Silicon wafer drying equipment for texturing machine

Through the coordinated design of the drying mechanism and the fixing mechanism, the problem of uneven drying of silicon wafers is solved, comprehensive and uniform drying of silicon wafers is achieved, and the drying efficiency and quality are improved.

CN223452343UActive Publication Date: 2025-10-17SHANDONG RUITAI ZHICHUANG OPTOELECTRONICS TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202422843412.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-21
Publication Date
2025-10-17
Estimated Expiration
2034-11-21

AI Technical Summary

Technical Problem

When drying silicon wafers, existing drying devices easily cause some areas to not be completely dried, affecting the quality of subsequent processing. In addition, the drying range is limited, making it difficult to fully air-dry the edges of the silicon wafers, reducing the overall drying efficiency.

Method used

The drying mechanism uses the synergistic effect of the fan, electric telescopic rod, curved frame, reciprocating threaded rod and other components to achieve comprehensive air drying of the silicon wafers; the fixing mechanism ensures the stable position of the silicon wafers through components such as the extrusion frame, clamping frame, and rollers, and the combination of the wedge block and the wedge groove ensures the stability and accuracy of the fan movement.

Benefits of technology

It achieves full drying of all parts of the silicon wafer, avoids the problem of uneven drying, improves the drying efficiency and range, and ensures efficient and uniform drying of the silicon wafer during the texturing process.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses silicon wafer drying equipment for a texturing machine, which relates to the technical field of texturing machines, and is technically characterized by comprising a drying box and four supporting legs fixedly arranged on the bottom surface of the drying box, and a drying mechanism and a fixing mechanism are arranged in the drying box; the silicon wafer drying device has the technical effects that a fan in the drying mechanism can do semi-circumferential reciprocating motion under the synergistic effect of a motor, a reciprocating threaded rod, a sliding sleeve, a telescopic rod and an arc-shaped frame, silicon wafers at the front end and the rear end of the inner side of a placement basket are comprehensively air-dried, and the problem of uneven drying is avoided; and all parts of the silicon wafer can be fully dried. And on the other hand, the electric telescopic rod drives the connecting frame and the fan to reciprocate left and right, the air drying range is further expanded, and the drying efficiency is improved. And meanwhile, the wedge-shaped block is matched with the wedge-shaped groove, and the control block is guided by the guide rail, so that the moving stability and accuracy of the fan are ensured.
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Description

TECHNICAL FIELD

[0001] The utility model relates to the technology field of the suede machine, specifically is a kind of silicon wafer drying equipment for suede machine. BACKGROUND

[0002] When producing solar cell, texturing is a very important process, the purpose of texturing is to eliminate the surface organic contamination and metal impurities on the surface of silicon wafer, remove the mechanical damage layer on the surface of silicon wafer, form surface texture on the surface of silicon wafer, i.e. form pyramid for single crystal and form pit for polycrystal, increase the absorption of sunlight and reduce reflection, the surface is not only made into pyramid or etched pit, but also an effective means to improve surface state, if the surface is not well made, surface state is difficult to compensate, dangling bond is greatly increased, and minority carrier lifetime is seriously combined, which greatly affects Uoc and Isc;

[0003] And in the process of texturing, the silicon wafer to be textured is placed in the carrier basket, and then placed in the multiple texturing grooves of the texturing machine for texturing, after the silicon wafer is textured in the texturing groove, the surface will have a lot of water, which needs to be placed in the drying groove of the drying equipment in the texturing machine by the mechanical hand, and after drying, the next process can be carried out, and a drying device is needed during drying.

[0004] The existing drying device can not completely dry some areas when drying the silicon wafer, which affects the quality of subsequent processing, and the limited drying range makes it difficult to fully dry the edge of the silicon wafer, which reduces the overall drying efficiency, therefore, a silicon wafer drying equipment for suede machine is proposed. UTILITY MODEL CONTENT

[0005] TECHNICAL SCHEME

[0006] To achieve the above purpose, the utility model provides the following technical scheme: a silicon wafer drying equipment for suede machine, including drying box and four supporting legs fixedly arranged on the bottom surface of the drying box, the drying box is internally provided with drying mechanism and fixing mechanism;

[0007] The fixing mechanism is located below the drying mechanism.

[0008] The drying mechanism includes drying part and moving part.

[0009] The drying part includes arc-shaped frame and fan, and the moving part includes electric telescopic rod and control frame.

[0010] Two moving blocks are slidably arranged on the front and rear end faces of the inside of the drying box, the top faces of the two moving blocks are fixedly connected with the bottom faces of the arc-shaped frames, the arc faces of the arc-shaped frames are provided with arc-shaped grooves, the inner walls of the arc-shaped grooves are slidably provided with sliding blocks, the bottom faces of the sliding blocks are fixedly provided with mounting frames, the bottom faces of the mounting frames are fixedly connected with the bottom face of the fan, the top faces of the two moving blocks are fixedly provided with connecting frames, the top faces of the connecting frames are provided with sliding grooves, the inner walls of the sliding grooves are slidably provided with sliding sleeves, the inner faces of the sliding sleeves are slidably provided with telescopic rods, and the bottom faces of the telescopic rods are hingedly connected with the top faces of the sliding blocks.

[0011] Preferably, the fixing mechanism comprises two extrusion frames, the two extrusion frames are slidably arranged on the side faces close to each other and extend to the inside of the drying box through the front and rear end faces of the drying box, two clamping frames are fixedly arranged on the side faces close to each other of the two extrusion frames, two groups of rollers are rotatably arranged on the inner faces of the two clamping frames through two groups of bearing seats, and the left side face of the drying box is provided with an inlet and outlet.

[0012] Preferably, the front face of the electric telescopic rod is fixedly connected with the back face of the drying box, the left side face of the output end of the electric telescopic rod is fixedly connected with the left end face of the inner face of the control frame, and the front face of the control frame is fixedly connected with the back face of the connecting frame.

[0013] Preferably, the front face of the connecting frame is fixedly provided with a mounting plate, the back face of the mounting plate is fixedly provided with a motor, the back face of the output end of the motor is fixedly provided with a reciprocating threaded rod, the surface of the reciprocating threaded rod is threadedly provided with a control block, and the left side face of the control block is fixedly connected with the right side face of the sliding sleeve.

[0014] Preferably, the top face of the connecting frame is fixedly provided with a guide rail, the top face of the inner face of the control block is provided with a connecting groove, and the surface of the guide rail is slidably connected with the inner wall of the connecting groove.

[0015] Preferably, the front and rear end faces of the inside of the drying box are respectively provided with two wedge-shaped grooves, the side faces away from each other of the two moving blocks are respectively fixedly provided with two wedge-shaped blocks, the surfaces of the two wedge-shaped blocks are respectively slidably connected with the inner walls of the two wedge-shaped grooves, and the bottom face of the drying box is fixedly provided with a drain pipe extending to the inside of the drying box.

[0016] Preferably, the inner faces of the two extrusion frames are respectively fixedly provided with two groups of dampers and two groups of springs, the side faces close to each other of the two groups of dampers and the two groups of springs are respectively fixedly connected with the front and rear end faces of the drying box, and the front and rear end faces of the inside of the drying box are respectively fixedly provided with two supporting plates. Advantages

[0017] Compared with the prior art, the silicon wafer drying equipment for the wool making machine has the following advantages:

[0018] 1. The fan in the drying mechanism, driven by the coordinated action of the motor, reciprocating threaded rod, sliding sleeve, telescopic rod, and curved frame, moves in a semicircular motion, fully drying the silicon wafers placed at the front and rear ends of the basket. This prevents uneven drying and ensures that all parts of the wafer are fully dried. Furthermore, the motorized telescopic rod drives the connecting frame and fan in a reciprocating left and right motion, further expanding the drying range and improving drying efficiency. Furthermore, the coordination of the wedge block and wedge slot, and the guidance of the control block by the guide rail, ensure the stability and accuracy of the fan's movement, providing a strong guarantee for efficient and uniform drying.

[0019] 2. The fixing mechanism consists of two extrusion racks, a clamping frame, rollers, dampers, and springs. When a basket containing silicon wafers is placed through the inlet and outlet ports and into the drying oven, two sets of springs and dampers force the two extrusion racks toward each other, driving the clamping frame to move synchronously. This causes the surfaces of the two rollers to press against the front and rear ends of the basket, clamping the basket securely. Additionally, two support plates support the bottom of the basket, ensuring the wafers' stable position during the drying process. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a three-dimensional schematic diagram of the left side of the utility model;

[0021] Figure 2 This is a top-down perspective diagram of the present invention;

[0022] Figure 3 It is a partially cutaway perspective diagram of the left side of the present invention;

[0023] Figure 4 This is a three-dimensional schematic diagram of the rear side of the utility model;

[0024] Figure 5 For this utility model Figure 3 Enlarged three-dimensional schematic diagram of area A in the middle.

[0025] In the figure: 1. Drying box; 2. Drying mechanism; 21. Connecting frame; 22. Arc frame; 23. Guide rail; 24. Reciprocating threaded rod; 25. Control block; 26. Motor; 27. Mounting plate; 28. Drain pipe; 29. ​​Fan; 210. Mounting frame; 211. Sliding sleeve; 212. Sliding block; 213. Moving block; 214. Telescopic rod; 215. Electric telescopic rod; 216. Control frame; 217. Wedge block; 3. Fixing mechanism; 31. Clamping frame; 32. Roller; 33. Extrusion frame; 34. Damper; 35. Spring; 36. Support plate; 4. Support leg. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention. Example 1

[0027] like Figures 1-5 As shown, this embodiment proposes a drying box 1 and four supporting legs 4 fixedly arranged on the bottom surface of the drying box 1, and a drying mechanism 2 and a fixing mechanism 3 are arranged inside the drying box;

[0028] The fixing mechanism 3 is located below the drying mechanism 2;

[0029] The drying mechanism 2 includes a drying part and a moving part;

[0030] The drying section includes an arc frame 22 and a fan 29, and the moving section includes an electric telescopic rod 215 and a control frame 216;

[0031] Two moving blocks 213 are respectively slidably provided on the front and rear end surfaces inside the drying box 1. The top surfaces of the two moving blocks 213 are respectively fixedly connected to the bottom surfaces of the arc frame 22. The arc frame 22 arc surface is provided with an arc groove, and the inner wall of the arc groove is slidably provided with a sliding block 212. The bottom surface of the sliding block 212 is fixedly provided with a mounting frame 210. The bottom surface of the mounting frame 210 is fixedly connected to the bottom surface of the fan 29. The top surfaces of the two moving blocks 213 are fixedly provided with a connecting frame 21. The top surface of the connecting frame 21 is provided with a slide groove, and a sliding sleeve 211 is slidably provided on the inner wall of the slide groove. A telescopic rod 214 is slidably provided on the inner side of the sliding sleeve 211. The bottom surface of the telescopic rod 214 is hinged to the top surface of the sliding block 212. The front surface of the electric telescopic rod 215 is fixedly connected to the back surface of the drying box 1. The left side of the output end of the electric telescopic rod 215 is fixedly connected to the inner left end surface of the control frame 216. The front of the system frame 216 is fixedly connected to the back of the connecting frame 21, and a mounting plate 27 is fixedly provided on the front of the connecting frame 21. A motor 26 is fixedly provided on the back of the mounting plate 27. A reciprocating threaded rod 24 is fixedly provided on the back of the output end of the motor 26. A control block 25 is provided on the surface of the reciprocating threaded rod 24. The left side of the control block 25 is fixedly connected to the right side of the sliding sleeve 211. A guide rail 23 is fixedly provided on the top surface of the connecting frame 21, and a connecting groove is provided on the inner top surface of the control block 25. The surface of the guide rail 23 is slidably connected to the inner wall of the connecting groove. Two wedge-shaped grooves are respectively provided on the front and rear end surfaces of the inner side of the drying box 1. Two wedge blocks 217 are respectively fixedly provided on the far side of the two moving blocks 213. The surfaces of the two wedge blocks 217 are respectively slidably connected to the inner walls of the two wedge grooves. A drainage pipe 28 is fixedly provided on the bottom surface of the drying box 1 and extends to the inside of the drying box 1.

[0032] In this embodiment, the fan 29 in the drying mechanism 2, driven by the coordinated action of the motor 26, reciprocating threaded rod 24, sliding sleeve 211, telescopic rod 214, and curved frame 22, is capable of semicircular reciprocating motion, comprehensively drying the silicon wafers placed at the front and rear ends of the flower basket, avoiding uneven drying and ensuring that all parts of the wafers are fully dried. Furthermore, the electric telescopic rod 215 drives the connecting frame 21 and fan 29 in reciprocating left and right motion, further expanding the drying range and improving drying efficiency. Furthermore, the coordination of the wedge block 217 with the wedge slot, and the guidance of the control block 25 by the guide rail 23, ensure the stability and accuracy of the fan 29's movement, effectively ensuring efficient and uniform drying. Example 2

[0033] like Figures 1-5 As shown, based on the same concept as the above-mentioned embodiment 1, this embodiment further proposes that the fixing mechanism 3 includes two extrusion racks 33, and the adjacent side surfaces of the two extrusion racks 33 slide through the front and rear end surfaces of the drying box 1 and extend into the interior of the drying box 1. Two clamping frames 31 are fixedly provided on the adjacent side surfaces of the two extrusion racks 33, and two groups of rollers 32 are rotatably provided on the inner sides of the two clamping frames 31 through two groups of bearing seats. A feed and discharge port is opened through the left side of the drying box 1, and two groups of dampers 34 and two groups of springs 35 are fixedly provided on the inner sides of the two extrusion racks 33. The adjacent side surfaces of the two groups of dampers 34 and the two groups of springs 35 are fixedly connected to the front and rear end surfaces of the drying box 1, and two support plates 36 are fixedly provided on the front and rear end surfaces inside the drying box 1.

[0034] In this embodiment, the fixing mechanism 3 comprises two extrusion racks 33, a clamping frame 31, rollers 32, dampers 34, and springs 35. When a placement basket containing silicon wafers is placed through the inlet and outlet ports into the drying oven 1, two sets of springs 35 and two sets of dampers 34 force the two extrusion racks 33 toward each other, driving the clamping frame 31 to move synchronously. This causes the surfaces of the two sets of rollers 32 to press against the front and rear ends of the placement basket, clamping and securing the basket. Furthermore, two support plates 36 support the bottom of the placement basket, ensuring the stable position of the silicon wafers during the drying process.

[0035] During use, the flower basket containing the silicon wafers is placed through the inlet and outlet ports and placed inside the drying box 1. During placement, two sets of springs 35 and two sets of dampers 34 are provided to allow the two extrusion racks 33 to approach each other on one side. When the two extrusion racks 33 approach each other, the two clamping frames 31 can be driven to move synchronously. When the two clamping frames 31 approach each other, the surfaces of the two sets of rollers 32 can be respectively pressed against the front and rear ends of the flower basket. After placement, the flower basket can be clamped and fixed. Two supporting plates 36 are provided to support the bottom of the flower basket.

[0036] After the placement is completed, the fan 29 is started, and the silicon wafer placed in the flower basket can be dried after the fan 29 is started. The motor 26 is started during the drying process, and the reciprocating screw rod 24 can be rotated when the output end of the motor 26 rotates. The sliding sleeve 211 can be moved back and forth by the control block 25 when the reciprocating screw rod 24 rotates. The telescopic rod 214 can be moved synchronously when the sliding sleeve 211 moves back and forth. The telescopic rod 214 can slide up and down in the inner wall of the sliding sleeve 211, and the sliding block 212 and the fan 29 can be moved back and forth in a semicircle by the limitation of the arc-shaped frame 22. The front and rear ends of the flower basket can be blown, and the silicon wafer placed in the front and rear ends of the flower basket can be dried. The electric telescopic rod 215 is started during the drying process, and the connecting frame 21 can be moved back and forth by the control frame 216 when the output end of the electric telescopic rod 215 is telescoped. The connecting frame 21 can move the fan 29 synchronously when the connecting frame 21 moves. The drying range of the fan 29 can be expanded when the fan 29 moves back and forth. The water dropped from the flower basket can be discharged through the drain pipe 28.

[0037] After the drying is completed, the flower basket can be taken out by manually pulling it to the left.

[0038] The above is only a specific embodiment of the present application, but the technical features of the present application are not limited thereto. Any simple change, equivalent replacement or modification made on the basis of the present application to solve the same technical problem and achieve the same technical effect is also covered by the protection scope of the present application.

Claims

1. A silicon wafer drying device for a texturing machine, comprising a drying box (1) and four supporting legs (4) fixedly arranged on the bottom surface of the drying box (1), characterized in that: A drying mechanism (2) and a fixing mechanism (3) are provided inside the drying box; The fixing mechanism (3) is located below the drying mechanism (2); The drying mechanism (2) comprises a drying part and a moving part; The drying section includes an arc frame (22) and a fan (29), and the moving section includes an electric telescopic rod (215) and a control frame (216); Two moving blocks (213) are slidably provided on the front and rear end surfaces of the inner side of the drying box (1), and the top surfaces of the two moving blocks (213) are fixedly connected to the bottom surface of the arc frame (22). The arc frame (22) is provided with an arc groove through the arc surface, and a sliding block (212) is slidably provided on the inner wall of the arc groove. The bottom surface of the sliding block (212) is fixedly provided with a mounting frame (210), and the bottom surface of the mounting frame (210) is fixedly connected to the bottom surface of the fan (29). The top surfaces of the two moving blocks (213) are fixedly provided with a connecting frame (21), and the top surface of the connecting frame (21) is provided with a sliding groove through the top surface, and a sliding sleeve (211) is slidably provided on the inner wall of the sliding groove. A telescopic rod (214) is slidably provided on the inner side surface of the sliding sleeve (211), and the bottom surface of the telescopic rod (214) is hinged to the top surface of the sliding block (212).

2. The silicon wafer drying device for a texturing machine according to claim 1, characterized in that: The fixing mechanism (3) includes two extrusion racks (33), and the adjacent side surfaces of the two extrusion racks (33) slide through the front and rear end surfaces of the drying box (1) and extend into the interior of the drying box (1). The adjacent side surfaces of the two extrusion racks (33) are respectively fixed with two clamping frames (31), and the inner sides of the two clamping frames (31) are respectively provided with two groups of rollers (32) that are rotatably provided through two groups of bearing seats. The left side surface of the drying box (1) is penetrated by a material inlet and outlet.

3. The silicon wafer drying device for a texturing machine according to claim 1, characterized in that: The front of the electric telescopic rod (215) is fixedly connected to the back of the drying box (1), the left side of the output end of the electric telescopic rod (215) is fixedly connected to the inner left end face of the control frame (216), and the front of the control frame (216) is fixedly connected to the back of the connecting frame (21).

4. The silicon wafer drying device for a texturing machine according to claim 1, characterized in that: A mounting plate (27) is fixedly provided on the front of the connecting frame (21), a motor (26) is fixedly provided on the back of the mounting plate (27), a reciprocating threaded rod (24) is fixedly provided on the back of the output end of the motor (26), a control block (25) is provided on the threaded sleeve on the surface of the reciprocating threaded rod (24), and the left side of the control block (25) is fixedly connected to the right side of the sliding sleeve (211).

5. The silicon wafer drying device for a texturing machine according to claim 4, characterized in that: A guide rail (23) is fixedly provided on the top surface of the connecting frame (21), a connecting groove is provided on the inner top surface of the control block (25), and the surface of the guide rail (23) is slidably connected to the inner wall of the connecting groove.

6. The silicon wafer drying device for a texturing machine according to claim 1, characterized in that: Two wedge-shaped grooves are respectively provided on the front and rear end surfaces of the inner side of the drying box (1); two wedge-shaped blocks (217) are respectively fixedly provided on the side surfaces away from the two movable blocks (213); the surfaces of the two wedge-shaped blocks (217) are respectively slidably connected to the inner walls of the two wedge-shaped grooves; a drainage pipe (28) is fixedly provided through the bottom surface of the drying box (1) and extends into the interior of the drying box (1).

7. The silicon wafer drying device for a texturing machine according to claim 2, characterized in that: Two groups of dampers (34) and two groups of springs (35) are fixedly provided on the inner side surfaces of the two extrusion racks (33), and the adjacent side surfaces of the two groups of dampers (34) and the two groups of springs (35) are fixedly connected to the front and rear end surfaces of the drying box (1), respectively. Two supporting plates (36) are fixedly provided on the front and rear end surfaces of the inner side of the drying box (1).