Independent air return structure of wet etching area

Abstract

The utility model discloses an independent air return structure of a wet etching area, and particularly relates to the technical field of semiconductor manufacturing, the independent air return structure comprises an independent air return mechanism arranged between the wet etching area and waste gas treatment equipment, the independent air return mechanism comprises a wind scooper arranged on one side close to the wet etching area, one end of the wind scooper is communicated with a telescopic hose, and the other end of the wind scooper is communicated with an air outlet. One end of the telescopic hose is connected with an exhaust fan, and the air outlet end of the exhaust fan is connected with an air outlet pipe. According to the utility model, the telescopic flexible pipe is arranged between the wind scooper and the exhaust fan, so that the wind scooper can be fixed by the bracket after the position and the angle of the wind scooper are conveniently adjusted during use, and waste gas generated at different positions of a wet etching area can be exhausted according to actual requirements; and the conveying pipe body is arranged to be of a split type structure, assembling and disassembling are convenient, the middle pipes at different positions can be disassembled according to needs, and then dust attached to the inner wall of the middle pipe body is cleaned.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor manufacturing, and more specifically to an independent air return structure in a wet etching area. Background Art

[0002] In semiconductor manufacturing and other related processes, wet etching is a key step used to form tiny patterns and structures on wafers, and the independent return air design of the wet etching area is crucial for pollution control in adjacent areas. Wet etching uses chemical solutions to react with the surface material of the wafer to remove unwanted materials. This process is usually carried out in an etcher, which includes a reaction chamber, a spray system, an exhaust system, etc. However, the chemicals and particulate matter produced during the wet etching process may cause pollution to adjacent areas, affecting product quality and production efficiency. The sources of pollution in the wet etching process mainly include chemical substances: chemical solutions used in the etching process, such as acids and alkalis, are corrosive and toxic; particulate matter: tiny particles produced during the etching process may adhere to the surface of the wafer or spread into the air; volatile organic compounds: certain chemical solutions will produce volatile organic compounds during the reaction process, which have an impact on the environment and human health.

[0003] Contaminants generated during wet etching are mainly spread to adjacent areas through the following pathways:

[0004] 1. Airborne transmission: pollutants spread to other areas with air flow;

[0005] 2. Personnel movement: When operators move between different areas, they may carry contaminants;

[0006] 3. Equipment movement: The movement of production equipment within the workshop may also lead to the spread of pollutants.

[0007] By setting up an independent return air system, the path of pollutants spreading through the air can be effectively reduced, and the degree of pollution to adjacent areas can be reduced. The independent return air system can quickly extract pollutants such as exhaust gas and droplets generated during the etching process, reducing the diffusion in the working area. Its principle is to form a directional return air path through reasonable airflow organization, and directly transport pollutants to the processing equipment. However, the air duct used in the existing independent return air system is an integrated structure. When the dust attached to the inside of the pipe needs to be cleaned, it needs to be shut down for maintenance, which is relatively inconvenient and affects normal use. Utility Model Content

[0008] In order to overcome the above-mentioned defects of the prior art, the utility model provides an independent air return structure for the wet etching area.

[0009] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an independent air return structure for a wet etching area, comprising an independent air return mechanism arranged between the wet etching area and the exhaust gas treatment equipment, the independent air return mechanism comprising an air guide hood installed on a side close to the wet etching area, one end of the air guide hood being connected to a telescopic hose, one end of the telescopic hose being connected to an exhaust fan, the air outlet end of the exhaust fan being connected to an air outlet pipe, the end of the air outlet pipe being connected to a first guide component, one side of the first guide component being connected to a plurality of intermediate pipes, the ends of the plurality of intermediate pipes being connected to a second guide component corresponding to the position of the first guide component, and the outer wall of the second guide component being connected to an exhaust gas input pipe connected to the input port of the exhaust gas treatment equipment.

[0010] As a further improvement of the technical solution of the present invention, a bracket for fixing and supporting the position of the air guide cover is fixedly connected to the outer wall of the air guide cover.

[0011] As a further improvement of the technical solution of the present invention, the input end and the output end of the exhaust fan are respectively connected to the ends of the telescopic hose and the air outlet pipe through flanges, and sealing rings are provided at the connections.

[0012] As a further improvement of the technical solution of the present utility model, the air outlet pipe and the first flow guide component are seamlessly welded, and the air outlet pipe is connected to the interior of the first flow guide component.

[0013] As a further improvement of the technical solution of the present utility model, the exhaust gas inlet pipe and the second flow guide component are seamlessly welded, and the exhaust gas inlet pipe is connected to the interior of the second flow guide component.

[0014] As a further improvement of the technical solution of the present invention, the outside of the first guide assembly and the second guide assembly are connected to several short pipes corresponding to the outside of both ends of each intermediate pipe, each short pipe is installed with a valve, and the end of each short pipe is provided with a first flange.

[0015] As a further improvement of the technical solution of the present invention, second flanges are provided at both ends of the intermediate tube at positions corresponding to the inner sides of the first flange. The intermediate tube and the short tube are connected by flanges, and a sealing ring is provided at the connection.

[0016] Beneficial effects of the utility model:

[0017] 1. By setting a retractable flexible hose between the air guide cover and the exhaust fan, the position and angle of the air guide cover can be easily adjusted during use and then fixed with a bracket, so that the exhaust gas generated at different positions of the wet etching area can be extracted according to actual needs;

[0018] 2. By setting the conveying pipe body as a split structure, it is convenient for assembly and disassembly, and the intermediate pipes at different positions can be disassembled as needed to clean the dust attached to the inner wall of the intermediate pipe. When it is necessary to disassemble and clean a certain intermediate pipe, first close the valves on both sides of the intermediate pipe at that position and remove the bolts on the flange. This will not affect the circulation of exhaust gas in other intermediate pipes, effectively reducing the impact of exhaust gas on the production environment and improving product quality and production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a structural diagram of the independent air return mechanism of the utility model.

[0020] Figure 2 It is a structural schematic diagram of the intermediate pipe in the utility model.

[0021] Figure 3 This is a structural diagram of the first flow guide component in the present utility model.

[0022] Figure 4 This is a schematic diagram of the installation position of the utility model between the wet etching area and the exhaust gas treatment equipment.

[0023] The figures are marked as follows: 1. air guide cover; 2. telescopic hose; 3. exhaust fan; 4. air outlet pipe; 5. first flow guide component; 6. intermediate pipe; 7. second flow guide component; 8. exhaust gas inlet pipe; 9. short pipe; 10. first flange; 11. valve; 601, second flange. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0025] As attached Figure 1-4 The independent air return structure of the wet etching area shown includes an independent air return mechanism arranged between the wet etching area and the exhaust gas treatment equipment. The independent air return mechanism includes an air guide cover 1 installed on the side close to the wet etching area. One end of the air guide cover 1 is connected to a telescopic hose 2, and one end of the telescopic hose 2 is connected to an exhaust fan 3. The air outlet end of the exhaust fan 3 is connected to an air outlet pipe 4, and the end of the air outlet pipe 4 is connected to a first guide component 5. One side of the first guide component 5 is connected to several intermediate pipes 6, and the ends of the multiple intermediate pipes 6 are connected to a second guide component 7 corresponding to the position of the first guide component 5. The outer wall of the second guide component 7 is connected to an exhaust gas input pipe 8 connected to the input port of the exhaust gas treatment equipment.

[0026] As attached Figure 1 As shown, the outer wall of the air guide cover 1 is fixedly connected with a bracket for fixing and supporting the position of the air guide cover 1, so as to facilitate the stability of the air guide cover 1 after installation.

[0027] As attached Figure 1 As shown, the input end and output end of the exhaust fan 3 are respectively connected to the ends of the telescopic hose 2 and the air outlet pipe 4 through flanges, and sealing rings are provided at the connections to improve the connection sealing of the inlet and outlet ends of the exhaust fan 3.

[0028] As attached Figure 1 and attached Figure 3 As shown, the air outlet pipe 4 and the first flow guide component 5 are seamlessly welded, and the air outlet pipe 4 is connected to the interior of the first flow guide component 5, which facilitates the connection between the air outlet pipe 4 and the first flow guide component 5.

[0029] As attached Figure 1 As shown, the exhaust gas inlet pipe 8 and the second flow guide component 7 are seamlessly welded, and the exhaust gas inlet pipe 8 is connected to the interior of the second flow guide component 7, which facilitates the connection between the exhaust gas inlet pipe 8 and the second flow guide component 7.

[0030] As attached Figure 1-3 As shown, the outside of the first flow guide component 5 and the second flow guide component 7 are connected to a plurality of short tubes 9 corresponding to the outside of both ends of each intermediate tube 6, each short tube 9 is installed with a valve 11, and the end of each short tube 9 is provided with a first flange 10, and the two ends of the intermediate tube 6 are provided with a second flange 601 at the inner position corresponding to the first flange 10. The intermediate tube 6 and the short tube 9 are connected by a flange, and a sealing ring is provided at the connection to facilitate the communication between multiple intermediate tubes 6 and the first flow guide component 5 and the second flow guide component 7.

[0031] Working principle: This utility model designs an independent air return structure for the wet etching area. The specific structure is shown in the attached manual. Figure 1-4As shown, when the present technical solution is in use, the air guide cover 1 is aligned with the location of the wet etching area, and then the exhaust fan 3 is started. The exhaust gas generated during the wet etching process can be extracted and transported to the interior of the first guide component 5, and then transported to the interior of the second guide component 7 through multiple intermediate pipes 6. Finally, the exhaust gas is guided by the exhaust gas inlet pipe 8 to the interior of the exhaust gas treatment equipment for exhaust gas treatment. A retractable flexible hose 2 is provided between the air guide cover 1 and the exhaust fan 3. The position and angle of the air guide cover 1 can be easily adjusted during use, and then the air guide cover 1 can be fixed with a bracket, so that the exhaust gas generated at different locations in the wet etching area can be extracted according to actual needs. Then, the conveying pipe body is set to a split structure for easy assembly and disassembly, and the intermediate pipe 6 at different positions can be disassembled as needed to clean the dust attached to the inner wall of the intermediate pipe 6. When a certain intermediate pipe 6 needs to be disassembled and cleaned, the valves on both sides of the intermediate pipe 6 at that position are first closed and the bolts on the flange are removed. This will not affect the flow of exhaust gas in other intermediate pipes 6.

[0032] The drawings of the embodiments disclosed in the present invention only relate to the structures related to the embodiments disclosed in the present invention. Other structures may refer to conventional designs. In the absence of conflicts, the same embodiment and different embodiments of the present invention may be combined with each other.

[0033] Finally: The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. The independent air return structure of the wet etching area includes an independent air return mechanism provided between the wet etching area and the exhaust gas treatment equipment, characterized in that: The independent air return mechanism comprises an air guide cover (1) installed on a side close to the wet etching area, one end of the air guide cover (1) is connected to a telescopic hose (2), one end of the telescopic hose (2) is connected to an exhaust fan (3), the air outlet end of the exhaust fan (3) is connected to an air outlet pipe (4), the end of the air outlet pipe (4) is connected to a first guide component (5), one side of the first guide component (5) is connected to a plurality of intermediate pipes (6), the ends of the plurality of intermediate pipes (6) are connected to a second guide component (7) corresponding to the position of the first guide component (5), and the outer wall of the second guide component (7) is connected to an exhaust gas input pipe (8) connected to an input port of an exhaust gas treatment device.

2. The independent air return structure for the wet etching area according to claim 1, characterized in that: A bracket for fixing and supporting the position of the air guide cover (1) is fixedly connected to the outer wall of the air guide cover (1).

3. The independent air return structure for the wet etching area according to claim 1, characterized in that: The input end and the output end of the exhaust fan (3) are respectively connected to the ends of the telescopic hose (2) and the air outlet pipe (4) through flanges, and sealing rings are provided at the connections.

4. The independent air return structure for the wet etching area according to claim 1, characterized in that: The air outlet pipe (4) and the first flow guide component (5) are seamlessly welded, and the air outlet pipe (4) is connected to the interior of the first flow guide component (5).

5. The independent air return structure for the wet etching area according to claim 1, characterized in that: The exhaust gas inlet pipe (8) and the second flow guide component (7) are seamlessly welded, and the exhaust gas inlet pipe (8) is connected to the interior of the second flow guide component (7).

6. The independent air return structure for the wet etching area according to claim 1, characterized in that: The outsides of the first flow guide component (5) and the second flow guide component (7) are connected to a plurality of short pipes (9) corresponding to the outer sides of both ends of each intermediate pipe (6), each short pipe (9) is installed with a valve (11), and the end of each short pipe (9) is provided with a first flange (10).

7. The independent air return structure for the wet etching area according to claim 1, characterized in that: Second flanges (601) are provided at both ends of the intermediate tube (6) at positions corresponding to the inner sides of the first flange (10). The intermediate tube (6) and the short tube (9) are connected via flanges, and a sealing ring is provided at the connection.

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