment components 16, increasing the target material 1 utilization rate of the unbalanced planar cathode by 1.5%. This means that the provision of the second magnetic adjustment components 16 can increase the target material 1 utilization rate and, to a certain extent, improve coating uniformity.

[0064] In this embodiment, the second magnetic adjustment member 16 is mainly used to adjust the magnetic field at both ends of the magnetic field generating device 6. It can be seen that the cathode ends are mostly ineffective areas during vacuum coating, so the second magnetic adjustment member 16 is mainly used to improve the utilization rate of the target material 1.

[0065] In this embodiment, the first magnetic pole is in the shape of a rectangular frame, the first and second segments are long sides, and the third and fourth segments are short sides. The structure is easy to manufacture and has a good coating effect.

[0066] In an optional technical solution of this embodiment, the first magnetic pole includes a plurality of permanent magnets arranged in sequence; and / or the second magnetic pole includes a plurality of permanent magnets arranged in sequence.

[0067] In this embodiment, the first and second sections each include a plurality of first permanent magnets 7. Specifically, sixteen first permanent magnets 7 are arrayed on the left and right sides of the spacer 11. The third and fourth sections each include a second permanent magnet 8, a third permanent magnet 9, and a fourth permanent magnet 10. Specifically, the second permanent magnet 8, the third permanent magnet 9, and the fourth permanent magnet 10 are symmetrically arranged on the front and back sides of the spacer 11, respectively. The second magnetic pole includes a plurality of fifth permanent magnets 22 and a plurality of sixth permanent magnets 23. Specifically, five sixth permanent magnets 23 and two fifth permanent magnets 22 are arranged in a slot at the center of the magnetic shoe base 14, that is, at the center of the spacer 11. The first permanent magnet 7, the second permanent magnet 8, the third permanent magnet 9, the fourth permanent magnet 10, the fifth permanent magnet 22, and the sixth permanent magnet 23 are all neodymium iron boron permanent magnets.

[0068] In this embodiment, each permanent magnet is formed separately, and the first and second magnetic poles in the magnetic field generating device 6 cannot be a single permanent magnet. Due to the processing characteristics of permanent magnets, the permanent magnet is manufactured by sintering powdered rare earth materials and then placing them in a fixed magnetic field device for magnetization. The interior of the permanent magnet is divided into multiple regions, which are called magnetic domains. Before magnetization, the polarity distribution of the magnetic domains is random, so the permanent magnet as a whole appears neutral. During magnetization, the spinning electrons in the permanent magnet are subjected to the Lorentz force under the action of the magnetic field, which slowly changes the polarity of the magnetic domains and causes some of the magnetic domains to move. After magnetization, the polarity direction of the magnetic domains inside the permanent magnet is basically the same, so the entire permanent magnet appears magnetic. However, if the permanent magnet is large, that is, there are many magnetic domains inside, it will be very difficult to magnetize it, and the overall magnetic field uniformity of the permanent magnet will be poor. This is because when there are many magnetic domains inside the permanent magnet, there will be more free magnetic domains to magnetically balance the magnetic domains that have changed or are changing polarity during magnetization. This will result in high magnetization power and long magnetization time, and the probability of demagnetization of the permanent magnet will also increase after magnetization is completed.

[0069] Therefore, each permanent magnet is set separately. First, it reduces the processing cost of the permanent magnet. Second, only when the magnetic field of the permanent magnet is uniform and stable can the uniformity of the magnetic field generated by the magnetic field generating device 6 be ensured. Third, it is conducive to process debugging and maintenance. Specifically, according to the coating situation, if an abnormality occurs in a certain area of the cathode target 1 due to improper control of the process gas during coating or other reasons, it can be debugged and remedied by replacing the permanent magnet in the corresponding area. For example, during vacuum coating, if the amount of process gas in a certain area of the target 1 is too much, the plasma in this area will be more concentrated. If the permanent magnet in this area is replaced with a permanent magnet with smaller magnetism at this time, the coating problem can be solved.

[0070] In this embodiment, the magnetic field strength of the first magnetic pole can be less than the magnetic field strength of the second magnetic pole. Preferably, the magnetic field strength of the first magnetic pole is greater than the magnetic field strength of the second magnetic pole. Specifically, the first permanent magnet 7, the second permanent magnet 8, the third permanent magnet 9, and the fourth permanent magnet 10 are strong permanent magnets, and the fifth permanent magnet 22 and the sixth permanent magnet 23 in the center are weak permanent magnets. The first permanent magnet 7, the second permanent magnet 8, the third permanent magnet 9, and the fourth permanent magnet 10 are installed with the same polarity direction, and the fifth permanent magnet 22 and the sixth permanent magnet 23 are installed with the same polarity. However, the first permanent magnet 7, the second permanent magnet 8, the third permanent magnet 9, and the fourth permanent magnet 10 are installed with opposite polarity to the fifth permanent magnet 22 and the sixth permanent magnet 23.

[0071] An optional technical solution of this embodiment further includes a spacer assembly. The magnetic adjustment assembly is disposed between the spacer block 11 and the first magnetic pole. The spacer assembly is also disposed between the magnetic adjustment assembly and the first magnetic pole. The magnetic adjustment assembly exerts a strong attraction on the first magnetic pole. Without the spacer assembly, the first magnetic pole would easily adhere to the magnetic adjustment assembly and be difficult to separate. By adding the spacer assembly between the first magnetic pole and the spacer block 11, the spacer assembly can be moved to adjust the position of the first magnetic pole.

[0072] Specifically, the partition assembly includes a long partition 17 and a short partition 18, both of which are made of aluminum alloy. Their relative magnetic permeability coefficients are the same as that of the spacer 11, both of which are 1. To facilitate installation, a long partition 17 is placed between the first permanent magnet 7 and the spacer 11, and a short partition 18 is placed between the second permanent magnet 8, the third permanent magnet 9 and the fourth permanent magnet 10 and the spacer 11. The long partition 17 and the short partition 18 are made of the same material as the spacer 11. There is a gap between the long partition 17 and the short partition 18. When the processing dimensional accuracy of the permanent magnet is not high, the position of the permanent magnet can be adjusted through this gap.

[0073] It should be noted that in this embodiment, the long partition 17 and the short partition 18 may not be provided, but the thickness of the long partition 17 and the short partition 18 may be directly added to the partition block 11, that is, the thickness of the long partition 17 and the short partition 18 may be increased accordingly in the front, back, left and right of the partition block 11.

[0074] An optional technical solution of this embodiment further includes a connecting block 13, which is connected to the magnetic shoe base 14 and located on the first side. The connecting block 13 is used to connect to the water cooling plate 3. The connecting block 13 is fixed to the magnetic shoe base 14 by fourth screws 19, which has a simple structure and facilitates the installation of the water cooling plate 3.

[0075] In an optional technical solution of this embodiment, a handle 15 is further included, which is connected to the magnetic shoe bottom plate 14 and is located on the second side, so as to facilitate the installation of the magnetic field generating device 6 as a whole on the unbalanced planar cathode.

[0076] This embodiment provides an unbalanced planar cathode, comprising a target material 1, a backing plate 2, a water-cooled plate 3, a cathode seat 4, an insulating frame 5 and the above-mentioned magnetic field generating device 6. Therefore, the technical advantages and effects achieved by the unbalanced planar cathode include the technical advantages and effects achieved by the above-mentioned magnetic field generating device 6, which will not be repeated here.

[0077] In this embodiment, a mounting hole is provided on the cathode seat 4, the magnetic field generating device 6 is provided in the mounting hole, the water-cooling plate 3 is connected to the upper end of the cathode seat 4 and corresponds to the mounting hole, the back plate 2 is provided on the upper side of the water-cooling plate 3, the target material 1 is provided on the upper side of the back plate 2, and the insulating frame 5 is sleeved on the cathode seat 4.

[0078] Specifically, the backplate 2 is made of copper, the insulating frame 5 is sleeved onto the cathode holder 4, and the water-cooling plate 3 is mounted on the upper surface of the cathode holder 4 and connected via a fifth screw. The backplate 2 is mounted within a groove in the water-cooling plate 3 and connected via a sixth screw. The target 1 is secured to the backplate 2. The contact surface between the target 1 and the backplate 2 is filled with molten indium. After the indium solidifies, the target 1 is secured to the backplate 2. A rectangular hole, or mounting hole, is provided within the cathode holder 4. The rectangular hole area is used to mount the magnetic field generator 6. A handle 15 is provided on the magnetic field generator 6 to facilitate its transport and installation.

[0079] In this embodiment, three connecting blocks 13 are mounted on the left and right sides of the magnetic shoe base 14, and one connecting block 13 is mounted on each of the front and rear sides. The other side of the connecting block 13 is connected to the water-cooling plate 3. Once the magnetic field generating device 6 is secured to the water-cooling plate 3 via the connecting blocks 13, the corresponding permanent magnet can be installed within the magnetic field generating device 6. Once the magnetic field generating device 6 and the water-cooling plate 3 are integrally mounted, the entire device can be installed within the rectangular hole of the cathode holder 4. This allows for convenient overall installation and a simple structure.

[0080] Because the optimized magnetic field generator 6 requires minimal holes, apertures, or other components within the magnetic tuning assembly area, the other components of the unbalanced planar cathode that are associated with the magnetic field generator 6 must also be optimized. The most important of these is the water-cooled plate 3. If the mounting holes and water pipes of the water-cooled plate 3 were to pass through the spacer 11 and the magnetic tuning assembly, the magnetic tuning assembly would be structurally incomplete, impacting the magnetic tuning effect. Therefore, during installation, the integrity of the magnetic tuning assembly must not be compromised by installation restrictions or structures like the water pipes. Therefore, compared to traditional water-cooled plate 3 installation methods and water supply methods, the structure of the water-cooled plate 3 also requires modifications and optimizations.

[0081] In the optional technical solution of this embodiment, a water filling area 32 is provided in the middle of the water-cooling plate 3, and a water inlet pipe 24 and a water outlet pipe 25 are respectively provided on both sides of the water-cooling plate 3, and the water inlet pipe 24 and the water outlet pipe 25 are both connected to the water filling area 32; the water inlet pipe 24 and the water outlet pipe 25 are both passed through the cathode seat 4, and are both sealed and connected to the cathode seat 4 through a first sealing structure.

[0082] Specifically, after the unbalanced planar cathode is operating, the water area 32 of the water-cooling plate 3 is filled with flowing water. To accommodate the water inlet pipe 24 and water outlet pipe 25 of the water-cooling plate 3, the water-cooling plate 3 is processed using a special process. A process hole 33 is opened on the side of the water-cooling plate 3. Specifically, during processing, a process hole 33 is first drilled with a drill bit until it reaches the water-cooling area 32. The water inlet pipe 24 and water outlet pipe 25 are then welded to the water-cooling plate 3. Finally, a hole cover is welded to the process hole 33 to completely seal the process hole 33.

[0083] Because the water flow of the water-cooling plate 3 needs to flow in from outside the cavity when the unbalanced planar cathode is working, it is necessary to carry out a sealing design for the cooperation between the parts of the water-cooling plate 3 and the entire unbalanced planar cathode. In this embodiment, the water inlet pipe 24 and the water outlet pipe 25 of the water-cooling plate 3 pass through the cathode seat 4. Because the water-cooling plate 3 is on the side of the vacuum chamber, the water inlet pipe 24 and the water outlet pipe 25 must be sealed, that is, they are sealed and connected to the cathode seat 4 through a first sealing structure. The first sealing structure includes a skeleton sealing ring 26 and a pressure cover 27. Two skeleton sealing rings 26 and pressure covers 27 are installed at the contact position between the tube wall and the cathode seat 4. During assembly, after the skeleton sealing ring 26 is installed, the pressure cover 27 is pressed into the top surface of the skeleton sealing ring 26. The area where the pressure cover 27 contacts the cathode seat 4 is fully welded together, and the area where the pressure cover 27 contacts the water pipe of the water-cooling plate 3 is also fully welded together. This can not only ensure the sealing of the water pipe, but also allow the water-cooling plate 3 and the magnetic field generating device 6 to be tightly fixed as one to prevent loosening. After the water-cooling plate 3, the magnetic field generating device 6 and the cathode seat 4 are installed, the water pipe joint 34 can be installed on the water pipe of the water-cooling plate 3.

[0084] In the optional technical solution of this embodiment, the back plate 2 is sealed to the water-cooled plate 3 via the second sealing structure 28; the water-cooled plate 3 is sealed to the cathode seat 4 via the third sealing structure 29; and the insulating frame 5 is sealed to the cathode seat 4 via the fourth sealing structure 30.

[0085] In this embodiment, there is a second sealing structure 28 in the contact area between the back plate 2 and the water-cooled plate 3, a third sealing structure 29 in the contact area between the water-cooled plate 3 and the cathode seat 4, and a fourth sealing structure 30 in the matching area between the insulating frame 5 and the cathode seat 4 and its cavity. This ensures that external gas cannot enter the cavity from the unbalanced planar cathode flange.

[0086] In this embodiment, the second sealing structure 28 , the third sealing structure 29 and the fourth sealing structure 30 may be sealing strips or insulating strips, or may be other sealing components as long as the requirements are met.

[0087] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A magnetic field generating device for an unbalanced planar cathode having a target surface, characterized in that: The magnetic field generating device (6) comprises: a magnetic shoe base (14), a spacer (11), a first magnetic pole, a second magnetic pole and a magnetic adjustment component; The magnetic shoe sole (14) has a first side and a second side opposite to each other, the spacer (11), the first magnetic pole, and the second magnetic pole are all arranged on the magnetic shoe sole (14) and are all located on the first side, and the spacer (11) is located between the first magnetic pole and the second magnetic pole; The polarity of the first magnetic pole is opposite to that of the second magnetic pole, and the magnetic field strength of the first magnetic pole is different from that of the second magnetic pole; The magnetic adjustment component is used to adjust the magnetic field strength in the horizontal direction of the target surface, and the magnetic adjustment component is arranged between the spacer (11) and the first magnetic pole, and / or the magnetic adjustment component is arranged between the spacer (11) and the second magnetic pole.

2. The magnetic field generating device according to claim 1, characterized in that The first magnetic pole is in the shape of a rectangular frame, and the spacer (11) is arranged in the frame of the first magnetic pole; The spacer (11) is provided with a slot, and the second magnetic pole is inserted into the slot; The magnetic adjustment component comprises a pair of first magnetic adjustment members (12), the first magnetic pole has a first section and a second section opposite to each other, and the pair of first magnetic adjustment members (12) are respectively located between the first section and the spacer (11) and between the second section and the spacer (11).

3. The magnetic field generating device according to claim 2, characterized in that: The magnetic adjustment component includes a pair of second magnetic adjustment members (16); The first magnetic pole also has a third section and a fourth section that are opposite to each other, and a pair of the second magnetic adjustment members (16) are respectively located between the third section and the spacer (11) and between the fourth section and the spacer (11).

4. The magnetic field generating device according to any one of claims 1 to 3, characterized in that: It also includes a partition assembly, the magnetic adjustment assembly is arranged between the spacer (11) and the first magnetic pole, and the partition assembly is arranged between the magnetic adjustment assembly and the first magnetic pole.

5. The magnetic field generating device according to any one of claims 1 to 3, characterized in that: The first magnetic pole includes a plurality of permanent magnets arranged in sequence; and / or; The second magnetic pole includes a plurality of permanent magnets arranged in sequence.

6. The magnetic field generating device according to any one of claims 1 to 3, characterized in that: It also includes a connecting block (13), which is connected to the magnetic shoe bottom plate (14) and is located on the first side. The connecting block (13) is used to connect the water cooling plate (3).

7. The magnetic field generating device according to any one of claims 1 to 3, characterized in that: It also includes a handle (15), which is connected to the magnetic shoe bottom plate (14) and is located on the second side.

8. An unbalanced planar cathode, characterized in that: It comprises a target material (1), a backing plate (2), a water-cooling plate (3), a cathode seat (4), an insulating frame (5), and a magnetic field generating device (6) according to any one of claims 1 to 7; The cathode seat (4) is provided with a mounting hole, the magnetic field generating device (6) is arranged in the mounting hole, the water-cooling plate (3) is connected to the upper end of the cathode seat (4) and corresponds to the mounting hole, the back plate (2) is arranged on the upper side of the water-cooling plate (3), the target material (1) is arranged on the upper side of the back plate (2), and the insulating frame (5) is sleeved on the cathode seat (4).

9. The unbalanced planar cathode according to claim 8, characterized in that: A water filling area (32) is provided in the middle of the water cooling plate (3), and a water inlet pipe (24) and a water outlet pipe (25) are provided on both sides of the water cooling plate (3), and the water inlet pipe (24) and the water outlet pipe (25) are both connected to the water filling area (32); The water inlet pipe (24) and the water outlet pipe (25) are both provided through the cathode seat (4), and are both sealedly connected to the cathode seat (4) via a first sealing structure.

10. The unbalanced planar cathode according to claim 8, characterized in that: The back plate (2) is sealedly connected to the water-cooling plate (3) via a second sealing structure (28); The water-cooling plate (3) is sealed and connected to the cathode seat (4) via a third sealing structure (29); The insulating frame (5) is sealed and connected to the cathode seat (4) via a fourth sealing structure (30).

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