Rotary target material

Abstract

The utility model provides a rotary target material. The rotary target material comprises a pipe cap and a pipe target which are fixedly connected, the tube target comprises a target material body with an annular structure; according to the direction far away from the pipe cap, the pipe target comprises a first sand blasting area, a sputtering area and a second sand blasting area; coaxial bosses are arranged on the surfaces of the two sides of the sputtering area. Through reasonable design of the boss structure of the sputtering area and the sand blasting area, on the premise that the sputtering effect is not affected, the service life of the sputtering target material is prolonged, and the material utilization rate is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of sputtering target materials, in particular to a rotating target material. Background Art

[0002] Sputtering is the process of bombarding a target material with ions. The process of dislodging atoms from the target is called sputtering. The deposition of these atoms on the substrate to form a film is called sputtering. This process typically involves gas discharge to generate ionized gas. The resulting positive ions, under the influence of an electric field, bombard a cathode target at high speed, knocking atoms or molecules from the target away. These atoms or molecules then fly to the substrate, where they deposit as a thin film.

[0003] Sputtering targets are one of the most important raw materials in the fabrication of semiconductor integrated circuits. Target materials primarily include Al, Ni, Cu, Ti, W, precious metals, and their alloys. They are primarily used in the fabrication of physical vapor deposition thin films for integrated circuits, such as contacts, vias, interconnects, barrier layers, and packaging. During the sputtering process, accelerated ions bombard the target surface, causing atoms to deposit onto the substrate. Target life is a crucial factor during its use.

[0004] CN 211443406U discloses a nozzle protection device for a rotating sputtering target. The nozzle protection device includes a ring cover for covering the nozzle of the rotating sputtering target. A fastening structure is provided between the inner side wall of the ring cover and the outer side wall of the nozzle of the rotating sputtering target. The ring cover is fastened to the nozzle of the rotating sputtering target by the fastening structure. The outer side of the ring cover is formed with a convex shoulder protruding toward the center. The inner side of the convex shoulder abuts against the nozzle surface of the rotating sputtering target, but the structure is relatively complex.

[0005] CN 211388351U discloses a protective structure for a TFT planar sputtering target used in sandblasting equipment. The protective structure includes a first protective layer that adheres closely to the upper surface of the substrate of the TFT planar sputtering target, a second protective layer attached to the side of the substrate, and a third protective layer that wraps around both ends of the backplate of the TFT planar sputtering target. The first protective layer completely covers the upper surface of the substrate; the second protective layer is closed along the edge of the substrate, with the bottom edge of the second protective layer flush with the bonding surface of the backplate, and the upper edge of the second protective layer wraps around the edge of the first protective layer. On the bonding surface of the backplate, the inner edges of the two third protective layers surround the bottom edge of the second protective layer to form a sandblasting area, but the structure is relatively complex.

[0006] CN 211972432U discloses a planar sputtering target, comprising a main board, a fixing hole, and a slideway. An extension plate is fixed below the main board, a limit block is placed above the fixing hole, a limit block is fixed inside the slideway, a fixing mechanism is placed inside the mounting plate, a back plate is fixed behind the main board, and a water tank is provided on the surface of the back plate, but the structure is relatively complex.

[0007] Therefore, it is necessary to develop a target material with a simple structure, suitable for sputtering coating equipment, good use effect, and broad application prospects. Utility Model Content

[0008] In view of the shortcomings of the prior art, the present invention aims to provide a rotating target material. The rotating target material provided by the present invention has a novel shape, which can not only achieve the purpose of extending the sputtering life, but also does not affect the magnetron sputtering effect due to the thickening of the target material.

[0009] To achieve this purpose, the present invention adopts the following technical solutions:

[0010] The utility model provides a rotating target material, which comprises a tube cap and a tube target which are fixedly connected; the tube target comprises a target material body with an annular structure;

[0011] In a direction away from the tube cap, the tube target includes a first sandblasting area, a sputtering area, and a second sandblasting area;

[0012] Coaxial bosses are provided on both side surfaces of the sputtering area.

[0013] The utility model provides a new shape design scheme for the use of a rotating sputtering target. A boss is designed in the sputtering area corresponding to the rotating target, which can not only extend the service life of the sputtering target, but also will not affect the magnetron sputtering effect due to the thickening of the target; and improve the material utilization rate of the rotating target.

[0014] As a preferred technical solution of the present invention, the length of the tube target is 500-800 mm, for example, it can be 500 mm, 550 mm, 600 mm, 650 mm, 700 mm, 750 mm or 800 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0015] Preferably, the inner surface diameter of the tube target is 68-72 mm, for example, 68 mm, 69 mm, 70 mm, 71 mm or 72 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0016] As a preferred technical solution of the present invention, the length of the first sandblasting area is 50 to 80 mm, for example, it can be 50 mm, 55 mm, 60 mm, 65 mm, 70 mm, 75 mm or 80 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0017] Preferably, the length of the sputtering area is 300 to 600 mm, for example, 300 mm, 350 mm, 400 mm, 450 mm, 500 mm, 550 mm or 600 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0018] Preferably, the length of the second sandblasting area is 150 to 200 mm, for example, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm or 200 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0019] As a preferred technical solution of the present invention, the surface of the boss is divided into a flat surface in the central area and a trapezoidal inclined surface in the peripheral area.

[0020] Preferably, the length of the central area of ​​the boss is 100 to 120 mm, for example, it can be 100 mm, 104 mm, 108 mm, 112 mm, 116 mm or 120 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0021] As a preferred technical solution of the present invention, the diameter of the central area of ​​the boss is 75 to 85 mm, for example, it can be 75 mm, 77 mm, 79 mm, 81 mm, 83 mm or 85 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0022] Preferably, the edge diameter of the outer peripheral area of ​​the boss is 80 to 90 mm, for example, it can be 80 mm, 82 mm, 84 mm, 86 mm, 88 mm or 90 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0023] The difference between the diameter of the central area of ​​the boss and the edge diameter of the peripheral area of ​​the boss is 3 to 6 mm, for example, it can be 3 mm, 4 mm, 5 mm or 6 mm, but is not limited to the listed values. Other values ​​not listed within the numerical range are also applicable.

[0024] As a preferred technical solution of the present invention, the roughness of the first sandblasting area and the second sandblasting area are both 35 to 65 μm, for example, 35 μm, 40 μm, 45 μm, 50 μm, 55 μm, 60 μm or 65 μm, but are not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0025] As a preferred technical solution of the present invention, at least four first threaded holes are equidistantly arranged on the pipe cap, for example, 4, 5, 6 or 7, but not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0026] As a preferred technical solution of the present invention, at least four second threaded holes are equidistantly provided at one end of the tube target close to the tube cap, for example, 4, 5, 6 or 7, but not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0027] As a preferred technical solution of the present invention, the diameters of the first threaded hole and the second threaded hole are both 6 to 8 mm, for example, they can be 6 mm, 6.4 mm, 6.8 mm, 7.2 mm, 7.6 mm or 8 mm, but are not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0028] As a preferred technical solution of the present invention, the first threaded holes and the second threaded holes are arranged in a one-to-one correspondence.

[0029] The system refers to an equipment system, a device system or a production device.

[0030] Compared with the prior art, the beneficial effects of the present invention are:

[0031] (1) The rotary target provided by the utility model has a simple structure, is convenient and practical, and has excellent industrial application prospects;

[0032] (2) In the rotating target provided by the present invention, a boss is designed in the sputtering area, which can not only extend the service life of the sputtering target, but also will not affect the magnetron sputtering effect due to the thickening of the target; and improve the material utilization rate of the rotating target. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 A schematic structural diagram of a rotary target provided in a specific embodiment of the present utility model;

[0034] Figure 2 A side view of a rotary target material providing a specific embodiment of the present invention;

[0035] Among them: 1 is the tube cap, 2 is the tube target, 3 is the first sandblasting area, 4 is the boss, 5 is the second sandblasting area, 6 is the plane of the central area, and 7 is the trapezoidal inclined surface of the peripheral area. DETAILED DESCRIPTION

[0036] It should be understood that, in the description of the present invention, the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0037] It should be noted that, in the description of this utility model, unless otherwise expressly specified or limited, the terms "disposed," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections, electrical connections; direct connections, indirect connections through an intermediate medium, and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on specific circumstances.

[0038] The technical solution of the present invention will be further described below with reference to the accompanying drawings and through specific implementation methods.

[0039] The utility model provides a Figure 1 The rotating target material shown in the figure comprises a tube cap 1 and a tube target 2 which are fixedly connected; the tube target 2 comprises a target body having an annular structure;

[0040] In the direction away from the tube cap 1, the tube target includes a first sandblasting area 3, a sputtering area and a second sandblasting area 5;

[0041] Coaxial bosses 4 are provided on both side surfaces of the sputtering area.

[0042] The length of the tube target 2 is 500-800 mm; the inner surface diameter of the tube target 2 is 68-72 mm;

[0043] The length of the first sandblasting area 3 is 50-80 mm; the length of the sputtering area is 300-600 mm; the length of the second sandblasting area 5 is 150-200 mm;

[0044] The surface of the boss 4 is divided into a flat surface 6 in the central region and a trapezoidal inclined surface 8 in the peripheral region; the length of the central region of the boss 4 is 100-120 mm; the diameter of the central region of the boss 4 is 75-85 mm; the edge diameter of the peripheral region of the boss 4 is 80-90 mm; and the difference between the diameter of the central region of the boss and the edge diameter of the peripheral region of the boss is 3-6 mm;

[0045] The roughness of the first sandblasting area 3 and the second sandblasting area 5 are both 35 to 65 μm;

[0046] At least four first threaded holes are equidistantly arranged on the tube cap 1; at least four second threaded holes are equidistantly arranged on one end of the tube target 2 close to the tube cap 1; the first threaded holes and the second threaded holes are arranged in a one-to-one correspondence; the diameters of the first threaded holes and the second threaded holes are both 6 to 8 mm.

[0047] The side view of the rotating target is as follows Figure 2 shown.

[0048] Example 1

[0049] This embodiment provides a rotating target material, which includes a tube cap 1 and a tube target 2 fixedly connected and arranged; the tube target 2 includes a target material body with an annular structure;

[0050] In the direction away from the tube cap 1, the tube target includes a first sandblasting area 3, a sputtering area and a second sandblasting area 5;

[0051] Coaxial bosses 4 are provided on both side surfaces of the sputtering area.

[0052] The length of the tube target 2 is 700 mm; the inner surface diameter of the tube target 2 is 70 mm;

[0053] The length of the first sandblasting area 3 is 70 mm; the length of the sputtering area is 450 mm; the length of the second sandblasting area 5 is 180 mm;

[0054] The surface of the boss 4 is divided into a flat surface 6 in the central region and a trapezoidal inclined surface 7 in the peripheral region. The length of the central region of the boss 4 is 110 mm. The diameter of the central region of the boss 4 is 78 mm. The edge diameter of the peripheral region of the boss 4 is 84 mm. The difference between the diameter of the central region of the boss and the edge diameter of the peripheral region of the boss is 6 mm.

[0055] The roughness of the first sandblasting area 3 and the second sandblasting area 5 are both 50 μm;

[0056] Six first threaded holes are equidistantly arranged on the tube cap 1; six second threaded holes are equidistantly arranged on one end of the tube target 2 close to the tube cap 1; the first threaded holes and the second threaded holes are arranged in a one-to-one correspondence; the diameters of the first threaded holes and the second threaded holes are both 7 mm.

[0057] Example 2

[0058] This embodiment provides a rotating target material, which includes a tube cap 1 and a tube target 2 fixedly connected and arranged; the tube target 2 includes a target material body with an annular structure;

[0059] In the direction away from the tube cap 1, the tube target includes a first sandblasting area 3, a sputtering area and a second sandblasting area 5;

[0060] Coaxial bosses 4 are provided on both side surfaces of the sputtering area.

[0061] The length of the tube target 2 is 500 mm; the inner surface diameter of the tube target 2 is 68 mm;

[0062] The length of the first sandblasting area 3 is 50 mm; the length of the sputtering area is 300 mm; the length of the second sandblasting area 5 is 150 mm;

[0063] The surface of the boss 4 is divided into a flat surface 6 in the central region and a trapezoidal inclined surface 7 in the peripheral region. The length of the central region of the boss 4 is 100 mm. The diameter of the central region of the boss 4 is 75 mm. The edge diameter of the peripheral region of the boss 4 is 80 mm. The difference between the diameter of the central region of the boss and the edge diameter of the peripheral region of the boss is 5 mm.

[0064] The roughness of the first sandblasting area 3 and the second sandblasting area 5 are both 35 μm;

[0065] The tube cap 1 is provided with 8 first threaded holes at equal intervals; the tube target 2 is provided with 8 second threaded holes at equal intervals at one end close to the tube cap 1; the first threaded holes and the second threaded holes are provided in a one-to-one correspondence; the diameters of the first threaded holes and the second threaded holes are both 6 mm.

[0066] Example 3

[0067] This embodiment provides a rotating target material, which includes a tube cap 1 and a tube target 2 fixedly connected and arranged; the tube target 2 includes a target material body with an annular structure;

[0068] In the direction away from the tube cap 1, the tube target includes a first sandblasting area 3, a sputtering area and a second sandblasting area 5;

[0069] Coaxial bosses 4 are provided on both side surfaces of the sputtering area.

[0070] The length of the tube target 2 is 800 mm; the inner surface diameter of the tube target 2 is 72 mm;

[0071] The length of the first sandblasting area 3 is 80 mm; the length of the sputtering area is 520 mm; the length of the second sandblasting area 5 is 200 mm;

[0072] The surface of the boss 4 is divided into a flat surface 6 in the central region and a trapezoidal inclined surface 7 in the peripheral region. The length of the central region of the boss 4 is 120 mm. The diameter of the central region of the boss 4 is 85 mm. The edge diameter of the peripheral region of the boss 4 is 88 mm. The difference between the diameter of the central region of the boss and the edge diameter of the peripheral region of the boss is 3 mm.

[0073] The roughness of the first sandblasting area 3 and the second sandblasting area 5 are both 65 μm;

[0074] Four first threaded holes are equidistantly arranged on the tube cap 1; four second threaded holes are equidistantly arranged on one end of the tube target 2 close to the tube cap 1; the first threaded holes and the second threaded holes are arranged in a one-to-one correspondence; the diameters of the first threaded holes and the second threaded holes are both 8 mm.

[0075] Example 4

[0076] This embodiment provides a rotating target material, which differs from that of embodiment 1 only in that:

[0077] In this embodiment, the edge diameter of the outer peripheral area of ​​the boss 4 is adjusted to 86 mm, and the difference between the diameter of the central area of ​​the boss and the edge diameter of the outer peripheral area of ​​the boss is adjusted to 8 mm.

[0078] Example 5

[0079] This embodiment provides a rotating target material, which differs from that of embodiment 1 only in that:

[0080] In this embodiment, the trapezoidal inclined surface of the boss 4 is omitted, that is, the length of the central area of ​​the boss 4 is 450 mm.

[0081] Example 6

[0082] This embodiment provides a rotating target material, which differs from that of embodiment 1 only in that:

[0083] In this embodiment, the roughness of the first sandblasting area 3 and the second sandblasting area 5 is adjusted to 30 μm.

[0084] Example 7

[0085] This embodiment provides a rotating target material, which differs from that of embodiment 1 only in that:

[0086] In this embodiment, the roughness of the first sandblasting area 3 and the second sandblasting area 5 is adjusted to 70 μm.

[0087] Comparative Example 1

[0088] This comparative example provides a rotary target material, which differs from Example 1 only in that:

[0089] In this comparative example, the coaxial bosses 4 on both side surfaces of the sputtering area are omitted.

[0090] Test and results:

[0091] The rotary targets provided in the above embodiments and comparative examples were applied to sputtering coating, and the service life and material utilization rate of the targets were recorded. The results are shown in Table 1.

[0092] Table 1

[0093]

[0094]

[0095] According to Table 1, we can know the following points:

[0096] (1) Comprehensive analysis of Examples 1-3 shows that the rotary target provided by the present invention prolongs the service life of the sputtering target by rationally designing the boss structure, which can be as high as 2420kW·h; and the material utilization rate can also be increased to more than 79%;

[0097] (2) A comprehensive analysis of Example 1, Examples 4-5, and Comparative Example 1 shows that when the difference between the diameter of the central area of ​​the boss and the edge diameter of the peripheral area of ​​the boss is too large, that is, the inclination angle of the trapezoidal slope of the boss is too large, resulting in a reduction in material utilization; when the trapezoidal slope is not provided in the boss, the service life of the rotary target will be reduced;

[0098] In addition, as described in Comparative Example 1, when the sputtering area of ​​the rotary target is not provided with a boss, the service life of the rotary target and the material utilization rate will be affected;

[0099] (3) A comprehensive analysis of Example 1 and Examples 6-7 shows that the surface roughness of the sandblasting area will affect the service life of the rotating target. When the roughness is too low or too high, the service life of the rotating target will be reduced, thereby affecting product quality.

[0100] In summary, the utility model extends the service life of the sputtering target and improves the material utilization rate without affecting the sputtering effect through the reasonable design of the sputtering area boss structure and the sandblasting area.

[0101] The applicant declares that the above is only a specific implementation method of the present invention, but the protection scope of the present invention is not limited thereto. Technicians in the relevant technical field should understand that any changes or substitutions that can be easily thought of by technicians in the relevant technical field within the technical scope disclosed in the present invention fall within the protection scope and disclosure scope of the present invention.

Claims

1. A rotating target, characterized in that: The rotating target comprises a tube cap and a tube target which are fixedly connected; the tube target comprises a target body having an annular structure; In a direction away from the tube cap, the tube target includes a first sandblasting area, a sputtering area, and a second sandblasting area; Coaxial bosses are provided on both side surfaces of the sputtering area.

2. The rotary target according to claim 1, wherein The length of the tube target is 500-800 mm; The inner surface diameter of the tube target is 68-72 mm.

3. The rotary target according to claim 1, wherein The length of the first sandblasting area is 50 to 80 mm; The length of the sputtering area is 300 to 600 mm; The length of the second sandblasting area is 150-200 mm.

4. The rotary target according to claim 1, wherein The surface of the boss is divided into a flat surface in the central area and a trapezoidal inclined surface in the peripheral area.

5. The rotary target according to claim 4, wherein: The length of the central area of ​​the boss is 100-120 mm.

6. The rotary target according to claim 4, wherein: The diameter of the central area of ​​the boss is 75 to 85 mm; The edge diameter of the outer peripheral area of ​​the boss is 80 to 90 mm; The difference between the diameter of the central area of ​​the boss and the edge diameter of the peripheral area of ​​the boss is 3 to 6 mm.

7. The rotary target according to claim 1, wherein: The roughness of the first sandblasting area and the second sandblasting area are both 35-65 μm.

8. The rotary target according to claim 1, wherein At least four first threaded holes are equidistantly arranged on the pipe cap; At least four second threaded holes are equidistantly arranged on one end of the tube target close to the tube cap.

9. The rotary target according to claim 8, characterized in that The first threaded holes and the second threaded holes are arranged in a one-to-one correspondence.

10. The rotary target according to claim 8, wherein The diameters of the first threaded hole and the second threaded hole are both 6-8 mm.

Images