Continuous production device for etching liquid

Abstract

The continuous production device is characterized in that a pH buffering agent storage tank of the continuous production device is sequentially connected with a crystallization purification device through a pipeline, the crystallization purification device is connected with a residue discharging tank, buffering tanks are arranged among the crystallization purification device, a first mixing device and a second mixing device, and the second mixing device is connected with a waste liquid collecting tank; the solubilizer storage tank is sequentially connected with the resin tower, the buffer tank, the filtering device and the first mixing device through pipelines; the resin tower is provided with a resin inlet and a solid waste temporary storage tank, and a buffer tank is arranged between the resin tower and the first mixing device; a pipeline of the electronic-grade phosphoric acid storage tank is sequentially connected with a dilute phosphoric acid storage tank, a filtering device and a second mixing device; the top of the dilute phosphoric acid storage tank is connected with the ultrapure water storage tank, and a phosphoric acid concentration detector is arranged in the dilute phosphoric acid storage tank; and the etching inhibitor storage tank is sequentially connected with the purification device, the buffer tank, the filtering device and the second mixing device through pipelines. The device deeply purifies the raw materials, improves the quality of the etching liquid and reduces the production cost.

Description

Technical Field

[0001] The utility model relates to the technical field of production of high-selectivity etching liquid, in particular to a continuous production device of etching liquid. Background Art

[0002] Wet etching technology has long been used in the industry as the most stable, effective, and widespread etching technique for semiconductor materials. However, as the semiconductor industry's requirements for product yield become increasingly stringent, wet etching technology not only requires strict control of etching time but also requires higher-quality etching fluid to meet the production requirements of advanced process chips and achieve higher product yields. Currently, commonly used etching fluid production methods suffer from complex operating procedures, poor equipment economics, and the inability to achieve continuous closed-loop production. As a result, the etching fluid quality is difficult to meet the production requirements of high-end chips. Therefore, there is a need to design an etching fluid continuous production device that is convenient to operate and energy-efficient. Utility Model Content

[0003] In view of the shortcomings of the existing technology, the present invention aims to solve the problem of continuous closed production of etching liquid and solve the purity and quality problems of etching liquid products. The present invention provides a continuous production device for etching liquid, which is easy to operate, energy-efficient and efficient, and has a highly feasible production method. It can achieve deep purification of raw materials and mixing and continuous production in a closed system, significantly improving the quality of the etching liquid product.

[0004] The technical solution of this utility model is as follows:

[0005] A continuous production device for etching liquid includes a pH buffer storage tank, wherein the outlet of the pH buffer storage tank is connected to the inlet of a crystallization purification device, the outlet of the crystallization purification device is connected to the inlet of a first buffer tank, the outlet of the first buffer tank is connected to a primary filtering device, and the outlet of the primary filtering device is connected to the inlet of a first mixing device.

[0006] The bottom outlet of the first mixing device is connected to the inlet of the second buffer tank; the outlet of the second buffer tank is connected to the inlet of the secondary filtering device, and the outlet of the secondary filtering device is connected to the inlet of the second mixing device;

[0007] The product outlet at the bottom of the second mixing device is connected to the inlet of the four-stage filtering device, and the outlet of the four-stage filtering device is connected to the product storage tank.

[0008] A temperature sensor and a pressure sensor are provided inside the crystallization purification device; and an outlet pipe at the bottom of the crystallization purification device is connected to a residual discharge tank.

[0009] A sampling port is provided at the bottom of the No. 1 buffer tank, and a first valve is provided at the sampling port.

[0010] The waste liquid outlet at the bottom of the second mixing device is connected to the waste liquid collection tank; a numerically controlled stirring paddle and a temperature sensor are also provided inside the second mixing device.

[0011] The first mixing device is internally provided with a numerically controlled stirring paddle and a temperature sensor.

[0012] The inlet of the second mixing device is connected to the outlet of the three-stage filtering device, the inlet of the three-stage filtering device is connected to the bottom discharge port of the dilute phosphoric acid storage tank, and the top inlet of the dilute phosphoric acid storage tank is connected to the outlet of the electronic grade phosphoric acid storage tank.

[0013] The top of the dilute phosphoric acid storage tank is connected to an ultrapure water storage tank for cooling and diluting phosphoric acid. The bottom of the dilute phosphoric acid storage tank is provided with a sampling port, the sampling port is provided with a second valve, and the inside of the dilute phosphoric acid storage tank is provided with a phosphoric acid concentration detector, temperature and pressure sensors.

[0014] The inlet of the first mixing device is also connected to the outlet of the five-stage filtration device, and the inlet of the five-stage filtration device is connected to the bottom outlet of the No. 3 buffer tank; the inlet of the No. 3 buffer tank is connected to the material outlet at the bottom of the resin tower; the outlet pipe of the No. 3 buffer tank is also connected to the top inlet of the resin tower; the inlet of the resin tower is connected to the outlet of the solubilizer storage tank.

[0015] Preferably, a sampling port is provided at the bottom of the No. 3 buffer tank, and a third valve is provided at the sampling port.

[0016] A resin inlet is provided at the top of the resin tower, and a solid waste discharge port at the bottom of the resin tower is connected to a solid waste temporary storage tank; a sieve plate for compacting the resin is also provided inside the resin tower; the aperture of the sieve plate should be smaller than the particle size of the resin particles; a temperature sensor and a conductivity sensor are also provided inside the resin tower.

[0017] The inlet of the second mixing device is connected to the outlet of the sixth-stage filtration device, the inlet of the sixth-stage filtration device is connected to the outlet of the fourth buffer tank, the inlet of the fourth buffer tank is connected to the outlet of the purification device, and the inlet of the purification device is connected to the liquid outlet of the etching inhibitor storage tank.

[0018] Preferably, a sampling port is provided at the bottom of the No. 4 buffer tank, and the sampling port is provided with a fourth valve.

[0019] Preferably, a temperature sensor and a pressure sensor are provided inside the purification device.

[0020] Preferably, the bottom outlet of the No. 1 buffer tank is also connected to the inlet of the crystallization purification device.

[0021] Preferably, the pH buffer tank, solubilizer tank, electronic-grade phosphoric acid tank, and etching inhibitor tank are all equipped with liquid level sensors and temperature sensors; the primary filter device, secondary filter device, tertiary filter device, quadruple filter device, sixth filter device, and fifth filter device are all equipped with flow sensors and pressure sensors; the No. 1 buffer tank, No. 2 buffer tank, No. 3 buffer tank, and No. 4 buffer tank are all equipped with liquid level sensors, temperature sensors, and pressure sensors; the electronic-grade phosphoric acid tank, dilute phosphoric acid tank, second mixing device, and product tank are all lined with polytetrafluoroethylene material, and the connecting pipes are made of strong acid-resistant material; the inside of the dilute phosphoric acid tank is equipped with a temperature sensor and a pressure sensor; the temperature sensor, liquid level sensor, pressure sensor, flow sensor, phosphoric acid concentration detector, and the delivery pump for conveying materials are all connected to the PLC control cabinet via cables.

[0022] Compared with the prior art, the present invention has the following beneficial effects:

[0023] 1. This utility model has the ability to efficiently and deeply purify raw materials, meeting the strict standards required for electronic-grade products. At the same time, it achieves efficient mixing and continuous production of raw materials in a closed system, significantly improving the overall quality of etching liquid products.

[0024] 2. This utility model not only stabilizes the quality of the product, but also effectively reduces production costs by optimizing the production process. Overall, this new equipment significantly reduces production costs while improving production efficiency and product quality, and can achieve continuous and stable production of products. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 This is a schematic diagram of the connection structure of the continuous production device of etching liquid of the utility model;

[0026] Figure numerals: pH buffer storage tank 1, crystallization purification device 2, No. 1 buffer tank 3, primary filtration device 4, residue discharge tank 5, first valve 6, first mixing device 7, No. 2 buffer tank 8, secondary filtration device 9, electronic grade phosphoric acid storage tank 10, dilute phosphoric acid storage tank 11, ultrapure water storage tank 12, tertiary filtration device 13, second valve 14, second mixing device 15, fourth filtration device 16, product storage tank 17, waste liquid collection tank 18, solubilizer storage tank 19, resin tower 20, resin addition port 21, sieve plate 22, solid waste temporary storage tank 23, third valve 24, No. 3 buffer tank 25, fifth filtration device 26, etching inhibitor storage tank 27, purification device 28, No. 4 buffer tank 29, fourth valve 30, sixth filtration device 31. DETAILED DESCRIPTION

[0027] It should be understood that the terms "bottom, inside, top" and the like indicate positions or locations based on the positions or locations shown in the accompanying drawings and are intended only to facilitate the description of the present invention and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific position, be constructed or operate in a specific position, and therefore should not be construed as limiting the present invention. The electrical components in this utility model are all powered by an external power supply;

[0028] The temperature sensor, pressure sensor, CNC stirring paddle, conductivity sensor, liquid level sensor, flow sensor, phosphoric acid concentration detector, PLC control cabinet, delivery pump and supporting power supply circuit in this application can all be purchased through the existing market. The PLC control cabinet has corresponding electrical control to connect these electrical devices. This application does not improve the circuit or control method. These existing technologies can be fully implemented by those skilled in the art and there is no need to elaborate.

[0029] The preferred components of this application are only for the convenience of explanation, and are not intended to limit the use of such components. Other different reagents may also be used for pH buffers, solubilizers, and etching inhibitors. Such equivalent substitutions fall within the scope of protection of this application. Preferably, the raw material component in the pH buffer storage tank 1 is sodium acetate. The raw material component in the solubilizer storage tank 19 is triethanolamine. The raw material component in the electronic-grade phosphoric acid storage tank 10 is phosphoric acid. The raw material component in the etching inhibitor storage tank 27 is 2-mercaptoimidazole. The raw material component of the ultrapure water storage tank 12 is water. The raw material of the resin tower 20 is preferably an acid-resistant resin.

[0030] Preferably, the electronic-grade phosphoric acid storage tank 10, the dilute phosphoric acid storage tank 11, the second mixing device 15 and the product storage tank 17 are all lined with tetrafluoroethylene material and polytetrafluoroethylene coating, and the connecting pipes are strong acid-resistant material pipes coated with polytetrafluoroethylene;

[0031] Preferably, the pipe between the inlet of the electronic-grade phosphoric acid storage tank 10 and the outlet of the dilute phosphoric acid storage tank 11 is made of a strong acid-resistant material pipe; the pipe between the inlet of the dilute phosphoric acid storage tank 11 and the outlet of the second mixing device 15 is made of a strong acid-resistant material pipe; the pipe between the outlet of the second mixing device 15 and the inlet of the fourth-stage filter device 16, and between the outlet of the fourth-stage filter device 16 and the inlet pipe of the product storage tank 17 is made of a strong acid-resistant material pipe;

[0032] Preferably, at least one delivery pump is installed between the connecting pipes between the pH buffer storage tank 1 and the crystallization purification device 2, and between the connecting pipes between the No. 1 buffer tank 3 and the primary filtration device 4.

[0033] Preferably, at least one delivery pump is connected to a pipeline between the bottom outlet of the crystallization purification device 2 and the top inlet of the first buffer tank 3 for normal delivery of the pH buffer. The bottom outlet of the first buffer tank 3 is also connected to the top inlet of the crystallization purification device 2, and at least one delivery pump is connected to a pipeline between them for refluxing substandard pH buffer.

[0034] Preferably, at least one delivery pump is installed between the connecting pipes of the electronic-grade phosphoric acid storage tank 10 and the dilute phosphoric acid storage tank 11 , and between the connecting pipes of the dilute phosphoric acid storage tank 11 and the tertiary filtration device 13 .

[0035] Preferably, at least one delivery pump is installed between the connecting pipes between the first mixing device 7 and the second buffer tank 8, the second buffer tank 8 and the secondary filtering device 9, and the second mixing device 15 and the fourth filtering device 16.

[0036] Preferably, at least one delivery pump is installed between the connecting pipes between the etching inhibitor storage tank 27 and the purification device 28 , the purification device 28 and the fourth buffer tank 29 , and the fourth buffer tank 29 and the sixth-stage filtration device 31 .

[0037] Preferably, at least one delivery pump is installed between the connecting pipes of the solubilizer storage tank 19 and the resin tower 20, and between the No. 3 buffer tank 25 and the five-stage filtration device 26.

[0038] Preferably, the inlet of buffer tank No. 3 25 is connected to the material outlet at the bottom of resin tower 20, and at least one delivery pump is installed between the connecting pipes to normally deliver the solubilizer. The outlet pipe of buffer tank No. 3 25 is also connected to the top inlet of resin tower 20, and at least one delivery pump is installed between the connecting pipes to recirculate substandard solubilizer.

[0039] Example 1

[0040] A continuous production device for etching liquid includes a pH buffer storage tank 1, the outlet of the pH buffer storage tank 1 is connected to the inlet of a crystallization purification device 2, the outlet of the crystallization purification device 2 is connected to the inlet of a No. 1 buffer tank 3, the outlet of the No. 1 buffer tank 3 is connected to a primary filtering device 4, and the outlet of the primary filtering device 4 is connected to the inlet of a first mixing device 7.

[0041] The bottom outlet of the first mixing device 7 is connected to the inlet of the second buffer tank 8; the outlet of the second buffer tank 8 is connected to the inlet of the secondary filtering device 9, and the outlet of the secondary filtering device 9 is connected to the inlet of the second mixing device 15;

[0042] The product outlet at the bottom of the second mixing device 15 is connected to the inlet of the fourth-stage filtering device 16 , and the outlet of the fourth-stage filtering device 16 is connected to the product storage tank 17 .

[0043] A temperature sensor and a pressure sensor are provided inside the crystallization purification device 2 ; an outlet pipe at the bottom of the crystallization purification device 2 is connected to the residual discharge tank 5 .

[0044] A sampling port is provided at the bottom of the No. 1 buffer tank 3 , and a first valve 6 is provided at the sampling port.

[0045] The waste liquid outlet at the bottom of the second mixing device 15 is connected to the waste liquid collection tank 18; a numerically controlled stirring blade and a temperature sensor are also provided inside the second mixing device 15.

[0046] The first mixing device 7 is internally provided with a numerically controlled stirring blade and a temperature sensor.

[0047] The inlet of the second mixing device 15 is connected to the outlet of the tertiary filtration device 13 , the inlet of the tertiary filtration device 13 is connected to the bottom discharge port of the dilute phosphoric acid storage tank 11 , and the top inlet of the dilute phosphoric acid storage tank 11 is connected to the outlet of the electronic grade phosphoric acid storage tank 10 .

[0048] The top of the dilute phosphoric acid storage tank 11 is connected to an ultrapure water storage tank 12 for cooling and diluting phosphoric acid. A sampling port is provided at the bottom of the dilute phosphoric acid storage tank 11, and a second valve 14 is provided at the sampling port. A phosphoric acid concentration detector, temperature and pressure sensors are provided inside the dilute phosphoric acid storage tank 11.

[0049] The inlet of the first mixing device 7 is also connected to the outlet of the five-stage filtration device 26, and the inlet of the five-stage filtration device 26 is connected to the bottom outlet of the No. 3 buffer tank 25; the inlet of the No. 3 buffer tank 25 is connected to the material outlet at the bottom of the resin tower 20; the outlet pipe of the No. 3 buffer tank 25 is also connected to the top inlet of the resin tower 20; the inlet of the resin tower 20 is connected to the outlet of the solubilizer storage tank 19.

[0050] Preferably, a sampling port is provided at the bottom of the No. 3 buffer tank 25 , and a third valve 24 is provided at the sampling port.

[0051] A resin inlet 21 is provided at the top of the resin tower 20, and a solid waste discharge port at the bottom of the resin tower 20 is connected to a solid waste temporary storage tank 23; a sieve plate 22 for compacting the resin is also provided inside the resin tower 20; the aperture of the sieve plate 22 should be smaller than the particle size of the resin particles; preferably, a temperature sensor and a conductivity sensor are also provided inside the resin tower 20.

[0052] The inlet of the second mixing device 15 is connected to the outlet of the sixth-stage filtration device 31 , the inlet of the sixth-stage filtration device 31 is connected to the outlet of the fourth buffer tank 29 , the inlet of the fourth buffer tank 29 is connected to the outlet of the purification device 28 , and the inlet of the purification device 28 is connected to the liquid outlet of the etching inhibitor storage tank 27 .

[0053] Preferably, a sampling port is provided at the bottom of the No. 4 buffer tank 29 , and a fourth valve 30 is provided at the sampling port.

[0054] Preferably, a temperature sensor and a pressure sensor are provided inside the purification device 28 .

[0055] Preferably, the pH buffer storage tank 1, the solubilizer storage tank 19, the electronic-grade phosphoric acid storage tank 10, and the etching inhibitor storage tank 27 are all provided with liquid level sensors and temperature sensors; the first-level filter device 4, the second-level filter device 9, the third-level filter device 13, the fourth-level filter device 16, the sixth-level filter device 31, and the fifth-level filter device 26 are all provided with flow sensors and pressure sensors; the No. 1 buffer tank 3, the No. 2 buffer tank 8, the No. 3 buffer tank 25, and the No. 4 buffer tank 29 are all provided with liquid level sensors, temperature sensors, and pressure sensors; the electronic-grade phosphoric acid storage tank 10, the dilute phosphoric acid storage tank 11, the second mixing device 15, and the product storage tank 17 are all lined with polytetrafluoroethylene material, and the connecting pipes are made of strong acid-resistant material; the inside of the dilute phosphoric acid storage tank 11 is provided with a temperature sensor and a pressure sensor; the temperature sensor, liquid level sensor, pressure sensor, flow sensor, phosphoric acid concentration detector, and the conveying pump for conveying materials are all connected to the PLC control cabinet via cables.

[0056] Example 2

[0057] A continuous production device for etching liquid includes a pH buffer storage tank 1, a solubilizer storage tank 19, an electronic grade phosphoric acid storage tank 10, and an etching inhibitor storage tank 27; the pH buffer storage tank 1 is sequentially connected to a crystallization purification device 2, a buffer tank 3, a primary filtration device 4, a first mixing device 7, a second buffer tank 8, a secondary filtration device 9, a second mixing device 15, a fourth filtration device 16, and a product storage tank 17 through a pipeline; the bottom of the crystallization purification device 2 is connected to a residual tank 5, and a buffer tank 3 is provided between the crystallization purification device 2 and the first mixing device 7; a second buffer tank 8 is provided between the first mixing device 7 and the second mixing device 15, and the bottom of the second mixing device 15 is connected to a waste liquid collection tank 18; The agent storage tank 19 is connected to the resin tower 20, the buffer tank 25, the five-stage filtration device 26 and the first mixing device 7 in sequence through pipelines; the resin tower 20 is provided with a resin addition inlet 21 at the top and a solid waste temporary storage tank 23 at the bottom, and a buffer tank 25 is provided between the resin tower 20 and the first mixing device 7; the electronic-grade phosphoric acid storage tank 10 is connected to the dilute phosphoric acid storage tank 11, the three-stage filtration device 13 and the second mixing device 15 in sequence through pipelines; the top of the dilute phosphoric acid storage tank 11 is connected to the ultrapure water storage tank 12, and a phosphoric acid concentration detector is provided inside the dilute phosphoric acid storage tank 11; the etching inhibitor storage tank 27 is connected to the purification device 28, the fourth buffer tank 29, the six-stage filtration device 31 and the second mixing device 15 in sequence through pipelines;

[0058] Preferably, a temperature sensor and a pressure sensor are provided inside the crystallization purification device 2; a sampling port is provided at the bottom of the buffer tank 3, and a valve 6 is provided at the sampling port; a primary filtering device 4 is provided between the buffer tank 3 and the first mixing device 7.

[0059] Preferably, a sieve plate 22 for compacting the resin is provided inside the resin tower 20; the aperture of the sieve plate 22 should be smaller than the particle size of the resin particles; a temperature sensor and a conductivity sensor are provided inside the resin tower 20; a resin addition port 21 is provided at the top of the resin tower 20, and a discharge port is provided at the bottom; the discharge port is connected to the solid waste temporary storage tank 23.

[0060] Preferably, a sampling port is provided at the bottom of the buffer tank 25 , and a third valve 24 is provided at the sampling port.

[0061] Preferably, an ultrapure water storage tank 12 for cooling and diluting phosphoric acid is connected to the top of the dilute phosphoric acid storage tank 11, and a phosphoric acid concentration detector, temperature and pressure sensors are provided inside the dilute phosphoric acid storage tank 11; a sampling port is provided at the bottom of the dilute phosphoric acid storage tank 11, and a second valve 14 is provided at the sampling port; a three-stage filtration device 13 is provided between the dilute phosphoric acid storage tank 11 and the second mixing device 15.

[0062] Preferably, a temperature sensor and a pressure sensor are provided inside the purification device 28; a sampling port is provided at the bottom of the No. 4 buffer tank 29, and a fourth valve 30 is provided at the sampling port; a six-stage filtering device 31 is provided between the No. 4 buffer tank 29 and the second mixing device 15.

[0063] Preferably, both the first mixing device 7 and the second mixing device 15 are provided with CNC stirring paddles and temperature sensors; a second buffer tank 8 is provided between the first mixing device 7 and the second mixing device 15, and a secondary filtering device 9 is provided between the second buffer tank 8 and the second mixing device 15.

[0064] Preferably, a four-stage filtering device 16 is provided between the second mixing device 15 and the product storage tank 17 .

[0065] Preferably, the pH buffer storage tank 1, the solubilizer storage tank 19, the electronic-grade phosphoric acid storage tank 10, and the etching inhibitor storage tank 27 are all provided with liquid level sensors and temperature sensors; the first-level filter device 4, the second-level filter device 9, the third-level filter device 13, the fourth-level filter device 16, the sixth-level filter device 31, and the fifth-level filter device 26 are all provided with flow sensors and pressure sensors; the buffer tank 3, the second buffer tank 8, the third buffer tank 25, and the fourth buffer tank 29 are all provided with liquid level sensors, temperature sensors, and pressure sensors; the electronic-grade phosphoric acid storage tank 10, the dilute phosphoric acid storage tank 11, the second mixing device 15, and the product storage tank 17 are all lined with polytetrafluoroethylene material, and the connecting pipes are made of strong acid-resistant material; a temperature sensor and a pressure sensor are provided inside the dilute phosphoric acid storage tank 11; the temperature sensor, liquid level sensor, pressure sensor, flow sensor, phosphoric acid concentration detector, and the conveying pump for conveying materials are all connected to the PLC control cabinet via cables.

[0066] like Figure 1As shown, the crystallization purification device 2 is respectively connected to the pH buffer storage tank 1, the residual tank 5 and the No. 1 buffer tank 3. A sampling valve 6 is provided at the bottom of the No. 1 buffer tank 3. When the concentration of metal ions in the pH buffer is detected to be lower than 1 ppb, it is sent to the first mixing device 7 through a pipeline delivery pump. In order to further control the particle size, a primary filtering device 4 is provided between the No. 1 buffer tank 3 and the first mixing device 7; a temperature sensor and a pressure sensor are provided inside the crystallization purification device 2; the dilute phosphoric acid storage tank 11 is respectively connected to the electronic grade phosphoric acid storage tank 10, the ultrapure water storage tank 12 and the second mixing device 15. The dilute phosphoric acid storage tank 11 is provided with a phosphoric acid concentration detector and a temperature sensor. Ultrapure water can be used for dilution of phosphoric acid. In order to further control Particle size, a three-stage filtering device 13 is provided between the dilute phosphoric acid storage tank 11 and the second mixing device 15; a resin adding port 21 is provided at the top of the resin tower 20, and a waste resin discharge port is provided at the bottom of the resin tower 20, and the waste resin discharge port is connected to the solid waste temporary storage device 23; a small hole sieve plate 22 is provided in the resin tower 20 for compacting the resin, and the aperture of the small hole sieve plate 22 should be smaller than the particle size of the resin particles. In addition, a temperature sensor and a conductivity sensor should also be provided inside the resin tower 20; a sampling port is provided at the bottom of the No. 3 buffer tank 25, and a third valve 24 is provided at the sampling port. When the concentration of metal ions in the solubilizer is detected to be lower than 1ppb, it is sent to the first mixing device 7 through the pipeline delivery pump. If the metal ions are higher than 1ppb, they are re-injected. The resin tower 20 is purified again; in order to further control the particle size, a five-stage filtration device 26 is provided between the No. 3 buffer tank 25 and the first mixing device 7; the purification device 28 is connected to the etching inhibitor storage tank 27 and the No. 4 buffer tank 29 respectively, and a temperature sensor and a pressure sensor are provided inside the purification device 28. A sampling port is provided at the bottom of the No. 4 buffer tank 29, and a fourth valve 30 is provided at the sampling port. When the concentration of metal ions in the etching inhibitor is detected to be lower than 1ppb, it is sent to the second mixing device 15 through a pipeline delivery pump; in order to further control the particle size, a six-stage filtration device 31 is provided between the No. 4 buffer tank 29 and the second mixing device 15; the first mixing device 7 is connected to the No. 1 buffer tank 3, the No. 2 buffer tank 8 and the No. 3 buffer tank respectively. The first mixing device 7 is connected to the No. 2 buffer tank 8, the buffer tank 11, the No. 4 buffer tank 29, the waste liquid collection tank 18 and the product storage tank 17, and its function is to finally mix the purified raw materials to obtain the etching solution product; in order to further control the particle size, a secondary filtering device 9 is provided between the No. 2 buffer tank 8 and the second mixing device 15; a numerically controlled stirring paddle and a temperature sensor are provided inside the second mixing device 15; in order to further control the particle size of the product, a fourth filtering device 16 is provided between the second mixing device 15 and the product storage tank 17;

[0067] Its working principle is as follows: the raw material in the pH buffer storage tank 1 is sent to the crystallization purification device 2 for deep purification, and the waste liquid and residue generated during the process enter the residual tank 5, and then the purified pH buffer is sent to the No. 1 buffer tank 3 through a delivery pump. According to the sampling test results, if the concentration of metal ions in the pH buffer is higher than 1ppb, it is returned to the crystallization purification device 2 for re-purification until the concentration of metal ions is lower than 1ppb, and then it is sent to the first mixing device 7 through a pipeline delivery pump. In order to control the particle size of the raw material, a primary filtering device 4 is provided between the No. 1 buffer tank 3 and the first mixing device 7; the raw material in the solubilizer storage tank 19 is sent to the resin tower 20 for deep purification, during which the resin tower 20 is regularly replaced with fresh resin, and then the purified solubilizer is sent to the No. 3 buffer tank 25 through a delivery pump. According to the sampling test results, if the requirement of the metal ion concentration in the solubilizer being lower than 1ppb is not met, it is returned to the resin tower 20 through the internal circulation pipeline for re-purification until the concentration of metal ions is lower than 1ppb, and then it is sent to the first mixing device 7 through a pipeline delivery pump. In order to control the particle size of the raw material The raw materials in the electronic grade phosphoric acid storage tank 10 are sent to the dilute phosphoric acid storage tank 11, which is diluted with ultrapure water and used as the dilute phosphoric acid raw materials. In order to control the particle size of the raw materials, a three-stage filtering device 13 is provided between the dilute phosphoric acid storage tank 11 and the second mixing device 15. The raw materials in the etching inhibitor storage tank 27 enter the purification device 28 for deep purification, and then the purified etching inhibitor is sent to the fourth buffer tank 29 through the delivery pump. According to the sampling test results, when the etching inhibitor is The concentration of metal ions in the etching inhibitor is less than 1 ppb and is delivered to the second mixing device 15 via a pipeline pump. To control the particle size of the raw materials, a six-stage filtration device 31 is provided between the No. 4 buffer tank 29 and the second mixing device 15. The pH buffer in the No. 1 buffer tank 3 and the solubilizer in the No. 3 buffer tank 25 are pre-mixed by the first mixing device 7 and then delivered to the No. 2 buffer tank 8 via a pipeline pump as a standby raw material. To further control the particle size, a two-stage filtration device 9 is provided between the No. 2 buffer tank 8 and the second mixing device 15. The mixed raw materials in the No. 2 buffer tank 8, the etching inhibitor in the No. 4 buffer tank 29, and the raw materials in the dilute phosphoric acid storage tank 11 are sequentially added and mixed by the second mixing device 15 and then delivered to the product storage tank 17 via a pipeline. To further control the particle size of the product, a four-stage filtration device 16 is provided between the second mixing device 15 and the product storage tank 17.

[0068] The utility model deeply purifies the raw materials required for the etching liquid formula, and then uses a series of supporting devices to achieve efficient mixing and continuous production of the purified raw materials without secondary transportation, greatly reducing the risk of environmental pollution to the raw materials, reducing the transportation and storage costs of the raw materials, and significantly improving the quality of the etching liquid products.

[0069] The above embodiments are merely preferred technical solutions of the present invention and should not be construed as limiting the present invention. The embodiments and features therein may be arbitrarily combined unless they conflict. The scope of protection of the present invention shall be the technical solutions described in the claims, including equivalent alternatives to the technical features of the technical solutions described in the claims. Equivalent alternatives and improvements within this scope are also within the scope of protection of the present invention.

Claims

1. A continuous production device for etching solution, comprising a pH buffer storage tank (1), characterized in that: The outlet of the pH buffer storage tank (1) is connected to the inlet of the crystallization purification device (2), the outlet of the crystallization purification device (2) is connected to the inlet of the first buffer tank (3), the outlet of the first buffer tank (3) is connected to the primary filtering device (4), and the outlet of the primary filtering device (4) is connected to the inlet of the first mixing device (7). The bottom outlet of the first mixing device (7) is connected to the inlet of the second buffer tank (8); the outlet of the second buffer tank (8) is connected to the inlet of the secondary filtering device (9), and the outlet of the secondary filtering device (9) is connected to the inlet of the second mixing device (15); The product outlet at the bottom of the second mixing device (15) is connected to the inlet of the fourth-stage filtering device (16), and the outlet of the fourth-stage filtering device (16) is connected to the product storage tank (17).

2. The continuous production device of an etching solution according to claim 1, characterized in that: A temperature sensor and a pressure sensor are provided inside the crystallization purification device (2); and the bottom outlet pipe of the crystallization purification device (2) is connected to the residual discharge tank (5).

3. The continuous production device of an etching solution according to claim 1, characterized in that: The bottom of the No. 1 buffer tank (3) is provided with a sampling port, and the sampling port is provided with a first valve (6).

4. The continuous production device of an etching solution according to claim 1, characterized in that: The waste liquid outlet at the bottom of the second mixing device (15) is connected to the waste liquid collection tank (18); a numerically controlled stirring paddle and a temperature sensor are also provided inside the second mixing device (15).

5. The continuous production device of an etching solution according to claim 1, characterized in that: The first mixing device (7) is internally provided with a numerically controlled stirring blade and a temperature sensor.

6. The continuous production device of an etching solution according to claim 1, characterized in that: The inlet of the second mixing device (15) is connected to the outlet of the tertiary filtration device (13), the inlet of the tertiary filtration device (13) is connected to the bottom discharge port of the dilute phosphoric acid storage tank (11), and the top inlet of the dilute phosphoric acid storage tank (11) is connected to the outlet of the electronic grade phosphoric acid storage tank (10).

7. The continuous production device of an etching solution according to claim 6, characterized in that: The top of the dilute phosphoric acid storage tank (11) is connected to an ultrapure water storage tank (12) for cooling and diluting phosphoric acid. A sampling port is provided at the bottom of the dilute phosphoric acid storage tank (11). The sampling port is provided with a second valve (14). A phosphoric acid concentration detector, temperature and pressure sensors are provided inside the dilute phosphoric acid storage tank (11).

8. The continuous production device of an etching solution according to claim 1, characterized in that: The inlet of the first mixing device (7) is also connected to the outlet of the five-stage filtering device (26), and the inlet of the five-stage filtering device (26) is connected to the bottom outlet of the No. 3 buffer tank (25); the inlet of the No. 3 buffer tank (25) is connected to the material outlet at the bottom of the resin tower (20); the outlet pipe of the No. 3 buffer tank (25) is also connected to the top inlet of the resin tower (20); and the inlet of the resin tower (20) is connected to the outlet of the solubilizer storage tank (19).

9. The continuous production device of etching solution according to claim 8, characterized in that: The resin tower (20) is provided with a resin inlet (21) at the top, and a solid waste discharge port at the bottom of the resin tower (20) is connected to a solid waste temporary storage tank (23); a sieve plate (22) for compacting the resin is also provided inside the resin tower (20); the aperture of the sieve plate (22) should be smaller than the particle size of the resin particles; and a temperature sensor and a conductivity sensor are also provided inside the resin tower (20).

10. The continuous production device of etching solution according to claim 1, characterized in that: The inlet of the second mixing device (15) is connected to the outlet of the six-stage filtering device (31), the inlet of the six-stage filtering device (31) is connected to the outlet of the fourth buffer tank (29), the inlet of the fourth buffer tank (29) is connected to the outlet of the purification device (28), and the inlet of the purification device (28) is connected to the liquid outlet of the etching inhibitor storage tank (27).

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