Air exhaust ring piece, process cavity and thin film deposition equipment

Abstract

The utility model discloses an air exhaust ring piece, a process cavity and thin film deposition equipment. The air exhaust ring piece is mounted in a chamber of the process cavity; the air exhaust ring piece comprises an air exhaust lining and an air exhaust ring; the air exhaust lining is installed in the cavity, and an annular lap joint groove is formed in the air exhaust lining. The air exhaust ring is in lap joint in the annular lap joint groove, and an air exhaust channel for connecting the cavity with the outside is formed between the air exhaust ring and the air exhaust lining; a leakage-proof piece is arranged at the joint of the cavity, the air exhaust lining and the air exhaust ring and used for eliminating tolerance clearances at the joint of the cavity, the air exhaust lining and the air exhaust ring so as to guarantee the air tightness of the air exhaust channel. According to the utility model, the tolerance clearance at the joint of the cavity, the air exhaust bushing and the air exhaust ring is eliminated through the leakage-proof piece, so that the air exhaust ring piece has better air tightness in the air exhaust process, and the process is prevented from being influenced by air leakage.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to an exhaust ring, a process chamber and thin film deposition equipment. Background Art

[0002] In the atomic thin film deposition process of semiconductor thin film deposition equipment (such as ALD equipment), especially in the process of memory chip DRAM, as the process requirements are getting higher and higher, the process operation time and operation cycle requirements are getting shorter and shorter. In such a process, the exhaust ring structure has a great influence on the flow field in the process chamber.

[0003] In existing semiconductor thin film deposition equipment, since the vacuum ring and the process chamber need to be positioned, they basically have positioning bosses and positioning grooves, which inevitably lead to tolerance gaps. If the tolerance gap is too large, there will be gaps and cause air leakage, which will affect the airflow field and thus affect the process. If the tolerance gap is too small, it may lead to assembly failure. Utility Model Content

[0004] The purpose of the utility model is to provide an exhaust ring, a process chamber and a thin film deposition device, aiming to solve the problem that the positioning and matching of the existing exhaust ring and the process chamber are prone to air leakage.

[0005] In order to solve the above technical problems, the purpose of the present invention is achieved through the following technical solutions: providing an exhaust ring installed in a chamber of a process chamber; the exhaust ring comprises:

[0006] An air extraction bushing is installed in the chamber, and an annular overlapping groove is formed on the air extraction bushing;

[0007] An air pumping ring is overlapped in the annular overlap groove, and an air pumping channel connecting the chamber with the outside is formed between the air pumping ring and the air pumping bushing;

[0008] Wherein, a leak-proof part is provided at the connection between the chamber, the air pumping bushing and the air pumping ring, and the leak-proof part is used to eliminate the tolerance gap at the connection between the chamber, the air pumping bushing and the air pumping ring to ensure the air tightness of the air pumping channel.

[0009] Furthermore, the vacuum sleeve and the chamber are connected by a concave-convex structure in a positioning and fitting manner, and the leak-proof component includes a leak-proof coating, which is applied to the concave-convex structure between the vacuum sleeve and the chamber to fill the tolerance gap at the concave-convex structure.

[0010] Furthermore, the leakage-proof component includes a sealant, and the sealant is sealed at the overlapping angle between the air pumping ring and the air pumping bushing.

[0011] Furthermore, a plurality of air pumping holes are provided on the air pumping ring along the circumferential direction, and the air pumping holes on different air pumping rings have different apertures and hole spacings;

[0012] A connecting portion is provided on the top of the air pumping ring, and the connecting portion is used to connect and cooperate with an external tool to facilitate removing the air pumping ring from the air pumping sleeve.

[0013] Furthermore, the connecting portion is a threaded blind hole that does not affect the flow field.

[0014] The embodiment of the present utility model further provides a process chamber, comprising a chamber and the above-mentioned pumping ring installed in the chamber;

[0015] The chamber includes a process area and an air outlet channel, and the air outlet channel is located radially outside the process area; the exhaust ring is located between the process area and the air outlet channel, and the process area and the air outlet channel are connected through the exhaust channel of the exhaust ring.

[0016] Furthermore, an arc-shaped convex seat is provided in the chamber, and the process area and the gas outlet channel are separated in the radial direction by the arc-shaped convex seat;

[0017] The arc-shaped boss includes two bosses and an arc-shaped convex edge between the two bosses, the process area is located radially inside the arc-shaped convex edge, and the air outlet channel is located radially outside the arc-shaped convex edge.

[0018] Furthermore, the bottom of the exhaust sleeve is installed on the arc-shaped boss, and the bottom of the exhaust sleeve and the top of the arc-shaped boss are positioned and matched through a concave-convex structure to achieve a tight fit. The inner bottom of the exhaust sleeve is connected to the process area, and the outer bottom of the exhaust sleeve is connected to the air outlet channel.

[0019] Furthermore, the process chamber further comprises:

[0020] a heating plate, disposed in the process area and located radially inward of the exhaust bushing;

[0021] An edge ring is provided on the outer periphery of the top of the heating plate;

[0022] a spray plate, disposed in the process area and located on top of the heating plate;

[0023] Among them, the outer periphery of the edge ring is bent to form a first annular groove opening upward, and the inner side of the exhaust sleeve is provided with a second annular groove opening downward. The outer periphery of the edge ring and the inner side of the exhaust sleeve are embedded with each other through the first annular groove and the second annular groove to form a maze-like air path.

[0024] An embodiment of the present invention further provides a thin film deposition device, comprising the process chamber as described above.

[0025] The beneficial effects of the embodiments of the present invention are as follows: the present invention eliminates the tolerance gap at the connection between the chamber, the vacuum sleeve and the vacuum ring through the leak-proof parts, ensuring that the vacuum ring has good air tightness during the vacuum process, avoiding leakage and affecting the process.

[0026] The utility model provides a connecting portion on the air pumping ring, and the air pumping ring can be easily taken out and replaced with the help of external tools. In the research and development stage, the air pumping ring with different hole arrangements can be designed and replaced for process verification without replacing the air pumping bushing. The method is simple, convenient and low-cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following is a brief introduction to the drawings required for use in the description of the embodiments. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0028] Figure 1 This is a schematic diagram of the explosion structure inside the process chamber provided by an embodiment of the present utility model.

[0029] Figure 2 A schematic diagram of the coordinated structure of the process chamber and the pumping ring combination provided in an embodiment of the present utility model.

[0030] Figure 3 This is a schematic cross-sectional view of the interior of a process chamber provided in an embodiment of the present invention.

[0031] Figure 4 A schematic diagram of gas flow during gas extraction in a process chamber provided in an embodiment of the present invention.

[0032] Figure 5 This is a schematic structural diagram of the bottom perspective of the air extraction sleeve provided in an embodiment of the utility model.

[0033] Figure 6 This is a schematic diagram of the chamber structure within the process chamber provided in an embodiment of the present utility model.

[0034] Figure 7 The embodiment of the present utility model provides Figure 3 Schematic diagram of the enlarged structure of part A in the figure.

[0035] Figure 8 Schematic diagram comparing the arrangement of the air pumping holes of different air pumping rings provided in the embodiments of the present invention.

[0036] Figure 9A schematic flow chart of the method for installing an exhaust ring provided in an embodiment of the present invention.

[0037] Description of the symbols in the figure:

[0038] 1. Pumping ring; 11. Pumping bushing; 111. Annular overlapping groove; 112. Arc-shaped opening; 113. Protrusion; 114. Second annular groove; 12. Pumping ring; 13. Sealant;

[0039] 2. Process chamber; 21. Process area; 22. Gas outlet channel; 23. Boss; 231. Recess; 24. Arc-shaped convex edge;

[0040] 3. Heating plate;

[0041] 4. Marginal ring;

[0042] 5. Spray plate. DETAILED DESCRIPTION

[0043] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0044] It will be understood that when used in this specification and the appended claims, the terms “comprises” and “comprising” indicate the presence of described features, integers, steps, operations, elements and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or groups thereof.

[0045] It should also be understood that the terms used in this utility model specification are only for the purpose of describing specific embodiments and are not intended to limit the utility model. As used in this utility model specification and the appended claims, the singular forms "a", "an" and "the" are intended to include plural forms unless the context clearly indicates otherwise.

[0046] It should be further understood that the term “and / or” used in the present specification and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes these combinations.

[0047] like Figure 1 and Figure 2 As shown, in order to facilitate understanding of the installation structure of the vacuum ring 1 in the process chamber 2 of this embodiment, the process chamber 2 of the embodiment of the present utility model is first introduced as a whole.

[0048] In one embodiment, the chamber within the process chamber 2 can be divided into a process area 21 and an air outlet channel 22, with the air outlet channel 22 located radially outward of the process area 21. The air pumping ring 1 is located between the process area 21 and the air outlet channel 22, and the process area 21 and the air outlet channel 22 are connected via the air pumping channel of the air pumping ring 1. That is, the air pumping ring 1 serves as a transition structure between the process area 21 and the air outlet channel 22. The air pumping ring 1 must be tightly positioned within the chamber to ensure that a sealed gas channel can be formed between the process area 21, the air pumping channel, and the air outlet channel 22, thereby preventing air leakage from affecting the process.

[0049] like Figure 3 and Figure 4 The working process of the vacuum ring 1 is introduced below using a specific vacuum scenario.

[0050] In one embodiment, a heating plate 3, an edge ring 4 and a shower plate 5 are provided in the process chamber 2;

[0051] The heating plate 3 is arranged in the process area 21 and is located radially inside the pumping ring 1 (that is, the pumping sleeve 11 of the pumping ring 1);

[0052] Wherein, the edge ring 4 is arranged on the outer periphery of the top of the heating plate 3;

[0053] The shower plate 5 is disposed in the process area 21 and located on top of the heating plate 3 .

[0054] In one scenario, reference Figure 4 In the direction of the arrow, in the cleaning phase of the thin film deposition process (as shown in the figure), the purge gas will be blown upward from the bottom of the heating plate 3 into the process area 21 for cleaning. The cleaned gas will flow from the periphery of the edge ring 4 to the exhaust ring 1, and then flow from the exhaust channel in the exhaust ring 1 to the outlet channel 22 for discharge.

[0055] Another scenario, refer to Figure 4 In the direction of the arrow in the figure, in the reaction link of the thin film deposition process, the reaction gas will be blown downward from the spray plate 5 into the process area 21 and react on the top of the heating disk 3. The reacted gas will continue to flow into the vacuum ring 1, and then flow from the vacuum channel in the vacuum ring 1 to the outlet channel 22 for discharge.

[0056] In the above two scenarios, an exhaust pump connected to the air outlet channel 22 is set externally. After the exhaust pump is started, the gas in the process area 21 can pass through the exhaust channel of the exhaust ring 1 and flow to the air outlet channel 22 for discharge. Therefore, it is necessary to ensure that the exhaust ring 1 is tightly installed in the chamber to reduce the risk of gas leakage during gas discharge.

[0057] In one embodiment, the pumping ring 1 is installed in the chamber of the process chamber 2; the pumping ring 1 includes a pumping bushing 11 and a pumping ring 12;

[0058] The air extraction bushing 11 is installed in the chamber, and an annular overlapping groove 111 is provided on the air extraction bushing 11;

[0059] The air pumping ring 12 is overlapped in the annular overlap groove 111, and an air pumping channel connecting the chamber and the outside is formed between the air pumping ring 12 and the air pumping bushing 11;

[0060] Among them, the connection between the chamber, the exhaust bushing 11 and the exhaust ring 12 is provided with a leak-proof part, which is used to eliminate the tolerance gap at the connection between the chamber, the exhaust bushing 11 and the exhaust ring 12 to ensure the airtightness of the exhaust channel.

[0061] In this embodiment, the connection between the chamber, the exhaust sleeve 11 and the exhaust ring 12 is where there is a risk of air leakage. Therefore, the risk of air leakage can be reduced by simply eliminating the tolerance gap at the connection between the chamber, the exhaust sleeve 11 and the exhaust ring 12.

[0062] like Figure 2 and Figure 5 In an embodiment of eliminating the tolerance gap between the chamber and the vacuum sleeve 11, the vacuum sleeve 11 and the chamber are connected by a concave-convex structure, and the leak-proof part includes a leak-proof coating (not shown in the figure), which is applied to the concave-convex structure between the vacuum sleeve 11 and the chamber to fill the tolerance gap at the concave-convex structure. In this way, the tightness between the vacuum sleeve 11 and the chamber can be ensured to reduce the risk of air leakage at the connection between the vacuum sleeve 11 and the chamber. Among them, the leak-proof coating can include metal coatings such as yttrium oxide coating, yttrium fluoride coating, and yttrium fluoride oxide coating, and non-metallic coatings such as polytetrafluoroethylene coating can also be used. The specific coating can be selected according to actual needs.

[0063] Specifically, an arc-shaped boss is provided in the chamber, and the process area 21 and the gas outlet channel 22 are separated in the radial direction by the arc-shaped boss; the arc-shaped boss includes two bosses 23 and an arc-shaped convex edge 24 located between the two bosses 23, the process area 21 is located on the radial inner side of the arc-shaped convex edge 24, and the gas outlet channel 22 is located on the radial outer side of the arc-shaped convex edge 24.

[0064] More specifically, the bottom of the exhaust bushing 11 is mounted on the arc-shaped protrusion, and the bottom of the exhaust bushing 11 and the top of the arc-shaped protrusion are positioned and matched by a concave-convex structure to achieve a tight fit. For example, two protrusions 113 are provided at the bottom of the exhaust bushing 11, and two recesses 231 are provided at the top of the two bosses 23. Positioning is achieved by the cooperation of the two protrusions 113 and the two recesses 231. After positioning is completed, the bottom of the exhaust bushing 11 can be tightly fitted with the arc-shaped convex edge 24, so that the inner bottom of the exhaust bushing 11 is connected to the process area 21, and the outer bottom of the exhaust bushing 11 is connected to the air outlet channel 22 through the arc-shaped opening 112, thereby preventing direct communication between the process area 21 and the air outlet channel 22.

[0065] like Figure 3 and Figure 6 In an embodiment of eliminating the tolerance gap between the exhaust bushing 11 and the exhaust ring 12, the shape of the annular overlapping groove 111 on the exhaust bushing 11 can be stepped, and the bottom of the annular overlapping groove 111 is provided with an arc-shaped opening 112 connected to the air outlet channel 22; a plurality of exhaust holes are opened on the exhaust ring 12 along the circumferential direction, and the exhaust ring 12 is overlapped in the annular overlapping groove 111. The stepped shape of the annular overlapping groove 111 allows the exhaust ring 12 to maintain a distance from the groove bottom of the annular overlapping groove 111; in this way, all the exhaust holes on the exhaust ring 12 can be connected to the air outlet channel 22 through the arc-shaped opening 112; it should be understood that the exhaust channel is the channel formed by the exhaust holes and the arc-shaped opening 112. In order to ensure the air tightness of the exhaust ring 12 after it is overlapped on the exhaust sleeve 11, a leak-proof part is set at the overlapping angle between the exhaust ring 12 and the annular overlapping groove 111 (that is, the gap between the inner and outer sides of the exhaust ring 12 and the inner wall of the annular overlapping groove 111); the leak-proof part may include a sealant 13.

[0066] like Figure 8 Figures a and b in the figure show two different arrangements of exhaust holes in the exhaust ring 12. The arrangement of the multiple exhaust holes on different exhaust rings 12 is different. For example, the apertures and hole spacing of the exhaust holes on the exhaust ring 12 are different. By providing a connecting portion on the exhaust ring 12, the exhaust ring 12 can be easily removed and replaced with the help of external tools. During the research and development stage, the exhaust ring 12 with different hole arrangements can be designed and replaced for process verification without having to replace the exhaust bushing 11. This is simple, convenient, and low-cost.

[0067] Specifically, the connecting portion can be a threaded blind hole that does not affect the flow field, and the exhaust ring 12 can be removed by cooperating with a threaded external tool; the connecting portion can also be a notch structure that can cooperate with a hook-shaped tool, both of which can realize convenient replacement of the exhaust ring 12.

[0068] like Figure 7As shown, in some other embodiments of the exhaust ring 1, the exhaust sleeve 11 of the exhaust ring 1 can cooperate with the edge ring 4 to prevent the reaction gas from entering the bottom of the heating plate 3 during the reaction phase of the thin film deposition process. Specifically, the outer periphery of the edge ring 4 is bent to form a first annular groove opening upward, and the inner side of the exhaust sleeve 11 is provided with a second annular groove 114 opening downward. The outer periphery of the edge ring 4 and the inner side of the exhaust sleeve 11 are interlocked through the first and second annular grooves 114 to form a labyrinthine gas path.

[0069] It is understandable that during the reaction phase of the thin film deposition process, the spray plate 5 inputs the reaction gas downward and reacts on top of the heating disk 3. The reacted reaction gas flows radially to the pumping ring 1. At this time, the labyrinth-shaped gas path can prevent the reaction gas from entering under the heating disk 3. During the purge phase of the thin film deposition process, the spray plate 5 does not input the reaction gas. The purge gas is input upward from under the heating disk 3. The purge gas can reach the pumping ring 1 through the labyrinth-shaped gas path and flow through the pumping channel of the pumping ring 1 to the gas outlet channel 22.

[0070] An embodiment of the present invention further provides a thin film deposition device, comprising the process chamber 2 as described above.

[0071] like Figure 9 As shown, the embodiment of the present invention further provides a method for installing an air pumping ring, which is applied to the air pumping ring 1 as described above, comprising:

[0072] S901, assembling the processed process chamber 2 and the exhaust bushing 11;

[0073] S902, shielding the area except the concave-convex structure between the exhaust sleeve 11 and the process chamber 2;

[0074] S903, performing metal or non-metal spraying on the concave-convex structure to form a leak-proof coating for filling the tolerance gap of the concave-convex structure;

[0075] S904, remove the exhaust bushing 11 and clean up excess spray residue;

[0076] S905, installing the air pumping ring 12 in the annular overlapping groove 111 of the air pumping bushing 11;

[0077] S906 , spray the sealant 13 evenly on the overlapping corners of the air pumping ring 12 and the air pumping bushing 11 to seal the gaps at the overlapping corners.

[0078] In this embodiment, based on the process of S901 to S906, the installation of the vacuum ring 1 can be completed, and the tolerance gap at the connection between the chamber, the vacuum sleeve 11 and the vacuum ring 12 can be eliminated, ensuring that the vacuum ring 1 has good air tightness during the vacuum process, avoiding air leakage and affecting the process.

[0079] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in the present invention, and such modifications or substitutions are intended to be within the scope of protection of the present invention. Therefore, the scope of protection of the present invention shall be subject to the scope of protection of the claims.

Claims

1. A vacuum ring installed in a chamber of a process chamber; characterized in that: The pumping ring comprises: An air extraction bushing is installed in the chamber, and an annular overlapping groove is formed on the air extraction bushing; An air pumping ring is overlapped in the annular overlap groove, and an air pumping channel connecting the chamber with the outside is formed between the air pumping ring and the air pumping bushing; Wherein, a leak-proof part is provided at the connection between the chamber, the air pumping bushing and the air pumping ring, and the leak-proof part is used to eliminate the tolerance gap at the connection between the chamber, the air pumping bushing and the air pumping ring to ensure the air tightness of the air pumping channel.

2. The vacuum ring according to claim 1, characterized in that: The vacuum sleeve and the chamber are positioned and connected via a concave-convex structure. The leak-proof component includes a leak-proof coating, which is applied to the concave-convex structure between the vacuum sleeve and the chamber to fill the tolerance gap at the concave-convex structure.

3. The vacuum ring according to claim 1, characterized in that: The leak-proof component includes a sealant, and the sealant is sealed at the overlapping angle between the air pumping ring and the air pumping bushing.

4. The air pumping ring according to claim 1, characterized in that: The pumping ring is provided with a plurality of pumping holes along the circumferential direction, and the pumping holes on different pumping rings have different apertures and hole spacings; A connecting portion is provided on the top of the air pumping ring, and the connecting portion is used to connect and cooperate with an external tool to facilitate removing the air pumping ring from the air pumping sleeve.

5. The air pumping ring according to claim 4, characterized in that: The connecting portion is a threaded blind hole that does not affect the flow field.

6. A process chamber, characterized in that: comprising a chamber and an air extraction ring according to any one of claims 1 to 5 installed in the chamber; The chamber includes a process area and an air outlet channel, and the air outlet channel is located radially outside the process area; the exhaust ring is located between the process area and the air outlet channel, and the process area and the air outlet channel are connected through the exhaust channel of the exhaust ring.

7. The process chamber according to claim 6, characterized in that: An arc-shaped convex seat is provided in the chamber, and the process area and the gas outlet channel are separated in the radial direction by the arc-shaped convex seat; The arc-shaped boss includes two bosses and an arc-shaped convex edge between the two bosses, the process area is located radially inside the arc-shaped convex edge, and the air outlet channel is located radially outside the arc-shaped convex edge.

8. The process chamber according to claim 7, characterized in that: The bottom of the exhaust sleeve is installed on the arc-shaped boss, and the bottom of the exhaust sleeve and the top of the arc-shaped boss are positioned and matched through a concave-convex structure to achieve a tight fit. The inner bottom of the exhaust sleeve is connected to the process area, and the outer bottom of the exhaust sleeve is connected to the air outlet channel.

9. The process chamber according to claim 8, characterized in that: Also includes: a heating plate, disposed in the process area and located radially inward of the exhaust bushing; An edge ring is provided on the outer periphery of the top of the heating plate; a spray plate, disposed in the process area and located on top of the heating plate; Among them, the outer periphery of the edge ring is bent to form a first annular groove opening upward, and the inner side of the exhaust sleeve is provided with a second annular groove opening downward. The outer periphery of the edge ring and the inner side of the exhaust sleeve are embedded with each other through the first annular groove and the second annular groove to form a maze-like air path.

10. A thin film deposition device, characterized in that: The process chamber comprises the process chamber according to any one of claims 6 to 9.

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