Multilayer height-adjustable photoresist solution sampling device
Through the multi-layer height-adjustable photoresist solution sampling device, the use of a liftable sampling mechanism and an independent sampling head solves the inefficiency and mixing problems caused by the fixed height of the sampling point, and realizes accurate sampling and efficient multi-layer sampling.
Patent Information
- Application Number
- CN202422693103.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-05
- Publication Date
- 2025-09-09
- Estimated Expiration
- 2034-11-05
Smart Images

Figure CN223320106U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of photoresist solution sampling, in particular to a multi-layer height-adjustable photoresist solution sampling device. Background Art
[0002] Photoresist is one of the key materials for fine pattern processing in microelectronics technology. In particular, the development of large-scale and ultra-large-scale integrated circuits in recent years has greatly promoted the research, development and application of photoresist. At present, existing photoresists are mostly stored in storage barrels during the production process. During the storage process, certain precipitation will occur. The sampling point of the sampling device is relatively fixed during use, which makes it inconvenient to sample multiple sampling points at the same time.
[0003] As disclosed in the publication (announcement) number CN217132659U, a raw material sampling device for photoresist production is disclosed, which includes a production storage box, a sampling platform and a multi-channel peristaltic pump. Multiple sampling channels are formed on the upper and lower sides of the production storage box. A vessel placement rack is provided on the other side of the sampling platform in the length direction. The vessel placement rack includes a vertical plate, multiple support plates and multiple vessel placement plates, and the multiple support plates and multiple vessel placement plates are alternately fixed on the vertical plate. The other ends of the multiple hoses included in the multi-channel peristaltic pump are respectively passed through the multiple support plates.
[0004] Although the above technical solution solves the corresponding technical problem, it still has the following defects:
[0005] The above technical solution has a relatively fixed height of the sampling point of the photoresist solution, which makes it inconvenient to adjust the height of the sampling point, thus still resulting in low sampling efficiency. Utility Model Content
[0006] The purpose of the utility model is to provide a multi-layer height-adjustable photoresist solution sampling device, which not only facilitates the adjustment of the sampling height, thereby realizing accurate sampling of photoresist solutions at different heights and avoiding solution mixing, but also multiple independently designed sampling heads can simultaneously take solution samples of multiple height layers, thereby improving sampling efficiency. At the same time, the design of separate sampling tubes ensures that the solutions of each layer do not interfere with each other during the sampling process, thereby ensuring the accuracy of the sampling results. In addition, the control box can control the operation of the control valve, sampling pump and forward and reverse motor, thereby simplifying the sampling process and improving operational convenience.
[0007] In order to achieve the above-mentioned purpose, the main technical solutions adopted by this utility model include:
[0008] A multi-layer height-adjustable photoresist solution sampling device, comprising:
[0009] A base is provided above the base with a sampling mechanism that can be raised and lowered and adjusted; a lifting driving mechanism for driving the sampling mechanism is installed at the top of the base and at a position corresponding to the sampling mechanism.
[0010] The above-mentioned multi-layer height-adjustable photoresist solution sampling device, wherein the sampling mechanism includes a liftable lifting platform, on which are installed a plurality of photoresist solution sampling components arranged at equal distances.
[0011] The above-mentioned multi-layer height-adjustable photoresist solution sampling device, wherein the photoresist solution sampling assembly includes a sampling pump installed on the lifting platform, a collecting tube is installed at the bottom of the sampling pump, a sampling tube for extracting photoresist solution is installed on the side of the sampling pump, and a sampling head is installed at the end of the sampling tube.
[0012] In the above-mentioned multi-layer height-adjustable photoresist solution sampling device, a control valve for controlling the opening and closing of the sampling head is installed on the sampling head.
[0013] The above-mentioned multi-layer height-adjustable photoresist solution sampling device, wherein the lifting drive mechanism includes a support frame fixedly connected to the top of the base, a forward and reverse motor is installed on the support frame, a threaded shaft is fixedly connected to the output shaft of the forward and reverse motor, a threaded sleeve is threadedly connected to the threaded shaft, and the threaded sleeve is fixedly connected to the side of the lifting platform on the side close to the lifting platform.
[0014] In the above-mentioned multi-layer height-adjustable photoresist solution sampling device, a collection tank for storing the extracted photoresist solution is also installed on the top of the base and at a position corresponding to the sampling mechanism.
[0015] The above-mentioned multi-layer height-adjustable photoresist solution sampling device, wherein a control box is also installed on the top of the base, and a PLC controller for controlling the sampling pump, control valve and forward and reverse motor is provided inside the control box.
[0016] In the above-mentioned multi-layer height-adjustable photoresist solution sampling device, the bottom of the threaded shaft is rotatably connected to the inner wall of the support frame through a limit bearing.
[0017] In the above-mentioned multi-layer height-adjustable photoresist solution sampling device, the lifting drive mechanism further includes a limiting sliding rod fixedly connected to the supporting frame, and a limiting sliding sleeve is slidably connected to the limiting sliding rod.
[0018] In the above-mentioned multi-layer height-adjustable photoresist solution sampling device, a side of the limiting sliding sleeve close to the threaded sleeve is fixedly connected to a side surface of the threaded sleeve.
[0019] The utility model has at least the following beneficial effects:
[0020] The multi-layer height-adjustable photoresist solution sampling device provided by the utility model is not only convenient for adjusting the sampling height, thereby realizing accurate sampling of photoresist solutions at different heights and avoiding solution mixing, but also multiple independently designed sampling heads can simultaneously take solution samples of multiple height layers, thereby improving sampling efficiency. At the same time, the design of separate sampling tubes ensures that the solutions of each layer do not interfere with each other during the sampling process, thereby ensuring the accuracy of the sampling results. In addition, the control box can control the operation of the control valve, sampling pump and forward and reverse motor, thereby simplifying the sampling process and improving operational convenience. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:
[0022] Figure 1 This is a schematic structural diagram of a multi-layer, height-adjustable photoresist solution sampling device according to the present invention;
[0023] Figure 2 This is a schematic structural diagram of the sampling mechanism in the multi-layer height-adjustable photoresist solution sampling device of the present invention;
[0024] Figure 3 This is a structural schematic diagram of the lifting drive mechanism in the multi-layer height-adjustable photoresist solution sampling device of the utility model.
[0025] Description of Figure Numbers:
[0026] 1. Base; 2. Sampling mechanism; 3. Lifting drive mechanism; 4. Collection tank; 5. Control box;
[0027] 201. Lifting platform; 202. Photoresist solution sampling assembly;
[0028] 2021. Sampling pump; 2022. Collection tube; 2023. Sampling tube; 2024. Sampling head; 2025. Control valve;
[0029] 301, support frame; 302, forward and reverse motor; 303, threaded shaft; 304, threaded sleeve;
[0030] 3031, limit bearing;
[0031] 3041, limit slide; 3042, limit slide. DETAILED DESCRIPTION
[0032] The following will describe the implementation methods of the present application in detail with reference to the accompanying drawings and examples, so that the implementation process of how the present application applies technical means to solve technical problems and achieve technical effects can be fully understood and implemented accordingly.
[0033] Please refer to Figures 1 to 3 As shown, an embodiment of the present invention provides a multi-layer height-adjustable photoresist solution sampling device, comprising: a base 1, a sampling mechanism 2 that can be raised and lowered is provided above the base 1, and a lifting drive mechanism 3 for driving the sampling mechanism 2 is installed at the top of the base 1 and at a position corresponding to the sampling mechanism 2;
[0034] By adopting the above technical solution, not only is it convenient to adjust the sampling height, thereby achieving accurate sampling of photoresist solutions at different heights and avoiding solution mixing, but also multiple independently designed sampling heads 2024 can simultaneously take solution samples from multiple height layers, thereby improving sampling efficiency. At the same time, the design of the separate sampling tube 2023 ensures that the solutions of each layer do not interfere with each other during the sampling process, thereby ensuring the accuracy of the sampling results. In addition, the control box 5 can control the operation of the control valve 2025, the sampling pump 2021, and the forward and reverse motor 302, thereby simplifying the sampling process and improving operational convenience.
[0035] Please refer to Figures 1 to 3 As shown, the sampling mechanism 2 includes a lift table 201 that can be raised and lowered, and a plurality of photoresist solution sampling components 202 arranged at equal distances are installed on the lift table 201 .
[0036] Please refer to Figures 1 to 3 As shown, the photoresist solution sampling assembly 202 includes a sampling pump 2021 installed on the lifting platform 201, a collecting tube 2022 is installed at the bottom of the sampling pump 2021, a sampling tube 2023 for extracting the photoresist solution is installed on the side of the sampling pump 2021, and a sampling head 2024 is installed at the end of the sampling tube 2023. The sampling head 2024 is designed for different heights. By setting multiple sampling heads 2024 at different heights, photoresist solutions at different heights can be sampled.
[0037] Please refer to Figures 1 to 3 As shown, a control valve 2025 for controlling the opening and closing of the sampling head 2024 is installed on the sampling head 2024. The control valve 2025 is provided to facilitate the opening and closing of the corresponding sampling head 2024.
[0038] Please refer to Figures 1 to 3As shown, the lifting drive mechanism 3 includes a support frame 301 fixedly connected to the top of the base 1, and a forward and reverse motor 302 is installed on the support frame 301. A threaded shaft 303 is fixedly connected to the output shaft of the forward and reverse motor 302, and a threaded sleeve 304 is threadedly connected to the threaded shaft 303. The side of the threaded sleeve 304 close to the lifting platform 201 is fixedly connected to the side of the lifting platform 201. The forward and reverse motor 302 drives the forward and reverse motor 302 to rotate, and under the action of the thread of the threaded shaft 303, the lifting platform 201 on the side of the threaded sleeve 304 can be driven to rise and fall, thereby facilitating the adjustment of the sampling depth of the sampling head 2024.
[0039] Please refer to Figures 1 to 3 As shown, a collecting tank 4 for storing the extracted photoresist solution is installed on the top of the base 1 and at a position corresponding to the sampling mechanism 2; by adopting the above technical solution, the collecting tank 4 is provided to facilitate the collection of the collected photoresist solution.
[0040] Please refer to Figures 1 to 3 As shown, a control box 5 is also installed on the top of the base 1, and a PLC controller for controlling the sampling pump 2021, the control valve 2025 and the forward and reverse motor 302 is provided inside the control box 5. The operation of the control valve 2025, the sampling pump 2021 and the forward and reverse motor 302 is controlled by the control box 5, which simplifies the sampling process and improves the convenience of operation.
[0041] Please refer to Figures 1 to 3 As shown, the bottom of the threaded shaft 303 is rotatably connected to the inner wall of the support frame 301 through a limit bearing 3031; by adopting the above technical solution, the stability of the rotation of the threaded shaft 303 is increased by setting the limit bearing 3031.
[0042] Please refer to Figures 1 to 3 As shown, the lifting drive mechanism 3 also includes a limiting slide rod 3041 fixedly connected to the support frame 301, and a limiting sleeve 3042 is slidably connected to the limiting slide rod 3041, and the side of the limiting sleeve 3042 close to the threaded sleeve 304 is fixedly connected to the side of the threaded sleeve 304; by adopting the above technical solution, the threaded sleeve 304 is limited by setting the limiting sleeve 3042 and the limiting slide rod 3041, thereby increasing the stability of the lifting and lowering adjustment of the threaded sleeve 304.
[0043] The working principle of the present invention is: the forward and reverse motor 302 is driven to rotate, and under the action of the thread of the threaded shaft 303, the lifting platform 201 on the side of the threaded sleeve 304 can be driven to rise and fall and adjust, thereby facilitating the adjustment of the sampling depth of the sampling head 2024. At the same time, multiple independently designed sampling heads 2024 can simultaneously take solution samples from multiple height layers, thereby improving the sampling efficiency. At the same time, the design of the separate sampling tube 2023 ensures that the solutions of each layer do not interfere with each other during the sampling process, thereby ensuring the accuracy of the sampling results. In addition, the control box 5 can control the operation of the control valve 2025, the sampling pump 2021 and the forward and reverse motor 302, thereby simplifying the sampling process and improving the convenience of operation.
[0044] The above description shows and describes several preferred embodiments of the present invention. However, as previously mentioned, it should be understood that the present invention is not limited to the form disclosed herein and should not be construed as excluding other embodiments. Instead, the present invention can be used in various other combinations, modifications, and environments and can be modified within the scope of the present invention as taught herein or through the techniques or knowledge in the relevant field. Modifications and variations made by those skilled in the art that do not depart from the spirit and scope of the present invention are intended to be protected by the claims appended hereto.
Claims
1. A multi-layer height-adjustable photoresist solution sampling device, comprising a base (1), characterized in that: A sampling mechanism (2) that can be raised and lowered is provided above the base (1), and a lifting drive mechanism (3) for driving the sampling mechanism (2) is installed at the top of the base (1) and at a position corresponding to the sampling mechanism (2).
2. The multi-layer height-adjustable photoresist solution sampling device according to claim 1, characterized in that: The sampling mechanism (2) comprises a liftable lifting platform (201), on which a plurality of photoresist solution sampling components (202) arranged at equal distances are mounted.
3. The multi-layer height-adjustable photoresist solution sampling device according to claim 2, characterized in that: The photoresist solution sampling assembly (202) comprises a sampling pump (2021) installed on the lifting platform (201), a collecting tube (2022) is installed at the bottom of the sampling pump (2021), a sampling tube (2023) for extracting the photoresist solution is installed on the side of the sampling pump (2021), and a sampling head (2024) is installed at the end of the sampling tube (2023).
4. The multi-layer height-adjustable photoresist solution sampling device according to claim 3, characterized in that: The sampling head (2024) is provided with a control valve (2025) for controlling the opening and closing of the sampling head (2024).
5. The multi-layer height-adjustable photoresist solution sampling device according to claim 4, characterized in that: The lifting drive mechanism (3) comprises a support frame (301) fixedly connected to the top of the base (1); a forward and reverse motor (302) is mounted on the support frame (301); a threaded shaft (303) is fixedly connected to the output shaft of the forward and reverse motor (302); a threaded sleeve (304) is threadedly connected to the threaded shaft (303); and the threaded sleeve (304) is fixedly connected to the side of the lifting platform (201) on a side close to the lifting platform (201).
6. The multi-layer height-adjustable photoresist solution sampling device according to claim 5, characterized in that: A collection tank (4) for storing the extracted photoresist solution is also installed on the top of the base (1) and at a position corresponding to the sampling mechanism (2).
7. The multi-layer height-adjustable photoresist solution sampling device according to claim 6, characterized in that: A control box (5) is also installed on the top of the base (1), and a PLC controller for controlling the sampling pump (2021), the control valve (2025) and the forward and reverse motor (302) is provided inside the control box (5).
8. The multi-layer height-adjustable photoresist solution sampling device according to claim 7, characterized in that: The bottom of the threaded shaft (303) is rotatably connected to the inner wall of the support frame (301) via a limiting bearing (3031).
9. The multi-layer height-adjustable photoresist solution sampling device according to claim 8, characterized in that: The lifting drive mechanism (3) further comprises a limiting sliding rod (3041) fixedly connected to the support frame (301), and a limiting sliding sleeve (3042) is slidably connected to the limiting sliding rod (3041).
10. The multi-layer height-adjustable photoresist solution sampling device according to claim 9, characterized in that: The side of the limiting sliding sleeve (3042) close to the threaded sleeve (304) is fixedly connected to the side surface of the threaded sleeve (304).
Citation Information
Patent Citations
Raw material sampling device for photoresist production
CN217132659U