Dopant feeding tool for single crystal furnace

The single crystal furnace dopant feeding tooling with a quartz shield and detachable connectors solves the problems of complex structure and high cost of existing devices, achieves safe and efficient addition of dopants, reduces production costs and improves the maintenance convenience of the equipment.

CN223329422UActive Publication Date: 2025-09-12云南嘉泰来新材料有限公司 +1
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Patent Information

Application Number
CN202422540192.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-10-21
Publication Date
2025-09-12
Estimated Expiration
2034-10-21

AI Technical Summary

Technical Problem

The existing single crystal furnace doping device has a complex structure, resulting in high production costs and difficulty in promotion.

Method used

The single crystal furnace dopant feeding tooling adopts a quartz shield and a detachable connector. The quartz shield protects the dopant from volatilizing at high temperature and adding it into the single crystal furnace to avoid spontaneous combustion and splashing.

Benefits of technology

The structure of the charging device is simplified, the production cost is reduced, and the dopant is effectively prevented from damaging the furnace internals and polluting the environment, and the maintenance is easy.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of monocrystalline silicon manufacturing, in particular to a dopant feeding tool for a single crystal furnace, which comprises a quartz shield, the bottom of the quartz shield is open, the top of the quartz shield is provided with a hanging lug, and a hanging hole is formed in the hanging lug in a penetrating manner; a barrel body is arranged in the quartz protective cover, a doping agent is placed in the barrel body, the barrel body is sent into the quartz protective cover through the bottom opening from bottom to top, and the quartz protective cover is detachably connected with the barrel body through a connecting piece. Compared with a traditional method, according to the technical scheme, the dopant is protected inside through the quartz shield, and the dopant is added into the single crystal furnace in a volatilization manner, so that the dopant with a low ignition point can be effectively prevented from spontaneous combustion to damage internal parts of the single crystal furnace, and the situation that the dopant substance is easy to splash to pollute the operation environment can be avoided; the feeding tool is simple in structure, low in cost and beneficial to self-production and self-use.
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Description

Technical Field

[0001] The utility model relates to the technical field of single crystal silicon manufacturing, in particular to a dopant feeding tool for a single crystal furnace. Background Art

[0002] A single crystal furnace is a device for pulling single crystal silicon required for producing solar cells. Dopants play a vital role in the crystal growth process, as they can affect the electrical, thermal and other physical properties of the crystal.

[0003] The patent document with patent announcement number: CN118600528A discloses a single crystal furnace doping device and a single crystal furnace, including a feeding chamber, a vacuum storage chamber, a discharge hopper and a discharge pipe, wherein the feeding chamber is provided with a feeding port, the vacuum storage chamber can store solid dopants, and the bottom of the discharge hopper is provided with a discharge port. The vacuum storage chamber is sealedly connected to the feeding chamber, the discharge hopper and the discharge pipe. The discharge pipe transports the solid dopant to avoid contact with the external environment. Even if the solid dopant produces volatile gas, it will not diffuse into the environment outside the furnace, thereby ensuring the safety of the production process; an isolation valve is provided between the feeding chamber and the vacuum storage chamber. The isolation valve can be opened automatically and continuously to realize multiple feedings, thereby facilitating the improvement of the uniformity of the resistance of the crystal rod and the efficiency of solid-phase doping.

[0004] Although the above-mentioned feeding device can protect the dopant and avoid contamination, its structure is relatively complex, the cost is high, and it is difficult to promote. Utility Model Content

[0005] In order to overcome the above technical problems, the purpose of the present invention is to provide a single crystal furnace dopant feeding tool, which solves the problem that when adding dopants into the single crystal furnace, the feeding device has a complex structure and increases production costs.

[0006] The purpose of the utility model can be achieved through the following technical solutions:

[0007] A dopant feeding tool for a single crystal furnace comprises a quartz shield, the bottom of the quartz shield is open, the top of the quartz shield is provided with a hanging ear, and the hanging ear is penetrated by a hanging hole;

[0008] A barrel is provided in the quartz shield. Dopant is placed in the barrel. The barrel is fed into the quartz shield from bottom to top through the bottom opening. The quartz shield and the barrel are detachably connected via a connector.

[0009] Furthermore, a furnace platform connecting rod is provided inside the single crystal furnace for lifting, and the size of the furnace platform connecting rod matches the size of the lifting hole.

[0010] Furthermore, the dopant is in solid or liquid state.

[0011] Furthermore, the barrel body is a cylindrical structure with an open top, and a gap is left between the outer diameter of the barrel body and the inner diameter of the quartz shield.

[0012] Furthermore, the connecting piece includes a hook and a hanging ring, the hook is installed at the top of the inner cavity of the quartz shield, and the hanging ring is installed at the top opening of the barrel body.

[0013] Furthermore, the connecting part includes a threaded barrel, a hanging arm and a threaded column, the bottom of the threaded barrel is open, the inner wall of the threaded barrel is provided with an internal thread, the hanging arm is installed at the top opening of the barrel body, the threaded column is installed at the position of the top of the hanging arm corresponding to the threaded barrel, and the outer wall of the threaded column is provided with an external thread.

[0014] Furthermore, a cone head is formed on the top of the threaded column.

[0015] Furthermore, the inner cavity height of the quartz shield is greater than the height of the barrel.

[0016] Furthermore, a telescopic rod is provided inside the quartz shield, and the telescopic rod is used to adjust the distance between the barrel body and the bottom opening of the quartz shield.

[0017] Beneficial effects of the utility model:

[0018] Compared with the traditional method, this technical solution protects the dopant inside through a quartz shield, and the dopant is added to the single crystal furnace through high-temperature volatilization. It can not only effectively prevent the dopant with a low ignition point from spontaneously combusting and damaging the components inside the single crystal furnace, but also avoid the dopant material from splashing and polluting the operating environment. The feeding tooling has a simple structure, low cost, and is easy to maintain and maintain, which is conducive to self-production and self-use. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The present invention will be further described below with reference to the accompanying drawings.

[0020] Figure 1 It is a three-dimensional view of the utility model;

[0021] Figure 2 It is a cross-sectional view of the quartz shield, barrel and hook in the utility model;

[0022] Figure 3 This is a three-dimensional view of the barrel and the lifting ring in the utility model;

[0023] Figure 4 It is a cross-sectional view of the quartz shield, barrel and threaded barrel in the utility model;

[0024] Figure 5 It is a three-dimensional view of the barrel and the boom in the utility model;

[0025] Figure 6 It is a cross-sectional view of the telescopic rod of the utility model installed inside the quartz shield.

[0026] In the figure: 1. Quartz shield; 11. Hanging ear; 12. Hanging hole; 2. Barrel body; 21. Lifting ring; 22. Lifting arm; 23. Threaded column; 3. Hook; 4. Threaded barrel; 5. Telescopic rod. DETAILED DESCRIPTION

[0027] The following will be combined with the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts shall fall within the scope of protection of the present invention.

[0028] like Figure 1 、 Figure 2 As shown, a single crystal furnace dopant feeding tool includes a quartz shield 1, the bottom of the quartz shield 1 is open, the top of the quartz shield 1 is provided with a hanging ear 11, the hanging ear 11 is penetrated by a hanging hole 12, and a furnace table connecting rod is provided inside the single crystal furnace for lifting, and the size of the furnace table connecting rod matches the size of the hanging hole 12; a barrel body 2 is provided inside the quartz shield 1, and a dopant is placed in the barrel body 2. The barrel body 2 is fed into the interior of the quartz shield 1 from bottom to top through the bottom opening, and the quartz shield 1 and the barrel body 2 are detachably connected by a connector.

[0029] When using the tool to add dopants, first clean the tool with alcohol, then put the dopant into the barrel 2, and install the barrel 2 inside the quartz shield 1. Quartz has the characteristics of high melting point and corrosion resistance, which is suitable for use in the high temperature environment of the single crystal furnace. Then, hang the quartz shield 1 on the furnace table connecting rod through the hanging hole 12, start the sub-chamber rotation, bring the quartz shield 1 into the single crystal furnace table, control the quartz shield 1 to drop to 20mm above the liquid level in the single crystal furnace. The temperature inside the single crystal furnace is relatively high, wait for the dopant in the barrel 2 to volatilize, and after the dopant volatilizes, lift the quartz shield 1 out to complete the adding process. This solution protects the dopant inside through the quartz shield 1, and the dopant is added to the single crystal furnace by high-temperature volatilization. It can not only effectively prevent the dopant with a low ignition point from spontaneously combusting and damaging the components inside the single crystal furnace, but also avoid the dopant material from splashing and polluting the operating environment. The feeding tool has a simple structure, low cost, and is easy to maintain and maintain, which is conducive to self-production and self-use.

[0030] It's important to note that the dopant's form also affects its volatilization rate. Generally, dopants are either solid or liquid. For example, solid dopants typically require higher temperatures to volatilize, while liquid or gaseous dopants may volatilize at lower temperatures. Therefore, the volatilization rate can be controlled by varying the dopant's form. In practice, the appropriate dopant form can be selected as needed, and its concentration and dosage can be adjusted to achieve the desired volatilization effect.

[0031] like Figure 2 、 Figure 3 As shown, barrel 2 is a cylindrical structure with an open top, facilitating the addition of dopants. A gap exists between the outer diameter of barrel 2 and the inner diameter of quartz shield 1. The size of this gap, as well as the size of the bottom opening of quartz shield 1, influences the volatilization efficiency of the dopant. Excessively large gaps and bottom openings can lead to rapid and uneven volatilization of the dopant, while too small can limit the volatilization rate. Therefore, the gap and bottom opening should be adjusted according to actual needs to control the volatilization rate of the dopant.

[0032] As an example, Figure 2 、 Figure 3 As shown, the connecting part includes a hook 3 and a ring 21. The hook 3 is installed at the top of the inner cavity of the quartz shield 1, and the ring 21 is installed at the top opening of the barrel body 2. During installation, the barrel body 2 is pushed upward into the interior of the quartz shield 1 until the ring 21 is hung on the hook 3.

[0033] It should be noted that the above-mentioned connector is suitable for placing solid dopants. Although the connection between the hook 3 and the ring 21 is relatively convenient, the barrel 2 will swing during and after the connection. Therefore, if liquid dopants are placed in the barrel 2, there is a possibility of leakage.

[0034] As an example, Figure 4 、 Figure 5 As shown, the connecting piece includes a threaded barrel 4, a hanging arm 22 and a threaded column 23. The hanging arm 22 is wider and has a larger area than the hanging ring 21. The bottom of the threaded barrel 4 is open, and the inner wall of the threaded barrel 4 is provided with an internal thread. The hanging arm 22 is installed at the top opening of the barrel body 2. The top of the hanging arm 22 is provided with a threaded column 23 corresponding to the position of the threaded barrel 4. The top of the threaded column 23 is formed with a cone head. The cone head at the top of the threaded column 23 serves to facilitate docking and guidance. The outer wall of the threaded column 23 is provided with an external thread. During installation, lift the barrel body 2 upward and enter the interior of the quartz shield 1 until the cone head at the top of the threaded column 23 extends into the interior of the threaded barrel 4. Then, the barrel body 2 can be rotated until the threaded column 23 is threadedly connected to the threaded barrel 4. At this time, the barrel body 2, the hanging arm 22, the threaded barrel 4 and the quartz shield 1 become a whole, preventing the barrel body 2 from swinging inside the quartz shield 1.

[0035] It should be noted that the above-mentioned connector is applicable to the placement of both solid dopants and liquid dopants, but this method also further increases the production cost, so it needs to be selected according to actual needs.

[0036] As an example, Figure 6 As shown, the inner cavity height of the quartz shield 1 is greater than the height of the barrel body 2. A telescopic rod 5 is provided inside the quartz shield 1. The telescopic rod 5 is used to adjust the distance between the barrel body 2 and the bottom opening of the quartz shield 1. By adjusting the distance, the volatilization rate of the dopant can be further controlled. This is because the closer to the liquid surface inside the single crystal furnace, the higher the temperature.

[0037] The use of the telescopic rod 5 varies depending on the connector. When using the hook 3, the ends of the telescopic rod 5 are connected to the top of the inner cavity of the quartz shield 1 and the hook 3 respectively; when using the threaded barrel 4, the ends of the telescopic rod 5 are connected to the top of the inner cavity of the quartz shield 1 and the threaded barrel 4 respectively.

[0038] It should be noted that, due to the high temperature environment, the telescopic rod 5 is manually adjusted. According to the form of the dopant and the predetermined volatilization efficiency, the extension length of the telescopic rod 5 is adjusted before the quartz shield 1 enters the single crystal furnace, thereby controlling the distance between the dopant and the liquid level in the single crystal furnace.

[0039] Throughout this specification, references to terms such as "one embodiment," "example," or "specific example" indicate that a specific feature, structure, material, or characteristic described in conjunction with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0040] The above contents are merely examples and explanations of the present invention. Those skilled in the art may make various modifications or additions to the described specific embodiments or replace them in similar ways. As long as they do not deviate from the scope of the present invention or exceed the scope defined by the claims, they shall fall within the scope of protection of the present invention.

Claims

1. A dopant feeding tool for a single crystal furnace, characterized in that: The quartz shield (1) comprises a quartz shield (1), the bottom of the quartz shield (1) is open, the top of the quartz shield (1) is provided with a hanging ear (11), and the hanging ear (11) is penetrated by a hanging hole (12); A barrel (2) is provided in the quartz shield (1), wherein a dopant is placed in the barrel (2), and the barrel (2) is fed into the quartz shield (1) from bottom to top through the bottom opening, and the quartz shield (1) and the barrel (2) are detachably connected via a connector.

2. A single crystal furnace dopant feeding tool according to claim 1, characterized in that: A furnace platform connecting rod is provided inside the single crystal furnace for lifting, and the size of the furnace platform connecting rod matches the size of the hanging hole (12).

3. The single crystal furnace dopant feeding tool according to claim 1, characterized in that: The dopant is in solid or liquid state.

4. The single crystal furnace dopant feeding tool according to claim 1, characterized in that: The barrel body (2) is a cylindrical structure with an open top, and a gap is left between the outer diameter of the barrel body (2) and the inner diameter of the quartz shield (1).

5. The single crystal furnace dopant feeding tool according to claim 1, characterized in that: The connecting piece comprises a hook (3) and a hanging ring (21), wherein the hook (3) is installed at the top of the inner cavity of the quartz shield (1), and the hanging ring (21) is installed at the top opening of the barrel body (2).

6. The single crystal furnace dopant feeding tool according to claim 1, characterized in that: The connecting piece comprises a threaded barrel (4), a hanging arm (22) and a threaded column (23); the bottom of the threaded barrel (4) is open, and the inner wall of the threaded barrel (4) is provided with an internal thread; the hanging arm (22) is installed at the top opening of the barrel body (2); the threaded column (23) is installed at a position on the top of the hanging arm (22) corresponding to the threaded barrel (4); and the outer wall of the threaded column (23) is provided with an external thread.

7. The single crystal furnace dopant feeding tool according to claim 6, characterized in that: The top of the threaded column (23) is formed with a cone head.

8. The single crystal furnace dopant feeding tool according to claim 1, characterized in that: The inner cavity height of the quartz shield (1) is greater than the height of the barrel (2).

9. The single crystal furnace dopant feeding tool according to claim 8, characterized in that: A telescopic rod (5) is provided inside the quartz shield (1), and the telescopic rod (5) is used to adjust the distance between the barrel (2) and the bottom opening of the quartz shield (1).

Citation Information

Patent Citations

  • Single crystal furnace doping device and single crystal furnace

    CN118600528A