Gas distribution structure

Abstract

The utility model provides a gas distribution structure, and belongs to the technical field of semiconductor production equipment, the gas distribution structure comprises a cavity, a first anti-adhesion plate, a second anti-adhesion plate and a gas distribution ring, when process gas is fed through a gas inlet, the process gas can be uniformly dispersed to the peripheral side of the cavity along a uniform gas flow channel, and then is conveyed inwards through a pore structure; and the air enters an area surrounded by the first anti-attachment plate and the second anti-attachment plate through a gap between the first anti-attachment plate and the second anti-attachment plate, so that the uniformity of circumferential air inlet can be effectively ensured. And meanwhile, the gap between the first anti-adhesion plate and the second anti-adhesion plate is used for preventing the pore structure from being blocked by the coating film, so that the cleaning convenience is improved. And the annular gas equalizing flow channel is arranged on one side, facing the gas inlet, of the gas distribution ring, namely the gas equalizing flow channel is in an open type design and is convenient to clean.

Description

Technical Field

[0001] The present application belongs to the technical field of semiconductor production equipment, and specifically relates to a gas distribution structure used in semiconductor coating equipment. Background Art

[0002] Magnetron sputtering, as a highly efficient thin-film deposition technology, is widely used in vacuum coating applications such as semiconductors and photovoltaics. Magnetron sputtering utilizes the interaction of electric and magnetic fields. Electrons, accelerated by the electric field, collide with argon atoms as they fly toward the substrate, ionizing them into a large number of argon ions and electrons. The electrons fly toward the substrate, and the argon ions, accelerated by the electric field, bombard the target material, sputtering a large number of target atoms and ions, which are deposited on the substrate to form a film.

[0003] To ensure film quality, it is necessary to ensure that the process gas in the vacuum chamber is evenly distributed so that the film can be evenly formed on the substrate. The gas distribution structure used in the related prior art is too complicated, the gas distribution effect is not ideal, and it is difficult to clean. Utility Model Content

[0004] The present application aims to solve at least one of the above-mentioned technical problems existing in the prior art. To this end, the present application provides an air-distributing structure which is simple in structure and can ensure an air-distributing effect.

[0005] The air distribution structure according to an embodiment of the present application includes:

[0006] A cavity, wherein a chamber is provided inside the cavity, and the cavity is provided with an air inlet communicating with the chamber;

[0007] a first anti-fog plate, the first anti-fog plate being disposed in the chamber, the first anti-fog plate being distributed along a circumferential side wall of the chamber and covering the air inlet, and a distance being spaced between the first anti-fog plate and the circumferential side wall of the chamber;

[0008] a second anti-scratch plate, the second anti-scratch plate being disposed in the chamber, the second anti-scratch plate being distributed along a circumferential sidewall of the chamber, the second anti-scratch plate comprising an extension extending between the first anti-scratch plate and the sidewall of the chamber, a distance being spaced between the extension and the first anti-scratch plate;

[0009] an air distribution ring, the air distribution ring being arranged between the first anti-fogation plate and the circumferential side wall of the chamber, the air distribution ring covering the air inlet, the air distribution ring being provided with an annular uniform flow channel on a side facing the air inlet, and the air distribution ring being provided with a pore structure around the first anti-fogation plate;

[0010] When the process gas is introduced through the gas inlet, it can pass through the uniform flow channel, the pore structure, and the gap between the first anti-fog plate and the second anti-fog plate and enter the inner space of the first anti-fog plate.

[0011] According to the air distribution structure of the embodiment of the present application, there are at least the following beneficial effects: the air distribution structure of this embodiment, when the process gas is fed into the air inlet, the process gas will first be evenly dispersed to the circumference of the chamber along the uniform flow channel, and then transported inward through the pore structure, passing through the gap between the first anti-fog plate and the second anti-fog plate into the area surrounded by the first anti-fog plate and the second anti-fog plate, which can effectively ensure the uniformity of the circumferential air intake. At the same time, the gap between the first anti-fog plate and the second anti-fog plate prevents the pore structure from being blocked by the coating, thereby improving the convenience of cleaning. In addition, an annular uniform flow channel is provided on the side of the air distribution ring facing the air inlet, that is, the uniform flow channel is an open design, which is convenient for cleaning.

[0012] According to some embodiments of the present application, the pore structure includes a plurality of uniform air holes, and the plurality of uniform air holes are evenly distributed around the first anti-fouling plate.

[0013] According to some embodiments of the present application, the pore diameter of the equilibrating pores is 0.5 mm to 2 mm.

[0014] According to some embodiments of the present application, the air distribution ring is connected to the circumferential side wall of the chamber on one side of the uniform flow channel, and the air distribution ring has a first gap between the circumferential side wall of the chamber and the other side of the uniform flow channel, and the pore structure is formed by the first gap.

[0015] According to some embodiments of the present application, a size of the first gap is 0.2 mm-2 mm.

[0016] According to some embodiments of the present application, the uniform flow channel has a first side wall, a second side wall and a third side wall, and the first side wall and the third side wall are vertically connected to both ends of the second side wall.

[0017] According to some embodiments of the present application, the distance between the extension section and the first anti-slip plate is 1 mm-6 mm.

[0018] According to some embodiments of the present application, the cavity is provided with a mounting step on a circumferential side wall of the chamber, and the air distribution ring is detachably mounted on the mounting step.

[0019] According to some embodiments of the present application, a mounting seat is provided on the inner side of the air distribution ring, and the mounting seat is connected to the mounting step by screws.

[0020] According to some embodiments of the present application, along the vertical direction, the first anti-slip plate and the second anti-slip plate completely cover the circumferential side wall of the chamber.

[0021] Additional aspects and advantages of the present application will be given in part in the following description, and some additional aspects and advantages will become obvious from the following description, or will be learned through practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The present application is further described below with reference to the accompanying drawings and embodiments, wherein:

[0023] Figure 1 This is a schematic diagram of the overall structure of the present application;

[0024] Figure 2 Schematic diagram of the first structural setting of the air distribution ring;

[0025] Figure 3 Schematic diagram of the second structure of the air distribution ring. DETAILED DESCRIPTION

[0026] The following describes in detail embodiments of the present application. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application.

[0027] In the description of this application, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on this application.

[0028] In the description of this application, "several" means more than one, "plurality" means more than two, "greater than," "less than," and "exceed" are understood to exclude the number itself, while "above," "below," and "within" are understood to include the number itself. The use of "first" and "second" in the description is solely for the purpose of distinguishing technical features and should not be construed as indicating or implying relative importance, implicitly specifying the number of the indicated technical features, or implicitly specifying the order of the indicated technical features.

[0029] In the description of this application, unless otherwise clearly defined, terms such as setting, installing, and connecting should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in this application based on the specific content of the technical solution.

[0030] In the description of this application, reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of this application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples.

[0031] Reference Figures 1 to 3 , an embodiment of the present application proposes an air distribution structure, comprising:

[0032] The cavity 100 has a chamber disposed therein, and the cavity 100 has an air inlet 103 communicating with the chamber;

[0033] A first anti-fog plate 200 is disposed in the chamber. The first anti-fog plate 200 is distributed along the circumferential sidewall of the chamber and covers the air inlet 103. There is a distance between the first anti-fog plate 200 and the circumferential sidewall of the chamber.

[0034] A second anti-fog plate 300 is disposed in the chamber and distributed along the circumferential sidewall of the chamber. The second anti-fog plate 300 includes an extension section 301 extending between the first anti-fog plate 200 and the sidewall of the chamber. A gap exists between the extension section 301 and the first anti-fog plate 200.

[0035] An air distribution ring 400 is disposed between the first anti-fog plate 200 and the circumferential sidewall of the chamber. The air distribution ring 400 covers the air inlet 103. An annular uniform flow channel 401 is provided on the side of the air distribution ring 400 facing the air inlet 103. The air distribution ring 400 has a porous structure around the first anti-fog plate 200.

[0036] When the process gas is introduced through the gas inlet 103 , it can pass through the uniform flow channel 401 , the pore structure, and the gap between the first anti-fog plate 200 and the second anti-fog plate 300 and enter the inner space of the first anti-fog plate 200 .

[0037] It can be understood that since the extension section 301 of the second anti-flush plate 300 is located between the first anti-flush plate 200 and the circumferential side wall of the chamber, the first anti-flush plate 200 and the second anti-flush plate 300 completely cover the circumferential side wall of the chamber.

[0038] At the same time, there is a distance between the extension section 301 and the first anti-fog plate 200, and a gap is formed between the two. Combined with the pore structure set by the air distribution ring 400, the air inlet 103 can be connected to the inner space of the first anti-fog plate 200 and the second anti-fog plate 300.

[0039] In the gas distribution structure of this embodiment, when process gas is introduced through the air inlet 103, the process gas is first evenly dispersed along the uniform flow channel 401 around the periphery of the chamber. It is then transported inward through the porous structure, passing through the gap between the first anti-fog plate 200 and the second anti-fog plate 300 and entering the area surrounded by the first and second anti-fog plates 200 and 300. This effectively ensures uniform circumferential air intake. At the same time, the gap between the first and second anti-fog plates 200 and 300 prevents the porous structure from being clogged by the coating, improving cleaning convenience. Furthermore, an annular uniform flow channel 401 is provided on the side of the air distribution ring 400 facing the air inlet 103, i.e., the uniform flow channel 401 is open-ended for easy cleaning.

[0040] Reference Figure 3 In some embodiments of the present application, the pore structure includes a plurality of gas-distributing holes 403, which are evenly distributed around the first anti-fog plate 200. With the structural arrangement of this embodiment, the plurality of gas-distributing holes 403 are evenly distributed along the length of the gas-distributing channel 401, ensuring that the process gas is evenly transported inward from the gas-distributing channel 401.

[0041] In actual applications, the aperture of the gas equalizing hole 403 can be set to 0.5mm-2mm, and the aperture is smaller than the width of the gas equalizing channel 401. Along the delivery direction of the process gas, the cross-sectional dimension of the gas equalizing channel 401 is larger than the cross-sectional dimension of the gas equalizing hole 403, so that the process gas is first filled with the gas equalizing channel 401 under the action of the delivery pressure, and then transported inward along the gas equalizing hole 403.

[0042] Reference Figure 2 In some embodiments of the present application, the air distribution ring 400 is connected to the circumferential side wall of the chamber on one side of the uniform flow channel 401, and the air distribution ring 400 has a first gap 402 between the circumferential side wall of the chamber on the other side of the uniform flow channel 401, and a pore structure is formed by the first gap 402. Specifically, the air distribution ring 400 is connected to the chamber 100 at the lower end of the uniform flow channel 401, and the upper end is spaced apart from the chamber 100 to form the first gap 402. When the process gas is fed in from the air inlet 103, it will first fill the uniform flow channel 401, and then pass through the first gap 402 at the upper end of the air distribution ring 400 into the gap between the first anti-fog plate 200 and the second anti-fog plate 300, and finally pass through the gap between the first anti-fog plate 200 and the second anti-fog plate 300 to enter the inner working area.

[0043] In practical applications, the size of the first gap 402 can be set to 0.2mm-2mm, and it is necessary to ensure that the size of the first gap 402 is smaller than the width of the uniform flow channel 401, and along the delivery direction of the process gas, the cross-sectional size of the uniform flow channel 401 is larger than the cross-sectional size of the first gap 402, so that the process gas is first filled with the uniform flow channel 401 under the action of the delivery pressure, and then transported inward along the first gap 402.

[0044] Reference Figure 2 and Figure 3 In some embodiments of the present application, uniform flow channel 401 includes a first sidewall, a second sidewall, and a third sidewall, with the first and third sidewalls perpendicularly connected to the ends of the second sidewall. In this embodiment, the first, second, and third sidewalls form a C-shaped profile, thereby forming uniform flow channel 401 with an open periphery, which has a simple structure and is easy to clean.

[0045] In some embodiments of the present application, the distance between the extension section 301 and the first anti-fouling plate 200 is controlled to be 1 mm to 6 mm, which can ensure the uniformity of the process gas supply and effectively prevent the entry of coating particles.

[0046] Reference Figure 2 and Figure 3 In some embodiments of the present application, the chamber body 100 is provided with a mounting step on the circumferential sidewall of the chamber, and the air distribution ring 400 is detachably mounted on the mounting step. In this way, the air distribution ring 400 can be removed for cleaning during the cleaning phase.

[0047] In some embodiments of the present application, a mounting seat is provided inside the air distribution ring 400, and the mounting seat is connected to the mounting step by screws. The mounting seat is provided inside the air distribution ring 400 to ensure that the air distribution ring 400 is close to the air inlet 103.

[0048] In some embodiments of the present application, along the vertical direction, the first anti-fog plate 200 and the second anti-fog plate 300 completely cover the circumferential sidewall of the chamber.

[0049] Reference Figures 1 to 3 In some embodiments of the present application, the air distribution structure includes:

[0050] The chamber 100 has a chamber disposed therein. A target 600 is disposed at the upper end of the chamber, and a magnetron 500 is disposed above the target 600. A substrate stage 700 is disposed at the lower end of the chamber, supporting the substrate for vertical movement. From top to bottom, the chamber 100 comprises a first cavity 101 and a second cavity 102. The upper end of the second cavity 102 is provided with a mounting step on the inner side.

[0051] The first anti-fog plate 200 has its upper end connected to the upper end of the inner wall of the first cavity 101, placing it close to the target 600. The lower end of the first anti-fog plate 200 extends downward into the second cavity 102 and over the mounting step. A distance is maintained between the first anti-fog plate 200 and the inner walls of both the first and second cavities 101, 102.

[0052] The second anti-fog plate 300 is screwed onto the mounting step. The second anti-fog plate 300 extends downward over the first anti-fog plate 200 to a position close to the substrate stage 700. A gap is also maintained between the second anti-fog plate 300 and the first anti-fog plate 200.

[0053] The air distribution ring 400 is mounted on the mounting step. It is understood that the air distribution ring 400 and the second anti-fog plate 300 can be mounted horizontally offset, such as with the air distribution ring 400 being larger than the second anti-fog plate 300 and positioned outside the second anti-fog plate 300. Alternatively, the air distribution ring 400 can be mounted circumferentially offset, or stacked. The outer periphery of the air distribution ring 400 is concave to form a circle of uniform air flow channels 401. A first gap 402 is defined between the upper end of the air distribution ring 400 and the lower end of the first cavity 101. Multiple uniform air holes 403 are provided on the inner sidewall of the air distribution ring 400. The second cavity 102 is provided with an air inlet 103 directly opposite the uniform air flow channels 401.

[0054] During operation, the process gas is fed in from the air inlet 103, first filling the uniform flow channel 401, then entering the area between the first anti-fog plate 200 and the inner wall of the cavity 100 along the first gap 402 and the uniform gas hole 403, and then passing through the gap between the first anti-fog plate 200 and the second anti-fog plate 300 to enter the inner space.

[0055] It is understood that the air distribution structure in this application features an open C-shaped cross-section of the air distribution channel, facilitating processing and cleaning. The provision of a first gap 402 within the air distribution ring 400 ensures uniform air distribution and prevents clogging. The overlapping first and second anti-fog plates 200 and 300 prevent particles from the coating environment from entering the air distribution ring 400 and causing clogging, while also providing a secondary air distribution effect.

[0056] The embodiments of the present application have been described in detail above with reference to the accompanying drawings. However, the present application is not limited to the above embodiments. Various modifications can be made within the scope of knowledge possessed by ordinary technicians in the relevant technical field without departing from the purpose of the present application. In addition, the embodiments of the present application and the features of the embodiments can be combined with each other unless there is a conflict.

Claims

1. An air distribution structure, characterized in that: include: A cavity, wherein a chamber is provided inside the cavity, and the cavity is provided with an air inlet communicating with the chamber; a first anti-fog plate, the first anti-fog plate being disposed in the chamber, the first anti-fog plate being distributed along a circumferential side wall of the chamber and covering the air inlet, and a distance being spaced between the first anti-fog plate and the circumferential side wall of the chamber; a second anti-scratch plate, the second anti-scratch plate being disposed in the chamber, the second anti-scratch plate being distributed along a circumferential sidewall of the chamber, the second anti-scratch plate comprising an extension extending between the first anti-scratch plate and the sidewall of the chamber, a distance being spaced between the extension and the first anti-scratch plate; an air distribution ring, the air distribution ring being arranged between the first anti-fogation plate and the circumferential side wall of the chamber, the air distribution ring covering the air inlet, the air distribution ring being provided with an annular uniform flow channel on a side facing the air inlet, and the air distribution ring being provided with a pore structure around the first anti-fogation plate; When the process gas is introduced through the gas inlet, it can pass through the uniform flow channel, the pore structure, and the gap between the first anti-fog plate and the second anti-fog plate and enter the inner space of the first anti-fog plate.

2. The air distribution structure according to claim 1, characterized in that: The pore structure includes a plurality of uniform air holes, and the plurality of uniform air holes are evenly distributed around the first anti-fouling plate.

3. The air distribution structure according to claim 2, characterized in that: The pore diameter of the equilibrating pores is 0.5 mm to 2 mm.

4. The air distribution structure according to claim 1, characterized in that: The air distribution ring is connected to the circumferential side wall of the chamber on one side of the uniform flow channel, and a first gap is formed between the air distribution ring and the circumferential side wall of the chamber on the other side of the uniform flow channel, and the pore structure is formed by the first gap.

5. The air distribution structure according to claim 4, characterized in that: The size of the first gap is 0.2 mm-2 mm.

6. The air distribution structure according to claim 1, characterized in that: The uniform flow channel has a first side wall, a second side wall and a third side wall, wherein the first side wall and the third side wall are vertically connected to two ends of the second side wall.

7. The air distribution structure according to claim 1, characterized in that: The distance between the extension section and the first anti-slip plate is 1 mm to 6 mm.

8. The air distribution structure according to claim 1, characterized in that: The cavity body is provided with an installation step on a circumferential side wall of the chamber, and the air distribution ring is detachably installed on the installation step.

9. The air distribution structure according to claim 8, characterized in that: A mounting seat is provided on the inner side of the air distribution ring, and the mounting seat is connected to the mounting step via screws.

10. The air distribution structure according to claim 1, characterized in that: In the vertical direction, the first anti-slip plate and the second anti-slip plate completely cover the circumferential side wall of the chamber.

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