Clamping type manipulator capable of preventing particulate matter pollution

Abstract

The clamping type mechanical arm capable of preventing particulate matter pollution comprises a finger piece, a telescopic device, a palm box and a double-push-rod assembly, the finger piece is connected to the front end of the palm box, a first limiting part is arranged at the fingertip of the finger piece, stroke openings are formed in the side walls of the two sides of the palm box, and a second limiting part is arranged at the tail end of the palm box. The telescopic device is arranged in the palm box, and the linkage end of the double-push-rod assembly is arranged in the palm box and connected with the telescopic end of the telescopic device, so that the double-push-rod assembly is limited by the stroke distance of the stroke opening to conduct telescopic displacement, and the clamping distance between the clamping end of the double-push-rod assembly and the first limiting part of the finger piece is adjusted. Therefore, fine particles in the manipulator are prevented from overflowing to pollute wafers.

Description

TECHNICAL FIELD

[0001] The utility model relates to wafer transmission technical field especially, relates to a clamping type manipulator of preventing particulate pollution. BACKGROUND

[0002] At present, in order to be able to compatible clamping multiple size specifications wafer, its mechanical hand adopts cylinder plus wafer single push rod form structure design, and the push rod mechanism is placed in the middle of the mechanical hand, and is opposite to the wafer, and is stretched to the wafer one side to form the clamping form.

[0003] Typically, such as the prior art presents "a compatible type wafer clamping handling device and method" (Chinese patent publication number: CN117116843A) it includes: end finger and end arm, the end finger is fixed in end arm, the end arm includes fixed assembly and moving assembly, the fixed assembly is fixed in end arm, the moving assembly is slidably arranged in fixed assembly, and the moving assembly is provided with wafer fastener, when the wafer size in end finger is different, the moving assembly moves to the different positions of moving assembly to realize the clamping of different size wafers.

[0004] However, through actual use, it is found that the mechanical hand of this structure, due to the gap between the push rod and the mechanical hand body, combined with the internal existence of some fine particulate matters after long-term use of the mechanical hand, therefore, the fine particulate matters will be taken out along with the push rod to pollute the wafer through the gap. It can be seen that the clamping type mechanical hand of the existing structure still lacks effective measures to prevent particulate pollution. UTILITY MODEL CONTENT

[0005] Therefore, the main purpose of the utility model is to provide a clamping type mechanical hand for preventing particulate pollution to prevent the overflow of fine particulate matters in the mechanical hand to pollute the wafer.

[0006] In order to achieve the above purpose, according to one aspect of the utility model, a clamping type mechanical hand for preventing particulate pollution is provided, which comprises: a finger piece, a telescopic device, a palm box, a double push rod assembly, wherein the finger piece is connected to the front end of the palm box, the first limiting part is arranged at the fingertip of the finger piece, the travel port is arranged on the side wall of the palm box, the telescopic device is arranged in the palm box, the connecting end of the double push rod assembly is arranged in the palm box and connected with the telescopic end of the telescopic device, so that the telescopic displacement of the double push rod assembly is limited by the travel distance of the travel port, and the clamping distance between the clamping end of the double push rod assembly and the first limiting part of the finger piece is adjusted.

[0007] Preferably, the double push rod assembly comprises a push rod frame, a dust baffle and a roller unit, the push rod frame is provided with a stroke window on the frame body, and rod arms are arranged on both sides of the front part of the frame body, the push rod frame partially penetrates through the stroke port, is sleeved on the front wall of the palm box through the stroke window, and the rear part of the push rod frame is arranged in the palm box and connected with the telescopic end of the telescopic device, the dust baffle is arranged on both sides of the push rod frame and blocks the stroke port, and the roller unit is arranged on the rod arm.

[0008] Preferably, the roller unit comprises an adapter block, a flange and a roller, the tail end of the adapter block is connected with the rod arm, the front end of the adapter block is provided with a mandrel, the roller is sleeved on the mandrel, and the flange is connected with the top of the mandrel through a bolt to limit the axial displacement of the roller.

[0009] Preferably, the roller unit comprises an adapter block, an eccentric flange and an eccentric wheel, the tail end of the adapter block is connected with the rod arm, the front end of the adapter block is provided with an eccentric mandrel, the eccentric wheel is sleeved on the eccentric mandrel, and the eccentric flange is connected with the top of the eccentric mandrel through a bolt to limit the axial displacement of the eccentric wheel.

[0010] Preferably, the double push rod assembly further comprises an adapter, and the adapter is in the shape of a Chinese character.

[0011] Preferably, the double push rod assembly further comprises a sensing unit and a trigger, the sensing unit is arranged in the palm box, and the trigger is arranged on the adapter to trigger the sensing unit when the telescopic device drives the adapter to displace and drives the roller unit to move to a position.

[0012] Preferably, the double push rod assembly further comprises a sensing unit and a trigger, the sensing unit is arranged in the palm box, and the trigger is arranged on the adapter to trigger the sensing unit when the telescopic device drives the adapter to displace and drives the roller unit to move to a position.

[0013] Preferably, a second limiting part is arranged at the root of the finger part.

[0014] Preferably, the sensing unit comprises an optical sensor and a fixing seat, the optical sensor is connected in the palm box through the fixing seat, and the sensing end of the optical sensor is on the movement track of the trigger.

[0015] Preferably, the telescopic device is a slide table air cylinder.

[0016] The double push rod assembly structure is combined with the telescopic device, can displace at the stroke opening on both sides of the palm box, forms clamping cooperation with the finger piece, thereby preventing the granular matter from overflowing directly from the front of the palm box to directly pollute the wafer, and further preventing the granular matter in the palm box from overflowing from the stroke opening, thereby improving the dustproof effect of the mechanical hand and ensuring the cleanliness during wafer clamping. BRIEF DESCRIPTION OF DRAWINGS

[0017] The accompanying drawings, which form a part of this application, are included to provide a further understanding of the application and are incorporated in and constitute a part of this application. The embodiments of the present application illustrated in the drawings are presented to provide an overall understanding of the present application, the exemplary embodiments of the present application, and the illustrations are used to explain the present application and do not constitute an inappropriate limitation to the present application. In the drawings:

[0018] Figure 1 It is an overall structure schematic view of the clamping type mechanical hand for preventing granular matter pollution of the present application;

[0019] Figure 2 It is an internal structure schematic view of the clamping type mechanical hand for preventing granular matter pollution of the present application;

[0020] Figure 3 It is an internal structure top view schematic view of the clamping type mechanical hand for preventing granular matter pollution of the present application;

[0021] Figure 4 It is a roller unit schematic view of the eccentric structure in the clamping type mechanical hand for preventing granular matter pollution of the present application.

[0022] BRIEF DESCRIPTION OF DRAWINGS

[0023] Finger piece 1, telescopic device 2, palm box 3, double push rod assembly 4, sensing unit 5, trigger piece 6, first limiting portion 11, second limiting portion 12, stroke opening 31, push rod frame 41, dust baffle 42, roller unit 43, adapter 44, stroke window 411, lever arm 412, adapter block 431, eccentric flange 432, eccentric wheel 433, eccentric core shaft 434, photoelectric sensor 51, fixed seat 52. DETAILED DESCRIPTION

[0024] To make the purpose, technical scheme and advantages of the embodiments of the present application more clear, the technical scheme in the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments of the present application. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.

[0025] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but rather merely represents selected embodiments of the present invention. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without creative effort are also within the scope of protection of the present invention.

[0026] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings.

[0027] In the description of the present utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings, or are the orientation or positional relationship in which the utility model product is usually placed when in use. They are only for the convenience of describing the utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present utility model. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance. The terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions.

[0028] Furthermore, terms such as "horizontal," "vertical," and "overhanging" do not necessarily imply that a component must be absolutely horizontal or overhanging, but rather that it can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," and does not mean that the structure must be completely horizontal, but rather that it can be slightly tilted.

[0029] In the description of the present invention, it should also be noted that, unless otherwise clearly specified and limited, the terms "setting", "layout", "installation", "connection", and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be a connection between the two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood in combination with the existing technology according to the specific circumstances. In addition, the embodiments of the present invention and the features in the embodiments can be combined with each other unless there is a conflict. And one or more of the components in the diagram may be necessary or non-essential, and the relative positional relationship between the components in the above diagram can be adjusted according to actual needs.

[0030] In order to prevent the mechanical hand internal fine particulate matter overflow pollution wafer, such as Figures 1 to 3 As shown in the utility model provides a kind of clamping type mechanical hand of preventing particulate matter pollution, its example includes: finger piece 1, telescopic device 2, palm box 3, double push rod assembly 4, wherein the finger piece 1 is connected at the front end of palm box 3, the first limiting portion 11 is equipped at the fingertip of finger piece 1, the travel port 31 is equipped on the two side walls of palm box 3, the telescopic device 2 example can be selected as slide table air cylinder, it is arranged in palm box 3, the linkage end of double push rod assembly 4 is arranged in palm box 3, and is connected with the telescopic end of telescopic device 2, to make double push rod assembly 4 be limited to the telescopic displacement of travel distance of travel port 31, adjust the clamping end of double push rod assembly 4, and the clamping distance of first limiting portion 11 of finger piece 1.

[0031] Specifically, as Figures 2 to 3 Shown in the preferred example, the double push rod assembly 4 includes: push rod frame 41, dust baffle 42, roller unit 43, wherein the travel window 411 is equipped on the frame body of push rod frame 41, and the rod arm 412 is equipped on the two sides of the front part of its frame body, through the setting, the part of frame body of push rod frame 41 can pass through travel port 31, be sleeved at the front wall of palm box 3 through travel window 411, and the rear part of push rod frame 41 frame body is arranged in palm box 3, and is connected with the telescopic end of telescopic device 2.

[0032] Such layout can make push rod frame 41 be pushed by telescopic device 2 to the travel port 31 on the two sides of palm box 3 and be telescopic, even if there is particulate matter dust in palm box 3, during the movement of push rod frame 41 pushed by telescopic device 2, only the overflow from the travel port 31 on the two sides of palm box 3, and will not be directly sprayed from the front to the wafer clamping position.

[0033] Meanwhile, it is worth mentioning that in addition to the overflow of particulate matter, the structure design of traditional middle push rod can also easily shake out its own lubricating grease and other dirt during the telescopic process of push rod, to contaminate the wafer, and in the structure of the mechanical hand of the example, since push rod frame 41 is stretched out from the travel port 31 on the two sides of palm box 3, it blocks the possibility of grease spraying from the front to the wafer.

[0034] In addition, in order to better block the overflow of particulate matter from travel port 31, in the example, dust baffle 42 is preferably arranged on the two sides of the frame body of push rod frame 41, so that during the telescopic process of push rod frame 41, it is always blocked at travel port 31, to close palm box 3 as much as possible to avoid the overflow of internal particulate matter, so that the mechanical hand can maintain better cleanliness, to prevent the wafer from being contaminated.

[0035] At the same time, in order to make push rod frame 41 better adapt to the first limiting portion 11 of finger piece 1 to clamp the wafer, improve the clamping stability, prevent the wafer from falling off, the roller unit 43 is arranged on the rod arm 412.

[0036] In an alternative embodiment, the roller unit 43 comprises an adapter block 431, a flange, and a roller, wherein the adapter block 431 is connected to the lever arm 412 at the tail end and is provided with a mandrel at the front end, the roller is sleeved on the mandrel, and the flange is connected to the top of the mandrel by bolts to limit the axial displacement of the roller. With this arrangement, when the roller contacts the wafer, it can automatically roll to adjust the relative position of the wafer edge and the pair of rollers, thereby forming a stable clamping of the wafer.

[0037] In addition, in another alternative embodiment, the roller unit 43 comprises an adapter block 431, an eccentric flange 432, and an eccentric wheel 433, wherein the adapter block 431 is connected to the lever arm 412 at the tail end and is provided with an eccentric mandrel 434 at the front end, the eccentric wheel 433 is sleeved on the eccentric mandrel 434, and the eccentric flange 432 is connected to the top of the eccentric mandrel 434 by bolts to limit the axial displacement of the eccentric wheel 433.

[0038] Specifically, during the teaching process, by rotating the eccentric mandrel 434, the front end of the eccentric wheel 433 can achieve a position change of ±0.2mm. By adjusting the eccentric angle of the eccentric mandrel 434, the position that fits the wafer is found. With this arrangement, the machining precision error and assembly error can be effectively eliminated, and the eccentric wheels 433 on both sides of the front end of the push rod holder 41 can simultaneously contact the wafer, achieving stable clamping during the handling process. At the same time, based on the adjustability of the eccentric wheel 433, the wafer clamping requirements under different working conditions can be effectively compatible.

[0039] In addition, the eccentric wheel 433 has a certain slope, and the force FN acting on the wafer along the slope of the eccentric wheel 433 in the vertical direction can be decomposed into a pushing force Fx in the clamping direction and a downward force Fy. Compared with the traditional roller, the eccentric wheel 433 can prevent the wafer from warping and sliding during clamping.

[0040] Further, in order to make the push rod holder 41 have a certain elastic retraction allowance during the forward extension process and avoid damaging the wafer, in an alternative embodiment, as shown in Figure 2 The double push rod assembly 4 further comprises an adapter 44, which is in the shape of a Chinese character "fang" (|), wherein the push rod holder 41 is connected to the extension end of the telescopic device 2 through the adapter 44. With this arrangement, when the push rod holder 41 encounters resistance during forward extension, the adapter 44 will elastically deform towards its opening under the resistance, allowing the push rod holder 41 to retract on one side and deflect towards one side of the wafer under the guidance of the roller unit 43, thereby deflecting the clamping force and avoiding further pressing the wafer from the front, which may cause damage to the wafer.

[0041] Further, in order to detect whether the wafer is clamped in place, in an optional embodiment, the clamping type mechanical hand for preventing particle pollution further comprises a sensing unit 5 and a trigger 6, wherein the sensing unit 5 is arranged in the palm box 3, and the trigger 6 is arranged on the adapter 44, so that when the telescopic device 2 drives the adapter 44 to move and the roller unit 43 is moved to a position, the trigger 6 triggers the sensing unit 5. In the example, the sensing unit 5 comprises a photoelectric sensor 51 and a fixing seat 52, the photoelectric sensor 51 is connected in the palm box 3 through the fixing seat 52, and the sensing end of the photoelectric sensor 51 is on the moving track of the trigger 6.

[0042] In addition, the relative position of the trigger 6 and the photoelectric sensor 51 can be adjusted according to the size of the wafer to be clamped. Through the above arrangement, when the telescopic device 2 pushes the roller unit 43 to clamp the wafer, the trigger 6 is driven to move, so as to trigger the photoelectric sensor 51, thereby detecting whether the roller unit 43 is in contact with the wafer, and judging whether the clamped wafer is a qualified size wafer.

[0043] On the other hand, in other optional embodiments, the trigger 6 can also be arranged on the push rod holder 41, and the sensing unit 5 is triggered by the trigger 6 when the telescopic device 2 drives the push rod holder 41 to move and the roller unit 43 is moved to a position.

[0044] Further, in order to facilitate the positioning of the wafer before the clamping end of the double push rod assembly 4 is in contact with the first limiting part 11 of the finger piece 1 to form clamping on the wafer, a second limiting part 12 is arranged at the root of the finger piece 1. Through the first and second limiting parts 11 and 12 on the finger piece 1, the position of the wafer can be preliminarily limited, so as to play a coarse positioning effect for the subsequent clamping process.

[0045] In summary, through the clamping type mechanical hand for preventing particle pollution, the double push rod assembly 4 is designed ingeniously, which can be displaced at the stroke opening 31 on both sides of the palm box 3 in combination with the telescopic device 2, and forms clamping cooperation with the finger piece 1, so as to prevent particles from overflowing from the front of the palm box 3 to directly contaminate the wafer. In addition, through the arrangement of the dust screen 42, the dust screen 42 can always block the stroke opening 31 during the telescopic movement of the push rod holder 41, so as to form a closed space for the palm box 3, and further prevent the particles in the palm box 3 from overflowing from the stroke opening 31, thereby improving the dust prevention effect of the mechanical hand and ensuring the cleanliness during the clamping process of the wafer.

[0046] The preferred embodiments disclosed above are only used to help describe the utility model. The preferred embodiments do not describe all the details and do not limit the utility model to the specific embodiments. Obviously, according to the content of the specification, many modifications and changes can be made. The specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the utility model, so that the persons skilled in the art can well understand and utilize the utility model. The utility model is limited by the claims and the entire scope and equivalents thereof, and any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the utility model should be included in the protection scope of the utility model.

[0047] In addition, various different embodiments of the utility model embodiments can also be combined arbitrarily, as long as they do not deviate from the idea of the utility model embodiments, and they should also be considered as disclosed by the utility model embodiments.

Claims

1. A clamping manipulator for preventing particle contamination, characterized in that Comprising: Finger member, telescopic device, palm box, double push rod assembly. The finger member is connected to the front end of the palm box. A first limiting portion is provided at the fingertip of the finger member. Stroke ports are provided on both side walls of the palm box. The telescopic device is arranged inside the palm box. The linkage end of the double push rod assembly is arranged inside the palm box and is connected to the telescopic end of the telescopic device, so that the double push rod assembly is displaced telescopically within the stroke distance limited by the stroke port, and the clamping distance between the clamping end of the double push rod assembly and the first limiting portion of the finger member is adjusted.

2. The clamping manipulator for preventing particle contamination according to claim 1 is characterized in that: The double push rod assembly includes: a push rod frame, a dust shield, and a roller unit. A stroke window is provided on the frame body of the push rod frame, and rod arms are provided on both sides of the front part of the frame body. A part of the frame body of the push rod frame passes through the stroke port and is sleeved on the front wall of the palm box through the stroke window, so that the rear part of the frame body of the push rod frame is placed inside the palm box and is connected to the telescopic end of the telescopic device. The dust shield is arranged on both sides of the frame body of the push rod frame and blocks at the stroke port. The roller unit is arranged on the rod arms.

3. The clamping manipulator for preventing particle contamination according to claim 2, characterized in that: The roller unit includes: an adapter block, a flange member, and a roller. The tail end of the adapter block is connected to the rod arm, and a core shaft is provided at the front end. The roller is sleeved on the core shaft, and the flange member is connected to the top of the core shaft through a bolt to limit the axial displacement of the roller.

4. The clamping manipulator for preventing particle contamination according to claim 2, characterized in that: The roller unit includes: an adapter block, an eccentric flange, and an eccentric wheel. The tail end of the adapter block is connected to the rod arm, and an eccentric core shaft is provided at the front end. The eccentric wheel is sleeved on the eccentric core shaft, and the eccentric flange is connected to the top of the eccentric core shaft through a bolt to limit the axial displacement of the eccentric wheel.

5. The clamping manipulator for preventing particle contamination according to claim 2, characterized in that: The double push rod assembly further includes: an adapter. The adapter is in a shape similar to a "匚". The push rod frame is connected to the telescopic end of the telescopic device through the adapter.

6. The clamping manipulator for preventing particle contamination according to claim 5, characterized in that: Further comprising: A sensing unit and a trigger member. The sensing unit is arranged inside the palm box, and the trigger member is arranged on the adapter. When the telescopic device controls the displacement of the adapter and drives the roller unit to move in place, the trigger member triggers the sensing unit.

7. The clamping manipulator for preventing particle contamination according to claim 2, characterized in that: Further comprising: A sensing unit and a trigger member. The sensing unit is arranged inside the palm box, and the trigger member is arranged on the push rod frame. When the telescopic device controls the displacement of the push rod frame and drives the roller unit to move in place, the trigger member triggers the sensing unit.

8. The clamping manipulator for preventing particle contamination according to claim 1, characterized in that: A second limiting portion is provided at the finger root of the finger member.

9. The clamping manipulator for preventing particle contamination according to any one of claims 6 to 7, characterized in that: The sensing unit includes: a photoelectric sensor and a fixing seat. The photoelectric sensor is connected inside the palm box through the fixing seat, and the sensing end of the photoelectric sensor is on the moving track of the trigger member.

10. The clamping manipulator for preventing particle contamination according to any one of claims 1 to 8, characterized in that: The telescopic device is a slide cylinder.

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