Annealing device

Abstract

The utility model discloses an annealing device, and relates to the technical field of semiconductor processing. The annealing device comprises a premixing chamber, an annealing chamber and a tray, one end of the premixing chamber is connected with a first air inlet pipe and a second air inlet pipe, the other end, away from the first air inlet pipe, of the premixing chamber is provided with at least one air outlet, and the first air inlet pipe, the second air inlet pipe and the at least one air outlet are all communicated with the interior of the premixing chamber. The first gas inlet pipe is used for communicating first process gas; the second gas inlet pipe is used for communicating second process gas; one side of the annealing chamber is provided with at least one air inlet communicating with the interior of the annealing chamber, and the at least one air inlet communicates with the at least one air outlet in a one-to-one correspondence manner; the tray is arranged in the annealing chamber. According to the annealing device provided by the invention, the first process gas and the second process gas can be premixed, so that the annealing effect is improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor processing technology, and in particular to an annealing device. Background Art

[0002] Micro-LEDs (Micro-Light Emitting Diodes) offer high efficiency, high brightness, high reliability, and fast response times. They are self-luminous and require no backlight, offering advantages such as energy saving, simple structure, small size, and thinness. During the Micro-LED manufacturing process, annealing can be performed to enhance the electrical properties of the transparent conductive layer (ITO).

[0003] However, in existing devices for Micro-LED annealing, directly introducing nitrogen and oxygen into the process chamber will affect the annealing effect of the Micro-LED. Utility Model Content

[0004] The present application provides an annealing device, which premixes a first process gas and a second process gas to improve the annealing effect.

[0005] The present application provides an annealing device, comprising:

[0006] a premixing chamber, wherein one end of the premixing chamber is connected to a first air inlet pipe and a second air inlet pipe, and the other end of the premixing chamber away from the first air inlet pipe is configured with at least one air outlet, the first air inlet pipe, the second air inlet pipe and the at least one air outlet are all in communication with the interior of the premixing chamber, the first air inlet pipe is used to communicate with a first process gas, and the second air inlet pipe is used to communicate with a second process gas;

[0007] An annealing chamber, wherein one side of the annealing chamber is provided with at least one air inlet communicating with the interior of the annealing chamber, and the at least one air inlet is in one-to-one communication with the at least one air outlet;

[0008] The tray is arranged in the annealing chamber.

[0009] Based on the above technical solution, in the annealing apparatus provided by this application, the second process gas and the first process gas can be mixed in a premixing chamber, thereby ensuring that the first and second process gases entering the annealing chamber are evenly mixed. This ensures that the oxygen concentration of the atmosphere surrounding each workpiece is within the desired range, while also ensuring that the atmosphere surrounding each workpiece is consistent. This improves the annealing effect of the workpiece, for example, enhancing the electrical properties of the ITO film layer in a Micro-LED.

[0010] In some possible implementations, a mixing structure is further provided in the premixing chamber, and the mixing structure is used to promote uniform mixing of the first process gas and the second process gas entering the premixing chamber.

[0011] In some possible implementations, the mixing structure includes a fan blade, which is rotatably installed in the premixing chamber and located between the first air inlet pipe and the air outlet.

[0012] In some possible implementations, the hybrid structure further includes a first driving member, which is transmission-connected to the fan blades and is configured to drive the fan blades to rotate.

[0013] In some possible implementations, the mixing structure includes an S-shaped flow channel, one end of the flow channel is connected to the first air inlet pipe and the second air inlet pipe respectively, and the other end of the flow channel is connected to the air outlet.

[0014] In some possible implementations, the hybrid structure includes a plurality of first separators and a plurality of second separators;

[0015] From one end close to the first air inlet pipe to one end close to the air outlet, the plurality of first baffles and the plurality of second baffles are alternately arranged in sequence and cooperate to form the flow channel.

[0016] In some possible implementations, the plurality of first partitions are connected to one side of the premixing chamber, and the plurality of second partitions are connected to the other side of the premixing chamber opposite to the first partitions.

[0017] In some possible implementations, a side wall of the first air intake pipe is in contact with a side wall of the second air intake pipe.

[0018] In some possible implementations, the annealing device further includes a heating component and a second driving component, and the heating component is disposed opposite to the tray;

[0019] The tray is rotatably installed in the annealing chamber and is transmission-connected to the second driving member.

[0020] In some possible implementations, the output shaft of the second driving member is coaxially arranged with the tray. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without creative work.

[0022] Figure 1 Shows a schematic structural diagram of an annealing device in some embodiments;

[0023] Figure 2 Shows a schematic structural diagram of an annealing device in some other embodiments;

[0024] Figure 3 Shows a schematic structural diagram of a premixing chamber in some embodiments;

[0025] Figure 4 Shows a schematic structural diagram of the premixing chamber in some other embodiments;

[0026] Figure 5 Schematic diagrams of the structure of the annealing chamber in some embodiments are shown.

[0027] Description of main component symbols:

[0028] 1000-annealing device;

[0029] 110-premixing chamber; 121-first air inlet pipe; 122-second air inlet pipe; 123-air outlet;

[0030] 210-annealing chamber; 220-air inlet;

[0031] 300 - mixing structure; 311 - fan blade; 312 - first driving member; 321 - first partition; 322 - second partition; 323 - flow channel;

[0032] 410 - tray; 420 - second driving member; 421 - output shaft;

[0033] 510-bracket; 520-fixing frame;

[0034] 600-heating component;

[0035] 700-connecting pipe;

[0036] 2000-first process gas; 3000-second process gas. DETAILED DESCRIPTION

[0037] The following describes in detail embodiments of the present application. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application.

[0038] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0039] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. Throughout the description of this application, "plurality" means two or more, unless otherwise specifically defined.

[0040] In this application, unless otherwise expressly specified or limited, terms such as "mounted," "connected," "connect," and "fixed" should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integration; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components or interactions between two components. Those skilled in the art will understand the specific meanings of these terms in this application based on specific circumstances.

[0041] In this application, unless otherwise expressly specified or limited, when a first feature is "above" or "below" a second feature, it may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Furthermore, when a first feature is "above," "above," or "above" a second feature, it may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is at a higher level than the second feature. When a first feature is "below," "below," or "below" a second feature, it may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature is at a lower level than the second feature.

[0042] The indium tin oxide (ITO) film is a key component of micro-LEDs. Besides its excellent conductivity and transparency, it also blocks harmful electronic radiation, ultraviolet rays, and far-infrared rays. An n-type oxide semiconductor, the ITO film typically has two key performance characteristics: conductivity and transmittance. During the ITO film preparation process, an annealing treatment is often performed. This treatment serves two primary purposes: first, it ensures a good ohmic contact between the ITO film and the p-GaN layer, and second, it increases the ITO film's light transmittance. Annealing reduces the contact resistance between the ITO film and the p-GaN layer, thereby lowering the longitudinal series resistance of the micro-LED, reducing heat generation, and increasing the lifespan of the micro-LED. Furthermore, annealing can increase the ITO film's light transmittance to over 90%, reducing light absorption and, for devices like micro-LEDs, increasing brightness.

[0043] During the Micro-LED annealing process, oxygen and nitrogen need to be introduced. After entering the annealing process chamber, the oxygen and nitrogen will mix, that is, the process chamber is filled with a mixture of nitrogen and oxygen. The mixed gas will act on the ITO film layer in the Micro-LED during the annealing process. If the nitrogen and oxygen are not mixed evenly in the process chamber, the oxygen concentration at different Micro-LED locations will be different, which will cause the electrical performance of the ITO film layer in some Micro-LEDs to decrease (in an atmosphere with a higher oxygen concentration, the planar conductivity of the ITO film layer will decrease). In addition, the electrical performance of the ITO film layer in each Micro-LED will be inconsistent, which cannot meet production requirements.

[0044] like Figure 1 As shown, an embodiment provides an annealing apparatus 1000 for annealing a workpiece, wherein the workpiece may be a Micro-LED chip. The annealing apparatus 1000 provided in this embodiment can maintain a consistent atmosphere for each workpiece, ensuring that the ITO film layer of the Micro-LED has good electrical properties after annealing, and can also ensure that the electrical properties of the ITO film layer of each Micro-LED are consistent.

[0045] like Figure 1 As shown, the annealing apparatus 1000 may include a premixing chamber 110 , an annealing chamber 210 , and a tray 410 .

[0046] One end of the premixing chamber 110 can be connected to a first air inlet pipe 121 and a second air inlet pipe 122, and both the first air inlet pipe 121 and the second air inlet pipe 122 are in communication with the interior of the premixing chamber 110. In an embodiment, the first air inlet pipe 121 can be used to communicate with the first process gas 2000. The second air inlet pipe 122 can be used to communicate with the second process gas 3000. The first process gas 2000 can be nitrogen (N2), and the second process gas 3000 can be oxygen (O2). In addition, at least one air outlet 123 is configured at one end of the premixing chamber 110 away from the first air inlet pipe 121, and the air outlet 123 can be in communication with the interior of the premixing chamber 110. The air outlet 123 can be used to output the gas in the premixing chamber 110. In addition, a corresponding air outlet pipe can be configured at the position of the air outlet 123, and the air outlet pipe can be fixed and sealed to the inner wall of the air outlet 123 by gluing, welding, or threading.

[0047] After the first process gas 2000 and the second process gas 3000 enter the premixing chamber 110, the first process gas 2000 and the second process gas 3000 meet and mix. The mixed first process gas 2000 and the second process gas 3000 can be output through the gas outlet 123. In the embodiment, the first gas inlet pipe 121 and the second gas inlet pipe 122 are arranged at one end of the premixing chamber 110, and the gas outlet 123 is arranged at the other end of the premixing chamber 110. This can extend the movement path of the first process gas 2000 and the second process gas 3000 in the premixing chamber 110, increase the mixing path of the first process gas 2000 and the second process gas 3000, and allow the first process gas 2000 and the second process gas 3000 to be evenly mixed and then output through the gas outlet 123.

[0048] At least one air inlet 220 is disposed on one side of the annealing chamber 210, and the air inlet 220 can be connected to the interior of the annealing chamber 210. In addition, a corresponding third air inlet pipe can be disposed at the position of the air inlet 220, and the third air inlet pipe can be fixed and sealed to the inner wall of the air inlet 220 by gluing, welding, or threading.

[0049] In one embodiment, at least one air inlet 220 can be connected to at least one air outlet 123 in a one-to-one correspondence. The mixed gas output from the premixing chamber 110 can be delivered to the annealing chamber 210 through the air outlet 123 and the air inlet 220. In some embodiments, the air outlet pipe at the position of the air outlet 123 can be connected to the third air inlet pipe at the position of the air inlet 220 via a connecting pipe 700 to achieve the connection between the premixing chamber 110 and the annealing chamber 210.

[0050] like Figure 2As shown, in other embodiments, one end of the connecting tube 700 can be directly connected to the gas outlet 123 to achieve connection with the premixing chamber 110. The other end of the connecting tube 700 can be directly connected to the gas inlet 220 to achieve connection with the annealing chamber 210.

[0051] The tray 410 may be disposed in the annealing chamber 210. The tray 410 may be used to carry workpieces to be processed.

[0052] During use, workpieces to be processed can be placed on tray 410 in annealing chamber 210 for annealing. Second process gas 3000 and first process gas 2000 are mixed in premixing chamber 110, ensuring a uniform mixture of first process gas 2000 and second process gas 3000 entering annealing chamber 210. This ensures that the oxygen concentration of the atmosphere surrounding each workpiece is within the desired range while also ensuring a consistent atmosphere for each workpiece. This improves the annealing effect of the workpiece, for example, enhancing the electrical properties of the ITO film layer in Micro-LEDs.

[0053] like Figure 1 and Figure 2 As shown, in some embodiments, the air outlets 123 and the air inlets 220 may be arranged in one group, two groups, four groups, etc.

[0054] like Figure 1 and Figure 3 As shown, the annealing device 1000 further includes a mixing structure 300 , which can be disposed in the premixing chamber 110 . The mixing structure 300 can make the first process gas 2000 and the second process gas 3000 entering the premixing chamber 110 mix more evenly, thereby improving the mixing effect.

[0055] In some embodiments, the mixing structure 300 may include blades 311. The blades 311 are rotatably installed in the premixing chamber 110. The blades 311 can rotate under the driving action of the airflow. When the first process gas 2000 and the second process gas 3000 enter the premixing chamber 110 through the corresponding first air inlet pipe 121 and the second air inlet pipe 122 and are output through the air outlet 123, an airflow will be formed in the premixing chamber 110, and the blades 311 can rotate under the driving action of the airflow. During the rotation of the blades 311, the first process gas 2000 and the second process gas 3000 can be stirred to make the first process gas 2000 and the second process gas 3000 mixed more evenly, thereby making the mixed gas transported to the annealing chamber 210 through the air outlet 123 more evenly mixed.

[0056] In some embodiments, the mixing structure 300 may further include a first driving member 312. The first driving member 312 may be a motor. The fan blades 311 may be connected to the output shaft 421 of the first driving member 312. Thus, the first driving member 312 may drive the fan blades 311 to rotate, further evenly mixing the first process gas 2000 and the second process gas 3000, and improving the mixing efficiency of the first process gas 2000 and the second process gas 3000.

[0057] like Figure 3 and Figure 4 As shown, in other embodiments, the mixing structure 300 may include a first baffle 321 and a second baffle 322, each of which may be provided in plurality. The plurality of first baffles 321 may be connected to a side wall of the premixing chamber 110 and may be sequentially spaced from one end near the first air inlet pipe 121 to one end near the air outlet 123. In an embodiment, the plurality of first baffles 321 may be arranged parallel to one another. The plurality of second baffles 322 may be connected to the other side wall of the premixing chamber 110 opposite the first baffles 321 and may be sequentially spaced from one end near the first air inlet pipe 121 to one end near the air outlet 123. The plurality of second baffles 322 may also be arranged parallel to one another. In addition, the plurality of second baffles 322 and the plurality of first baffles 321 may be arranged in an alternating manner, thereby forming an S-shaped flow channel 323 in the premixing chamber 110. After the first process gas 2000 enters the premixing chamber 110 through the first inlet pipe 121 and the second process gas 3000 enters the premixing chamber 110 through the second inlet pipe 122, they can move through the S-shaped flow channel 323 to the gas outlet 123. During this process, the airflow of the first process gas 2000 and the airflow of the second process gas 3000 will generate turbulence during the turning process, thereby allowing the first process gas 2000 and the second process gas 3000 to be fully mixed. In addition, the distance between the first inlet pipe 121 and the second inlet pipe 122 can be set as small as possible, so that the first process gas 2000 and the second process gas 3000 can meet and mix immediately upon entering the premixing chamber 110, further ensuring the first process gas 2000 and the second process gas 3000 are fully mixed. For example, in some embodiments, the sidewall of the first inlet pipe 121 can be arranged to fit the sidewall of the second inlet pipe 122.

[0058] In other embodiments, the ends of the first partition plate 321 and the second partition plate 322 that are away from each other are both spaced apart from the sidewalls of the premixing chamber 110 on the corresponding sides.

[0059] In other embodiments, the premixing chamber 110 may be a block or plate structure, and the S-shaped flow channel 323 may be opened in the premixing chamber 110 and communicate with the first air inlet pipe 121, the second air inlet pipe 122 and the air outlet 123 respectively.

[0060] like Figure 1 and Figure 5 As shown, the annealing device 1000 further includes a heating assembly 600. The heating assembly 600 is disposed in the annealing chamber 210 and opposite the tray 410. In an embodiment, the heating assembly 600 can be used to heat the workpiece to provide the temperature required for the annealing process. In some embodiments, the heating assembly 600 can include a plurality of lamps arranged in parallel.

[0061] In some embodiments, the tray 410 is rotatably mounted within the annealing chamber 210, thereby enabling the workpieces to rotate synchronously with the tray 410. During use, since it is difficult to maintain a uniform temperature across the multiple lamps within the heating assembly 600, the tray 410 can be used to rotate the workpieces. This allows each workpiece to sequentially pass through the irradiation area of ​​a different lamp, resulting in uniform heating of the workpieces and improved annealing quality and consistency.

[0062] In the embodiment, a bracket 510 and a second driving member 420 are fixedly provided in the annealing chamber 210. The tray 410 can be rotatably mounted on the side of the bracket 510 facing the heating assembly 600. The second driving member 420 can be fixedly mounted on the side of the bracket 510 facing away from the tray 410 through a fixing bracket 520. In some embodiments, the second driving member 420 can use a motor with adjustable speed. The output shaft 421 of the second driving member 420 can be passed through the bracket 510 and fixedly connected to the tray 410. During use, the second driving member 420 can drive the tray 410 to rotate, thereby driving the workpiece on the tray 410 to rotate synchronously. Among them, the rotation speed of the tray 410 can be set as needed, and no specific limitation is made here.

[0063] In addition, the output shaft 421 of the second driving member 420 can be coaxially arranged with the tray 410 to avoid problems such as the tray 410 tilting.

[0064] The annealing device 1000 provided in this application can fully and evenly mix the first process gas 2000 and the second process gas 3000 entering the annealing chamber 210 to ensure that the oxygen concentration of the atmosphere surrounding each workpiece is within the desired range, thereby improving the annealing effect and consistency of the workpieces. In addition, the tray 410 carrying the workpieces is rotated, which can ensure that the workpieces on the tray 410 are heated more evenly and the atmosphere surrounding each workpiece is more uniform. This can improve the uniformity and consistency of the electrical performance of the workpieces after annealing, improve the electrical performance of the workpieces after annealing, and thus ensure the uniformity of the Micro-LED brightness.

[0065] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in this specification and features of different embodiments or examples without contradiction.

[0066] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application.

Claims

1. An annealing device, characterized in that: include: a premixing chamber, wherein one end of the premixing chamber is connected to a first air inlet pipe and a second air inlet pipe, and the other end of the premixing chamber away from the first air inlet pipe is configured with at least one air outlet, the first air inlet pipe, the second air inlet pipe and the at least one air outlet are all in communication with the interior of the premixing chamber, the first air inlet pipe is used to communicate with a first process gas, and the second air inlet pipe is used to communicate with a second process gas; An annealing chamber, wherein one side of the annealing chamber is provided with at least one air inlet communicating with the interior of the annealing chamber, and the at least one air inlet is in one-to-one communication with the at least one air outlet; The tray is arranged in the annealing chamber.

2. The annealing device according to claim 1, characterized in that The premixing chamber is further provided with a mixing structure, and the mixing structure is used to promote uniform mixing of the first process gas and the second process gas entering the premixing chamber.

3. The annealing device according to claim 2, characterized in that The mixing structure includes a fan blade, which is rotatably installed in the premixing chamber and is located between the first air inlet pipe and the air outlet.

4. The annealing device according to claim 3, characterized in that The hybrid structure further includes a first driving member, which is transmission-connected to the fan blades and is used to drive the fan blades to rotate.

5. The annealing device according to claim 2, characterized in that The mixing structure includes an S-shaped flow channel, one end of the flow channel is connected to the first air inlet pipe and the second air inlet pipe respectively, and the other end of the flow channel is connected to the air outlet.

6. The annealing device according to claim 5, characterized in that The hybrid structure includes a plurality of first baffles and a plurality of second baffles; From one end close to the first air inlet pipe to one end close to the air outlet, the plurality of first baffles and the plurality of second baffles are alternately arranged in sequence and cooperate to form the flow channel.

7. The annealing device according to claim 6, characterized in that The plurality of first partitions are connected to one side of the premixing chamber, and the plurality of second partitions are connected to the other side of the premixing chamber opposite to the first partitions.

8. The annealing device according to any one of claims 5 to 7, characterized in that: The side wall of the first air intake pipe is in contact with the side wall of the second air intake pipe.

9. The annealing device according to claim 1, characterized in that The annealing device further comprises a heating component and a second driving member, wherein the heating component is arranged opposite to the tray; The tray is rotatably installed in the annealing chamber and is transmission-connected to the second driving member.

10. The annealing device according to claim 9, characterized in that The output shaft of the second driving member is coaxially arranged with the tray.

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