Etching apparatus

Abstract

The utility model discloses an etching device. The etching device comprises a first chamber and a stop assembly, the first chamber is provided with a first end part and is provided with a plurality of first conveying shafts which are arranged along a first direction and extend along a second direction, the first direction is perpendicular to the second direction, and the plurality of first conveying shafts are used for conveying plate-shaped elements towards the first end part along the first direction; the stopping assembly is arranged in the first cavity close to the first end part, the stopping assembly has an original position and a retreating position, a preset distance is formed between the retreating position and the original position in the first direction, and the stopping assembly is provided with a first inclined surface; when the plurality of first conveying shafts convey the plate-shaped elements not to reach the first end part, the stop assembly is located at the original position, the plate-shaped elements reach the first end part and touch the first inclined surface of the stop assembly, and the stop assembly moves to the retreating position. According to the utility model, the surface cleanness of the plate-shaped element can be ensured, and the subsequent coating quality is prevented from being influenced.

Description

Technical Field

[0001] The utility model relates to an etching device, in particular to an etching device with a stopper assembly. Background Art

[0002] At present, display panels are widely used in many electronic products, such as mobile phones, tablet computers, watches, car displays, etc. As users have higher and higher requirements for electronic products, electronic products are now developing in the direction of being lighter and thinner. Taking the display panel as an example, after the box is completed, the chemical reaction between the glass substrate and the acid solution can be used to etch and thin the upper and lower glass substrates, so that the overall thickness of the display panel is thinned. After the etching and thinning are completed, a functional thin film, such as ITO, can be plated on the surface of the glass substrate of the display panel. In the prior art, after the display panel is etched and thinned, it is transferred from the cleaning chamber to the coating chamber. When the display panel reaches the exit of the cleaning chamber, it will collide with the stop assembly at the exit. Foreign matter such as glass sand remaining on the side surface of the display panel is splashed back to the surface of the display panel due to the instantaneous impact and the obstruction of the stop assembly, affecting the surface cleanliness of the display panel when it enters the coating chamber, resulting in the problem of film peeling after the display panel is coated.

[0003] Therefore, how to design an etching device that can ensure the cleanliness of the surface of the plate-like component and avoid affecting the quality of subsequent coating has become one of the technical problems that need to be solved. Utility Model Content

[0004] The purpose of the present invention is to provide an etching device to solve the above problems.

[0005] In order to achieve the above-mentioned purpose, the present invention provides an etching device, which includes a first chamber and a stopper assembly. The first chamber has a first end, and is provided with a plurality of first conveying shafts arranged along a first direction and extending along a second direction, wherein the first direction is perpendicular to the second direction, and the plurality of first conveying shafts are used to convey the plate-like element along the first direction toward the first end; the stopper assembly is arranged in the first chamber adjacent to the first end, and has an original position and a retreat position, wherein the retreat position has a preset distance from the original position in the first direction, and the stopper assembly has a first inclined surface; the stopper assembly includes a stopper column, which The column has a first end and a second end relative to each other, and a waist located between the first end and the second end, the first end has a first diameter d1, the second end has a second diameter d2, and the waist has a third diameter d3, wherein d3<d1, d3<d2; wherein, when the multiple first transmission shafts transmit the plate-like element but do not reach the first end, the stop assembly is located at the original position, and when the plate-like element reaches the first end and touches the first inclined surface of the stop assembly, the stop assembly moves to the retreat position in accordance with the touch of the plate-like element.

[0006] As an optional technical solution, 0.6<d3 / d1<0.9; or, 0.6<d3 / d2<0.9.

[0007] As an optional technical solution, there is a first inclined surface between the waist and the first end.

[0008] As an optional technical solution, the plane where the top surfaces of the multiple first transmission shafts are located is not higher than the plane where the waist is located.

[0009] As an optional technical solution, a first distance between the first end and the waist is greater than or equal to a second distance between the second end and the waist.

[0010] As an optional technical solution, the etching device further includes a driving component, which is arranged corresponding to the stop component, and is used to drive the stop component to move between the original position and the retreat position; wherein, when the plate-like element reaches the first end and touches the first inclined surface of the stop component, and the stop component moves to the retreat position, foreign matter on the side surface of the plate-like element hits the first inclined surface and falls from the gap between the plate-like element and the stop component.

[0011] As an optional technical solution, after the stop assembly is located at the retreat position for a first preset time, the driving assembly drives the stop assembly to return to the original position.

[0012] As an optional technical solution, the etching device further includes a sensing component, which is arranged adjacent to or on the stop component, and is used to sense whether the plate-like element touches the stop component.

[0013] As an optional technical solution, the stop assembly further includes a support platform disposed adjacent to the first end portion, the support platform is provided with a rotation axis, and the stop post is rotatably disposed on the rotation axis.

[0014] As an optional technical solution, the etching device also includes a second chamber adjacent to the first end of the first chamber, and the second chamber is provided with a plurality of second conveying axes arranged along a third direction and extending along a fourth direction, the third direction is perpendicular to the fourth direction, and the third direction intersects with the first direction. After the plate-like element reaches the first end, it is conveyed along the third direction by the plurality of second conveying axes.

[0015] In the etching device of the present invention, a stopper assembly is disposed at the first end of the first chamber. The stopper assembly has a first inclined surface and has a home position and a retreated position. When a plate-like element slightly strikes the stopper assembly, the first inclined surface cooperates with the retreating movement of the stopper assembly, causing foreign matter such as glass flakes to fall between the plate-like element and the stopper assembly without splashing back onto the surface of the plate-like element. This ensures a clean surface for the plate-like element and ensures the quality of subsequent coating.

[0016] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments, but they are not intended to limit the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A schematic diagram of an etching device according to the present invention;

[0018] Figure 2 This is a schematic diagram of the stopper assembly in the etching device of the present invention being located at the original position;

[0019] Figure 3 This is a schematic diagram of the etching device of the present invention with the stopper assembly in the retreated position;

[0020] Figure 4 for Figure 3 A partial enlarged schematic diagram. DETAILED DESCRIPTION

[0021] In order to provide a further understanding of the purpose, structure, features and functions of the present invention, the present invention is described in detail below with reference to the embodiments.

[0022] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention may be implemented. Directional terms used in this invention, such as "up," "down," "front," "back," "left," "right," and "side," refer only to the directions in the accompanying drawings. Therefore, these directional terms are intended to illustrate and facilitate understanding of the present invention and are not intended to limit the present invention.

[0023] Please refer to Figures 1 to 4 , Figure 1 Schematic diagram of the etching device of the present invention, Figure 2 This is a schematic diagram of the stopper assembly in the etching device of the present invention in its original position. Figure 3 This is a schematic diagram of the stopper assembly in the etching device of the present invention in the retreat position. Figure 4 for Figure 3A partial enlarged view of the etching device 10. The etching device 10 comprises a first chamber A and a stopper assembly 200. The first chamber A has a first end 101, and is provided with a plurality of first conveying shafts 110 arranged along a first direction F1 and extending along a second direction F2, the first direction F1 being perpendicular to the second direction F2, the plurality of first conveying shafts 110 being used for conveying the plate-shaped elements P along the first direction F1 towards the first end 101. The stopper assembly 200 is disposed in the first chamber A adjacent to the first end 101, and has an original position OP and a retreat position BP, the retreat position BP having a preset distance from the original position OP in the first direction F1, and the stopper assembly 200 has a first inclined surface 201. When the plurality of first conveying shafts 110 do not convey the plate-shaped elements P to the first end 101, the stopper assembly 200 is located at the original position OP, and at this time the plate-shaped elements P do not touch the stopper assembly 200. When the plate-shaped elements P reach the first end 101 and touch the first inclined surface 201 of the stopper assembly 200, the stopper assembly 200 moves to the retreat position BP in response to the touch of the plate-shaped elements P.

[0024] In an embodiment, the plate-shaped elements P are display panel large plates, which can be subsequently cut into a plurality of display panels. The first chamber A is, for example, a cleaning chamber, and the etching device 10 can further comprise an etching chamber (not shown) located before the first chamber A, and the first end 101 is an outlet of the first chamber A, i.e. the stopper assembly 200 is disposed in the first chamber A adjacent to the outlet of the first chamber A. The plate-shaped elements P enter the first chamber A after being thinned by etching in the etching chamber, and the first chamber A is provided with a plurality of nozzles NO for spraying cleaning liquid to clean the surface of the plate-shaped elements P after being thinned by etching, so as to flush the surface of the plate-shaped elements P to remove glass sand, etching liquid, etc. The cleaning liquid can be water. In actual operation, a small amount of foreign matter pt such as glass sand can remain on the side surface of the plate-shaped elements P after cleaning. When the plate-shaped elements P reach the first end 101, the side edges of the plate-shaped elements P touch (or are considered to slightly hit) the first inclined surface 201 of the stopper assembly 200, and the stopper assembly 200 moves from the original position OP to the retreat position BP. In this process, the small amount of foreign matter pt on the side surface of the plate-shaped elements P hits the first inclined surface 201 and changes the direction of movement under the guidance / blocking of the first inclined surface 201, and moves obliquely downward relative to the first inclined surface 201. At the same time, the movement of the stopper assembly 200 to the retreat position BP can form a gap between the plate-shaped elements P and the stopper assembly 200, so that the aforementioned foreign matter pt falls from the gap. Thus, through the cooperation of the first inclined surface 201 and the retreat movement of the stopper assembly 200, the foreign matter pt such as glass sand can change the direction of movement and fall from the gap between the plate-shaped elements P and the stopper assembly 200, avoiding being splashed back to the surface of the plate-shaped elements P due to instantaneous impact, ensuring the surface of the plate-shaped elements P to be clean, and avoiding affecting the quality of subsequent film coating.

[0025] In one embodiment, the etching apparatus 10 may further include a second chamber (not shown) adjacent to the first end 101 of the first chamber A. The second chamber is provided with a plurality of second conveying shafts arranged along a third direction and extending along a fourth direction. The third direction is perpendicular to the fourth direction and intersects the first direction (for example, if the third direction F1 is perpendicular to the fourth direction and the second direction F2 is parallel to the third direction). After the plate-like component P reaches the first end 101, it is conveyed along the third direction by the plurality of second conveying shafts. The second chamber may be a coating chamber or a conveying chamber located between the coating chamber and the first chamber A. The provision of a stopper assembly 200 within the first chamber A prevents foreign matter such as glass frit from being splashed back onto the surface of the plate-like component P, thereby ensuring the cleanliness of the surface of the plate-like component P before entering the coating chamber, thereby ensuring the quality of the subsequent coating and preventing the problem of partial film shedding.

[0026] In one embodiment, the stopper assembly 200 includes a stopper post 210 having a first end 211 and a second end 212, and a waist portion 213 located between the first and second ends 211 and 212. The first end 211 has a first diameter d1, the second end 212 has a second diameter d2, and the waist portion 213 has a third diameter d3, where d3 < d1 and d3 < d2. In other words, the stopper post 210 has a drum-like structure that is thin in the middle and thick at both ends. When the stopper post 210 is installed, the first end 211 is located above the second end 212, and the waist portion 213 and the first end 211 form the aforementioned first inclined surface 201.

[0027] In one embodiment, the ratio of the third diameter d3 of the waist 213 to the first diameter d1 of the first end 211 is between 0.6 and 0.9, that is, 0.6<d3 / d1<0.9. The ratio of the third diameter d3 of the waist 213 to the second diameter d2 of the second end 212 is also between 0.6 and 0.6, that is, 0.6<d3 / d2<0.9. Furthermore, the first diameter d1 of the first end 211 and the second diameter d2 of the second end 212 are equal. For example, the first diameter d1 of the first end 211 and the second diameter d2 of the second end 212 are both 15 mm, and the third diameter d3 of the waist 213 is 12 mm. In one embodiment, the first distance between the first end 211 and the waist 213 is equal to the second distance between the second end 212 and the waist 213, but this is not limited to this, and the first distance may also be greater than the second distance.

[0028] like Figure 3 and Figure 4 As shown, when the plate-shaped element P touches (or is considered to have a slight impact on) the first inclined surface 201 of the stopper assembly 200, the stopper assembly 200 moves along the first direction F1 from the original position (at Figure 4The position of the stopper assembly 200 shown by the dotted line in the figure is moved to the retreat position BP. During this process, foreign matter pt such as glass sand on the side surface of the plate-shaped element P will first collide with the first inclined surface 201 in the horizontal direction, and then be guided / blocked by the first inclined surface 201 and move from the first inclined surface 201 in a direction symmetrical to the horizontal direction and relative to the normal line of the first inclined surface 201 ( Figure 4 At the same time, since the stopper assembly 200 moves to the retreat position BP, a gap is formed between the stopper assembly 200 and the plate-like component P, so that the foreign matter pt falls through the gap between the stopper assembly 200 and the plate-like component P during the downward movement, thereby avoiding splashing onto the surface of the plate-like component P and affecting the subsequent coating quality.

[0029] In one embodiment, the plane where the top surfaces of the multiple first transmission shafts 110 are located is no higher than the plane where the waist 213 is located. In this way, when the plate-shaped element P hits the stop assembly 200, it can hit the first inclined surface 201 between the first end 211 and the waist 213, so that foreign matter pt such as glass sand can fall obliquely downward from the first inclined surface 201.

[0030] In one embodiment, the etching apparatus 10 further includes a drive assembly 300, which is disposed in correspondence with the stop assembly 200 and is configured to drive the stop assembly 200 to move between an original position OP and a retreated position BP. The drive assembly 300 may be a pneumatic cylinder. The drive assembly 300 drives the stop assembly 200 to the retreated position BP the instant the plate-like component P contacts the stop assembly 200. After the stop assembly 200 has been at the retreated position BP for a first predetermined time, the drive assembly 300 drives the stop assembly 200 to return to the original position OP. For example, when the plate-like component P that contacts the stop assembly 200 leaves the first chamber A and enters the second chamber, the drive assembly 300 drives the stop assembly 200 to return to the original position OP, thereby facilitating the transfer of the next plate-like component P in the first chamber A to the first end 101.

[0031] In one embodiment, the stopping assembly 200 further includes a supporting platform 220 disposed adjacent to the first end portion 101 . The supporting platform 220 is provided with a rotation axis (not shown), and the stopping post 210 is rotatably disposed on the rotation axis. Figure 2 and Figure 3In the illustrated embodiment, a drive assembly 300 (e.g., a pneumatic cylinder) is connected to the support platform 220. When the plate-like component P contacts the stop assembly 200, the drive assembly 300 drives the support platform 220 and the stop assembly 200 to move along the first direction F1 to the retracted position BP. In another embodiment, the drive assembly 300 can also be connected to the stop assembly 200. When the plate-like component P contacts the stop assembly 200, the drive assembly 300 drives the stop assembly 200 to move along the first direction F1 to the retracted position BP.

[0032] In one embodiment, when the plate-like element P touches the stop assembly 200, at least a portion of the support platform 220 is located below the plate-like element P (the portion that touches the stop assembly 200), and foreign matter pt such as glass sand on the side surface of the plate-like element P may fall onto the support platform 220 from the gap between the stop assembly 200 and the plate-like element P. The surface of the support platform 220 may be cleaned when the etching device 10 is regularly cleaned and maintained; alternatively, an automatic surface cleaning device (not shown) may be provided corresponding to the support platform 220 here to clean the surface of the support platform 220 here in a timely manner to remove foreign matter such as glass sand that has fallen thereon.

[0033] In one embodiment, the etching apparatus 10 may further include a sensing component (not shown) disposed adjacent to or on the stopper component 200 , for sensing whether the plate-like component P contacts the stopper component 200 . The sensing component may be, for example, a light sensor disposed adjacent to the stopper component 200 ; alternatively, the sensing component may be a pressure sensor disposed on the stopper component 200 .

[0034] In the etching device of the present invention, a stopper assembly is disposed at the first end of the first chamber. The stopper assembly has a first inclined surface and has a home position and a retreated position. When a plate-like element slightly strikes the stopper assembly, the first inclined surface cooperates with the retreating movement of the stopper assembly, causing foreign matter such as glass flakes to fall between the plate-like element and the stopper assembly without splashing back onto the surface of the plate-like element. This ensures a clean surface for the plate-like element and ensures the quality of subsequent coating.

[0035] Of course, the present invention may have many other embodiments. Without departing from the spirit and essence of the present invention, technicians familiar with the field may make various corresponding changes and modifications based on the present invention, but these corresponding changes and modifications should all fall within the scope of protection of the claims attached to the present invention.

Claims

1. An etching device, characterized in that include, A first chamber having a first end portion, the first chamber being provided with a plurality of first conveying shafts arranged along a first direction and extending along a second direction, the first direction being perpendicular to the second direction, the plurality of first conveying shafts being used to convey the plate-shaped component along the first direction toward the first end portion; as well as a stop assembly disposed within the first chamber adjacent to the first end, the stop assembly having an initial position and a retreated position, the retreated position being a predetermined distance from the initial position in the first direction, the stop assembly having a first inclined surface; the stop assembly comprising a stop post having opposing first and second ends, a first end, a second end, and a waist portion located between the first and second ends, the first end having a first diameter d1, the second end having a second diameter d2, and the waist having a third diameter d3, wherein d3 < d1 and d3 < d2; When the plate-shaped element is transported by the multiple first transmission shafts but does not reach the first end, the stop assembly is located at the original position; when the plate-shaped element reaches the first end and touches the first inclined surface of the stop assembly, the stop assembly moves to the retreat position in accordance with the contact of the plate-shaped element.

2. The etching device according to claim 1, characterized in that 0.6<d3 / d1<0.9; or, 0.6<d3 / d2<0.

9.

3. The etching device according to claim 1, wherein A first inclined surface is formed between the waist and the first end.

4. The etching device according to claim 3, characterized in that The plane where the top surfaces of the plurality of first transmission shafts are located is not higher than the plane where the waist is located.

5. The etching device according to claim 1, characterized in that A first distance between the first end and the waist is greater than or equal to a second distance between the second end and the waist.

6. The etching device according to claim 1, wherein The etching device also includes a driving component, which is arranged corresponding to the stop component, and is used to drive the stop component to move between the original position and the retreat position; wherein, when the plate-like element reaches the first end and touches the first inclined surface of the stop component, and the stop component moves to the retreat position, foreign matter on the side surface of the plate-like element hits the first inclined surface and falls from the gap between the plate-like element and the stop component.

7. The etching device according to claim 6, characterized in that After the stop assembly is located at the retreat position for a first preset time, the driving assembly drives the stop assembly to return to the original position.

8. The etching device according to claim 1, wherein The etching device further includes a sensing component, which is disposed adjacent to or on the stop component, and is used to sense whether the plate-shaped element touches the stop component.

9. The etching device according to claim 1, wherein: The stop assembly further comprises a support platform adjacent to the first end portion. The support platform is provided with a rotation axis, and the stop post is rotatably provided on the rotation axis.

10. The etching device according to claim 1, wherein The etching device also includes a second chamber adjacent to the first end of the first chamber, the second chamber is provided with a plurality of second conveying axes arranged along a third direction and extending along a fourth direction, the third direction is perpendicular to the fourth direction, and the third direction intersects with the first direction. After the plate-like element reaches the first end, it is conveyed along the third direction by the plurality of second conveying axes.

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