Thin wandering star wheel suitable for high-precision mask polishing and machining device
The design of a thin planetary wheel solves the problem of processing marks caused by polishing liquid overflow, achieves efficient and high-precision polishing and a long-life polishing pad, and ensures that the flatness of the quartz glass meets high-precision requirements.
Patent Information
- Application Number
- CN202422047304.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-22
- Publication Date
- 2025-09-05
- Estimated Expiration
- 2034-08-22
AI Technical Summary
The planetary wheel design of existing double-sided polishing machines causes the polishing liquid to overflow from the cavity gap, resulting in uneven local polishing liquid flow, arc-shaped processing marks, and affecting the flatness of the quartz glass. Existing solutions will reduce polishing efficiency or shorten the life of the polishing pad.
A thin planetary wheel is designed with the cavity notch set close to the center of the circle to form non-overlapping liquid-deficient areas. The symmetrical layout of the liquid storage chamber ensures uniform distribution of the polishing liquid to avoid overflow. Combined with appropriate rotation speed and thickness design, an efficient polishing effect is maintained.
It achieves high-precision polishing without arc-shaped processing marks, improves the life of the polishing pad and polishing efficiency, ensures the flatness of the quartz glass reaches below 0.1μm, and is easy to operate.
Smart Images
Figure CN223301507U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a double-sided grinding / polishing planetary wheel, in particular to a thin planetary wheel suitable for polishing a high-precision mask and a processing device. Background Art
[0002] As a consumable component used in double-sided grinding / polishing machines, planetary wheels are widely used in industries such as piezoelectric crystal processing, optical glass processing, sapphire processing, and ceramic processing. They are indispensable production consumables in modern industrial production activities. In recent years, with the rapid development of science and technology, the demand for finished substrate crystal wafers has increased significantly. In particular, the popularity of mass-produced electronic products such as mobile phones and tablets, and the rapid development of touch screens, has further increased the demand for precision grinding and polishing of lenses. In the high-precision mask industry, the flatness requirements of 6025 type quartz glass used in semiconductors are even more stringent, with the highest PV value required to be below 0.1μm.
[0003] Therefore, in order to meet higher requirements, the planetary wheel, as one of the most important tooling in the processing process, also needs a better design solution.
[0004] To facilitate the removal and placement of wafers, the planetary wheels of existing double-sided polishing machines often have cavity notches on both sides of the planetary wheel glass station to facilitate the insertion of fingers for the removal and placement of wafers. However, this design causes the polishing liquid to overflow from the cavity notches, resulting in low local polishing liquid flow, thereby producing arc-shaped processing marks. The fluctuation height of this processing mark can even reach more than 0.3μm, which will directly cause the quartz glass flatness to exceed the standard and fail to meet the requirements.
[0005] To avoid this problem, the common methods are to make the planetary wheel thicker or reduce the polishing speed to limit the overflow of the polishing liquid. The former will make the planetary wheel heavier and have an adverse effect on the life of the polishing pad, while the latter will reduce the polishing efficiency. Utility Model Content
[0006] In response to the shortcomings of the existing technology, the utility model provides a thin planetary wheel and processing device suitable for high-precision mask polishing, rationally plans the surface polishing liquid path, does not reduce the polishing efficiency and polishing pad life, and facilitates the removal and placement of the sheet, while solving the problem of surface processing lines caused by uneven polishing liquid flow.
[0007] In order to achieve the above-mentioned purpose, the embodiments of the present invention adopt the following technical solutions:
[0008] According to one aspect of the present invention, a thin planetary gear suitable for high-precision mask polishing includes a planetary gear body, a plurality of planetary gear teeth disposed on the periphery of the planetary gear body, and a plurality of cavities defined in the planetary gear body. The cavity has a cavity notch disposed near the center of the planetary gear. The cavity notch forms a circular liquid-deficient region formed by the planetary gear during rotation, and does not overlap with the cavity.
[0009] Preferably, the cavity notch is arranged at the end point of the cavity closest to the center of the circle on the side close to the center of the thin planetary wheel.
[0010] Preferably, the thin planetary wheel is provided with a plurality of cavities for receiving workpieces. The cavities are symmetrical or arranged in a symmetrical triangle with the center of the circle where the thin planetary wheel is located as the center, and are of uniform shape and size. When the cavities are arranged in a symmetrical triangle, the centers of the triangles coincide with the center of the circle.
[0011] Preferably, the planetary wheel is provided with multiple liquid reservoirs for supplying polishing liquid to the bottom surface of the planetary wheel. The liquid reservoirs are arranged symmetrically or in a triangular pattern with the center of the circle containing the thin planetary wheel as the center. When the liquid reservoirs are arranged in a triangular pattern, the centers of the triangles coincide with the center of the circle, and the liquid reservoirs are of uniform shape and size, which can improve the balance of the planetary wheel during operation.
[0012] Preferably, the planetary gear teeth are arranged at equal intervals.
[0013] Preferably, the mold cavity is square or rectangular, and the symmetry axis of the mold cavity passes through the center of the circle where the planetary wheel is located.
[0014] Preferably, the distance between the cavity notch and the center of the thin planetary wheel is not less than 28 mm.
[0015] Preferably, the thickness of the thin planetary wheel is 1.5-3 mm.
[0016] According to one aspect of the present invention, a processing device includes the above-mentioned thin planetary wheel.
[0017] Preferably, using the above-mentioned processing device of the above-mentioned thin planetary wheel, the flatness of the workpiece after processing will not be affected by the traces of liquid deficiency of the planetary wheel and the surface processing lines will not be deteriorated. The flatness PV value is 0.1-0.3μm, and the flatness PV value meets the conditions for further optimization to below 0.1μm.
[0018] Advantages of the implementation of this utility model:
[0019] (1) When the thin planetary wheel of the present invention is used to polish glass, no arc-shaped processing marks will be produced on the glass surface.
[0020] (2) The thin planetary wheel described in the present invention does not need to be made thicker to avoid processing marks, and the thickness of the planetary wheel at its thinnest point can be as low as 1.5 mm, thereby increasing the life of the polishing pad.
[0021] (3) The thin planetary gear described in the present invention does not need to reduce the rotation speed to avoid processing marks, and the processing speed of the lower plate can be maintained at no less than 35 rpm. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following is a brief introduction to the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0023] Figure 1 This is a schematic structural diagram of a thin planetary wheel suitable for high-precision mask polishing according to Example 1 of the present utility model;
[0024] Figure 2 This is a schematic structural diagram of a thin planetary wheel suitable for high-precision mask polishing according to Example 2 of the present utility model;
[0025] The description of the accompanying numbers is as follows: 1. Planetary wheel body; 2. Planetary wheel teeth; 3. Cavity; 4. Cavity symmetry axis; 5. Cavity notch; 6. Liquid-deficient area; 7. Liquid storage chamber. DETAILED DESCRIPTION
[0026] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limitations on the present invention.
[0027] Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, features qualified as "first," "second," etc., may explicitly or implicitly include one or more of such features. In the description of this utility model, unless otherwise specified, "plurality" means two or more.
[0028] In the description of this utility model, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood broadly. For example, they may refer to fixed, removable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediary; and internal communication between two components. Those skilled in the art will understand the specific meanings of these terms in this utility model based on specific circumstances.
[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0030] Example 1
[0031] In this embodiment, a thin planetary gear suitable for high-precision mask polishing includes a planetary gear body 1, a plurality of planetary gear teeth 2 arranged on the outer periphery of the planetary gear body 1, and three square cavities 3 are formed on the planetary gear body 1. The axis of symmetry of the cavity 3 passes through the center of the circle where the planetary gear is located. The thickness of the thin planetary gear is 2.5 mm. Its structure is as follows Figure 1 shown.
[0032] The spacing between the planetary gear teeth 2 is the same, and the sizes of the planetary gear teeth 2 are consistent.
[0033] A cavity notch 5 is provided in the cavity 3 near the center of the circle where the thin planetary wheel is located, and the distance between the notch and the center of the circle of the thin planetary wheel is 30 mm; the cavity 3 is a closed area, which is only connected to the cavity notch 5. The circular liquid-deficient area 6 formed by the cavity notch 5 when the thin planetary wheel rotates does not overlap with the cavity 3. The three cavities 3 are arranged in a symmetrical triangle, and the center of the triangle coincides with the center of the circle.
[0034] The planetary wheel body 1 is provided with three liquid storage chambers 7 for supplying polishing liquid to the bottom surface of the planetary wheel. The liquid storage chambers 7 are of the same shape and size. The three liquid storage chambers 7 are arranged in a symmetrical triangle shape, with the triangle center coinciding with the center of the circle.
[0035] Example 2
[0036] In this embodiment, a thin planetary wheel suitable for high-precision mask polishing includes a planetary wheel body 1, a plurality of planetary wheel teeth 2 arranged on the outer periphery of the planetary wheel body 1, two square cavities 3 are formed on the planetary wheel body 1, and the symmetry axis of the cavity 3 passes through the center of the circle where the thin planetary wheel is located. The thickness of the thin planetary wheel is 1.5 mm. Its structure is as follows Figure 2 shown.
[0037] The spacing between the planetary gear teeth 2 is the same, and the sizes of the planetary gear teeth 2 are consistent.
[0038] A cavity notch 5 is provided on the side of the cavity 3 close to the center of the planetary wheel, and the distance between the notch and the center of the thin planetary wheel is 28 mm; the cavity 3 is a closed area, which is only connected to the cavity notch 5. The circular liquid-deficient area 6 formed by the cavity notch 5 when the thin planetary wheel rotates does not overlap with the cavity 3. The two cavities 3 are symmetrical about the center of the circle where the thin planetary wheel is located.
[0039] The planetary wheel body 1 is provided with four liquid storage chambers 7 for supplying polishing liquid to the bottom surface of the planetary wheel. The liquid storage chambers 7 are of the same shape and size. The four liquid storage chambers 7 are arranged in a rectangular shape, and the center of the rectangle is the center of the circle where the thin planetary wheel is located.
[0040] Example 3
[0041] In this embodiment, the processing device is a double-sided polishing machine, wherein the planetary wheel adopts the thin planetary wheel of embodiment 2. Figure 2 .
[0042] When Example 3 is working, the lower plate of the double-sided polishing machine will perform circular motion, and the polishing liquid at the cavity notch 5 of the thin planetary wheel is located near the center of the planetary wheel. At the same time, the center of the planetary wheel is also the center of the effective position of the annular lower plate. The linear velocity here is relatively constant, and the polishing liquid will not overflow from the notch in large quantities. Even if the polishing liquid overflows, the motion trajectory of the liquid-deficient part 6 is a circle tangent to the cavity 3, which will not affect the polishing liquid flow on the contact surface of the workpiece.
[0043] Thanks to this design, the planetary gear no longer needs to be thickened to avoid machining marks. For example, in the processing of 6025 quartz glass, the planetary gear can be as thin as 1.5mm. While maintaining the required rotational speed, machining efficiency remains stable at over 10μm / h. The flatness of the finished workpiece is not affected by the presence of machining marks on the surface of the planetary gear due to fluid depletion. The flatness PV value is 0.1-0.3μm, and the flatness PV value meets the requirements for further optimization to below 0.1μm.
[0044] After the processing is completed, the workpiece can be directly extracted from the position of the cavity notch 5 opened on the cavity 3 of the thin planetary wheel with fingers. The operation is convenient, time-saving and labor-saving, and effectively avoids the previous process of removing the planetary wheel after the processing is completed. The friction between the planetary wheel gear and the polishing machine gear causes the polishing powder on the polishing machine gear to contaminate the polishing liquid.
[0045] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in the present invention should be included in the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be based on the scope of protection of the claims.
Claims
1. A thin planetary gear suitable for high-precision mask polishing, comprising a planetary gear body, a plurality of planetary gear teeth arranged on the periphery of the planetary gear body, a cavity provided on the planetary gear body, and a liquid storage cavity, characterized in that: The mold cavity is provided with a mold cavity notch near the center of the thin planetary wheel. The mold cavity notch is in a circular liquid-deficient area formed when the thin planetary wheel rotates and does not overlap with the mold cavity.
2. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: The cavity notch is arranged at the end point of the cavity closest to the center of the circle on the side close to the center of the thin planetary wheel.
3. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: There are multiple cavities, and the cavities are symmetrical or arranged in a symmetrical triangle with the center of the circle where the thin planetary wheel is located as the center. When the cavities are arranged in a symmetrical triangle, the center of the triangle coincides with the center of the circle, and the shape and size of the cavities are consistent.
4. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: A plurality of liquid storage cavities are provided on the planetary wheel body, and the liquid storage cavities are arranged symmetrically or in a symmetrical triangle with the center of the circle where the thin planetary wheel is located as the center. When the liquid storage cavities are arranged in a symmetrical triangle, the center of the triangle coincides with the center of the circle, and the liquid storage cavities have the same shape and size.
5. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: The planetary gear teeth are arranged at equal intervals.
6. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: The mold cavity is square or rectangular, and the symmetry axis of the mold cavity passes through the center of the circle where the planetary wheel is located.
7. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: The distance between the cavity notch and the center of the thin planetary wheel is not less than 28 mm.
8. The thin planetary wheel suitable for high-precision mask polishing according to claim 1, characterized in that: The thickness of the thin planetary wheel is 1.5-3 mm.
9. A processing device, characterized in that: The processing device includes the thin planetary wheel according to any one of claims 1 to 8.
10. The processing device according to claim 9, characterized in that The flatness of the processed workpiece is 0.1-0.3μm.