Detection device for CVD (chemical vapor deposition) film device

Abstract

The utility model discloses a CVD (chemical vapor deposition) film device detection device, which relates to the technical field of chemical vapor deposition and comprises a film coating table, a plurality of film coating grooves are annularly formed in the film coating table, a rotating table is fixedly mounted at the center of the film coating table, and a detection component is fixedly mounted above the rotating table. And a backpressure film covering assembly is arranged above the film covering groove, the detection assembly comprises a first electric telescopic rod, the driving end of the first electric telescopic rod is fixedly connected with a mounting table, and an industrial detection camera is fixedly mounted above the mounting table. According to the utility model, the industrial detection camera is used for observing whether the meshes of the filter screen in the backpressure laminating assembly are blocked or not, and under the condition that the meshes are blocked, the driving cylinder drives the mounting disc to move downwards, and the through hole rod penetrates through the meshes of the filter screen to eject solid particles, so that reaction gas can uniformly penetrate through the filter screen to be in contact with a plating piece; and the thickness of the film on the plated part is uniform and consistent.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical vapor deposition, and in particular to a CVD thin film device detection device. Background Art

[0002] Chemical vapor deposition (CVD) is a technology that uses gaseous precursor reactants to form solid thin films on substrate surfaces through gas-phase chemical reactions. During the reaction, the material source enters the process chamber in gaseous form. Under RF power and heating, the material source (reactant gas) receives activation energy from the plasma field, activating and enhancing the chemical reaction, thereby achieving chemical vapor deposition. The service life of a CVD thin film device is primarily affected by its consumables. This is generally estimated by counting the consumables used in the CVD thin film device.

[0003] When the CVD thin film device is coating the workpiece, the clogging of the small holes on the back pressure plate will cause the film thickness on the workpiece to be uneven, resulting in reduced mechanical and thermal properties of the workpiece. When subjected to external force, the thinner areas of the film will first crack. For workpieces with heat conduction requirements, uneven film thickness will also lead to uneven heat conduction, affecting the heat dissipation performance of the workpiece. Utility Model Content

[0004] The purpose of the utility model is to solve the problem in the prior art that the clogging of the small holes on the back pressure plate will lead to uneven film thickness on the plated parts, resulting in reduced mechanical and thermal properties of the plated parts, and to propose a CVD thin film device detection device.

[0005] In order to achieve the above-mentioned purpose, the utility model adopts the following technical solutions: a CVD thin film device detection device, comprising a coating table, a plurality of coating grooves are provided in an annular shape inside the coating table, a rotating table is fixedly installed at the center of the coating table, a detection assembly is fixedly installed above the rotating table, a back-pressure coating assembly is arranged above the coating groove, the detection assembly comprises a No. 1 electric telescopic rod, the driving end of the No. 1 electric telescopic rod is fixedly connected to the mounting table, an industrial detection camera is fixedly installed above the mounting table, a No. 2 electric telescopic rod is arranged on both sides of the back-pressure coating assembly, and the driving ends of two groups of the No. 2 electric telescopic rods are respectively fixedly installed on both sides of the back-pressure coating assembly.

[0006] Preferably, the back pressure coating assembly includes an installation chamber, a filter, a through hole assembly and a reaction gas introduction assembly, the filter is fixedly installed inside the installation chamber, the through hole assembly is arranged on one side of the filter, and the reaction gas introduction assembly is arranged between the through hole assembly and the filter.

[0007] Preferably, the back pressure coating assembly includes an installation chamber, a filter, a through hole assembly and a reaction gas introduction assembly, the filter is fixedly installed inside the installation chamber, the through hole assembly is arranged on one side of the filter, and the reaction gas introduction assembly is arranged between the through hole assembly and the filter.

[0008] Preferably, the reaction gas introduction component includes an air guide pipe and an air outlet pipe, the output end of the air guide pipe is fixedly connected to the input end of the air outlet pipe, and the outer side of the air outlet pipe is fixedly connected with a plurality of air guide ports.

[0009] Preferably, a sealing ring is fixedly mounted on the outer side of the mounting plate.

[0010] Preferably, a bottom ring is fixedly installed inside the installation bin, and a plurality of positioning rods are fixedly installed on one side of the bottom ring in a circular arrangement, and one end of the plurality of positioning rods movably passes through the interior of the installation plate.

[0011] Compared with the prior art, the advantages and positive effects of the present invention are:

[0012] 1. In the utility model, an industrial detection camera is used to observe whether the mesh of the filter in the back pressure laminating assembly is blocked. If it is blocked, the cylinder drives the mounting plate to move downward, and the through-hole rod passes through the mesh of the filter to push out the solid particles, ensuring that the reaction gas can evenly pass through the filter and contact the plated workpiece, so that the thickness of the film on the plated workpiece is uniform.

[0013] 2. In the present invention, by arranging four sets of gas outlet pipes in a ring shape inside the installation chamber, it is possible to ensure that the reaction gas is evenly discharged into the interior of the installation chamber, thereby ensuring that the thickness of the film on the surface of the plated part reaches a uniform and high standard. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 The present invention provides a schematic diagram of the three-dimensional structure of a CVD thin film device detection device;

[0015] Figure 2 The present invention provides a schematic diagram of the positional relationship between a detection component and a back pressure laminating component in a CVD thin film device detection device;

[0016] Figure 3 The utility model provides a three-dimensional structural diagram of a back pressure film covering component in a CVD thin film device detection device;

[0017] Figure 4 The utility model provides a three-dimensional structural schematic diagram of a reaction gas introduction component in a CVD thin film device detection device.

[0018] Legend: 1. Laminating table; 11. Laminating tank; 12. Rotating table; 2. Inspection assembly; 21. No. 1 electric telescopic rod; 22. Mounting table; 23. Industrial inspection camera; 3. Back pressure laminating assembly; 31. Mounting bin; 311. Mounting rack; 32. Filter; 33. Through-hole assembly; 331. Mounting plate; 332. Through-hole rod; 333. Driving cylinder; 334. Sealing ring; 34. Reaction gas inlet assembly; 341. Gas duct; 342. Gas outlet duct; 343. Gas port; 35. Bottom ring; 351. Positioning rod; 4. No. 2 electric telescopic rod. DETAILED DESCRIPTION

[0019] In order to more clearly understand the above-mentioned purpose, features and advantages of the present invention, the present invention is further described below with reference to the accompanying drawings and embodiments. It should be noted that the embodiments of the present application and the features therein can be combined with each other without conflict.

[0020] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments disclosed in the following specification.

[0021] Example 1: Figure 1 - Figure 4As shown, the utility model provides a CVD thin film device detection device, including a coating table 1, a plurality of coating grooves 11 are provided in an annular shape inside the coating table 1, a rotating table 12 is fixedly installed at the center of the coating table 1, a detection component 2 is fixedly installed above the rotating table 12, a back pressure coating component 3 is provided above the coating groove 11, the detection component 2 includes a No. 1 electric telescopic rod 21, the driving end of the No. 1 electric telescopic rod 21 is fixedly connected to the mounting table 22, an industrial detection camera 23 is fixedly installed above the mounting table 22, a No. 2 electric telescopic rod 4 is provided on both sides of the back pressure coating component 3, the driving ends of the two groups of No. 2 electric telescopic rods 4 are respectively fixedly installed on both sides of the back pressure coating component 3, the back pressure coating component 3 includes a mounting bin 31, a filter screen 32, a through hole component 33 and a reaction gas introduction component 34, the filter screen 3 2 is fixedly installed inside the installation chamber 31, the through-hole assembly 33 is arranged on one side of the filter screen 32, and the reaction gas introduction assembly 34 is arranged between the through-hole assembly 33 and the filter screen 32. The through-hole assembly 33 includes a mounting plate 331, and a plurality of through-hole rods 332 are fixedly installed on one side of the mounting plate 331. A mounting frame 311 is fixedly installed above the installation chamber 31, and a driving cylinder 333 is fixedly installed in the middle of the mounting frame 311. The driving end of the driving cylinder 333 is fixedly installed at the center of the other side of the mounting plate 331 by bolts. A sealing ring 334 is fixedly installed on the outside of the mounting plate 331. A bottom ring 35 is fixedly installed inside the installation chamber 31. A plurality of positioning rods 351 are fixedly installed in a circular arrangement on one side of the bottom ring 35. One end of the plurality of positioning rods 351 movably passes through the interior of the installation plate 331.

[0022] The following is a detailed description of the specific settings and functions of this embodiment. Before a single back pressure coating assembly 3 performs a coating operation on a plated piece, the No. 1 electric telescopic rod 21 drives the mounting platform 22 to move to the bottom of the back pressure coating assembly 3. The industrial detection camera 23 observes whether the mesh of the filter screen 32 in the back pressure coating assembly 3 is blocked. If it is blocked by solid particles, the driving cylinder 333 drives the mounting plate 331 to move downward, and the through-hole rod 332 passes through the mesh of the filter screen 32 to push out the solid particles. The rotating table 12 drives the industrial detection camera 23 Move to the inside of the next coating tank 11, detect another set of back-pressure coating components 3, and then the robotic arm places the plated workpiece inside the coating tank 11 and starts coating the plated workpiece, ensuring that the reaction gas can evenly pass through the filter 32 and contact the plated workpiece, so that the thickness of the film on the plated workpiece is uniform, and by installing a sealing ring 334 on the outside of the mounting plate 331, ensure the sealing of the mounting chamber 31; at the same time, the positioning rod 351 will constrain the movement trajectory of the mounting plate 331 to ensure that the through-hole rod 332 can accurately pass through the mesh of the filter 32.

[0023] Example 2: Figure 1 - Figure 4As shown, a CVD thin film device detection device includes a coating table 1, a plurality of coating grooves 11 are provided in an annular manner inside the coating table 1, a rotating table 12 is fixedly installed at the center of the coating table 1, a detection component 2 is fixedly installed above the rotating table 12, a back pressure coating component 3 is provided above the coating groove 11, the detection component 2 includes a No. 1 electric telescopic rod 21, a driving end of the No. 1 electric telescopic rod 21 is fixedly connected to a mounting table 22, an industrial detection camera 23 is fixedly installed above the mounting table 22, and a No. 2 electric telescopic rod 4 is provided on both sides of the back pressure coating component 3, and the driving ends of the two groups of No. 2 electric telescopic rods 4 are fixedly connected to the mounting table 22. The moving ends are fixedly mounted on both sides of the back pressure diaphragm assembly 3, and the back pressure diaphragm assembly 3 includes a mounting chamber 31, a filter screen 32, a through hole assembly 33 and a reaction gas introduction assembly 34. The filter screen 32 is fixedly mounted inside the mounting chamber 31, the through hole assembly 33 is arranged on one side of the filter screen 32, and the reaction gas introduction assembly 34 is arranged between the through hole assembly 33 and the filter screen 32. The reaction gas introduction assembly 34 includes an air guide pipe 341 and an air outlet pipe 342. The output end of the air guide pipe 341 is fixedly connected to the input end of the air outlet pipe 342, and the outer side of the air outlet pipe 342 is fixedly connected with several air guide ports 343.

[0024] The effect achieved by the entire embodiment is that after cleaning the filter 32, the No. 2 electric telescopic rod 4 drives the back pressure coating assembly 3 to fall into the coating tank 11, and the reaction gas enters the interior of the installation chamber 31 through the air guide pipe 341, the air outlet pipe 342 and the air guide port 343 in turn, and then passes through the filter 32 to contact the plated workpiece for chemical vapor deposition coating. Among them, the four groups of air outlet pipes 342 are arranged in a ring inside the installation chamber 31, which can ensure that the reaction gas is evenly discharged into the interior of the installation chamber 31, thereby ensuring that the thickness of the film on the surface of the plated workpiece reaches a uniform and high standard.

[0025] The usage and working principle of this device are as follows: before a single back-pressure coating assembly 3 performs coating operation on the plated workpiece, the No. 1 electric telescopic rod 21 drives the mounting platform 22 to move to the bottom of the back-pressure coating assembly 3, and the industrial detection camera 23 observes whether the mesh of the filter screen 32 in the back-pressure coating assembly 3 is blocked. If it is blocked by solid particles, the driving cylinder 333 drives the mounting plate 331 to move downward, and the through-hole rod 332 passes through the mesh of the filter screen 32 to push out the solid particles. The rotating table 12 drives the industrial detection camera 23 to move to the inside of the next coating tank 11 to detect another set of back-pressure coating assemblies 3. Then the robotic arm places the plated workpiece inside the coating tank 11, and the No. 2 electric telescopic rod 4 drives the back-pressure coating assembly 3 to fall into the inside of the coating tank 11. The reaction gas enters the interior of the mounting bin 31 through the gas guide pipe 341, the gas outlet pipe 342 and the gas guide port 343 in turn, and then passes through the filter screen 32 to contact the plated workpiece for chemical vapor deposition coating.

[0026] The above are only preferred embodiments of the present invention and are not intended to limit the present invention in any other form. Any technician familiar with the profession may use the technical content disclosed above to change or modify it into an equivalent embodiment with equivalent changes and apply it to other fields. However, any simple modification, equivalent change and modification of the above embodiment made according to the technical essence of the present invention without departing from the content of the technical solution of the present invention shall still fall within the scope of protection of the technical solution of the present invention.

Claims

1. A CVD thin film device detection device, comprising a coating stage (1), characterized in that: The coating platform (1) is provided with a plurality of coating grooves (11) in an annular shape inside. A rotating platform (12) is fixedly installed at the center of the coating platform (1). A detection component (2) is fixedly installed above the rotating platform (12). A back-pressure coating component (3) is provided above the coating groove (11). The detection component (2) comprises a No. 1 electric telescopic rod (21). The driving end of the No. 1 electric telescopic rod (21) is fixedly connected to a mounting platform (22). An industrial detection camera (23) is fixedly installed above the mounting platform (22). A No. 2 electric telescopic rod (4) is provided on both sides of the back-pressure coating component (3). The driving ends of two groups of the No. 2 electric telescopic rods (4) are fixedly installed on both sides of the back-pressure coating component (3).

2. The CVD thin film device detection device according to claim 1, characterized in that: The back pressure coating assembly (3) comprises an installation chamber (31), a filter screen (32), a through hole assembly (33) and a reaction gas introduction assembly (34); the filter screen (32) is fixedly installed inside the installation chamber (31); the through hole assembly (33) is arranged on one side of the filter screen (32); and the reaction gas introduction assembly (34) is arranged between the through hole assembly (33) and the filter screen (32).

3. The CVD thin film device detection device according to claim 2, characterized in that: The through-hole assembly (33) comprises a mounting plate (331), a plurality of through-hole rods (332) are fixedly mounted on one side of the mounting plate (331), a mounting frame (311) is fixedly mounted above the mounting chamber (31), a driving cylinder (333) is fixedly mounted in the middle of the mounting frame (311), and a driving end of the driving cylinder (333) is fixedly mounted at the center of the other side of the mounting plate (331) by means of bolts.

4. The CVD thin film device detection device according to claim 2, characterized in that: The reaction gas introduction component (34) comprises a gas guide pipe (341) and a gas outlet pipe (342), the output end of the gas guide pipe (341) is fixedly connected to the input end of the gas outlet pipe (342), and the outer side of the gas outlet pipe (342) is fixedly connected to a plurality of gas guide ports (343).

5. The CVD thin film device detection device according to claim 3, characterized in that: A sealing ring (334) is fixedly mounted on the outer side of the mounting plate (331).

6. The CVD thin film device detection device according to claim 3, characterized in that: A bottom ring (35) is fixedly installed inside the installation chamber (31), and a plurality of positioning rods (351) are fixedly installed on one side of the bottom ring (35) in a circular arrangement. One end of the plurality of positioning rods (351) is movably inserted into the interior of the installation plate (331).

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