Cavity-penetrating gas circuit structure and thin film deposition equipment

Abstract

The utility model discloses a through-cavity gas circuit structure and film deposition equipment, the through-cavity gas circuit structure includes: first cavity, second cavity, first gas mixing block, second gas mixing block and intake pipeline, first cavity and second cavity are arranged adjacently, the first gas mixing block is arranged at the top of first cavity, the second gas mixing block is arranged at the top of second cavity, and the intake pipeline is arranged at the top of second cavity. The second gas mixing block is arranged at the top of the second cavity; wherein the gas inlet pipeline is configured to distribute gas from the lower parts of the first cavity and the second cavity, then respectively penetrate through the first cavity and the second cavity, and are respectively connected with the first gas mixing block and the second gas mixing block. By adopting a lower gas distribution mode, the flow resistance of the one-to-two pipeline is increased, and the influence of difficult-to-process high-flow-resistance parts such as a gas mixing block, a large baffle plate and a spraying plate on gas distribution can be effectively inhibited, so that the gas distribution uniformity is remarkably improved, and the deposition quality of a film is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a through-cavity gas path structure and thin film deposition equipment. Background Art

[0002] Chemical Vapor Deposition (CVD) is a material preparation technique widely used in the semiconductor field. It forms a thin film by introducing one or more gaseous precursors containing the desired components onto a heated wafer surface, causing these precursors to undergo chemical reactions or thermal decomposition, thereby forming a thin film on the wafer. To ensure the quality and performance of the film, the design of the CVD equipment is particularly important, especially the design of the gas inlet assembly, which directly affects the uniform and effective distribution of gases within the reaction chamber, thereby affecting the film deposition effect. In traditional CVD equipment, the gas inlet assembly typically consists of two major components: the gas inlet line and the gas mixing block. The gas inlet line delivers the reactant gases from an external gas source into the reaction chamber, while the gas mixing block is responsible for evenly mixing the different types of gases to ensure that they are in the optimal state for the reaction process. In practical applications, especially where high-precision control of film thickness and composition is required, the design of the gas inlet assembly is particularly critical.

[0003] Traditional CVD equipment's gas box and inlet piping design tends to adopt a bottom-up gas introduction method, introducing gas into the upper chamber. To enhance equipment safety and ease of maintenance, protective shields are typically installed at key locations, and piping is avoided from being routed directly outside the chamber. Therefore, a common practice is to hollow out the non-vacuum areas of the chamber to allow the inlet piping to pass through the chamber. In dual-chamber CVD equipment, the inlet piping further branches into two paths after passing through the chamber, entering the mixing blocks of chambers A and B, respectively. To minimize the number of through-chamber openings, current designs tend to adopt an "upper-gas splitting" approach, where the piping is split into two paths after passing through the chamber, connecting to the mixing blocks of chambers A and B, respectively. However, this "upper-gas splitting" approach makes it difficult to achieve uniform gas distribution during the branching process, resulting in different gas flow rates within chambers A and B. This uneven gas distribution directly affects film deposition quality, causes unstable product performance, and even increases production costs. Utility Model Content

[0004] The embodiments of the present invention provide a through-cavity gas path structure and a thin film deposition device, aiming to solve the problem of uneven gas distribution in existing dual-cavity thin film deposition devices.

[0005] In a first aspect, the present invention provides a through-cavity air path structure, comprising: a first cavity, a second cavity, a first air mixing block, a second air mixing block, and an air intake pipeline, wherein the first cavity and the second cavity are arranged adjacent to each other, the first air mixing block is arranged at the top of the first cavity, and the second air mixing block is arranged at the top of the second cavity;

[0006] The air intake pipeline is configured to separate the air from the bottom of the first cavity and the second cavity, pass through the first cavity and the second cavity respectively, and be connected to the first gas mixing block and the second gas mixing block respectively.

[0007] Furthermore, the air intake pipeline includes a first air branch, a second air branch and a main air path, the main air path is arranged below the first cavity and the second cavity, the air intake ends of the first air branch and the second air branch are both connected to the main air path, the first air branch passes through the first cavity and its air outlet end is connected to the first air mixing block, the second air branch passes through the second cavity and its air outlet end is connected to the second air mixing block.

[0008] Furthermore, the first air distribution branch includes a first lower air distribution pipe section, a first through-cavity pipe section and a first upper air intake pipe section, one end of the first lower air distribution pipe section is connected to the main air path, the lower end of the first through-cavity pipe section is connected to the other end of the first air distribution pipe section, the first through-cavity pipe section passes through the first cavity from bottom to top, the upper end of the first through-cavity pipe section passes through the top of the first cavity and is connected to one end of the first upper air intake pipe section, and the other end of the first upper air intake pipe section is connected to the first gas mixing block.

[0009] Furthermore, the first upper air inlet pipe section includes a first upper connecting pipe section and a first upper interface pipe section, the two ends of the first upper connecting pipe section are respectively connected to the upper end of the first cavity-penetrating pipe section and one end of the first upper interface pipe section, and the other end of the first upper interface pipe section is connected to the first gas mixing block; wherein, there is an angle between the first upper connecting pipe section and the first upper interface pipe section.

[0010] Furthermore, the second air distribution branch includes a second lower air distribution pipe section, a second through-cavity pipe section and a second upper air intake pipe section, one end of the second lower air distribution pipe section is connected to the main air path, the lower end of the second through-cavity pipe section is connected to the other end of the second air distribution pipe section, the second through-cavity pipe section passes through the second cavity from bottom to top, the upper end of the second through-cavity pipe section passes through the top of the second cavity and is connected to one end of the second upper air intake pipe section, and the other end of the second upper air intake pipe section is connected to the second air mixing block.

[0011] Furthermore, the second upper air inlet pipe section includes a second upper connecting pipe section and a second upper interface pipe section, the two ends of the second upper connecting pipe section are respectively connected to the upper end of the second through-cavity pipe section and one end of the second upper interface pipe section, and the other end of the second upper interface pipe section is connected to the second gas mixing block; wherein, there is an angle between the second upper connecting pipe section and the second upper interface pipe section.

[0012] Furthermore, a first diameter expansion interface is provided between the first gas mixing block and the gas outlet end of the first gas distribution branch, the first gas mixing block and the gas outlet end of the first gas distribution branch are connected through the first diameter expansion interface, and the diameter of the first diameter expansion interface is larger than the pipe diameter of the first gas mixing block and the first gas distribution branch; and / or,

[0013] A second expansion interface is provided between the second gas mixing block and the gas outlet end of the second gas distribution branch. The second gas mixing block and the gas outlet end of the second gas distribution branch are connected through the second expansion interface. The diameter of the second expansion interface is larger than the pipeline diameter of the second gas mixing block and the second gas distribution branch.

[0014] Furthermore, the first diameter expansion interface includes a first diameter expansion inlet and a first diameter expansion outlet, the first diameter expansion inlet is provided at the first gas mixing block, the first diameter expansion outlet is provided at the gas outlet end of the first gas distribution branch, and the first diameter expansion inlet and the first diameter expansion outlet are connected; and / or,

[0015] The second diameter expansion interface includes a second diameter expansion inlet and a second diameter expansion outlet. The second diameter expansion inlet is provided at the second gas mixing block, and the second diameter expansion outlet is provided at the gas outlet end of the second gas distribution branch. The second diameter expansion inlet and the second diameter expansion outlet are connected.

[0016] Furthermore, the air intake pipe is a stainless steel vacuum tube.

[0017] In a second aspect, the present invention provides a thin film deposition device, comprising the above-mentioned through-cavity gas path structure.

[0018] The utility model provides a through-cavity air path structure and a thin film deposition device, the through-cavity air path structure comprises: a first cavity, a second cavity, a first gas mixing block, a second gas mixing block and an air intake pipeline, the air intake pipeline adopts a downward gas separation method, the air intake pipeline first separates the gas below the first cavity and the second cavity, and then passes from bottom to top to the top of the first cavity and the second cavity respectively, and is connected to the first gas mixing block and the second gas mixing block on the top of the first cavity and the second cavity respectively. This downward gas separation method increases the flow resistance of the one-two-section pipeline, and can effectively suppress the influence of difficult-to-process large flow resistance parts such as gas mixing blocks, large baffles, spray plates, etc. on gas separation, thereby significantly improving the uniformity of gas separation and improving the quality of thin film deposition. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0020] Figure 1 A schematic diagram showing the existing intake pipe using upper air separation is shown;

[0021] Figure 2 A schematic diagram showing the through-cavity air path structure of an embodiment of the utility model is shown;

[0022] Figure 3 A schematic diagram showing the air intake pipe of the through-cavity air path structure according to an embodiment of the present invention is shown;

[0023] Figure 4 A partial schematic diagram of the through-cavity air path structure of an embodiment of the utility model is shown;

[0024] Figure 5 Shown Figure 4 A partial enlarged schematic diagram;

[0025] Reference numerals:

[0026] 1. First cavity; 2. Second cavity; 3. First gas mixing block; 31. First expanded diameter inlet; 4. Second gas mixing block; 41. Second expanded diameter inlet; 5. Air intake pipe; 51. First gas distribution branch; 511. First lower gas distribution pipe section; 512. First through-cavity pipe section; 513. First upper gas intake pipe section; 5131. First upper connecting pipe section; 5132. First upper interface pipe section; 514. First expanded diameter outlet; 52. Second gas distribution branch; 521. Second lower gas distribution pipe section; 522. Second through-cavity pipe section; 523. Second upper gas intake pipe section; 5231. Second upper connecting pipe section; 5232. Second upper interface pipe section; 524. Second expanded diameter outlet; 53. Main gas circuit. DETAILED DESCRIPTION

[0027] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0028] Directional terms used in this disclosure, such as "upper," "lower," "front," "rear," "left," "right," "inner," "outer," and "side," refer only to directions in the accompanying drawings. Therefore, these directional terms are intended to illustrate and facilitate understanding of this disclosure and are not intended to limit this disclosure. Furthermore, in the accompanying drawings, similar or identical structures are denoted by the same reference numerals.

[0029] In a dual-chamber CVD device, it is crucial to ensure the thickness consistency of the deposited films in the two reaction chambers. To achieve this goal, the uniformity of the gas distribution in the gas inlet pipeline becomes a decisive factor. Specifically, only when the gas can be evenly distributed and enter the two reaction chambers can the consistency of the film deposition process in the two chambers be guaranteed, thereby obtaining a film product with uniform thickness. However, if Figure 1 As shown in the figure, in the current design of dual-chamber CVD equipment, the "upper gas separation" solution is commonly adopted, that is, the gas first enters the equipment through a common inlet, and then splits into two paths after passing through the chamber wall, leading to the mixing blocks of the two reaction chambers A and B respectively. Although this design simplifies the physical layout and reduces the number of through-cavity openings, it has certain drawbacks. The reason is that due to the difference in flow resistance between the two reaction chambers, it is difficult to ensure completely uniform distribution of gas after the bifurcation point. This flow resistance mismatch phenomenon will cause some gas to flow more to one chamber and relatively less to the other, ultimately resulting in inconsistent film deposition rate and thickness in the two chambers, affecting product quality and production efficiency.

[0030] In order to solve this problem, the embodiment of the present invention proposes a through-cavity air path structure and a thin film deposition device, which solves the problem of uneven gas distribution between the two cavities by adopting a lower gas distribution method, improves the uniformity of air intake, and improves the quality of thin film deposition.

[0031] The embodiment of the present utility model is to solve the problem of uneven gas distribution mentioned above. The specific idea is as follows: the reason for the mismatch of flow resistance between the two reaction chambers is that the processing precision of the two chamber components is inconsistent, especially for large flow resistance parts that are difficult to process, such as mixing blocks, large baffles, spray plates, etc. The inconsistent processing precision of these parts will cause differences in the flow resistance of the two chambers, thereby leading to uneven gas distribution. In order to avoid the influence of mismatch of flow resistance on the uniformity of gas distribution, the solution of this application is to increase the flow resistance after gas distribution, because the flow resistance after gas distribution affects the flow resistance of each of the two chambers. Therefore, the greater the flow resistance after gas distribution, the more it can offset the influence of mismatch of flow resistance caused by inconsistent processing precision of large flow resistance parts (the greater the flow resistance, the smaller the influence of flow resistance difference caused by inconsistent processing precision). In other words, by increasing the flow resistance of the pipeline after one-to-two division, the influence of large flow resistance parts on gas distribution can be effectively suppressed, thereby significantly improving the uniformity of gas distribution and improving the quality of thin film deposition.

[0032] In order to better understand the above technical solution, the above technical solution will be described in detail below with reference to the accompanying drawings and specific implementation methods.

[0033] See also Figure 1-Figure 5 The embodiment of the utility model shows a through-cavity air path structure, including: a first cavity 1, a second cavity 2, a first gas mixing block 3, a second gas mixing block 4 and an air intake pipe 5. The first cavity 1 and the second cavity 2 are arranged adjacent to each other, the first gas mixing block 3 is arranged at the top of the first cavity 1, and the second gas mixing block 4 is arranged at the top of the second cavity 2; wherein, the air intake pipe 5 is configured to separate the gas from the bottom of the first cavity 1 and the second cavity 2, and then pass through the first cavity 1 and the second cavity 2 respectively, and be connected to the first gas mixing block 3 and the second gas mixing block 4 respectively.

[0034] Specifically, the reaction chamber of this embodiment is a dual-cavity structure, having two cavities, namely a first cavity 1 and a second cavity 2. The two cavities are arranged adjacent to each other, and the interiors of the first cavity 1 and the second cavity 2 are respectively used for process gas processing to deposit thin films. The first gas mixing block 3 is arranged at the center of the top of the first cavity 1, and the second gas mixing block 4 is arranged at the center of the top of the second cavity 2. The first gas mixing block 3 and the second gas mixing block 4 are used to mix the various reaction gases evenly together to ensure that they enter the cavity in the correct proportion. Both cavities are equipped with components of the same specifications. These include components related to gas delivery, such as gas mixing blocks, large baffles, spray plates, etc. In principle, these components require the two cavities to remain consistent, but in actual applications, it is often difficult to ensure that the processing accuracy is completely consistent, which leads to differences in the flow resistance of the two cavities, that is, the flow resistance is not matched, so the uniformity of the gas distribution is affected. For this reason, the air intake pipe 5 of this embodiment adopts a lower air separation method compared to the previous upper air separation method, that is, the air intake pipe 5 first separates the air below the first cavity 1 and the second cavity 2, thereby forming two branches of air separation. After the air separation, the two branches then pass through the first cavity 1 and the second cavity 2 respectively. After passing through the first cavity 1 and the second cavity 2, the two branches are respectively connected to the first mixing block 3 on the top of the first cavity 1 and the second mixing block 4 on the top of the second cavity 2. The difference between this lower air separation method and the upper air separation method is that the upper air separation is that the air intake pipe 5 passes through the cavity to the top of the cavity and then divides the air into two, while the lower air separation is that the air intake pipe 5 first divides the air into two below the double cavity and then passes through the cavity separately. The lower air separation has an additional pipeline that passes through the cavity part, that is, the pipeline after the split is added, which increases the flow resistance of the one-two section pipeline. It should be noted that there are various structural forms of the air intake pipe 5. No matter what the structure is, as long as it can achieve the downward gas separation method, it is not limited here.

[0035] The flow resistance components (gas mixing block, large baffle, spray plate, etc.) in the dual-cavity CVD chamber are connected in series in sequence. The total flow resistance of each cavity is equal to the sum of the flow resistance of each flow resistance component in each cavity. The section of the air inlet pipe 5 after it is divided into two is part of the total flow resistance, thus affecting the matching degree of the flow resistance of the two cavities. It can be understood that, among them, is the flow resistance of the cavity, is the flow resistance of the pipeline divided into two sections, and is the flow resistance of the flow resistance component. The processing precision of the pipeline itself is high, and the difference in the flow resistance of the pipeline is negligible. The flow resistance is greatly affected by the difficult-to-process flow resistance components in the cavity. The inconsistent processing precision of these flow resistance components will cause the mismatch of the flow resistance of the two cavities. If the flow resistance of the pipeline divided into two sections is increased, the influence of the mismatch of the flow resistance caused by the inconsistent processing precision of the flow resistance components can be weakened. That is, the larger it is, the more it can offset the inconsistent influence. This embodiment increases the flow resistance of the one-two section pipeline by adopting the lower gas separation method, thereby offsetting the impact of flow resistance mismatch caused by inconsistent processing precision of the two-cavity flow resistance components, and further improving gas separation uniformity.

[0036] Through this embodiment, the flow resistance of the one-two section pipeline is increased by adopting the method of lower gas separation, which weakens the influence of the mismatch of the flow resistance of the two cavities caused by inconsistent processing precision of the flow resistance parts, thereby significantly improving the uniformity of gas separation and improving the quality of thin film deposition.

[0037] Reference Figure 2In one embodiment, the air intake pipeline 5 includes a first air branch 51, a second air branch 52 and a main air path 53. The main air path 53 is arranged below the first cavity 1 and the second cavity 2. The air inlet ends of the first air branch 51 and the second air branch 52 are both connected to the main air path 53. The first air branch 51 passes through the first cavity 1 and its air outlet end is connected to the first air mixing block 3. The second air branch 52 passes through the second cavity 2 and its air outlet end is connected to the second air mixing block 4. Specifically, the air intake pipeline 5 of this embodiment includes three sections of pipelines, namely the first air branch 51, the second air branch 52 and the main air path 53. The main air path 53 serves as the air intake channel of the air intake pipeline 5. The first air branch 51 and the second air branch 52 are branch pipelines after the air intake pipeline 5 is divided into two. The main gas path 53 is arranged below the double cavity, and adopts a cavity-penetrating method from bottom to top. The air inlet ends of the first air branch 51 and the second air branch 52 are connected to the air outlet end of the main gas path 53 below the double cavity, and the main gas path 53 is divided into two by the first air branch 51 and the second air branch 52 for air separation. The first air branch 51 and the second air branch 52 pass through the first cavity 1 and the second cavity 2 respectively. The first air branch 51 passes through the first cavity 1 and arrives at the top of the first cavity 1. The air outlet end of the first air branch 51 is connected to the first gas mixing block 3, thereby delivering the gas of the branch pipeline to the first gas mixing block 3 for mixing. The second air branch 52 passes through the second cavity 2 and arrives at the top of the second cavity 2. The air outlet end of the second branch gas path is connected to the second gas mixing block 4, thereby delivering the gas of the branch pipeline to the second gas mixing block 4 for mixing. The air inlet pipeline 5 of this embodiment has a simple structure and is easy to assemble.

[0038] Reference Figure 3In this embodiment, the first gas branch 51 includes a first lower gas branch section 511, a first through-the-cavity section 512, and a first upper air intake section 513. One end of the first lower gas branch section 511 is connected to the main gas path 53, and the lower end of the first through-the-cavity section 512 is connected to the other end of the first gas branch section. The first through-the-cavity section 512 passes through the first cavity 1 from bottom to top, and the upper end of the first through-the-cavity section 512 passes through the top of the first cavity 1 and is connected to one end of the first upper air intake section 513. The other end of the first upper air intake section 513 is connected to the first gas mixing block 3. Specifically, the first gas branch 51 of this embodiment includes three sections of pipelines, namely the first lower gas branch section 511, the first through-the-cavity section 512, and the first upper air intake section 513. The first lower gas-dividing pipe section 511 serves as a gas-dividing pipe for receiving gas diverted from the main gas path 53. Therefore, the first lower gas-dividing pipe section 511 is connected to the main gas path 53. The main gas path 53 is typically positioned between the two cavities. The first lower gas-dividing pipe section 511 is a short horizontal pipe that remains horizontal and intersects the main gas path 53 at right angles. The first through-cavity pipe section 512 is a long vertical pipe that passes through the first cavity 1 and hollows out the through-cavity at the non-vacuum position of the cavity. The first through-cavity pipe section 512 has a lower end and an upper end, and its lower end is connected to the first gas distribution pipe section. The first through-cavity pipe section 512 vertically passes through the first cavity 1, and passes through the lower cavity wall and the upper cavity wall of the first cavity 1 respectively. The first through-cavity pipe section 512 is also vertically intersected and connected with the first lower gas distribution pipe section 511. The upper end of the first through-cavity pipe section 512 passes through the top of the first cavity 1 and connects with the first upper air intake pipe section 513. The first upper air intake pipe section 513 is responsible for guiding the gas of the first through-cavity pipe section 512 to the first gas mixing block 3, so the first upper air intake pipe section 513 is connected to the first gas mixing block 3. It can be seen that the first gas distribution branch 51 of this embodiment adopts a three-section pipeline, one section of the pipeline is used for gas distribution, one section of the pipeline is used for cavity penetration, and one section of the pipeline is used for guidance. It has a simple structure and is easy to assemble.

[0039] Continue to refer to Figure 3In this embodiment, the first upper air intake pipe section 513 includes a first upper connecting pipe section 5131 and a first upper interface pipe section 5132. The two ends of the first upper connecting pipe section 5131 are respectively connected to the upper end of the first through-cavity pipe section 512 and one end of the first upper interface pipe section 5132, and the other end of the first upper interface pipe section 5132 is connected to the first gas mixing block 3. There is an included angle between the first upper connecting pipe section 5131 and the first upper interface pipe section 5132. Specifically, the first upper air intake pipe section 513 of this embodiment includes two sections of pipelines, namely the first upper connecting pipe section 5131 and the first upper interface pipe section 5132. The first upper connecting pipe section 5131 is used to connect the gas from the first through-cavity pipe section 512, and the first upper interface pipe section 5132 is used to connect to the interface of the first gas mixing block 3. Since the first gas mixing block 3 is usually arranged at the top center position of the first cavity 1, it is a certain distance away from the upper end of the first through-cavity pipe section 512, so a section of pipeline is needed to connect it; and the first gas mixing block 3 is in the shape of a rectangle as a whole, and the interface of the first gas mixing block 3 is arranged on the side of one side thereof, so a section of access pipe section is also needed to connect to its interface. The first upper connecting pipe section 5131 of this embodiment is a long horizontal pipe, and the first upper interface pipe section 5132 is a short horizontal pipe. The first upper connecting pipe section 5131 and the first upper interface pipe section 5132 are at the same level. One end of the first upper connecting pipe section 5131 is connected to the upper end of the first through-cavity pipe section 512, and the other end is connected to the front side of the interface of the first gas mixing block 3 and is connected to the first upper interface section. The first upper interface section is connected to the interface of the first gas mixing block 3. The first upper connecting pipe section 5131 and the first upper interface pipe section 5132 have a certain angle between them, for example, 90 degrees. Of course, it is understandable that other angles are also possible. This angle is related to the placement of the first gas mixing block 3 and can be set by those skilled in the art based on actual needs. This angle is not limited here. This angle can form a corner between the first upper connecting pipe section 5131 and the first upper interface pipe section 5132, facilitating access to the interface of the first gas mixing block 3 and improving assembly convenience.

[0040] Continue to refer to Figure 3In one embodiment, the second air distribution branch 52 includes a second lower air distribution pipe section 521, a second through-the-cavity pipe section 522, and a second upper air inlet pipe section 523. One end of the second lower air distribution pipe section 521 is connected to the main air path 53, and the lower end of the second through-the-cavity pipe section 522 is connected to the other end of the second air distribution pipe section. The second through-the-cavity pipe section 522 passes through the second cavity 2 from bottom to top, and the upper end of the second through-the-cavity pipe section 522 passes through the top of the second cavity 2 and is connected to one end of the second upper air inlet pipe section 523. The other end of the second upper air inlet pipe section 523 is connected to the second gas mixing block 4. Specifically, the second air distribution branch 52 of this embodiment also includes three sections of pipes, namely the second lower air distribution pipe section 521, the second through-the-cavity pipe section 522, and the second upper air inlet pipe section 523. The second lower gas-dividing pipe section 521 serves as a gas-dividing pipe for receiving gas diverted from the main gas path 53. Therefore, the second lower gas-dividing pipe section 521 is connected to the main gas path 53. The main gas path 53 is typically positioned between the two cavities. The second lower gas-dividing pipe section 521 is a short horizontal pipe that remains horizontal and intersects the main gas path 53 at right angles. The second through-cavity pipe section 522 is a long vertical pipe that passes through the second cavity 2 and hollows out the through-cavity at the non-vacuum position of the cavity. The second through-cavity pipe section 522 has a lower end and an upper end, and its lower end is connected to the second gas distribution pipe section. The second through-cavity pipe section 522 vertically passes through the second cavity 2, and passes through the lower cavity wall and the upper cavity wall of the second cavity 2 respectively. The second through-cavity pipe section 522 is also vertically intersected and connected with the second lower gas distribution pipe section 521. The upper end of the second through-cavity pipe section 522 passes through the top of the second cavity 2 and connects with the second upper air intake pipe section 523. The second upper air intake pipe section 523 is responsible for guiding the gas of the second through-cavity pipe section 522 to the second gas mixing block 4, so the second upper air intake pipe section 523 is connected to the second gas mixing block 4. It can be seen that the second gas distribution branch 52 of this embodiment adopts a three-section pipeline, one section of the pipeline is used for gas distribution, one section of the pipeline is used for cavity penetration, and one section of the pipeline is used for guidance. It has a simple structure and is easy to assemble.

[0041] Continue to refer to Figure 3In this embodiment, the second upper air intake pipe section 523 includes a second upper connecting pipe section 5231 and a second upper interface pipe section 5232. The two ends of the second upper connecting pipe section 5231 are respectively connected to the upper end of the second through-cavity pipe section 522 and one end of the second upper interface pipe section 5232. The other end of the second upper interface pipe section 5232 is connected to the second gas mixing block 4. An included angle is formed between the second upper connecting pipe section 5231 and the second upper interface pipe section 5232. Specifically, the second upper air intake pipe section 5233 of this embodiment also includes two pipelines: the second upper connecting pipe section 5231 and the second upper interface pipe section 5232. The second upper connecting pipe section 5231 is used to connect the gas exiting the second through-cavity pipe section 522, and the second upper interface pipe section 5232 is used to connect to the interface of the second gas mixing block 4. Since the second gas mixing block 4 is usually arranged at the top center position of the second cavity 2, it is a certain distance away from the upper end of the second through-cavity pipe section 522, so a section of pipeline is needed to connect it; and the second gas mixing block 4 is in the shape of a rectangle as a whole, and the interface of the second gas mixing block 4 is arranged on the side of one side thereof, so a section of access pipe section is also needed to access its interface. The second upper connecting pipe section 5231 of this embodiment is a long horizontal pipe, and the second upper interface pipe section 5232 is a short horizontal pipe. The second upper connecting pipe section 5231 and the second upper interface pipe section 5232 are at the same level. One end of the second upper connecting pipe section 5231 is connected to the upper end of the second through-cavity pipe section 522, and the other end is connected to the front side of the interface of the second gas mixing block 4 and is connected to the second upper interface section, and the second upper interface section is connected to the interface of the second gas mixing block 4. The second upper connecting pipe section 5231 and the second upper interface pipe section 5232 have a certain angle between them, for example, 90 degrees. Of course, it is understandable that other angles are also possible. This angle is related to the placement of the second gas mixing block 4 and can be set by those skilled in the art based on actual needs. This angle is not limited here. This angle can form a corner between the second upper connecting pipe section 5231 and the second upper interface pipe section 5232, facilitating access to the interface of the second gas mixing block 4 and improving assembly convenience.

[0042] Reference Figure 4In one embodiment, a first diameter expansion interface is provided between the first gas mixing block 3 and the gas outlet end of the first gas distribution branch 51, and the first gas mixing block 3 and the gas outlet end of the first gas distribution branch 51 are connected through the first diameter expansion interface, and the diameter of the first diameter expansion interface is larger than the pipe diameter of the first gas mixing block 3 and the first gas distribution branch 51; and / or, a second diameter expansion interface is provided between the second gas mixing block 4 and the gas outlet end of the second gas distribution branch 52, and the second gas mixing block 4 and the gas outlet end of the second gas distribution branch 52 are connected through the second diameter expansion interface, and the diameter of the second diameter expansion interface is larger than the pipe diameter of the second gas mixing block 4 and the second gas distribution branch 52. Specifically, in the process of the process gas entering the gas mixing block from the air inlet pipe 5, it is not easy to completely align the joint of the two. If there is misalignment in the installation of the interface between the pipeline and the gas mixing block, the gas passage area will be reduced, and the flow resistance of the two cavities will easily be mismatched, affecting the uniformity of gas distribution. To this end, this embodiment expands the interface joint between the pipeline and the gas mixing block, which can avoid the reduction of the flow area of ​​the original caliber to the greatest extent. Specifically, a first diameter-expanding interface is provided between the interface of the first gas mixing block 3 and the gas outlet end of the first gas distribution branch 51, and the interface of the first gas mixing block 3 and the gas outlet end of the first gas distribution branch 51 are connected through the diameter-expanding interface. The diameter of the diameter-expanding interface is larger than the diameter of the interface of the first gas mixing block 3, and is also larger than the diameter of the first gas distribution branch 51. The diameter-expanding interface is used to increase the flow area of ​​the joint, so that even if the interface of the first gas mixing block 3 and the gas outlet end of the first gas distribution branch 51 are not completely aligned, the flow area of ​​the joint will not be reduced, thereby reducing the flow resistance caused by misalignment during installation. Similarly, the structure of the second diameter-expanding interface is the same as that of the first diameter-expanding interface, and will not be repeated here. It should be noted that the first diameter-expanding interface and the second diameter-expanding interface can be various diameter-changing structures. No matter what structure it is, as long as it ensures that the diameter is larger than the diameter of the original pipeline, it is not limited here.

[0043] Reference Figure 5In this embodiment, the first diameter-expanding interface includes a first diameter-expanding inlet 31 and a first diameter-expanding outlet 514. The first diameter-expanding inlet 31 is provided in the first gas mixing block 3, and the first diameter-expanding outlet 514 is provided at the outlet end of the first gas branch 51. The first diameter-expanding inlet 31 and the first diameter-expanding outlet 514 are connected. And / or, the second diameter-expanding interface includes a second diameter-expanding inlet 41 and a second diameter-expanding outlet 524. The second diameter-expanding inlet 41 is provided in the second gas mixing block 4, and the second diameter-expanding outlet 524 is provided at the outlet end of the second gas branch 52. The second diameter-expanding inlet 41 and the second diameter-expanding outlet 524 are connected. Specifically, the first diameter-expanding interface and the second diameter-expanding interface of this embodiment adopt a double-sided expansion structure. Specifically, the first expanded diameter interface is composed of a first expanded diameter inlet 31 and a first expanded diameter outlet 514. The first expanded diameter inlet 31 is the interface of the first gas mixing block 3, and the first expanded diameter outlet 514 is the outlet end of the first gas distribution branch 51 (the outlet end of the first upper interface pipe section 5132). The first expanded diameter inlet 31 and the first expanded diameter outlet 514 are both bell-mouth structures, with the narrow ends connected to their respective pipelines and the wide ends connected to each other. The bilaterally expanded structure avoids the reduction in the flow area of ​​the original caliber caused by misalignment, thereby reducing the flow resistance caused by misalignment during installation and improving the uniformity of gas distribution. Similarly, the structure of the second expanded diameter inlet 41 and the second expanded diameter outlet 524 is the same as that of the first expanded diameter inlet 31 and the first expanded diameter outlet 514, and will not be repeated here.

[0044] In one embodiment, the air inlet pipe 5 is a stainless steel vacuum tube. The stainless steel vacuum tube has high processing precision, reduces the impact on the flow resistance of the two cavities, and improves the uniformity of gas distribution.

[0045] The present invention also provides a thin film deposition device including the through-cavity gas path structure of the above embodiment. Specifically, the through-cavity gas path structure has been described in detail in the above embodiment and will not be described again for the sake of brevity.

[0046] Through this embodiment, the flow resistance of the one-two section pipeline is increased by adopting the method of lower gas separation, which can effectively suppress the influence of difficult-to-process large flow resistance parts such as mixing blocks, large baffles, spray plates, etc. on gas separation, thereby significantly improving the uniformity of gas separation, ensuring the consistency of the thickness of the thin film deposition in the two chambers, and improving the quality of thin film deposition.

[0047] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in the present invention, and such modifications or substitutions are intended to be within the scope of protection of the present invention. Therefore, the scope of protection of the present invention shall be subject to the scope of protection of the claims.

Claims

1. A through-cavity air path structure, characterized in that: include: A first cavity, a second cavity, a first gas mixing block, a second gas mixing block and an air intake pipeline, wherein the first cavity and the second cavity are arranged adjacent to each other, the first gas mixing block is arranged at the top of the first cavity, and the second gas mixing block is arranged at the top of the second cavity; The air intake pipeline is configured to separate the air from the bottom of the first cavity and the second cavity, pass through the first cavity and the second cavity respectively, and be connected to the first gas mixing block and the second gas mixing block respectively.

2. The through-cavity air path structure according to claim 1, characterized in that: The air intake pipeline includes a first air branch, a second air branch and a main air path. The main air path is arranged below the first cavity and the second cavity. The air intake ends of the first air branch and the second air branch are both connected to the main air path. The first air branch passes through the first cavity and its air outlet end is connected to the first air mixing block. The second air branch passes through the second cavity and its air outlet end is connected to the second air mixing block.

3. The through-cavity air path structure according to claim 2, characterized in that: The first air distribution branch includes a first lower air distribution pipe section, a first through-cavity pipe section and a first upper air intake pipe section, one end of the first lower air distribution pipe section is connected to the main air path, the lower end of the first through-cavity pipe section is connected to the other end of the first lower air distribution pipe section, the first through-cavity pipe section passes through the first cavity from bottom to top, the upper end of the first through-cavity pipe section passes through the top of the first cavity and is connected to one end of the first upper air intake pipe section, and the other end of the first upper air intake pipe section is connected to the first gas mixing block.

4. The through-cavity air path structure according to claim 3, characterized in that: The first upper air inlet pipe section includes a first upper connecting pipe section and a first upper interface pipe section, the two ends of the first upper connecting pipe section are respectively connected to the upper end of the first cavity-penetrating pipe section and one end of the first upper interface pipe section, and the other end of the first upper interface pipe section is connected to the first gas mixing block; wherein, there is an angle between the first upper connecting pipe section and the first upper interface pipe section.

5. The through-cavity air path structure according to claim 2, characterized in that: The second air distribution branch includes a second lower air distribution pipe section, a second through-cavity pipe section and a second upper air intake pipe section. One end of the second lower air distribution pipe section is connected to the main air path, and the lower end of the second through-cavity pipe section is connected to the other end of the second lower air distribution pipe section. The second through-cavity pipe section passes through the second cavity from bottom to top, and the upper end of the second through-cavity pipe section passes through the top of the second cavity and is connected to one end of the second upper air intake pipe section. The other end of the second upper air intake pipe section is connected to the second air mixing block.

6. The through-cavity air path structure according to claim 5, characterized in that: The second upper air inlet pipe section includes a second upper connecting pipe section and a second upper interface pipe section, the two ends of the second upper connecting pipe section are respectively connected to the upper end of the second cavity-penetrating pipe section and one end of the second upper interface pipe section, and the other end of the second upper interface pipe section is connected to the second gas mixing block; wherein, there is an angle between the second upper connecting pipe section and the second upper interface pipe section.

7. The through-cavity air path structure according to any one of claims 2 to 6, characterized in that: A first diameter expansion interface is provided between the first gas mixing block and the gas outlet end of the first gas distribution branch. The first gas mixing block and the gas outlet end of the first gas distribution branch are connected through the first diameter expansion interface. The diameter of the first diameter expansion interface is larger than the pipe diameter of the first gas mixing block and the first gas distribution branch. and / or, A second expansion interface is provided between the second gas mixing block and the gas outlet end of the second gas distribution branch. The second gas mixing block and the gas outlet end of the second gas distribution branch are connected through the second expansion interface. The diameter of the second expansion interface is larger than the pipeline diameter of the second gas mixing block and the second gas distribution branch.

8. The through-cavity air path structure according to claim 7, characterized in that: The first diameter expansion interface includes a first diameter expansion inlet and a first diameter expansion outlet, wherein the first diameter expansion inlet is provided at the first gas mixing block, and the first diameter expansion outlet is provided at the gas outlet end of the first gas distribution branch, and the first diameter expansion inlet and the first diameter expansion outlet are connected; and / or, The second diameter expansion interface includes a second diameter expansion inlet and a second diameter expansion outlet. The second diameter expansion inlet is provided at the second gas mixing block, and the second diameter expansion outlet is provided at the gas outlet end of the second gas distribution branch. The second diameter expansion inlet and the second diameter expansion outlet are connected.

9. The through-cavity air path structure according to claim 1, characterized in that: The air intake pipeline is a stainless steel vacuum tube.

10. A thin film deposition device, characterized in that: It comprises the through-cavity air path structure as described in any one of claims 1 to 9.

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