Peripheral exposure machine capable of avoiding color unevenness

Abstract

The utility model provides a periphery exposure machine capable of avoiding uneven color (Mura), which comprises a carrying table, a light source and a darkroom, the carrying table comprises a base, a cover plate and a plurality of support rods; the cover plate is arranged above the base, the edge of the cover plate is of an inclined plane design, the upper surface of the cover plate is of a mirror surface structure, the supporting rods are fixed to the base in an array sequencing mode, and the upper ends of the supporting rods penetrate through the cover plate; the light source is arranged right above the edge of the carrying table, and the darkroom is arranged on one side of the carrying table and correspondingly absorbs reflected light of the inclined face. The utility model has the advantages of simple structure, convenience in operation and low improvement cost, does not need to smear an absorbent regularly, prevents stray light from being generated, and avoids secondary exposure on a product, uneven color and poor product taste.

Description

Technical Field

[0001] The utility model relates to the technical field of exposure machine equipment, in particular to a peripheral exposure machine that avoids color unevenness. Background Art

[0002] The lithography process in LCD panel manufacturing includes cleaning, photoresist coating, vacuum drying (VCD), soft baking, exposure, perimeter exposure, development, hard baking, and inspection. Perimeter exposure is an essential step, exposing excess photoresist around the glass. Development dissolves and removes this excess film. This ensures that the etching process completely removes any excess film around the glass, preventing residual metal, indium tin oxide (ITO), silicon nitride, and other thin films from forming, which could cause anomalies during the plasma process and sealant processing.

[0003] like Figure 1 As shown, existing peripheral exposure machines, to create a glass carrier at a low cost, have support rods 2' arranged in an array on a base 1'. A cover plate 3' is placed on the base 1' to form the carrier, and a light source 4' is positioned directly above the edge of the carrier. During use, an absorbent is regularly applied to the cover plate 3'. The product glass is placed on the carrier by a robotic arm, positioned, and then scanned for exposure. During exposure, the UV light from above shines on the product glass, partially transmitting through the glass and continuing to the cover plate 3'. Because the cover plate 3' is made of rough, oxidized stainless steel, some of the UV light is absorbed by the absorbent, while some is diffusely reflected. The diffusely reflected UV light is exposed around the support rods 2', while the top of the support rods 2' is not exposed because it blocks the diffusely reflected UV light. This creates a circular color unevenness, resulting in poor quality. Summary of the Invention

[0004] The technical problem to be solved by the utility model is to provide a device with a simple structure, easy operation, low modification cost, no need to apply absorbent regularly, prevent the generation of stray light, avoid secondary exposure on the product, resulting in uneven color and poor product taste.

[0005] The utility model is realized as follows: a peripheral exposure machine for avoiding color unevenness, comprising

[0006] A carrier, comprising a base, a cover, and a plurality of support rods; the cover is disposed above the base, has an inclined edge, and the upper surface of the cover is a mirrored structure; the support rods are fixed to the base in an array and have their upper ends passing through the cover;

[0007] a light source, disposed just above the edge of the carrier;

[0008] A darkroom is arranged on one side of the carrier and correspondingly absorbs the reflected light from the inclined surface.

[0009] Furthermore, the light source is an ultraviolet light source.

[0010] Furthermore, the cover is made of stainless steel or glass.

[0011] Furthermore, the inner wall of the darkroom is covered with a wave-absorbing material or is provided with a wave-absorbing mechanism.

[0012] The advantages of the present invention are as follows: the present invention replaces the peripheral exposure machine-mounted stage cover of the existing equipment with a mirror material, and utilizes the principle of mirror reflection. During exposure, part of the ultraviolet light passing through the product will be reflected on the cover of the mirror material, thereby preventing the reflected light from scattering in all directions and preventing the ultraviolet light from forming a circular color unevenness on the top plate of the support rod, resulting in poor quality. In addition, the present invention provides a darkroom on one side of the stage for absorbing the reflected light of the ultraviolet light, further preventing the reflected light from affecting the photoresist exposure effect of the product. The present invention is a simple structure, easy to operate, and low modification cost. It does not require regular application of absorbent, thereby preventing the generation of stray light and avoiding secondary exposure on the product, which would form uneven color and result in poor product quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0014] Figure 1 This is a structural diagram of an existing peripheral exposure airborne platform.

[0015] Figure 2 This is a schematic structural diagram of the peripheral exposure machine of the present utility model.

[0016] Description of the accompanying drawings: base 1', support rod 2', cover 3', light source 4', carrier 1, base 11, cover 12, inclined surface 121, support rod 13, light source 2, darkroom 3, product 100. DETAILED DESCRIPTION

[0017] The following is a clear and complete description of the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0018] like Figure 2 As shown, the present invention is a peripheral exposure machine for avoiding color unevenness, comprising a carrier 1 , a light source 2 and a darkroom 3 .

[0019] The carrier 1 includes a base 11, a cover 12, and a plurality of support rods 13; the cover 12 is arranged above the base 11, and its edge is designed as an inclined surface 121. The upper surface of the cover 12 is a mirror structure. Preferably, the cover 12 is made of stainless steel or glass. The support rods 13 are arranged in an array and fixed on the base 11, and the upper ends thereof pass through the cover 12.

[0020] The light source 2 is disposed just above the edge of the carrier 1 , and the light source 2 is an ultraviolet light source.

[0021] The darkroom 3 is disposed on one side of the carrier 1 , and an inner wall of the darkroom 3 is covered with a wave-absorbing material or provided with a wave-absorbing structure for absorbing the reflected light from the inclined surface 121 .

[0022] The product 100 to be peripherally exposed is placed on the top of the support rod 13, and the edge of the product 100 to be exposed corresponds to the edge of the carrier 1, and the ultraviolet light is vertically incident on the product 100 from directly above the edge of the carrier for exposure. Since part of the ultraviolet light penetrates the product 10 and continues to propagate onto the cover 12, the ultraviolet light will be reflected on the mirror surface because the surface of the inclined surface 121 of the cover 12 is a mirror design. Since the edge of the cover 12 is a tilted surface design, the ultraviolet light will be reflected to the outside of the carrier 1, and a darkroom 3 is set outside the carrier 1 to absorb the reflected ultraviolet light, thereby preventing the reflected ultraviolet light from affecting the photoresist exposure effect of the product.

[0023] The present invention replaces the peripheral exposure machine-borne stage cover of the existing equipment with a mirror material. Utilizing the principle of mirror reflection, during exposure, part of the ultraviolet light passing through the product 100 will be reflected on the mirror material cover 12, preventing the reflected light from scattering in all directions and preventing the ultraviolet light from forming a circular color unevenness on the top plate of the support rod 13, resulting in poor quality. Furthermore, the present invention provides a darkroom on one side of the stage for absorbing the reflected ultraviolet light, further preventing the reflected light from affecting the product photoresist exposure effect. The present invention is simple in structure, easy to operate, and low in modification cost. It does not require regular application of absorbent, prevents the generation of stray light, and avoids secondary exposure on the product, which would cause uneven color and poor product quality.

[0024] Although the specific implementation methods of the present invention are described above, those skilled in the art should understand that the specific embodiments described are merely illustrative and are not intended to limit the scope of the present invention. Equivalent modifications and changes made by those skilled in the art in accordance with the spirit of the present invention should be included within the scope of protection of the claims of the present invention.

Claims

1. A peripheral exposure device for avoiding color unevenness, characterized by: include A carrier, comprising a base, a cover, and a plurality of support rods; the cover is disposed above the base, has an inclined edge, and the upper surface of the cover is a mirrored structure; the support rods are fixed to the base in an array and have their upper ends passing through the cover; a light source, disposed just above the edge of the carrier; A darkroom is arranged on one side of the carrier and correspondingly absorbs the reflected light from the inclined surface.

2. The peripheral exposure device for avoiding color unevenness according to claim 1, characterized in that: The light source is an ultraviolet light source.

3. The peripheral exposure device for avoiding color unevenness according to claim 1, characterized in that: The cover plate is made of stainless steel or glass.

4. The peripheral exposure device for avoiding color unevenness according to claim 1, characterized in that: The inner wall of the darkroom is covered with a wave-absorbing material or is provided with a wave-absorbing mechanism.

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