Conductive film for narrow bezel display

Abstract

The utility model discloses a conducting film for narrow bezel display, which comprises a base material layer, a low refractive index resin layer, a high refractive index resin layer and a conducting composite layer which are stacked in sequence, the conducting composite layer comprises an ITO layer and a metal copper layer arranged on one side of the ITO layer away from the high refractive index resin layer, the impedance of the ITO layer is 130-200 ohms, and the thickness of the metal copper layer is 1-10 micrometers. The absolute value of the difference value of the average reflectivity of the high-refractive-index resin layer and the ITO layer in the all-optical section is 0-0.5%, the refractive index of the low-refractive-index resin layer is 1.50-1.55, the thickness of the low-refractive-index resin layer is 500-700 nm, the refractive index of the high-refractive-index resin layer is 1.65-1.70, and the thickness of the high-refractive-index resin layer is 70-150 nm. According to the conducting film for narrow frame display, the low-refractive-index resin layer is coated on the surface of the base material layer, so that the selection range of the base material layer can be enlarged; the surface of the low-refractive-index resin layer is coated with the high-refractive-index resin layer, so that the effect that etching marks cannot be perceived at a short-distance visual angle can be achieved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to conductive film technical field, specifically about a kind of for narrow frame display's conductive film. BACKGROUND

[0002] ITO etching mark is in the processing of ITO (indium tin oxide) conductive film, uneven surface or visual mark caused by etching process.In the processing of ITO conductive film, it is usually necessary to form specific circuit pattern by etching process.If the formula of etching solution, etching time, temperature or other parameters are not properly controlled in this process, it may cause uneven etching on the surface of ITO conductive film, thus forming etching mark.Etching mark may be physical indentation, or visual color difference, which will affect the appearance and performance of the product, especially in high transparency applications, the existence of etching mark will reduce the optical performance of the product, affect its light transmittance and visual effect.

[0003] Therefore, how to minimize the impact of etching mark when viewing at close range is a problem that needs to be solved in conductive film.

[0004] The information disclosed in this background section is only intended to increase the understanding of the general background of the present utility model, and should not be regarded as acknowledging or implying in any form that the information constitutes prior art known to those skilled in the art. CONTENT OF THE UTILITY MODEL

[0005] The utility model aims to provide a kind of conductive film for narrow frame display, which can achieve the effect of imperceptible etching mark at close range viewing angle.

[0006] To achieve the above object, the utility model provides a kind of conductive film for narrow frame display, for narrow frame display's conductive film, it is characterized in that, including base material layer, low fold resin layer, high fold resin layer and conductive composite layer that are sequentially stacked, the conductive composite layer includes ITO layer and the metal copper layer on the side of ITO layer away from high fold resin layer, the impedance of ITO layer is 130-200Ω, the absolute value of the average reflectivity difference of high fold resin layer and ITO layer in full light section is 0-0.5%, the refractive index of low fold resin layer is 1.50-1.55, the thickness of low fold resin layer is 500-700nm, the refractive index of high fold resin layer is 1.65-1.70, the thickness of high fold resin layer is 70-150nm.

[0007] In one or more embodiments, the conductive film for narrow frame display further comprises an anti-blocking layer arranged on the substrate layer away from the low-refractive resin layer, the anti-blocking layer is an acrylic resin layer, the thickness of the anti-blocking layer is 800-1000 nm, and the refractive index of the anti-blocking layer is 1.50-1.55.

[0008] In one or more embodiments, the conductive film for narrow frame display further comprises an optical matching layer arranged between the high-refractive resin layer and the conductive composite layer, the optical matching layer is a silicon oxide layer, and the thickness of the optical matching layer is 8-12 nm.

[0009] In one or more embodiments, the thickness of the ITO layer is 18-25 nm.

[0010] In one or more embodiments, the thickness of the metal copper layer is 120-140 nm, and the impedance of the metal copper layer is 0.18-0.22 Ω.

[0011] In one or more embodiments, the conductive composite layer comprises a bonding layer arranged between the ITO layer and the metal copper layer.

[0012] In one or more embodiments, the bonding layer is a layer structure formed by one or more of aluminum oxide, titanium oxide and copper-nickel oxide, and the thickness of the bonding layer is 1-2 nm.

[0013] In one or more embodiments, a transition layer is arranged between the bonding layer and the metal copper layer, the transition layer is a copper-nickel alloy layer, and the thickness of the transition layer is 2-5 nm.

[0014] In one or more embodiments, an oxidation-resistant layer is arranged on the side of the metal copper layer away from the ITO layer, the oxidation-resistant layer is a copper-nickel alloy layer, and the thickness of the oxidation-resistant layer is 20-30 nm.

[0015] In one or more embodiments, the substrate layer is selected from one of a PET layer, a CPI layer, a PC layer, a TAC layer and a COP layer, and the thickness of the substrate layer is 25-200 μm.

[0016] Compared with the prior art, the conductive film for narrow frame display of the utility model, by arranging low-refractive resin layer, high-refractive resin layer and conductive composite layer on the substrate layer in sequence, and controlling the absolute value of the average reflectivity difference of the high-refractive resin layer and the ITO layer in the full light section to be 0-0.5%, the setting of the low-refractive resin layer makes the material selection range of the substrate layer wider, and is not limited to the traditional PET material, and the average reflectivity difference control of the high-refractive resin layer and the ITO layer can ensure that the conductive film for narrow frame display can also be ensured to be not easy to be detected under the near distance viewing angle. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0018] Figure 1 Schematic diagram of a conductive film for a narrow-frame display in one embodiment of the present invention;

[0019] Description of main reference numerals:

[0020] 1-substrate layer, 2-low-refractive resin layer, 3-high-refractive resin layer, 4-conductive composite layer, 41-ITO layer, 42-adhesive layer, 43-transition layer, 44-metal copper layer, 5-optical matching layer, 6-anti-adhesion layer, 7-anti-oxidation layer. DETAILED DESCRIPTION

[0021] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the following will be combined with the drawings of the embodiments of the present invention to clearly and completely describe the technical solutions of the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0022] like Figure 1 As shown, according to one embodiment of the present invention, a conductive film for a narrow-frame display includes a substrate layer 1, a low-refractive index resin layer 2, a high-refractive index resin layer 3, and a conductive composite layer 4 stacked in sequence. The conductive composite layer 4 includes an ITO layer 41 and a metal copper layer 44 disposed on a side of the ITO layer 41 facing away from the high-refractive index resin layer. The impedance of the ITO layer 41 is 130-200Ω, the refractive index of the low-refractive index resin layer is 1.50-1.55, and the thickness of the low-refractive index resin layer is 500-700nm. The refractive index of the high-refractive index resin layer is 1.65-1.70, and the thickness of the high-refractive index resin layer is 70-150nm. The absolute value of the difference in average reflectivity between the high-refractive index resin layer 3 and the ITO layer 41 in the full optical range is 0-0.5%.

[0023] It can be understood that the impedance of the ITO layer 41 is 130-200Ω, and since the thickness and impedance of the ITO layer 41 are inversely proportional, the smaller the impedance of the ITO layer 41, the greater the thickness of the ITO layer 41, and the deeper the etching mark thereon, and the more obvious the etching mark when observed at close range. Even if the technical means of the utility model is adopted, the etching mark can be perceived at close range. In addition, the impedance of the ITO layer 41 is 130-200Ω, which is mainly used in touch screens (small size screens) in electronic devices such as mobile phones, iPads, etc., so it is necessary to ensure that the etching mark is not easily perceived at close range. When the impedance of the ITO layer 41 is less than 130Ω, for example, the impedance of the ITO layer 41 is 50Ω, it is mainly used in electronic devices such as television screens (large size screens), and the distance between the user and the screen is far away. When the distance is far away, the ITO layer 41 is naturally not observed, and the technical means of the utility model is not needed.

[0024] The cooperation of the ITO layer 41 and the copper layer 44 is used to realize the narrow frame performance of the conductive film, that is, the blackened area of the outer periphery of the conductive film is narrow.

[0025] It should be noted that in a conventional ITO conductive film, the absolute value of the difference between the reflectivity of the substrate layer and the reflectivity of the ITO layer is large, which can cause the etching mark to be perceived when observed at close range, affecting the use experience. The utility model sets a high-refractive resin layer 3 on the substrate layer 1, and the absolute value of the average reflectivity difference between the high-refractive resin layer 3 and the ITO layer 41 in the full light segment is 0-0.5%, so that the reflectivity of the high-refractive resin layer 3 and the ITO layer 41 is similar, ensuring that the etching mark is not easily perceived at close range, that is, the high-refractive resin layer 3 plays a role in eliminating shadows; at the same time, the high-refractive resin layer 3 also plays a role in improving the adhesion of the conductive composite layer 4.

[0026] When using the high-refractive resin layer 3, the substrate layer 1 can only choose a specific PET film, which causes the substrate layer 1 to be unable to use other materials. The low-refractive resin layer 2 arranged between the high-refractive resin layer 3 and the substrate layer 1 can make the material selection of the substrate layer 1 not limited to a specific PET film, but also other materials such as the substrate layer 1. For example, the substrate layer 1 can be selected from one of PET (polyethylene terephthalate) film, CPI (colorless polyimide) film, PC (polycarbonate) film, TAC (triacetyl cellulose) film, COP (cyclo olefin polymer) film. Specifically, the thickness of the substrate layer 1 can be 25-200μm. In addition, the low-refractive resin layer 2 can also play a role as a hardening layer, that is, to improve the strength of the entire conductive film.

[0027] Specifically, the raw material of the low-refractive resin layer 2 is a conventional acrylic resin coating liquid. The strength of the conductive film is ensured. In order to further strengthen the hardening effect of the low-refractive resin layer 2, the material of the low-refractant resin layer 2 includes nanoparticles. The nanoparticles are selected from one of silicon oxide, aluminum oxide, magnesium silicate, aluminum silicate, calcium carbonate, and magnesium carbonate. Specifically, the raw material of the low-refractive resin layer 2 is the GOROKUWA CHEMICAL CHT-X1 coating liquid.

[0028] Specifically, the raw material of the high-refractive resin layer 3 is a conventional acrylic resin coating liquid. The high-refractive resin layer 3 can be doped with zirconium oxide nanoparticles, and the doping ratio is 30-40% wt, which is used to increase the refractive index of the high-refractive resin layer 3. It can be understood that the high-refractive resin layer 3 can also be doped with other nanoparticles, and the doping ratio can also be other values, as long as it can increase the refractive index of the high-refractive resin layer 3. Specifically, the raw material of the high-refractive resin layer 3 is the TOYO INK TYZ68-A01-CN and TYZ60-A01-CN coating liquid.

[0029] Specifically, the ITO layer 41 is an indium tin oxide layer, which is a mixture of indium oxide and tin oxide, and the mass ratio of indium oxide to tin oxide is 90:10-95:5. The thickness of the ITO layer 41 is 18-25 nm. Preferably, the mass ratio of indium oxide to tin oxide is 93:7.

[0030] Specifically, the thickness of the copper metal layer 44 is 120-140 nm, and the resistance of the copper metal layer 44 is 0.18-0.22 Ω.

[0031] Further, the conductive film further comprises an anti-adhesion layer 6, which is arranged on the side of the substrate layer 1 away from the low-refractive resin layer 2. The refractive index of the anti-adhesion layer 6 is 1.50-1.55. The thickness of the anti-adhesion layer 6 is 800-1000 nm, which plays a role in preventing adhesion and facilitates the winding of the entire conductive film. Specifically, the main raw material of the anti-adhesion layer 6 can be an acrylic resin, silica particles, and an anti-adhesion particle composed of a coating liquid, such as DIC PC15-5311 coating liquid. The anti-adhesion layer 6 can be coated with other common anti-adhesion coating liquids on the market.

[0032] Further, the conductive film further comprises an optical matching layer 5, which is arranged between the high-refractive resin layer 3 and the conductive composite layer 4. The optical matching layer 5 is a silica layer, i.e. the material of this layer is silica. In order to improve the light transmittance of the conductive film for narrow frame display, the thickness of the optical matching layer 5 is 8-12 nm.

[0033] Further, the conductive composite layer 4 includes a bonding layer 42 arranged between the ITO layer 41 and the copper metal layer 44. The bonding layer 42 plays a role in bonding the ITO layer 41 and the copper metal layer 44.

[0034] Preferably, the bonding layer 42 is a layer structure formed by one or more of aluminum oxide, titanium oxide, and copper nickel oxide, and the thickness of the bonding layer 42 is 1-2 nm.

[0035] like Figure 1 As shown, a transition layer is provided between the bonding layer and the metal copper layer. The transition layer 43 is a copper-nickel alloy layer. The mass ratio of copper to nickel in the transition layer 43 is 70:30-80:20. The thickness of the transition layer 43 is 2-5 nm to reduce the reflection of the metal copper layer 44.

[0036] Furthermore, an anti-oxidation layer 7 is provided on the side of the metallic copper layer 44 facing away from the ITO layer 41. The anti-oxidation layer 7 is provided on the side of the metallic copper layer 44 facing away from the transition layer 43. The anti-oxidation layer 7 is a copper-nickel alloy layer having a copper-nickel mass ratio of 70:30-80:20 and a thickness of 20-30 nm, and is used to enhance the ring test resistance of the conductive film.

[0037] In the following embodiments and comparative examples, the low-refractive resin layer 2 is Arakawa Chemical CHT-X1, the high-refractive resin layer 3 is Toyo Ink TYZ68-A01-CN, and the anti-adhesion layer 6 is DIC Corporation PC15-5311; the conductive film impedance is 140 ohms as an example.

[0038] Example 1

[0039] Prepare as Figure 1 The conductive film shown for narrow-frame display is as follows, wherein the substrate layer 1 is a PET film with a thickness of 125 μm; the low-refractive index resin layer 2 has a refractive index of 1.52 and a thickness of 600 nm; the high-refractive index resin layer 3 has a refractive index of 1.68 and a thickness of 120 nm; the anti-adhesion layer 6 has a refractive index of 1.52 and a thickness of 900 nm; the optical matching layer 5 is a silicon dioxide layer with a thickness of 10 nm; the ITO layer 41 is an indium tin oxide layer with a mass ratio of indium oxide to tin oxide of 93:7 and a thickness of 20 nm; the bonding layer 42 is an aluminum oxide layer with a thickness of 1 nm; the transition layer 43 is a copper-nickel alloy layer with a copper-nickel ratio of 70:30 and a thickness of 4 nm; the metal copper layer 44 is copper with a thickness of 120 nm; and the anti-oxidation layer 7 is a copper-nickel alloy layer with a copper-nickel ratio of 70:30 and a thickness of 25 nm.

[0040] Example 2

[0041] Prepare as Figure 1The conductive film shown is for narrow-frame display, wherein the substrate layer 1 is a TAC film with a thickness of 60 μm; the low-refractive index resin layer 2 has a refractive index of 1.50 and a thickness of 500 nm; the high-refractive index resin layer 3 has a refractive index of 1.70 and a thickness of 150 nm; the anti-adhesion layer 6 has a refractive index of 1.50 and a thickness of 800 nm; the optical matching layer 5 is a silicon dioxide layer with a thickness of 8 nm; the ITO layer 41 is an indium tin oxide layer with a mass ratio of indium oxide to tin oxide of 93:7 and a thickness of 18 nm; the bonding layer 42 is an aluminum oxide layer with a thickness of 2 nm; the transition layer 43 is a copper-nickel alloy layer with a copper-nickel ratio of 80:20 and a thickness of 2 nm; the metal copper layer 44 is copper with a thickness of 140 nm; and the anti-oxidation layer 7 is a copper-nickel alloy layer with a copper-nickel ratio of 80:20 and a thickness of 20 nm.

[0042] Example 3

[0043] Prepare as Figure 1 The conductive film shown for narrow-frame display is as follows, wherein the substrate layer 1 is a PET film with a thickness of 125 μm; the low-refractive index resin layer 2 has a refractive index of 1.55 and a thickness of 700 nm; the high-refractive index resin layer 3 has a refractive index of 1.65 and a thickness of 70 nm; the anti-adhesion layer 6 has a refractive index of 1.55 and a thickness of 1000 nm; the optical matching layer 5 is a silicon dioxide layer with a thickness of 12 nm; the ITO layer 41 is an indium tin oxide layer with a mass ratio of indium oxide to tin oxide of 93:7 and a thickness of 25 nm; the bonding layer 42 is an aluminum oxide layer with a thickness of 1 nm; the transition layer 43 is a copper-nickel alloy layer with a copper-nickel ratio of 70:30 and a thickness of 5 nm; the metal copper layer 44 is copper with a thickness of 140 nm; and the anti-oxidation layer 7 is a copper-nickel alloy layer with a copper-nickel ratio of 70:30 and a thickness of 30 nm.

[0044] Comparative Example 1

[0045] The only difference between this comparative example and Example 1 is that there is no high-refractive resin layer 3 in the conductive film.

[0046] Comparative Example 2

[0047] The only difference between this comparative example and Example 1 is that there is no adhesive layer 42 .

[0048] Comparative Example 3

[0049] The only difference between this comparative example and Example 1 is that there is no anti-oxidation layer 7 .

[0050] Comparative Example 4:

[0051] It is basically the same as Example 1, the only difference being that the thickness of the ITO layer 41 in the conductive film is 45 nm.

[0052] Comparative Example 5:

[0053] The difference between the present comparative example and example 1 is that the conductive composite layer 4 only contains an ITO layer, without the metal copper layer 44, without the adhesive interlayer 42, without the transition layer 43, and without the oxidation-resistant layer 7.

[0054] The conductive films of examples 1-3 and comparative examples 1-5 were subjected to the following performance tests:

[0055] (1) ITO impedance: 4-probe tester was used to test according to standard ASTM D991

[0056] (2) ITO etching mark observation test: naked eye observation to see if the etching mark can be observed, and the observation is not good.

[0057] (3) Metal adhesion test: dry grid test, referring to ASTM D3359 test standard.

[0058] (4) Cycle resistance performance test: high temperature and high humidity test, conditions: 85℃ / 85%RH, placed for 240h, and tested after standing for 2h after taking out.

[0059] Table 1: Test data of ITO impedance, ITO etching mark, narrow frame, metal adhesion, and cycle resistance of examples 1-3 and comparative examples 1-5.

[0060] ITO impedance ITO etch marks Narrow bezel Metal adhesion Cyclic resistance performance Example 1 140 ohms Good Suitable 5B Good Example 2 140 ohms Good Suitable 5B Good Example 3 140 ohms Good Suitable 5B Good Comparative Example 1 140 ohms Poor Suitable 0B Poor Comparative Example 2 140 ohms Good Suitable 0B Poor Comparative Example 3 140 ohms Good Suitable 5B Poor Comparative Example 4 50 ohms Poor Suitable 5B Good Comparative Example 5 140 ohms Good Not suitable 5B Good

[0061] Data analysis:

[0062] From the above test data, it can be seen that:

[0063] Examples 1-3 are the protection scheme of the present application, which is suitable for narrow frame display scheme, and has good adhesion and cycle resistance performance, and the ITO etching mark is good, that is, the etching mark cannot be observed.

[0064] Comparative example 1 lacks a high-refractive resin layer 3, which cannot achieve optical shadowing effect with the low-refractive resin layer 2, and the etching mark is obvious, and the effect is poor.

[0065] Comparative example 2 lacks an adhesive layer 42, which leads to poor adhesion between the metal copper layer 44 and the ITO layer 41, and poor cycle resistance performance.

[0066] Comparative example 3 lacks an oxidation-resistant layer 7, which leads to poor cycle resistance performance.

[0067] Comparative example 4 has a relatively thick ITO layer 41, which leads to an impedance of only 50 ohms, and the etching mark is relatively obvious.

[0068] Comparative example 5 does not have a metal copper layer 44, and therefore cannot be used for narrow frame display.

[0069] Wherein, if the ITO etching mark test data is poor, the obvious etching mark can be perceived when observed at close range; if the ITO etching mark test data is good, the etching mark is not easy to be perceived when observed at close range.

[0070] In summary, the conductive film for narrow frame display of the utility model is provided with low-refractive resin layer 2 and high-refractive resin layer 3 on one side of substrate layer 1, and the refractive index of low-refractive resin layer 2 and high-refractive resin layer 3 is controlled, so that the substrate selection range of the conductive film for narrow frame display is increased and the etching mark cannot be perceived when observed at close range, thereby providing better viewing experience for users.

[0071] It is obvious for those skilled in the art that the utility model is not limited to the details of the above-mentioned exemplary embodiments, and the utility model can be realized in other specific forms without departing from the spirit or basic characteristics of the utility model. Therefore, the embodiments should be regarded as exemplary and non-restrictive from any point of view, and the scope of the utility model is defined by the appended claims rather than the above description, and all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the utility model. Any figure mark in the claims should not be regarded as limiting the involved claims.

[0072] In addition, it should be understood that, although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, and those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be properly combined to form other embodiments that those skilled in the art can understand.

Claims

1. A conductive film for narrow-frame display, characterized in that: The invention comprises a substrate layer, a low-refractive index resin layer, a high-refractive index resin layer and a conductive composite layer stacked in sequence, wherein the conductive composite layer comprises an ITO layer and a metal copper layer arranged on the side of the ITO layer facing away from the high-refractive index resin layer. The impedance of the ITO layer is 130-200Ω, the absolute value of the difference in average reflectivity between the high-refractive index resin layer and the ITO layer in the full optical range is 0-0.5%, the refractive index of the low-refractive index resin layer is 1.50-1.55, the thickness of the low-refractive index resin layer is 500-700nm, the refractive index of the high-refractive index resin layer is 1.65-1.70, and the thickness of the high-refractive index resin layer is 70-150nm.

2. The conductive film for narrow-frame display according to claim 1, wherein: The conductive film for narrow-frame display further includes an anti-adhesion layer provided on the side of the substrate layer away from the low-refractive resin layer. The anti-adhesion layer is an acrylic resin layer. The thickness of the anti-adhesion layer is 800-1000 nm, and the refractive index of the anti-adhesion layer is 1.50-1.

55.

3. The conductive film for narrow-frame display according to claim 1, wherein: The conductive film for narrow-frame display further includes an optical matching layer disposed between the high-refractive resin layer and the conductive composite layer. The optical matching layer is a silicon oxide layer, and the thickness of the optical matching layer is 8-12 nm.

4. The conductive film for narrow-frame display according to claim 1, wherein: The thickness of the ITO layer is 18-25 nm.

5. The conductive film for narrow-frame display according to claim 1, wherein: The thickness of the metal copper layer is 120-140 nm, and the impedance of the metal copper layer is 0.18-0.22 Ω.

6. The conductive film for narrow-frame display according to claim 1, wherein: The conductive composite layer includes a bonding layer arranged between the ITO layer and the metal copper layer.

7. The conductive film for narrow-frame display according to claim 6, wherein: The bonding layer is a layer structure formed by one or more of aluminum oxide, titanium oxide and copper nickel oxide, and the thickness of the bonding layer is 1-2 nm.

8. The conductive film for narrow-frame display according to claim 6, wherein: A transition layer is provided between the bonding layer and the metal copper layer. The transition layer is a copper-nickel alloy layer, and the thickness of the transition layer is 2-5 nm.

9. The conductive film for narrow-frame display according to claim 1, wherein: An anti-oxidation layer is provided on the side of the metal copper layer away from the ITO layer. The anti-oxidation layer is a copper-nickel alloy layer and has a thickness of 20-30 nm.

10. The conductive film for narrow-frame display according to claim 1, wherein: The substrate layer is selected from one of a PET layer, a CPI layer, a PC layer, a TAC layer, and a COP layer, and the thickness of the substrate layer is 25-200 μm.

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