Closed dust removal system applied to chemical industry

Abstract

The utility model discloses a closed dust removal system applied to the chemical industry, and relates to the technical field of industrial gas dust removal. The device comprises a dust removal tower (1), the top of the dust removal tower (1) is connected with an exhaust pipe (2) for exhausting purified gas; the middle part of the dust removal tower (1) is connected with a gas inlet pipe (5) for feeding dust-containing feed gas; the bottom of the dust removal tower (1) is connected with a blow-off pipe (7); the circulating pipeline is used for circulating washing liquid for washing dust, and a liquid supplementing pipe (9) for supplementing the washing liquid is further connected to the dust removal tower (1). According to the closed dust removal system applied to the chemical industry provided by the utility model, the whole dust removal system is a closed environment and can be suitable for harsh working conditions such as high temperature, acid and alkali corrosion, flammable and explosive conditions and the like.

Description

Technical Field

[0001] The utility model relates to the field of industrial gas dust removal, in particular to a closed dust removal system used in the chemical industry. Background Art

[0002] Dust removal refers to the technical measures used to remove particulate matter from dust-laden gases to reduce atmospheric emissions. Dust-laden industrial waste gas can be generated by mechanical processes such as the crushing, screening, conveying, and blasting of solid materials, or by processes such as combustion, high-temperature melting, and chemical reactions. Dust collectors are widely used to control the dust and smoke generated in waste gas. Dust collectors currently used in industry generally employ conventional dust removal equipment and processes, such as bag filters, wire mesh filters, or water curtains.

[0003] However, existing dust removal equipment generally cannot be used in harsh working conditions such as high temperature, acid and alkali corrosion, flammable and explosive materials. Therefore, it is necessary to develop a dust removal system suitable for harsh working conditions such as high temperature, acid and alkali corrosion, flammable and explosive materials.

[0004] The applicant has discovered that the prior art has at least the following technical problems:

[0005] Existing dust removal devices such as bag filters, wire mesh filters or water curtain dust removal cannot be used in harsh working conditions such as high temperature, acid and alkali corrosion, flammable and explosive conditions. Utility Model Content

[0006] The purpose of this utility model is to provide a closed dust removal system for use in the chemical industry, addressing the technical problem that existing dust removal devices, such as bag filters, wire mesh filters, or water curtain dust collectors, cannot be used in harsh working conditions such as high temperatures, acid and alkali corrosion, and flammable and explosive environments. The various technical effects achieved by the preferred technical solution among the various technical solutions provided by this utility model are detailed below.

[0007] To achieve the above objectives, the present invention provides the following technical solutions:

[0008] The utility model provides a closed dust removal system used in the chemical industry, comprising a dust removal tower and a control device; wherein,

[0009] The top of the dust removal tower is connected to an exhaust pipe for discharging purified gas, and the exhaust pipe is connected to a pressure sensor and a temperature sensor;

[0010] The middle part of the dust removal tower is connected to an air inlet pipe for the intake of dust-containing raw gas, and the air inlet pipe is connected to an air inlet valve;

[0011] The bottom of the dust removal tower is connected to a sewage pipe, and the sewage pipe is connected to a sewage valve;

[0012] The system further comprises a circulation pipeline for circulating a washing liquid for washing dust, wherein the liquid inlet end of the circulation pipeline is connected to the lower part of the dust removal tower, the liquid outlet end of the circulation pipeline extends into the washing tower, and the liquid outlet end of the circulation pipeline is connected to a spray pipeline, and the spray pipeline is connected to a plurality of spray heads; the spray heads are all located on the upper side of the air inlet pipe;

[0013] The dust removal tower is also connected to a liquid replenishing pipe for replenishing washing liquid, and the liquid replenishing pipe is connected to a liquid replenishing valve;

[0014] The dust removal tower is further provided with a liquid level sensor 1 and a liquid level sensor 2 at the high liquid level and the low liquid level;

[0015] The pressure sensor, temperature sensor, air inlet valve, sewage discharge valve, liquid replenishing valve, liquid level sensor 1 and liquid level sensor 2 are all electrically connected to the control device respectively.

[0016] Optionally or preferably, the circulation pipeline includes a circulation main pipe and a pumping branch pipe 1 and a pumping branch pipe 2 connected to the circulation main pipe; wherein,

[0017] The pumping branch pipe 1 is connected to the liquid inlet valve A, the drain pipe A, the circulating pump 1, the drain pipe B, and the liquid inlet valve B in sequence along the liquid inlet direction; the drain pipe A is connected to the drain valve A, the drain pipe B is connected to the drain valve B, and the pumping branch pipe 1 is also connected to the pressure sensor 1;

[0018] The second pumping branch pipe is connected to the liquid inlet valve C, the drain pipe C, the second circulating pump, the drain pipe D, and the liquid inlet valve D in sequence along the liquid inlet direction; the drain pipe C is connected to the drain valve C, and the drain pipe D is connected to the drain valve D. The second pumping branch pipe is also connected to the second pressure sensor;

[0019] The circulation main pipe is connected to a circulation liquid inlet valve; the liquid inlet valve A, drain valve A, circulation pump 1, drain valve B, liquid inlet valve B, pressure sensor 1, liquid inlet valve C, drain valve C, circulation pump 2, drain valve D, liquid inlet valve D, and pressure sensor 2 are all electrically connected to the control device respectively.

[0020] Optionally or preferably, the circulation pump 1 and the circulation pump 2 are both slurry pumps.

[0021] Optionally or preferably, the liquid replenishing pipe is connected to the upper part of the dust removal tower.

[0022] Optionally or preferably, it further includes a drain pipe connected to the lower part of the dust removal tower, and the drain pipe is connected to a drain valve.

[0023] Optionally or preferably, the dust removal tower is further provided with a plurality of observation mirrors.

[0024] Optionally or preferably, the dust removal tower is further provided with a maintenance manhole.

[0025] Optionally or preferably, the control device is a PLC.

[0026] Based on the above technical solution, the embodiments of the present utility model can produce at least the following technical effects:

[0027] The utility model provides a closed dust removal system for use in the chemical industry. During dust removal, raw gas containing dust enters from an air inlet pipe. After entering, the raw gas is countercurrently contacted with a circulating washing liquid sprayed from the upper part of a tower. The washing liquid can wash away 96%-98% of the dust in the raw gas. After washing the dust, purified gas is obtained. The remaining 2%-4% of small dust particles continue to remain in the purified gas and are discharged from the exhaust pipe at the top of the tower. The dust in the discharged purified gas is greatly reduced, which greatly reduces the operating load of subsequent system processing and avoids the blockage of subsequent pipelines and equipment. The dust washed by the washing liquid is mixed with the washing liquid and deposited at the bottom of the dust removal tower, and is continuously discharged from the sewage pipe at the bottom of the dust removal tower; at the same time, the washing liquid is continuously replenished into the dust removal tower through the liquid replenishment pipe. The liquid level sensor 1 and liquid level sensor 2 set can monitor the liquid level in the dust removal tower. When the liquid level in the dust removal tower reaches the high liquid level of the position of the liquid level sensor 1, the liquid replenishment valve is controlled by the control device to close, and the liquid replenishment from the liquid replenishment pipe is stopped; when the liquid level in the dust removal tower reaches the high liquid level of the position of the liquid level sensor 2, the liquid replenishment valve is controlled by the control device to open, and the liquid is replenished from the liquid replenishment pipe, thereby ensuring the stability of the liquid level at the bottom of the dust removal tower; the entire dust removal process is continuous and stable; the upper slurry liquid at the bottom of the dust removal tower is transported to the top of the dust removal tower through the circulation main pipe and the pumping branch pipe 1 and pumping branch pipe 2 connected to the circulation main pipe, and then enters the tower to spray the raw gas to wash the dust and circulate. The utility model provides a closed dust removal system for use in the chemical industry. The entire dust removal system is a closed environment and can be applied to relatively harsh working conditions such as high temperature, acid and alkali corrosion, and flammable and explosive conditions. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0029] Figure 1 It is a structural schematic diagram of an embodiment of the present utility model.

[0030] Figure: 1. Dust removal tower; 2. Exhaust pipe; 3. Pressure sensor; 4. Temperature sensor; 5. Inlet pipe; 6. Inlet valve; 7. Drain pipe; 8. Drain valve; 9. Liquid replenishment pipe; 10. Liquid replenishment valve; 11. Circulation main pipe; 12. Pumping branch pipe 1; 13. Pumping branch pipe 2; 14. Liquid inlet valve A; 15. Drain valve A; 16. Circulation pump 1; 17. Drain valve B; 18. Liquid inlet valve B; 19. Pressure sensor 1; 20. Liquid inlet valve C; 21. Drain valve C; 22. Circulation pump 2; 23. Drain valve D; 24. Liquid inlet valve D; 25. Pressure sensor 2; 26. Liquid level sensor 1; 27. Liquid level sensor 2; 28. Drain pipe; 29. ​​Drain valve; 30. Observation mirror; 31. Inspection manhole; 32. Bypass pipe; 33. Bypass refill valve; 34. Spray pipe; 35. Spray head; 36. Circulating liquid inlet valve; 37. Drain pipe A; 38. Drain pipe B; 39. Drain pipe C; 40. Drain pipe D; 41. Front liquid valve; 42. Rear liquid valve. DETAILED DESCRIPTION

[0031] To make the purpose, technical solution, and advantages of the present invention more clear, the technical solution of the present invention will be described in detail below. Obviously, the embodiments described are only some of the embodiments of the present invention, and not all of them. Based on the embodiments of the present invention, all other implementation methods obtained by ordinary technicians in this field without making any creative efforts are within the scope of protection of the present invention.

[0032] like Figure 1 As shown:

[0033] The utility model provides a closed dust removal system used in the chemical industry, comprising a dust removal tower 1 and a control device; wherein,

[0034] The top of the dust removal tower 1 is connected to an exhaust pipe 2 for discharging purified gas, and the exhaust pipe 2 is connected to a pressure sensor 3 and a temperature sensor 4;

[0035] The middle of the dust removal tower 1 is connected to an air intake pipe 5 for the intake of dust-containing raw gas, and the air intake pipe 5 is connected to an air intake valve 6;

[0036] The bottom of the dust removal tower 1 is connected to a sewage pipe 7, and the sewage pipe 7 is connected to a sewage valve 8;

[0037] The system further includes a circulation pipeline for circulating a washing liquid for washing dust. The liquid inlet end of the circulation pipeline is connected to the lower part of the dust removal tower 1, and the liquid outlet end of the circulation pipeline extends into the washing tower. The liquid outlet end of the circulation pipeline is connected to a spray pipeline 34, and the spray pipeline 34 is connected to a plurality of nozzles 35. The nozzles 35 are all located on the upper side of the air inlet pipe 5.

[0038] The dust removal tower 1 is also connected to a liquid replenishing pipe 9 for replenishing the washing liquid, and the liquid replenishing pipe 9 is connected to a liquid replenishing valve 10; the front and rear sides of the liquid replenishing valve 10 are respectively provided with a front liquid replenishing valve 41 and a rear liquid replenishing valve 42;

[0039] The dust removal tower 1 is further provided with a liquid level sensor 1 26 and a liquid level sensor 2 27 at the high liquid level and the low liquid level;

[0040] The pressure sensor 3, the temperature sensor 4, the air inlet valve 6, the drain valve 8, the liquid replenishing valve 10, the liquid level sensor 1 26 and the liquid level sensor 2 27 are all electrically connected to the control device respectively.

[0041] The utility model provides a closed dust removal system for use in the chemical industry. During dust removal, raw gas containing dust enters from the air inlet pipe 5. After entering, the raw gas is countercurrently contacted with the circulating washing liquid sprayed from the upper part of the tower. The washing liquid can wash away 96%-98% of the dust in the raw gas. After washing the dust, purified gas is obtained. The remaining 2%-4% of small particles of dust continue to remain in the purified gas and are discharged from the exhaust pipe 2 at the top of the tower. The dust in the discharged purified gas is greatly reduced, which greatly reduces the operating load of subsequent system processing and avoids the blockage of subsequent pipelines and equipment. The dust removed by the washing liquid is mixed with the washing liquid and deposited at the bottom of the dust removal tower 1, and is continuously discharged from the sewage pipe 7 at the bottom of the dust removal tower 1. At the same time, the washing liquid is continuously replenished into the dust removal tower 1 through the liquid replenishment pipe 9. The liquid level sensor 1 26 and the liquid level sensor 2 27 are provided to monitor the liquid level in the dust removal tower 1. When the position of the liquid level sensor 1 26 (the high liquid level) is reached in the dust removal tower 1, the control device controls the liquid replenishment valve 10 to close, and the replenishment from the liquid replenishment pipe 9 is stopped. When the level in the dust removal tower 1 reaches the position of the second liquid level sensor 27 (the high liquid level), the control device controls the refill valve 10 to open and refills the liquid from the refill pipe 9, thereby ensuring the stability of the liquid level at the bottom of the dust removal tower 1. The entire dust removal process is continuous and stable. The upper slurry liquid at the bottom of the dust removal tower 1 is transported to the top of the dust removal tower 1 through the circulation main pipe 11 and the pumping branch pipe 1 12 and pumping branch pipe 2 13 connected to the circulation main pipe 11. The slurry then enters the tower to spray and wash the raw gas for dust, and then circulates. The enclosed dust removal system used in the chemical industry provided by the utility model is a closed environment and can be applied to relatively harsh working conditions such as high temperature, acid and alkali corrosion, and flammable and explosive conditions.

[0042] As an optional embodiment, the circulation pipeline includes a circulation main pipe 11 and a pumping branch pipe 12 and a pumping branch pipe 2 13 connected to the circulation main pipe 11; wherein,

[0043] The pumping branch pipe 12 is connected to the liquid inlet valve A14, the drain pipe A37, the circulating pump 16, the drain pipe B38, and the liquid inlet valve B18 in sequence along the liquid inlet direction; the drain pipe A37 is connected to the drain valve A15, and the drain pipe B38 is connected to the drain valve B17. The pumping branch pipe 12 is also connected to a pressure sensor 19.

[0044] The second pumping branch pipe 13 is connected to the liquid inlet valve C20, the drain pipe C39, the second circulating pump 22, the drain pipe D40, and the liquid inlet valve D23 in sequence along the liquid inlet direction; the drain pipe C39 is connected to the drain valve C21, and the drain pipe D40 is connected to the drain valve D23. The second pumping branch pipe 13 is also connected to the second pressure sensor 25.

[0045] The circulating main pipe 11 is connected to a circulating liquid inlet valve; the liquid inlet valve A14, drain valve A15, circulating pump 16, drain valve B17, liquid inlet valve B18, pressure sensor 19, liquid inlet valve C20, drain valve C21, circulating pump 22, drain valve D23, liquid inlet valve D23, and pressure sensor 2 25 are all electrically connected to the control device. The present invention is designed with two pumping branches, namely pumping branch 12 and pumping branch 2 13, which can be used alternately in specific applications. For example, if there is a problem with the circulating pump 16 in the pumping branch 12 or the pumping branch 12 cannot circulate liquid normally due to other reasons, the pumping branch 2 13 can be used as a replacement for the circulating liquid. The design of two pumping branches can ensure the stable operation of the entire dust removal system.

[0046] As an optional embodiment, the circulating pump 16 and the circulating pump 2 22 are both slurry pumps. Since the liquid transported by the circulating pump 16 and the circulating pump 2 22 is a slurry mixture, in order to avoid wear on the pump impeller, a dedicated slurry pump needs to be selected. At the same time, the nozzle adopts a porous mesh structure, and the pore size is generally 3mm-8mm. The specific pore size can be selected according to the actual working conditions, with the requirement of not being easy to clog. In addition, according to actual needs, if it is necessary to improve the spray washing effect, a two-layer or three-layer nozzle 35 can also be used for spraying. Figure 1 Only one layer of nozzles 35 is drawn.

[0047] As an optional embodiment, the liquid replenishing pipe 9 is connected to the upper part of the dust removal tower 1.

[0048] As an optional embodiment, it further includes a drain pipe 28 connected to the lower part of the dust removal tower 1, and the drain pipe 28 is connected to a drain valve 29.

[0049] As an optional embodiment, the dust removal tower 1 is further provided with a plurality of observation mirrors 30. The observation mirrors 30 are provided to facilitate the staff to observe whether the working process of the dust removal tower 1 is stable and whether there is any abnormality during the inspection.

[0050] As an optional embodiment, the dust removal tower 1 is further provided with a maintenance manhole 31. The maintenance manhole 31 is provided to facilitate maintenance of the dust removal tower 1 when maintenance is required.

[0051] As an optional embodiment, the bypass pipe 32 is further included, which is connected to both ends of the liquid replenishing valve 10 . The bypass pipe 32 is connected to a bypass liquid replenishing valve 33 .

[0052] As an optional implementation, the control device is a PLC.

[0053] The working process of the closed dust removal system used in the chemical industry provided by the utility model is as follows:

[0054] The control device controls the air inlet valve 6 to open, and the dust-containing raw gas enters from the air inlet pipe 5. After entering, the raw gas is in countercurrent contact with the circulating washing liquid sprayed from the upper part of the tower. The washing liquid can wash away 96%-98% of the dust in the raw gas. After washing the dust, purified gas is obtained, and the remaining 2%-4% of small particles of dust continue to remain in the purified gas and are discharged from the exhaust pipe 2 at the top of the tower. The pressure sensor 3 and temperature sensor 4 connected to the exhaust pipe 2 can monitor the pressure and temperature of the purified gas discharged to monitor the operation of the dust removal system; the dust in the discharged purified gas is greatly reduced, which greatly reduces the operating load of the subsequent system processing and avoids the blockage of subsequent pipelines and equipment.

[0055] The dust washed by the washing liquid is mixed with the washing liquid and deposited at the bottom of the dust removal tower 1, and is continuously discharged from the sewage pipe 7 at the bottom of the dust removal tower 1; at the same time, the washing liquid is continuously replenished into the dust removal tower 1 through the liquid replenishment pipe 9, and the liquid level sensor 1 26 and the liquid level sensor 2 27 are set to monitor the liquid level in the dust removal tower 1. When the position of the liquid level sensor 1 26 (high liquid level) is reached in the dust removal tower 1, the liquid replenishment valve 10 is controlled by the control device to close, and the liquid replenishment from the liquid replenishment pipe 9 is stopped; when the dust removal tower 1 reaches the position of the liquid level sensor 1 26 (high liquid level), the liquid replenishment valve 10 is controlled by the control device to close, and the liquid replenishment from the liquid replenishment pipe 9 is stopped; when the dust removal tower 1 reaches the position of the liquid level sensor 1 When the liquid level in the dust tower 1 reaches the position of the liquid level sensor 2 27 (the high liquid level), the control device controls the liquid replenishing valve 10 to open and replenishes the liquid from the liquid replenishing pipe 9, thereby ensuring the stability of the liquid level at the bottom of the dust removal tower 1; the entire dust removal process is continuous and stable; and the upper slurry liquid at the bottom of the dust removal tower 1 is transported to the top of the dust removal tower 1 through the circulation main pipe 11 and the pumping branch pipe 1 12 and the pumping branch pipe 2 13 connected to the circulation main pipe 11, and then enters the tower to spray the raw gas to wash the dust, and the cycle is carried out.

[0056] The above is only a specific implementation method of the present invention, but the protection scope of the present invention is not limited to this. Any technician familiar with this technical field can easily think of changes or replacements within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A closed dust removal system used in the chemical industry, characterized in that: It comprises a dust removal tower (1) and a control device; wherein, The top of the dust removal tower (1) is connected to an exhaust pipe (2) for discharging purified gas, and the exhaust pipe (2) is connected to a pressure sensor (3) and a temperature sensor (4); An air inlet pipe (5) for intake of dust-containing raw gas is connected to the middle of the dust removal tower (1), and an air inlet valve (6) is connected to the air inlet pipe (5); The bottom of the dust removal tower (1) is connected to a sewage pipe (7), and the sewage pipe (7) is connected to a sewage valve (8); It also includes a circulation pipeline for circulating a washing liquid for washing dust, wherein the liquid inlet end of the circulation pipeline is connected to the lower part of the dust removal tower (1), the liquid outlet end of the circulation pipeline extends into the washing tower, and the liquid outlet end of the circulation pipeline is connected to a spray pipeline (34), and the spray pipeline (34) is connected to a plurality of spray heads (35); the spray heads (35) are all located on the upper side of the air inlet pipe (5); The dust removal tower (1) is also connected to a liquid replenishing pipe (9) for replenishing washing liquid, and the liquid replenishing pipe (9) is connected to a liquid replenishing valve (10); The dust removal tower (1) is further provided with a first liquid level sensor (26) and a second liquid level sensor (27) at a high liquid level and a low liquid level; The pressure sensor (3), temperature sensor (4), air inlet valve (6), drain valve (8), liquid replenishing valve (10), liquid level sensor 1 (26) and liquid level sensor 2 (27) are all electrically connected to the control device.

2. The closed dust removal system used in the chemical industry according to claim 1, characterized in that: The circulation pipeline includes a circulation main pipe (11) and a pumping branch pipe 1 (12) and a pumping branch pipe 2 (13) connected to the circulation main pipe (11); wherein, The pumping branch pipe 1 (12) is connected to a liquid inlet valve A (14), a drain pipe A (37), a circulating pump 1 (16), a drain pipe B (38), and a liquid inlet valve B (18) in sequence along the liquid inlet direction; the drain pipe A (37) is connected to a drain valve A (15), the drain pipe B (38) is connected to a drain valve B (17), and the pumping branch pipe 1 (12) is also connected to a pressure sensor 1 (19); The second pumping branch pipe (13) is connected to the liquid inlet valve C (20), the drain pipe C (39), the second circulating pump (22), the drain pipe D (40), and the liquid inlet valve D (24) in sequence along the liquid inlet direction; the drain pipe C (39) is connected to the drain valve C (21), the drain pipe D (40) is connected to the drain valve D (23), and the second pumping branch pipe (13) is also connected to the second pressure sensor (25); The circulation main pipe (11) is connected to a circulation liquid inlet valve; the liquid inlet valve A (14), the drain valve A (15), the circulation pump 1 (16), the drain valve B (17), the liquid inlet valve B (18), the pressure sensor 1 (19), the liquid inlet valve C (20), the drain valve C (21), the circulation pump 2 (22), the drain valve D (23), the liquid inlet valve D (24), and the pressure sensor 2 (25) are all electrically connected to the control device.

3. The closed dust removal system used in the chemical industry according to claim 2, characterized in that: The circulating pump 1 (16) and the circulating pump 2 (22) are both slurry pumps.

4. The closed dust removal system used in the chemical industry according to claim 1, characterized in that: The liquid replenishing pipe (9) is connected to the upper part of the dust removal tower (1).

5. The closed dust removal system used in the chemical industry according to claim 1, characterized in that: It also includes a drain pipe (28) connected to the lower part of the dust removal tower (1), and a drain valve (29) is connected to the drain pipe (28).

6. The closed dust removal system used in the chemical industry according to claim 1, characterized in that: The dust removal tower (1) is also provided with several observation mirrors (30).

7. The closed dust removal system used in the chemical industry according to claim 1, characterized in that: The dust removal tower (1) is also provided with a maintenance manhole (31).

8. The closed dust removal system for use in the chemical industry according to any one of claims 1 to 7, characterized in that: The control device is a PLC.

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